JPH04355944A - Wafer rotating device - Google Patents

Wafer rotating device

Info

Publication number
JPH04355944A
JPH04355944A JP3010205A JP1020591A JPH04355944A JP H04355944 A JPH04355944 A JP H04355944A JP 3010205 A JP3010205 A JP 3010205A JP 1020591 A JP1020591 A JP 1020591A JP H04355944 A JPH04355944 A JP H04355944A
Authority
JP
Japan
Prior art keywords
mounting table
support column
table support
motor
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3010205A
Other languages
Japanese (ja)
Inventor
Nobuhito Nunotani
布 谷 伸 仁
Tomio Minohoshi
簑 星 富 夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP3010205A priority Critical patent/JPH04355944A/en
Publication of JPH04355944A publication Critical patent/JPH04355944A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To detect the speed of rotation of a placing stage support pillar in a closed vessel in a state that the sealing performance of the closed vessel is held. CONSTITUTION:A placing stage 3 placed with a wafer 2 and a placing stage support pillar 4 bonded firmly to this placing stage 3 are respectively housed in a closed vessel 1. A magnetic fluid seal 6 couples a motor 7 with the pillar 4 in a noncontact state in a state that the sealing performance of the vessel 1 is held. A through hole 8 is perforated in the pillar 4 and a luminous flux from a light-emitting device 14 passes through the hole 8 via a window 14, transmits a window 12 and is made incicident to a photodetector 15. A detection output of the photodetector 15 shows the speed of rotation of the pillar 4. A control device 16 controls the speed of rotation of the motor 7 on the basis of the detection output so that the speed of rotation of the pillar 4 reaches a desired value.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は半導体ウェハを回転駆動
するウェハ回転装置に係り、特に、ウェハを載置する載
置台とこの載置台を支持する載置台支持柱とを夫々密閉
容器内に収容し、この載置台支持柱を密閉容器の外部か
ら回転駆動するウェハ回転装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer rotation device for rotationally driving a semiconductor wafer, and in particular, a mounting table on which a wafer is placed and a mounting table support column for supporting this mounting table are each accommodated in a sealed container. The present invention also relates to a wafer rotation device that rotationally drives this mounting table support column from outside the closed container.

【0002】0002

【従来の技術】図2は従来のウェハ回転装置を示したも
ので、密閉容器1内にはウェハ2を載置した載置台3と
この載置台3を一体的に支持する載置台支持柱4とが夫
々収容されている。この載置台支持柱4は密閉容器1内
の軸受5によって回転可能に支持されている。密閉容器
1はその下端部に磁性流体シール6が固着され、外部か
ら完全に遮蔽されている。密閉容器1の外部にはモータ
ー7が設置され、磁性流体シール6は密閉容器1の密閉
性を保持した状態で、モーター7と載置台支持柱4とを
非接触状態で連結する。ウェハ2の回転数は高精度に制
御する必要があるため、モーター7は図示を省略された
制御装置によって高精度に制御され所定の回転数で回転
し、磁性流体シール6を介して載置台支持柱4を駆動し
、ウェハ2を回転させる。
2. Description of the Related Art FIG. 2 shows a conventional wafer rotation apparatus, in which a closed container 1 includes a mounting table 3 on which a wafer 2 is placed, and a mounting table support column 4 that integrally supports this mounting table 3. are accommodated respectively. This mounting table support column 4 is rotatably supported by a bearing 5 within the closed container 1. A magnetic fluid seal 6 is fixed to the lower end of the closed container 1, and the closed container 1 is completely shielded from the outside. A motor 7 is installed outside the closed container 1, and the magnetic fluid seal 6 connects the motor 7 and the mounting table support column 4 in a non-contact state while maintaining the airtightness of the closed container 1. Since the rotational speed of the wafer 2 needs to be controlled with high precision, the motor 7 is controlled with high precision by a control device (not shown), rotates at a predetermined rotational speed, and supports the mounting table via the magnetic fluid seal 6. The pillar 4 is driven to rotate the wafer 2.

【0003】0003

【発明が解決しようとする課題】ところが、上述の従来
のウェハ回転装置では、載置台支持柱4とモーター7と
が磁性流体シール6によって非接触状態で連結されてい
るため、モーター7の回転数と載置台支持柱4の回転数
とが必ずしも一致しないことがある。従って、モーター
7を所定の回転数に高精度に制御したにも拘らず、ウェ
ハは所定の回転数になっていないといった問題があった
However, in the conventional wafer rotation apparatus described above, the mounting table support column 4 and the motor 7 are connected in a non-contact manner by the magnetic fluid seal 6, so that the rotation speed of the motor 7 is The rotation speed of the mounting table support column 4 may not always match. Therefore, even though the motor 7 is controlled to a predetermined rotation speed with high precision, the wafer does not rotate at the predetermined rotation speed.

【0004】特に、磁性流体シール6は経年変化によっ
て動力伝達力が低下するため、定期的な保守点検を行わ
なければならない。この保守点検は、密閉容器1を開放
して回転計などの測定器を中に入れて載置台支持柱4の
回転数を測定するので、密閉容器1にダストが侵入する
原因となるといった問題もある。更に、密閉容器1内が
真空や有毒ガス等で満されている場合には、保守点検が
一層繁雑となり多くの時間と労力を要する作業になって
しまう。
[0004] In particular, the power transmission force of the magnetic fluid seal 6 decreases over time, so regular maintenance and inspection must be performed. In this maintenance inspection, the closed container 1 is opened and a measuring device such as a tachometer is inserted to measure the rotation speed of the mounting table support column 4, so there is the problem that dust may enter the closed container 1. be. Furthermore, if the inside of the closed container 1 is vacuumed or filled with toxic gas, maintenance and inspection become even more complicated and require much time and effort.

【0005】また、例えば磁性流体シール6に突発的な
事故が発生してウェハの回転数が所定値から変化した場
合には、従来のウェハ回転装置ではウェハの実際の回転
数が分からないので、この異常に気付かず原因不明の不
良品を作ってしまうという問題もあった。そこで、本発
明の目的は密閉容器の密閉性を保持した状態で載置台支
持柱の回転速度を検出することができるウェハ回転装置
を提供することにある。
Furthermore, if, for example, a sudden accident occurs in the magnetic fluid seal 6 and the rotational speed of the wafer changes from a predetermined value, the actual rotational speed of the wafer cannot be determined using conventional wafer rotation devices. There was also the problem that people were not aware of this abnormality and ended up producing defective products for unknown reasons. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a wafer rotation device that can detect the rotational speed of a mounting table support column while maintaining the airtightness of a closed container.

【0006】[0006]

【課題を解決するための手段】この目的を達成するため
に、本発明によるウェハ回転装置は、ウェハを載置する
載置台と、この載置台を支持する載置台支持柱と、上記
載置台と上記載置台支持柱とを内部に収容する密閉容器
と、この密閉容器の外部に設置されたモータと、上記密
閉容器の密閉性を保持した状態で上記載置台支持柱と上
記モータとを連結する連結手段とを具備するウェハ回転
装置において、上記密閉容器の外壁に形成された光透過
部と、上記光透過部に位置的に対応する上記密閉容器の
外部に設置され上記光透過部を介して上記載置台支持柱
の回転を検出する光電センサー手段と、上記光電センサ
ー手段の検出出力に基づき上記モーターを制御する制御
装置とを具備するものである。なお、上記構成のうち、
望ましい態様は以下の通りである。
[Means for Solving the Problems] In order to achieve this object, a wafer rotation apparatus according to the present invention includes a mounting table on which a wafer is placed, a mounting table support column that supports this mounting table, and a mounting table that supports the mounting table. An airtight container that houses the mounting table support column therein, a motor installed outside the airtight container, and a connection between the placement table support column and the motor while maintaining the airtightness of the airtight container. A wafer rotation apparatus comprising: a light transmitting part formed on an outer wall of the sealed container; and a light transmitting part installed outside the sealed container in a position corresponding to the light transmitting part and connecting the light transmitting part through the light transmitting part. The apparatus includes a photoelectric sensor means for detecting the rotation of the mounting table support column, and a control device for controlling the motor based on the detection output of the photoelectric sensor means. In addition, among the above configurations,
Desirable embodiments are as follows.

【0007】上記光透過部は、上記載置台支持柱を貫い
て延在する直線が交差する上記密閉容器の外壁に一対形
成され、上記載置台支持柱には上記直線が貫通する位置
に貫通孔が穿孔され、上記光電センサ手段は上記直線に
沿って進行するように光束を発光する発光器と上記載置
台支持柱の上記貫通孔を通過した上記光束を受光する受
光器とを含む。
A pair of the light transmitting parts are formed on the outer wall of the sealed container where a straight line extending through the mounting table support column intersects, and a through hole is formed in the mounting table support column at a position where the straight line passes through. is perforated, and the photoelectric sensor means includes a light emitter that emits a light beam traveling along the straight line and a light receiver that receives the light beam that has passed through the through hole of the mounting table support column.

【0008】[0008]

【作用】モーターは密閉容器内の載置台支持柱を連結手
段を介して回転駆動し、載置台上のウェハを回転させる
。光電センサ手段は密閉容器外壁の光透過部を介して載
置台支持柱の回転を検出する。制御装置は、載置台支持
柱の回転数が所望の値になるように、光電センサ手段の
検出出力に基づきモーターの回転数、即ち回転速度を制
御する。こうして密閉容器内の載置台支持柱の回転数が
密閉容器外の光電センサ手段の検出出力に基づきモータ
ーによって制御される。
[Operation] The motor rotates the mounting table support column in the closed container via the connecting means, thereby rotating the wafer on the mounting table. The photoelectric sensor means detects the rotation of the mounting table support column through the light transmitting part of the outer wall of the closed container. The control device controls the rotational speed of the motor based on the detection output of the photoelectric sensor means so that the rotational speed of the mounting table support column reaches a desired value. In this way, the rotation speed of the mounting table support column inside the hermetic container is controlled by the motor based on the detection output of the photoelectric sensor means outside the hermetic container.

【0009】[0009]

【実施例】次に本発明によるウェハ回転装置の一実施例
を図2と同部分には同一符号を付して示した図1を参照
して説明する。図1において、密閉容器1内には、ウェ
ハ2を載置した載置台3とこの載置台3を一体的に支持
する円柱形または円筒形の載置台支持柱4とが夫々収容
されている。この載置台支持柱4は密閉容器1内の軸受
5によって回転可能に支持されている。密閉容器1はそ
の下端部に磁性流体シール6が固着され、外部から完全
に遮蔽されている。密閉容器1の外部にはモーター7が
設置され、磁性流体シール6は密閉容器1の密閉性を保
持した状態で、モーター7と載置台支持柱4とを非接触
状態で連結する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of a wafer rotating apparatus according to the present invention will be described with reference to FIG. 1, in which the same parts as in FIG. 2 are denoted by the same reference numerals. In FIG. 1, a closed container 1 houses a mounting table 3 on which a wafer 2 is placed and a cylindrical or cylindrical mounting table support column 4 that integrally supports the mounting table 3. This mounting table support column 4 is rotatably supported by a bearing 5 within the closed container 1. A magnetic fluid seal 6 is fixed to the lower end of the closed container 1, and the closed container 1 is completely shielded from the outside. A motor 7 is installed outside the closed container 1, and the magnetic fluid seal 6 connects the motor 7 and the mounting table support column 4 in a non-contact state while maintaining the airtightness of the closed container 1.

【0010】載置台支持柱4には貫通孔8が穿孔され、
この貫通孔8は載置台支持柱4の回転中心軸に垂直にか
つその回転中心軸から所定量ずれて穿設されている。密
閉容器1の外壁にも互いに対向した貫通穴9、10が穿
設され、これらの貫通穴9、10の位置は貫通孔8と同
一平面内となるように定められている。各貫通穴9、1
0には光透過性材料からなる窓11、12が0リング1
3を介して取付けられ、これらの0リング13は光透過
性窓11、12と密閉容器1との間をシールし、密閉容
器1の密閉性を保持している。
A through hole 8 is bored in the mounting table support column 4.
This through hole 8 is bored perpendicularly to the rotation center axis of the mounting table support column 4 and deviated from the rotation center axis by a predetermined amount. Through holes 9 and 10 are also formed in the outer wall of the closed container 1 and are opposed to each other, and the positions of these through holes 9 and 10 are determined to be in the same plane as the through hole 8. Each through hole 9, 1
0 has windows 11 and 12 made of a light-transmitting material in the 0 ring 1.
These O-rings 13 seal between the light-transmitting windows 11 and 12 and the closed container 1, and maintain the airtightness of the closed container 1.

【0011】光透過性窓11、12には夫々に対向して
発光器14と受光器15が配置されている。発光器14
は光透過性窓11と貫通穴9とを介して載置台支持柱4
に光束を放射し、受光器15は載置台支持柱4の貫通孔
8を通過した上記光束を受光する。受光器15は検出出
力を制御装置16に送り、この制御装置16はこの検出
出力に基づきモーター7の回転速度を制御する。
A light emitter 14 and a light receiver 15 are disposed in the light transmitting windows 11 and 12, facing each other. Light emitter 14
is the mounting table support column 4 via the light-transmitting window 11 and the through hole 9.
The light receiver 15 receives the light beam that has passed through the through hole 8 of the mounting table support column 4. The light receiver 15 sends a detection output to a control device 16, and the control device 16 controls the rotational speed of the motor 7 based on this detection output.

【0012】次にこの実施例の作用を説明する。モータ
ー7は磁性流体シール6を介して載置台支持柱4を回転
駆動し、これによって載置台支持柱4に固定された載置
台3が回転され、ウェハ2も回転される。発光器14か
らの光束は、光透過性窓11と貫通穴9とを介して載置
台支持柱4に入射し、回転中の載置台支持柱4の貫通孔
8が貫通穴9と10とに位置的に一致した時にその載置
台支持柱4の貫通孔8を通過して、貫通穴10と光透過
性窓12とを介して受光器15に入射する。この受光器
15は発光器14からの光束が入射するとオン信号を発
生する。従って、受光器14は載置台支持柱4の一回転
毎に一つのオン信号を発生するので、このオン信号の周
波数、または周期は載置台支持柱4、即ちウェハ2の回
転速度を表している。
Next, the operation of this embodiment will be explained. The motor 7 rotates the mounting table support column 4 via the magnetic fluid seal 6, thereby rotating the mounting table 3 fixed to the mounting table support column 4 and rotating the wafer 2 as well. The light beam from the light emitter 14 enters the mounting table support column 4 through the light-transmitting window 11 and the through hole 9, and the through hole 8 of the rotating mounting table support column 4 enters the through holes 9 and 10. When the positions match, the light passes through the through hole 8 of the mounting table support column 4 and enters the light receiver 15 via the through hole 10 and the light-transmitting window 12. The light receiver 15 generates an ON signal when the light beam from the light emitter 14 is incident thereon. Therefore, since the light receiver 14 generates one ON signal for each rotation of the mounting table support column 4, the frequency or period of this ON signal represents the rotation speed of the mounting table support column 4, that is, the wafer 2. .

【0013】制御装置16は受光器14の検出出力、即
ちオン信号を受け、載置台支持柱4の回転速度が所望値
に一致するように上記オン信号の周波数に基づきモータ
ー7の回転速度を制御する。こうして、たとえ磁性流体
シール6に起因した回転速度差がモーター7と載置台支
持柱4との間に存在しても、モーター7は常時ウェハ2
の回転速度を所望値に制御することができる。上記実施
例ではモーター7はその出力軸が直接に磁性流体シール
6に接続していた。しかしながら、モーター7の出力を
ベルトなどを介して磁性流体シール6に接続することも
できる。
The control device 16 receives the detection output of the light receiver 14, that is, the ON signal, and controls the rotation speed of the motor 7 based on the frequency of the ON signal so that the rotation speed of the mounting table support column 4 matches a desired value. do. In this way, even if a rotational speed difference due to the magnetic fluid seal 6 exists between the motor 7 and the mounting table support column 4, the motor 7 is always connected to the wafer 2.
The rotation speed of can be controlled to a desired value. In the above embodiment, the output shaft of the motor 7 was directly connected to the magnetic fluid seal 6. However, it is also possible to connect the output of the motor 7 to the magnetic fluid seal 6 via a belt or the like.

【0014】なお、磁性流体シール6の機能は密閉容器
1の密閉性を保った状態でモーター7の回転を載置台支
持柱4に伝達することである。従って、本発明はこのよ
うな機能を有する手段であれば、磁性流体シール6以外
の他のシール構造を使用することもできる。例えば、密
閉容器の底面に対向するモーター7の出力軸先端と載置
台支持柱4の先端とに夫々永久磁石を取付け、これらの
永久磁石の磁力によってモーター7の回転を載置台支持
柱4に伝達することもできる。
The function of the magnetic fluid seal 6 is to transmit the rotation of the motor 7 to the mounting table support column 4 while maintaining the airtightness of the closed container 1. Therefore, in the present invention, other seal structures other than the magnetic fluid seal 6 can be used as long as they have such a function. For example, permanent magnets are attached to the tip of the output shaft of the motor 7 and the tip of the platform support column 4, which face the bottom of the airtight container, and the rotation of the motor 7 is transmitted to the platform support column 4 by the magnetic force of these permanent magnets. You can also.

【0015】また、載置台支持柱4の一回転当りの受光
器15のオン信号を倍増することもできる。例えば、貫
通孔8を載置台支持柱4の回転中心軸を通るように穿孔
すれば、オン信号の周波数は2倍となり、このような貫
通孔8を2個穿孔すれば4倍になる。載置台支持柱4の
回転速度を測定するセンサーは、上記実施例に示した透
過型の光電センサーの代りに、載置台支持柱4に貼付し
た反射部からの反射光を受光する反射型の光電センサー
を使用することもできる。更には、近接スイッチ等を使
用することもできる。
Furthermore, the ON signal of the light receiver 15 per rotation of the mounting table support column 4 can be doubled. For example, if the through hole 8 is drilled so as to pass through the rotation center axis of the mounting table support column 4, the frequency of the on signal will be doubled, and if two such through holes 8 are drilled, it will be quadrupled. The sensor that measures the rotational speed of the mounting table support column 4 is a reflective type photoelectric sensor that receives reflected light from a reflective section attached to the mounting table support column 4 instead of the transmission type photoelectric sensor shown in the above embodiment. Sensors can also be used. Furthermore, a proximity switch or the like can also be used.

【0016】[0016]

【発明の効果】以上の説明から明らかなように、本発明
は光電センサ手段によって載置台支持柱の回転速度を検
出し、この検出出力に基づきモーターの回転速度を制御
するため、ウェハ載置台の回転速度を常時高精度に制御
することができ、従ってウェハの不良品発生を大幅に低
減することができる。また、光電センサ手段は密閉容器
の外部に設置されているため、メンテナンスが非常に容
易であり、密閉容器内に活性ガスが充填されている場合
にもなんらそのガスの影響を受けることはない。
As is clear from the above description, the present invention detects the rotation speed of the wafer support column using a photoelectric sensor means and controls the rotation speed of the motor based on this detection output. The rotation speed can be controlled with high precision at all times, and therefore the occurrence of defective wafers can be significantly reduced. Furthermore, since the photoelectric sensor means is installed outside the closed container, maintenance is very easy, and even if the closed container is filled with active gas, it will not be affected by the gas.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明によるウェハ回転装置の一実施例を示し
た断面図。
FIG. 1 is a sectional view showing an embodiment of a wafer rotation device according to the present invention.

【図2】従来のウェハ回転装置を示した断面図。FIG. 2 is a sectional view showing a conventional wafer rotation device.

【符号の説明】[Explanation of symbols]

1  密閉容器 2  ウェハ 3  載置台 4  載置台支持柱 6  連結手段(磁性流体シール) 7  モーター 9  光透過部 11  光透過部 10  光透過部 12  光透過部 14  光電センサー手段 15  光電センサー手段 1 Airtight container 2 Wafer 3 Placement stand 4 Mounting table support pillar 6 Connecting means (magnetic fluid seal) 7 Motor 9 Light transmission part 11 Light transmission part 10 Light transmission part 12 Light transmission part 14 Photoelectric sensor means 15 Photoelectric sensor means

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ウェハを載置する載置台と、この載置台を
支持する載置台支持柱と、上記載置台と上記載置台支持
柱とを内部に収容する密閉容器と、この密閉容器の外部
に設置されたモータと、上記密閉容器の密閉性を保持し
た状態で上記載置台支持柱と上記モータとを連結する連
結手段とを具備するウェハ回転装置において、上記密閉
容器の外壁に形成された光透過部と、上記光透過部に位
置的に対応する上記密閉容器の外部に設置され上記光透
過部を介して上記載置台支持柱の回転を検出する光電セ
ンサー手段と、上記光電センサー手段の検出出力に基づ
き上記モーターを制御する制御装置とを具備することを
特徴とするウェハ回転装置。
Claims 1: A mounting table on which a wafer is placed, a mounting table support column that supports the mounting table, a sealed container that accommodates the mounting table and the mounting table support column inside, and an exterior of the sealed container. A wafer rotation apparatus comprising: a motor installed in the airtight container; and a connecting means for connecting the mounting table support column and the motor while maintaining the airtightness of the airtight container, the connecting means being formed on the outer wall of the airtight container. a light transmitting part; a photoelectric sensor means installed outside the closed container corresponding to the light transmitting part positionally and detecting rotation of the mounting table support column through the light transmitting part; A wafer rotation device comprising: a control device that controls the motor based on a detection output.
【請求項2】上記光透過部は上記載置台支持柱を貫いて
延在する直線が交差する上記密閉容器の外壁に一対形成
され、上記載置台支持柱には上記直線が貫通する位置に
貫通孔が穿孔され、上記光電センサ手段は上記直線に沿
って進行するように光束を発光する発光器と上記載置台
支持柱の上記貫通孔を通過した上記光束を受光する受光
器とを含むことを特徴とする請求項1に記載のウェハ回
転装置。
2. A pair of the light transmitting parts are formed on the outer wall of the sealed container where a straight line extending through the mounting table support pillar intersects, and the light transmitting part is penetrated through the mounting table support pillar at a position where the straight line penetrates. A hole is bored, and the photoelectric sensor means includes a light emitter that emits a light beam traveling along the straight line and a light receiver that receives the light beam that has passed through the through hole of the mounting table support column. The wafer rotation device according to claim 1.
JP3010205A 1991-01-30 1991-01-30 Wafer rotating device Withdrawn JPH04355944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3010205A JPH04355944A (en) 1991-01-30 1991-01-30 Wafer rotating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3010205A JPH04355944A (en) 1991-01-30 1991-01-30 Wafer rotating device

Publications (1)

Publication Number Publication Date
JPH04355944A true JPH04355944A (en) 1992-12-09

Family

ID=11743772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3010205A Withdrawn JPH04355944A (en) 1991-01-30 1991-01-30 Wafer rotating device

Country Status (1)

Country Link
JP (1) JPH04355944A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999052139A1 (en) * 1998-04-04 1999-10-14 Tokyo Electron Limited Probe device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999052139A1 (en) * 1998-04-04 1999-10-14 Tokyo Electron Limited Probe device

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