JPH0447454B2 - - Google Patents

Info

Publication number
JPH0447454B2
JPH0447454B2 JP58161456A JP16145683A JPH0447454B2 JP H0447454 B2 JPH0447454 B2 JP H0447454B2 JP 58161456 A JP58161456 A JP 58161456A JP 16145683 A JP16145683 A JP 16145683A JP H0447454 B2 JPH0447454 B2 JP H0447454B2
Authority
JP
Japan
Prior art keywords
sample
light
light source
container
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58161456A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6053016A (ja
Inventor
Masahiko Hirose
Takaaki Kamimura
Masahiko Akyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP16145683A priority Critical patent/JPS6053016A/ja
Publication of JPS6053016A publication Critical patent/JPS6053016A/ja
Publication of JPH0447454B2 publication Critical patent/JPH0447454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP16145683A 1983-09-02 1983-09-02 試料処理装置 Granted JPS6053016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16145683A JPS6053016A (ja) 1983-09-02 1983-09-02 試料処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16145683A JPS6053016A (ja) 1983-09-02 1983-09-02 試料処理装置

Publications (2)

Publication Number Publication Date
JPS6053016A JPS6053016A (ja) 1985-03-26
JPH0447454B2 true JPH0447454B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-04

Family

ID=15735447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16145683A Granted JPS6053016A (ja) 1983-09-02 1983-09-02 試料処理装置

Country Status (1)

Country Link
JP (1) JPS6053016A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2588511B2 (ja) * 1986-09-24 1997-03-05 株式会社日立製作所 処理装置
JPS6355428U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1986-09-26 1988-04-13
JPS63222430A (ja) * 1987-03-11 1988-09-16 Nikon Corp 光照射装置
US5178682A (en) * 1988-06-21 1993-01-12 Mitsubishi Denki Kabushiki Kaisha Method for forming a thin layer on a semiconductor substrate and apparatus therefor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505721U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-05-17 1975-01-21

Also Published As

Publication number Publication date
JPS6053016A (ja) 1985-03-26

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