JPH04317352A - Formation of wafer for calibration of inspecting apparatus for surface contamination of wafer - Google Patents

Abstract

PURPOSE:To easily judge whether a wafer for calibration used is contaminated or whether a wafer surface contamination inspection apparatus is abnormal by a method wherein standard particles are applied to one part of a wafer. CONSTITUTION:A standard-particle solution 2 which has diluted standard particles with an alcohol is prepared; the standard-particle solution 2 is filled into a pippette 1 dispersed onto a wafer 3. The dripped standard-particle solution 2 is expanded in a circuit shape on the wafer 3. Since the alcohol as a dilution liquid is evaporated in about several seconds, the standard particles are distributed and applied in the circular shape in a part to which the standard-particle solution 2 has been dripped. As result, when the wafer 3 for calibration use is measured periodically and an increase in the number of foreign bodies is recognized, the abnormality of a wafer surface contamination inspection apparatus can be judged easily by means of the distribution of the foreign bodies. Since the number of standard particles to be applied can be adjusted by the dripping amount of the standard-particle solution 2, 100 or loss standard particles can easily be applied.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for preparing a wafer for calibration of a wafer surface foreign matter inspection apparatus.

0002

2. Description of the Related Art A calibration wafer for a conventional wafer surface foreign matter inspection apparatus is prepared using standard particles, alcohol, an atomizer, and a wafer. The method for creating it will be explained below.

As shown in FIG. 2, a standard particle solution 2 in which standard particles are diluted 100,000 to 300,000 times with alcohol is sprayed onto the wafer 3 placed on a support stand 4 using a sprayer 5. Attach particles. As standard particles, those having a particle size of 0.1 μm to 10 μm are used.

0004

[Problems to be Solved by the Invention] In the above-described conventional method for preparing a wafer for calibration of a wafer surface foreign matter inspection device,
Since the standard particles are attached using a sprayer, the standard particles are attached to the entire surface of the wafer, and when a single calibration wafer is periodically measured with a wafer surface foreign particle inspection device, an increase in the number of foreign particles is observed. However, it was difficult to determine whether the increase was due to an abnormality in the wafer surface foreign matter inspection device, or whether it was due to foreign matter other than standard particles adhering to the calibration wafer because it was dirty.

Another problem is that it is difficult to control the number of standard particles to be deposited, and furthermore, it is difficult to deposit a small number of standard particles, about 100 or less per sheet.

[0006]

[Means for Solving the Problems] A method for preparing a calibration wafer for a wafer surface foreign matter inspection apparatus according to the present invention is to drop a standard particle solution onto the wafer using a pipette.

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings. FIG. 1 is a perspective view of a wafer and a pipette for explaining one embodiment of the present invention.

First, a standard particle solution 2 is prepared by diluting standard particles approximately 100,000 to 300,000 times with alcohol using a beaker or the like, and this standard particle solution 2 is filled into a pillet 1 and dripped onto a wafer 3. The dropped standard particle solution 2 is placed on the wafer 3.
Spread out in a circle on top. Since alcohol, which is a diluent, evaporates in about a few seconds, the standard particles are distributed in a circular pattern and adhere to the area where the standard particle solution 2 is dropped.

Since the number of standard particles to be deposited can be adjusted by adjusting the amount of the standard particle solution 2 dropped, it is possible to easily deposit 100 or less standard particles.

0010

[Effects of the Invention] As explained above, the present invention allows standard particles to be attached to a part of a wafer using a pipette, so that when a calibration wafer is periodically measured with a wafer surface foreign matter inspection device, the number of foreign matter counts increases. Even if foreign matter is detected, it is possible to easily determine whether the calibration wafer is contaminated or whether there is an abnormality in the wafer surface foreign matter inspection device based on the distribution of attached foreign matter. Furthermore, since the standard particle solution is dropped with a pipette, there is also the effect that a small number of standard particles, about 100 or less, can be easily attached.

[Brief explanation of drawings]

FIG. 1 is a perspective view of a pipette and a wafer for explaining one embodiment of the present invention.

FIG. 2 is a perspective view of a wafer and a sprayer for explaining a conventional calibration wafer manufacturing method.

[Explanation of symbols]

1 Pipette 2 Standard particle solution 3 Wafer 4 Support stand 5 Sprayer

Claims (1)

[Claims] 1. A method for preparing a wafer for calibration of a wafer surface foreign matter inspection device, which comprises dropping a standard particle solution diluted with alcohol onto the wafer using a pipette.