JPH04335595A - Water cleaning method of soldered printed-circuit board - Google Patents
Water cleaning method of soldered printed-circuit boardInfo
- Publication number
- JPH04335595A JPH04335595A JP10711391A JP10711391A JPH04335595A JP H04335595 A JPH04335595 A JP H04335595A JP 10711391 A JP10711391 A JP 10711391A JP 10711391 A JP10711391 A JP 10711391A JP H04335595 A JPH04335595 A JP H04335595A
- Authority
- JP
- Japan
- Prior art keywords
- water
- circuit board
- cleaning method
- soldered
- water cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 238000004140 cleaning Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000002518 antifoaming agent Substances 0.000 claims abstract description 15
- 230000004907 flux Effects 0.000 claims abstract description 13
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims abstract description 11
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 claims abstract description 10
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910000679 solder Inorganic materials 0.000 claims abstract description 9
- 238000005406 washing Methods 0.000 claims description 10
- 239000006071 cream Substances 0.000 claims description 8
- 239000012535 impurity Substances 0.000 abstract description 8
- 150000003839 salts Chemical class 0.000 abstract description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000009413 insulation Methods 0.000 description 7
- 150000002500 ions Chemical group 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- -1 amine salt Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- BTXXTMOWISPQSJ-UHFFFAOYSA-N 4,4,4-trifluorobutan-2-one Chemical compound CC(=O)CC(F)(F)F BTXXTMOWISPQSJ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- BQACOLQNOUYJCE-FYZZASKESA-N Abietic acid Natural products CC(C)C1=CC2=CC[C@]3(C)[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1 BQACOLQNOUYJCE-FYZZASKESA-N 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical class Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- YPHMISFOHDHNIV-FSZOTQKASA-N cycloheximide Chemical compound C1[C@@H](C)C[C@H](C)C(=O)[C@@H]1[C@H](O)CC1CC(=O)NC(=O)C1 YPHMISFOHDHNIV-FSZOTQKASA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 235000013373 food additive Nutrition 0.000 description 1
- 239000002778 food additive Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003784 tall oil Substances 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はロジン系フラックスとク
リームハンダを使用してハンダ付けしたプリント基板の
水洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for washing printed circuit boards soldered using rosin flux and cream solder.
【0002】0002
【従来の技術】現在、電子機器用には一般に、松脂をペ
ースとしたロジン系フラックスとクリームハンダが使用
され、ハンダ付けした後、フロンなどの有機溶剤で洗浄
している。2. Description of the Related Art Currently, rosin-based flux and cream solder containing pine resin as a paste are generally used for electronic devices, and after soldering, they are cleaned with an organic solvent such as chlorofluorocarbon.
【0003】しかし、近年フロンによるオゾン層破壊の
問題やトリクロロエチレン類の発ガン性の疑いなど、環
境破壊や労働衛生の立場より各種有機溶剤の規制が強く
なり、その対応が迫られている。その対応策としてすべ
ての成分が水溶性である水溶性洗浄水が注目されてきた
。従来の水溶性洗浄水の組成を簡単に説明すると、水/
アルコール/界面活性剤で構成されている。その水は塩
類と不純物の最良の溶剤であり、水のアミン塩溶解量は
300mg/ccとアルコールの約300倍の溶解量の
ために、アルコールの希釈溶媒としても最も有効な溶媒
である。However, in recent years, regulations on various organic solvents have become stricter from the standpoint of environmental destruction and occupational health, such as the problem of ozone layer depletion due to fluorocarbons and the suspicion of carcinogenicity of trichlorethylene, and countermeasures have been required. As a countermeasure to this problem, water-soluble cleaning water in which all components are water-soluble has been attracting attention. A simple explanation of the composition of conventional water-soluble cleaning water is water/
Composed of alcohol/surfactant. Water is the best solvent for salts and impurities, and because the amount of amine salt dissolved in water is 300 mg/cc, about 300 times that of alcohol, it is also the most effective solvent for diluting alcohol.
【0004】水はプリント基板表面に付着する不純物を
引きはなす力はないが、アルコールは特定の不純物を溶
解し、かつ、乾燥度を飛躍的に高め乾燥時間を大幅に短
縮する。[0004] Water does not have the power to remove impurities adhering to the surface of a printed circuit board, but alcohol dissolves specific impurities and dramatically increases the degree of dryness and significantly shortens the drying time.
【0005】界面活性剤は低濃度で水,アルコールの表
面エネルギー(表面張力)を下げることができるために
電子部品相互間の狭い隙間にまで浸入して、ハンダ付け
後に残存する塩類を除去する。Since surfactants can lower the surface energy (surface tension) of water and alcohol at low concentrations, they penetrate into narrow gaps between electronic components and remove salts remaining after soldering.
【0006】[0006]
【発明が解決しようとする課題】上述した従来の水溶性
洗浄水は、界面活性剤を含んでいるので、電子部品相互
間に浸入する程度には表面張力が低下しているが、泡立
ちが生じない程度までには表面張力が低下していない。
すなわち、従来の水溶性洗浄水または加温水は依然とし
て表面張力が大きい(水の表面張力:73dynes/
cm25℃)ので泡立ち、その泡が障害となって、塩類
や不純物を良好に除去することができないという問題を
有していた。[Problems to be Solved by the Invention] The above-mentioned conventional water-soluble cleaning water contains surfactants, so the surface tension is lowered to the extent that it can penetrate between electronic components, but foaming occurs. The surface tension has not decreased to such an extent. In other words, conventional water-soluble cleaning water or heated water still has a large surface tension (surface tension of water: 73 dynes/
cm 25° C.), it foams, and the foam becomes a hindrance, making it impossible to remove salts and impurities satisfactorily.
【0007】特に、ロジン系フラックスは水溶性が乏し
いので、水洗浄によっては十分に塩類や不純物を除去す
ることができないという問題があった。In particular, since rosin-based flux has poor water solubility, there is a problem in that salts and impurities cannot be sufficiently removed by washing with water.
【0008】ロジン系フラックスとクリームハンダは、
金属表面酸化物を除去するための活性剤とフラックスの
流動を調整するためのアルコール類とを含んでいる。そ
して、活性剤は有機酸,有機アミン,有機アミン塩酸塩
,臭化水素酸塩,塩化亜鉛等を混合しており、アルコー
ル類は一価,二価および/または三価の脂肪施アルコー
ル(ポリグリコール)等を混合している。活性剤は酸性
であるので、ハンダ付け後、部品表面に残る。[0008] Rosin flux and cream solder are
It contains an activator to remove metal surface oxides and alcohols to adjust flux flow. The activator is a mixture of organic acids, organic amines, organic amine hydrochlorides, hydrobromides, zinc chloride, etc., and the alcohols are monovalent, divalent and/or trivalent fatty alcohols (polymerized alcohols). glycol), etc. Since the activator is acidic, it remains on the surface of the component after soldering.
【0009】このようなロジン系フラックスとクリーム
ハンダにおいて、従来の水溶性洗浄水では、洗浄時の泡
が障害となって、前記の塩類とフラックス中の不純物,
銅塩化物,銅アビエチン酸が電子パーツの表面または隙
間に残り金属部分を腐食させ、絶縁を劣化させることが
多かった。さらに、回路パターンにマイグレーションが
成長して回路不良になるという問題もあった。[0009] In such rosin-based flux and cream solder, when using conventional water-soluble cleaning water, bubbles during cleaning become an obstacle, and the above-mentioned salts and impurities in the flux are removed.
Copper chloride and copper abietic acid often remained on the surfaces or gaps of electronic parts, corroding metal parts and deteriorating insulation. Furthermore, there is also the problem that migration grows in the circuit pattern, resulting in circuit defects.
【0010】本発明の目的は、以上のような問題点を解
決し、泡による障害をなくして、腐食性の塩類と不純物
を残さず除去することのできる、ハンダ付けプリント基
板の水洗浄方法を提供することにある。The purpose of the present invention is to solve the above-mentioned problems, and to provide a method for cleaning soldered printed circuit boards with water, which eliminates problems caused by bubbles and removes corrosive salts and impurities without leaving any residue. It is about providing.
【0011】[0011]
【課題を解決するための手段】上記目的を達成するため
に、本発明の水洗浄方法は消泡剤を含む洗浄水を使用す
ることを特徴とする。Means for Solving the Problems In order to achieve the above object, the water washing method of the present invention is characterized in that washing water containing an antifoaming agent is used.
【0012】0012
【実施例】本発明の水洗浄方法に使用し得る消泡剤は現
在100種市販されている。これを分類すると、鉱油系
,油脂系,脂肪酸系,脂肪酸エステル系,低級アルコー
ル,高級アルコール,ポリオキシアルキレン系,アミド
系,リン酸エステル系,金属セッケン系およびシリコン
系等がある。さらに、具体的に種類を説明するとイソプ
ロパノール,ブタノール,アミルアルコール,オレイン
酸,トール油,金属セッケン,ポリプロピレングリコー
ル,ポリプロピレングリコール誘導体,シリコン樹脂,
シリコン樹脂の界面活性剤配合品,シリコン樹脂の無機
粉末配合品等がある。EXAMPLE There are currently 100 types of antifoaming agents on the market that can be used in the water washing method of the present invention. When classified, there are mineral oil-based, oil-based, fatty acid-based, fatty acid ester-based, lower alcohol, higher alcohol, polyoxyalkylene-based, amide-based, phosphoric acid ester-based, metal soap-based, and silicon-based. Furthermore, to explain the specific types, isopropanol, butanol, amyl alcohol, oleic acid, tall oil, metal soap, polypropylene glycol, polypropylene glycol derivatives, silicone resin,
There are products containing silicone resin with surfactants, and products containing silicone resin with inorganic powder.
【0013】本実施例では、これらの消泡剤の中から、
溶解度が低く、表面張力,界面張力が低く、分散性,拡
散性が良好で、比重が小さく、比較的アルカリや熱に強
いコンパクトタイプのシリコンを選定した。後述する試
験方法による試験によると、消泡剤含有量が0.000
1%以下のときは効果が認められず、1%以上では安定
な泡が発生するために有効でないことが認められた。[0013] Among these antifoaming agents, in this example,
We selected a compact type of silicon that has low solubility, low surface tension and interfacial tension, good dispersibility and diffusivity, low specific gravity, and is relatively resistant to alkali and heat. According to the test according to the test method described below, the antifoaming agent content was 0.000.
When it was less than 1%, no effect was observed, and when it was more than 1%, stable foam was generated, making it ineffective.
【0014】次に、消泡剤として0.1%のシリコンを
含有した洗浄水にて洗浄した試験について説明する。[0014] Next, a test will be described in which cleaning was performed using cleaning water containing 0.1% silicone as an antifoaming agent.
【0015】図1は試験用プリント基板の平面図、図2
はイオン残渣量を示す図、図3は絶縁抵抗値の結果を示
す図である。FIG. 1 is a plan view of the test printed circuit board, and FIG.
3 is a diagram showing the amount of ion residue, and FIG. 3 is a diagram showing the results of the insulation resistance value.
【0016】図1に示すように、プリント基板上に、パ
ターン幅W=1.0mm,間隔L=0.2mmのクシ形
銅ハク電極パターンPを作り、このパターン上にIC,
コンデンサ,ICソケット等の電子部品を搭載できる試
験用プリント基板を作成した。このプリント基板に電子
部品を搭載し、ロジン系フラックス(タムラ化研のCF
−330VS)を常温で2秒Dipして発泡塗布し、1
00℃でプレヒートした後、自動ハンダ付け装置で電子
部品をハンダ付けした。1例として、この基板の水洗工
程は、60℃温純水プリウォッシュ1分→水/60%ア
ルコール/1%界面活性剤/0.1%消泡剤(トーレー
シリコン(株)SH−29PA,東芝シリコン(株)T
SA730)の混合水でウォッシュ2分→温純水リンス
1分で、洗浄を行った。この消泡剤、すなわちシリコン
は化学薬品安定性,熱安定性に優れ、搭載された電子部
品,プラスチック,ゴムに全く影響はなかった。シリコ
ン系SH−29PA,シリコン系TSA730は共に水
系タイプであるがSH−29PAは溶剤にも使用できる
。As shown in FIG. 1, a comb-shaped copper strip electrode pattern P with a pattern width W=1.0 mm and a spacing L=0.2 mm is made on a printed circuit board, and ICs,
A test printed circuit board was created on which electronic components such as capacitors and IC sockets could be mounted. Electronic components are mounted on this printed circuit board, and rosin-based flux (Tamura Kaken's CF
-330VS) at room temperature for 2 seconds to foam and apply.
After preheating at 00°C, electronic components were soldered using an automatic soldering device. As an example, the water washing process for this substrate is as follows: 60°C warm pure water prewash for 1 minute → water/60% alcohol/1% surfactant/0.1% antifoaming agent (Toray Silicon Co., Ltd. SH-29PA, Toshiba Silicon Co., Ltd.T
Washing was carried out by washing with mixed water of SA730 for 2 minutes and then rinsing with warm pure water for 1 minute. This antifoaming agent, silicone, has excellent chemical stability and thermal stability, and had no effect on the electronic components, plastics, and rubber mounted on it. Silicon-based SH-29PA and silicon-based TSA730 are both water-based types, but SH-29PA can also be used as a solvent.
【0017】洗浄後エアーブローにて熱風乾燥したプリ
ント基板をオメガメータ(日本アルファメタルズ製,ス
タティック方式,6008MD)によりイオン残渣を測
定した結果を図2に示す。このオメガメータの原理は一
定量の抽出溶液(1PA75%,純水)に測定物の残留
イオンを抽出し、この溶液の電気抵抗を測定し、得られ
た電気抵抗値をマイクロプロセッサにより同量のNaC
lイオンに変換するというものである。得られるイオン
残渣量の単位はmgNaCl/Sq−inである。図2
中、Aは従来技術による比較例で、B,Cは本発明によ
る実施例である.Bはアルコール/界面活性剤/SH−
29PA,Cはアルコール/界面活性剤/TSA730
で、いずれも明らかに泡による洗浄障害が少ないために
比較例Aのイオン残渣量より少ない。FIG. 2 shows the results of measuring the ion residue on the printed circuit board that had been cleaned and dried with hot air using an omega meter (manufactured by Nippon Alpha Metals, static method, 6008MD). The principle of this omega meter is to extract the residual ions of the sample into a certain amount of extraction solution (1PA 75%, pure water), measure the electrical resistance of this solution, and use the microprocessor to calculate the electrical resistance value of the same amount. NaC
It is converted into l ions. The unit of the amount of ion residue obtained is mgNaCl/Sq-in. Figure 2
Among them, A is a comparative example based on the prior art, and B and C are examples according to the present invention. B is alcohol/surfactant/SH-
29PA,C is alcohol/surfactant/TSA730
In both cases, the amount of ion residue is smaller than that of Comparative Example A because there is clearly less cleaning interference due to bubbles.
【0018】次に図3について説明する。図1に示した
クシ形銅ハク基板のクシ形電極の絶縁抵抗を測定し、そ
の後温度40℃,相対湿度90〜95%の雰囲気下で,
D,C,30Vを300時間印加し、絶縁抵抗値を測定
した。その結果、図3のB,Cで示したように絶縁劣化
は300時間後も極めて少なかった。また、他のシリコ
ン系消泡剤,SH−7PA,SH−28PA,SH−3
0PA,TSA720においても同様な結果が得られた
。もちろん、本発明で使用したシリコンは食品衛生法で
食品添加物として許可されているので人,環境へのダメ
ージはない。さらに、ロジン系フラックス,クリームハ
ンダに有効であり、かつ水溶性フラックス,水溶性クリ
ームハンダにも極めて優れた水洗浄方法である。Next, FIG. 3 will be explained. The insulation resistance of the comb-shaped electrode of the comb-shaped copper foil board shown in Fig. 1 was measured, and then in an atmosphere with a temperature of 40°C and a relative humidity of 90 to 95%.
D, C, 30V was applied for 300 hours, and the insulation resistance value was measured. As a result, as shown in B and C in FIG. 3, insulation deterioration was extremely small even after 300 hours. In addition, other silicone antifoaming agents, SH-7PA, SH-28PA, SH-3
Similar results were obtained with 0PA and TSA720. Of course, the silicon used in the present invention is permitted as a food additive under the Food Sanitation Act, so there is no damage to humans or the environment. Furthermore, this water cleaning method is effective for rosin-based flux and cream solder, and is also excellent for water-soluble flux and water-soluble cream solder.
【0019】なお、上記試験方法による試験結果では、
消泡剤の含有量を0.0001%〜1%とするのが望ま
しいことが確認されたが、1ppm以下あるいは1%以
上でも本発明の効果を損なうものでなければ全て本発明
に含まれる。さらに、シリコン以外の消泡剤も全て本発
明に含まれる。[0019] In addition, the test results according to the above test method are as follows:
It has been confirmed that it is desirable that the content of the antifoaming agent be 0.0001% to 1%, but any content of 1 ppm or less or 1% or more is included in the present invention as long as it does not impair the effects of the present invention. Furthermore, all antifoaming agents other than silicone are also included in the present invention.
【0020】[0020]
【発明の効果】本発明によれば、消泡剤を含む洗浄水を
使用することにより、ハンダ付け後にプリント基板に残
ったロジン系フラックス,クリームハンダは完全に洗浄
されて、電食,絶縁低下のない信頼性の極めて高い電子
機器用実装プリント基板が得られる。さらに、本発明の
水洗浄方法では、作業性,生産性低下,排水量増大排水
トラブル等もなく、水質汚濁防止法および下水道法に基
づく処理も不必要となり省資源,省エネルギーからも極
めて有用である。According to the present invention, by using cleaning water containing an antifoaming agent, the rosin flux and cream solder remaining on the printed circuit board after soldering are completely washed away, preventing electrolytic corrosion and deterioration of insulation. A mounted printed circuit board for electronic equipment with extremely high reliability without any problems can be obtained. Furthermore, the water washing method of the present invention does not reduce workability, productivity, increase drainage volume, or cause drainage troubles, and does not require treatment based on the Water Pollution Control Law or the Sewerage Law, making it extremely useful in terms of resource and energy conservation.
【図1】本発明の試験用プリント基板の平面図。FIG. 1 is a plan view of a test printed circuit board of the present invention.
【図2】イオン残渣量を示す図。FIG. 2 is a diagram showing the amount of ion residue.
【図3】絶縁抵抗値を示す図。FIG. 3 is a diagram showing insulation resistance values.
Claims (2)
を使用してハンダ付けしたプリント基板の水洗浄方法で
あって、消泡剤を含む洗浄水を使用することを特徴とす
るハンダ付けプリント基板の水洗浄方法。Claim 1. A method for water cleaning a printed circuit board soldered using rosin-based flux and cream solder, the method comprising using cleaning water containing an antifoaming agent. Method.
1%であることを特徴とする請求項1記載のハンダ付け
プリント基板の水洗浄方法。2. The content of the antifoaming agent is 0.0001 to 0.0001.
2. The method of washing a soldered printed circuit board with water according to claim 1, wherein the water washing amount is 1%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10711391A JPH04335595A (en) | 1991-05-13 | 1991-05-13 | Water cleaning method of soldered printed-circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10711391A JPH04335595A (en) | 1991-05-13 | 1991-05-13 | Water cleaning method of soldered printed-circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04335595A true JPH04335595A (en) | 1992-11-24 |
Family
ID=14450805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10711391A Pending JPH04335595A (en) | 1991-05-13 | 1991-05-13 | Water cleaning method of soldered printed-circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04335595A (en) |
-
1991
- 1991-05-13 JP JP10711391A patent/JPH04335595A/en active Pending
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