JPH0431463A - Electrical circuit material - Google Patents
Electrical circuit materialInfo
- Publication number
- JPH0431463A JPH0431463A JP13408890A JP13408890A JPH0431463A JP H0431463 A JPH0431463 A JP H0431463A JP 13408890 A JP13408890 A JP 13408890A JP 13408890 A JP13408890 A JP 13408890A JP H0431463 A JPH0431463 A JP H0431463A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- organic
- metal salt
- present
- reducing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 80
- 239000002184 metal Substances 0.000 claims abstract description 80
- 150000003839 salts Chemical class 0.000 claims abstract description 41
- 239000011230 binding agent Substances 0.000 claims abstract description 22
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 17
- 239000003054 catalyst Substances 0.000 claims description 19
- 239000010419 fine particle Substances 0.000 claims description 17
- 239000002923 metal particle Substances 0.000 claims description 9
- 229910001111 Fine metal Inorganic materials 0.000 claims description 7
- 238000006479 redox reaction Methods 0.000 claims description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 abstract description 3
- KZJPVUDYAMEDRM-UHFFFAOYSA-M silver;2,2,2-trifluoroacetate Chemical compound [Ag+].[O-]C(=O)C(F)(F)F KZJPVUDYAMEDRM-UHFFFAOYSA-M 0.000 abstract description 2
- 239000013528 metallic particle Substances 0.000 abstract 4
- GPNYZBKIGXGYNU-UHFFFAOYSA-N 2-tert-butyl-6-[(3-tert-butyl-5-ethyl-2-hydroxyphenyl)methyl]-4-ethylphenol Chemical compound CC(C)(C)C1=CC(CC)=CC(CC=2C(=C(C=C(CC)C=2)C(C)(C)C)O)=C1O GPNYZBKIGXGYNU-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical class [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical class [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000013522 chelant Chemical class 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Chemical class 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical class [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- -1 silver halide Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical class [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical class [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000001119 stannous chloride Substances 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- IBVWKDVFDAWRFU-UHFFFAOYSA-L benzenesulfonate;nickel(2+) Chemical compound [Ni+2].[O-]S(=O)(=O)C1=CC=CC=C1.[O-]S(=O)(=O)C1=CC=CC=C1 IBVWKDVFDAWRFU-UHFFFAOYSA-L 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical class C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- PQTCMBYFWMFIGM-UHFFFAOYSA-N gold silver Chemical compound [Ag].[Au] PQTCMBYFWMFIGM-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011133 lead Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical class [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- IJAPPYDYQCXOEF-UHFFFAOYSA-N phthalazin-1(2H)-one Chemical class C1=CC=C2C(=O)NN=CC2=C1 IJAPPYDYQCXOEF-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical class OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Conductive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は有機金属塩と還元剤との反応を有機バインダー
中で行うことによって好適に金属微粒子がバインダー中
に分散せしめられた電気回路材料に関する。この電気回
路材料は金属微粒子の種類、組成、分散状態などによっ
て単に導通を確保する回路材料だけでなく、抵抗素子や
発熱回路、磁気回路等の各種の機能を有する電気回路と
しても使用できるものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electric circuit material in which fine metal particles are suitably dispersed in a binder by carrying out a reaction between an organic metal salt and a reducing agent in an organic binder. . This electric circuit material can be used not only as a circuit material that simply ensures continuity, but also as an electric circuit with various functions such as a resistive element, a heating circuit, a magnetic circuit, etc., depending on the type, composition, and dispersion state of the metal fine particles. be.
電子産業の発展とともに各種の機能材料が要求され、特
に種々の電気特性を有する複合材料が多数使用されてい
る。たとえば多数のIC、LSIが搭載されている電子
機器では各素子を組合せ、制御、統合するための電気回
路パターンが多用されている。この各種電気回路は電子
機器の小型軽量化に伴ってより高精細で高性能な材料が
要求されてる。With the development of the electronic industry, various functional materials are required, and in particular, many composite materials having various electrical properties are being used. For example, in electronic devices equipped with a large number of ICs and LSIs, electric circuit patterns are often used to combine, control, and integrate each element. These various electric circuits require higher precision and higher performance materials as electronic devices become smaller and lighter.
このためにはすでに種々の導電性塗料が印刷方式で使用
されており、また銅箔をエツチングによりパターン化す
る方法や無電解メツキや、電気メツキによって回路基板
を形成する方法が提案されている。しかしながら、従来
の技術では高精細なパターンが必ずしも再現性よく大量
に生産できず、より優れた高品位の材料が要求されてい
る。For this purpose, various conductive paints have already been used in printing methods, and methods have been proposed in which copper foil is patterned by etching, and circuit boards are formed by electroless plating and electroplating. However, with conventional techniques, high-definition patterns cannot necessarily be produced in large quantities with good reproducibility, and there is a need for better, higher-quality materials.
〔発明が解決しようとする課題]
本発明は金属微粒子が高濃度かつ均一な分散状態で存在
し、できるだけ少量の金属微粒子で良好な導電特性、電
気特性を得て、高精細で信転性の高い回路基板を作製し
ようとするものである。このためには金属微粒子の粒子
サイズや形状、さらに金属微粒子が凝集した二次構造の
形成をコントロールする必要がある。[Problems to be Solved by the Invention] The present invention provides a method in which fine metal particles are present in a highly concentrated and uniformly dispersed state, and good conductive and electrical properties can be obtained with as little metal fine particles as possible, resulting in high definition and reliability. The aim is to create a high-quality circuit board. For this purpose, it is necessary to control the particle size and shape of the metal fine particles, as well as the formation of a secondary structure in which the metal fine particles aggregate.
本発明は既に本発明者らが見いだした新現象の発見に端
を発し、有用な電気回路材料を発明するに至ったもので
ある。この発明の基本概念となる材料については、例え
ば特開平2−74389号公報等に記載されている。The present invention originated from the discovery of a new phenomenon already discovered by the present inventors, and led to the invention of a useful electric circuit material. The materials forming the basic concept of this invention are described in, for example, Japanese Patent Laid-Open No. 2-74389.
即ち2本発明は、電気回路材料として金属微粒子がバイ
ンダー中に好適に分散せしめられているように金属微粒
子が還元反応によって形成される時にバインダーがすで
に存在しているようにしたものである。しかもこの金属
微粒子を得るための反応の触媒として還元される有機金
属塩より貴な金属を触媒核として含有せしめられる。That is, in the second aspect of the present invention, the binder is already present when the metal fine particles are formed by a reduction reaction so that the metal fine particles are suitably dispersed in the binder as an electric circuit material. Moreover, as a catalyst for the reaction to obtain these metal fine particles, a metal nobler than the organic metal salt to be reduced can be contained as a catalyst nucleus.
本発明は有機バインダーの存在下で有機金属塩と該有機
金属塩のための還元剤とを反応せしめて得られる金属微
粒子が、該有機バインダー中に分散せしめられている電
気回路材料であり、特にこの複合材料が、有機金属塩と
還元剤との酸化還元反応において該有機金属塩より貴な
金属触媒核の存在下で形成された金属微粒子と有機バイ
ンダよりなる電気回路材料に関するものである。The present invention is an electric circuit material in which fine metal particles obtained by reacting an organic metal salt and a reducing agent for the organic metal salt in the presence of an organic binder are dispersed in the organic binder, and in particular, This composite material relates to an electric circuit material comprising metal fine particles and an organic binder formed in the presence of a metal catalyst nucleus nobler than the organic metal salt in a redox reaction between the organic metal salt and the reducing agent.
本発明において用いられる有機金属塩として、二ッ’y
−ル、M、銀、パラジウム、クロム、コバルト、鉛など
の金属塩や、それらのキレート化合物などが用いられる
。特に代表的な金属塩としてはへヘン酸、ステアリン酸
、オレイン酸、酢酸などのカルボン酸の金属塩や、フタ
ラジノン、ベンゾトリアゾールなどの含窒素化合物の金
属塩、アセチルアセトン、エチレンジアミン四酢酸のキ
レート化合物、ジアゾスルホネートの金属塩、スルフィ
ン酸の金属塩などを挙げることができる。特に有機バイ
ンダーに可溶な金属塩は、本発明に有用であり、その例
としてフッ素含有カルボン酸やフッ素含有キレート化合
物の金属塩を挙げることができる。As the organometallic salt used in the present invention, two
- Metal salts such as M, silver, palladium, chromium, cobalt, and lead, and chelate compounds thereof are used. Particularly representative metal salts include metal salts of carboxylic acids such as hehenic acid, stearic acid, oleic acid, and acetic acid; metal salts of nitrogen-containing compounds such as phthalazinone and benzotriazole; chelate compounds of acetylacetone and ethylenediaminetetraacetic acid; Examples include metal salts of diazosulfonate and metal salts of sulfinic acid. Metal salts that are particularly soluble in organic binders are useful in the present invention, examples of which include metal salts of fluorine-containing carboxylic acids and fluorine-containing chelate compounds.
本発明で用いられる還元剤は金属塩を還元するものであ
り、還元されやすい金属塩に対してはヒンダードフェノ
ールなどの弱い還元剤で十分であるが、還元されにくい
金属塩ではヒドラジン類やアスコルビン酸などの強い還
元剤が選択される。The reducing agent used in the present invention is one that reduces metal salts.For metal salts that are easily reduced, a weak reducing agent such as hindered phenol is sufficient, but for metal salts that are difficult to reduce, hydrazines and ascorbin A strong reducing agent such as an acid is chosen.
本発明において特に有機金属塩の金属種より青な金属種
の極微量を触媒核として含有せしめると、還元される金
属微粒子を有機バインー中の所望の位置に形成すること
ができる。例えば有機金属塩と還元剤が有機バインダー
中に含有され、これが薄膜状に引き延ばされている場合
、この表面に有機金属塩の金属種より貴な金属種の極微
量を触媒核として付着せしめて表面の反応を加速せしめ
ると引き延ばされた材料の表面に還元された金属微粒子
を集中的に形成することができる。このように本発明に
おいて有機金属塩の金属種より貴な金属種の極微量を触
媒核として含有せしめることは薄膜状の高性能の電気回
路材料を提供する・うえで極めて有効である。本発明に
おいて有機金属塩より貴な金属触媒核とは、この金属触
媒核が存在することによって有機金属塩と還元剤との反
応を促進するものをいう。例えば有機金属塩が有機銀塩
の場合、これより貴な金属触媒核としては金、パラジウ
ム、白金、ロジウム、水銀、タリウム、鉛などであり、
また金属銀それ自体も金属触媒核となりうる。この金属
触媒核は金属の硫化物、酸化物などの化合物でもよい。In the present invention, in particular, when a trace amount of a metal species bluer than the metal species of the organic metal salt is contained as catalyst nuclei, fine metal particles to be reduced can be formed at desired positions in the organic binder. For example, when an organic metal salt and a reducing agent are contained in an organic binder and this is stretched into a thin film, a very small amount of a metal species nobler than the metal species of the organic metal salt is attached to the surface as catalyst nuclei. By accelerating the reaction on the surface, reduced metal particles can be intensively formed on the surface of the stretched material. As described above, in the present invention, it is extremely effective to contain a very small amount of a metal species nobler than the metal species of the organic metal salt as a catalyst core in providing a thin film-like high-performance electric circuit material. In the present invention, a metal catalyst nucleus more noble than an organic metal salt refers to a metal catalyst nucleus whose presence promotes the reaction between an organic metal salt and a reducing agent. For example, when the organic metal salt is an organic silver salt, nobler metal catalyst nuclei include gold, palladium, platinum, rhodium, mercury, thallium, lead, etc.
Metallic silver itself can also serve as a metal catalyst nucleus. This metal catalyst core may be a compound such as a metal sulfide or oxide.
この金属触媒核を形成せしめる方法としては、塩化パラ
ジウム水溶液、塩化第一錫水溶液に順次浸漬してパラジ
ウム核をつける無電解メツキ前処理法の応用や、蒸着法
、スパッタ法などで微量の金属を付着せしめる方法、あ
るいは水素、硫化水素などの還元性ガスで処理する方法
、活性光線、X線、ガンマ−線などで前処理する方法な
ど多種の方法の中から好適な方法が選択される。Methods for forming these metal catalyst nuclei include the application of an electroless plating pretreatment method in which palladium nuclei are formed by sequentially immersing them in an aqueous solution of palladium chloride and aqueous solution of stannous chloride, or the application of a trace amount of metal by vapor deposition, sputtering, etc. A suitable method is selected from among various methods, such as a method of attachment, a method of treatment with a reducing gas such as hydrogen or hydrogen sulfide, and a method of pretreatment with actinic rays, X-rays, gamma rays, etc.
また金属触媒核を形成せしめる方法として、本発明の有
機金属塩より碑な金属、あるいは有機金属塩に対する還
元剤によって少量の有機金属塩を予め還元せしめ、これ
によって形成された金属核を金属触媒核として用いるこ
ともできる。In addition, as a method for forming a metal catalyst nucleus, a small amount of the organic metal salt is reduced in advance using a metal more important than the organic metal salt of the present invention or a reducing agent for the organic metal salt, and the metal nucleus thus formed is converted into a metal catalyst nucleus. It can also be used as
本発明では、有機金属塩の感光性を利用したり、ハロゲ
ン化銀のような感光性化合物を添加することによって電
気回路材料のパターンを形成する方法が採用できる。こ
れは有機金属塩と還元剤を有機バインダーとともに予め
、塗布、乾燥したのち、触媒核を表面に付着したシート
を準備し、マスクパターンを通して露光、加熱すること
によって電気回路版が得られるようにしたものである。In the present invention, a method can be adopted in which a pattern of an electric circuit material is formed by utilizing the photosensitivity of an organic metal salt or by adding a photosensitive compound such as silver halide. In this method, an organic metal salt and a reducing agent are coated with an organic binder in advance, dried, and then a sheet with catalyst nuclei attached to the surface is prepared, and an electrical circuit plate is obtained by exposing the sheet to light through a mask pattern and heating it. It is something.
露光部では材料内部に露光による触媒核が多数形成され
るため材料内部で酸化還元反応が加速される。In the exposed part, a large number of catalyst nuclei are formed inside the material due to exposure, so that the redox reaction is accelerated inside the material.
一方弁露光部では表面に付着せしめられた触媒核によっ
て金属微粒子が表面近傍に高濃度に存在することになる
。ここで露光部と非露光部ではその電気的性質が異なっ
ていることが今回はじめて判明した。例えば非露光部で
は金属微粒子が高濃度に存在し、一部凝集しているため
導電性を有し一方露光部では金属微粒子が内部に疎に分
散しているために非導電性となる。このような顕著な電
気的性質の差は本発明においてはじめて見いだされたも
のであり、しかも高精細なパターンが得られることが判
明した。また、このような導電性の差は電気メツキ等で
さらに顕著にすることもできる。On the other hand, in the exposed portion of the valve, fine metal particles are present at a high concentration near the surface due to catalyst nuclei attached to the surface. This is the first time that it has been found that the electrical properties of the exposed and non-exposed areas are different. For example, in the non-exposed area, metal fine particles are present at a high concentration and are partially aggregated, so they are conductive, whereas in the exposed area, the metal fine particles are loosely dispersed inside, so they are non-conductive. Such a remarkable difference in electrical properties was discovered for the first time in the present invention, and it was also found that a high-definition pattern could be obtained. Moreover, such a difference in conductivity can be made more noticeable by electroplating or the like.
本発明において導電性パターンを得るための有機金属塩
としては、ニッケル、銅、銀、パラジウムなどが一般的
であり、磁気特性をパターン化するためにはコバルト、
あるいはコバルト・白金系などの金属塩が用いられる。In the present invention, nickel, copper, silver, palladium, etc. are generally used as organic metal salts to obtain a conductive pattern, and cobalt,
Alternatively, metal salts such as cobalt and platinum are used.
また発熱体を回路化する材料としてはタングステン、あ
るいはニッケル、・クロムなどが用いられる。In addition, tungsten, nickel, chromium, etc. are used as the material for circuitizing the heating element.
本発明においては通常このようにして露光によるパター
ン化を行なうが、通常の紫外光、可視光のほかに各種レ
ーザー光によるスキャンニングや電子線照射、X線照射
などを行なうこともできる。In the present invention, patterning is usually carried out by exposure in this way, but scanning with various laser beams, electron beam irradiation, X-ray irradiation, etc. can also be carried out in addition to ordinary ultraviolet light and visible light.
なお、高精細化という目的とは合致しないが、簡便かつ
安価なプロセスとして、予め本発明の有機金属塩と還元
剤の反応を適当なバインダー可溶性溶媒中で反応せしめ
て、金属微粒子がバインダ中に形成せしめられた塗布液
を準備し、グラビアコーター、スクリーン印刷機等でパ
ターンを印刷してもよい。この金属微粒子は室温で反応
せし7めてもよいし、また反応が遅い場合には60〜1
50°C程度に加熱してもよい。なおこの印刷手法によ
るパターンニングは本発明の有機金属塩と還元剤との反
応が開始する前の溶液にも適用することができる。Although it does not match the purpose of high definition, as a simple and inexpensive process, the organic metal salt of the present invention and the reducing agent are reacted in advance in a suitable binder-soluble solvent, so that the metal fine particles are dissolved in the binder. The formed coating liquid may be prepared, and a pattern may be printed using a gravure coater, a screen printer, or the like. The metal fine particles may be reacted at room temperature, or if the reaction is slow, the metal particles may be reacted at room temperature.
It may be heated to about 50°C. Note that patterning by this printing method can also be applied to a solution before the reaction between the organic metal salt of the present invention and the reducing agent starts.
本発明で用いられる有機バインダーとしては溶媒可溶性
のものであれば特に限定されないが、疎水性バインダー
が好ましく、例えばポリスチレン、ポリメチルメタクリ
レート、ポリビニルブヂラル、線状ポリエステル樹脂、
線状ポリウレタン樹脂等から選択することができる。本
発明の金属微粒子と有機バインダーとの比率は重量比で
100対1から1対10の範囲にあることが好ましい。The organic binder used in the present invention is not particularly limited as long as it is solvent soluble, but hydrophobic binders are preferred, such as polystyrene, polymethyl methacrylate, polyvinyl butyral, linear polyester resin,
It can be selected from linear polyurethane resins and the like. The ratio of the metal fine particles to the organic binder of the present invention is preferably in the range of 100:1 to 1:10 by weight.
特に電気回路材料として好適な性能を発揮するためには
金属微粒子の含有量はできるだけ多いほうが好ましいが
、逆にあまり多すぎると平滑なシート状にコーティング
することが難しくなる。In particular, in order to exhibit suitable performance as an electric circuit material, it is preferable that the content of metal fine particles be as high as possible, but on the other hand, if the content is too large, it becomes difficult to coat the material into a smooth sheet.
金属微粒子の大きさは金属塩の種類、加熱温度、還元剤
の種類、溶媒の有無、有機金属塩より貴な金属触媒核の
有無などによって大きく影響され逆にこれらの条件をコ
ントロールすることによって所望のサイズ、形状の金属
微粒子を得ることができる。一般には金属微粒子のサイ
ズは一次粒子として5nm〜50μm程度にコントロー
ルされ、二次の凝集構造が観察される。The size of metal fine particles is greatly influenced by the type of metal salt, heating temperature, type of reducing agent, presence or absence of a solvent, presence or absence of a metal catalyst nucleus that is more noble than the organic metal salt, and conversely, the desired size can be obtained by controlling these conditions. It is possible to obtain fine metal particles with a size and shape of . Generally, the size of metal fine particles is controlled to be about 5 nm to 50 μm as primary particles, and a secondary agglomerated structure is observed.
本発明の電気回路材料はガラス、アルミナ、マイカなど
の各種の無機材料基板の上や、ポリエステルフィルム、
ポリイミドフィルム、エポキシ基板などの有機高分子材
料基板の上にパターンを形成して使用される。さらに、
本発明の電気回路材料はポリエステル、ポリアクリレー
ト、ポリメタクリレート、ポリイミド、ポリウレタン、
エポキシ樹脂などの各種樹脂で、塗布あるいはラミネト
によって保護されていてもよい。The electrical circuit material of the present invention can be used on various inorganic material substrates such as glass, alumina, and mica, on polyester films,
It is used by forming a pattern on an organic polymer material substrate such as a polyimide film or epoxy substrate. moreover,
The electrical circuit materials of the present invention include polyester, polyacrylate, polymethacrylate, polyimide, polyurethane,
It may be protected by coating or laminating with various resins such as epoxy resin.
本発明の材料はシート状で使用される以外に、シートを
熱プレス等で加工した形態で使用してもよく、また不織
布等に含浸せしめてもよい。In addition to being used in the form of a sheet, the material of the present invention may be used in the form of a sheet processed by heat pressing or the like, or it may be impregnated into a nonwoven fabric or the like.
なお、本発明の材料は電気回路材料として発明されたも
のであるが、感光性を利用したパターンニング技術を応
用した各種製品や、装飾、印刷分野などへの応用も可能
である。Although the material of the present invention was invented as an electric circuit material, it can also be applied to various products applying patterning technology using photosensitivity, decoration, printing fields, etc.
以下に本発明をより詳細に説明するための実施例を記載
するがこれは本発明を限定するものではない。Examples are described below to explain the present invention in more detail, but the present invention is not limited thereto.
実施例1 下記の成分(I)からなる溶液を準備した。Example 1 A solution consisting of the following component (I) was prepared.
成分(I)
トリフルオロ酢酸銀 200 gポリビニル
ブチラール 30 g2.2−メチシンビス(
4−エチル−6−t−50gプチルフェへル)
2−ブタノン 1000 gトルエン
200gこの溶液は、約−時間
攪拌して均一化し、平均口径的0.3μ−のフィルター
を通して未溶解物やゴミを除去した後、80μ−の厚さ
のポリエチレンテレフタレートフィルム上に乾燥後の塗
布厚が13μmになるように均一に塗布し乾燥した。Component (I) Silver trifluoroacetate 200 g Polyvinyl butyral 30 g 2.2-methicine bis(
2-butanone 1000 g toluene 200 g This solution was homogenized by stirring for approximately 1 hour, and passed through a filter with an average diameter of 0.3 μ to remove undissolved substances and dirt. After that, it was uniformly coated onto a polyethylene terephthalate film having a thickness of 80 μm so that the coating thickness after drying was 13 μm, and then dried.
このフィルムを下記水溶液(1)および(2)を入れた
各々の処理槽に30秒間づつ通過せしめて再び乾燥した
。This film was passed through each treatment tank containing the following aqueous solutions (1) and (2) for 30 seconds and dried again.
水溶液(1)
塩化パラジウム 500■濃塩酸
20戚
蒸留水 1000 all
水溶液(2)
塩化第一錫 500■濃塩酸
20m1
蒸留水 1000戚
なお、この工程までの操作は暗室中で行った。Aqueous solution (1) Palladium chloride 500■ Concentrated hydrochloric acid
20-distilled water 1000 all Aqueous solution (2) Stannous chloride 500 ■ Concentrated hydrochloric acid
20ml distilled water 1000ml The operations up to this step were performed in a dark room.
次に得られたフィルムにマスクパターン(ポジタイプ)
を密着せしめて、500W超高圧水銀灯を1分間、39
cmの距離から露光せしめた。さらにこのフィルムを1
50°Cで3分間加熱すると未露光部に反射性の銀光沢
パターンが形成され、一方露光部には黒化した銀金属分
散層が感材層内部に形成された。この銀光沢パターン部
は導電性を有し、かつ黒化部は非導電性であることがテ
スターを用いた簡単なテストによって確認できた。Next, mask pattern (positive type) on the obtained film
for 1 minute with a 500W ultra-high pressure mercury lamp.
It was exposed to light from a distance of cm. Furthermore, this film 1
When heated at 50° C. for 3 minutes, a reflective silver luster pattern was formed in the unexposed areas, while a blackened silver metal dispersion layer was formed inside the sensitive material layer in the exposed areas. It was confirmed by a simple test using a tester that the silver glossy pattern part was conductive and the blackened part was non-conductive.
このテストは解像力テストパターンを用いて、20本/
mの細線の形成が可能であることが確認できた。This test uses a resolution test pattern with 20 images/
It was confirmed that it was possible to form a thin wire of m.
実施例2
実施例1で得られた銀金属パターンを電極として電気メ
ツキ法によって導電性パターン上に約10μmの銅金属
層を形成した。このとき黒化銀部分は非導電性のままで
あり外観上も全く変化は認められなかった。このシート
は約30μmのポリエステル製フィルムでラミネートさ
れフレキシブル配線材料として使用可能であった。Example 2 Using the silver metal pattern obtained in Example 1 as an electrode, a copper metal layer with a thickness of about 10 μm was formed on the conductive pattern by electroplating. At this time, the blackened silver portion remained non-conductive and no change was observed in appearance. This sheet was laminated with a polyester film of about 30 μm and could be used as a flexible wiring material.
実施例3
実施例1の成分(1)において銀金減塩の代わりにフェ
ニルスルフオン酸ニッケル、溶媒としてヘプタン、バイ
ンダーとしてポリイソブチレン、還元剤としてN−メチ
ル−P−アミノ−フェノールサルフェートを成分(1)
と同様の量比で用いた。Example 3 In component (1) of Example 1, nickel phenylsulfonate was used instead of silver-gold salt reduction, heptane was used as a solvent, polyisobutylene was used as a binder, and N-methyl-P-amino-phenol sulfate was used as a reducing agent ( 1)
It was used in the same ratio.
二の溶液を実施例1と同様に塗布乾燥し、ついで水溶液
(1)および(2)で処理し、パターン露光した後、さ
らに140″Cで5分間加熱処理すると導電性のパター
ンが得られる。この金属ニッケル系の材料は実施例1と
同様に電気回路材料として有用であることが分かった。The second solution was applied and dried in the same manner as in Example 1, then treated with aqueous solutions (1) and (2), pattern exposed, and then heated at 140''C for 5 minutes to obtain a conductive pattern. This metallic nickel-based material was found to be useful as an electric circuit material, as in Example 1.
特許出願人 旭化成工業株式会社Patent applicant: Asahi Kasei Industries, Ltd.
Claims (2)
属塩のための還元剤とを反応せしめて得られる金属微粒
子が、該有機バインダー中に分散せしめられている電気
回路材料(1) Electric circuit material in which fine metal particles obtained by reacting an organic metal salt and a reducing agent for the organic metal salt in the presence of an organic binder are dispersed in the organic binder.
元剤との酸化還元反応において該有機金属塩より貴な金
属触媒核の存在下で形成された金属微粒子と有機バイン
ダーよりなる電気回路材料(3)請求項(1)または(
2)の電気回路材料が微細な電気回路を形成しているシ
ート状の電気回路基板(2) The electric circuit material according to claim (1) comprises metal fine particles formed in the redox reaction between an organic metal salt and a reducing agent in the presence of a metal catalyst nucleus nobler than the organic metal salt and an organic binder. Electric circuit material (3) Claim (1) or (
2) A sheet-shaped electrical circuit board in which the electrical circuit material forms a minute electrical circuit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13408890A JPH0431463A (en) | 1990-05-25 | 1990-05-25 | Electrical circuit material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13408890A JPH0431463A (en) | 1990-05-25 | 1990-05-25 | Electrical circuit material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0431463A true JPH0431463A (en) | 1992-02-03 |
Family
ID=15120140
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13408890A Pending JPH0431463A (en) | 1990-05-25 | 1990-05-25 | Electrical circuit material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0431463A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002157918A (en) * | 2000-11-17 | 2002-05-31 | Jsr Corp | Conductive composite particle and applied product using it |
WO2003056574A1 (en) * | 2001-12-27 | 2003-07-10 | Fujikura Ltd. | Electroconductive composition, electroconductive coating and method for forming electroconductive coating |
JP2004253794A (en) * | 2003-01-29 | 2004-09-09 | Fuji Photo Film Co Ltd | Ink for forming printed wiring board, method for forming printed wiring board, and the printed wiring board |
US7771627B2 (en) | 2002-04-10 | 2010-08-10 | Fujikura Ltd. | Conductive composition |
JP2017174705A (en) * | 2016-03-25 | 2017-09-28 | 東レ株式会社 | Conductive paste, method for producing conductive pattern, and substrate comprising conductive pattern |
-
1990
- 1990-05-25 JP JP13408890A patent/JPH0431463A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002157918A (en) * | 2000-11-17 | 2002-05-31 | Jsr Corp | Conductive composite particle and applied product using it |
WO2003056574A1 (en) * | 2001-12-27 | 2003-07-10 | Fujikura Ltd. | Electroconductive composition, electroconductive coating and method for forming electroconductive coating |
KR100951726B1 (en) * | 2001-12-27 | 2010-04-07 | 가부시키가이샤후지쿠라 | Electroconductive composition, electroconductive coating and method for forming electroconductive coating |
US7771627B2 (en) | 2002-04-10 | 2010-08-10 | Fujikura Ltd. | Conductive composition |
JP2004253794A (en) * | 2003-01-29 | 2004-09-09 | Fuji Photo Film Co Ltd | Ink for forming printed wiring board, method for forming printed wiring board, and the printed wiring board |
JP2017174705A (en) * | 2016-03-25 | 2017-09-28 | 東レ株式会社 | Conductive paste, method for producing conductive pattern, and substrate comprising conductive pattern |
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