JPH04342720A - Epoxy resin composition for wiring substrate - Google Patents
Epoxy resin composition for wiring substrateInfo
- Publication number
- JPH04342720A JPH04342720A JP14406591A JP14406591A JPH04342720A JP H04342720 A JPH04342720 A JP H04342720A JP 14406591 A JP14406591 A JP 14406591A JP 14406591 A JP14406591 A JP 14406591A JP H04342720 A JPH04342720 A JP H04342720A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- phenolic hydroxyl
- integer
- resin composition
- polybutadiene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 54
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 53
- 239000000203 mixture Substances 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 title description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 35
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 24
- -1 imidazole compound Chemical class 0.000 claims abstract description 21
- 229920001400 block copolymer Polymers 0.000 claims abstract description 19
- 229920003006 Polybutadiene acrylonitrile Polymers 0.000 claims abstract description 18
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 229920003986 novolac Polymers 0.000 claims description 13
- 239000005011 phenolic resin Substances 0.000 claims description 2
- 150000002989 phenols Chemical class 0.000 abstract description 5
- 229920001577 copolymer Polymers 0.000 abstract description 4
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 abstract description 2
- 230000001588 bifunctional effect Effects 0.000 abstract 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 19
- 239000007795 chemical reaction product Substances 0.000 description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 11
- 239000011889 copper foil Substances 0.000 description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- 229920003235 aromatic polyamide Polymers 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- QNVNLUSHGRBCLO-UHFFFAOYSA-N 5-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(O)=CC(C(O)=O)=C1 QNVNLUSHGRBCLO-UHFFFAOYSA-N 0.000 description 6
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
- 239000004760 aramid Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- 238000005452 bending Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- 229920013646 Hycar Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- CDOWNLMZVKJRSC-UHFFFAOYSA-N 2-hydroxyterephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(O)=C1 CDOWNLMZVKJRSC-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- MNUOZFHYBCRUOD-UHFFFAOYSA-N 3-hydroxyphthalic acid Chemical compound OC(=O)C1=CC=CC(O)=C1C(O)=O MNUOZFHYBCRUOD-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- BCEQKAQCUWUNML-UHFFFAOYSA-N 4-hydroxybenzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(O)C(C(O)=O)=C1 BCEQKAQCUWUNML-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- XWBDWHCCBGMXKG-UHFFFAOYSA-N ethanamine;hydron;chloride Chemical compound Cl.CCN XWBDWHCCBGMXKG-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002560 nitrile group Chemical group 0.000 description 2
- 239000010680 novolac-type phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid group Chemical group C(C=1C(C(=O)O)=CC=CC1)(=O)O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000001028 reflection method Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- BQIOTSCEOSMFOT-UHFFFAOYSA-N 1-hydroxycyclohexa-3,5-diene-1,2-dicarboxylic acid Chemical compound OC(=O)C1C=CC=CC1(O)C(O)=O BQIOTSCEOSMFOT-UHFFFAOYSA-N 0.000 description 1
- IEKHISJGRIEHRE-UHFFFAOYSA-N 16-methylheptadecanoic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O IEKHISJGRIEHRE-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- JHJUYGMZIWDHMO-UHFFFAOYSA-N 2,6-dibromo-4-(3,5-dibromo-4-hydroxyphenyl)sulfonylphenol Chemical compound C1=C(Br)C(O)=C(Br)C=C1S(=O)(=O)C1=CC(Br)=C(O)C(Br)=C1 JHJUYGMZIWDHMO-UHFFFAOYSA-N 0.000 description 1
- JSZMNEHRJUWKCF-UHFFFAOYSA-N 2-(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl)acetic acid Chemical compound C1C(CC(O)=O)C(C)CC2OC21 JSZMNEHRJUWKCF-UHFFFAOYSA-N 0.000 description 1
- SUTCVRHWHOUKJP-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetic acid Chemical compound C1C(CC(=O)O)CCC2OC21 SUTCVRHWHOUKJP-UHFFFAOYSA-N 0.000 description 1
- WKJICCKTDQDONB-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxycarbonyl)cyclohexane-1-carboxylic acid Chemical compound OC(=O)C1CCCCC1C(=O)OCC1OC1 WKJICCKTDQDONB-UHFFFAOYSA-N 0.000 description 1
- PULOARGYCVHSDH-UHFFFAOYSA-N 2-amino-3,4,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1OC1CC1=C(CC2OC2)C(N)=C(O)C=C1CC1CO1 PULOARGYCVHSDH-UHFFFAOYSA-N 0.000 description 1
- PWDGALQKQJSBKU-UHFFFAOYSA-N 2-chloro-4-(3-chloro-4-hydroxyphenyl)sulfonylphenol Chemical compound C1=C(Cl)C(O)=CC=C1S(=O)(=O)C1=CC=C(O)C(Cl)=C1 PWDGALQKQJSBKU-UHFFFAOYSA-N 0.000 description 1
- KKOHCQAVIJDYAF-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O KKOHCQAVIJDYAF-UHFFFAOYSA-N 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- WVDGHGISNBRCAO-UHFFFAOYSA-N 2-hydroxyisophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1O WVDGHGISNBRCAO-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- HVEAQFIZKONJJG-UHFFFAOYSA-N 3-(3-carboxybenzoyl)benzoic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=C(C=CC=2)C(O)=O)=C1 HVEAQFIZKONJJG-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- RBQRPOWGQURLEU-UHFFFAOYSA-N 3-[(3-carboxyphenyl)methyl]benzoic acid Chemical compound OC(=O)C1=CC=CC(CC=2C=C(C=CC=2)C(O)=O)=C1 RBQRPOWGQURLEU-UHFFFAOYSA-N 0.000 description 1
- RXNYJUSEXLAVNQ-UHFFFAOYSA-N 4,4'-Dihydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1 RXNYJUSEXLAVNQ-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- MITHMOYLTXMLRB-UHFFFAOYSA-N 4-(4-aminophenyl)sulfinylaniline Chemical compound C1=CC(N)=CC=C1S(=O)C1=CC=C(N)C=C1 MITHMOYLTXMLRB-UHFFFAOYSA-N 0.000 description 1
- LFEWXDOYPCWFHR-UHFFFAOYSA-N 4-(4-carboxybenzoyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C=C1 LFEWXDOYPCWFHR-UHFFFAOYSA-N 0.000 description 1
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 1
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 description 1
- FJXIPWRKSXGKSY-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfanylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1SC1=CC=C(C(O)=O)C=C1 FJXIPWRKSXGKSY-UHFFFAOYSA-N 0.000 description 1
- SQJQLYOMPSJVQS-UHFFFAOYSA-N 4-(4-carboxyphenyl)sulfonylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C=C1 SQJQLYOMPSJVQS-UHFFFAOYSA-N 0.000 description 1
- SUCTVKDVODFXFX-UHFFFAOYSA-N 4-(4-hydroxy-3,5-dimethylphenyl)sulfonyl-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(S(=O)(=O)C=2C=C(C)C(O)=C(C)C=2)=C1 SUCTVKDVODFXFX-UHFFFAOYSA-N 0.000 description 1
- IBNFPRMKLZDANU-UHFFFAOYSA-N 4-(4-hydroxy-3-methylphenyl)sulfanyl-2-methylphenol Chemical compound C1=C(O)C(C)=CC(SC=2C=C(C)C(O)=CC=2)=C1 IBNFPRMKLZDANU-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- VTDMBRAUHKUOON-UHFFFAOYSA-N 4-[(4-carboxyphenyl)methyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C=C1 VTDMBRAUHKUOON-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- ODJUOZPKKHIEOZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)propan-2-yl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=C(C)C=2)=C1 ODJUOZPKKHIEOZ-UHFFFAOYSA-N 0.000 description 1
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 1
- INTKLIPLFSTUMR-UHFFFAOYSA-N 5,5-bis(oxiran-2-ylmethyl)imidazolidine-2,4-dione Chemical compound N1C(=O)NC(=O)C1(CC1OC1)CC1OC1 INTKLIPLFSTUMR-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920003043 Cellulose fiber Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000005001 aminoaryl group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- MYMCSQDRHUQQDW-UHFFFAOYSA-N bis(4-amino-3-methylphenyl)methanone Chemical compound C1=C(N)C(C)=CC(C(=O)C=2C=C(C)C(N)=CC=2)=C1 MYMCSQDRHUQQDW-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- MGHPNCMVUAKAIE-UHFFFAOYSA-N diphenylmethanamine Chemical compound C=1C=CC=CC=1C(N)C1=CC=CC=C1 MGHPNCMVUAKAIE-UHFFFAOYSA-N 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000008301 phosphite esters Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、配線基板に用いられる
エポキシ樹脂組成物に係わり、特に耐熱性、耐電圧性、
機械特性等が改善され、接着性の良く絶縁性のエポキシ
樹脂組成物に関する。[Industrial Application Field] The present invention relates to an epoxy resin composition used for wiring boards, and in particular, it has excellent heat resistance, voltage resistance,
The present invention relates to an epoxy resin composition with improved mechanical properties, good adhesiveness, and insulation properties.
【0002】0002
【従来の技術】近年、放熱性、電磁シールド性、耐熱性
、回路スペースの縮小化等の観点から基材に金属箔を接
着して構成するフレキシブル配線基板、回路基板、これ
らを多層化した多層回路基板等が広く使用されてきてい
る。これらはポリイミド樹脂板、エポキシ樹脂等をガラ
ス繊維等に含浸させたガラスエポキシ基板および金属板
に絶縁層を設けた基板等からなる基材に金属箔を設けて
エッチング法で回路を形成したもの、基板上に回路を直
接メッキして構成した物または導電性樹脂で回路を印刷
した物等が知られている。[Prior Art] In recent years, flexible wiring boards and circuit boards, which are constructed by bonding metal foil to a base material, have been developed from the viewpoint of heat dissipation, electromagnetic shielding, heat resistance, reduction of circuit space, etc. Circuit boards and the like have been widely used. These are base materials such as polyimide resin plates, glass epoxy substrates with glass fibers impregnated with epoxy resin, etc., and substrates with insulating layers on metal plates, etc., with metal foil provided on them and circuits formed by etching. There are known devices in which a circuit is directly plated onto a substrate, or a circuit is printed with conductive resin.
【0003】0003
【発明が解決しようとする課題】これらのうち基材に銅
箔を貼り合わせて形成された配線基板においては、絶縁
性のある接着材料としてエポキシ樹脂が広く使用されて
いる。しかし、エポキシ樹脂は絶縁性、耐熱性、接着性
が優れるが、脆く、熱衝撃による割れ、外部衝撃による
剥離、スルホール時のスミアの発生、可撓性が不十分で
曲げた場合割れを発生し易い等の問題点がある。従来は
この熱衝撃や外部からの機械的衝撃や可撓性の不足等の
問題に対して、エポキシ樹脂に対してゴム状物質を添加
して解決しているが、このゴム状物質の添加は耐熱性の
低下、高温度加熱後の接着性の低下をたすほか、スミア
の発生等の問題も従来同様に発生している。Problems to be Solved by the Invention Among these wiring boards formed by bonding copper foil to a base material, epoxy resin is widely used as an insulating adhesive material. However, although epoxy resin has excellent insulation, heat resistance, and adhesive properties, it is brittle and can crack due to thermal shock, peel off due to external impact, generate smear when through-hole, and crack when bent due to insufficient flexibility. There are problems such as being easy to use. Conventionally, problems such as thermal shock, external mechanical shock, and lack of flexibility have been solved by adding rubber-like substances to epoxy resin. In addition to a decrease in heat resistance and a decrease in adhesion after high-temperature heating, problems such as smear generation also occur as in the past.
【0004】0004
【課題を解決するための手段】本発明者は、上記問題点
を解決すべく鋭意研究を重ねた結果、少なくともエポキ
シ樹脂、多官能フェノール化合物、イミダゾール化合物
および一般式(1)で示すフェノール性水酸基含有アラ
ミド−ポリブタジエン−アクリロニトリルブロック共重
合体とを含有することを特徴とする配線基板用エポキシ
樹脂組成物が配線基板用に有用であることを見いだした
。[Means for Solving the Problems] As a result of extensive research to solve the above problems, the present inventors have discovered that at least an epoxy resin, a polyfunctional phenol compound, an imidazole compound and a phenolic hydroxyl group represented by the general formula (1) It has been found that an epoxy resin composition for wiring boards containing an aramid-polybutadiene-acrylonitrile block copolymer is useful for wiring boards.
【化2】
(式中x=3〜7の整数、y=1〜4の整数、y/(x
+y)=0.1〜0.3、z=5〜15の整数、m=1
〜400の整数、n=1〜400の整数、n/(m+n
)=0.01〜0.50、l=1〜50の整数、Ar1
、Ar3 は二価の芳香族基、Ar2 はフェノール
性水酸基を含有する二価の芳香族基を示す)[Formula 2] (where x = integer from 3 to 7, y = integer from 1 to 4, y/(x
+y) = 0.1 to 0.3, z = integer of 5 to 15, m = 1
~400 integer, n=1~400 integer, n/(m+n
) = 0.01 to 0.50, l = integer of 1 to 50, Ar1
, Ar3 is a divalent aromatic group, Ar2 is a divalent aromatic group containing a phenolic hydroxyl group)
【0005
】上記一般式(1)で示すフェノール性水酸基含有アラ
ミド−ポリブタジエン−アクリロニトリルブロック共重
合体をエポキシ樹脂に導入することにより、耐熱性の低
下をもたらすことなしに強靱性の改善が計られ、熱や外
部衝撃による割れや剥離、更には曲げ強度等を改善する
ことが出来ることが判った。また、この共重合体は、少
量の添加で高い効果が得られるので、エポキシ樹脂が持
つ絶縁性を損なうことがないばかりではなく、この共重
合体中のポリブタジエン−アクリロニトリル成分がエポ
キシマトリックス中にミクロン以下のサイズで少量存在
するので、スミア発生の改善ばかりでなく、熱や外部衝
撃に対する応力緩和剤として作用するものと推定される
。又、この共重合体中のアラミド成分はエポキシ樹脂中
に分子状で分散され、エポキシマトリックスの強靱性が
向上するばかりでなく、耐熱性の向上も計られる。更に
、このアラミド成分に、ポリブタジエン−アクリロニト
リル成分が固定化されているので、加熱によるブリーデ
ングアウトもなく、熱サイクルによる接着強度の変化も
少ない。更に、多官能性フェノール性化合物としてノボ
ラック型フェノール樹脂を使用することにより、高温で
の曲げ強度がより改善させる。以上により、本発明のエ
ポキシ樹脂組成物を絶縁層として用いる配線基板は従来
にない著しい改善効果が得られる。0005
] By introducing the phenolic hydroxyl group-containing aramid-polybutadiene-acrylonitrile block copolymer represented by the above general formula (1) into an epoxy resin, toughness can be improved without reducing heat resistance. It has been found that cracking and peeling caused by external impact, as well as bending strength, etc. can be improved. In addition, this copolymer can achieve high effects even when added in small amounts, so not only does it not impair the insulation properties of epoxy resin, but the polybutadiene-acrylonitrile component in this copolymer can be added to the epoxy matrix with micronization. Since it exists in small quantities with the following sizes, it is presumed that it not only improves smear generation but also acts as a stress reliever against heat and external impact. Furthermore, the aramid component in this copolymer is dispersed in molecular form in the epoxy resin, which not only improves the toughness of the epoxy matrix but also improves its heat resistance. Furthermore, since the polybutadiene-acrylonitrile component is fixed to this aramid component, there is no bleeding out due to heating, and there is little change in adhesive strength due to thermal cycles. Furthermore, by using a novolac type phenolic resin as the polyfunctional phenolic compound, the bending strength at high temperatures is further improved. As a result of the above, the wiring board using the epoxy resin composition of the present invention as an insulating layer has a remarkable improvement effect that has not been seen before.
【0006】本発明において使用するエポキシ樹脂とし
ては、1分子中に少なくとも2個のエポキシ基を有する
エポキシ樹脂であればどのようなものでもよく、このよ
うなものとして、例えば、グリシジルエーテル類、グリ
シジルエステル類、グリシジルアミン類、線状脂肪族エ
ポキシド類、脂環式エポキシド類、ヒダントイン型エポ
キシド類などのエポキシ樹脂が挙げられる。 ここに
、グリシジルエーテル類としては、例えばビスフェノー
ルのグリシジルエーテル、フェノールノボラックのポリ
グリシジルエーテル、アルキレングリコール又はポリア
ルキレングリコールのグリシジルエーテルなどが挙げら
れる。このビスフェノールのグリシジルエーテルとして
は、ビスフェノールA、ビスフェノールF、ビスフェノ
ールAD、ビスフェノールS、テトラメチルビスフェノ
ールA、テトラメチルビスフェノールF、テトラメチル
ビスフェノールAD、テトラメチルビスフェノールS、
テトラクロロビスフェノールA、テトラブロモビスフェ
ノールAなどの二価フェノール類のジグリシジルエーテ
ルが挙げられ、フェノールノボラックのポリグリシジル
エーテルとしては、例えばフェノールノボラック、クレ
ゾールノボラック、ブロム化フェノールノボラックなど
のノボラック樹脂のポリグリシジルエーテルが挙げられ
、アルキレングリコール又はポリアルキレングリコール
のジグリシジルエーテルとしては、例えばポリエチレン
グリコール、ポリプロピレングリコール、ブタンジオー
ルなどのグリコール類のジグリシジルエーテルが挙げら
れる。又、前記グリシジルエステル類としては、例えば
ヘキサヒドロフタル酸のグリシジルエステルやダイマー
酸のグリシジルエステルなどが挙げられ、グリシジルア
ミン類としては、例えばトリグリシジルアミノジフェニ
ルメタン、トリグリシジルアミノフェノール、トリグリ
シジルイソシアヌレートなどが挙げられる。更に、線状
脂肪族エポキシド類としては、例えばエポキシ化ポリブ
タジエン、エポキシ化大豆油などが挙げられ、脂環式エ
ポキシド類としては、例えば3、4−エポキシ−6−メ
チルシクロヘキシルメチルカルボキシレート、3,4エ
ポキシシクロヘキシルメチルカルボキシレート、水素添
加型ビスフェノールエポキシなどが挙げられる。ヒダン
トイン型エポキシ類としては、ジグリシジルヒダントイ
ン、グリシジルグリシドオキシアルキルヒダントイン等
が挙げられる。The epoxy resin used in the present invention may be any epoxy resin as long as it has at least two epoxy groups in one molecule, such as glycidyl ethers, glycidyl Examples include epoxy resins such as esters, glycidyl amines, linear aliphatic epoxides, alicyclic epoxides, and hydantoin type epoxides. Examples of the glycidyl ethers include glycidyl ether of bisphenol, polyglycidyl ether of phenol novolak, glycidyl ether of alkylene glycol or polyalkylene glycol, and the like. The glycidyl ethers of bisphenol include bisphenol A, bisphenol F, bisphenol AD, bisphenol S, tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol AD, tetramethylbisphenol S,
Examples include diglycidyl ethers of dihydric phenols such as tetrachlorobisphenol A and tetrabromobisphenol A, and examples of polyglycidyl ethers of phenol novolacs include polyglycidyl ethers of novolak resins such as phenol novolak, cresol novolac, and brominated phenol novolak. Examples of diglycidyl ethers of alkylene glycols or polyalkylene glycols include diglycidyl ethers of glycols such as polyethylene glycol, polypropylene glycol, and butanediol. Examples of the glycidyl esters include hexahydrophthalic acid glycidyl ester and dimer acid glycidyl ester, and examples of the glycidyl amines include triglycidyl amino diphenylmethane, triglycidylaminophenol, and triglycidyl isocyanurate. can be mentioned. Further, examples of linear aliphatic epoxides include epoxidized polybutadiene and epoxidized soybean oil, and examples of alicyclic epoxides include 3,4-epoxy-6-methylcyclohexylmethylcarboxylate, 3, Examples include 4-epoxycyclohexylmethylcarboxylate and hydrogenated bisphenol epoxy. Examples of hydantoin-type epoxies include diglycidylhydantoin, glycidylglycidoxyalkylhydantoin, and the like.
【0007】本発明で使用する硬化剤としての多官能フ
ェノール化合物としては、1分子中に官能基が2個以上
あり、エポキシ樹脂と分子鎖を生成出来ればどのような
ものでもよく、例えば2,2’−ビス(4−ヒドロキシ
フェニル)プロパン、2,2’−ビス(2−メチル−4
−ヒドロキシフェニル)プロパン、2,2’−ビス(4
−ヒドロキシフェニル)メタン、1,1’−ビス(4−
ヒドロキシフェニル)エタン、1,1’−ビス(4−ヒ
ドロキシフェニル)ヘキサン、1,1’−ビス(4−ヒ
ドロキシフェニル)ドコシル、2、2’−ビス(4−ヒ
ドロキシフェニル)ブタン、2、2’−ビス(4−ヒド
ロキシフェニル)ヘキサン、ビス(4−ヒドロキシフェ
ニル)スルフォン、ビス(3−クロロ−4−ヒドロキシ
フェニル)スルフォン、ビス(3,5−ジメチル−4−
ヒドロキシフェニル)スルフォン、ビス(4−ヒドロキ
シ−3,5−ジブロモフェニル)スルフォン、ビス(4
−ヒドロキシフェニル)スルフィド、ビス(3−メチル
−4−ヒドロキシフェニル)スルフィド、1、1−ビス
(4−ヒドロキシフェニル)シクロヘキサン、4,4’
−ジヒドロキシベンゾフェノン、ジヒドロキシナフタレ
ン、1,4−(p−ヒドロキシクミル)ベンゼン、又は
フェノール、クレゾール、アルキルフェノール、カテコ
ール、ビスフェノールA、ビスフェノールF等のノボラ
ック樹脂およびこれらのフェノール樹脂のハロゲン化物
などがあげられる。これらフェノール化合物は何種類か
を併用することもできる。この配合量はエポキシ樹脂に
対してフェノール水酸基が0.5〜1.5当量の範囲で
あることがドリル加工性の点から好ましい。本発明にお
いては、ノボラック型フェノール樹脂が高温において高
い曲げ強度を与えるので好ましい。The polyfunctional phenol compound used as a curing agent in the present invention may be any compound as long as it has two or more functional groups in one molecule and can form a molecular chain with the epoxy resin. 2'-bis(4-hydroxyphenyl)propane, 2,2'-bis(2-methyl-4
-hydroxyphenyl)propane, 2,2'-bis(4
-hydroxyphenyl)methane, 1,1'-bis(4-
hydroxyphenyl)ethane, 1,1'-bis(4-hydroxyphenyl)hexane, 1,1'-bis(4-hydroxyphenyl)docosyl, 2,2'-bis(4-hydroxyphenyl)butane, 2,2 '-Bis(4-hydroxyphenyl)hexane, bis(4-hydroxyphenyl)sulfone, bis(3-chloro-4-hydroxyphenyl)sulfone, bis(3,5-dimethyl-4-
hydroxyphenyl) sulfone, bis(4-hydroxy-3,5-dibromophenyl) sulfone, bis(4
-hydroxyphenyl) sulfide, bis(3-methyl-4-hydroxyphenyl) sulfide, 1,1-bis(4-hydroxyphenyl)cyclohexane, 4,4'
-Dihydroxybenzophenone, dihydroxynaphthalene, 1,4-(p-hydroxycumyl)benzene, or novolak resins such as phenol, cresol, alkylphenol, catechol, bisphenol A, and bisphenol F, and halogenated products of these phenol resins. . Several types of these phenol compounds can also be used in combination. From the viewpoint of drill workability, it is preferable that the amount of phenol hydroxyl group added is in the range of 0.5 to 1.5 equivalents based on the epoxy resin. In the present invention, novolac type phenolic resin is preferred because it provides high bending strength at high temperatures.
【0008】本発明の配線基用エポキシ樹脂組成物には
、硬化促進剤としてイミダゾール化合物を配合する。
該イミダゾール化合物としてはイミダゾール、2−エチ
ルイミダゾール、2−エチル−4−メチルイミダゾール
、2−フェニルイミダゾール、2−ウンデシルイミダゾ
ール、1−ベンジル−2−メチルイミダゾール、2−ヘ
プタデシルイミダゾール、2−イソプロピルイミダゾー
ル、2,4−ジメチルイミダゾール、2−フェニル−4
−メチルイミダゾール、2−メチルイミダゾリン、2−
エチルイミダゾリン、2−イソプロピルイミダゾリン、
2−フェニルイミダゾリン、2−ウンデシルイミダゾリ
ン、2,4ージメチルイミダゾリン、2−フェニル−4
−メチルイミダゾリン等又はこれらをマスクした化合物
が挙げられる。このマスク化剤としては、アクリロニト
リル、フェニレンジイソシアネート、トリレンジイソシ
アネート、ナフタレンジイソシアネート、ヘキサメチレ
ンジイソシアネート、メチレンジビスフェニルイソシア
ネート、メラミンアクリレート等がある。これらの硬化
促進剤は何種類か併用してもよく、配合量はエポキシ樹
脂に対して0.01〜10重量%が好ましい。The epoxy resin composition for wiring bases of the present invention contains an imidazole compound as a curing accelerator. The imidazole compounds include imidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2-heptadecylimidazole, and 2-isopropyl. Imidazole, 2,4-dimethylimidazole, 2-phenyl-4
-Methylimidazole, 2-methylimidazoline, 2-
Ethylimidazoline, 2-isopropylimidazoline,
2-phenylimidazoline, 2-undecylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4
-Methylimidazoline, etc., or compounds masking these may be mentioned. Examples of the masking agent include acrylonitrile, phenylene diisocyanate, tolylene diisocyanate, naphthalene diisocyanate, hexamethylene diisocyanate, methylene dibisphenyl isocyanate, and melamine acrylate. Several types of these curing accelerators may be used in combination, and the blending amount is preferably 0.01 to 10% by weight based on the epoxy resin.
【0009】本発明で使用するブロック共重合体(1)
は、下記の方法で合成できる。すなわち一般式(1)中
のフェノール性水酸基を有する二価の芳香族基Ar2
を持つ芳香族ジカルボン酸と、一般式(1)中の二価の
芳香族基Ar1 を持ち、かつフェノール性水酸基を有
しない芳香族ジカルボン酸に対して、過剰量の一般式(
1)中に2価の芳香族基Ar3 を持つ芳香族ジアミン
を加え、これらを例えば、亜リン酸エステルとピリジン
誘導体の存在下、N−メチル−2−ピロリドンによって
代表される有機溶媒中で、窒素等の不活性雰囲気下に加
熱攪拌する。この結果得られる両末端がアミノアリール
基となったフェノール性水酸基含有ポリアラミドオリゴ
マー溶液に、両末端にカルボキシル基をもつポリブタジ
エン−アクリロニトリル共重合体を添加し、重縮合する
ことによりブロック共重合体が得られる。Block copolymer (1) used in the present invention
can be synthesized by the following method. That is, the divalent aromatic group Ar2 having a phenolic hydroxyl group in general formula (1)
An excess amount of the aromatic dicarboxylic acid having the divalent aromatic group Ar1 in the general formula (1) and no phenolic hydroxyl group,
Add an aromatic diamine having a divalent aromatic group Ar3 into 1), and add these to, for example, an organic solvent represented by N-methyl-2-pyrrolidone in the presence of a phosphite ester and a pyridine derivative. Heat and stir under an inert atmosphere such as nitrogen. A polybutadiene-acrylonitrile copolymer having carboxyl groups at both ends is added to the resulting polyaramid oligomer solution containing aminoaryl groups at both ends, and polycondensation is performed to form a block copolymer. can get.
【0010】前記のフェノール性水酸基を有するジカル
ボン酸のとしては、5−ヒドロキシイソフタル酸、4−
ヒドロキシイソフタル酸、2−ヒドロキシフタル酸、3
−ヒドロキシフタル酸、2−ヒドロキシテレフタル酸が
挙げられ、又前記のフェノール性水酸基を有しないジカ
ルボン酸の具体例として、フタル酸、イソフタル酸、テ
レフタル酸、4,4’−ビフェニルジカルボン酸、3,
3’−メチレン二安息香酸、4,4’−メチレン二安息
香酸、4,4’−オキシ二安息香酸、4,4’−チオ二
安息香酸、3,3’−カルボニル二安息香酸、4,4’
−カルボニル二安息香酸、4,4’−スルホニル二安息
香酸、1,4−ナフタレンジカルボン酸、1,5−ナフ
タレンジカルボン酸、2,6−ナフタレンジカルボン酸
等が挙げられるが、これらに限定されるものではない。Examples of the dicarboxylic acids having a phenolic hydroxyl group include 5-hydroxyisophthalic acid and 4-hydroxyisophthalic acid.
Hydroxyisophthalic acid, 2-hydroxyphthalic acid, 3
-Hydroxyphthalic acid, 2-hydroxyterephthalic acid, and specific examples of the dicarboxylic acids without phenolic hydroxyl groups include phthalic acid, isophthalic acid, terephthalic acid, 4,4'-biphenyldicarboxylic acid, 3,
3'-methylene dibenzoic acid, 4,4'-methylene dibenzoic acid, 4,4'-oxydibenzoic acid, 4,4'-thiodibenzoic acid, 3,3'-carbonyl dibenzoic acid, 4, 4'
- Carbonyl dibenzoic acid, 4,4'-sulfonyl dibenzoic acid, 1,4-naphthalene dicarboxylic acid, 1,5-naphthalene dicarboxylic acid, 2,6-naphthalene dicarboxylic acid, etc., but are limited to these. It's not a thing.
【0011】更に、前記芳香族ジアミンの具体例として
はm−フェニレンジアミン、p−フェニレンジアミン、
メタトリレンジアミン、4,4’−ジアミノジフェニル
エーテル、3,3’−ジメチル−4,4’−ジアミノジ
フェニルエーテル、3,3’−ジアミノジフェニルエー
テル、3,4’−ジアミノジフェニルエーテル、4,4
’−ジアミノジフェニルチオエーテル、3,3’−ジメ
チル−4,4’−ジアミノジフェニルチオエーテル、3
,3’−ジエトキシ−4,4’−ジアミノジフェニルチ
オエーテル、3,3’−ジアミノジフェニルチオエーテ
ル、4,4’−ジアミノベンゾフェノン、3,3’−ジ
メチル−4,4’−ジアミノベンゾフェノン、3,3’
−ジアミノジフェニルメタン、4,4’−ジアミノジフ
ェニルメタン、3,3’−ジメトキシ−4,4’−ジア
ミノジフェニルメタン、2,2’−ビス(3−アミノフ
ェニル)プロパン、2,2’−ビス(4−アミノフェニ
ル)プロパン、4,4’−ジアミノジフェニルスルホキ
シド、4,4’−ジアミノジフェニルスルホン、ベンジ
ジン、3,3’−ジメチルベンジジン、3,3’−ジメ
トキシベンジジン、3,3’−ジアミノビフェニル、p
−キシリレンジアミン、m−キシリレンジアミン等が挙
げられ、これらを単独又は混合して使用することができ
る。Further, specific examples of the aromatic diamine include m-phenylene diamine, p-phenylene diamine,
Metatolylene diamine, 4,4'-diaminodiphenyl ether, 3,3'-dimethyl-4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4
'-Diaminodiphenylthioether, 3,3'-dimethyl-4,4'-diaminodiphenylthioether, 3
, 3'-diethoxy-4,4'-diaminodiphenylthioether, 3,3'-diaminodiphenylthioether, 4,4'-diaminobenzophenone, 3,3'-dimethyl-4,4'-diaminobenzophenone, 3,3 '
-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,3'-dimethoxy-4,4'-diaminodiphenylmethane, 2,2'-bis(3-aminophenyl)propane, 2,2'-bis(4- aminophenyl)propane, 4,4'-diaminodiphenylsulfoxide, 4,4'-diaminodiphenylsulfone, benzidine, 3,3'-dimethylbenzidine, 3,3'-dimethoxybenzidine, 3,3'-diaminobiphenyl, p
-xylylene diamine, m-xylylene diamine, etc., and these can be used alone or in combination.
【0012】又、両末端にカルボキシル基を持つポリブ
タジエン−アクリロニトリル共重合体は、Goodri
ch社からHycar CTBNとして市販されてお
り、これらを使用することが出来る。[0012] In addition, a polybutadiene-acrylonitrile copolymer having carboxyl groups at both ends is produced by Goodri
It is commercially available as Hycar CTBN from ch company, and these can be used.
【0013】本発明のプリント配線基板用絶縁層として
使用されるエポキシ樹脂組成物は、カップリング剤、染
料や顔料等の着色剤、酸化安定剤、光安定剤等を配合す
ることも出来る。The epoxy resin composition used as the insulating layer for a printed wiring board of the present invention may contain a coupling agent, a coloring agent such as a dye or a pigment, an oxidation stabilizer, a light stabilizer, and the like.
【0014】カップリング剤としては、γ−グリシドキ
シプロピルトリメトキシシラン、γ−グリシドキシプロ
ピルトリエトキシシラン等のシラン系カップリング剤、
イソプロピルトリイソステアロイルチタネート、イソプ
ロピルトリドデシルベンゼンスルホニルチタネート等の
チタネート系カップリング剤を使用して、更に銅箔との
接着強化を計ることが出来る。Examples of the coupling agent include silane coupling agents such as γ-glycidoxypropyltrimethoxysilane and γ-glycidoxypropyltriethoxysilane;
The adhesion to the copper foil can be further strengthened by using a titanate coupling agent such as isopropyl triisostearoyl titanate or isopropyl tridodecylbenzenesulfonyl titanate.
【0015】プリント配線基板用絶縁層として使用され
る本発明のエポキシ樹脂組成物の作製方法として、上記
のエポキシ樹脂、多官能フェノール化合物、一般式(1
)の共重合体、その他必要なイミダゾール化合物等をア
セトン、メチルエチルケトン、トルエン、N,N−ジメ
チルホルムアミド、N,N−ジメチルアセトアミド、N
−メチル−2−ピロリドン等の溶媒に溶解させて、ワニ
ス化して基材に塗布、または繊維に含浸させた後、80
〜200℃の範囲で熱乾燥し、配線基板用プリプレグを
作製する。その際、エポキシ樹脂の一部と一般式(1)
のブロック共重合体を反応させて一旦エポキシ樹脂変成
体からなる反応生成物を作成し、然る後、該反応生成物
をエポキシ樹脂、多官能フェノール化合物およびイミダ
ゾール化合物等の添加剤と共に混合して前記溶媒に溶解
し、ワニス化する方法が強靱な接着性能を得るために好
ましい。前記反応生成物について更に詳述すると、次の
通りである。すなわち、本発明の前記エポキシ樹脂のエ
ポキシ基とブロック共重合体のフェノール性水酸基との
反応は、アミド系溶媒中で反応させることによりこれら
の反応生成物が得られる。アミド系溶媒としては、N,
Nージメチルホルムアミド、N,Nージメチルアセトア
ミド、N−メチル−2−ピロリドン等が用いられる。エ
ポキシ樹脂の使用量は、ブロック共重合体に対して1〜
20倍当量、好ましくは5〜15倍当量であえある。こ
の反応温度は50℃以上好ましくは70℃である。ブロ
ック共重合体の使用量は、本発明の配線基板用エポキシ
樹脂組成物に含有する全ポキシ樹脂に対して1〜15重
量%が好ましい。15重量%を超えて添加しても、大き
な塗膜の強靱性やエリクセン性能は得られないので、好
ましくはない。更に、このプリプレグまたはこのプリプ
レグを更に積層したプリプレグに銅箔を加熱加圧して接
着、本発明のプリント配線基板を製造することができる
。又、液状のエポキシ樹脂を使用して、これらの化合物
を溶解させた無溶媒のエポキシ樹脂組成物を基材に塗布
または繊維に含浸させることも可能である。[0015] As a method for producing the epoxy resin composition of the present invention used as an insulating layer for a printed wiring board, the above epoxy resin, a polyfunctional phenol compound, a compound of the general formula (1
) and other necessary imidazole compounds such as acetone, methyl ethyl ketone, toluene, N,N-dimethylformamide, N,N-dimethylacetamide, N
- After dissolving in a solvent such as methyl-2-pyrrolidone and making it into a varnish and applying it to a base material or impregnating it into fibers,
A wiring board prepreg is produced by heat drying at a temperature of ~200°C. At that time, a part of the epoxy resin and the general formula (1)
A reaction product consisting of a modified epoxy resin is created by reacting a block copolymer of The method of dissolving it in the above-mentioned solvent to form a varnish is preferred in order to obtain strong adhesive performance. Further details of the reaction product are as follows. That is, the reaction between the epoxy group of the epoxy resin of the present invention and the phenolic hydroxyl group of the block copolymer can be carried out in an amide solvent to obtain a reaction product. As the amide solvent, N,
N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, etc. are used. The amount of epoxy resin used is 1 to 1 to 1 for the block copolymer.
The amount is 20 times equivalent, preferably 5 to 15 times equivalent. The reaction temperature is 50°C or higher, preferably 70°C. The amount of the block copolymer used is preferably 1 to 15% by weight based on the total poxy resin contained in the epoxy resin composition for wiring boards of the present invention. Even if it is added in an amount exceeding 15% by weight, it is not preferable because a large coating film toughness or Erichsen performance cannot be obtained. Furthermore, the printed wiring board of the present invention can be manufactured by bonding copper foil to this prepreg or a prepreg obtained by further laminating this prepreg by heating and pressurizing it. It is also possible to use a liquid epoxy resin to coat a base material or impregnate fibers with a solvent-free epoxy resin composition in which these compounds are dissolved.
【0016】このエポキシ樹脂組成物を塗布または含浸
する基材としては、カプトンに代表されるポリイミド樹
脂やアルミ基板などが使用され、繊維としては、セルロ
ース繊維、ガラス繊維、アラミド繊維、カーボン繊維等
が使用される。[0016] As the base material to which this epoxy resin composition is applied or impregnated, polyimide resin represented by Kapton, aluminum substrate, etc. are used, and as the fiber, cellulose fiber, glass fiber, aramid fiber, carbon fiber, etc. are used. used.
【0017】[0017]
【実施例】以下、更に本発明を実施例を以て説明するが
、本発明はこれらに限定されるものではない。
合成例1
フェノール性水酸基含有アラミド−ポリブタジエン−ア
クリロニトリルブロック共重合体(アラミド部に含有す
るフェノール性水酸基が2モル%)の合成;イソフタル
酸19.60g(118mmol)、3、4’−オキシ
ジアニリン26.4g(132mmol)、5−ヒドロ
キシイソフタル酸0.41g(2.3mmol)、塩化
リチウム3.9g、塩化カルシウム12.1g、N−メ
チル−2−ピロリドン240ml、ピリジン54mlを
1リットルの4ツ口丸底フラスコの中に入れ、攪拌溶解
させた後、亜リン酸トリフェニル74gを加えて、90
℃で4時間反応させて、フェノール性水酸基含有アラミ
ドオリゴマー体を生成させた。これに両末端にカルボキ
シル基を持つポリブタジエン−アクリロニトリル共重合
体(Hycar CTBN、BF Goodric
h社製:ポリブタジエンアクリロニトリル部に含有する
アクリロニトリル成分が17モル%で、分子量が約36
00)48gを240mlのピリジンに溶解した液を加
えて、更に4時間反応させた後、室温に冷却、この反応
液をメタノール20リットルに投入して本発明に使用す
るポリブタジエン−アクリロニトリル共重合体部の含有
量が50重量%であるフェノール性水酸基を約2モル%
含有するアラミド−ポリブタジエン−アクリロニトリル
ブロック共重合体を析出させた。この析出ポリマーを更
にメタノール洗浄とメタノール還流により精製した。こ
のポリマーの固有粘度は0.85dl/g(ジメチルア
セトアミド、30℃)であった。ポリマー粉末を拡散反
射法により赤外スペクトルを測定したところ、1674
cm−1にアミドカルボニル基を、2856〜2975
cm−1にブタジエン部分のC−H結合に基づく吸収を
、2245cm−1にニトリル基に基づく吸収を認めた
。[Examples] The present invention will be further explained below with reference to Examples, but the present invention is not limited thereto. Synthesis Example 1 Synthesis of phenolic hydroxyl group-containing aramid-polybutadiene-acrylonitrile block copolymer (2 mol% of phenolic hydroxyl groups contained in the aramid part); 19.60 g (118 mmol) of isophthalic acid, 3,4'-oxydianiline 26.4 g (132 mmol), 0.41 g (2.3 mmol) of 5-hydroxyisophthalic acid, 3.9 g of lithium chloride, 12.1 g of calcium chloride, 240 ml of N-methyl-2-pyrrolidone, and 54 ml of pyridine in 4 liters. Pour into a round-bottomed flask and stir to dissolve, then add 74 g of triphenyl phosphite and add 90 g of triphenyl phosphite.
The mixture was reacted at ℃ for 4 hours to produce a phenolic hydroxyl group-containing aramid oligomer. In addition, polybutadiene-acrylonitrile copolymer having carboxyl groups at both ends (Hycar CTBN, BF Goodric
Manufactured by Company H: The acrylonitrile component contained in the polybutadiene acrylonitrile part is 17 mol%, and the molecular weight is approximately 36.
00) Add a solution of 48 g dissolved in 240 ml of pyridine, react for another 4 hours, cool to room temperature, and add this reaction solution to 20 liters of methanol to prepare the polybutadiene-acrylonitrile copolymer used in the present invention. Approximately 2 mol% of phenolic hydroxyl groups with a content of 50% by weight
The aramid-polybutadiene-acrylonitrile block copolymer contained therein was precipitated. This precipitated polymer was further purified by methanol washing and methanol reflux. The intrinsic viscosity of this polymer was 0.85 dl/g (dimethylacetamide, 30°C). When the infrared spectrum of the polymer powder was measured using the diffuse reflection method, it was found that 1674
Amidocarbonyl group at cm-1, 2856-2975
An absorption based on the C-H bond of the butadiene moiety was observed at cm-1, and an absorption based on the nitrile group was observed at 2245 cm-1.
【0018】合成例2
フェノール性水酸基含有アラミド−ポリブタジエン−ア
クリロニトリルブロック共重合体(アラミド部に含有す
るフェノール性水酸基が14モル%)の合成;合成例1
において、イソフタル酸を19.93g(120mmo
l)、3、4’−オキシジアニリンを30.68g(1
53mmol)、5−ヒドロキシイソフタル酸を3.6
4(20mmol)、両末端にカルボキシル基を持つポ
リブタジエン−アクリロニトリル共重合体(Hycar
CTBN、BF Goodrich製。ポリブタ
ジエンアクリロニトリル部に含有するアクリロニトリル
が17モル%で、分子量が約3600)を55.5gに
代えた以外は合成例1と同様な操作をして重合を行い、
同様な後処理を行い、本発明に使用するフェノール性水
酸基を約14モル%含有するアラミド−ポリブタジエン
−アクリロニトリルブロック共重合体を析出させた。こ
のポリマーの固有粘度は0.82dl/g(ジメチルア
セトアミド、30℃)であった。ポリマー粉末を拡散反
射法により赤外スペクトルを測定したところ、1675
cm−1にアミドカルボニル基を、2854〜2971
cm−1にブタジエン部分のC−H結合に基づく吸収を
、2243cm−1にニトリル基に基づく吸収を認めた
。Synthesis Example 2 Synthesis of phenolic hydroxyl group-containing aramid-polybutadiene-acrylonitrile block copolymer (14 mol% of phenolic hydroxyl groups contained in the aramid part); Synthesis Example 1
, 19.93 g (120 mmo
l), 30.68 g (1
53 mmol), 3.6 5-hydroxyisophthalic acid
4 (20 mmol), polybutadiene-acrylonitrile copolymer with carboxyl groups at both ends (Hycar
CTBN, manufactured by BF Goodrich. Polymerization was carried out in the same manner as in Synthesis Example 1, except that the acrylonitrile contained in the polybutadiene acrylonitrile portion was 17 mol % and the molecular weight was approximately 3600) was replaced with 55.5 g.
A similar post-treatment was performed to precipitate an aramid-polybutadiene-acrylonitrile block copolymer containing about 14 mol% of phenolic hydroxyl groups used in the present invention. The intrinsic viscosity of this polymer was 0.82 dl/g (dimethylacetamide, 30°C). When the infrared spectrum of the polymer powder was measured using the diffuse reflection method, it was found that 1675
Amidocarbonyl group at cm-1, 2854-2971
An absorption based on the C-H bond of the butadiene moiety was observed at cm-1, and an absorption based on the nitrile group was observed at 2243 cm-1.
【0019】<エポキシ樹脂とブロック共重合体との反
応生成物(A)の生成>ジメチルホルムアミド200g
中に合成例1で得られたフェノール性水酸基を2モル%
含有したフェノール性水酸基含有アラミドーポリブタジ
エンアクリロニトリルブロック共重合体24gを溶解さ
せた後、エポキシ樹脂(AER667、ビスフェノール
A型エポキシ樹脂、平均分子量:2600、エポキシ当
量:2000、旭化成工業(株)製)5.7g、反応促
進剤であるトリフェニルホスフィン0.08gを加えて
90℃で2時間反応させた。これを水に添加して樹脂を
析出させ、温水で洗浄を繰り返し、更にテトラハイドロ
フランを加えて減圧下でこれらの溶媒を共沸させた後、
真空乾燥させ、アラミド部にエポキシ樹脂が反応した反
応生成物(A)を得た。この反応生成物(A)1mgを
約30mlのピリジンに溶解した溶液に、フェノール性
水酸基の呈色指示液(無水塩化−鉄(3価)1gをクロ
ロホルム100mlに溶かし、更にピリジン8mlを加
えて後、析出物をろ過して赤色溶液を調整して得られた
)を数滴加えて攪拌したが、全く変色は認められず、こ
の樹脂にはフェノール性水酸基が全てグリシジル基と反
応し、未反応フェノール残基が含有されていないことを
確認した。<Production of reaction product (A) between epoxy resin and block copolymer> 200 g of dimethylformamide
2 mol% of the phenolic hydroxyl group obtained in Synthesis Example 1 in
After dissolving 24 g of the contained phenolic hydroxyl group-containing aramidopolybutadiene acrylonitrile block copolymer, epoxy resin (AER667, bisphenol A epoxy resin, average molecular weight: 2600, epoxy equivalent: 2000, manufactured by Asahi Kasei Corporation) 5 .7 g and 0.08 g of triphenylphosphine as a reaction accelerator were added, and the mixture was reacted at 90° C. for 2 hours. This was added to water to precipitate the resin, washed repeatedly with warm water, and then tetrahydrofuran was added to azeotrope these solvents under reduced pressure.
It was vacuum dried to obtain a reaction product (A) in which the epoxy resin reacted with the aramid part. To a solution in which 1 mg of this reaction product (A) was dissolved in about 30 ml of pyridine, 1 g of anhydrous chloride-iron (trivalent) was dissolved in 100 ml of chloroform, and 8 ml of pyridine was added. (obtained by filtering the precipitate and preparing a red solution) was added and stirred, but no discoloration was observed; all the phenolic hydroxyl groups in this resin had reacted with the glycidyl groups, and no unreacted It was confirmed that no phenol residues were contained.
【0020】<エポキシ樹脂とブロック共重合体との反
応生成物(B)の生成>合成例2で得られたフェノール
性水酸基が約14モル%含有したアラミドーポリブタジ
エンアクリロニトリルブロック共重合体24g、エポキ
シ樹脂14.4(AER667、ビスフェノールA型エ
ポキシ樹脂、平均分子量:2600、エポキシ当量:2
000、旭化成工業(株)製)、硬化剤であるトリフェ
ニルホスフィン0.6mgをジメチルフォルムアミド2
00gに溶解させて樹脂組成物例1と同様な操作を行っ
て、アラミド−ポリブタジエンアクリロニトリルブロッ
ク共重合体とエポキシ樹脂との反応生成物(B)を得た
。この反応生成物(B)1mgを約30mlのピリジン
に溶解した溶液にフェノール性水酸基の呈色指示液(無
水塩化鉄(3価)1gをクロロホルム100mlに溶か
し、更にピリジン8mlを加えて後、析出物をろ過して
赤色溶液を調整して得られた)を数滴加えて攪拌したが
、全く変色は認められず、この樹脂にはフェノール性水
酸基が全てグリシジル基と反応し、未反応フェノール残
基が含有されていないことを確認した。<Production of reaction product (B) of epoxy resin and block copolymer> 24 g of the aramidopolybutadiene acrylonitrile block copolymer containing about 14 mol% of phenolic hydroxyl groups obtained in Synthesis Example 2, epoxy Resin 14.4 (AER667, bisphenol A type epoxy resin, average molecular weight: 2600, epoxy equivalent: 2
000, manufactured by Asahi Kasei Industries, Ltd.), 0.6 mg of triphenylphosphine, a curing agent, was added with dimethylformamide 2
A reaction product (B) of an aramid-polybutadiene acrylonitrile block copolymer and an epoxy resin was obtained by dissolving the mixture in 0.0 g and performing the same operation as in Resin Composition Example 1. To a solution of 1 mg of this reaction product (B) dissolved in about 30 ml of pyridine, 1 g of anhydrous iron chloride (trivalent), anhydrous iron chloride (trivalent), was dissolved in 100 ml of chloroform, and 8 ml of pyridine was added, followed by precipitation. A few drops of the red solution (obtained by filtering the substance and preparing a red solution) were added and stirred, but no discoloration was observed; all the phenolic hydroxyl groups in this resin reacted with the glycidyl groups, and unreacted phenol remained. It was confirmed that no groups were contained.
【0021】実施例1
臭素化ビスフェノールA型エポキシ樹脂(エポキシ
当量:550) 77g 反応生成物(A)
10g フェ
ノールノボラック型エポキシ樹脂(エポキシ当量:20
0) 20g フェノールノボラック樹脂
30g エチルアミン塩酸塩
2g
γ−グリシドキプロピルトリメトキシシラン
2g 1−
シアノエチル−2−フェニルイミダゾール
0.2g上記の各化合物
をメチルエチルケトンに溶解し、不揮発分60%のワニ
スとした。このワニスを厚さ1mm、大きさ50×50
mmのガラス布に含浸後、130℃で10分間加熱乾燥
してプリプレグを得た。Example 1 Brominated bisphenol A type epoxy resin (epoxy equivalent: 550) 77g Reaction product (A)
10g phenol novolac type epoxy resin (epoxy equivalent: 20
0) 20g phenol novolak resin
30g ethylamine hydrochloride
2g
γ-glycidoxypropyltrimethoxysilane
2g 1-
Cyanoethyl-2-phenylimidazole
0.2 g of each of the above compounds was dissolved in methyl ethyl ketone to prepare a varnish with a nonvolatile content of 60%. Apply this varnish to a thickness of 1 mm and a size of 50 x 50
A prepreg was obtained by impregnating a glass cloth with a diameter of 1.0 mm and then heating and drying it at 130° C. for 10 minutes.
【0022】実施例2
実施例1において使用した反応生成物(A)10gを反
応生成物(B)15gに代え、更に臭素化ビスフェノー
ルA型エポキシ樹脂77gを75gに代えた以外は全く
実施例1と同じ方法でプリプグを得た。Example 2 Example 1 was completely repeated, except that 10 g of the reaction product (A) used in Example 1 was replaced with 15 g of the reaction product (B), and 77 g of the brominated bisphenol A epoxy resin was replaced with 75 g. I got prepug in the same way.
【0023】実施例3
実施例1において使用した反応生成物(A)10gを反
応生成物(B)30gに代え、更に臭素化ビスフェノー
ルA型エポキシ樹脂77gを65gに代えた以外は実施
例1と全く同じ方法でプリプレグを得た。Example 3 Same as Example 1 except that 10 g of the reaction product (A) used in Example 1 was replaced with 30 g of the reaction product (B), and 77 g of the brominated bisphenol A epoxy resin was replaced with 65 g. Prepreg was obtained in exactly the same way.
【0024】実施例4
臭素化ビスフェノールA型エポキシ樹脂(エポキシ
当量:530) 75g 反応生成物(B)
15g フェ
ノールノボラック型エポキシ樹脂(エポキシ当量:20
0) 20g フェノールノボラック樹脂
30g エチルアミン塩酸塩
2g
γ−グリシドキプロピルトリメトキシシラン
2g 1−
シアノエチル−2−フェニルイミダゾール
0.2g上記の化合物を
N−ジメチルアセトアミドに溶解し、不揮発分25%の
ワニスとした。このワニスを厚さ125μm、大きさ5
0×50mmのカプトンに塗布後、130℃で10分間
加熱乾燥してプリプレグを得た。Example 4 Brominated bisphenol A type epoxy resin (epoxy equivalent: 530) 75g Reaction product (B)
15g phenol novolac type epoxy resin (epoxy equivalent: 20
0) 20g phenol novolak resin
30g ethylamine hydrochloride
2g
γ-glycidoxypropyltrimethoxysilane
2g 1-
Cyanoethyl-2-phenylimidazole
0.2 g of the above compound was dissolved in N-dimethylacetamide to prepare a varnish with a nonvolatile content of 25%. This varnish has a thickness of 125 μm and a size of 5
After coating on a 0x50 mm Kapton, it was heated and dried at 130°C for 10 minutes to obtain a prepreg.
【0025】実施例5
実施例4において使用した反応生成物(B)15gを3
0gに、更に、臭素化ビスフェノールA型エポキシ樹脂
75gを65gに代えた以外は全く実施例4と同じ方法
でプリプレグを得た。Example 5 15 g of the reaction product (B) used in Example 4 was
A prepreg was obtained in exactly the same manner as in Example 4, except that 0 g of the brominated bisphenol A type epoxy resin was replaced with 65 g of the brominated bisphenol A epoxy resin.
【0026】比較例1
実施例1において使用した反応生成物(A)を除き、更
に、臭素化ビスフェノールA型エポキシ樹脂75gを8
0gに代えた以外は全く実施例1と同じ方法でプリプレ
グを得た。Comparative Example 1 In addition to the reaction product (A) used in Example 1, 75 g of brominated bisphenol A type epoxy resin was added to 8
A prepreg was obtained in the same manner as in Example 1 except that the amount was changed to 0 g.
【0027】比較例2
実施例4において使用した反応生成物(B)を除き、更
に、臭素化ビスフェノールA型エポキシ樹脂75gを8
0gに代えた以外は全く実施例4と同じ方法でプリプレ
グを得た。Comparative Example 2 In addition to the reaction product (B) used in Example 4, 75 g of brominated bisphenol A type epoxy resin was added to 8
A prepreg was obtained in the same manner as in Example 4 except that the amount was changed to 0 g.
【0028】比較例3
実施例4において使用した反応生成物(B)を除き、更
に、臭素化ビスフェノールA型エポキシ樹脂75gを8
0gに、フェノールノボラック樹脂30gをジシアミン
ジアミド4gに代えた以外は全く実施例4と同じ方法で
プリプレグを得た。Comparative Example 3 In addition to the reaction product (B) used in Example 4, 75 g of brominated bisphenol A type epoxy resin was added to 8
A prepreg was obtained in the same manner as in Example 4, except that 30 g of the phenol novolac resin was replaced with 4 g of dicyamine diamide.
【0029】実施例1〜3、比較例1で得たプリプレグ
を3枚と厚さ35μm、大きさ50×50mmの銅箔2
枚を用いて、170℃、100分、50kg/cm2
の条件で加熱加圧して銅張積層板を作製した。更に、こ
の銅張積層板の両側に前記したプリプレグを同じ条件で
積層、加熱加圧して、三層の配線基板を作製した。又、
実施例4と5、比較例2と3で得たカプトン上に形成し
たプリプレグに同じ35μmの銅箔を積層し、170℃
、100分、50kg/cm2 の条件で加熱加圧して
銅張積層板を作製した。これら銅箔回路配線基板に対し
て、スミア発生率状況観察、銅箔引き剥し強さ測定、折
り曲げ試験を行った。これらの結果を表1に示す。
スミア発生率評価:ドリル加工した配線基板にスルーホ
ールメッキを施し、スルーホール部の切断面を顕微鏡に
て穴の内層銅とスルーホールメッキ銅との接続部分を観
察し、スミア発生状況を調べた(実施例1〜3、比較例
1の試料に対してのみ行った)。
銅箔引き剥し強さ評価:配線基板上の銅箔に1mm幅の
ラインを形成した。このラインは、基板上の銅箔にネガ
型ドライフィルム(ヘキスト社製、OZAPECF52
5)を貼り合わせ、露光、現像後40Bёの塩化第二鉄
水溶液でエッチンッグして形成した。そのラインの90
度方向の引き剥し強さを50mm/minの引き剥し速
度で測定した(実施例1〜5、比較例1〜3の試料に対
して行った)。なお表1における常温とは25℃を、又
加熱とは155℃で240時間加熱処理後を示す。
折り曲げ試験:回路基板を180度折り曲げて、その折
り曲げ部分にクラックが形成されたか否かで可及び不可
の評価を下した(実施例4と5、比較例2と3の試料に
対して行った)。[0029] Three prepreg sheets obtained in Examples 1 to 3 and Comparative Example 1 and a copper foil 2 with a thickness of 35 μm and a size of 50 x 50 mm.
170℃, 100 minutes, 50kg/cm2
A copper-clad laminate was produced by heating and pressing under the following conditions. Further, the prepreg described above was laminated on both sides of this copper-clad laminate under the same conditions, and heated and pressed to produce a three-layer wiring board. or,
The same 35 μm copper foil was laminated on the prepreg formed on Kapton obtained in Examples 4 and 5 and Comparative Examples 2 and 3, and heated at 170°C.
A copper-clad laminate was produced by heating and pressing under the conditions of 100 minutes and 50 kg/cm2. These copper foil circuit wiring boards were subjected to observation of smear occurrence rate, measurement of copper foil peeling strength, and bending test. These results are shown in Table 1. Evaluation of smear occurrence rate: Through-hole plating was applied to a drilled wiring board, and the connection between the inner layer copper of the hole and the through-hole plated copper was observed using a microscope on the cut surface of the through-hole section, and the occurrence of smear was investigated. (This was carried out only for the samples of Examples 1 to 3 and Comparative Example 1). Copper foil peel strength evaluation: A 1 mm wide line was formed on the copper foil on the wiring board. This line uses a negative dry film (manufactured by Hoechst, OZAPECF52) on the copper foil on the board.
5) were bonded together, exposed, developed, and etched with 40 Bё of ferric chloride aqueous solution. 90 of that line
The peel strength in the degree direction was measured at a peel rate of 50 mm/min (measured for the samples of Examples 1 to 5 and Comparative Examples 1 to 3). In Table 1, normal temperature means 25°C, and heating means after heat treatment at 155°C for 240 hours. Bending test: The circuit board was bent 180 degrees, and an evaluation of pass or fail was made based on whether or not a crack was formed at the bent part (this was done on samples of Examples 4 and 5 and Comparative Examples 2 and 3). ).
【0030】[0030]
【表1】[Table 1]
【発明の効果】本発明のエポキシ樹脂組成物を絶縁層と
する配線基板は、スミアの発生が少なく、銅箔との強い
接着性、強靱性を有するので好適に使用できる。Effects of the Invention A wiring board having an insulating layer made of the epoxy resin composition of the present invention can be suitably used because it causes less smearing and has strong adhesion to copper foil and toughness.
Claims (1)
ノール化合物、イミダゾール化合物および一般式(1)
で示すフェノール性水酸基含有アラミド−ポリブタジエ
ン−アクリロニトリルブロック共重合体とを含有するこ
とを特徴とする配線基板用エポキシ樹脂組成物。 【化1】 (式中x=3〜7の整数、y=1〜4の整数、y/(x
+y)=0.1〜0.3、z=5〜15の整数、m=1
〜400の整数、n=1〜400の整数、n/(m+n
)=0.01〜0.50、l=1〜50の整数、Ar1
、Ar3 は二価の芳香族基、Ar2 はフェノール
性水酸基を含有する二価の芳香族基を示す)【請求項2
】 多官能フェノール化合物が、ノボラック型フェノ
ール樹脂であることを特徴とする請求項1記載の配線基
板用エポキシ樹脂組成物。Claim 1: At least an epoxy resin, a polyfunctional phenol compound, an imidazole compound, and the general formula (1)
An epoxy resin composition for a wiring board, comprising a phenolic hydroxyl group-containing aramid-polybutadiene-acrylonitrile block copolymer. [Formula 1] (where x = integer from 3 to 7, y = integer from 1 to 4, y/(x
+y) = 0.1 to 0.3, z = integer of 5 to 15, m = 1
~400 integer, n=1~400 integer, n/(m+n
) = 0.01 to 0.50, l = integer of 1 to 50, Ar1
, Ar3 represents a divalent aromatic group, Ar2 represents a divalent aromatic group containing a phenolic hydroxyl group) [Claim 2
10. The epoxy resin composition for wiring boards according to claim 1, wherein the polyfunctional phenol compound is a novolac type phenol resin.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3144065A JP3017562B2 (en) | 1991-05-21 | 1991-05-21 | Epoxy resin composition for wiring boards |
US07/851,801 US5258456A (en) | 1991-03-15 | 1992-03-16 | Epoxy resin with phenolic OH-aramide/ban block copolymer |
US08/097,890 US5334661A (en) | 1991-03-15 | 1993-07-28 | Epoxy resin reacted with phenolic OH-aramide/ban |
US08/149,371 US5334662A (en) | 1991-03-15 | 1993-11-09 | Epoxy resin/phenolic OH-aramid/ban block copolymer product with CTBN |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3144065A JP3017562B2 (en) | 1991-05-21 | 1991-05-21 | Epoxy resin composition for wiring boards |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04342720A true JPH04342720A (en) | 1992-11-30 |
JP3017562B2 JP3017562B2 (en) | 2000-03-13 |
Family
ID=15353488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3144065A Expired - Fee Related JP3017562B2 (en) | 1991-03-15 | 1991-05-21 | Epoxy resin composition for wiring boards |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3017562B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0834835A (en) * | 1994-07-26 | 1996-02-06 | Hitachi Chem Co Ltd | Epoxy resin composition and cured product thereof |
JP2002527551A (en) * | 1998-10-13 | 2002-08-27 | スリーエム イノベイティブ プロパティズ カンパニー | High strength epoxy adhesive and its use |
JP2006527278A (en) * | 2003-06-06 | 2006-11-30 | ダウ グローバル テクノロジーズ インコーポレイティド | Curable flame retardant epoxy resin composition |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU1876197A (en) | 1996-03-13 | 1997-10-01 | W.L. Gore & Associates Gmbh | Gasket with corrosion inhibitor |
-
1991
- 1991-05-21 JP JP3144065A patent/JP3017562B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0834835A (en) * | 1994-07-26 | 1996-02-06 | Hitachi Chem Co Ltd | Epoxy resin composition and cured product thereof |
JP2002527551A (en) * | 1998-10-13 | 2002-08-27 | スリーエム イノベイティブ プロパティズ カンパニー | High strength epoxy adhesive and its use |
JP2011122147A (en) * | 1998-10-13 | 2011-06-23 | Three M Innovative Properties Co | High-strength epoxy adhesive and use thereof |
JP2006527278A (en) * | 2003-06-06 | 2006-11-30 | ダウ グローバル テクノロジーズ インコーポレイティド | Curable flame retardant epoxy resin composition |
Also Published As
Publication number | Publication date |
---|---|
JP3017562B2 (en) | 2000-03-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108690194B (en) | Polyimide, adhesive material, adhesive layer, adhesive sheet, copper foil, copper-clad laminate, wiring board, and method for producing same | |
KR100842024B1 (en) | Polyamide Resin-Containing Composition and Manufacturing Method Thereof | |
KR20030034106A (en) | Epoxy resin composition and cured object obtained therefrom | |
CN108690552B (en) | Adhesive, adhesive material, adhesive layer, adhesive sheet, copper foil, copper-clad laminate, wiring board, and method for producing same | |
CN106995678B (en) | Polyimide adhesive | |
CN106010421A (en) | Adhesive composition, film adhesive, adhesive layer, adhesive sheet, copper-clad laminate, wiring board and printing circuit board | |
TW201619292A (en) | Polyimide resin composition, adhesion composition, primer composition, lamination body and resin-adhered copper foil | |
JP4616771B2 (en) | Flame retardant epoxy resin composition and cured product thereof | |
CN106947079B (en) | Modified polyimide, adhesive composition, copper foil with resin, copper-clad laminate, printed wiring board, and multilayer substrate | |
TWI700320B (en) | Resin composition, and pre-preg, metal-clad laminate, and printed circuit board using the same | |
US5180627A (en) | Heat resistant adhesive composition | |
WO2008072630A1 (en) | Polyamide resin, epoxy resin composition using the same, and use of the composition | |
JP2001220557A (en) | Epoxy resin composition adhesive sheet | |
JP2001081282A (en) | Epoxy resin composition and flexible printed wiring board material containing the same | |
JP3638404B2 (en) | Flexible printed wiring board | |
JPH04342720A (en) | Epoxy resin composition for wiring substrate | |
JP3485169B2 (en) | Cyanate / epoxy resin composition and prepreg, metal foil-clad laminate and printed wiring board using the same | |
JP4919659B2 (en) | Polyamide resin composition, epoxy resin composition and use thereof | |
JP4197611B2 (en) | Epoxy resin composition and flexible printed wiring board material using the same | |
JP2001123132A (en) | Epoxy resin composition adhesive sheet | |
JP4042886B2 (en) | Epoxy resin composition and flexible printed wiring board material using the same | |
JP2001233945A (en) | Electroless-platable highly heat resistant epoxy resin composition, insulation material for buildup using it and buildup base plate | |
JP4038831B2 (en) | Varnish, resin-coated copper foil and laminate | |
JP2001302761A (en) | Thermosetting resin composition, cured item, prepreg for laminate, and printed circuit substrate | |
JPS62207322A (en) | Thermosetting resin composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19991130 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071224 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081224 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091224 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091224 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101224 Year of fee payment: 11 |
|
LAPS | Cancellation because of no payment of annual fees |