JPH0432781B2 - - Google Patents

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Publication number
JPH0432781B2
JPH0432781B2 JP19950887A JP19950887A JPH0432781B2 JP H0432781 B2 JPH0432781 B2 JP H0432781B2 JP 19950887 A JP19950887 A JP 19950887A JP 19950887 A JP19950887 A JP 19950887A JP H0432781 B2 JPH0432781 B2 JP H0432781B2
Authority
JP
Japan
Prior art keywords
weight
frit
glaze
firing
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19950887A
Other languages
Japanese (ja)
Other versions
JPS6442340A (en
Inventor
Kimiki Hatanaka
Tooru Oonuki
Takaaki Toki
Takashi Matsubara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inax Corp
Original Assignee
Inax Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inax Corp filed Critical Inax Corp
Priority to JP19950887A priority Critical patent/JPS6442340A/en
Priority to EP88307217A priority patent/EP0303402B1/en
Priority to ES198888307217T priority patent/ES2037836T3/en
Priority to DE8888307217T priority patent/DE3877278T2/en
Priority to KR1019880010166A priority patent/KR910003251B1/en
Publication of JPS6442340A publication Critical patent/JPS6442340A/en
Publication of JPH0432781B2 publication Critical patent/JPH0432781B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明はタイル釉薬用フリツトに係り、特に内
装用タイルを1回の焼成のみで製造する、所謂一
度焼きに用いるタイル釉薬用フリツトに関する。 [従来の技術] 従来より、内装用タイルは2回焼成過程を経
る、所謂二度焼により製造されている。即ち、従
来の内装用タイルは、坏土の成形及び乾燥の後、
第1回目の焼成(素焼き)を行ない、冷却後、こ
の素焼きタイルに釉掛けし、第2回目の焼成を行
うことにより製造されている。 このように内装用タイルの場合に二度焼きする
理由は次の通りである。外装用タイルに比べ、内
装用タイルは厚く釉掛けする必要があるのである
が、仮に一度焼きするために坏土成形体(圧粉
体)に厚く釉掛けすると、焼成過程において坏土
から発生するガスが釉層を通過しにくくなり、半
溶融ないしは溶融状態にある釉層を突き破り、釉
層にクレータ状のガス噴出穴や気泡、ビンホー
ル、亀裂等が生じてしまうのである。 即ち、坏土成形体(素地)を焼成するプロセス
においては、該坏土中に含まれる炭酸塩系鉱物の
熱分解や有機物質の燃焼に伴つてガスが発生す
る。このガス発生は、極めてゆつくりと昇温する
場合には700〜800℃程度で完了するのであるが、
ローラーハースキルン等を採用する高生産効率製
造法の下では昇温速度が大であり、上記ガス発生
反応は遅延し、周囲温度が1000℃を超える領域に
までずれ込むようになる。殊に、成形体内部にお
いては該成形体表面に比べ昇温が遅れるから周囲
温度が1100℃になつてもガス発生反応が継続して
いる場合すらある。 従来のタイル用釉薬においては、1000℃前後程
度から急速に軟化を開始し、溶融状態となつてタ
イル素地表面を覆うようになるのであるが、この
ように溶けた釉が表面を覆つた後でも前記の如く
素地内部からガスが発生してくることになると前
記の泡吹き現象が生じてしまうのである。 二度焼き方式によれば、素地は素焼品となつて
おり、2度目の焼成時には素地からのガス発生は
無く、厚く釉掛けしても泡吹き現象が発生せず、
光沢に富み奇麗な平坦施釉面を有する内装用タイ
ルが製造される。 [発明が解決しようとする問題点] 叙上の如く、従来の釉薬を用いて内装用タイル
を一度焼き方式にて製造しようとすると、泡吹き
現象が生じ、およそ製品とするには適わない釉面
となつてしまつていた。 そのため、従来では、内装用タイルは二度焼き
によらざるを得ず、それだけ焼成燃料コストが高
く、焼成の手間等も嵩み、生産性が低いものとな
つていた。 [問題点を解決するための手段] 本発明は、一度焼きにて内装用タイルを製造す
ることを可能とするためのタイル釉薬用フリツト
を提供するものであり、このフリツトは SiO2 55〜65重量% Al2O3 10〜18重量% CaO 18〜25重量% アルカリ金属の酸化物 0.5〜4重量% ZrO2 0〜10重量% B2O3 0〜2重量% MgO、BaO、SrO及びZnOの1種又は2種以上
合計で0〜10重量% を含むものである。 [作用] かかる本発明のフリツトにおいては、アルカリ
金属の酸化物及びB2O3成分が微量であり、軟化
開始点よりも高い温度に加熱しても粘性低下が緩
慢であり、軟化開始温度よりも相当高温にならな
いと素地表面を全面的に、所謂べたつと覆うよう
にはならない。即ち、素地内部からガスが発生し
ても、このガスはフリツト粒子の間を通り抜けて
外部に容易に抜け出すことができるようになり、
泡吹き現象が防止される。 以下、本発明のフリツト各成分の作用をその好
ましい態様と共に詳細に説明する。 本発明のフリツトにおいて、SiO2、Al2O3は高
軟化点フリツトを構成する主成分であり、アルミ
ノシリケート系ガラスの骨格部分を構成する。 また、CaOとアルカリ金属の酸化物(以下、
R2Oと略)とは、それぞれ上記アルミノシリケー
トのネツトワークを部分的に断ち切り、そのガラ
ス化を促進し、軟化開始温度を低下させる作用を
有する。 本発明において、SiO2は55〜65重量%(以下
%と略)、Al2O3は10〜18%、CaOは18〜25%、
R2Oは0.5〜4%が好適であり、それぞれ上記範
囲を逸脱するとフリツトの軟化温度が過度になつ
て泡吹き現象をもたらしたり、逆に軟化温度が過
度に高くなつて素地焼成後においても釉が十分に
は溶けない事態が生じる。特に好ましい範囲は、
SiO260〜64%、Al2O312〜16%、CaO19〜23%、
R2O1〜3%である。なお、Li2Oはなくてもよい
が、二度焼に準ずる釉面の平滑性を得るためには
添加するのが好ましい。このLi2Oの含有%は0.5
〜1.5%の範囲が好ましい。0.5%未満では平滑性
の改善効果が少なく、1.5%を超えると釉面にピ
ンホールが出易くなる。 本発明のフリツトは、B2O3、MgO、ZnO、
SrO及びBaOを含んでも良い。これらの酸化物を
必要に応じ含有させることにより、フリツトの軟
化点を低下させることができる。これらの酸化物
は、過度に多く含有するとフリツトの軟化点が過
度に低下し、また軟化開始後急速にフリツトの粘
性を低下させるようになるので、B2O3は2%以
下とりわけ1%以下、MgOは5%以下とりわけ
3%以下、ZnOは5%以下とりわけ3%以下、
SrOは5%以下とりわけ3%以下、BaOは5%以
下とりわけ3%以下とするのが好ましい。なお、
MgO、BaO、SrO及びZnOは合量でも10%以下
とする。 本発明のフリツトは、素地の隠蔽力を付与する
ZrO2を10%以下含有していても良い。 本発明のフリツトは、さらに必要に応じ他の
BaO等の酸化物や塩化物、硫酸塩等の化合物を
含んでも良いが、それらは合量でも3%以下とり
わけ1%以下とするのが好ましい。 本発明のフリツトは常法に従い、通常のフリツ
ト用原料を調合及び溶融後、冷却し、次いで粉砕
することにより製造することができる。 本発明のフリツトは水、アルコールその他適宜
の液体に分散させて釉薬とされるが、この際、長
石、粘土、ジルコン(珪酸ジルコニウム)、珪砂、
アルミナ、酸化亜鉛、酸化チタン、炭酸バリウム
等を併用し、さらに適宜の顔料等を併用しても良
い。 [実施例] 以下、本発明を実施例及び比較例に基いてさら
に詳細に説明する。 なお、以下の実施例及び比較例において、タイ
ル用の坏土成形体としては次のものを用いた。 即ち、ろう石45重量部、粘土40重量部、石炭石
10重量部及びシヤモツト5重量部をボールミル粉
砕、混合し、水分を加え、350Kg/cm2で成形し、
これを乾燥したものである。この成形体(素地)
の大きさは10cm×10cm×0.5cmである。 また、この成形体を焼成するには全長25mのロ
ーラーハースキルンを用い、走行速度1.0m/分、
焼成帯最高温度1190℃とした。 実施例 1 原料として長石、珪石、石炭石を採用し、これ
らを乾燥、粉砕、篩分けした後調合し、るつぼ中
で1400℃にて1時間溶融した後急冷し、フリツト
とした。このフリツトの化学組成を第1表に示
す。 このフリツト70重量部に対し長石15重量部、粘
土2重量部、ジルコン13重量部を加え、ボールミ
ルにて混合した。これに水33重量部とカルボン酸
系分散剤0.20重量部を加え、さらにボールミル中
で混合し、泥しよう釉とした。 この泥しよう釉を幕掛け法により前記成形体表
面に乾燥後の厚さが0.6mm程度となるように塗付
し、乾燥後焼成した。 焼成後、タイルを観察したところ、釉面は泡吹
きは全くなく、平坦で光沢を帯び、厚い釉薬層を
有する高級感に富む内装用タイルであることが認
められた。 実施例 2〜8 実施例1において原料の配合比を変更すること
により、また原料としてさらにジルコン、ホウ
砂、マグネシア、酸化亜鉛を付加すること以外は
同様にして第1表に示す組成のフリツトを製造し
た。そして、これらのフリツトを用い、実施例1
と同様にして泥しよう釉とし、成形体に塗付し乾
燥及び焼成を行なつた。 その結果いずれも実施例1と同様に優れた表面
性状を有する内装用タイルが製造された。 比較例 1,2,3,4 組成を第1表に示す通りとしたこと以外は上記
実施例と同様にしてフリツトを製造し、同様に泥
しよう釉とし、成形体に塗付し乾燥及び焼成を行
なつた。その結果、いずれも釉薬層に泡吹きが生
じた。 比較例 5 長石43重量部、珪砂6.5重量部、粘土4.0重量
部、石炭13.0重量部を調合することにより第1表
に示す組成の釉薬(生釉)を製造した。これを泥
しようにして成形体に塗付し、乾燥及び焼成を行
なつたところ、釉薬層に泡吹きが生じた。
[Industrial Application Field] The present invention relates to a tile glaze frit, and more particularly to a tile glaze frit used for so-called one-time firing, in which interior tiles are manufactured by only one firing. [Prior Art] Traditionally, interior tiles have been manufactured by undergoing a two-time firing process, so-called double firing. That is, in conventional interior tiles, after molding and drying clay,
It is manufactured by performing a first firing (unglazed firing), and after cooling, this unglazed tile is glazed, and a second firing is performed. The reason why interior tiles are fired twice is as follows. Compared to exterior tiles, interior tiles need to be glazed thickly, but if you apply a thick glaze to the clay molded body (powder compact) for firing once, glazes will be generated from the clay during the firing process. Gas becomes difficult to pass through the glaze layer and breaks through the glaze layer, which is in a semi-molten or molten state, creating crater-shaped gas ejection holes, bubbles, bottle holes, cracks, etc. in the glaze layer. That is, in the process of firing a clay molded body (base material), gas is generated as a result of thermal decomposition of carbonate minerals and combustion of organic substances contained in the clay. This gas generation is completed at around 700 to 800 degrees Celsius when the temperature rises extremely slowly.
Under a highly productive manufacturing method that employs a roller hearth kiln or the like, the rate of temperature rise is high, and the above gas generation reaction is delayed, causing the ambient temperature to exceed 1000°C. In particular, since the temperature rise inside the molded body is delayed compared to the surface of the molded body, the gas generation reaction may even continue even when the ambient temperature reaches 1100°C. Conventional tile glazes begin to soften rapidly at around 1,000℃, becoming molten and covering the surface of the tile base, but even after the molten glaze covers the surface, As mentioned above, when gas is generated from inside the substrate, the above-mentioned bubbling phenomenon occurs. According to the twice-fired method, the base material is unglazed, and there is no gas generation from the base material during the second firing, and no bubble-blowing phenomenon occurs even when glazed thickly.
Interior tiles with a glossy and beautiful flat glazed surface are manufactured. [Problems to be Solved by the Invention] As mentioned above, when attempting to manufacture interior tiles using a one-time firing method using conventional glazes, a bubbling phenomenon occurs and the glaze becomes unsuitable for use as a product. It had become a face. Therefore, conventionally, tiles for interior use had to be fired twice, which increased the cost of firing fuel, increased the labor involved in firing, and resulted in low productivity. [Means for Solving the Problems] The present invention provides a frit for tile glaze that makes it possible to manufacture interior tiles by firing once, and this frit is made of SiO 2 55-65 Weight% Al 2 O 3 10-18% by weight CaO 18-25% by weight Alkali metal oxides 0.5-4% by weight ZrO 2 0-10% by weight B 2 O 3 0-2% by weight MgO, BaO, SrO and ZnO One or more types of
It contains 0 to 10% by weight in total. [Function] In the frit of the present invention, the alkali metal oxide and the B 2 O 3 component are present in trace amounts, and even when heated to a temperature higher than the softening starting point, the viscosity decreases slowly, and the frit is lower than the softening starting temperature. However, unless the temperature is quite high, it will not cover the entire surface of the substrate in a so-called sticky manner. In other words, even if gas is generated from inside the substrate, this gas can easily escape to the outside by passing between the frit particles.
The bubble blowing phenomenon is prevented. Hereinafter, the functions of each component of the frit of the present invention will be explained in detail together with their preferred embodiments. In the frit of the present invention, SiO 2 and Al 2 O 3 are the main components constituting the high softening point frit and constitute the skeleton of the aluminosilicate glass. In addition, CaO and alkali metal oxides (hereinafter referred to as
R 2 O (abbreviated as R 2 O) has the effect of partially cutting off the network of the aluminosilicate, promoting its vitrification, and lowering the softening start temperature. In the present invention, SiO2 is 55 to 65% by weight (hereinafter abbreviated as %), Al2O3 is 10 to 18%, CaO is 18 to 25%,
A suitable R 2 O content is 0.5 to 4%, and if it deviates from the above range, the softening temperature of the frit may become excessive, resulting in bubbling, or conversely, the softening temperature may become excessively high, causing problems even after firing the base material. A situation may arise in which the glaze does not melt sufficiently. A particularly preferable range is
SiO2 60-64%, Al2O3 12-16 %, CaO19-23%,
R2O is 1-3%. Although Li 2 O is not necessary, it is preferable to add it in order to obtain a smoothness of the glaze surface similar to that of twice-fired glaze. The content% of this Li 2 O is 0.5
A range of ~1.5% is preferred. If it is less than 0.5%, the effect of improving smoothness is small, and if it exceeds 1.5%, pinholes are likely to appear on the glaze surface. The frit of the present invention contains B 2 O 3 , MgO, ZnO,
It may also contain SrO and BaO. By including these oxides as necessary, the softening point of the frit can be lowered. If these oxides are contained in an excessively large amount, the softening point of the frit will be excessively lowered, and the viscosity of the frit will be rapidly lowered after softening begins, so the B 2 O 3 content should be 2% or less, especially 1% or less. , MgO is 5% or less, especially 3% or less, ZnO is 5% or less, especially 3% or less,
SrO is preferably 5% or less, especially 3% or less, and BaO is preferably 5% or less, especially 3% or less. In addition,
The total amount of MgO, BaO, SrO and ZnO shall be 10% or less. The frit of the present invention imparts hiding power to the substrate.
It may contain 10% or less of ZrO 2 . The frit of the present invention may be further modified with other materials as necessary.
Although it may contain compounds such as oxides such as BaO, chlorides, and sulfates, the total amount thereof is preferably 3% or less, especially 1% or less. The frit of the present invention can be manufactured in accordance with a conventional method by blending and melting ordinary raw materials for frit, cooling, and then pulverizing. The frit of the present invention is made into a glaze by dispersing it in water, alcohol, or other appropriate liquid.
Alumina, zinc oxide, titanium oxide, barium carbonate, etc. may be used in combination, and appropriate pigments may also be used in combination. [Examples] Hereinafter, the present invention will be explained in more detail based on Examples and Comparative Examples. In addition, in the following examples and comparative examples, the following clay molded bodies for tiles were used. Namely, 45 parts by weight of waxite, 40 parts by weight of clay, coal stone.
10 parts by weight and 5 parts by weight of Syamoto were crushed in a ball mill, mixed, added with water, and molded at 350 kg/cm 2 .
This is dried. This molded body (base material)
The size is 10cm x 10cm x 0.5cm. In addition, a roller hearth kiln with a total length of 25 m was used to fire this molded body, and the running speed was 1.0 m/min.
The maximum temperature of the firing zone was 1190°C. Example 1 Feldspar, silica, and coal stone were used as raw materials, and these were dried, crushed, and sieved, then blended, melted in a crucible at 1400°C for 1 hour, and then rapidly cooled to form a frit. The chemical composition of this frit is shown in Table 1. To 70 parts by weight of this frit, 15 parts by weight of feldspar, 2 parts by weight of clay, and 13 parts by weight of zircon were added and mixed in a ball mill. To this, 33 parts by weight of water and 0.20 parts by weight of a carboxylic acid dispersant were added, and the mixture was further mixed in a ball mill to form a mud glaze. This mud glaze was applied to the surface of the molded body by the curtain method so that the thickness after drying was approximately 0.6 mm, and after drying, it was fired. When the tile was observed after firing, it was found that the glazed surface had no bubbles at all, was flat and glossy, and had a thick glaze layer, making it a high-class interior tile. Examples 2 to 8 Frits having the composition shown in Table 1 were produced in the same manner as in Example 1, except that the blending ratio of the raw materials was changed and zircon, borax, magnesia, and zinc oxide were further added as raw materials. Manufactured. Using these frits, Example 1
A mud glaze was made in the same manner as above, applied to a molded body, dried and fired. As a result, interior tiles having excellent surface properties similar to those of Example 1 were manufactured. Comparative Examples 1, 2, 3, 4 A frit was manufactured in the same manner as in the above example except that the composition was as shown in Table 1, and a mud glaze was applied in the same manner to a molded body, dried and fired. I did this. As a result, bubbling occurred in the glaze layer in all cases. Comparative Example 5 A glaze (raw glaze) having the composition shown in Table 1 was produced by blending 43 parts by weight of feldspar, 6.5 parts by weight of silica sand, 4.0 parts by weight of clay, and 13.0 parts by weight of coal. When this was applied as a slurry to a molded body, dried and fired, bubbles appeared in the glaze layer.

【表】【table】

【表】 なお、実施例1の釉及び比較例5で調合した生
釉を圧力10Kg/cm2で直径0.2cm、高さ0.3cmの円柱
体(以下、ボタンという。)に成形し、これらを
昇温速度10℃/minにて空気雰囲気下で常温から
1200℃まで加熱し、ボタンの高さの経時変化をマ
イクロスコープにて測定した。その結果を第1図
に示す。 第1図より、生釉は1040℃位から急速に軟化を
開始し、その後の粘性低下も急であることが認め
られる。これに対し、実施例1の釉は、約900℃
位で軟化を開始するものの、その後の粘性低下は
極めて緩慢であり、1100℃〜1150℃の高温域にお
いても相当の高粘性であることが認められる。な
お、図中、横軸は温度である。縦軸は、ボタンの
高さ(焼成前の高さを100とした時の各温度での
ボタンの高さ)を示している。このように本発明
に係るフリツトは高温域でも高粘性であるため、
焼成時に成形体から発生するガスがフリツト粒子
同志の間を容易に通過するようになり、釉薬層の
泡吹き現象が確実に防止されることが裏付けられ
た。なお、本発明のフリツトは、成形体からのガ
ス発生が終了する焼成帯の最高温度付近において
は十分に軟化し、素地の表面を均一に覆うように
なる。 [効果] 以上の実施例及び比較例からも明らかな通り、
本発明のフリツトを用いることにより美麗な厚掛
けした釉薬層を有するタイルが一度焼きにして製
造される。従つて、本発明のフリツトを採用する
ことにより内装用タイルの製造コストが大幅に低
減される。
[Table] The glaze of Example 1 and the raw glaze prepared in Comparative Example 5 were molded into a cylindrical body (hereinafter referred to as a button) with a diameter of 0.2 cm and a height of 0.3 cm at a pressure of 10 kg/cm 2 . From room temperature in an air atmosphere at a heating rate of 10℃/min
The button was heated to 1200°C and changes in button height over time were measured using a microscope. The results are shown in FIG. From Figure 1, it can be seen that the raw glaze begins to soften rapidly at around 1040°C, and the viscosity decreases rapidly thereafter. In contrast, the glaze of Example 1 was heated to approximately 900°C.
Although it starts to soften at about 100°C, the viscosity declines thereafter is extremely slow, and it is recognized that the viscosity is considerably high even in the high temperature range of 1100°C to 1150°C. In addition, in the figure, the horizontal axis is temperature. The vertical axis indicates the height of the button (the height of the button at each temperature when the height before firing is set as 100). As described above, since the frit according to the present invention has high viscosity even in a high temperature range,
It was confirmed that the gas generated from the molded body during firing was able to easily pass between the frit particles, and that the bubbling phenomenon of the glaze layer was reliably prevented. The frit of the present invention is sufficiently softened near the maximum temperature of the firing zone at which gas generation from the molded body ends, and the frit uniformly covers the surface of the substrate. [Effect] As is clear from the above examples and comparative examples,
By using the frit of the present invention, tiles with a beautiful thick glaze layer can be produced in one firing. Therefore, by employing the frit of the present invention, the manufacturing cost of interior tiles can be significantly reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例における測定結果を示すグラフ
である。
FIG. 1 is a graph showing measurement results in Examples.

Claims (1)

【特許請求の範囲】 1 SiO2 55〜65重量% Al2O3 10〜18重量% CaO 18〜25重量% アルカリ金属の酸化物 0.5〜4重量% ZrO2 0〜10重量% B2O3 0〜2重量% MgO、BaO、SrO及びZnOの1種又は2種以上
合計で0〜10重量% を含むタイル釉薬用フリツト。
[Claims] 1 SiO 2 55-65% by weight Al 2 O 3 10-18% by weight CaO 18-25% by weight Alkali metal oxide 0.5-4% by weight ZrO 2 0-10% by weight B 2 O 3 0 to 2% by weight One or more of MgO, BaO, SrO and ZnO
Fritz for tile glazes containing a total of 0 to 10% by weight.
JP19950887A 1987-08-10 1987-08-10 Frit for tile glaze Granted JPS6442340A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP19950887A JPS6442340A (en) 1987-08-10 1987-08-10 Frit for tile glaze
EP88307217A EP0303402B1 (en) 1987-08-10 1988-08-04 Method of producing tiles by single firing
ES198888307217T ES2037836T3 (en) 1987-08-10 1988-08-04 TILE PRODUCTION METHOD.
DE8888307217T DE3877278T2 (en) 1987-08-10 1988-08-04 METHOD FOR PRODUCING TILES WITH A SINGLE COMBUSTION.
KR1019880010166A KR910003251B1 (en) 1987-08-10 1988-08-10 Frit for tile glaze

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19950887A JPS6442340A (en) 1987-08-10 1987-08-10 Frit for tile glaze

Publications (2)

Publication Number Publication Date
JPS6442340A JPS6442340A (en) 1989-02-14
JPH0432781B2 true JPH0432781B2 (en) 1992-06-01

Family

ID=16408984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19950887A Granted JPS6442340A (en) 1987-08-10 1987-08-10 Frit for tile glaze

Country Status (1)

Country Link
JP (1) JPS6442340A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04349144A (en) * 1991-05-24 1992-12-03 Inax Corp Ultra-glossy glaze
CN112979271B (en) * 2021-03-24 2022-11-04 江西金唯冠建材有限公司 Preparation method of light high-strength pure-color glazed brick

Also Published As

Publication number Publication date
JPS6442340A (en) 1989-02-14

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