JPH04301099A - Electrolytic pickling and polishing method - Google Patents

Electrolytic pickling and polishing method

Info

Publication number
JPH04301099A
JPH04301099A JP6707991A JP6707991A JPH04301099A JP H04301099 A JPH04301099 A JP H04301099A JP 6707991 A JP6707991 A JP 6707991A JP 6707991 A JP6707991 A JP 6707991A JP H04301099 A JPH04301099 A JP H04301099A
Authority
JP
Japan
Prior art keywords
electrolytic bath
polishing
electrolytic
polished
electrolyte
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6707991A
Other languages
Japanese (ja)
Inventor
Taketo Okumura
奥 村 健 人
Yasushi Chichihara
乳▲原▼ 寧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP6707991A priority Critical patent/JPH04301099A/en
Publication of JPH04301099A publication Critical patent/JPH04301099A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To stabilize polishability and to improve efficiency by mixing and forming the electrolytic bath to be used for electrolytic polishing just before a stage in a polishing device, thereby forming and supplying the electrolytic bath optimum for a material to be polished at proper times. CONSTITUTION:An electrolyte stock tank 31 and a paste forming agent stock tank 32 are held respectively independently. The information on polishing by external input or automatic detection is inputted from an input terminal 37 to an electrolytic bath controller 29. An electrolyte replenishing pump 34, a paste forming agent replenishing pump and a washing water supplying pump 26 are driven and stopped at proper times according to the signal based thereon and the electrolytic bath is injected into an electrolytic bath mixing tank 30 and is mixed therein. The always optimum electrolytic bath 24 is, therefore, supplied to soft pads 11 of respective polishing electrodes 10 by a pump 4, by which the material to be polished is electrolytically pickled and polished.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、電解酸洗研摩方法に関
し、さらに詳しくはペースト状電解浴を用いた移動電極
方式による部分電解酸洗研摩方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic pickling and polishing method, and more particularly to a partially electrolytic pickling and polishing method using a moving electrode system using a paste electrolytic bath.

【0002】0002

【従来の技術】厚鋼板のミルスケール除去方法には、シ
ョットブラスト・サンドブラストによる方法、砥石・ベ
ルト砥石等による方法、あるいは両者の組み合せによる
方法等、いわゆる機械的除去方法と、ステンレス鋼のご
とく酸洗槽による化学的除去方法が、従来より行なわれ
ている。
[Prior Art] Mill scale removal methods for thick steel plates include so-called mechanical removal methods, such as shot blasting/sandblasting, grindstone/belt grindstone, etc., or a combination of both, and acid removal methods such as those for stainless steel. A chemical removal method using a washing tank has traditionally been used.

【0003】これに対して、電気化学的研摩法である移
動電極方式による部分電解酸洗研摩法が開発された(例
えば、特開昭64−4500号公報参照)。
In response to this, a partial electrolytic pickling polishing method using a moving electrode method, which is an electrochemical polishing method, has been developed (see, for example, Japanese Patent Laid-Open No. 4500/1983).

【0004】電気化学的方法である前記研摩法では、機
械的研摩法に比べて研摩負荷を削減でき、研摩時の発熱
も小さく、研摩歪の発生を抑制できる。さらに、移動電
極による部分酸洗研摩法であるため、酸洗槽によるドブ
漬法に比べて設備の小型化、効率化をはかることができ
、片面のみの処理も可能である。
The polishing method, which is an electrochemical method, can reduce the polishing load compared to the mechanical polishing method, generate less heat during polishing, and suppress the occurrence of polishing distortion. Furthermore, since it is a partial pickling and polishing method using a moving electrode, the equipment can be made smaller and more efficient than the pickling method using a pickling tank, and it is also possible to treat only one side.

【0005】移動電極方式による部分電解酸洗研摩法(
以下、電解研摩と略称する)は、薄鋼板のように酸洗槽
を連続通板できない厚鋼板等を対象とすることおよび電
極(自転、公転もしくは両者の組み合せ、あるいは振動
を与えることを常とする)を移動させながら部分的に処
理を行なうこと等の理由により、ペースト状の電解浴と
、この電解浴を電極と被研摩材との間に保持するための
軟質パッド(機械的研摩能を付与するために若干の砥粒
を混入する場合がある)を電極直下にとり付けた形式と
なる。
Partial electrolytic pickling and polishing method using a moving electrode method (
Electrolytic polishing (hereinafter abbreviated as electrolytic polishing) is used for thick steel plates that cannot be continuously passed through a pickling tank, such as thin steel plates, and for electrodes (rotation, revolution, a combination of both, or vibration). For some reasons, such as partially processing while moving the electrode, a paste-like electrolytic bath and a soft pad (with mechanical polishing ability) to hold this electrolytic bath between the electrode and the material to be polished are used. A small amount of abrasive grains may be mixed in to apply the abrasive grains) is attached directly below the electrode.

【0006】前記電解研摩にて使用する電解浴に要求さ
れる特性は、前記電解研摩の特徴から、十分な通電性(
電解質の含有量)を適切な粘度(ペースト化の程度)お
よび化学的研摩能を付与するための適度な酸性度である
と言える。
[0006] The characteristics required of the electrolytic bath used in the electrolytic polishing are sufficient electrical conductivity (
It can be said that the content of electrolyte), the appropriate viscosity (degree of pasting), and the appropriate acidity to impart chemical polishing ability.

【0007】[0007]

【発明が解決しようとする課題】これらの特性を満足さ
せた電解浴を、電解浴製造設備にてあらかじめ作成し、
電解研摩に使用することになる。要求される特性値の内
、酸性度は、設備の耐酸性、作業環境の制約のもとで、
被研摩材の材質、スケール層組成およびスケール層厚(
以下、被研摩材の特性という)により適正値が異なる。 また、電解質の量も、被研摩材の特性により必要投入電
気量が異なるため、調整する必要がある。さらに粘度に
ついては、前述のごとく移動電極方式による部分研摩の
ため、電解浴を電極直下に良好に保持するための重要な
特性であるが、気温、被研摩材温度、電解浴自身の温度
等の影響で容易に変化するため、研摩条件(電極回転数
、電極間(電極〜被研摩材)距離、軟質パッド材質等)
に加えて、環境的条件(気温、被研摩材温度)により適
正値が異なる。従って、被研摩材の特性、環境的条件、
研摩条件が異なると一種類の電解浴では研摩能が安定せ
ず、逆に研摩能を安定化させるためには、それぞれの条
件の組み合せ数に応じた電解浴が必要となり、このこと
が同一設備での多種にわたる被研摩材処理を困難ならし
めていた。
[Problem to be solved by the invention] An electrolytic bath that satisfies these characteristics is prepared in advance at an electrolytic bath manufacturing facility, and
It will be used for electrolytic polishing. Among the required characteristic values, acidity is determined based on the acid resistance of the equipment and the constraints of the working environment.
Material of the material to be polished, scale layer composition and scale layer thickness (
The appropriate value differs depending on the characteristics of the material to be polished (hereinafter referred to as the characteristics of the material to be polished). Furthermore, the amount of electrolyte needs to be adjusted because the amount of electricity required varies depending on the characteristics of the material to be polished. Furthermore, as mentioned above, viscosity is an important characteristic for maintaining the electrolytic bath well under the electrode because of the moving electrode method used for partial polishing. Polishing conditions (electrode rotation speed, distance between electrodes (electrode to polished material), soft pad material, etc.)
In addition, the appropriate value differs depending on the environmental conditions (air temperature, temperature of the material to be polished). Therefore, the characteristics of the material being polished, the environmental conditions,
If the polishing conditions are different, the polishing performance of one type of electrolytic bath will not be stable.On the other hand, in order to stabilize the polishing performance, electrolytic baths corresponding to the number of combinations of each condition are required. This makes it difficult to process a wide variety of materials to be polished.

【0008】さらに、電解研摩では前述のごとく、研摩
時の発熱は、機械的研摩法に比べて小さいものの完全に
は無視できず、しかも熱伝導率が比較的低いペースト状
電解浴を使用するため、電解浴中(電極〜被研摩材間)
に熱が滞留し、研摩を進めるに従って電解浴の温度変化
に伴い粘度が変化する。このような研摩作業中の粘度変
化には、あらかじめ製造した電解浴を供給する方法では
事実上対応できなかった。
Furthermore, as mentioned above, in electrolytic polishing, the heat generated during polishing is smaller than that in mechanical polishing, but cannot be completely ignored, and furthermore, because a paste-like electrolytic bath with relatively low thermal conductivity is used. , in an electrolytic bath (between the electrode and the material to be polished)
As the polishing progresses, the viscosity changes as the temperature of the electrolytic bath changes. Such changes in viscosity during polishing operations could not be effectively dealt with by the method of supplying an electrolytic bath prepared in advance.

【0009】さらに、従来は電解浴を複数種にわたって
切換えて使用する場合、電解浴種類と同数のストックタ
ンクを研摩装置内に設置する必要があり装置が大型化し
ていた。この大型化を防ぐためストックタンクを少数(
極端な場合には1タンク)とすると、電解浴切換毎に使
用電解浴のタンク内からの除去、タンク洗浄、新電解浴
のタンクへの注入が必要であり、所要時間が大きくかか
り、設備の稼働率の低下となっていた。また切換時タン
ク内の残電解浴回収が困難な場合は残電解浴は廃棄せざ
るを得ず、電解浴の原単位の上昇が避けられなかった。
Furthermore, conventionally, when a plurality of types of electrolytic baths are used, it is necessary to install stock tanks in the polishing apparatus in the same number as the types of electrolytic baths, which increases the size of the apparatus. To prevent this increase in size, a small number of stock tanks (
In extreme cases, if one tank is used, each time the electrolytic bath is switched, it is necessary to remove the used electrolytic bath from the tank, clean the tank, and pour a new electrolytic bath into the tank, which takes a lot of time and reduces the equipment. The operating rate was decreasing. Furthermore, if it is difficult to recover the remaining electrolytic bath in the tank at the time of switching, the remaining electrolytic bath must be discarded, and an increase in the basic unit of electrolytic bath is unavoidable.

【0010】図5は、従来のストックタンク1基の場合
における部分電解研摩方法の一例を示すフロー図である
FIG. 5 is a flowchart showing an example of a conventional partial electrolytic polishing method in the case of one stock tank.

【0011】図5において、2はペースト状電解浴1を
装入した電解浴ストックタンクで、14は予熱ヒーター
、15は撹拌器である。また、前記タンク2の下部には
ポンプ4およびリリーフ弁5を設け、配管6にて電解浴
の循環ができる。
In FIG. 5, numeral 2 is an electrolytic bath stock tank in which the pasty electrolytic bath 1 is charged, numeral 14 is a preheating heater, and numeral 15 is a stirrer. Further, a pump 4 and a relief valve 5 are provided at the lower part of the tank 2, and the electrolytic bath can be circulated through a pipe 6.

【0012】電解浴1を取替える場合は、電解浴排出弁
8を開き、電解浴供給配管3を介して排出配管7から排
出する。
When replacing the electrolytic bath 1, the electrolytic bath discharge valve 8 is opened and the electrolytic bath is discharged from the discharge pipe 7 via the electrolytic bath supply pipe 3.

【0013】研摩に際しては、被研摩材12の研摩面に
対向して1個または2個以上の研摩電極10がそれぞれ
軟質パッド11を前記研摩面に接して設けられる。16
は通電ブラシ、17は被研摩材通電電極、18はケーブ
ル、19は電解電源である。
During polishing, one or more polishing electrodes 10 are provided facing the polishing surface of the material 12 to be polished, each with a soft pad 11 in contact with the polishing surface. 16
17 is a current-carrying brush, 17 is a current-carrying electrode for the material to be polished, 18 is a cable, and 19 is an electrolytic power source.

【0014】前記研摩電極10へのペースト状電解浴の
供給は、前記電解浴供給配管3を介して、流量計13お
よびポンプ4で流量を調整しながら電解浴供給ヘッダー
9を介して行なわれる。
The pasty electrolytic bath is supplied to the polishing electrode 10 through the electrolytic bath supply pipe 3 and through the electrolytic bath supply header 9 while adjusting the flow rate with a flow meter 13 and a pump 4.

【0015】このような従来の装置で研摩作業を円滑に
行なうためには、前記ストックタンク2の容量は200
〜300リットルを必要とする。
[0015] In order to perform the polishing work smoothly with such a conventional device, the capacity of the stock tank 2 must be 200 ml.
Requires ~300 liters.

【0016】本発明は、前記の諸問題を解決し、ペース
ト状電解浴を用いた移動電極方式による部分電解酸洗研
摩法において、被研摩材の特性、環境的条件、研摩条件
の変化に対応し、研摩能を安定化させた電解酸洗研摩方
法を提供することを目的としている。
The present invention solves the above-mentioned problems and adapts to changes in the characteristics of the material to be polished, environmental conditions, and polishing conditions in a partial electrolytic pickling polishing method using a moving electrode method using a paste electrolytic bath. The object of the present invention is to provide an electrolytic pickling polishing method with stable polishing performance.

【0017】[0017]

【課題を解決するための手段】上記目的を達成するため
に本発明によれば、ペースト状電解浴を用いて被研摩材
と移動電極との間に通電することにより部分電解酸洗を
行なうに際し、少なくとも1つの電解質および少なくと
も1つのペースト化剤から被研摩材の特性、環境的条件
に応じて電解質およびペースト化剤の種類および構成比
率を制御した電解浴を用いて被研摩材に応じて所定の電
解条件で電解酸洗研摩することを特徴とする電解酸洗研
摩方法が提供される。
[Means for Solving the Problems] According to the present invention, in order to achieve the above object, partial electrolytic pickling is carried out by applying current between a material to be polished and a moving electrode using a paste electrolytic bath. , at least one electrolyte and at least one pasting agent, using an electrolytic bath in which the type and composition ratio of the electrolyte and the pasting agent are controlled according to the characteristics of the material to be polished and environmental conditions. An electrolytic pickling and polishing method is provided, which is characterized in that electrolytic pickling and polishing is carried out under the following electrolytic conditions.

【0018】以下に本発明を図1を参照しながらさらに
詳細に説明する。
The present invention will be explained in more detail below with reference to FIG.

【0019】図1は本発明の一実施例を示す電解酸洗研
摩方法のフロー図である。本発明では電解質ストックタ
ンク31とペースト化剤ストックタンク32をそれぞれ
独立に保有し、入力端子37により入力する被研摩材特
性および研摩条件(外部入力または自動検出による)と
、研摩部温度計および粘度計27および発生電圧(電圧
計28により)、さらには混合後のペースト状電解浴2
4の温度計、pH計、液面計および粘度計の値25の情
報を電解浴制御装置29に入力し、これに基づいて電解
浴制御装置29が電解質補給ポンプ34、ペースト化剤
補給ポンプおよび浄水供給ポンプ26を適時駆動、停止
して各電解質20、21、各ペースト化剤22、23を
それぞれを電解浴混合タンク30に注入、混合し、常に
最適な電解浴24を電解浴供給ポンプ4により各研摩電
極10の軟質パッド11へ供給して電解酸洗研摩するも
のである。なお、36は逆止弁である。
FIG. 1 is a flowchart of an electrolytic pickling and polishing method showing an embodiment of the present invention. In the present invention, an electrolyte stock tank 31 and a pasting agent stock tank 32 are independently provided, and the characteristics of the material to be polished and the polishing conditions (by external input or automatic detection) input through the input terminal 37, the temperature meter of the polishing part, and the viscosity. total 27 and the generated voltage (by voltmeter 28), as well as the paste electrolyte bath 2 after mixing.
The information on the values 25 of the thermometer, pH meter, liquid level meter, and viscometer in step 4 is input to the electrolytic bath control device 29, and based on this, the electrolytic bath control device 29 controls the electrolyte replenishment pump 34, pasting agent replenishment pump, and The purified water supply pump 26 is driven and stopped at appropriate times, and each electrolyte 20, 21 and each pasting agent 22, 23 are injected and mixed into the electrolytic bath mixing tank 30, and the electrolytic bath supply pump 4 always supplies the optimum electrolytic bath 24. is supplied to the soft pad 11 of each polishing electrode 10 for electrolytic pickling polishing. Note that 36 is a check valve.

【0020】電解浴切換時は、電解浴排出弁8を開放し
電解浴供給ポンプ4を作動することによって系外へ排出
または回収する。さらに、前記混合タンク30以降の洗
浄は浄水供給配管33からの浄水を使用することによっ
て容易に行ない得る。
When switching the electrolytic bath, the electrolytic bath discharge valve 8 is opened and the electrolytic bath supply pump 4 is operated to discharge or recover the electrolytic bath from the system. Further, cleaning of the mixing tank 30 and subsequent parts can be easily performed by using purified water from the purified water supply pipe 33.

【0021】図3〜5は、それぞれ電解質としてNa2
 SO4、ペースト化剤としてポリアクリル酸ソーダを
用いた場合の電解浴温度と粘度の関係、ペースト化剤添
加率と粘度の関係、電解質量と発生電圧の関係を示すグ
ラフである。これらから被研摩材、研摩条件(速度、投
入電気量等)に対応した目標とする酸性度、粘度等と上
記各因子間の関係を電解浴制御装置にあらかじめ登録す
ることによって常に最適な電解浴で安定して研摩するこ
とが可能となることがわかる。
FIGS. 3 to 5 show Na2 as the electrolyte, respectively.
It is a graph showing the relationship between electrolytic bath temperature and viscosity, the relationship between pasting agent addition rate and viscosity, and the relationship between electrolyte mass and generated voltage when using SO4 and sodium polyacrylate as a pasting agent. From these, the target acidity, viscosity, etc. corresponding to the material to be polished, polishing conditions (speed, amount of electricity input, etc.) and the relationship between each of the above factors are registered in advance in the electrolytic bath control device, so that the electrolytic bath is always optimal. It can be seen that stable polishing is possible.

【0022】また、本発明によれば電解質、ペースト化
剤の構成比は5〜20%であることから各ストックタン
クの容量も小さくてよく、設備の小型化が実現できる。
Further, according to the present invention, since the composition ratio of the electrolyte and the pasting agent is 5 to 20%, the capacity of each stock tank may be small, and the equipment can be downsized.

【0023】また、電解浴混合タンクの容量は、常に最
適な電解浴を研摩部に供給し、かつ切換時のロスを少な
くするために、研摩部への供給量をやや上まわる程度に
小容量化することができる。
In addition, the capacity of the electrolytic bath mixing tank is small enough to slightly exceed the amount supplied to the polishing section in order to always supply the optimum electrolytic bath to the polishing section and to reduce loss during switching. can be converted into

【0024】なお、上記説明では、電解質2種、ペース
ト化剤2種を搭載した形態としているが、それぞれの数
に制約はなく、また、混合に供する電解質とペースト化
剤の組み合せにも原理上の制約はない。また、電極10
も3個に限るものではない。
[0024] In the above explanation, two types of electrolytes and two types of pasting agents are installed, but there is no restriction on the number of each, and the combination of electrolytes and pasting agents to be mixed is subject to principle. There are no restrictions. In addition, the electrode 10
The number is not limited to three.

【0025】[0025]

【作用】本発明によれば、被研摩材の特性、環境条件、
電解条件に対応して電解質の種類(酸性度)、電解質の
量、ペースト化剤の量を研摩装置内で随時変更した後、
混合し、研摩部へ供給できる。さらに、研摩作業中の発
生熱、研摩部分への除去スケールの混入、軟質パッドの
経時的変化による電解浴保持力の変化に対しても、研摩
部の電解質温度、被研摩材温度、発生電圧を検出するこ
とによって対応できる。
[Operation] According to the present invention, the characteristics of the material to be polished, the environmental conditions,
After changing the type of electrolyte (acidity), amount of electrolyte, and amount of pasting agent in the polishing equipment as needed according to the electrolytic conditions,
Can be mixed and supplied to the polishing section. Furthermore, the electrolyte temperature in the polishing part, the temperature of the material to be polished, and the generated voltage can be adjusted to prevent changes in the electrolyte retention force caused by the heat generated during polishing, the contamination of removed scale in the polishing part, and changes in the soft pad over time. You can respond by detecting it.

【0026】従って、同一装置で多様な被研摩材に対し
、ペースト状電解質を数多く用意をすることなく適切な
電解浴を用いて安定した研摩能で研摩できるようになっ
た。
[0026] Therefore, it has become possible to polish various materials to be polished with stable polishing performance using an appropriate electrolytic bath without having to prepare a large number of paste electrolytes with the same apparatus.

【0027】本発明によれば、電解質、ペースト化剤を
必要種類搭載すればよく、通常これらは5〜20wt%
添加であるため各搭載容量は少なくてよく、従って設備
を小型化できる。さらに、混合用タンクとして必要供給
量が満足できる程度に小型化でき、電解浴切換時の電解
浴ロス、切換時間ロスを大幅に減少させることができる
[0027] According to the present invention, it is sufficient to carry necessary types of electrolyte and pasting agent, and usually these are contained in an amount of 5 to 20 wt%.
Since it is an additive, each loading capacity can be small, and the equipment can therefore be downsized. Furthermore, it can be made small enough to satisfy the required supply amount as a mixing tank, and electrolytic bath loss and switching time loss when switching electrolytic baths can be significantly reduced.

【0028】[0028]

【実施例】以下に本発明を実施例に基づき具体的に説明
する。
EXAMPLES The present invention will be specifically explained below based on examples.

【0029】(実施例1)電解質としてNa2 SO4
 を、ペースト化剤としてポリアクリル酸ソーダを、ま
た残部には浄水を用い、図1に示す装置にて移動電極方
式による部分電解酸洗研摩法により厚鋼板(SUS30
4相当鋼、厚さ20mm)のミルスケール除去を行なっ
た。
(Example 1) Na2 SO4 as electrolyte
A thick steel plate (SUS30
Mill scale was removed from 4-equivalent steel (20 mm thick).

【0030】各電解質タンクおよびペースト化剤タンク
容量は各20リットル、電解浴混合タンク容量は5リッ
トル1基とし、軟質パッド(厚さ30mm×220mm
φ)を用いた。
Each electrolyte tank and pasting agent tank has a capacity of 20 liters, one electrolyte bath mixing tank has a capacity of 5 liters, and a soft pad (thickness 30 mm x 220 mm)
φ) was used.

【0031】以上のような条件のもとに、まず電解電圧
15V、研摩部への電解質粘度30×103 ポイズを
目標とした制御を、次に電解電圧10V、研摩部への電
解質粘度10×103 ポイズと目標とした制御を行な
った。この間での電解質ロスは5リットル(うちNaS
O4 約0.5リットル、ポリアクリル酸約0.3リッ
トル含有)、切換時間ロスは約1分であり、いずれの条
件においても安定した研摩が行なわれた。
Under the above conditions, first, the electrolysis voltage was 15V, and the electrolyte viscosity to the polished area was controlled to be 30×103 poise, and then the electrolysis voltage was 10V, and the electrolyte viscosity to the polished area was controlled to be 10×103 poise. Poise and targeted control were performed. The electrolyte loss during this time was 5 liters (of which NaS
(containing about 0.5 liters of O4 and about 0.3 liters of polyacrylic acid), the switching time loss was about 1 minute, and stable polishing was performed under all conditions.

【0032】[0032]

【発明の効果】本発明は、以上説明したように構成され
ているので、電解研摩に用いる電解浴を、研摩装置内で
電解質、ペースト化剤、浄水を混合することによって作
成し、研摩部に供給する方法としたために、被研摩材の
特性、環境的条件、研摩条件に最も適した電解浴を随時
作成供給でき、研摩能の安定化が得られるようになった
[Effects of the Invention] Since the present invention is constructed as described above, an electrolytic bath used for electrolytic polishing is created by mixing an electrolyte, a pasting agent, and purified water in a polishing device, and is applied to the polishing part. Because of this feeding method, the electrolytic bath most suitable for the characteristics of the material to be polished, environmental conditions, and polishing conditions can be created and supplied at any time, making it possible to stabilize the polishing performance.

【0033】また、電解質、ペースト化剤を独立に保有
し、通常混合割合の最も多い浄水は外部から導入できる
ために設備の小型化が実現できた。
Furthermore, the electrolyte and the pasting agent are stored independently, and purified water, which usually has the highest mixing ratio, can be introduced from outside, making it possible to downsize the equipment.

【0034】さらに、混合タンクの容量を適切とするこ
とによって電解浴切換時のロスを削減できるという効果
もある。
Furthermore, by optimizing the capacity of the mixing tank, it is possible to reduce losses when switching electrolytic baths.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の電解酸洗研摩方法の一例を示すフロー
図である。
FIG. 1 is a flow diagram showing an example of the electrolytic pickling and polishing method of the present invention.

【図2】電解質10%Na2 SO4 、ペースト化剤
5%ポリアクリル酸ソーダ混合時の電解浴温度と粘度と
の関係を示すグラフである。
FIG. 2 is a graph showing the relationship between electrolytic bath temperature and viscosity when an electrolyte of 10% Na2SO4 and a pasting agent of 5% sodium polyacrylate are mixed.

【図3】電解浴温度30℃でのペースト化剤ポリアクリ
ル酸ソーダ添加量と粘度との関係を示すグラフである。
FIG. 3 is a graph showing the relationship between the amount of pasting agent sodium polyacrylate added and viscosity at an electrolytic bath temperature of 30°C.

【図4】電解浴温度30℃での電解質Na2 SO4 
添加量と電解電圧との関係を示すグラフである。
[Figure 4] Electrolyte Na2 SO4 at electrolytic bath temperature of 30°C
It is a graph showing the relationship between the addition amount and the electrolytic voltage.

【図5】従来の部分電解研摩方法を示すフロー図である
FIG. 5 is a flow diagram showing a conventional partial electrolytic polishing method.

【符号の説明】[Explanation of symbols]

1  ペースト状電解浴 2  電解浴ストックタンク 3  電解浴供給配管 4  電解浴供給ポンプ 5  リリーフ弁 6  リリーフ配管 7  電解浴排出配管 8  電解浴排出弁 9  電解浴供給ヘッダー 10  研摩電極 11  軟質パッド 12  被研摩材 13  流量計 14  電解浴予熱ヒーター 15  電解浴撹拌器 16  通電ブラシ 17  被研摩材通電電極 18  ケーブル 19  電解電源 20、21  電解質 22、23  ペースト化剤 24  混合後のペースト状電解浴 25  混合後の電解浴の温度計、pH計、液面計、粘
度計 26  浄水供給ポンプ 27  研摩部温度計、粘度計 28  電圧計 29  電解浴制御装置 30  電解浴混合タンク 31  電解質ストックタンク 32  ペースト化剤ストックタンク 33  浄水供給配管 34  電解質補給ポンプ 35  ペースト化剤供給ポンプ 36  逆止弁
1 Paste electrolytic bath 2 Electrolytic bath stock tank 3 Electrolytic bath supply piping 4 Electrolytic bath supply pump 5 Relief valve 6 Relief piping 7 Electrolytic bath discharge piping 8 Electrolytic bath discharge valve 9 Electrolytic bath supply header 10 Polishing electrode 11 Soft pad 12 To be polished Material 13 Flow meter 14 Electrolytic bath preheating heater 15 Electrolytic bath stirrer 16 Current-carrying brush 17 Current-carrying electrode for polished material 18 Cable 19 Electrolytic power source 20, 21 Electrolyte 22, 23 Pasting agent 24 Paste electrolytic bath after mixing 25 After mixing Electrolytic bath thermometer, pH meter, liquid level meter, viscometer 26 Clean water supply pump 27 Polishing part thermometer, viscometer 28 Voltmeter 29 Electrolytic bath control device 30 Electrolytic bath mixing tank 31 Electrolyte stock tank 32 Pasting agent stock tank 33 Clean water supply piping 34 Electrolyte replenishment pump 35 Pasting agent supply pump 36 Check valve

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  ペースト状電解浴を用いて被研摩材と
移動電極との間に通電することにより部分電解酸洗を行
なうに際し、少なくとも1つの電解質および少なくとも
1つのペースト化剤から被研摩材の特性、環境的条件に
応じて電解質およびペースト化剤の種類および構成比率
を制御した電解浴を用いて被研摩材に応じて所定の電解
条件で電解酸洗研摩することを特徴とする電解酸洗研摩
方法。
Claim 1: When performing partial electrolytic pickling by applying current between the workpiece to be polished and a moving electrode using a pasty electrolytic bath, the workpiece to be polished is partially electrolytically pickled from at least one electrolyte and at least one pasting agent. Electrolytic pickling is characterized by carrying out electrolytic pickling and polishing under predetermined electrolytic conditions depending on the material to be polished using an electrolytic bath in which the type and composition ratio of electrolyte and pasting agent are controlled according to the characteristics and environmental conditions. Polishing method.
JP6707991A 1991-03-29 1991-03-29 Electrolytic pickling and polishing method Pending JPH04301099A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6707991A JPH04301099A (en) 1991-03-29 1991-03-29 Electrolytic pickling and polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6707991A JPH04301099A (en) 1991-03-29 1991-03-29 Electrolytic pickling and polishing method

Publications (1)

Publication Number Publication Date
JPH04301099A true JPH04301099A (en) 1992-10-23

Family

ID=13334510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6707991A Pending JPH04301099A (en) 1991-03-29 1991-03-29 Electrolytic pickling and polishing method

Country Status (1)

Country Link
JP (1) JPH04301099A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105951163A (en) * 2016-07-07 2016-09-21 侯马市隆成电光源材料有限公司 Continuous electrolytic polishing equipment
CN106987894A (en) * 2017-06-02 2017-07-28 无锡市鹏振智能科技有限公司 A kind of inversion type electrolytic buffing attachment and its electrobrightening equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644500A (en) * 1987-06-25 1989-01-09 Kawasaki Steel Co Method for electrolyzing metallic material surface

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS644500A (en) * 1987-06-25 1989-01-09 Kawasaki Steel Co Method for electrolyzing metallic material surface

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105951163A (en) * 2016-07-07 2016-09-21 侯马市隆成电光源材料有限公司 Continuous electrolytic polishing equipment
CN106987894A (en) * 2017-06-02 2017-07-28 无锡市鹏振智能科技有限公司 A kind of inversion type electrolytic buffing attachment and its electrobrightening equipment

Similar Documents

Publication Publication Date Title
US6863797B2 (en) Electrolyte with good planarization capability, high removal rate and smooth surface finish for electrochemically controlled copper CMP
TW473811B (en) Plating apparatus
CN100449705C (en) Electrolytic processing device and substrate processing appts.
WO2002041369A2 (en) Electropolishing and chemical mechanical planarization
US20070289878A1 (en) Method and Device for Picking Metals
WO1999041435A1 (en) METHOD OF REMOVING Ti FILM AND APPARATUS THEREFOR
JPH04301099A (en) Electrolytic pickling and polishing method
US20070095677A1 (en) Electrochemical method for ecmp polishing pad conditioning
TW201033410A (en) Electro-thinning apparatus for removing excess metal on surface of substrate and removing method using the same
WO2008094811A2 (en) Method and system for pad conditioning in an ecmp process
JP2781945B2 (en) Continuous electrolytic polishing method and continuous electrolytic polishing apparatus
US6660156B2 (en) Pipe electropolishing apparatus using an electrolyte heater and cooler
JP6866751B2 (en) Cleaning system
CN109097779A (en) A kind of electrolytic copper foil titanium cathode roller chemical polishing solution and polishing method
JP2696197B2 (en) Continuous electrolytic polishing method and continuous electrolytic polishing apparatus
CN211057271U (en) Electrolytic polishing device for checking target crystal grains
US9359688B1 (en) Apparatuses and methods for controlling PH in electroplating baths
JP3004390B2 (en) High-speed descaling and surface modification method and apparatus for hot-rolled alloy steel strip
JPH04311599A (en) Electrolytic polishing method for steel plate
JP2020035880A (en) Cleaning system
WO2022038817A1 (en) Concentration reduction-suppression method for persulfuric acid component in sulfuric acid solution containing persulfuric acid component, and concentration reduction-suppression device for persulfuric acid component
US20050250333A1 (en) Method and composition to minimize dishing
JPH09120952A (en) Surface treatment method for wafer
JPH08239790A (en) Method for controlling electrical contact in electrolytic refining
JP2577618B2 (en) Method and apparatus for descaling alloy steel strip

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 19960716