JPH0440419A - Electrode deposited with color filter on top - Google Patents
Electrode deposited with color filter on topInfo
- Publication number
- JPH0440419A JPH0440419A JP2148086A JP14808690A JPH0440419A JP H0440419 A JPH0440419 A JP H0440419A JP 2148086 A JP2148086 A JP 2148086A JP 14808690 A JP14808690 A JP 14808690A JP H0440419 A JPH0440419 A JP H0440419A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- color filter
- compd
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 8
- 239000011521 glass Substances 0.000 abstract description 6
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 3
- 239000000049 pigment Substances 0.000 abstract description 3
- 239000004925 Acrylic resin Substances 0.000 abstract description 2
- 229920000178 Acrylic resin Polymers 0.000 abstract description 2
- 238000000206 photolithography Methods 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000012212 insulator Substances 0.000 abstract 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、主に液晶表示装置ｔこ用いられるカラーフィ
ルタ上への透明電極膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a transparent electrode film on a color filter used mainly in liquid crystal display devices.
［従来の技術］
従来、液晶表示装置等に用いられるカラーフィルタの透
明電極構造は、ガラス等からなる基板上に必要形状にパ
ターン化された透明電極を設げ、その上に有機系樹脂に
有機又は無機からなる染料又は顔料の混合された色基質
をパターン化して設け、更に必要に応じ色基質を保護す
るためのオーバーコート膜が設けられていた。[Prior Art] Conventionally, the transparent electrode structure of color filters used in liquid crystal display devices, etc., consists of providing a transparent electrode patterned in the required shape on a substrate made of glass or the like, and then applying an organic resin to an organic resin. Alternatively, a color substrate mixed with an inorganic dye or pigment is provided in a patterned manner, and an overcoat film for protecting the color substrate is further provided as necessary.
そのため、従来のカラーフィルタの透明電極膜構造では
、基板であるガラス上に直に成膜するため比較的高温で
の膜付けが可能であるとともに、無機基質同士の結合で
あるため、基板との密着性をあまり考慮する必要がなか
った。しかし近年液晶素子が高密度化されるに伴い、従
来の様な透明電極上にカラーフィルタを形成した構造で
は、特性に限界があるため基板上にカラーフィルタを形
成し、その上に透明電極を形成する構造へと移行してき
た。Therefore, with the transparent electrode film structure of conventional color filters, the film is formed directly on the glass substrate, which allows the film to be formed at relatively high temperatures, and since it is a bond between inorganic substrates, it is possible to form the film directly on the glass substrate. There was no need to give much consideration to adhesion. However, as liquid crystal elements have become more dense in recent years, the conventional structure in which color filters are formed on transparent electrodes has limited characteristics, so color filters are formed on substrates and transparent electrodes are placed on top of them. It has shifted to a structure that forms.
［発明が解決しようとする課題および目的］しかし、カ
ラーフィルタ又はオーバーコート膜のような有機物上に
無機物である透明電極を直に形成しようとすると、カラ
ーフィルタまたはオーバーコート膜と透明電極膜間の密
着性が悪く、後の工程に於て電極が浮き出すという課題
があった。[Problems and objects to be solved by the invention] However, when attempting to directly form a transparent electrode made of an inorganic material on an organic material such as a color filter or overcoat film, the problem arises that the gap between the color filter or overcoat film and the transparent electrode film is There was a problem that the adhesion was poor and the electrodes were exposed in subsequent steps.
［課題を解決するための手段］
本発明は、前記課題を解決するもので、少なくともＲ，
Ｇ、 Ｂからなる色基質、更に必要によりオーバーコ
ート膜を有するカラーフィルタ上に、必要により透明絶
縁膜、更に透明電極膜を設けてなるカラーフィルタ上付
は電極に於いて、少なくとも前記カラーフィルタ又はオ
ーバーコート膜と、透明絶縁膜又は透明電極膜の間に有
機ケイ素化合物膜が形成されていることを特徴とする。[Means for Solving the Problems] The present invention solves the above problems, and includes at least R,
A color filter overlay is formed by providing a transparent insulating film and a transparent electrode film, if necessary, on a color filter having a color substrate consisting of G and B, and an overcoat film if necessary.At the electrode, at least the color filter or It is characterized in that an organosilicon compound film is formed between the overcoat film and the transparent insulating film or transparent electrode film.
以下、実施例により本発明の詳細を示す。Hereinafter, the details of the present invention will be shown by examples.
［実施例１］
第１図は、本発明のカラーフィルタ上付は電極の構造の
一例を示す略図である。ガラス基板１０の上に顔料レジ
スト系カラーフィルタ基質を各々塗布、パターニングし
、赤、緑、青からなるカラーフィルタ１１を形成した。[Example 1] FIG. 1 is a schematic diagram showing an example of the structure of the color filter top electrode of the present invention. Pigment resist-based color filter substrates were applied and patterned on the glass substrate 10 to form color filters 11 consisting of red, green, and blue.
この上に感光性アクリル樹脂を約２ミクロンロールコー
ト塗布しフォトリソによりパターン形成し、硬化させオ
ーバーコート膜１２とした。この基板を洗浄した後、
１％γ−アミノープロピルートリアルコキシシラン水溶
液中に浸漬し、水洗乾燥して有機ケイ素化合物膜１３を
形成した。尚この時の膜厚は、数十へ以下である。更に
、この基板をＤＣマグネトロンスパッタリング装置に挿
入し、スパッタリング法により、透明電極膜１４を形成
した。この時の膜付は条件は、ターゲツト材としてＩｎ
２０３８０〜９５ｗｔ％、５ｎＯ２５〜２０ｗｔ％の焼
結体を用い、スパッタ時の０２分圧はおよそ１〜８Ｘ１
０−５ＴＯｏｒである。また基板加熱温度は、１５０〜
２３０°Ｃの温度であり、膜厚は約２０００人である。On top of this, a photosensitive acrylic resin was roll-coated to a thickness of about 2 microns, patterned by photolithography, and cured to form an overcoat film 12. After cleaning this board,
The film was immersed in a 1% γ-aminopropyltrialkoxysilane aqueous solution, washed with water, and dried to form an organosilicon compound film 13. Incidentally, the film thickness at this time is several tens or less. Furthermore, this substrate was inserted into a DC magnetron sputtering device, and a transparent electrode film 14 was formed by a sputtering method. The conditions for film formation at this time were In as the target material.
Using a sintered body of 20380-95wt% and 5nO25-20wt%, the 02 partial pressure during sputtering was approximately 1-8X1.
It is 0-5 TOor. In addition, the substrate heating temperature is 150~
The temperature is 230°C and the film thickness is about 2000.
このようにして得られた透明電極膜は、シート抵抗がお
よそ１５〜２８Ω／口であった。更にこの基板上にポジ
レジストを電極構造にパターン化して、硝酸＋塩酸＋水
系のエツチング液で約５０°Ｃに加熱しながらパターニ
ングした。得られた電極は、サイドエツチングが約１〜
３ミクロンでしかも密着性は良好であり、後工程のアル
カリのレジスト剥離工程、更にはパネル組立工程と流動
しても電極浮き等全く発生する事がなかった。尚、比較
のために有機ケイ素化合物膜１３を形成せず直接透明電
極膜１４を形成した基板は、サイドエツチング量が、約
１０ミクロンで、基板に対して断面形状がオーバーハン
グ状であり、密着性が悪く、後工程のアルカリのレジス
ト剥離工程で透明電極が、一部剥離した。The transparent electrode film thus obtained had a sheet resistance of approximately 15 to 28 Ω/mouth. Furthermore, a positive resist was patterned into an electrode structure on this substrate, and the patterning was performed while heating to about 50° C. using an etching solution of nitric acid + hydrochloric acid + water. The obtained electrode has a side etching of about 1~
The thickness was 3 microns, and the adhesion was good, and no electrode floating occurred at all even during the post-process alkali resist stripping process and even during the panel assembly process. For comparison, a substrate on which the transparent electrode film 14 was directly formed without forming the organosilicon compound film 13 had a side etching amount of about 10 microns and a cross-sectional shape overhanging the substrate. The transparent electrode was partially peeled off during the post-process alkaline resist removal process.
［実施例２コ
ガラス基板１０の上に、赤、緑、青の顔料インクを各々
オフセット印刷機で、ストライブパターンに印刷し、カ
ラーフィルタ１１を形成した。この上にポリイミド樹脂
を約１ミクロンフレキソ印刷し、樹脂を硬化させオーバ
ーコート膜１２とした。この基板を洗浄した後、約５％
γ−グリシドキシープロビル−トリアルコキシシランエ
タノール溶液をスピンコードにより塗布し、乾燥して有
機ケイ素化合物膜１３を約数画人形成した。更に、この
基板をＲＦマグネトロンスパッタリング装置に挿入し、
スパッタリング法により、透明絶縁膜１５を形成した。[Example 2] Red, green, and blue pigment inks were each printed in a stripe pattern on a glass substrate 10 using an offset printing machine to form a color filter 11. A polyimide resin of about 1 micron was flexographically printed on this, and the resin was cured to form an overcoat film 12. After cleaning this substrate, approximately 5%
A γ-glycidoxyprobyl-trialkoxysilane ethanol solution was applied using a spin cord and dried to form an organosilicon compound film 13 having a thickness of about several strokes. Furthermore, this substrate is inserted into an RF magnetron sputtering device,
A transparent insulating film 15 was formed by sputtering.
この時の透明絶縁膜としては、酸化珪素、酸化ジルコニ
ウム、酸化チタン、酸化アルミニウムの単独又は混合物
である。膜厚は、およそ１００〜４０００人である。更
にこの基板上を真空蒸着機に挿入し、ＥＢ加熱により、
透明電極膜１４を形成した。この時の膜付は条件は、蒸
着材料としてＩｎ２０３９５ｗｔ％、ＳｎＯ２５ｗｔ％
の焼結体を用い、蒸着時の到達真空度はおよそ１〜３ｘ
ｌＯ−６Ｔｏｏｒである。また基板加熱温度は、１８０
〜２５０°Ｃの温度であり、膜厚は約１５００人である
。このようにして得られた透明電極膜は、シート抵抗が
およそ１４〜２５Ω／口であった。更にこの基板上にポ
ジレジストを電極構造にパターン化して、塩化鉄＋塩酸
＋水系のエツチング液で約５０°Ｃに加熱しながらパタ
ーニングした。得られた電極は、サイドエツチングがほ
とんどなく、密着性も良好で後工程に於いても何ら問題
なく流動することができた。The transparent insulating film at this time may be silicon oxide, zirconium oxide, titanium oxide, or aluminum oxide alone or in combination. The film thickness is approximately 100 to 4000 people. Furthermore, this substrate was inserted into a vacuum evaporator, and by EB heating,
A transparent electrode film 14 was formed. The conditions for film deposition at this time were In20395wt% and SnO25wt% as vapor deposition materials.
The ultimate vacuum during vapor deposition is approximately 1 to 3x.
It is lO-6Toor. Also, the substrate heating temperature is 180℃.
The temperature is ~250°C and the film thickness is approximately 1500 mm. The transparent electrode film thus obtained had a sheet resistance of approximately 14 to 25 Ω/mouth. Furthermore, a positive resist was patterned into an electrode structure on this substrate, and patterning was performed while heating to about 50° C. with an etching solution of iron chloride + hydrochloric acid + water. The obtained electrode had almost no side etching, had good adhesion, and could be flowed without any problem in the subsequent process.
上記実施例は、本発明の一部を示すもので、カラーフィ
ルタ、オーバーコート膜の形成方法、条件等に限定され
るものではなく、又材質に於いても有機化合物を僅かで
も含有していれば適合するとともに、又透明絶縁膜及び
透明電極においても材質組成、成膜条件等に限定される
ものではない。The above examples show a part of the present invention, and are not limited to the method and conditions for forming the color filter and overcoat film, and the materials may not contain even a small amount of organic compounds. In addition, there are no limitations on the material composition, film formation conditions, etc. of the transparent insulating film and the transparent electrode.
更に、本発明に於ける有機ケイ素化合物とは、シランカ
ップリング剤をすべて含有するものであるが、特にアミ
ノ基、エポキシ基を有するシランカップリング剤が、よ
り特性的に好ましいものである。Further, the organosilicon compound in the present invention includes all silane coupling agents, but silane coupling agents having an amino group or an epoxy group are particularly preferable in terms of characteristics.
［発明の効果］
以上述べたように、本発明によれば、カラーフィルタ又
はオーバーコート膜の有機化合物と、透明絶縁物膜又は
透明電極膜の無機化合物との間に、各々の膜と強い親和
性を有する有機ケイ素化合物膜を設けることで、従来に
ない優れた密着性を有するカラーフィルタ上付は電極が
得られるため、高品質で高密度の液晶表示装置等への応
用が可能である。[Effects of the Invention] As described above, according to the present invention, there is a strong affinity between the organic compound of the color filter or the overcoat film and the inorganic compound of the transparent insulating film or the transparent electrode film. By providing an organosilicon compound film with properties, it is possible to obtain electrodes for color filter overlays with unprecedented adhesion, making it possible to apply them to high-quality, high-density liquid crystal display devices, etc.
第１図は、本発明カラーフィルタ上付は電極の一例を示
す断面略図である。
１０．
１１゜
１２゜
１３゜
１４゜
１５゜
基板
カラーフィルタ
オーバーコート膜
有機ケイ素化合物膜
透明電極膜
透明絶縁膜
以 上
出願人 セイコーエプソン株式会社FIG. 1 is a schematic cross-sectional view showing an example of the color filter top electrode of the present invention. 10. 11゜12゜13゜14゜15゜Substrate Color filter overcoat film Organosilicon compound film Transparent electrode film Transparent insulation film Applicant: Seiko Epson Corporation
Claims (1)
りオーバーコート膜を有するカラーフィルタ上に、必要
により透明絶縁膜、更に透明電極膜を設けてなるカラー
フィルタ上付け電極に於いて、少なくとも前記カラーフ
ィルタ又はオーバーコート膜と、透明絶縁膜又は透明電
極膜の間に有機ケイ素化合物膜が形成されていることを
特徴とするカラーフィルタ上付け電極。In a color filter top electrode, which is formed by providing a color substrate consisting of at least R, G, and B, and a color filter having an overcoat film if necessary, a transparent insulating film and a transparent electrode film if necessary, at least the color A color filter upper electrode characterized in that an organosilicon compound film is formed between a filter or overcoat film and a transparent insulating film or a transparent electrode film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2148086A JPH0440419A (en) | 1990-06-06 | 1990-06-06 | Electrode deposited with color filter on top |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2148086A JPH0440419A (en) | 1990-06-06 | 1990-06-06 | Electrode deposited with color filter on top |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0440419A true JPH0440419A (en) | 1992-02-10 |
Family
ID=15444922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2148086A Pending JPH0440419A (en) | 1990-06-06 | 1990-06-06 | Electrode deposited with color filter on top |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0440419A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH063639A (en) * | 1992-06-17 | 1994-01-14 | Sharp Corp | Manufacture of projection type color liquid crystal display device |
| JP2003066215A (en) * | 2001-08-23 | 2003-03-05 | Sumitomo Chem Co Ltd | Color filter with protective film |
| US6559066B2 (en) | 1996-08-02 | 2003-05-06 | Sharp Kabushiki Kaisha | Substrate for use in display element, method of manufacturing the same, and apparatus for manufacturing the same |
-
1990
- 1990-06-06 JP JP2148086A patent/JPH0440419A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH063639A (en) * | 1992-06-17 | 1994-01-14 | Sharp Corp | Manufacture of projection type color liquid crystal display device |
| US6559066B2 (en) | 1996-08-02 | 2003-05-06 | Sharp Kabushiki Kaisha | Substrate for use in display element, method of manufacturing the same, and apparatus for manufacturing the same |
| JP2003066215A (en) * | 2001-08-23 | 2003-03-05 | Sumitomo Chem Co Ltd | Color filter with protective film |
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