JPH04317007A - Production of color filter - Google Patents

Abstract

PURPOSE:To obtain the color filter used for flat displays, such as liquid crystal displays or imagers, such as CCDs, or color sensors, etc., with high accuracy and good efficiency. CONSTITUTION:An ionization radiation curing resin contg. coloring pigments is packed into groove parts 6 for prescribed colored patterns formed in a matrix 4 and is cured or half cured by irradiation with ionization radiations; thereafter, the transparent substrate 12 and the matrix 4 are superposed on each other via a transparent resin and the ionization radiation curing resin is irradiated with the ionization radiations at least from either of the transparent substrate 12 side or the matrix 4 side and is thereby cured. The ionization radiation curing resin in the groove parts 6 is simultaneously adhered to the transparent substrate 12 via the ionization radiation curing transparent resin, by which the colored patterns are formed. The color filter having the colored layers 14 consisting of plural colors of the required colored patterns is obtd. by repeating the above-mentioned operation.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention relates to a method for manufacturing color filters, and in particular, to manufacture color filters for use in flat displays such as liquid crystal displays, imagers such as CCDs, color sensors, etc. with high precision and efficiency. The present invention relates to a method of manufacturing color filters that can be obtained easily.

0002

2. Description of the Related Art For example, the image pickup tube of a color video camera is equipped with a color filter in which fine stripes of a plurality of colors are formed on a transparent substrate. Furthermore, in liquid crystal displays (LCDs), color filters are used in both active matrix and simple matrix systems in order to meet the recent demand for colorization. For example, a thin film transistor (
In active matrix liquid crystal displays using TFT, the color filters are red (R) and green (G).
The three primary colors of , blue (B) are used, and by turning on and off the electrodes corresponding to each pixel of R, G, and B, the liquid crystal operates as a shutter and lights each pixel of R, G, and B. Transparent color display is performed. And the color mixture is 2
This is visually performed on the retina using the principle of additive color mixing, in which liquid crystal shutters corresponding to pixels of more than one color are opened and colors are mixed to appear as different colors.

[0003] The color filters used as described above have conventionally been manufactured using methods such as dyeing methods, pigment dispersion methods, printing methods, and electrodeposition methods. In order to manufacture color filters using the dyeing method, a coating solution containing a hydrophilic resin such as gelatin, casein, or polyvinyl alcohol and a photosensitizing agent such as dichromate is applied onto a transparent glass substrate using a spin coating method or the like. It is coated, then exposed and developed using a mask with a predetermined pattern, and then dyed with a dye to form a first colored layer. Thereafter, a resist dyeing layer is provided on the first colored layer to prevent double dyeing, and then a second colored layer and a third colored layer are respectively formed in the same manner as the first colored layer. As a result, R, G,
A color filter including each colored layer of B can be obtained.

[0004] In addition, in the production of color filters using the pigment dispersion method, a photosensitive liquid in which colorants such as organic pigments and inorganic pigments are dispersed in transparent photosensitive resin is applied onto a transparent glass substrate to form a photosensitive resin layer. Form. Next, a mask having an opening pattern of a predetermined shape is placed on this photosensitive resin layer, and exposed to light.
Development is performed to form a first colored layer. Similarly, a second colored layer and a third colored layer can be formed to obtain a color filter including R, G, and B colored layers.

[0005] In the production of color filters using printing methods, colored layers are formed only through printing processes such as offset methods such as lithographic offset printing and intaglio offset printing, screen printing methods, and flexo printing methods. Furthermore, in the production of color filters using the electrodeposition method, an indium tin oxide (ITO) film is formed on the substrate in advance by photolithography, and a colored layer is formed in predetermined areas by electrophoresis in an electrodeposition bath. It is something to do.

[0006]

[Problems to be Solved by the Invention] However, while the dyeing method provides a color filter with a rich variety of tones and excellent resolution, it is difficult to prevent the already colored areas from being dyed twice during dyeing. There was a problem that the process was complicated and the manufacturing cost was high due to the need to take countermeasures. Furthermore, since a water-soluble polymer material is used for the object to be dyed, there is also a problem that heat resistance, chemical resistance, light resistance, etc. are inferior.

[0007] In addition, although the pigment dispersion method allows the formation of fine patterns, it requires a photolithography process every time the color is changed, which makes the process complicated. There has been a problem in that equipment costs are high when manufacturing large panels, making it difficult to reduce manufacturing costs. In addition, the printing method is a method of manufacturing color filters that enables cost reduction and mass production at the same time, and also allows for large screens, but the dimensional accuracy is ±1.
There was a problem that the pattern quality was low, about 0 μm, and pinholes and color unevenness were likely to occur, resulting in insufficient pattern quality.

Furthermore, although the electrodeposition method has the same level of dimensional accuracy and pattern quality as the pigment dispersion method and reduces the number of steps, it involves the expensive Cr pattern black matrix formation step and ITO pattern formation step, resulting in lower manufacturing costs. There was a problem that the amount of Furthermore, when manufacturing large panels of 15 inches or more, there is also the problem of increased equipment costs.

The present invention has been made in view of the above-mentioned circumstances, and it is an object of the present invention to produce color filters used in flat displays such as liquid crystal displays, imagers such as CCDs, color sensors, etc. with high precision and efficiency. It is an object of the present invention to provide a method for manufacturing a color filter that can be obtained.

0010

[Means for Solving the Problems] In order to achieve the above object, the present invention provides a method for manufacturing a color filter including a colored layer consisting of colored patterns of a plurality of colors, in which grooves for predetermined colored patterns are formed. The grooves of the mold are filled with an ionizing radiation-curable resin containing a colored pigment, and ionizing radiation is irradiated to bring the ionizing radiation-curable resin into a hardened or semi-hardened state. A transparent substrate is stacked on the matrix so as to be in close contact with the ionizing radiation-curable resin in the groove, and the ionizing radiation-curable transparent resin is cured by irradiating ionizing radiation from at least one of the transparent substrate side and the matrix side. , forming a colored pattern on the transparent substrate by bonding the ionizing radiation-cured resin in the groove to the transparent substrate via the cured ionizing radiation-cured transparent resin, is repeated for the required number of colors to form the transparent The structure was such that a colored layer was formed on the substrate.

[0011]

[Operation] Ionizing radiation-cured resin containing colored pigments is filled into grooves for predetermined colored patterns formed in the matrix,
It is brought into a cured or semi-cured state by irradiation with ionizing radiation, and then the transparent substrate is superimposed on the matrix via the ionizing radiation-cured transparent resin, and ionizing radiation is irradiated from at least one of the transparent substrate side and the matrix side. At the same time as the ionizing radiation-cured transparent resin is cured, the ionizing radiation-cured resin in the groove is adhered to the transparent substrate via the ionizing radiation-cured transparent resin to form a colored pattern on the transparent substrate. A color filter including a colored layer consisting of a colored pattern of a plurality of colors is obtained. This makes it possible to manufacture a color filter that has heat resistance, light resistance, etc. and good pattern dimensional accuracy, and also simplifies the color filter process and reduces manufacturing costs.

0012

Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing an example of an active matrix liquid crystal display (LCD) using a color filter manufactured according to the present invention, and FIG. 2 is a schematic cross-sectional view. 1 and 2, the LCD 1 includes a color filter 10 and a transparent glass substrate 20.
A liquid crystal layer 40 made of twisted nematic (TN) liquid crystal and having a thickness of about 5 to 10 μm is formed between them, and polarized light is formed on the outside of the color filter 10 and the transparent glass substrate 20. It is constructed by disposing plates 50 and 51.

FIG. 3 is an enlarged partial sectional view of the color filter 10. The color filter 10 includes a transparent substrate 12, a red pattern 14R formed on the transparent substrate 12 via a first transparent resin layer 13a, and a second red pattern 14R. Green pattern 14G formed via transparent resin layer 13b, third transparent resin layer 13
A colored layer 14 consisting of a blue pattern 14B formed through a fourth transparent resin layer 13d and a black matrix 16 formed through a fourth transparent resin layer 13d are provided so as to cover the colored layer 14 and the black matrix 16. A protective layer 18 and a transparent common electrode 19 are provided. This color filter 10 is arranged so that the transparent common electrode 19 is located on the liquid crystal layer 40 side. The colored patterns of the red pattern 14R, green pattern 14G, and blue pattern 14B constituting the colored layer 14 are arranged in a mosaic arrangement as shown in FIG. 1. Note that the arrangement of the colored patterns is not limited to this, and may be a triangular arrangement, a striped arrangement, or the like.

Further, display electrodes 22 are provided on the transparent glass substrate 20 so as to correspond to the colored patterns 16R, 16G, and 16B, and each display electrode 22 has a thin film transistor (TFT) 24. Further, between each display electrode 22, a scanning line (gate electrode bus line) 26a and a data line 26b are arranged so as to correspond to the black matrix 13.

In such an LCD 1, each of the colored patterns 14R, 14G, and 14B constitutes a pixel, and by turning on and off the display electrode corresponding to each pixel while illumination light is irradiated from the polarizing plate 51 side, the liquid crystal is turned on and off. The layer 40 operates as a shutter, and light passes through each pixel of the colored patterns 14R, 14G, and 14B to perform color display. Here, an example of manufacturing a color filter according to the present invention will be described with reference to FIGS. 4 and 5. First, an ionizing radiation-curable resin containing a red pigment is dropped onto the surface of the matrix 4R on which the groove 6R for the red pattern is formed, and the excess ionizing radiation-curable resin is removed with a doctor to ionize only the groove 6R. A radiation-curable resin 8R is filled and ionizing radiation is irradiated from the groove 6R side of the master mold 4R (FIG. 4(A)). As a result, the ionizing radiation curing resin 8R is cured. Next, the ionizing radiation-curable transparent resin 13a is dropped onto the mother mold 4R, and the transparent substrate 12 is placed on the mother mold 4R, thereby filling the groove 6R with the ionizing radiation-curable resin through the ionizing radiation-curable transparent resin 13a. 8R and the transparent substrate 12 are brought into close contact with each other, and in this state, ionizing radiation is irradiated from the transparent substrate 12 side (FIG. 4(B))
. As a result, the ionizing radiation-curable transparent resin 13a is cured to become the first transparent resin layer 13a, and the ionizing radiation-curable resin 8R is adhered to the transparent substrate 12 via the first transparent resin layer 13a, and the mother mold 4R and transparent Transparent substrate 1 with red pattern 14R formed by separating it from substrate 12
2 is obtained (FIG. 4(C)). Next, an ionizing radiation curing resin containing a green pigment is dropped onto the matrix 4G in which the grooves 6G for the green pattern have been formed, and the excess ionizing radiation curing resin is removed with a doctor so that only the grooves 6G are exposed to ionizing radiation. The curable resin 8G is filled, and ionizing radiation is irradiated from the groove 6G side of the matrix 4G to cure the ionizing radiation curable resin 8G (FIG. 4(D)). Next, the ionizing radiation-curable transparent resin 13b is dropped onto the matrix 4G, so that the ionizing radiation-curable resin 8G filled in the groove 6G comes into close contact with a predetermined area on the transparent substrate 12 where the red pattern 14R is not formed. Transparent substrate 12
and the matrix 4G, and ionizing radiation is irradiated from the transparent substrate 12 side (FIG. 4(E)). As a result, the ionizing radiation-curable transparent resin 13b is cured to become the second transparent resin layer 13b, and the ionizing radiation-curable resin 8G is adhered to the transparent substrate 12 via the second transparent resin layer 13b, and the mother mold 4G and the transparent By separating the substrate 12, a green pattern 14G is formed.
A transparent substrate 12 on which is formed is obtained (FIG. 4(F)). Similarly, a matrix 4 in which a groove 6B for a blue pattern is formed.
Using B, the ionizing radiation-curable resin 8B containing the blue pigment filled in the groove is irradiated with ionizing radiation from the groove 6B side of the matrix 4B to cure the ionizing radiation-curable resin 8B (FIG. 5(A) ). Next, the transparent substrate 12 is bonded to the transparent substrate 12 via the ionizing radiation curing transparent resin 13c so that the ionizing radiation curing resin 8B in the groove 6B is located in a predetermined area on the transparent substrate 12 where the red pattern 14R and the green pattern 14G are not formed. Overlap with the matrix 6B (Fig. 5(B)). and,
By irradiating ionizing radiation from the transparent substrate 12 side, the ionizing radiation-cured transparent resin 13c is cured to become a third transparent resin layer 13c, and the ionizing radiation-cured resin 8B is applied to the transparent substrate via this third transparent resin layer 13c. 12, and by separating the matrix and the transparent substrate 12, a transparent substrate 12 on which a blue pattern 14B is formed is obtained (FIG. 5).
(C)). In this way, a colored layer 14 consisting of a red pattern 14R, a green pattern 14G, and a blue pattern 14B is formed on the transparent substrate 12 via the first transparent resin layer 13a, the second transparent resin layer 13b, and the third transparent resin layer 13c.
is formed. A predetermined gap is left between each colored pattern of the colored layer 14, and then a black matrix is formed in this gap. That is, a matrix 4BM in which a groove 6BM for a black matrix is formed is used, and an ionizing radiation curing resin 8B containing a light non-transparent substance is used.
M is filled into this groove 6BM, and the groove 6BM of the mother mold 4BM is filled with M.
Ionizing radiation curing resin 8BM by irradiating ionizing radiation from the side
(FIG. 5(D)). Next, the ionizing radiation-curable transparent resin 13d is dropped onto the mother mold 4BM, and the transparent substrate is placed so that the ionizing radiation-curable resin 8BM filled in the groove portion 6BM is located in each colored pattern gap of the colored layer 14 on the transparent substrate 12. 12 and matrix 4BM are overlapped. After irradiating ionizing radiation from the transparent substrate 12 side,
By separating the mother mold 4BM and the transparent substrate 12, a black matrix 16 is formed on the transparent substrate 12 via the fourth transparent resin layer 13d (FIG. 5(E)).

In the above example, the black matrix 16 is formed in the gaps left between the colored patterns of the colored layer 14, but the colored layer 14 is formed without leaving any gaps,
The black matrix 16 may be formed on the boundaries of each colored pattern. Furthermore, by omitting the black matrix forming step, a color filter without a black matrix can be manufactured.

[0017]Furthermore, the filling of the ionizing radiation-cured resin into the grooves of the matrix may be carried out in a single operation of removing the excess ionizing radiation-cured resin with a doctor as described above; After filling once, it may be cured by irradiating with ionizing radiation, and then the filling operation may be performed again to improve the filling rate of the groove portion. The size of the matrix and the shape of the grooves that can be used in the present invention are appropriately determined depending on the intended color filter. For example, when supporting a color filter for the super twisted nematic (STN) simple matrix method, the coloring pattern matrix should have 480 grooves with a width of 110 μm, a depth of 3 μm, and a length of about 200 mm lined up at a pitch of 390 μm. Can be done. Also, the width of the black matrix matrix is 20μ.
m, depth of 3μm, length of about 200mm groove is 130μm
It can be assumed that 1441 lines are lined up at a pitch. Then, as shown in FIG. 4, a red pattern 14R with a width of 110 μm was formed on a transparent substrate using a colored pattern matrix.
Green pattern 14G and blue pattern 14B (total 14
40 pieces) are sequentially formed at intervals of 20 μm, and a black matrix can be formed between each colored pattern using a black matrix matrix.

Furthermore, the cross-sectional shape of the groove of the matrix is shown in FIG. 6 (A
) as shown in FIG. 6(B), the side surface is tapered θ relative to the bottom as shown in FIG. 6(C). The sides can be shaped like steps, as shown in the example below. In particular, by setting the cross-sectional shape of the groove to the cross-sectional shape shown in FIGS. 6(B) and (C), the peelability between the master mold and the ionizing radiation-cured resin is improved. In this case, the taper θ is 90°~
The angle is about 10°, preferably about 60° to 40°. Further, it is preferable that the flatness of the bottom of the groove and the depth accuracy of the groove are each within ±10 μm. The matrix material has excellent dimensional stability, low coefficient of thermal expansion, and resistance to in-plane deformation.
It is required to have resistance to ionizing radiation, resistance to ionizing radiation curing resin, and abrasion resistance when removing excess ionizing radiation curing resin with a doctor or the like. Examples of such materials include glasses such as alkali-free glass, alkali glass, surface-polished glass, and low thermal expansion glass; ceramics; metals or metal compounds such as aluminum, chromium, copper, and nickel; vinyl chloride-vinyl acetate copolymers, and polyesters. resins such as polyolefin resins, polyurethane resins, epoxy resins, acrylic resins, polystyrene resins, silicone resins, fluorine resins, or filler-containing resins; or composites of the above can be used. . In addition, in order to improve the releasability between the matrix and the ionizing radiation-cured resin, we have applied various methods such as spraying silicone oil, surface treatments such as chromite treatment on the metal surface, introducing mold release components into the resin, and adding mold release agents. You may go.

[0019] Formation of the matrix using the above-mentioned materials can be performed according to general processing methods such as mechanical cutting, wet etching, dry etching, radiation processing (laser, electron beam, etc.), thin film formation, plating, etc. . Also,
The matrix is one in which the convex part 4a and the base part 4b defining the groove part 6 are integrally formed of the same material as shown in FIG. The protrusion 4a and the base 4b that define the ridge 4a and the base 4b may be made of different materials. Furthermore, as shown in FIG. 7(C), the protrusion 4a and base 4b that define the groove 6 are integrally formed of the same material, and a metal layer 4c is formed on the protrusion 4a to improve wear resistance. As shown in FIG. 7(D), the groove 6
The convex portion 4a and the base portion 4b defining the are formed of different materials,
A metal layer 4c may be formed on the convex portion 4a to improve wear resistance.

Further, when ionizing radiation is irradiated from the matrix side, the material of the matrix must be transparent. As the transparent substrate 12 of the color filter 10, quartz glass,
Inflexible rigid materials such as Pyrex glass and synthetic quartz plates, or flexible materials such as transparent resin films and optical resin plates can be used. Among these, especially Corning's 7059 glass,
It is a material with a low coefficient of thermal expansion and has excellent dimensional stability and workability during high-temperature heat treatment.Also, since it is an alkali-free glass that does not contain any alkali components, it is suitable for color filters for active matrix type LCDs. .

Known ionizing radiation-curable resins and ionizing radiation-curable transparent resins can be used, such as epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate, silicone acrylate, melamine acrylate, unsaturated polyester, polyene/ Photopolymerizable oligomers such as thiols,
A photopolymerizable monomer such as a monofunctional acrylate or a polyfunctional acrylate, a photopolymerization initiator such as a benzoin type, an acetophenone type, a thioxane phosphorus type, or a peroxide type, a photopolymerization initiation aid such as an amine type or a quinone type, etc. are used. be able to. In addition, fillers,
Adhesives, plasticizers, non-reactive polymers, and resins such as urea resins, amide resins, phenol/formalin resins, etc. may also be added. In particular, such ionizing radiation-curable resins contain colored pigments as described below, so that the irradiated ionizing radiation can penetrate deeply into the thioxane phosphorus-structured photopolymerization initiator, which has a longer sensitive wavelength than the acetophenone-structured photoinitiator. It is preferable to use a polymerization initiator. Also,
α has a long wavelength sensitizing effect when mixed with arylate.
The use of photopolymerization initiators such as -aminoacetophenone is preferred. Further, the ionizing radiation-curable resin preferably has a small shrinkage rate when cured by irradiation with ionizing radiation.

The colored pigment contained in such an ionizing radiation-curable resin may be either an organic pigment or an inorganic pigment, and various pigments can be selected depending on the required spectral characteristics. Examples of organic pigments include azo lake pigments, insoluble azo pigments,
Condensed azo pigments, copper phthalocyanine pigments, metal-free phthalocyanine pigments, anthraquinone pigments, condensed polycyclic pigments such as perylene, penoline, and dioxazine, lakes of acidic or basic dyes, or mixtures thereof can be used. Examples of inorganic pigments include white pigments such as titanium white, extender pigments such as calcium carbonate, black pigments such as carbon black, red pigments such as cadmium red,
Yellow pigments such as titanium yellow, green pigments such as titanium cobalt green, blue pigments such as cobalt blue, purple pigments such as manganese violet, etc. can be used. In particular, highly heat-resistant pigments with a discoloration temperature of 150° C. or higher, preferably 250° C. or higher are preferred. Further, as the light-opaque substance for the black matrix, metal oxides such as carbon black, graphite, black iron oxide, iron black, copper oxide, manganese oxide, etc. can be used. The average particle diameter of such a pigment is preferably several μm or less, and a pigment that does not contain particles of 5 μm or more is particularly preferred.

Heat resistance etc. can be improved by subjecting the above pigment to surface treatment. Surface treatments include rosin modification treatment, amine/cation activator treatment,
It is possible to use fatty acid/anion activator treatment, nonionic activator treatment, polymer resin treatment, treatment with pigment derivatives, treatment by topochemical methods such as partial oxidation, solvent treatment, etc., or a combination thereof. In order to improve heat resistance, it is also suitable to incorporate derivatives with slightly different structures into the pigment crystals. For example, by using a small amount of partially chlorinated copper phthalocyanine or phthalimidomethyl copper phthalocyanine in a copper phthalocyanine pigment, it is possible to incorporate a derivative with a slightly different structure into the pigment crystal. An increase in discoloration temperature is observed. Furthermore, a carbamoyl group (-C
ONH2), and the introduction of a carboxyl group (-COOH) also increases the discoloration temperature.

[0024] In addition, since inorganic pigments are more difficult to transmit ultraviolet rays than organic pigments, when using inorganic pigments, the content of the photopolymerization initiator must be increased to 5 to 20% by weight, or the surface treatment of the pigment must be carried out. There is a need to do. However, when using an electron beam as the ionizing radiation, it is not necessary to take such measures. The viscosity of the ionizing radiation-cured resin containing colored pigments is
It is preferably 10,000 cps or less, and particularly preferably 500 cps or less in terms of surface flatness and prevention of air bubbles.

As the ionizing radiation irradiation source, an ultraviolet irradiation device such as a low-pressure mercury lamp, high-pressure mercury lamp, ultra-high-pressure mercury lamp, metal halide lamp, pulsed xenon lamp, or electrodeless discharge lamp can be used, and the irradiation amount is 10
~500 W/cm is preferable. Alternatively, a cold mirror may be used to remove the infrared light to prevent the temperature of the irradiated object from rising. In addition, when using a flat matrix,
When the ionizing radiation-curable resin is sandwiched between the transparent substrate and the matrix, curing failure is likely to occur in the portions of the ionizing radiation-curable resin that come into contact with oxygen, so it is preferable to perform curing in a nitrogen atmosphere. Moreover, a linear filament type, scanning type, or other type of electron beam generator can also be used as the ionizing radiation irradiation source. In this case, the irradiation energy is 100 to 500 kV and 1
~10 Mrad is preferred.

The protective layer 18 provided to cover the colored layer 16 of the color filter 10 is intended to smooth the surface of the color filter 10, improve reliability, and prevent contamination of the liquid crystal layer 40. , acrylic resin, epoxy resin, polyimide resin, or a transparent inorganic compound such as silicon dioxide (SiO2). The thickness of the protective layer is 0.5-50
The thickness is preferably about μm.

As the transparent common electrode 19, an indium tin oxide (ITO) film can be used. The ITO film can be formed by a known method such as a vapor deposition method or a sputtering method, and the thickness is preferably about 200 to 2000 Å. Next, the present invention will be explained in more detail by showing experimental examples. (Experiment Example 1) Surface-polished alkali-free glass (2 m thick)
Prepare four glasses (m) and form a chromium (Cr) film with a thickness of 30,000 Å on the surface of each glass by sputtering method,
A photoresist was applied to a thickness of 2 μm on this Cr film. Next, there are 3 openings with a width of 110 μm and a length of 200 mm.
No. 480 striped photomask (negative type) lined up at a pitch of 90 μm. 1 to 3, 1440 openings with a width of 20 μm and a length of 200 mm at a pitch of 130 μm.
Lined striped photomask (negative type) N
o. 4 was prepared. Then, using these photomasks, exposure, development and etching were performed from the Cr film side of each of the above glasses. As a result, photomask No. 1-3
The glass using each has a width of 110 μm and a depth of 3 μm.
, mother mold No. 480 grooves each having a length of 200 mm are lined up at a pitch of 390 μm. 1 to 3, and photomask No.
．． The glass using No. 4 was a black matrix master mold No. 4 in which 1441 grooves each having a width of 20 μm, a depth of 3 μm, and a length of 200 mm were lined up at a pitch of 130 μm. It was set as 4.

Next, the following blue pigment, green pigment, red pigment, and ultraviolet curing resin were prepared, and after each colored pigment was subjected to a silane coupling treatment, 12 parts by weight of the blue pigment was added to 100 parts by weight of the ultraviolet curing resin. 20 parts by weight of the green pigment and 20 parts by weight of the red pigment were mixed and dispersed to obtain blue, green, and red colored ultraviolet curing resins. (Blue pigment) ・Lionor Blue ES Toyo Ink Mfg. Co., Ltd.
Made by C. I. Pigment B
lue15.6...9 parts by weight ・Lionogen Violet RL Manufactured by Toyo Ink Mfg. Co., Ltd.
C. I. Pigment Vio
let23...3 parts by weight (green pigment) ・Lionol Green 2YS Toyo Ink Manufacturing (
Co., Ltd. C. I. Pigment
Green36...15 parts by weight
・Seika First Yellow 2700 Manufactured by Dainichiseika Kagyo Co., Ltd. C. I. Pigmen
t Yellow83...4 parts by weight (
Red pigment) ・Liotogen Red GD Toyo Ink Mfg. Co., Ltd.
Made by C. I. Pigment R
ed168...23 parts by weight
・Rionogen Red RL Manufactured by Toyo Ink Mfg. Co., Ltd. C. I. Pigment Or
enge36...8 parts by weight (ultraviolet curing resin) - Oligoester acrylate (M-7100, manufactured by Toagosei Co., Ltd.)...50 parts by weight -
Nonylphenoxypolyethylene glycol acrylate (M-111, manufactured by Toagosei Co., Ltd.)...20 parts by weight
・N-vinyl-2-pyrrolidone (viscosity 2 cps)
...20 parts by weight ・Photopolymerization initiator
1-Hydroxycyclohexyl phenyl ketone
(Irgacure 184 manufactured by Ciba Geigy Japan)...3 parts by weight Further, 5 parts by weight of carbon black was mixed and dispersed in 100 parts by weight of the above ultraviolet curable resin to obtain a black ultraviolet curable resin for a black matrix.

[0029] Also, alkali-free glass (Corning 7059, thickness 1.5 mm) whose surface was polished and treated with silane coupling was used.
1 mm) was prepared as a transparent substrate. Next, mother type No.
．． Pour blue ultraviolet curing resin over the entire surface of mother mold No. 1
Excess blue ultraviolet curing resin is removed by sliding a doctor over the mold No. Blue ultraviolet curing resin was filled only in the groove of No. 1. Similarly, mother type No. The groove of No. 2 was filled with green ultraviolet curing resin, and the mold no. The groove of No. 3 was filled with red ultraviolet curing resin, and the mold no. The groove portion of No. 4 was filled with a black ultraviolet curing resin for a black matrix. Then, each matrix was irradiated with ultraviolet light (irradiation amount was 200 m
J/cm2) to cure the colored ultraviolet curable resin in each groove. After that, the above ultraviolet curable resin was applied to the mother mold No. 1 onto the transparent substrate, and place the transparent substrate onto the matrix No. 1. Layered on top of 1. As a result, the transparent substrate and the mother mold No. 1 were stacked together. In this state, ultraviolet rays were irradiated from the transparent substrate side. The irradiation amount was 200 mJ/cm2. By this ultraviolet irradiation, the ultraviolet curable resin is cured to form a transparent ultraviolet curable resin layer, and the blue ultraviolet curable resin is adhered to this ultraviolet curable resin layer. When the transparent substrate was peeled off from No. 1, a blue pattern was formed on the transparent substrate through the ultraviolet curing resin layer.

Next, in the same manner as above, the ultraviolet curing resin was applied to the matrix No. 2 onto the transparent substrate, and place the transparent substrate on the mother mold No. 2 so that the green ultraviolet curing resin is located in an area 20 μm away from the blue pattern among the areas where the blue pattern is not formed on the transparent substrate. 2 and irradiated with ultraviolet rays from the transparent substrate side to form a green pattern on the transparent substrate through the ultraviolet curable resin layer. Furthermore, in the same manner as above, the ultraviolet curing resin was applied to the mother mold No. 3 onto the transparent substrate, and place the transparent substrate on the mother mold No. 3 so that the red ultraviolet curing resin is located in the center of the area (width 150 μm) sandwiched between the blue pattern and green pattern forming areas of the transparent substrate. 3 and irradiated with ultraviolet rays from the transparent substrate side to form a red pattern on the transparent substrate through the ultraviolet curing resin layer. As a result, a colored layer having a colored pattern of red (R), green (G), and blue (B) was formed.

Next, in the same manner as above, the ultraviolet curable resin was applied to the mother mold No. 4, and place the transparent substrate on the matrix No. 4 so that the black ultraviolet curable resin is in close contact with the boundaries (width 20 μm) of the red (R), green (G), and blue (B) colored patterns. 4 and irradiated with ultraviolet rays from the transparent substrate side to form a black matrix on the transparent substrate via the ultraviolet curable resin layer.

Next, a protective layer was formed to cover the colored layer. This protective layer was formed by spin coating using Optomer SS manufactured by Nippon Synthetic Rubber Co., Ltd., and had a thickness of about 25 μm. Furthermore, a transparent common electrode (ITO) with a thickness of approximately 220A is deposited on this protective layer by sputtering.
A color filter was obtained by forming a film). The dimensional accuracy of such a color filter was ±1 μm. (Experimental Example 2) The following electron beam curing resin was used instead of the ultraviolet curing resin, and a polyethylene terphthalate (PET) resin with a thickness of 100 μm was used as the transparent substrate. The irradiation dose before alignment is 10
A color filter was obtained in the same manner as in Experimental Example 1, except that the color filter was cured using 10 Mrad (irradiation dose after superposing the matrix and the transparent substrate was 10 Mrad).

The dimensional accuracy of such a color filter is ±
5 μm, and no major deformation of the PET resin substrate was observed. (Electron beam curable resin) - Urethane acrylate (C-9501 manufactured by Sartomer)...50 parts by weight - Dipentaerythritol hexaacrylate
(M-Toagosei Co., Ltd.) ...15 parts by weight Tetrahydrofurfuryl methacrylate (viscosity 2.5 cp
s)...30 parts by weight (Experiment Example 3) Before overlapping the mother mold and transparent substrate, the amount of ultraviolet ray irradiation was 50 mJ/cm2 to bring the colored ultraviolet curing resin into a semi-cured state, and after the overlapping of the mother mold and transparent substrate. UV irradiation amount of 200mJ/cm2
A color filter was obtained in the same manner as in Experimental Example 1 except for the following. The dimensional accuracy of such a color filter was ±1 μm.

[0034]

As described in detail above, according to the present invention, an ionizing radiation-curable resin containing a colored pigment is filled into grooves for a predetermined colored pattern formed in a matrix, and is cured by irradiation with ionizing radiation. Alternatively, the transparent substrate is placed in a semi-cured state via the ionizing radiation-cured transparent resin, and the transparent substrate is superimposed on the matrix, and ionizing radiation is irradiated from at least one of the transparent substrate side and the matrix side, and the ionizing radiation-cured transparent resin is cured. At the same time as it is cured, the ionizing radiation-cured resin in the groove is adhered to the transparent substrate via the ionizing radiation-cured transparent resin to form a colored pattern on the transparent substrate, and by repeating this process, the required multi-colored colored pattern is created. A color filter with a colored layer consisting of
It becomes possible to manufacture a color filter that has light resistance and good pattern dimensional accuracy, and also simplifies the color filter manufacturing process, making it possible to reduce manufacturing costs.

[Brief explanation of the drawing]

FIG. 1 is a perspective view showing an example of an active matrix liquid crystal display using a color filter manufactured according to the present invention.

FIG. 2 is a schematic cross-sectional view of the liquid crystal display shown in FIG. 1;

3 is an enlarged partial cross-sectional view of a color filter used in the liquid crystal display shown in FIG. 1. FIG.

FIG. 4 is a process diagram for explaining a method for manufacturing a color filter according to the present invention.

FIG. 5 is a process diagram for explaining a method for manufacturing a color filter according to the present invention.

FIG. 6 is a cross-sectional view showing the cross-sectional shape of the matrix.

FIG. 7 is a schematic configuration diagram showing an example of the configuration of a matrix.

[Explanation of symbols]

4...Material mold 6...Groove portion 10...Color filter 12...Transparent substrate 13...Transparent resin layer 14...Colored layers 14R, 14G, 14B...Colored pattern 16...Black matrix

Claims (3)

[Claims] 1. A method for manufacturing a color filter having a colored layer having colored patterns of a plurality of colors, in which an ionizing radiation-curable resin containing a colored pigment is applied to the grooves of a matrix in which grooves for a predetermined coloring pattern are formed. The resin is filled with ionizing radiation and irradiated with ionizing radiation to bring the ionizing radiation-cured resin into a hardened or semi-hardened state, and then applied to the matrix so as to be in close contact with the ionizing radiation-curable resin in the groove through the ionizing radiation-curable transparent resin. The transparent substrates are stacked, and the ionizing radiation is irradiated from at least one of the transparent substrate side and the matrix side to cure the ionizing radiation-curable transparent resin, and the ionization in the groove portion is cured through the cured ionizing radiation-curable transparent resin. Manufacturing a color filter characterized in that a step of bonding a radiation-curable resin and the transparent substrate to form a colored pattern on the transparent substrate is repeated for the required number of colors to form a colored layer on the transparent substrate. Method. 2. After forming the colored layer, the grooves of the master mold in which the grooves for the black matrix are formed are filled with an ionizing radiation-curable resin containing a light-opaque substance, and ionizing radiation is irradiated to cure the ionization. The radiation-cured resin is brought into a cured or semi-cured state, and then the transparent substrate is stacked on the matrix so as to be in close contact with the ionizing radiation-cured resin in the groove via the ionizing radiation-cured transparent resin, and the transparent substrate side and Ionizing radiation is irradiated from at least one side of the matrix to cure the ionizing radiation-curable transparent resin, and the ionizing radiation-curable resin in the groove is bonded to the transparent substrate via the cured ionizing radiation-curable transparent resin. 2. The method of manufacturing a color filter according to claim 1, further comprising the step of forming a black matrix on the transparent substrate. 3. Fill the grooves of the master mold in which the grooves for the black matrix are formed with an ionizing radiation-curable resin containing a light-opaque substance, and irradiate the ionizing radiation-curable resin to a cured state or A semi-cured state is obtained, and then a transparent substrate is placed on the mother mold so as to be in close contact with the ionizing radiation-curable resin in the groove via the ionizing radiation-curable transparent resin, and from at least one of the transparent substrate side and the mother mold side. The ionizing radiation-curable transparent resin was cured by irradiation with ionizing radiation, and the ionizing radiation-curable resin in the groove was bonded to the transparent substrate via the cured ionizing radiation-curable transparent resin to form a black matrix in advance. 2. The method of manufacturing a color filter according to claim 1, wherein a transparent substrate is used.