JPH0450690A - Semiconductor radiation detector - Google Patents

Semiconductor radiation detector

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Publication number
JPH0450690A
JPH0450690A JP2154415A JP15441590A JPH0450690A JP H0450690 A JPH0450690 A JP H0450690A JP 2154415 A JP2154415 A JP 2154415A JP 15441590 A JP15441590 A JP 15441590A JP H0450690 A JPH0450690 A JP H0450690A
Authority
JP
Japan
Prior art keywords
semiconductor radiation
radiation detector
depletion layer
semiconductor
changeover switch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2154415A
Other languages
Japanese (ja)
Inventor
Toshiharu Miyauchi
宮内 敏治
Junichi Hoshi
星 純一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2154415A priority Critical patent/JPH0450690A/en
Publication of JPH0450690A publication Critical patent/JPH0450690A/en
Pending legal-status Critical Current

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  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To obtain an inexpensive detector of high accuracy by changing over the voltage applied to a semiconductor substrate having a bond for forming one depletion layer. CONSTITUTION:When a changeover switch 41 is closed, a current flows to semiconductor radiation detector from a DC power supply 2 through a voltage dividing resistor 31 to form a depletion layer 71. When a changeover switch 42 is closed, a depletion layer 72 is formed and, when a changeover switch 43 is closed, a depletion layer 73 is formed. As mentioned above, by utilizing that the sizes of the depletion layers 71 - 73 are different by the difference between the voltages divided by voltage dividing resistors 31 - 33 and applied to the semiconductor radiation detector 1, incident radiations 5 different in energy range are converted to electric signals by amplifiers 6 and transmitted to the measuring device of the next stage.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、例えば原子力発電所等の放射線を扱う場所
での放射線計測に使用される半導体放射線検出装置に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor radiation detection device used for radiation measurement in a place where radiation is handled, such as a nuclear power plant.

〔従来の技術〕[Conventional technology]

第3図は例えば実開昭63−60977号公報に示され
た従来の半導体放射線検出装置を示す構成図である。図
において、(1)は半導体放射線検出器、(2)は半導
体放射線検出器(1)に直流電圧を印加するための直流
電源、(5)は半導体放射線検出器(1)に入射する入
射放射線、(6)は増巾器、(8)は半導体放射線検出
器(1)のP型基板、(9)は半導体放射線検出器(1
)のn領域、(71) 〜(73)はP型基板C8)内
に形成された空乏層、  (101)は半導体放射線検
出器(1)の+側電極、  (,102)は半導体放射
線検出器(1)の−側電極、(111)及び(112)
は半導体放射線検出器(1)の伊領域である。
FIG. 3 is a block diagram showing a conventional semiconductor radiation detection device disclosed in, for example, Japanese Utility Model Application Publication No. 63-60977. In the figure, (1) is a semiconductor radiation detector, (2) is a DC power supply for applying DC voltage to the semiconductor radiation detector (1), and (5) is the incident radiation that enters the semiconductor radiation detector (1). , (6) is the amplifier, (8) is the P-type substrate of the semiconductor radiation detector (1), and (9) is the semiconductor radiation detector (1).
), (71) to (73) are the depletion layer formed in the P-type substrate C8), (101) is the + side electrode of the semiconductor radiation detector (1), (,102) is the semiconductor radiation detection Negative electrode of device (1), (111) and (112)
is the area of the semiconductor radiation detector (1).

次に動作について説明する。Next, the operation will be explained.

半導体放射線検出器(1)の+側電極(101)と−側
電極(102)間に直流電源(2)から電圧が印加され
ると、第3図に示す様に伊領域(111) 、 (11
2)の違いにより、P型基板18)内に形成される空乏
層(71)〜(73)の延びが異なる。次いで、入射放
射線(5)が半導体放射線検出器(1)に入射すると、
空乏層(71)〜(73)の延びが異なる為、空乏層(
71)〜(73)でそれぞれエネルギー範囲の異なる放
射線を検出し、増巾器(6)に送る。
When a voltage is applied from the DC power supply (2) between the + side electrode (101) and the - side electrode (102) of the semiconductor radiation detector (1), the area (111), ( 11
Due to the difference in 2), the extensions of the depletion layers (71) to (73) formed in the P-type substrate 18) differ. Then, when the incident radiation (5) enters the semiconductor radiation detector (1),
Since the lengths of the depletion layers (71) to (73) are different, the depletion layers (
71) to (73) detect radiation having different energy ranges and send them to the amplifier (6).

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体放射線検出装置は以上のように構成されて
いるので、一つの半導体基板中に複数の接合をしなけれ
ばならず、高度な技術を必要とするという課題があった
Since the conventional semiconductor radiation detection device is configured as described above, there is a problem that a plurality of bondings must be made in one semiconductor substrate, which requires advanced technology.

この発明は上記のような課題を解決するためになてれた
もので、一つの空乏層形成のための接合を有する半導体
放射線検出器のみで、エネルギー範囲の異なる放射線を
検出できる半導体放射線検出装置を得ることを目的とす
る。
This invention was developed to solve the above problems, and provides a semiconductor radiation detection device that can detect radiation in different energy ranges using only a semiconductor radiation detector having a junction for forming a depletion layer. The purpose is to obtain.

cmiiを解決するための手段〕 この発明に係る半導体放射線検出装置は、一つの空乏層
形成のための接合を有する半導体基板に印加する電圧を
切替えることにより、上記接合に異なった空乏層を形成
はせ、エネルギー範囲の異なる放射線を検出するもので
ある。
Means for Solving cmii] The semiconductor radiation detection device according to the present invention is capable of forming different depletion layers at the junction by switching the voltage applied to the semiconductor substrate having a junction for forming one depletion layer. It detects radiation with different energy ranges.

〔作用〕[Effect]

この発明における半導体放射線検出装置は、半導体基板
に印加する電圧を切替えることにより、半導体基板内に
形成でれる空乏層を変化させて、エネルギー範囲の異な
る放射線を検出する。
The semiconductor radiation detection device according to the present invention detects radiation having different energy ranges by changing the depletion layer formed within the semiconductor substrate by switching the voltage applied to the semiconductor substrate.

〔実施例〕〔Example〕

以下、この発明の一実施例を図について説明する。第1
図において、(1)は半導体放射線検出器、(2)は直
流電源、(31)〜(33)は直流電源(2)の電圧を
分圧する分圧抵抗、(41)〜(43)は分圧抵抗(3
1)〜(33)へ電流を流し分圧するのを切替える切替
スイッチ、+5)は被計測対象の入射放射線、(6)は
増巾器テアリ、入射放射線(6(のエネルギーを電気信
号として次段の計測器(図示せず)に伝える。+8)は
半導体放射線検出器(1)のP型基板、(9)はP型基
板18)に不純物を注入して形成されたn領域、  (
101)は半導体放射線検出器(1)の+側電極、(1
02)は半導体放射線検出器(1)の−側電極である。
An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, (1) is a semiconductor radiation detector, (2) is a DC power supply, (31) to (33) are voltage dividing resistors that divide the voltage of the DC power supply (2), and (41) to (43) are voltage dividers. Piezoresistance (3
1) to (33) are the changeover switches that allow current to flow and divide the voltage. +8) is the P-type substrate of the semiconductor radiation detector (1), (9) is the n-region formed by implanting impurities into the P-type substrate 18),
101) is the + side electrode of the semiconductor radiation detector (1), (1
02) is the - side electrode of the semiconductor radiation detector (1).

以上のように、半導体放射線検出器(1)は不純物濃度
一種で一つの接合のみにより構lli!2されているた
め半導体放射線検出器(1)は従来に比べて簡単に作る
ことが出来、安価となる。
As described above, the semiconductor radiation detector (1) can be constructed with one type of impurity concentration and only one junction! 2, the semiconductor radiation detector (1) can be manufactured more easily and at lower cost than conventional ones.

次に動作について、第2図(Al−(0)により説明す
る。第2図偽)に示すように、切替スイッチ(41)が
閉じると直流電源(2)から分圧抵抗(31)を通り、
半導体放射線検出器(1)に電流が流れ、空乏層(71
)ができる。同様に第2図(Blでは、切替スイッチ(
42)が閉じると空乏層(72)が、第2図(0)では
、切替スイッチ(43)が閉じると空乏層(73)がで
きる。以上のように分圧抵抗(31)〜(33)で分圧
され、半導体放射線検出器(1)に加えられる電圧の違
いにより、空乏層(71)〜(73)の大きさが異なる
ことを利用しエネルギー範囲の異なる入射放射線(5)
を半導体放射線検出器(1)で検出し、増巾器(6)で
電気信号に変えて、次段の計測器(図示せず)に伝える
ことができる。
Next, the operation will be explained using Fig. 2 (Al-(0). Fig. 2 false). ,
A current flows through the semiconductor radiation detector (1), and the depletion layer (71
) can be done. Similarly, in Figure 2 (Bl, the changeover switch (
42) is closed, a depletion layer (72) is formed, and in FIG. 2 (0), when the changeover switch (43) is closed, a depletion layer (73) is formed. As mentioned above, the size of the depletion layers (71) to (73) differs depending on the voltage divided by the voltage dividing resistors (31) to (33) and applied to the semiconductor radiation detector (1). Incident radiation with different energy ranges (5)
can be detected by a semiconductor radiation detector (1), converted into an electrical signal by an amplifier (6), and transmitted to a next-stage measuring instrument (not shown).

また、分圧抵抗(31)〜(33)の抵抗値を牌整する
ことで、空乏層(71)〜(73)の太き式を変えるこ
とが出来るため精度の高いものが得られる7なお、上記
実施例では分圧抵抗(31)〜(33)を並列に配置し
たものを示したが1例えば第4図に示すように、分圧抵
抗(31)〜(34)を直列に配置しても良く、この場
合の動作はそれぞれ第5図(Al−(0)に示すように
、空乏層(71)〜(73)の大きさが異なることにな
り、上記実施例と同様の効果を奏する。
In addition, by adjusting the resistance values of the voltage dividing resistors (31) to (33), the thick formulas for the depletion layers (71) to (73) can be changed, resulting in highly accurate results. In the above embodiment, voltage dividing resistors (31) to (33) are arranged in parallel, but for example, as shown in FIG. 4, voltage dividing resistors (31) to (34) are arranged in series. In this case, the sizes of the depletion layers (71) to (73) are different as shown in FIG. 5 (Al-(0)), and the same effect as in the above embodiment can be obtained. play.

また、分圧抵抗(31)〜(33)を使用するかわりに
、電圧の異なる直流電源(2)を複数個用いて切替える
ようにしてもよく、半導体放射線検出器(1)に加える
電圧を切替えることができる構成であればどのように構
成式れていてもよい。
Furthermore, instead of using the voltage dividing resistors (31) to (33), a plurality of DC power supplies (2) with different voltages may be used to switch the voltage applied to the semiconductor radiation detector (1). Any configuration may be used as long as it is possible.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば半導体放射線検出装置
を、一つの空乏層形成のための接合を有する半導体基板
に印加する電Ffを切替えるように構成したので、装置
が安価にでき、また、精度の高いものが得られる効果が
ある。
As described above, according to the present invention, the semiconductor radiation detection device is configured to switch the electric current Ff applied to the semiconductor substrate having a junction for forming one depletion layer, so the device can be made inexpensive, and This has the effect of obtaining highly accurate products.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例による半導体放射線検出装
置の回路図、第2図(ハ)〜(C1は第1図の半導体放
射線検出装置の動作説明用回路図、第3図は従来の半導
体放射線検出装置を示す構成図、第4図はこの発明の他
の実施例による半導体放射線検出装置の回路図、第5図
+A1〜(○)は第4図の半導体放射線検出装置の動作
説明用回路図である。 図において、(1)は半導体放射線検出器、(2)は直
流電源、  (31)〜(33)は分圧抵抗、(41)
〜(43)は切替スイッチ、(5Iは入射放射線、(6
)は増巾器、  (71)〜(73) は空乏層である。 なお、 図中同一符号は同− 又は相当部分を示 す。 代 理 人 大 岩 増 雄 第1図 !曽 す 象 第3図 第4図
FIG. 1 is a circuit diagram of a semiconductor radiation detection device according to an embodiment of the present invention, FIGS. 2(C) to (C1 are circuit diagrams for explaining the operation of the semiconductor radiation detection device of FIG. A configuration diagram showing a semiconductor radiation detection device, FIG. 4 is a circuit diagram of a semiconductor radiation detection device according to another embodiment of the present invention, and FIG. 5 +A1 to (○) are for explaining the operation of the semiconductor radiation detection device in FIG. It is a circuit diagram. In the figure, (1) is a semiconductor radiation detector, (2) is a DC power supply, (31) to (33) are voltage dividing resistors, and (41)
~ (43) is a changeover switch, (5I is incident radiation, (6
) is an amplifier, and (71) to (73) are depletion layers. In addition, the same reference numerals in the figures indicate the same or equivalent parts. Agent Masuo Oiwa Figure 1! Zeng Elephant Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims]  一つの空乏層形成のための接合を有する半導体基板を
備え、この半導体基板に印加する電圧を切替え、上記接
合に異なつた空乏層を形成させることによりエネルギー
範囲の異なる放射線を検出することを特徴とする半導体
放射線検出装置。
It is characterized by comprising a semiconductor substrate having a junction for forming one depletion layer, and detecting radiation having different energy ranges by changing the voltage applied to the semiconductor substrate and forming different depletion layers at the junction. Semiconductor radiation detection device.
JP2154415A 1990-06-13 1990-06-13 Semiconductor radiation detector Pending JPH0450690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2154415A JPH0450690A (en) 1990-06-13 1990-06-13 Semiconductor radiation detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2154415A JPH0450690A (en) 1990-06-13 1990-06-13 Semiconductor radiation detector

Publications (1)

Publication Number Publication Date
JPH0450690A true JPH0450690A (en) 1992-02-19

Family

ID=15583661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2154415A Pending JPH0450690A (en) 1990-06-13 1990-06-13 Semiconductor radiation detector

Country Status (1)

Country Link
JP (1) JPH0450690A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011164048A (en) * 2010-02-15 2011-08-25 Yokogawa Electric Corp Radiation measuring device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011164048A (en) * 2010-02-15 2011-08-25 Yokogawa Electric Corp Radiation measuring device

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