JPH04357699A - Synchrotron radiation beam generating device - Google Patents

Abstract

PURPOSE:To provide a synchrotron device in which stability of electron beams is secured and uniform radiation of SOR beams can be obtained over a wide range. CONSTITUTION:Beam track deflection means 37-46 are provided along an orbit 5 and by means of those deviation between an electron beam track and the orbit is controlled to be within a specified range so that both may be in coincidence with each other in one specified region (high frequency acceleration cavity 18), and the beam track is made to pass through without practical deflection in relation to the orbit. In other specified regions (deflecting magnets 1-4), the electron beam track is deflected in the orthogonal direction so as to be in parallel to a track surface formed by the orbit to emit SOR beams to stepper parts 19-26. With this construction, uniform radiation of SOR beams can be provided over a wide range and with high reliability without increase of emittance nor instability of electron beams.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a synchrotron radiation generating apparatus used, for example, in X-ray lithography.

0002

2. Description of the Related Art As is well known, with the demand for higher integration density in semiconductor devices, ultra-LSI (Large S
X-ray lithography technology is being considered as one of the methods for realizing microfabrication in the manufacture of integrated circuits. In recent years, synchrotron radiation (hereinafter abbreviated as SOR light) has attracted attention as an extremely powerful X-ray source for X-ray lithography.
There is a synchrotron radiation light generating device as a device that generates this SOR light.

A conventional example of a synchrotron radiation light generating apparatus used in X-ray lithography will be described below with reference to FIG. Figure 8 is a schematic configuration diagram, and in the figure, 1 to 4
Denotes deflection magnets disposed on the orbit 5, and the deflection magnets 1 to 4 cause electrons incident along the orbit 5 from an electron beam injector (not shown) to orbit along the orbit 5. 6 to 17 are quadrupole magnets provided on the orbit 5 for converging the orbiting electrons; 18 are high frequency acceleration cavities provided on the orbit 5 for accelerating the orbiting electrons;
19 to 26 are stepper units for performing X-ray lithography; 27
-34 are beam lines that guide the SOR light emitted by the deflection magnets 1-4 to the stepper sections 19-26. Also, 35
36 is a deflection part beam duct arranged so that an orbit 5 of electrons is formed in the deflection magnets 1 to 4; and 36 is a beam duct arranged so that an orbit 5 of electrons is formed between each deflection magnet 1 to 4. This is a straight section beam duct. Note that the center orbit of the electrons incident from the electron beam injector and circulating coincides with the orbit 5, and the orbital surface of the orbit 5 is formed on a horizontal plane.

[0004] With such a structure, when the electrons incident and circulating along the orbit 5 pass through the deflection magnets 1 to 4 and change direction, the SOR light is directed in the tangential direction of the orbit of the electrons. discharge. The emitted SOR light has extremely sharp directivity in the emission direction, and therefore the beamline 27
The SOR led to the stepper sections 19 to 26 through 34
The light irradiates a limited narrow band-shaped range in the horizontal direction on the substrates disposed in the stepper sections 19 to 26. However, in order to apply it to the manufacture of semiconductor devices, it is necessary to be able to irradiate a wider range with stable SOR light so that it can cover the entire surface of semiconductor wafers, which are becoming larger in diameter.

Therefore, in order to expand the irradiation range of the SOR light, a movable mirror for the SOR light is placed in the middle of the beam lines 27 to 34, and this mirror is mechanically moved to align the traveling direction of the SOR light with the plane of the orbit 5. It has been proposed to widen the irradiation range by changing the direction perpendicular to . However, in the proposed method, there is a large loss of 30 to 40% of the SOR light in the mirror, the drive system for the mirror is expensive and unreliable, and the irradiation angle of the SOR light on the substrate is Since the light intensity changes, there are problems such as poor uniformity of light intensity distribution on the substrate.

[0006] Furthermore, in Japanese Patent Laid-Open No. 60-70700 and Japanese Patent Laid-Open No. 62-43100, a deflector is installed on the orbit in which the electrons circulate to deflect the orbit and move the orbit of the electron beam itself. However, for example, in a high-frequency acceleration cavity placed in orbit, the electron trajectory deviates significantly from the center orbit of the high-frequency acceleration cavity, resulting in an increase in emittance and There is a risk of instability. Furthermore, JP-A-62-1417
Publication No. 21 proposes expanding the irradiation range by moving the deflecting magnet or the entire device in a direction perpendicular to the orbital plane of the electrons, but it is difficult to precisely control the extremely heavy deflecting magnet or the entire device. There is a problem in that vertical movement requires a large-scale drive mechanism.

[0007]

[Problems to be Solved by the Invention] The present invention has been made in view of the situation where when expanding the irradiation range of SOR light as described above, the light intensity distribution is not uniform and reliability is low. The object of the present invention is to provide a synchrotron radiation generating device that can provide a stable electron beam and uniformly irradiate SOR light over a wide range with high reliability.

[0008]

[Means for Solving the Problems] The synchrotron radiation light generating device of the present invention includes a deflecting magnet arranged on an orbit so as to cause electrons to revolve along the orbit, and a deflecting magnet that converges the orbiting electrons. In a synchrotron synchrotron radiation generator equipped with a quadrupole magnet placed in an orbit between deflecting magnets and a high-frequency acceleration cavity placed in an orbit to accelerate the orbiting electrons, In one predetermined region along the orbit, the deviation between the electron beam orbit and the orbit is set to be within a predetermined range so that the electron beam orbit substantially matches the orbit, and in another predetermined region, the electron beam orbit is aligned with the orbital plane formed by the orbit. It is characterized by being provided with a beam trajectory deflecting means that deflects the beam in a vertical direction so as to be substantially parallel to each other, and is arranged on an orbit so as to cause electrons to orbit along the orbit. A deflecting magnet and a magnet 4 arranged on an orbit between the deflecting magnet so as to converge the orbiting electrons.
In the synchrotron radiation generation device equipped with a polar magnet, movable means is provided for reciprocating the quadrupole magnet in a direction perpendicular to the orbital surface of the electron orbit in response to the orbit of the electron deflected by the deflection magnet. It is characterized by being

[0009]

[Operation] The synchrotron synchrotron radiation generator configured as described above makes the deviation between the electron beam orbit and the orbit within a predetermined range in one predetermined region along the orbit, and substantially matches the orbit in other regions. Since a beam orbit deflecting means is provided that deflects the beam in a vertical direction so that the beam orbit of the electron is approximately parallel to the orbital plane formed by the orbit in a prescribed area, the electron beam is deflected in a prescribed area near the orbit in one prescribed area. pass through the range,
The beam trajectory does not substantially move relative to the orbit, and in other predetermined areas the beam trajectory is deflected in the vertical direction so as to be approximately parallel to the orbital plane formed by the orbit, which increases emittance and The electron beam does not become unstable, and uniform irradiation of SOR light can be achieved over a wide range with high reliability. In addition, since a movable means is provided for reciprocating the quadrupole magnet in a direction perpendicular to the orbital surface of the orbit of the electrons, the electron beam trajectory moves in the perpendicular direction with the reciprocation of the quadrupole magnet, and the SOR light is Uniform irradiation can be stably obtained over a wide range with high reliability.

0010

Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that parts that are the same as those in the prior art are denoted by the same reference numerals and explanations are omitted, and the configuration of the present invention that is different from the prior art will be explained.

First, a first embodiment will be explained with reference to FIGS. 1 and 2. FIG. 1 is a schematic configuration diagram, and FIG. 2 is a graph showing vertical coordinates of electron orbits. In the figure, 37~
Reference numeral 46 denotes an electron beam trajectory deflector that forms a beam trajectory deflection means arranged along the orbit 5, and these deflect the orbit of the electron beam at a predetermined deflection angle in a direction perpendicular to the orbital plane of the orbit 5. The electron beam orbit is formed so that the orbit of the electron beam is on the same plane as the orbit 5 when the electron beam orbit deflectors 37 to 46 are not operated. Each electron beam trajectory deflector 37 to 46 serves as a stepper section 19 to 2 for the SOR light emitted from the deflection magnets 1 to 4.
This is to ensure that the irradiation position at 6 is a predetermined value, and the deflection angle is set in advance to obtain an appropriate deflection angle, or is set in the corresponding deflection magnets 1 to 4. Beamline 2
The SOR light emitted through the channels 7 to 34 is measured and controlled based on the measurement results.

The electron beam trajectory deflectors 37 to 44 are provided on the orbit 5 between the deflection magnets 1 to 4 and the quadrupole magnets 6 to 13 arranged adjacent to the deflection magnets 1 to 4, respectively. , deflects the electron beam entering and exiting the deflection magnets 1 to 4. That is, the electron beam trajectory deflectors 37 to 40 are arranged on the inlet side of the deflection magnets 1 to 4 in the electron orbit direction, so that the trajectory of the electron beam in the deflection magnets 1 to 4 is approximately parallel to the orbital plane of the orbit 5. As shown, the electron beam trajectory deflector 37~
The trajectory of the electron beam emitted from the electron beam 40 is deflected so as to be substantially parallel to the orbital plane of the orbit 5. The electron beam trajectory deflectors 41 to 44 are arranged on the exit side of the electron orbiting direction of the deflecting magnets 1 to 4, and are arranged to deflect the electron beam trajectory which is approximately parallel to the orbital plane of the orbiting orbit 5 in the deflecting magnets 1 to 4. It is deflected in the vertical direction so as to intersect the orbit 5 in the circumferential direction.

Further, the electron beam trajectory deflectors 45 and 46 are arranged on the orbit 5 between the deflection magnet 4 and the deflection magnet 1 in which the high frequency acceleration cavity 18 is arranged, and the electron beam trajectory deflector 45 is It is provided on the orbit 5 between the polar magnet 9 and the high frequency acceleration cavity 18 so that the trajectory of the electron beam in the high frequency acceleration cavity 18 coincides with the orbit 5 passing through the central axis of the high frequency acceleration cavity 18. to be deflected. The electron beam trajectory deflector 46 is provided on the orbit 5 between the quadrupole magnets 17 and 13 provided adjacent to the exit side of the electron orbiting direction of the high frequency acceleration cavity 18, and The trajectory of the electron beam accelerated in the shell 18 and emitted from the quadrupole magnet 17 in accordance with the orbit 5 is deflected in the vertical direction away from the orbit 5 in the orbit direction. As a result, the orbit of the electron beam coincides with the orbit 5 in one predetermined area where it is necessary to limit the orbit to the vicinity of the orbit 5, for example, the high frequency acceleration cavity 18, and the orbit of the electron beam is approximately aligned with the orbit 5. In other predetermined areas that need to be parallel, for example, the deflecting magnets 1 to 4 for extracting the SOR light, the area is approximately parallel to the orbital surface of the orbit 5. FIG. 2 shows the deflection state of the electron beam trajectory in a part of the orbit 5, and is a graph showing the coordinates of the electron trajectory in the vertical direction between the deflection magnet 4 and the deflection magnet 1. The graph shows the position on the horizontal axis and the vertical coordinate z on the vertical axis.The horizontal axis shows the constituent elements at the corresponding positions, and the vertical axis shows the orbit 5 as 0.
The upper side is taken as positive and the lower side as negative, and 47 in the figure is the orbit of the electron. Further, in other sections of the orbit 5, the only difference is that the high frequency acceleration cavity 18 and the electron beam trajectory deflectors 45 and 46 disposed accordingly are not provided.

[0014] In this embodiment configured as described above,
Electrons are made to enter along the orbit 5 from an electron beam injector (not shown) and circulate along the orbit 5. The incident electrons are accelerated in the high-frequency acceleration cavity 18 and deflected in a direction perpendicular to the orbital plane of the orbit 5 by each of the electron beam trajectory deflectors 37 to 46 while circulating. In other words, the orbits of the electrons entering the deflection magnets 1 to 4 are the electron beam trajectory deflector 37.
~ 40, the electrons are deflected so as to be substantially parallel to the orbit 5, and the electrons entering the deflecting magnets 1 to 4 maintain their orbits at arbitrary positions in the deflecting magnets 1 to 4 to be substantially parallel to the orbit 5, The electron beams enter the electron beam trajectory deflectors 41 to 44 as they are. The electron beam orbit deflectors 41, 42, 43 move the electrons to quadrupole magnets 6, 14, 10 whose orbits are arranged in order on the orbit 5, respectively.
, 7, 15, 11, 8, 16, 12, and is deflected into the next electron beam trajectory deflector 38, 39, 40 so as to be deflected to the opposite side to the orbit 5. On the other hand, the electrons are deflected by the electron beam orbit deflector 44 so that their orbits intersect with the orbit 5, pass through the quadrupole magnet 9, and are deflected by the electron beam orbit deflector 45 so that they coincide with the orbit 5, thereby transmitting high-frequency waves. Enter acceleration cavity 18. Electrons are accelerated in the high frequency acceleration cavity 18 in a trajectory that coincides with the orbit 5. The electrons exiting the high-frequency acceleration cavity 18 pass through the quadrupole magnet 17 on a trajectory that matches the orbit 5, and are rotated by the electron beam trajectory deflector 46 in a direction opposite to the state before entering the high-frequency acceleration cavity 18. Orbit 5
The electron beam is deflected away from the electron beam and enters the electron beam trajectory deflector 37 via the quadrupole magnet 13. The electrons circulate in the orbit 5 while repeating the above steps. Then, the SOR light is guided to the stepper sections 19-26 through the beam lines 27-34 connected to each of the deflecting magnets 1-4, and the surface of the substrate etc. arranged in each stepper section 19-26 is irradiated with the SOR light.

According to the above embodiment, the deflection magnets 1 to 4
The irradiation range of the SOR light that irradiates the stepper parts 19 to 26 connected to the orbiting path 5 is sufficiently wide in the horizontal direction parallel to the orbital surface of the orbiting orbit 5, as in the conventional case, and is Since the electron orbit is approximately parallel to the orbital plane of the orbit 5, a predetermined range of light can be obtained in the vertical direction, and the light intensity within the obtained irradiation range is uniform, resulting in distortion-free irradiation. can be realized. In addition, since the orbit of the electron in the high-frequency acceleration cavity 18 matches the orbit 5, the electrons passing through this are always inside the high-frequency acceleration cavity 18 even if the orbit is changed by the deflection magnets 1 to 4. Then, the orbit passes on the central axis without changing its position. That is, the electrons are not deflected within the high-frequency acceleration cavity 18, so there is no increase in emittance due to deflection, and the electron beam does not become unstable due to excitation of higher-order modes. Furthermore, since there is no need to place a mirror in the optical path of the SOR light,
There is no large loss of SOR light, there is no expensive mirror drive system, and there is no reduction in reliability due to the intervention of mechanical parts such as a drive system. Moreover, it can sufficiently cope with the increase in the diameter of semiconductor wafers.

Next, a second embodiment of the present invention will be explained with reference to FIG. FIG. 3 is a graph showing the coordinates of the electron trajectory in the vertical direction, and corresponds to FIG. 2 of the first embodiment. In the figure, 48 is an electron orbit, and 49 and 50 are deflection magnets 4 provided with a high frequency acceleration cavity 18 along the orbit 5.
and the deflection magnet 1, which, like the other electron beam trajectory deflectors 37 to 44, control the trajectory of the electron beam in a direction perpendicular to the orbital plane of the orbit 5. It is designed so that the orbit of the electron beam is on the same plane as the orbit 5 when it is not acting.

Further, the electron beam trajectory deflector 49 is provided on the orbit 5 between the quadrupole magnet 9 and the high-frequency acceleration cavity 18, and the electron beam orbit in the high-frequency acceleration cavity 18 is minutely aligned with the orbit 5. Deflect to intersect at an angle. The intersection angle is set so that when the electron beam passes through the high-frequency acceleration cavity 18, it passes through the center of the high-frequency acceleration cavity 18 without increasing emittance or making the electron beam unstable. The deviation of the trajectory of the electron beam from the orbit 5 in the cavity 18 is minute. The electron beam trajectory deflector 50 is the high frequency acceleration cavity 18.
The electrons are provided on the orbit 5 between the quadrupole magnet 17 and the quadrupole magnet 13 provided adjacent to the exit side in the orbiting direction of the electrons, and are accelerated in the high frequency acceleration cavity 18 and pass through the quadrupole magnet 17. The orbit of the electron beam is deflected in the vertical direction so as to move away from the orbit 5 in the orbiting direction. As a result, the trajectory of the electron beam intersects the orbit 5 at a small angle in the high frequency acceleration cavity 18, which is one predetermined region along the orbit 5, and in the deflection magnets 1 to 4, which are other predetermined regions. Orbit 5
is approximately parallel to the orbital plane.

In this embodiment configured as described above, electrons are incident along the orbit 5 from an electron beam injector (not shown) and made to orbit along the orbit 5, as in the first embodiment. The incident electrons are accelerated in the high frequency acceleration cavity 18, and while circulating, each electron beam trajectory deflector 37
44, 49, and 50 in a direction perpendicular to the orbital surface of the orbiting orbit 5. In other words, the electron beam trajectory deflector 3
7 to 44 operate in the same manner as in the first embodiment. On the other hand, between the deflection magnet 4 and the deflection magnet 1, an electron beam orbit deflector 4
4, the electrons are deflected so that their orbit intersects the orbit 5, pass through a quadrupole magnet 9, and then pass through an electron beam orbit deflector 49.
The electron trajectory is deflected at a small crossing angle with respect to the circular orbit 5 so that the electron trajectory passes within a predetermined range near the center of the high-frequency acceleration cavity 18 . In the high frequency acceleration cavity 18, the electrons are accelerated in a trajectory having a small crossing angle with respect to the orbit 5. The number of electrons leaving the high frequency acceleration cavity 18 is 4
The electron beam passes through the polar magnet 17 and is deflected by the electron beam trajectory deflector 50 so as to be away from the orbit 5 in the opposite direction to the state before entering the high frequency acceleration cavity 18, and then passes through the quadrupole magnet 13 to deflect the electron beam trajectory. Enter vessel 37. The electrons circulate in the orbit 5 while repeating the above steps. And each deflection magnet 1 to 4
The SOR light is guided to the stepper sections 19 to 26 connected to the
SO
Irradiate R light.

Even in this embodiment, although the electron orbit in the high frequency acceleration cavity 18 does not coincide with the orbit 5, the electrons passing through the high frequency acceleration cavity 18 are always in the high frequency acceleration cavity 18. passes through substantially the center of the trajectory without significantly moving the position of the trajectory, and therefore the same operation and effect as in the first embodiment can be obtained.

Next, a third embodiment of the present invention will be explained with reference to FIG. FIG. 4 is a schematic configuration diagram, and corresponds to FIG. 1 of the first embodiment. In the figure, 51 to 54 are deflection magnets disposed on the orbit 5, and these are formed so that there is no magnetic field gradient. The deflection magnets 51 to 54 cause electrons incident from an unillustrated electron beam injector to revolve along the orbit 5. Also 55
-62 are electron beam trajectory deflectors disposed along the orbit 5, which are controlled in the same manner as in the first embodiment, and which direct the electron beam trajectory in a direction perpendicular to the orbital plane of the orbit 5. The SOR light is deflected by a predetermined amount, and the irradiation position of the SOR light emitted from the deflection magnets 55 to 62 to the stepper sections 19 to 26 is set to a predetermined value. It should be noted that the electron beam trajectory is formed so as to be on the same plane as the orbit 5 when the electron beam trajectory deflectors 45, 46, 55-62 are not activated.

The electron beam trajectory deflectors 55 to 62 are provided on the orbit 5 between the deflection magnets 51 to 54 and the quadrupole magnets 6 to 13 arranged adjacent to the deflection magnets 51 to 54, respectively. , deflects the electron beam entering and exiting the deflection magnets 51 to 54. That is, the electron beam trajectory deflector 5
5 to 58 are arranged on the entrance side of the electron orbiting direction of the deflecting magnets 51 to 54, and deflect the electron beam orbit so that the orbit of the electron beam in the deflecting magnets 51 to 54 becomes parallel to the orbital surface of the orbiting orbit 5. The orbits of the electron beams emitted from the devices 55 to 58 are deflected so as to be parallel to the orbital plane of the orbit 5. The electron beam trajectory deflectors 59-62 are deflection magnets 51-54.
The deflection magnets 51 to 5 are arranged on the exit side in the direction of electron circulation.
4, the orbit of the electron beam, which was parallel to the orbital plane of the orbit 5, is deflected in the perpendicular direction so as to intersect the orbit 5 in the orbit direction. As a result, the trajectory of the electron beam coincides with the orbit 5 in the high frequency acceleration cavity 18, which is one predetermined area along the orbit 5, and in the deflection magnet, which is another predetermined area, as in the first embodiment. 51 to 54 are parallel to the orbital surface of the circulating orbit 5.

[0022] In this embodiment configured as described above,
Electrons are made to enter along the orbit 5 from an electron beam injector (not shown) and circulate along the orbit 5. The incident electrons are accelerated in the high-frequency acceleration cavity 18 and deflected in a direction perpendicular to the orbital plane of the orbit 5 by each electron beam trajectory deflector 45, 46, 55-62 while circulating. That is, the electrons entering the deflection magnets 51 to 54 are deflected so that their orbits are parallel to the orbit 5 by the electron beam trajectory deflectors 55 to 58, and the electrons entering the deflection magnets 51 to 54 with no magnetic field gradient are deflected by the deflection magnets 51 to 58. The orbit at any position among the electron beams 54 to 54 is maintained parallel to the orbit 5, and the electron beams enter the electron beam trajectory deflectors 59 to 62 as they are. electron beam trajectory deflector 59,
At 60 and 61, the electrons move through quadrupole magnets 6, 14, 10, 7, 15, and 11 whose orbits are arranged in order on the orbit 5, respectively.
, 8, 16, 12, and the next electron beam trajectory deflector 5
6, 57, and 58, it is deflected so as to be deflected to the opposite side to the orbit 5. On the other hand, the electron beam trajectory deflector 6
At step 2, the electrons are deflected so that their orbits intersect with the orbit 5, pass through the quadrupole magnet 9, and are deflected by the electron beam orbit deflector 45 so as to coincide with the orbit 5, and then enter the high frequency acceleration cavity 18.
to go into. After the electrons accelerated in the high-frequency acceleration cavity 18 exit the high-frequency acceleration cavity 18, they pass through the quadrupole magnet 17 on a trajectory that matches the orbit 5, and are changed by the electron beam trajectory deflector 46 to change the orbit into the high-frequency acceleration space. The electron beam is deflected away from the orbit 5 in the opposite direction to the state before entering the shell 18, and enters the electron beam orbit deflector 55 via the quadrupole magnet 13. The electrons circulate in the orbit 5 while repeating the above steps. And each deflection magnet 5
The SOR light guided to the stepper sections 19 to 26 through the beam lines 27 to 34 connected to the beam lines 1 to 54 is irradiated onto the surface of a substrate or the like disposed in each stepper section 19 to 26.

According to the present embodiment described above, the same functions and effects as those of the first embodiment can be obtained, and the deflection magnets 51 to 5
Since the orbit of the electron in stepper part 4 is parallel to the orbital plane of orbit 5, the light intensity within the irradiation range of stepper parts 19 to 26 becomes more uniform, and improved irradiation without distortion can be realized. .

Next, a fourth embodiment of the present invention will be explained with reference to FIG. FIG. 5 is a front view showing only the main parts. In the figure, the deflection magnets 63 and 64 are formed so that there is no magnetic field gradient, and the deflection magnets 63 and 64 are formed with approximately half-cylindrical yokes 65 and 66, and the coil 6.
It has grooves 69, 70 formed along the cylindrical outer surfaces of the yokes 65, 66.
Deflector beam ducts 71 and 72, which are arc-shaped curved tubes, are disposed on and fixed on frames 73 and 74, respectively. Also, between the two deflection magnets 63 and 64 are annular quadrupole magnets 75 and 76.
The mounting base 78 of the movable pedestal 77 is arranged so that the center axes of the movable bases 77 coincide with each other, and an equilibrium trajectory of electrons is formed around the center axes.
It is placed on top. The movable frame 77 is constructed by installing a drive mechanism 79 on a base 80 that linearly reciprocates a mounting base 78 in the vertical direction by hydraulic drive, and aligns the attached quadrupole magnets 75 and 76 with balanced trajectories. Move it up and down. Furthermore, annular quadrupole magnets 75 and 7 are connected via vacuum bellows 81 and 82 between one end of each of the deflection unit beam ducts 71 and 72 provided in the two deflection magnets 63 and 64, respectively.
A straight section beam duct 83 in the form of a straight tube is disposed so as to pass through the vicinity of the balanced orbit section 6. On the other hand, also between the other ends of the deflection section beam ducts 71 and 72,
Similarly, a straight beam duct (not shown) is disposed so as to pass through the vicinity of the balanced orbit of annular quadrupole magnets (not shown) provided in pairs with the quadrupole magnets 75 and 76. is provided to be raised and lowered by a movable stand (not shown), and deflection section beam ducts 71, 7
2 and the straight beam duct 83 communicate with a straight beam duct (not shown), and an orbit 5 of electrons is formed inside these communicating ducts.

In this embodiment configured as described above,
Electrons are made to enter along the orbit 5 from an electron beam injector (not shown) and circulate along the orbit 5. Note 4
When the equilibrium orbits of the pole magnets 75 and 76 are at a position that coincides with the orbit 5, the electron beam orbit coincides with the orbit 5. Here, while the electrons are orbiting, the quadrupole magnet 75
, 76 are reciprocated in a direction perpendicular to the orbital surface of the orbit 5 by the drive mechanism 79 of the movable frame 77 at a speed of several tens of cm/second or less, the electrons circulate and return to the quadrupole magnets 75, 76 again. When it arrives, it will move to a position that is slightly shifted from its previous orbit. Then, the electrons start betatron oscillation with the initial value at a position shifted by a small distance, but the quadrupole magnet 7
Since the vibration speed that moves the magnets 5 and 76 up and down is not high, it usually attenuates in about a few milliseconds, and the orbit of the electron beam is changed to the orbit 5 as the quadrupole magnets 75 and 76 are moved up and down by the movable frame 77. It will move up and down while remaining parallel to the orbital plane. On the other hand, in the magnetic fields of the deflection magnets 63 and 64, which have no magnetic field gradient, there is no horizontal magnetic flux, so no vertical focusing force is applied, and even if the electron beam moves in the vertical direction, the position of the electron beam It has no effect on changes in As a result, the trajectory of the electron beam in the deflecting magnets 63, 64 is swung up and down by moving the quadrupole magnets 75, 76 up and down, and SOR light is generated by the change in the trajectory of the electron beam in the deflecting magnets 63, 64. The beam is also swung up and down to irradiate a predetermined range of a substrate, etc. placed in a stepper section (not shown).

According to the above embodiment, the deflecting magnets 63,
The irradiation range of the SOR light that irradiates the stepper section connected to the deflecting magnet 63,
The orbit of the electron beam in 64 is focused on the equilibrium orbit of quadrupole magnets 75 and 76, and is swung up and down in a perpendicular direction while remaining parallel to the orbital plane of orbit 5. Therefore, it is possible to stably spread a predetermined range in the vertical direction, and the light intensity within the obtained irradiation range is uniform, making it possible to realize highly reliable irradiation without distortion. Furthermore, for example, while the total weight of a device in which the deflecting magnets 63 and 64 have a radius of 1 m exceeds 10 tons, the quadrupole magnets 75 and 7 each weigh approximately 100 kg, which is relatively lightweight.
6 is reciprocated in a direction perpendicular to the orbital surface of the orbit 5, the movable pedestal 77 can be made inexpensive, and the drive mechanism 79 can also be controlled with high precision.

Next, a fifth embodiment of the present invention will be explained with reference to FIG. FIG. 6 is a front view showing only the main parts.
7 are arranged with their central axes aligned, and at the same time, a straight beam duct 83 passing through near the center of quadrupole magnets 86 and 87 is arranged on the mounting base 85 by a support member 88. There is. Further, both ends of the linear beam duct 83 are attached to one end of each of the deflecting beam ducts 71 and 72 via flexible vacuum bellows 89 and 90. The movable pedestal 84 is constructed by installing a drive mechanism 79 on the base 91 that reciprocates the mount 85 in the vertical direction. Move them up and down without changing their positions. On the other hand, a straight line (not shown) is also provided between the other ends of the deflection section beam ducts 71, 72, passing through the quadrupole magnets (not shown) provided in a similar manner to form a pair with the quadrupole magnets 86, 87. The quadrupole magnet and the straight beam duct are similarly arranged to be moved up and down by a movable frame (not shown), and the deflection part beam ducts 71 and 72 and the straight part beam duct 8
3 communicates with a straight beam duct (not shown), and an orbit 5 of electrons is formed inside these communicating ducts.

In this embodiment configured as described above,
Similar to the fourth embodiment, the incident electrons are made to orbit along the orbit 5, and the quadrupole magnets 86, 8 are rotated while the electrons are orbiting.
7 and the straight beam duct 83 are moved several tens of centimeters in the direction perpendicular to the orbital surface of the orbiting orbit 5 by the drive mechanism 79 of the movable frame 84.
Reciprocate at a speed of m/s or less. Due to this reciprocating motion, the trajectory of the electron beam is made to move up and down parallel to the orbital surface of the orbiting orbit 5, and is also swung up and down in the magnetic fields of the deflecting magnets 63 and 64, which have no magnetic field gradient. The SOR light generated by changing the trajectory of the electron beams in the deflection magnets 63 and 64 is also swung up and down, and irradiates a predetermined range of a substrate, etc. placed in a stepper section (not shown).

According to the above embodiment, the quadrupole magnet 86,
87 and the straight beam duct 83 are swung up and down without changing their positions, the same actions and effects as in the fourth embodiment can be obtained, and the quadrupole magnet 8
The central opening diameter of the magnets 6 and 87 can be made sufficiently small to approximately match the outer diameter dimension of the straight beam duct 83 passing through it, and the magnetomotive force of the quadrupole magnets 86 and 87 can be made small. It can be made cheaper and lighter. Furthermore, for example, while the total weight of a device in which the deflection magnets 63 and 64 have a radius of 1 m exceeds 10 tons, the combined weight of the straight beam duct 83 and the quadrupole magnets 86 and 87 is approximately 200 tons. The movable pedestal 84, which is relatively lightweight and inexpensive (kg), can control the reciprocating movement of the orbit 5 in a direction perpendicular to the orbital surface with high precision.

Next, a sixth embodiment of the present invention will be explained with reference to FIG. FIG. 7 is a plan view showing only the main parts.
1 and 72, a linear portion is inserted through vacuum bellows 92 and 93, which are flexible similarly to the one end, and passes through the vicinity of the center of the annular quadrupole magnets 94 and 95. A beam duct 96 is provided. As a result, the deflection section beam ducts 71 and 72 and the straight section beam duct 83
, 96, and an electron orbit 5 is formed inside the duct. Also, all four-pole magnets 86, 87, 94, 95
is attached to a mounting base 98 of a movable frame 97, and at the same time, straight beam ducts 83 and 99 are attached to the mounting base 98 by support members (not shown). The movable pedestal 97 is constructed by providing a drive mechanism 79 on a base (not shown) for reciprocating the mount 98 in the vertical direction.
The quadrupole magnets 86, 87, 94, 95 and the straight beam ducts 83, 96 attached to the magnets are moved up and down without changing their positions.

In this embodiment configured as described above,
Similar to the fifth embodiment, the incident electrons are made to orbit along the orbit 5, and the quadrupole magnets 86, 8 are rotated while the electrons are orbiting.
7, 94, 95 and the straight beam ducts 83, 96 are reciprocated by a drive mechanism 79 of a movable frame 97 in a direction perpendicular to the orbital surface of the orbit 5 at a speed of several tens of cm/second or less. Due to this reciprocating motion, the trajectory of the electron beam is made to move up and down parallel to the orbital surface of the orbiting orbit 5, and is also swung up and down in the magnetic fields of the deflecting magnets 63 and 64, which have no magnetic field gradient. The SOR light generated by changing the trajectory of the electron beams in the deflection magnets 63 and 64 is also swung up and down, and irradiates a predetermined range of a substrate, etc. placed in a stepper section (not shown).

According to this embodiment, all the quadrupole magnets 86, 87, 94, 95 and the straight beam duct 83,
96 are swung up and down at the same time, the same actions and effects as in the fifth embodiment can be obtained, and the movable frame 9
Since there is only one magnet 7, the four-pole magnets 86, 87, 94, and 95 can be moved up and down at the same time without changing their positions. Also, compared to the weight of the entire device, the 4-pole magnets 86, 8
The weight of the parts 7, 94, 95, etc. that are moved up and down is light, and the reciprocating motion of the movable pedestal 97 can be controlled with high precision.

It should be noted that the present invention is not limited to the above-mentioned embodiments, but is limited to the range where the movement of the electron orbit does not pose a practical problem with respect to the orbit, even in the part where the electron enters the orbit. It may be implemented with appropriate modifications within the scope of the gist, such as arranging an electron beam trajectory deflector so as to

[0034]

[Effects of the Invention] As is clear from the above description, the present invention allows the deviation between the electron beam orbit and the orbit to be within a predetermined range in one predetermined region along the orbit, and to substantially match the orbit. In a predetermined area, a beam orbit deflecting means for deflecting the beam in a vertical direction so that the electron beam orbit becomes approximately parallel to the orbital plane formed by the orbiting orbit may be provided, or a quadrupole magnet may be installed perpendicular to the orbital plane formed by the electron orbit. By adopting a configuration in which a movable means for reciprocating in the direction is provided, a stable electron beam can be ensured, and effects such as uniform irradiation of SOR light can be obtained over a wide range with high reliability can be obtained. .

[Brief explanation of the drawing]

FIG. 1 is a schematic configuration diagram showing a first embodiment of the present invention.

FIG. 2 is a graph showing vertical coordinates of electron trajectories in FIG. 1;

FIG. 3 is a graph showing vertical coordinates of electron trajectories in a second embodiment of the present invention.

FIG. 4 is a schematic configuration diagram showing a third embodiment of the present invention.

FIG. 5 is a front view showing a fourth embodiment of the present invention.

FIG. 6 is a front view showing a fifth embodiment of the present invention.

FIG. 7 is a plan view showing a sixth embodiment of the present invention.

FIG. 8 is a schematic configuration diagram showing a conventional example.

[Explanation of symbols]

1 to 4... Deflection magnet (another predetermined area) 5... Orbit 6 to 14... Quadrupole magnet 18... High frequency acceleration cavity (one predetermined area) 37 to 46... Electron beam trajectory deflector (beam trajectory deflection means)

Claims (2)

[Claims] 1. A deflecting magnet disposed on an orbit so as to cause electrons to orbit along the orbit, and a deflecting magnet disposed on the orbit between the deflecting magnets so as to converge the orbiting electrons. In the synchrotron radiation generation device, the synchrotron synchrotron radiation generator includes a quadrupole magnet arranged on the orbit and a high frequency acceleration cavity that accelerates the orbiting electrons. In a predetermined region, the electron beam trajectory and the orbital orbit are made to substantially match each other by keeping the deviation within a predetermined range, and in another predetermined region, the electron beam trajectory is substantially parallel to the orbital plane formed by the orbital orbit. 1. A synchrotron synchrotron radiation generating device, characterized in that a beam trajectory deflecting means for deflecting the beam in a vertical direction is provided. 2. A deflecting magnet disposed on an orbit so as to cause electrons to orbit along the orbit, and a deflecting magnet disposed on the orbit between the deflecting magnets so as to converge the orbiting electrons. In a synchrotron radiation generation device comprising a quadrupole magnet, the quadrupole magnet is reciprocated in a direction perpendicular to the orbital plane of the orbit of the electrons in response to the orbit of the electrons deflected by the deflection magnet. What is claimed is: 1. A synchrotron radiation light generating device, characterized in that a synchrotron radiation light generating device is provided with movable means for moving the synchrotron radiation.