JPH04297908A - Concentration controller for wash solution - Google Patents

Concentration controller for wash solution

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Publication number
JPH04297908A
JPH04297908A JP6324991A JP6324991A JPH04297908A JP H04297908 A JPH04297908 A JP H04297908A JP 6324991 A JP6324991 A JP 6324991A JP 6324991 A JP6324991 A JP 6324991A JP H04297908 A JPH04297908 A JP H04297908A
Authority
JP
Japan
Prior art keywords
concentration
solution
water
level
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6324991A
Other languages
Japanese (ja)
Inventor
Makoto Tanaka
田 中   真
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6324991A priority Critical patent/JPH04297908A/en
Publication of JPH04297908A publication Critical patent/JPH04297908A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To simultaneously control the concentration and liquid level of a wash solution obtained by supplying a stock solution for washing and water. CONSTITUTION:The undiluted solution is supplied through an undiluted solution supply valve 8 to a vessel and water is supplied through a water supply valve 5 to the vessel. In this vessel, the concentration of the wash solution is detected by a concentration detector 3, and the liquid level is detected by a level detector 6. A concentration control part 4 calculates an undiluted solution supply amount FDA and a water supply amount FDW per unit time having a ratio so that deviation between a detected concentration value PV1 and a set concentration value SV1 of the wash solution can be close to zero. A level control part 7 calculates a total supply amount FL per unit time adding the amounts of the undiluted solution and water so that deviation between a detected level value PV2 and a set level value SV2 of the level can be close to zero. An undiluted solution/water mixing amount calculation part 11 calculates mixing amounts FA and FW of the total supply amount FL so as to maintain the concentration of the wash solution at the set concentration value SV1 based on the undiluted solution supply amount FDA, water supply amount FDW, total supply amount FL and set concentration value SV1 and according to these mixing amounts, the undiluted solution supply valve 8 and the water supply valve 5 are controlled.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、洗浄のための原液を供
給する原液供給弁よび水を供給する水供給弁の各開度を
制御して容器内の洗浄溶液の濃度及び液面レベルを制御
する洗浄溶液の濃度制御装置に関する。
[Industrial Application Field] The present invention controls the opening degrees of a stock solution supply valve that supplies a stock solution for cleaning and a water supply valve that supplies water to control the concentration and liquid level of a cleaning solution in a container. The present invention relates to a device for controlling the concentration of a cleaning solution.

【0002】0002

【従来の技術】金属板を洗浄するものとして、容器内に
溜められた酸洗溶液に金属板を浸して板の表裏面を同時
に洗浄する酸洗設備がある。この酸洗設備で板を連続的
に通板させれば、当然のことながら酸洗溶液の濃度及び
液面レベルが変化する。そのため、原液を供給する原液
供給弁よび水を供給する水供給弁の各開度を制御して容
器内の酸洗溶液の濃度及び液面レベルを制御する濃度制
御装置を備えている。
2. Description of the Related Art There is a pickling equipment for cleaning metal plates, which simultaneously cleans the front and back surfaces of a metal plate by immersing the metal plate in a pickling solution stored in a container. When plates are continuously passed through this pickling equipment, the concentration and liquid level of the pickling solution naturally change. Therefore, a concentration control device is provided to control the concentration and liquid level of the pickling solution in the container by controlling the opening degrees of the stock solution supply valve that supplies the stock solution and the water supply valve that supplies water.

【0003】図2はこの種の従来の濃度制御装置の概略
構成図である。同図において、金属でなる板1は、容器
に溜められた酸洗溶液2に浸して連続的に通板せしめら
れる。この場合、原液は原液供給弁8を通して容器内に
供給され、水は水供給弁5を通して容器内に供給される
。このうち、原液の単位時間当たりの流量(以下、単に
流量という)は流量検出器22によって検出され、流量
検出値PV3 が流量調節部23に加えられる。流量調
節部23はこの流量検出値PV3 と流量設定値SV3
 との偏差が零になるような操作量を演算し、この操作
量に対応する調節信号によって原液供給弁8の開度を制
御する。従って、原液は常に一定量だけ供給される。
FIG. 2 is a schematic diagram of a conventional concentration control device of this type. In the figure, a metal plate 1 is immersed in a pickling solution 2 stored in a container and passed through it continuously. In this case, the stock solution is supplied into the container through the stock solution supply valve 8, and the water is supplied into the container through the water supply valve 5. Among these, the flow rate of the stock solution per unit time (hereinafter simply referred to as flow rate) is detected by the flow rate detector 22, and the detected flow rate value PV3 is applied to the flow rate adjustment section 23. The flow rate adjustment unit 23 uses this flow rate detection value PV3 and the flow rate set value SV3.
A manipulated variable is calculated such that the deviation from the undiluted solution supply valve 8 becomes zero, and the opening degree of the stock solution supply valve 8 is controlled by an adjustment signal corresponding to this manipulated variable. Therefore, a constant amount of stock solution is always supplied.

【0004】一方、酸洗溶液2の濃度は濃度検出器3に
よって検出され、濃度検出値PV1 が濃度調節部4に
加えられる。濃度調節部4においては濃度検出値PV1
 と濃度設定値SV1 との偏差を零に近付けるような
水供給弁5の操作量を演算し、この操作量に対応する調
節信号を信号選択部21に与える。また、酸洗溶液2の
液面のレベルがレベル検出器6で検出され、レベル検出
値PV2 がレベル調節部7に加えられる。レベル調節
部7はレベル検出値PV2 とレベル設定値SV2 と
を比較し、その偏差を零に近付けるような水供給弁5の
操作量を演算し、この操作量に対応する調節信号を信号
選択部21に与える。そこで、信号選択部21は濃度調
節部4及びレベル調節部7の調節信号の大きさを比較し
、大きい一方の調節信号に従って水供給弁5の開度を制
御する。
On the other hand, the concentration of the pickling solution 2 is detected by a concentration detector 3, and a detected concentration value PV1 is applied to a concentration adjusting section 4. In the concentration adjustment section 4, the concentration detection value PV1
The operation amount of the water supply valve 5 that brings the deviation between the concentration setting value SV1 and the concentration setting value SV1 closer to zero is calculated, and an adjustment signal corresponding to this operation amount is given to the signal selection section 21. Further, the level of the pickling solution 2 is detected by a level detector 6, and a detected level value PV2 is applied to a level adjusting section 7. The level adjustment section 7 compares the level detection value PV2 and the level set value SV2, calculates the amount of operation of the water supply valve 5 that brings the deviation closer to zero, and sends an adjustment signal corresponding to this amount of operation to the signal selection section. Give to 21. Therefore, the signal selection section 21 compares the magnitudes of the adjustment signals from the concentration adjustment section 4 and the level adjustment section 7, and controls the opening degree of the water supply valve 5 according to the larger adjustment signal.

【0005】[0005]

【発明が解決しようとする課題】容器内の酸洗溶液2は
、通板量(単位時間当たりの通板面積)や、酸洗溶液温
度や、雰囲気温度等により濃度やレベルの減少の割合が
変化する。しかるに、図2に示した従来の濃度制御装置
は、濃度やレベルの減少の割合が変化することを考慮し
ておらず、酸洗溶液2が必要とされるレベル以上である
ことを前提として原液の流量が設定されていた。
[Problem to be Solved by the Invention] The rate of decrease in concentration and level of the pickling solution 2 in the container varies depending on the amount of plate passing (the area of plate passing per unit time), the temperature of the pickling solution, the ambient temperature, etc. Change. However, the conventional concentration control device shown in Fig. 2 does not take into account changes in the concentration or the rate of decrease in level, and does not take into account changes in the rate of decrease in concentration or level. The flow rate was set.

【0006】このため、酸洗溶液2の濃度やレベルの減
少の割合が小さい時には原液の供給量が過多となり、濃
度を調節するために多量の水を供給することから酸洗溶
液2に余剰が発生し、この余剰溶液は容器外に捨てられ
ていた。また、酸洗溶液2の濃度やレベルの減少の割合
が極端に大きい時には板1の酸洗溶液2への浸漬を確保
するため濃度制御の精度を犠牲にしてレベルを確保して
いた。
For this reason, when the rate of decrease in the concentration or level of the pickling solution 2 is small, the amount of the stock solution supplied becomes excessive, and since a large amount of water is supplied to adjust the concentration, there is a surplus in the pickling solution 2. This excess solution was discarded outside the container. Furthermore, when the rate of decrease in the concentration or level of the pickling solution 2 is extremely large, the accuracy of concentration control is sacrificed in order to ensure that the plate 1 is immersed in the pickling solution 2 to maintain the level.

【0007】しかして、酸洗溶液2の濃度やレベルの減
少の割合が小さい時には酸洗溶液の無駄使いとなって製
品コストを高騰させ、反対に、酸洗溶液2の濃度やレベ
ルの減少の割合が極端に大きい時には濃度に対する制御
精度が低下して製品々質を低下させるという問題があっ
た。
However, when the rate of decrease in the concentration or level of the pickling solution 2 is small, the pickling solution is wasted and the product cost increases; When the ratio is extremely large, there is a problem in that the accuracy of controlling the concentration decreases and the quality of the products deteriorates.

【0008】この発明は、上記の問題点を解決するため
になされたもので、洗浄の条件が変化したとしても、洗
浄溶液に余剰を生じさせることなく酸洗溶液の濃度及び
レベルを所定の範囲に維持することのできる洗浄溶液の
濃度制御装置を得ることを目的とする。
The present invention was made to solve the above problems, and even if the cleaning conditions change, the concentration and level of the pickling solution can be maintained within a predetermined range without creating a surplus in the cleaning solution. An object of the present invention is to obtain a device for controlling the concentration of a cleaning solution that can maintain the concentration of the cleaning solution.

【0009】[0009]

【課題を解決するための手段】本発明は、洗浄のための
原液を供給する原液供給弁及び水を供給する水供給弁の
各開度を制御して容器内の洗浄溶液の濃度及び液面レベ
ルを制御する洗浄溶液の濃度制御装置において、前記洗
浄溶液の濃度検出値と濃度設定値との偏差を零に近付け
るような比率を有する単位時間当たりの原液供給量及び
水供給量を演算する濃度調節手段と、前記洗浄溶液の液
面のレベル検出値とレベル設定値との偏差を零に近付け
るように原液及び水を併せた単位時間当たりの総供給量
を演算するレベル調節手段と、演算された前記原液供給
量、水供給量、総供給量及び前記濃度設定値に基づき前
記洗浄溶液の濃度を前記濃度設定値に維持する前記総供
給量の原液と水との配分量を演算する配分量演算手段と
を備え、この配分量に従って前記原液供給弁及び水供給
弁を制御するものである。
[Means for Solving the Problems] The present invention controls the opening degrees of a stock solution supply valve that supplies a stock solution for cleaning and a water supply valve that supplies water to control the concentration and liquid level of a cleaning solution in a container. In a cleaning solution concentration control device that controls the level, the concentration is calculated to calculate the raw solution supply amount and water supply amount per unit time having a ratio that brings the deviation between the detected concentration value and the concentration setting value of the cleaning solution close to zero. an adjusting means, a level adjusting means for calculating the total supply amount of the undiluted solution and water per unit time so that the deviation between the detected level value of the liquid level of the cleaning solution and the level setting value approaches zero; an allocation amount for calculating an allocation amount between the stock solution and water of the total supply amount to maintain the concentration of the cleaning solution at the concentration setting value based on the supply amount of the stock solution, the water supply amount, the total supply amount, and the concentration setting value; and a calculation means, and controls the stock solution supply valve and the water supply valve according to the distribution amount.

【0010】0010

【作用】この発明においては、洗浄溶液の濃度変化を維
持するような比率を有する単位時間当たりの原液供給量
及び水供給量を演算する一方、洗浄溶液の液面のレベル
の変化を維持するような原液及び水を併せた単位時間当
たりの総供給量を演算し、これらの演算結果と濃度設定
値に基づいて洗浄溶液の濃度を設定値に維持する総供給
量の原液と水の配分量を演算しているため、濃度及びレ
ベルの同時制御が可能になっている。
[Operation] In this invention, the amount of raw solution supplied and the amount of water supplied per unit time are calculated at a ratio that maintains the change in the concentration of the cleaning solution, while at the same time maintaining the change in the level of the cleaning solution. Calculate the total supply amount of the undiluted solution and water per unit time, and calculate the distribution amount of the undiluted solution and water for the total supply amount to maintain the concentration of the cleaning solution at the set value based on these calculation results and the concentration setting value. Since it is calculated, simultaneous control of concentration and level is possible.

【0011】[0011]

【実施例】図1はこの発明の一実施例の概略構成図であ
り、図中、図1と同一の符号を付したものはそれぞれ同
一の要素を示している。ここで、水は水供給弁5を通し
て容器に供給され、原液は原液供給弁8を通して容器に
供給される。また、容器内の酸洗溶液2の濃度は濃度検
出器3で検出され濃度検出値PV1 が濃度調節部4に
加えられ、酸洗溶液2のレベルがレベル検出器6で検出
されレベル検出値PV2 がレベル調節部7に加えられ
る。この場合、濃度調節部4は濃度検出値PV1 と濃
度設定値SV1 とを比較し、その差を零に近付けるよ
うな比率を有する原液供給量FDA及び水供給量FDW
を演算して原液/水配分量演算部11に加える。また、
レベル調節部7はレベル検出値PV2 とレベル設定値
SV2との偏差を零に近付けるように原液及び水を併せ
た総供給量FL を演算して同じく原液/水配分量演算
部11に加える。原液/水配分量演算部11は原液供給
量FDA、水供給量FDW、総供給量FL 及び濃度検
出値PV1 に基づき、所定の関係式に従って原液の配
分量FA と水の配分量FW を演算し、これらの配分
量に対応する調節信号を水供給弁5及び原液供給弁8に
加える構成になっている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a schematic diagram of an embodiment of the present invention. In the figure, the same reference numerals as in FIG. 1 indicate the same elements. Here, water is supplied to the container through the water supply valve 5, and stock solution is supplied to the container through the stock solution supply valve 8. Further, the concentration of the pickling solution 2 in the container is detected by a concentration detector 3, and a detected concentration value PV1 is added to the concentration adjusting section 4, and the level of the pickling solution 2 is detected by a level detector 6, and a detected level value PV2 is added to the concentration adjusting section 4. is added to the level adjustment section 7. In this case, the concentration adjustment unit 4 compares the detected concentration value PV1 and the concentration set value SV1, and adjusts the raw solution supply amount FDA and water supply amount FDW to have a ratio that brings the difference close to zero.
is calculated and added to the stock solution/water distribution amount calculation section 11. Also,
The level adjustment section 7 calculates the total supply amount FL of the stock solution and water so that the deviation between the level detection value PV2 and the level setting value SV2 approaches zero, and also adds it to the stock solution/water distribution calculation section 11. The stock solution/water distribution amount calculation unit 11 calculates the stock solution distribution amount FA and the water distribution amount FW according to a predetermined relational expression based on the raw solution supply amount FDA, the water supply amount FDW, the total supply amount FL and the detected concentration value PV1. , and is configured to apply adjustment signals corresponding to these distribution amounts to the water supply valve 5 and the stock solution supply valve 8.

【0012】上記のように構成された本実施例の動作を
以下に説明する。
The operation of this embodiment configured as described above will be explained below.

【0013】先ず、濃度調節部4は濃度検出値PV1 
と濃度設定値SV1 とを比較し、その差を零に近付け
るような比率を有する原液供給量FDA及び水供給量F
DWを演算する。この場合、酸洗溶液2の濃度が低くな
ったとすれば、原液供給量FDAは増え、水供給量FD
Wは減るような値が演算される。また、レベル調節部7
はレベル検出値PV2 とレベル設定値SV2 との偏
差を零に近付けるための原液及び水を併せた総供給量F
L を演算する。
First, the density adjustment section 4 adjusts the detected density value PV1.
and the concentration setting value SV1, and determine the stock solution supply amount FDA and the water supply amount F, which have a ratio that brings the difference close to zero.
Calculate DW. In this case, if the concentration of pickling solution 2 becomes lower, the raw solution supply amount FDA increases and the water supply amount FD
A value that decreases W is calculated. In addition, the level adjustment section 7
is the total supply amount F of stock solution and water to bring the deviation between level detection value PV2 and level set value SV2 close to zero.
Calculate L.

【0014】次に、原液/水配分量演算部11はそれぞ
れ演算された原液供給量FDA、水供給量FDW、総供
給量FL 及び濃度設定値PV1 とに基づき下式の演
算を実行する。 FA =(FL −FDA−FDW)×SV1 /10
0 ÷β/100 +FDA      =(FL −
FDA−FDW)×SV1 /β+FDA      
          …(1) FW =FL −FA
        =FL −(FL −FDA−FDW)×
SV1 /β−FDA      =(FL −FDA
−FDW)・(1−SV1 /β)+FDW     
   …(2) ただしβ:原液の酸濃度[%]である
Next, the stock solution/water distribution amount calculation section 11 executes the following calculation based on the calculated stock solution supply amount FDA, water supply amount FDW, total supply amount FL and concentration setting value PV1. FA = (FL - FDA - FDW) x SV1 /10
0 ÷ β/100 + FDA = (FL −
FDA-FDW)×SV1/β+FDA
...(1) FW = FL -FA
=FL-(FL-FDA-FDW)×
SV1/β-FDA = (FL-FDA
-FDW)・(1-SV1/β)+FDW
...(2) where β is the acid concentration [%] of the stock solution.

【0015】このようにして演算された原液の配分量F
A と水の配分量FW は、酸洗溶液の濃度を濃度設定
値PV1 に維持するものに他ならず、これらの配分量
に従って水供給弁5及び原液供給弁8が制御される。
The distribution amount F of the stock solution calculated in this way
A and the water distribution amount FW are nothing but what maintains the concentration of the pickling solution at the concentration setting value PV1, and the water supply valve 5 and the stock solution supply valve 8 are controlled according to these distribution amounts.

【0016】かくして、この実施例によれば、濃度検出
値PV1 の変化に応じてこれを補正する原液供給量F
DA及び水供給量FDWを演算する一方、レベル検出値
PV2 の変化に応じてこれを補正する総供給量FL 
を演算し、さらにこれらの演算結果から酸洗溶液2の濃
度を濃度設定値PV1 に維持する原液の配分量FA 
と水の配分量FW とを演算しているので、酸洗溶液2
の濃度とレベルを同時に制御することができる。
Thus, according to this embodiment, the stock solution supply amount F is corrected according to the change in the detected concentration value PV1.
While calculating DA and water supply amount FDW, total supply amount FL is corrected according to changes in level detection value PV2.
Further, from these calculation results, the distribution amount FA of the stock solution to maintain the concentration of the pickling solution 2 at the concentration setting value PV1 is calculated.
Since we are calculating the distribution amount of water FW, the pickling solution 2
The concentration and level of can be controlled simultaneously.

【0017】なお、上記実施例では最も頻繁に使用され
る酸洗溶液について説明したが、本発明はこれに限定さ
れるものではなく、洗浄のための原液と水とを供給する
殆どの洗浄溶液に適用できることは言うまでもない。
[0017] In the above embodiments, the most frequently used pickling solution was explained, but the present invention is not limited thereto, and most cleaning solutions that supply the undiluted solution and water for cleaning can be used. Needless to say, it can be applied to

【0018】[0018]

【発明の効果】以上の説明によって明らかなようにこの
発明によれば、洗浄条件の変化により濃度やレベルの減
少の割合が変化したとしても、洗浄溶液に余剰を生じさ
せることなく酸洗溶液の濃度及びレベルを所定の範囲に
維持することができ、れによって、洗浄溶液の無駄使い
による製品コストの高騰や、濃度に対する制御精度の低
下による製品々質の低下を防止することができる。
Effects of the Invention As is clear from the above explanation, according to the present invention, even if the rate of decrease in concentration or level changes due to changes in cleaning conditions, the pickling solution can be improved without creating a surplus in the cleaning solution. The concentration and level can be maintained within a predetermined range, thereby preventing an increase in product costs due to wasted cleaning solution and a decrease in product quality due to a decrease in concentration control accuracy.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の一実施例の概略構成図。FIG. 1 is a schematic configuration diagram of an embodiment of the present invention.

【図2】従来の洗浄溶液の濃度制御装置の概略構成図。FIG. 2 is a schematic diagram of a conventional cleaning solution concentration control device.

【符号の説明】[Explanation of symbols]

2  酸洗溶液 3  濃度検出器 4  濃度調節部 5  水供給弁 6  レベル検出器 7  レベル調節部 8  原液供給弁 11  原液/水配分量演算部 2 Pickling solution 3 Concentration detector 4 Density adjustment section 5 Water supply valve 6 Level detector 7 Level adjustment section 8 Stock solution supply valve 11 Stock solution/water distribution amount calculation section

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】洗浄のための原液を供給する原液供給弁及
び水を供給する水供給弁の各開度を制御して容器内の洗
浄溶液の濃度及び液面レベルを制御する洗浄溶液の濃度
制御装置において、前記洗浄溶液の濃度検出値と濃度設
定値との偏差を零に近付けるような比率を有する単位時
間当たりの原液供給量及び水供給量を演算する濃度調節
手段と、前記洗浄溶液の液面のレベル検出値とレベル設
定値との偏差を零に近付けるように原液及び水を併せた
単位時間当たりの総供給量を演算するレベル調節手段と
、演算された前記原液供給量、水供給量、総供給量及び
前記濃度設定値に基づき前記洗浄溶液の濃度を前記濃度
設定値に維持する前記総供給量の原液と水との配分量を
演算する配分量演算手段とを備え、この配分量に従って
前記原液供給弁及び水供給弁を制御することを特徴とす
る洗浄溶液の濃度制御装置。
[Claim 1] A cleaning solution concentration that controls the concentration and liquid level of the cleaning solution in a container by controlling the opening degrees of a stock solution supply valve that supplies a stock solution for cleaning and a water supply valve that supplies water. In the control device, a concentration adjusting means for calculating an amount of raw solution supplied and an amount of water supplied per unit time having a ratio such that a deviation between a detected concentration value and a set concentration value of the cleaning solution approaches zero; Level adjustment means for calculating the total supply amount of the raw solution and water per unit time so that the deviation between the detected level value of the liquid level and the level set value approaches zero, and the calculated raw solution supply amount and water supply. a distribution amount calculation means for calculating an amount to be distributed between the undiluted solution and water in the total supply amount to maintain the concentration of the cleaning solution at the concentration setting value based on the total supply amount and the concentration setting value; A cleaning solution concentration control device characterized by controlling the stock solution supply valve and the water supply valve according to the amount.
JP6324991A 1991-03-27 1991-03-27 Concentration controller for wash solution Pending JPH04297908A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6324991A JPH04297908A (en) 1991-03-27 1991-03-27 Concentration controller for wash solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6324991A JPH04297908A (en) 1991-03-27 1991-03-27 Concentration controller for wash solution

Publications (1)

Publication Number Publication Date
JPH04297908A true JPH04297908A (en) 1992-10-21

Family

ID=13223788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6324991A Pending JPH04297908A (en) 1991-03-27 1991-03-27 Concentration controller for wash solution

Country Status (1)

Country Link
JP (1) JPH04297908A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020043772A (en) * 2000-12-04 2002-06-12 이구택 An apparatus for controlling level of acid having concentration compensation function in a strip acid-clealing device
CN113348236A (en) * 2019-02-08 2021-09-03 宝洁公司 Method for treating fabrics with automatically pretreated water

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020043772A (en) * 2000-12-04 2002-06-12 이구택 An apparatus for controlling level of acid having concentration compensation function in a strip acid-clealing device
CN113348236A (en) * 2019-02-08 2021-09-03 宝洁公司 Method for treating fabrics with automatically pretreated water

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