JPH04354676A - Grinding wheel for precision machining - Google Patents
Grinding wheel for precision machiningInfo
- Publication number
- JPH04354676A JPH04354676A JP3155584A JP15558491A JPH04354676A JP H04354676 A JPH04354676 A JP H04354676A JP 3155584 A JP3155584 A JP 3155584A JP 15558491 A JP15558491 A JP 15558491A JP H04354676 A JPH04354676 A JP H04354676A
- Authority
- JP
- Japan
- Prior art keywords
- abrasive grains
- grindstone
- precision machining
- resin
- stoichiometric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003754 machining Methods 0.000 title claims abstract description 13
- 238000000227 grinding Methods 0.000 title abstract description 4
- 239000006061 abrasive grain Substances 0.000 claims abstract description 42
- 150000001875 compounds Chemical class 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 12
- 229920005989 resin Polymers 0.000 claims abstract description 12
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 8
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 8
- 239000006104 solid solution Substances 0.000 claims abstract description 8
- 239000002245 particle Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 7
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 5
- -1 polyethylene Polymers 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004698 Polyethylene Substances 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 150000002736 metal compounds Chemical group 0.000 claims description 3
- 229920000573 polyethylene Polymers 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 235000013980 iron oxide Nutrition 0.000 claims 2
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 31
- 230000003746 surface roughness Effects 0.000 abstract description 6
- 239000000919 ceramic Substances 0.000 abstract description 5
- 239000013078 crystal Substances 0.000 abstract description 4
- 239000011521 glass Substances 0.000 abstract description 4
- 150000004767 nitrides Chemical class 0.000 abstract description 3
- 238000005498 polishing Methods 0.000 description 23
- 230000000694 effects Effects 0.000 description 10
- 238000000034 method Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- 101100130497 Drosophila melanogaster Mical gene Proteins 0.000 description 1
- 101100345589 Mus musculus Mical1 gene Proteins 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000012245 magnesium oxide Nutrition 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、半導体用ウェハーや基
板,磁気ヘッド基盤,レーザ用反射鏡,光学部品,精密
機械部品,精密計測器部品,電子部品等の各種産業に用
いられるセラミックス,ガラス,単結晶を代表とする硬
質材料又は軟質加工材料を鏡面加工するのに最適な精密
加工用砥石に関するものである。[Industrial Application Field] The present invention applies to ceramics and glass used in various industries such as semiconductor wafers and substrates, magnetic head substrates, laser reflectors, optical parts, precision mechanical parts, precision measuring instrument parts, and electronic parts. This invention relates to a precision machining grindstone that is ideal for mirror-finishing hard materials such as single crystals or soft processed materials.
【0002】0002
【従来の技術】従来、研削加工又は研削加工の内、ラッ
ピングやポリシクングのように鏡面加工を目的とする仕
上加工には、被加工材料よりも硬い主としてダイヤモン
ドや立方晶窒化ホウ素のような超硬質砥粒もしくはそれ
を含む砥石が用いられている。[Prior Art] Conventionally, in grinding processing or grinding processing, finishing processing for the purpose of mirror finishing such as lapping and polishing has been performed using ultra-hard materials such as diamond or cubic boron nitride, which are harder than the workpiece material. Abrasive grains or a whetstone containing them are used.
【0003】これに対し、被加工材料よりも軟質な砥粒
又はそれを含む砥石を用いて、被加工材料との機械的な
作用により誘起される化学反応、所謂メカノケミカルを
生じさせる仕上加工法が提案されている。On the other hand, there is a finishing method that uses abrasive grains that are softer than the material to be processed, or a grindstone containing them, to produce a chemical reaction induced by mechanical action with the material to be processed, so-called mechanochemical. is proposed.
【0004】このメカノケミカルによる加工法の代表的
なものとしては、Voraらの「Mechanoche
mical Polishing of Sil
iconNitride」[J.Am.Cer.Soc
,65(9)C−140(1982)]、唐木らの「S
i単結晶のメカノケミカルポリシングにおける加工速度
促進機構」[精密機械,46,3(1980)53−5
9]、落合らの「フェライト材のメカノケミカルポリシ
ング」[精密工学会誌,54,3(1988)146−
151]及び特開昭64−64766号公報がある。[0004] A typical example of this mechanochemical processing method is "Mechanoche" by Vora et al.
Mical Polishing of Sil
iconNitride” [J. Am. Cer. Soc.
, 65 (9) C-140 (1982)], Karaki et al.
``Processing speed acceleration mechanism in mechanochemical polishing of single crystals'' [Precision Machinery, 46, 3 (1980) 53-5
9], Ochiai et al., “Mechanochemical polishing of ferrite materials” [Journal of Japan Society for Precision Engineering, 54, 3 (1988) 146-
151] and Japanese Unexamined Patent Publication No. 64-64766.
【0005】[0005]
【発明が解決しようとする課題】Voraらの「Mec
hanochemical Polishing
ofSilicon Nitride」には、窒化ケ
イ素とセラミックスをCaCO3,MgO,SiO2,
Fe2O3,Fe3O4等の軟質な砥粒を用いて湿式で
メカノケミカルポリシングをしたことが記載されており
、唐木らの「Si単結晶のメカノケミカルポリシングに
おける加工速度促進機構」には、Si単結晶をアルカリ
性溶液中、ZrO2砥粒によりメカノケミカルポリシン
グしたことについて記載されている。落合らの「フェラ
イト材のメカノケミカルポリシング」には、Mn−Zn
系単結晶フェライトを蒸留水,水酸化ナトリウム,塩酸
溶液中、Al2O3砥粒によりメカノケミカルポリシン
グしたことについて記載されている。[Problem to be solved by the invention] “Mec” by Vora et al.
Hanochemical Polishing
ofSilicon Nitride” uses silicon nitride and ceramics such as CaCO3, MgO, SiO2,
It has been described that wet mechanochemical polishing was performed using soft abrasive grains such as Fe2O3 and Fe3O4, and Karaki et al. Mechanochemical polishing with ZrO2 abrasive grains in an alkaline solution is described. Ochiai et al.'s ``mechanochemical polishing of ferrite materials'' uses Mn-Zn.
It is described that single-crystal ferrite was mechanochemically polished with Al2O3 abrasive grains in distilled water, sodium hydroxide, and hydrochloric acid solutions.
【0006】また、特開昭64−64766号公報には
、被加工材料との反応性に優れた金属,酸化物,窒化物
,ケイ化物,ホウ化物,炭化物の砥粒と、ポリアセター
ル,ポリエチレン,アクリロニトリル,ポリフェニルサ
ルファイド,フェノール,エポキシの樹脂とを被加工材
料より軟質に成形した砥石材が記載されている。Furthermore, Japanese Patent Application Laid-Open No. 64-64766 discloses abrasive grains of metals, oxides, nitrides, silicides, borides, and carbides that have excellent reactivity with the workpiece material, and abrasive grains of polyacetal, polyethylene, A grindstone material made of acrylonitrile, polyphenyl sulfide, phenol, and epoxy resin molded to be softer than the material to be processed is described.
【0007】以上の内、Vora,唐木,落合らの前者
は、酸化物砥粒を用いてメカノケミカルポリシングを行
ったものであり、後者の特開昭64−64766号公報
は、酸化物、特にCr2O3,Fe2O3,CeO2の
酸化物砥粒と樹脂とからなる砥石について記載されてい
る。
これらに用いられている砥粒は、市販されているもので
、化学的に安定な化学量論的化合物からなるために、ポ
リシング効果が弱く、溶媒を介在させてポリシング効果
を高めようとしていること、被加工材料の表面を鏡面に
する場合、長時間加工する必要があること、又加工後の
鏡面状態、すなわち面粗度が満足できないという問題が
ある。Among the above, the former by Vora, Karaki, and Ochiai et al. performed mechanochemical polishing using oxide abrasive grains, and the latter, Japanese Patent Application Laid-Open No. 64-64766, uses oxides, especially A grindstone made of oxide abrasive grains of Cr2O3, Fe2O3, and CeO2 and a resin is described. The abrasive grains used in these products are commercially available and consist of chemically stable stoichiometric compounds, so the polishing effect is weak, and attempts are made to increase the polishing effect by intervening a solvent. When the surface of the material to be processed is made into a mirror surface, there is a problem in that it is necessary to process the material for a long time and that the mirror surface state after processing, that is, the surface roughness is not satisfactory.
【0008】本発明は、上述ような問題点を解決したも
ので、具体的には、化学的に準安定な非化学量論的化合
物の砥粒を樹脂で固めて、ポリシング効果の高い、被加
工材料の面粗度を高めることができた精密加工用砥石の
提供を目的とするものである。The present invention solves the above-mentioned problems. Specifically, the abrasive grains of a chemically metastable non-stoichiometric compound are solidified with a resin to form a coating with a high polishing effect. The object of the present invention is to provide a grindstone for precision machining that can improve the surface roughness of processed materials.
【0009】[0009]
【課題を解決するための手段】本発明者らは、半導体用
Siウェハーやセラミックス焼結体でなる被加工材料の
表面を鏡面加工し、加工時間の短縮及び被加工材料の面
精度の向上について検討していた所、超硬質砥粒よりも
軟質な金属酸化物を樹脂で固めた砥石を用いて、メカノ
ケミカルポリシングを行うと鏡面加工ができること、こ
のとき市販の金属酸化物に比べて、還元処理した非化学
量論的化合物からなる金属酸化物を用いると、従来のよ
うな酸性溶液又はアルカリ性溶液を媒介とする湿式によ
るメカノケミカルポリシングでなくても、乾式でもつて
メカノケミカルポリシング効果が十分に生じること、非
化学量論的化合物の砥粒が酸素欠陥に基づく触媒作用に
より被加工材料の表面を酸化促進させること、及びその
効果として、被加工材料の面精度を顕著に向上させうる
という知見を得た。[Means for Solving the Problems] The present inventors have proposed a method for reducing the processing time and improving the surface accuracy of the workpiece by mirror-finishing the surface of the workpiece material such as a semiconductor Si wafer or a ceramic sintered body. We were considering that mirror polishing could be achieved by mechanochemical polishing using a grindstone made of metal oxide hardened with resin, which is softer than ultra-hard abrasive grains. By using a treated metal oxide consisting of a non-stoichiometric compound, a sufficient mechanochemical polishing effect can be achieved even in a dry method, instead of the conventional wet mechanochemical polishing using an acidic or alkaline solution. knowledge that the abrasive grains of non-stoichiometric compounds promote oxidation of the surface of the workpiece material through a catalytic action based on oxygen defects, and that this effect can significantly improve the surface precision of the workpiece material. I got it.
【0010】本発明は、上述の知見に基づいて完成した
ものである。The present invention was completed based on the above findings.
【0011】すなわち、本発明の精密加工用砥石は、レ
ジンボンド砥石であって、該砥石に金属の酸化物,酸炭
化物,酸窒化物及びこれらの相互固溶体の中の少なくと
も1種でなる非化学量論的化合物の砥粒を少なくとも3
0体積%含有していることを特徴とするものである。That is, the precision machining grindstone of the present invention is a resin bonded grindstone, and the grindstone is coated with a non-chemical compound made of at least one of metal oxides, oxycarbides, oxynitrides, and mutual solid solutions thereof. At least 3 stoichiometric compound abrasive grains
It is characterized by containing 0% by volume.
【0012】本発明における非化学量論的化合物の砥粒
とは、周期律表の2a,3a,4a,5a,6a,7a
,8a,3b,4b,5bの酸化物,酸炭化物,酸窒化
物及びこれらの相互固溶体の中の少なくとも1種の非化
学量論的化合物の粒子でなり、実際には、金属及び/又
は半金属の元素をM、非金属の元素をAと表示すると、
(M1A1−W)、(M1A2−X)、(M2A3−Y
)、(M3A4−Z)で表わされるもので、(化学量論
的化合物は、M1A1,M1A2,M2A3,M3A4
でなる。)具体的に例示すると、酸化クロムの場合、C
rO2−X,C2O3−Y、酸化鉄の場合、FeO1−
W,Fe2O3−Y,Fe3O4−Z、酸化チタンの場
合、TiO1−W,TiO2−X,Ti2O3−Yを挙
げることができる。(ただし、M及びAは原子比を表わ
す。)非化学量論的化合物の砥粒は、希土類元素及び周
期律表の4a,6a,8aの酸化物,酸炭化物,酸窒化
物及びこれらの相互固溶体の中の少なくとも1種でなる
場合が好ましく、これらの内、チタン,クロム又は鉄の
酸化物,酸炭化物,酸窒化物及びこれらの相互固溶体の
中の少なくとも1種、具体的には、例えばCrO2−X
,TiO2−X(ただし、0.77>x>0)、Cr2
O3−Y,Fe2O3−Y(ただし、0.6>y0)で
なる場合には、被加工材料の面精度の向上が特に顕著に
なることから好ましい。[0012] In the present invention, the abrasive grains of non-stoichiometric compounds refer to particles 2a, 3a, 4a, 5a, 6a, and 7a of the periodic table.
, 8a, 3b, 4b, 5b, and particles of at least one non-stoichiometric compound among oxides, oxycarbides, oxynitrides and mutual solid solutions of these; If the metal element is represented by M and the non-metal element is represented by A, then
(M1A1-W), (M1A2-X), (M2A3-Y
), (M3A4-Z), (stoichiometric compounds are M1A1, M1A2, M2A3, M3A4
It becomes. ) To give a specific example, in the case of chromium oxide, C
rO2-X, C2O3-Y, in the case of iron oxide, FeO1-
In the case of W, Fe2O3-Y, Fe3O4-Z, and titanium oxide, TiO1-W, TiO2-X, and Ti2O3-Y can be mentioned. (However, M and A represent the atomic ratio.) Abrasive grains of non-stoichiometric compounds include rare earth elements, oxides, oxycarbides, oxynitrides of 4a, 6a, 8a of the periodic table, and their mutual It is preferable that it is made of at least one kind of solid solution, and among these, at least one kind of oxide, oxycarbide, oxynitride, and mutual solid solution of titanium, chromium, or iron, specifically, for example, CrO2-X
, TiO2-X (however, 0.77>x>0), Cr2
It is preferable to use O3-Y, Fe2O3-Y (0.6>y0) because the surface accuracy of the workpiece material is particularly improved.
【0013】さらに、好ましいのは、0.06>x>0
.03,0.6>y>0.11である。Furthermore, it is preferable that 0.06>x>0
.. 03,0.6>y>0.11.
【0014】非化学量論的化合物の砥粒は、微細である
程、活性化が高く、被加工材料の面精度の向上が顕著に
なり、平均粒径1.0μm以下で粒度分布の標準偏差が
均一な粒子からなる砥粒、特に好ましくは平均粒径0.
05μm以下の粒子である。この砥粒が30体積%未満
になると被加工材料の面精度の向上効果が顕著に低下す
る。The finer the abrasive grains of a non-stoichiometric compound, the higher the activation, the more remarkable the improvement in the surface precision of the workpiece material, and the standard deviation of the particle size distribution when the average grain size is 1.0 μm or less. Abrasive grains consisting of uniform particles, particularly preferably an average particle size of 0.
The particles are 0.05 μm or less. If the content of the abrasive grains is less than 30% by volume, the effect of improving the surface accuracy of the workpiece material will be significantly reduced.
【0015】本発明の精密加工用砥石は、特に上述の非
化学量論的化合物の砥粒が30〜80体積と、樹脂が1
5〜49体積%と、残部が金属の化合物を主成分とする
他物質とからなる場合が砥石の強度上からも好ましいこ
とである。In particular, the precision machining grindstone of the present invention has 30 to 80 volumes of abrasive grains of the above-mentioned non-stoichiometric compound and 1 volume of resin.
From the viewpoint of the strength of the grindstone, it is preferable that the amount is 5 to 49% by volume and the remainder is other substances mainly composed of metal compounds.
【0016】本発明における樹脂は、特に制限を受ける
ものでないが、フェノール,エポキシ,ポリイミド,ポ
リスチレン又はポリエチレンでなる場合には、砥石の成
形性,強度及び砥石の成形時での砥粒及び他物質の分散
性にすぐれるので好ましいことである。The resin used in the present invention is not particularly limited, but when it is made of phenol, epoxy, polyimide, polystyrene, or polyethylene, the moldability and strength of the grindstone and the abrasive grains and other substances during molding of the grindstone may be affected. This is preferable because it has excellent dispersibility.
【0017】本発明における金属の化合物を主成分とす
る他物質とは、従来から砥石に用いられている物質なら
ば特に制限を受けるものでなく、具体的には、超硬質砥
粒,化学量論的化合物の砥粒,ガラス,ウィスカー,繊
維,カーボンを挙げることができ、さらに具体的には、
例えばAl2O3,SiO2,SiC,Fe2O3,Z
rO2,CeO2,CBN,WBN,(ウルツ鉱型BN
),ダイヤモンドを挙げることができる。[0017] In the present invention, the other substances mainly composed of metal compounds are not particularly limited as long as they have been conventionally used in grindstones, and specifically include ultra-hard abrasive grains, chemical Examples include abrasive grains, glass, whiskers, fibers, carbon, and more specifically,
For example, Al2O3, SiO2, SiC, Fe2O3, Z
rO2, CeO2, CBN, WBN, (wurtzite BN
) and diamonds.
【0018】本発明の精密加工用砥石は、従来から行わ
れている砥石の成形法、具体的には、砥粒と樹脂又は必
要に応じて他物質の含有した出発原料を混合,篩別後、
金型でもってホットプレスして作製することができる。The precision machining whetstone of the present invention can be produced by a conventional grindstone forming method, specifically, by mixing abrasive grains and a starting material containing a resin or other substances as necessary, sieving, and then sieving. ,
It can be produced by hot pressing with a mold.
【0019】[0019]
【作用】本発明の精密加工用砥石は、使用時には、非化
学量論的化合物の砥粒がそれに内在している活性力と被
加工材料の表面における摩擦熱により、一層活性化を高
め、砥粒と被加工材料との化学反応の促進作用、所謂メ
カノケミカル作用を顕著に生じさせている。また、砥石
に含有する樹脂は、非化学量論的化合物の砥粒及び他物
質を保持し、砥石の強度を高める作用及び、使用時には
、非化学量論的化合物の砥粒と被加工材料の表面とを接
触しやすくする作用をしているものである。[Function] When the precision machining grindstone of the present invention is used, the abrasive grains of the non-stoichiometric compound further increase activation due to the inherent activation force and the frictional heat on the surface of the workpiece material. This significantly promotes the chemical reaction between the grains and the material to be processed, the so-called mechanochemical action. In addition, the resin contained in the whetstone has the effect of holding the abrasive grains of the non-stoichiometric compound and other substances, increasing the strength of the whetstone, and when in use, the abrasive grains of the non-stoichiometric compound and the workpiece material. It has the effect of making it easier to come into contact with the surface.
【0020】[0020]
【実施例1】平均粒径が1μm以下の各種市販の砥粒を
還元処理して、非化学量論的化合物の砥粒とした出発原
料と、平均粒径1μm以下の各種の金属又は半金属の化
合物粉末と、各種の樹脂を用いて、表1のように配合し
、各試料を得た。[Example 1] Starting raw materials made into non-stoichiometric compound abrasive grains by reducing various commercially available abrasive grains with an average particle size of 1 μm or less, and various metals or semimetals with an average particle size of 1 μm or less Each sample was obtained by blending the compound powder and various resins as shown in Table 1.
【0021】表1に示した配合組成の各試料を擂摺機に
て混合,篩別後、表2に示す焼結条件でもって砥石を作
製した。[0021] Each sample having the compounding composition shown in Table 1 was mixed and sieved using a grinder, and then grindstones were prepared under the sintering conditions shown in Table 2.
【0022】[0022]
【表1】[Table 1]
【0023】[0023]
【表2】
表2により得た本発明品1〜15と比較品1〜5及び市
販のシリカゾルを比較品6として用いて、下記の条件で
もって鏡面研摩仕上を試みた。
鏡面研摩仕上げ条件
被加工材料:表3に示すセラミックス,ガラス及びSi
ウェハーの表面を1μmダイヤモンド砥石で研摩した面
、
回転数 :90rpm
加工圧力 :120g/cm2
研摩方式 :乾式
評価 :所定の研摩時間における被加工材料
の面粗度、60分研摩後における被加工材料の面状態及
び砥石の損傷状態の観察。[Table 2] Using products 1 to 15 of the present invention obtained from Table 2, comparative products 1 to 5, and a commercially available silica sol as comparative product 6, mirror polishing was attempted under the following conditions. Mirror polishing finishing conditions Work material: Ceramics, glass, and Si shown in Table 3
The surface of the wafer was polished with a 1 μm diamond grindstone, rotation speed: 90 rpm, processing pressure: 120 g/cm2, polishing method: dry evaluation: the surface roughness of the workpiece material at a given polishing time, the roughness of the workpiece material after 60 minutes of polishing. Observation of surface condition and damage condition of whetstone.
【0024】上記鏡面研摩仕上試験の結果を表3に示し
た。Table 3 shows the results of the mirror polishing test.
【0025】[0025]
【表3】[Table 3]
【0026】[0026]
【実施例2】市販されている平均粒径0.1μmで、か
つ標準偏差の均一なCr2O3を各種の条件でもって還
元処理し、各種のCr2O3−yの砥粒を得た。Example 2 Commercially available Cr2O3 having an average particle diameter of 0.1 μm and a uniform standard deviation was subjected to reduction treatment under various conditions to obtain various types of Cr2O3-y abrasive grains.
【0027】このCr2O3−yの砥粒とフェノール樹
脂とを表4のように配合した後、実施例1と同様にして
各種の砥石を作製した。After blending the Cr2O3-y abrasive grains and phenol resin as shown in Table 4, various types of grindstones were prepared in the same manner as in Example 1.
【0028】[0028]
【表4】
表4に示した各種の砥石を用いて、実施例1で行ったと
同様の鏡面研摩仕上試験を行って、その結果を表5に示
した。[Table 4] Using the various grindstones shown in Table 4, a mirror polishing finish test similar to that in Example 1 was conducted, and the results are shown in Table 5.
【0029】ここで用いたCr2O3−yの内、Cr2
O2.4の砥粒の硬さを測定し、その結果を図1に示し
た。Of the Cr2O3-y used here, Cr2
The hardness of O2.4 abrasive grains was measured and the results are shown in FIG.
【0030】[0030]
【表5】[Table 5]
【0031】[0031]
【発明の効果】本発明の精密加工用砥石は、砥石中に含
有している非化学量論的化合物の砥粒と、使用時に被加
工材料の表面に発生する摩擦熱でもって、被加工材料の
表面でサブナノメーターのオーダーでの酸化,酸化被膜
形成及びその被膜除去が繰り返されるという、酸化反応
の促進効果の高い砥石であり、従来の化学量論的化合物
の砥粒を含有した砥石に比べて、被加工材料の面粗度(
Rmax)において、約8.5〜66倍も向上させうる
という顕著な効果を有するものである。Effects of the Invention: The precision machining whetstone of the present invention uses the abrasive grains of a non-stoichiometric compound contained in the whetstone and the frictional heat generated on the surface of the workpiece material during use. This grindstone is highly effective in accelerating oxidation reactions by repeatedly oxidizing, forming an oxide film, and removing that film on the sub-nanometer order on the surface of the surface. The surface roughness of the workpiece material (
This has a remarkable effect of improving Rmax) by about 8.5 to 66 times.
【図1】本発明の精密加工用砥石に用いた砥粒の内の1
種であるCr2O2.4の温度と硬さの関係を示すグラ
フである。[Figure 1] One of the abrasive grains used in the precision processing grindstone of the present invention
It is a graph showing the relationship between temperature and hardness of Cr2O2.4 which is a seed.
Claims (6)
、金属の酸化物,酸炭化物,酸窒化物及びこれらの相互
固溶体の中の少なくとも1種でなる非化学量論的化合物
の砥粒を少なくとも30体積%含有していることを特徴
とする精密加工用砥石。1. A resin-bonded grindstone, the grindstone comprising at least 30 abrasive grains of a non-stoichiometric compound consisting of at least one of metal oxides, oxycarbides, oxynitrides, and mutual solid solutions thereof. A grindstone for precision machining characterized by containing % by volume.
ン,クロム又は鉄の酸化物,酸炭化物,酸窒化物及びこ
れらの相互固溶体の中の少なくとも1種からなることを
特徴とする請求項1記載の精密加工用砥石。Claim 2: A claim characterized in that the abrasive grains of the non-stoichiometric compound are made of at least one of titanium, chromium, or iron oxides, oxycarbides, oxynitrides, and mutual solid solutions thereof. A grindstone for precision processing according to item 1.
粒径1.0μm以下の粒子でなることを特徴とする請求
項1又は2記載の精密加工用砥石。3. The precision machining whetstone according to claim 1, wherein the abrasive grains of the non-stoichiometric compound are particles with an average grain size of 1.0 μm or less.
、樹脂が15〜49体積%と、金属の酸化物,酸炭化物
,酸窒化物及びこれらの相互固溶体の中の少なくとも1
種でなる非化学量論的化合物の砥粒が30〜80体積%
と、残部が金属の化合物を主成分とする他物質とからな
ることを特徴とする精密加工用砥石。4. A resin-bonded grindstone, which contains 15 to 49% by volume of resin and at least one of metal oxides, oxycarbides, oxynitrides, and mutual solid solutions thereof.
Abrasive grains of non-stoichiometric compounds consisting of seeds are 30-80% by volume
A grindstone for precision machining, characterized in that the remainder is composed of other substances whose main component is a metal compound.
リイミド,ポリスチレン又はポリエチレンからなり、上
記非化学量論的化合物の砥粒がチタン,クロム及び/又
は鉄の酸化物からなることを特徴とする請求項4記載の
精密加工用砥石。5. A claim characterized in that the resin is made of phenol, epoxy, polyimide, polystyrene or polyethylene, and the abrasive grains of the non-stoichiometric compound are made of titanium, chromium and/or iron oxide. 4. The precision processing grindstone described in 4.
粒径1.0μm以下の粉末でなることを特徴とする請求
項4又は5記載の精密加工用砥石。6. The precision machining grindstone according to claim 4, wherein the abrasive grains of the non-stoichiometric compound are powders with an average particle size of 1.0 μm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3155584A JP3014062B2 (en) | 1991-05-30 | 1991-05-30 | Whetstone for precision machining |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3155584A JP3014062B2 (en) | 1991-05-30 | 1991-05-30 | Whetstone for precision machining |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04354676A true JPH04354676A (en) | 1992-12-09 |
JP3014062B2 JP3014062B2 (en) | 2000-02-28 |
Family
ID=15609243
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3155584A Expired - Fee Related JP3014062B2 (en) | 1991-05-30 | 1991-05-30 | Whetstone for precision machining |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3014062B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6413149B1 (en) | 1998-04-28 | 2002-07-02 | Ebara Corporation | Abrading plate and polishing method using the same |
JP2007229848A (en) * | 2006-02-28 | 2007-09-13 | Saitama Univ | MOLDED BODY AND GRINDING WHEEL CONTAINING SiOx POWDER, AND GRINDING METHOD USING THE SAME |
-
1991
- 1991-05-30 JP JP3155584A patent/JP3014062B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6942548B2 (en) | 1998-03-27 | 2005-09-13 | Ebara Corporation | Polishing method using an abrading plate |
US6413149B1 (en) | 1998-04-28 | 2002-07-02 | Ebara Corporation | Abrading plate and polishing method using the same |
JP2007229848A (en) * | 2006-02-28 | 2007-09-13 | Saitama Univ | MOLDED BODY AND GRINDING WHEEL CONTAINING SiOx POWDER, AND GRINDING METHOD USING THE SAME |
Also Published As
Publication number | Publication date |
---|---|
JP3014062B2 (en) | 2000-02-28 |
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