JPH044060U - - Google Patents
Info
- Publication number
- JPH044060U JPH044060U JP4440090U JP4440090U JPH044060U JP H044060 U JPH044060 U JP H044060U JP 4440090 U JP4440090 U JP 4440090U JP 4440090 U JP4440090 U JP 4440090U JP H044060 U JPH044060 U JP H044060U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- base plate
- vacuum chamber
- cooling structure
- refrigerant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000003507 refrigerant Substances 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- AFYPFACVUDMOHA-UHFFFAOYSA-N chlorotrifluoromethane Chemical compound FC(F)(F)Cl AFYPFACVUDMOHA-UHFFFAOYSA-N 0.000 claims 1
- 239000002826 coolant Substances 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4440090U JPH0650539Y2 (ja) | 1990-04-24 | 1990-04-24 | スパッタ装置の基板冷却構造 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4440090U JPH0650539Y2 (ja) | 1990-04-24 | 1990-04-24 | スパッタ装置の基板冷却構造 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH044060U true JPH044060U (nl) | 1992-01-14 |
| JPH0650539Y2 JPH0650539Y2 (ja) | 1994-12-21 |
Family
ID=31557668
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4440090U Expired - Lifetime JPH0650539Y2 (ja) | 1990-04-24 | 1990-04-24 | スパッタ装置の基板冷却構造 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0650539Y2 (nl) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05238881A (ja) * | 1992-02-27 | 1993-09-17 | Hoxan Corp | ガスソース分子線エピタキシー装置 |
-
1990
- 1990-04-24 JP JP4440090U patent/JPH0650539Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05238881A (ja) * | 1992-02-27 | 1993-09-17 | Hoxan Corp | ガスソース分子線エピタキシー装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0650539Y2 (ja) | 1994-12-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2088821A1 (en) | Cooling structure for integrated circuit | |
| JPH044060U (nl) | ||
| JPS57188434A (en) | Manufacture apparatus for heat ray reflecting glass | |
| JPH0397993U (nl) | ||
| JPH02120830U (nl) | ||
| JPS64523U (nl) | ||
| JPS62118133U (nl) | ||
| JPH03113843U (nl) | ||
| JPS61202456U (nl) | ||
| JPS5947650U (ja) | 金属熱処理設備 | |
| JPH0367446U (nl) | ||
| JPH01173135U (nl) | ||
| JPH02131132U (nl) | ||
| JPH0225045U (nl) | ||
| JPH0382322U (nl) | ||
| JPS63147813U (nl) | ||
| JPH0211652U (nl) | ||
| JPS6186668U (nl) | ||
| JPH0361274U (nl) | ||
| JPS6397230U (nl) | ||
| JPS61202455U (nl) | ||
| JPH02131341U (nl) | ||
| JPH0292924U (nl) | ||
| JPH032652U (nl) | ||
| JPH0187529U (nl) |