JPH04362509A - Recording medium, its manufacture and manufacturing device - Google Patents

Abstract

PURPOSE:To prevent impurities from being included in a recording layer by providing a getter layer fetching remaining gas lower than the recording layer. CONSTITUTION:Active metal is formed by a sputtering method on a substrate 8 which is heating-processed in a getter room 21, and the getter layer 23 is formed on the substrate 8. The 23 fetches whole remaining gas which is brought into the room 21 together with a substrate holder, and remaining gas is completely prevented from being brought into a next sputter room 3. Since the layer 23 mixes the impurities consisting of remaining gas in a magnetic disk 22, a magnetic layer 17 formed on the layer 23 becomes a pure layer which does not include the impurities at all and becomes the layer in which recording density is high and a recording characteristic is considerably superior.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a recording medium in which a recording layer is formed by sputtering, and a method and apparatus for manufacturing the same.

0002

2. Description of the Related Art In general, in information recording media such as magnetic disks and magneto-optical disks, in order to meet the demand for higher recording density, the recording layer of the recording medium is formed with high precision using a sputtering method. It is like that.

3 to 5 show a conventional recording medium manufacturing apparatus, and FIG. 6 shows a magnetic recording medium, which is one type of conventional recording medium, manufactured by the conventional apparatus.

In the conventional apparatus, as shown schematically in FIG. 3, a preparation chamber 1, a heating chamber 2, a sputtering chamber 3, a protective film forming chamber 4, and a take-out chamber 5 are arranged in the front and rear directions (left and right in FIG. 3). direction). Each room 1, 2, 3, 4,
The inlet and outlet of 5 are partitioned and connected by a partition means 6 such as a partition valve. While the substrate holder 7 shown in FIGS. 4 and 5 sequentially moves through each of these chambers, a plurality of disk-shaped substrates 8, 8, . As a result, the magnetic disk 9 shown in FIG. 6 is manufactured. The substrate holder 7 is formed by a lower base portion 10 for maintaining overall stability and a substrate holding portion 11 for holding a plurality of substrates 8, 8, . . . on the lower base portion 10. A plurality of wheels 12, 12... for movement are rotatably provided on both sides of the
Further, a rack 13 is fixed to the lower surface of the base portion 10 in the front-rear direction with its teeth facing downward. Each of the rooms 1, 2, 3,
The board holder 7 is mounted on the wheels 12 inside and at the front and rear of the parts 4 and 5.
, 12 are disposed discontinuously at each partitioning means 6. A plurality of pinions 15 are disposed at appropriate positions between the rails 14 on both sides to engage the rack 13 and move the substrate holder 7.

[0005] The production of a conventional recording medium constructed as described above is carried out as follows.

The substrate holder 7 is moved on the rail 14 by the rotation of the pinion 15, and is moved to the first preparation chamber 1.
Once inside, after the entrance and exit are completely closed by the partitioning means 6 (from now on, processing in each chamber is similarly performed with the chamber fully closed), a plurality of substrates 8, 8 is held and heated at a predetermined temperature for a predetermined period of time. Next, in the heating chamber 2, it is further heated at a predetermined temperature for a predetermined period of time. Next, in the sputtering chamber 3, a Cr underlayer 16 is formed on the substrate 8 made of Ni-P or the like by sputtering, and then a magnetic layer made of Co-Cr-Ta (Ni) or the like is formed on the Cr underlayer 16. 17 is formed by epitaxial growth using a sputtering method. Next, in the protective film forming chamber 4, a protective film 18 made of carbon or the like is formed on the magnetic layer 17 by sputtering. Finally, in the extraction chamber 5,
If necessary, a lubricating film 19 made of lubricant is provided on the protective film 18.
After forming a magnetic disk 9 as a magnetic recording medium, each magnetic disk 9 is taken out from the substrate holder 11 of the substrate carrier 7.

[0007]

However, the conventional magnetic disk 9 manufactured as described above has a problem in that impurities are mixed into the magnetic layer 17 which serves as a recording layer.

This means that even if the sputtering chamber 3 is set to a predetermined degree of vacuum during sputtering, the substrate 8 is still inside the sputtering chamber 3.
H2O is carried in by adhering to the surface of the substrate holder 7 etc. into which the substrate holder 7 is carried, and O2 is carried in by opening and closing the partitioning means 6 at the boundary with the heating chamber 2 when the substrate holder 7 passes through.
etc. remain as residual gas, and when the magnetic layer 17 is formed on the Cr underlayer 16, these residual gases
This is because the particles may get mixed into the magnetic layer 17 and deteriorate the characteristics of the magnetic layer 17.

Furthermore, each chamber 1, 2, 3, as shown in FIG.
In an in-line type manufacturing apparatus in which sputtering devices 4 and 5 are connected in series, it has been impossible to completely prevent H2O, O2, etc. from being brought into the sputtering chamber 3.

The present invention has been made in view of these points, and it is an object of the present invention to provide a recording medium having a recording layer with excellent characteristics without contamination with impurities, and a recording medium with excellent characteristics by forming a recording layer without contamination with impurities. It is an object of the present invention to provide a recording medium manufacturing method and manufacturing apparatus that can manufacture a recording medium with a high temperature.

[0011]

[Means for Solving the Problems] In order to achieve the above object, the recording medium of the present invention has a recording layer formed by a sputtering method, in which a recording layer is formed below the recording layer. It is characterized by having a getter layer that captures residual gas that is about to be carried into the sputtering chamber.

[0012] Furthermore, in the method of manufacturing a recording medium of the present invention, the recording medium is manufactured by forming a recording layer on the substrate by a sputtering method while moving the substrate of the recording medium in a sputtering chamber partitioned by a partitioning means. In the method for manufacturing a recording medium, a getter layer containing residual gas that is about to be brought into the sputtering chamber is formed on the substrate of the recording medium in a getter chamber provided in front of the sputtering chamber, and then A recording layer is formed above the getter layer in the sputtering chamber.

The recording medium manufacturing apparatus of the present invention is a recording medium manufacturing apparatus having a sputtering chamber for forming a recording layer on a substrate of a recording medium by a sputtering method.
The present invention is characterized in that a getter chamber is provided in front of the sputtering chamber to form a getter layer on the substrate of the recording medium that captures residual gas that is about to be carried into the sputtering chamber.

[0014]

[Operation] The recording medium of the present invention has a getter layer below the recording layer that captures residual gas that is about to be carried into the sputtering chamber where the recording layer is formed. The resulting recording layer contains no impurities and has extremely excellent characteristics.

Furthermore, when the recording medium manufacturing apparatus of the present invention is operated according to the method of the present invention, in the getter chamber provided in front of the sputtering chamber, a getter layer containing residual gas that is about to be carried into the sputtering chamber is formed. is formed on the substrate of the recording medium, and then a recording layer is formed above the getter layer in the sputtering chamber, so that the recording layer formed by sputtering has extremely excellent properties and does not contain any impurities. It becomes a recording medium.

[0016]

Embodiments An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

FIG. 1 shows an embodiment of the manufacturing apparatus of the present invention. The same parts as the conventional one are given the same reference numerals.

In this embodiment, in front of the sputtering chamber 3 of the conventional apparatus, a getter layer containing residual gas that is about to be brought into the sputtering chamber 3 together with the substrate holder 7, etc. is deposited on the recording medium by a sputtering method. A getter chamber 21 is provided for the substrate 8, and the other configurations are the same as the conventional one.

Next, a process of manufacturing a magnetic disk 22, which is an example of the recording medium of the present invention, shown in FIG. 2 by operating the apparatus of this embodiment shown in FIG. 1 according to the method of the present invention will be described.

In FIG. 2, the same parts as in the conventional example are given the same reference numerals.

First, the substrate holder 7 is run on the rail 14 by the rotation of the pinion 15, and when it enters the first preparation chamber 1, the entrance and exit are completely closed by the partitioning means 6, and then the substrate holder 7 A plurality of substrates 8, 8, . . . are held in the substrate holder 11 and heated at a predetermined temperature for a predetermined period of time.

Next, in the heating chamber 2, it is further heated at a predetermined temperature for a predetermined period of time.

Next, in the getter chamber 21, an active metal such as Ti or Cr is formed on the substrate 8 made of Ni-P or the like by sputtering, and a getter layer 23 is formed on the substrate 8.
is formed. This getter layer 23 takes in all the residual gas such as H2O and O2 brought into the getter chamber 21 together with the substrate holder 7, etc., and prevents the residual gas from being brought into the next sputtering chamber 3. completely prevent it.

Next, the substrate 8 on which the getter layer 23 has been formed is transported to the sputtering chamber 3 by the substrate holder 7 . At this time, since there is no residual gas in the getter chamber 21, no residual gas is brought into the sputtering chamber 3. Then, in this sputtering chamber 3, a Cr underlayer 16 is formed by sputtering on the getter layer 23 formed on the substrate 8 made of Ni--P, etc.
A magnetic layer 17 made of Co--Cr--Ta (Ni) or the like is formed on the underlayer 16 by epitaxial growth using a sputtering method.

Next, in the protective film forming chamber 4, the magnetic layer 1 is
A protective film 18 made of C or the like is formed on the film 7 by sputtering.

Finally, in the unloading chamber 5, a lubricant film 19 made of lubricant is formed on the protective film 18 if necessary to form the magnetic disks 22, and then each magnetic disk is removed from the substrate holder 11 of the substrate carrier 7. Take out 22.

In the magnetic disk 22 of this embodiment manufactured in this way, the getter layer 23 is made of H2 gas, which is a residual gas.
Since all impurities such as O and O2 are mixed in, the magnetic layer 17, which is the recording layer formed on top of it, is pure and does not contain any impurities, and has extremely high recording characteristics such as high recording density. It will be excellent.

Although the above embodiment relates to a magnetic recording medium consisting of the magnetic disk 22, it can be similarly applied to other recording media such as magneto-optical recording media.

[0029] Furthermore, even in the manufacture of items other than recording media, by forming a getter layer, it is possible to form substances to be formed subsequently with extremely high purity.

It should be noted that the present invention is not limited to the embodiments described above, and can be modified as necessary.

[0031]

Effects of the Invention Since the present invention is structured and operates as described above, it is possible to obtain a recording medium having a recording layer with excellent characteristics without contamination of impurities, and to form a recording layer without contamination with impurities. Effects such as being able to obtain a recording medium manufacturing method and manufacturing apparatus that can manufacture a recording medium with excellent characteristics by forming the recording medium are produced.

[Brief explanation of the drawing]

FIG. 1 is a schematic cross-sectional plan view showing one embodiment of the recording medium manufacturing apparatus of the present invention.

FIG. 2 is a side view showing essential parts of one embodiment of the recording medium of the present invention.

FIG. 3 is a schematic cross-sectional plan view showing an example of a conventional recording medium manufacturing apparatus.

[Figure 4] Side view showing a conventional substrate holder

[Figure 5] Right side view of Figure 4

[Fig. 6] Side view 3 showing the main parts of an example of a conventional recording medium.
Sputtering chamber 4 Protective film deposition quality 7 Substrate holder 8 Substrate 16 Cr underlayer 17 Magnetic layer 18 Protective film 21 Getter chamber 22 Magnetic disk 23 Getter layer

Claims (3)

[Claims] 1. A recording medium having a recording layer formed by a sputtering method, comprising a getter layer below the recording layer that captures residual gas that is about to be carried into a sputtering chamber where the recording layer is formed. A recording medium characterized by. 2. A method for manufacturing a recording medium, comprising: manufacturing a recording medium by forming a recording layer on the substrate by a sputtering method while moving the substrate of the recording medium within a sputtering chamber partitioned by a partitioning means, wherein the sputtering chamber In a getter chamber provided before the sputtering chamber, a getter layer that captures residual gas that is about to be brought into the sputtering chamber is formed on the substrate of the recording medium, and then the recording layer is formed on the getter layer in the sputtering chamber. A method for manufacturing a recording medium, characterized in that the recording medium is formed in an upper layer. 3. In a recording medium manufacturing apparatus having a sputtering chamber for forming a recording layer on a substrate of a recording medium by a sputtering method, a getter containing residual gas that is about to be brought into the sputtering chamber is provided before the sputtering chamber. An apparatus for manufacturing a recording medium, comprising a getter chamber for forming a layer on a substrate of the recording medium.