JPH0438518Y2 - - Google Patents

Info

Publication number
JPH0438518Y2
JPH0438518Y2 JP1983039595U JP3959583U JPH0438518Y2 JP H0438518 Y2 JPH0438518 Y2 JP H0438518Y2 JP 1983039595 U JP1983039595 U JP 1983039595U JP 3959583 U JP3959583 U JP 3959583U JP H0438518 Y2 JPH0438518 Y2 JP H0438518Y2
Authority
JP
Japan
Prior art keywords
cleaning
wafers
wafer
main body
divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983039595U
Other languages
Japanese (ja)
Other versions
JPS59146941U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3959583U priority Critical patent/JPS59146941U/en
Publication of JPS59146941U publication Critical patent/JPS59146941U/en
Application granted granted Critical
Publication of JPH0438518Y2 publication Critical patent/JPH0438518Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Description

【考案の詳細な説明】 (技術分野) 本考案は既存の半導体洗浄装置に何ら変更を加
えることなく、切断分割されて外形の小さくなつ
た半導体ウエハを容易に洗浄することができる半
導体洗浄治具に関するものである。
[Detailed description of the invention] (Technical field) The present invention is a semiconductor cleaning jig that can easily clean semiconductor wafers that have been cut and divided into smaller external dimensions without making any changes to existing semiconductor cleaning equipment. It is related to.

(従来技術) 半導体製造工程に於ては、使用装置の条件設定
やウエハ処理中の条件モニターのため、多量のモ
ニターウエハを使用する。この場合、トランジス
タ、ダイオード等を形成するウエハのできるだけ
忠実なモニターとするため、同一ロツトのウエハ
を抜き取つて使用するのが普通である。ところ
が、ウエハ1枚の単価は高価であるため、1枚の
ウエハを小片に分割してモニターとして使用する
のが、製造コスト低減のため好ましいが、ウエハ
はその分割作業により表面が汚染されるため、分
割後のウエハは必ず洗浄する必要がある。
(Prior Art) In the semiconductor manufacturing process, a large number of monitor wafers are used to set conditions for the equipment used and to monitor conditions during wafer processing. In this case, in order to monitor wafers forming transistors, diodes, etc. as faithfully as possible, wafers from the same lot are usually extracted and used. However, since the unit price of a single wafer is high, it is preferable to divide a single wafer into small pieces and use them as a monitor in order to reduce manufacturing costs. , it is necessary to clean the wafer after it has been divided.

一方、シリコン半導体ウエハは、その取扱いの
容易さから、円い形に作られており、従つて洗浄
治具は円形のウエハを装着する様に設計され、さ
らにこの洗浄治具を合理的に取扱う様に洗浄装置
が構成されている。第1図は周知の洗浄治具の外
観斜視図、第2図はその−′方向の縦断正面
図を示しているが、従来この種洗浄治具1は、円
形のウエハ2をそれぞれ非接触で隣接させて収納
する切り溝(ポケツト)3がピツチ3〜5mm程度
で一般には25個設けられていて、各切り溝3の間
には複数の窓4を開けることにより、洗浄液の流
れや、ウエハ2を乾燥させる場合の水切り効果を
高める構造となつている。この切り溝3の外側に
設けられた複数の窓4は、洗浄液の流れや水切り
効果を高めるため、支障のない限りできるだけ大
きくなつている。従つて、破損あるいは切断によ
つて外形が小さくなつたウエハは複数の窓4から
落下してしまうので、その洗浄にこの洗浄治具1
を用いることができない。そのため、分割ウエハ
洗浄のために別の異形の洗浄治具を準備する必要
が生じ、また洗浄治具が異なる結果、既存の洗浄
装置での洗浄ができなくなり、新たにモニター小
片用の洗浄装置を設置せざるを得ず、経費や工数
が増大する欠点があつた。
On the other hand, silicon semiconductor wafers are made in a circular shape for ease of handling, so cleaning jigs are designed to mount circular wafers, and this cleaning jigs can be handled rationally. The cleaning device is configured as follows. FIG. 1 is an external perspective view of a well-known cleaning jig, and FIG. 2 is a longitudinal sectional front view in the -' direction. In general, there are 25 pockets 3 that are stored adjacent to each other with a pitch of about 3 to 5 mm, and by opening a plurality of windows 4 between each pocket 3, the flow of the cleaning solution and the wafer can be controlled. It has a structure that enhances the draining effect when drying 2. The plurality of windows 4 provided on the outside of the kerf 3 are made as large as possible without causing any hindrance in order to enhance the flow of the cleaning liquid and the draining effect. Therefore, since wafers whose external dimensions have become smaller due to damage or cutting fall through the plurality of windows 4, this cleaning jig 1 is used to clean them.
cannot be used. Therefore, it became necessary to prepare another odd-shaped cleaning jig for cleaning divided wafers, and as a result of the different cleaning jigs, it became impossible to clean with the existing cleaning equipment, and a new cleaning equipment for small monitor pieces was installed. It had to be installed, which had the drawback of increasing costs and man-hours.

(考案の目的) 本考案の目的はこれらの欠点を解決するため、
外形が小さくなつた分割ウエハを支持できる切り
溝を有する支持体を洗浄治具の内側面のほぼ中央
部に、着脱自在に取付けることにより、分割ウエ
ハを分割前ウエハと同一の洗浄治具で取扱うこと
を可能とし、既存の洗浄装置での分割ウエハの洗
浄、乾燥ができるようにしたもので、以下詳細に
説明する。
(Purpose of the invention) The purpose of the invention is to solve these drawbacks.
By removably attaching a support having a cut groove capable of supporting divided wafers whose outer dimensions have become smaller to approximately the center of the inner surface of the cleaning jig, the divided wafers can be handled with the same cleaning jig as the wafers before division. This will be described in detail below.

(考案の構成および作用) 第3図は本考案を実施した洗浄治具の外観斜視
図、第4図はその−′方向の縦断正面図であ
り、図において、5は洗浄治具本体、6は分割ウ
エハの支持体、7は支持体6を洗浄治具本体5に
固定するピンである。洗浄治具本体5は既存の洗
浄装置に適合した従来の洗浄治具1と同一の外形
を有しまた分割前の円形ウエハ2を収納する複数
の切り溝8ならびに複数の窓4を有している。洗
浄治具本体5の両内側面のほぼ中央部には、一対
の支持体6を対向させて長手方向の全長に渡つて
配設し、ピン7によつて側面より着脱自在に固定
している。支持体6には分割ウエハ9の中心角A
に合わせた切り込み角度を有する複数の切り溝1
0を設け、第4図に示すように、中心角Aを有す
る直線部を下にして先端部が支持体の下部に突出
するように、該切り溝10に分割ウエハ9を挿入
して支持するようにする。モニターとしてのウエ
ハの分割形状は用途に応じて多種多様のものがあ
るが、直線で交叉する2辺を持つ例えば鋭角形状
であればその交叉角に適合させた切り込み角度の
切り溝10を有する支持体6を用意すれば、ピン
7によつて取り替えることにより、各種形状の分
割ウエハ9を支持することができる。また、支持
体6に支持される分割ウエハ9が本体5の切り溝
8に支持されるウエハ2と平行になるようにその
切り溝10を設ければ、分割ウエハ9の洗浄時の
水切り効果を高めることができる。
(Structure and operation of the invention) Fig. 3 is an external perspective view of a cleaning jig embodying the present invention, and Fig. 4 is a vertical sectional front view in the -' direction. 7 is a support for the divided wafer, and 7 is a pin for fixing the support 6 to the cleaning jig main body 5. The cleaning jig main body 5 has the same external shape as the conventional cleaning jig 1 that is compatible with existing cleaning equipment, and has a plurality of grooves 8 and a plurality of windows 4 for storing the circular wafers 2 before being divided. There is. A pair of supports 6 are disposed at approximately the center of both inner surfaces of the cleaning jig main body 5, facing each other over the entire length in the longitudinal direction, and are removably fixed from the sides with pins 7. . The support body 6 has a center angle A of the divided wafer 9.
A plurality of kerf grooves 1 having cutting angles tailored to
0, and as shown in FIG. 4, the split wafer 9 is inserted into the cut groove 10 and supported with the straight part having the central angle A facing down and the tip part protruding to the lower part of the support. do it like this. There are many different shapes for dividing a wafer as a monitor depending on the purpose, but if the shape is an acute angle with two straight sides that intersect, for example, the support has a cut groove 10 with a cut angle that matches the intersecting angle. Once the body 6 is prepared, divided wafers 9 of various shapes can be supported by replacing it with pins 7. Furthermore, if the cut grooves 10 are provided so that the split wafer 9 supported by the support 6 is parallel to the wafer 2 supported by the cut grooves 8 of the main body 5, the water draining effect when cleaning the split wafer 9 can be improved. can be increased.

支持体6の材質は、機械加工が簡単で、洗浄中
にウエハを汚染しないものであればよく、特に制
限はないが、洗浄治具本体5と同一材質であるこ
とが好ましい。
The material of the support body 6 is not particularly limited as long as it is easy to machine and does not contaminate the wafer during cleaning, but it is preferably the same material as the cleaning jig main body 5.

また、本実施例では、支持体6は側面より埋め
込まれたピン7により固定するようにしている
が、支持体6を着脱自在に固定できるものであれ
ば特に制限はない。
Further, in this embodiment, the support body 6 is fixed by the pin 7 embedded from the side, but there is no particular restriction as long as the support body 6 can be detachably fixed.

分割ウエハ9の洗浄においては、前述のように
支持体6の切り溝10にウエハ9の中心角Aを下
向けにして挿入することにより、ウエハ9を洗浄
治具本体5から落下させることなく、切り溝10
の数だけの枚数を同時に安定よく支持することが
でき、また、本体5の外形は既存の洗浄装置に対
応しているから、既設の洗浄装置をそのまま用い
て分割ウエハ9の洗浄をすることができる。ま
た、本案治具は、支持体6を取外せば、分割され
ていない円形ウエハ2の洗浄にも用いることがで
きる。
When cleaning the divided wafer 9, as described above, by inserting the wafer 9 into the cut groove 10 of the support 6 with the center angle A facing downward, the wafer 9 can be cleaned without falling from the cleaning jig main body 5. Kerf 10
It is possible to stably support the same number of wafers at the same time, and since the external shape of the main body 5 is compatible with existing cleaning equipment, the divided wafers 9 can be cleaned using the existing cleaning equipment as is. can. Further, the present jig can also be used for cleaning undivided circular wafers 2 by removing the support 6.

尚、上記説明では本案治具を用いて洗浄するウ
エハとして、半導体装置製造に用いるモニター用
の分割ウエハについて説明しているが、本案治具
で洗浄できるものはモニター用分割ウエハに限ら
れるものではなく、例えば半導体装置製造中に時
時発生する破損されたウエハについても、その破
損部分を切除して本案治具にて洗浄することがで
きる。従来、半導体装置洗浄中に破損したウエハ
は、前述のように従来の洗浄治具では洗浄が不可
能であることから、廃棄されるのが常であつた
が、本案治具を用いた洗浄により、破損ウエハに
ついても製造処理途中で廃棄することなく半導体
装置として完成することができるので、製造コス
トを低減することができる。
In the above explanation, the wafer to be cleaned using the jig of the present invention is a split wafer for monitoring purposes used in semiconductor device manufacturing, but the wafers that can be cleaned with the jig of the present invention are not limited to split wafers for monitoring purposes. For example, even if a wafer is damaged from time to time during the manufacture of semiconductor devices, the damaged portion can be cut out and cleaned using the jig of the present invention. In the past, wafers that were damaged during semiconductor device cleaning were usually discarded because they could not be cleaned with conventional cleaning jigs as mentioned above, but wafers that were damaged during semiconductor device cleaning were usually discarded. Since damaged wafers can be completed as semiconductor devices without being discarded during the manufacturing process, manufacturing costs can be reduced.

(考案の効果) 以上説明したように本考案によれば、外形が小
さくなつた分割ウエハを支持する切り溝を有する
支持体を洗浄治具の内側面のほぼ中央部に着脱自
在に取付けたので、既存の洗浄及び乾燥装置の製
造ラインに僅少の加工も施すことなく現状のま
ま、分割前の円いウエハのみならず分割されたモ
ニターウエハや工程処理中に破損したウエハも破
棄することなく洗浄することが可能となり、経費
を削減し、製造コストを低減することができる。
(Effects of the invention) As explained above, according to the invention, a support body having a cut groove for supporting divided wafers having a reduced external size is removably attached to approximately the center of the inner surface of the cleaning jig. , the existing cleaning and drying equipment manufacturing line can be cleaned as is without any slight modification, and not only round wafers before division, but also divided monitor wafers and wafers damaged during process processing can be cleaned without discarding them. This makes it possible to reduce expenses and manufacturing costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の洗浄治具の外観斜視図、第2図
はその−′方向の縦断正面図、第3図は本考
案の実施例の外観斜視図、第4図はその−′
方向の縦断正面図である。 5……洗浄治具本体、6……分割ウエハの支持
体、7……ピン、8……切り溝、9……分割ウエ
ハ、10……切り溝。
Fig. 1 is an external perspective view of a conventional cleaning jig, Fig. 2 is a longitudinal sectional front view in the -' direction, Fig. 3 is an external perspective view of the embodiment of the present invention, and Fig. 4 is its -'
It is a longitudinal sectional front view of the direction. 5... Cleaning jig main body, 6... Support for divided wafer, 7... Pin, 8... Cut groove, 9... Divided wafer, 10... Cut groove.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハの洗浄治具本体と、該本体の内側
面中央部に着脱自在に対向して設けた左右一対の
支持体であり該支持体の対向面に下方に傾斜し相
互に間隔を有するとともに該対向面の端面に長手
方向に複数の切り溝を設けた左右一対の支持体
と、該本体と支持体とを装着する装着部材とによ
り構成されたことを特徴とする半導体ウエハ洗浄
治具。
A cleaning jig main body for semiconductor wafers, and a pair of left and right supports removably provided opposite to each other at the center of the inner surface of the main body. 1. A semiconductor wafer cleaning jig comprising a pair of left and right supports each having a plurality of grooves in the longitudinal direction on the end faces of opposing surfaces, and a mounting member for mounting the main body and the supports.
JP3959583U 1983-03-22 1983-03-22 Semiconductor cleaning jig Granted JPS59146941U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3959583U JPS59146941U (en) 1983-03-22 1983-03-22 Semiconductor cleaning jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3959583U JPS59146941U (en) 1983-03-22 1983-03-22 Semiconductor cleaning jig

Publications (2)

Publication Number Publication Date
JPS59146941U JPS59146941U (en) 1984-10-01
JPH0438518Y2 true JPH0438518Y2 (en) 1992-09-09

Family

ID=30170233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3959583U Granted JPS59146941U (en) 1983-03-22 1983-03-22 Semiconductor cleaning jig

Country Status (1)

Country Link
JP (1) JPS59146941U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285477A (en) * 1976-01-09 1977-07-15 Senken Kk Wafer carrying container for integrated circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5285477A (en) * 1976-01-09 1977-07-15 Senken Kk Wafer carrying container for integrated circuit

Also Published As

Publication number Publication date
JPS59146941U (en) 1984-10-01

Similar Documents

Publication Publication Date Title
US8123866B2 (en) Wafer manufacturing method and device
JPH0438518Y2 (en)
US4671206A (en) Article support rack
KR101414717B1 (en) Brush Assembly for Semiconductor Package Manufacturing Machine
JPH10181880A (en) Wafer drop prevention tool
JPH0322547A (en) Substrate holder
CN211045394U (en) Wet process jig for irregular wafer
JPS6339484B2 (en)
CN209071300U (en) Bearing jig
JPH0680723B2 (en) Storage device for goods
JP2513899B2 (en) Chip tray for integrated circuits
JPS61164225A (en) Washing device for semiconductor wafer
JPS5845836Y2 (en) Cleaning case for ultra-small non-metallic materials
JP3609230B2 (en) Semiconductor device manufacturing equipment
KR0125857Y1 (en) Mask phage device of mask cleaning equipment
JPS6116695Y2 (en)
JPS6315016Y2 (en)
JPH019673Y2 (en)
JPH0314048Y2 (en)
SU1646809A1 (en) Filler granule for vibration machining
JPH05232423A (en) Liquid crystal plate cutting device
SU1558649A1 (en) Filler granule for tumbling
KR940008809A (en) JIG for ingot processing
JPH0218011Y2 (en)
JPS6273728A (en) Cleaning unit for semiconductor substrate containing box