JPH04285617A - Resin composition for sealing semiconductor - Google Patents
Resin composition for sealing semiconductorInfo
- Publication number
- JPH04285617A JPH04285617A JP5165291A JP5165291A JPH04285617A JP H04285617 A JPH04285617 A JP H04285617A JP 5165291 A JP5165291 A JP 5165291A JP 5165291 A JP5165291 A JP 5165291A JP H04285617 A JPH04285617 A JP H04285617A
- Authority
- JP
- Japan
- Prior art keywords
- spherical silica
- silica
- average particle
- particle size
- bis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 20
- 239000004065 semiconductor Substances 0.000 title claims description 8
- 238000007789 sealing Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 127
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 59
- 239000002245 particle Substances 0.000 claims abstract description 32
- -1 allylphenol compound Chemical class 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 claims abstract description 9
- 239000011164 primary particle Substances 0.000 claims abstract description 9
- 238000005538 encapsulation Methods 0.000 claims description 7
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- IPZJQDSFZGZEOY-UHFFFAOYSA-N dimethylmethylene Chemical group C[C]C IPZJQDSFZGZEOY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 16
- 238000000465 moulding Methods 0.000 abstract description 14
- 238000002156 mixing Methods 0.000 abstract description 9
- 125000003118 aryl group Chemical group 0.000 abstract description 5
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 abstract description 3
- AQGZJQNZNONGKY-UHFFFAOYSA-N 1-[4-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=C(N2C(C=CC2=O)=O)C=C1 AQGZJQNZNONGKY-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 8
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- PUKLCKVOVCZYKF-UHFFFAOYSA-N 1-[2-(2,5-dioxopyrrol-1-yl)ethyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCN1C(=O)C=CC1=O PUKLCKVOVCZYKF-UHFFFAOYSA-N 0.000 description 1
- MNNRYIOVAFZDAL-UHFFFAOYSA-N 1-[2-[2-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1OC1=CC=CC=C1N1C(=O)C=CC1=O MNNRYIOVAFZDAL-UHFFFAOYSA-N 0.000 description 1
- JRGFYXSJDUIGAY-UHFFFAOYSA-N 1-[2-[2-(2,5-dioxopyrrol-1-yl)phenyl]sulfonylphenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1N1C(=O)C=CC1=O JRGFYXSJDUIGAY-UHFFFAOYSA-N 0.000 description 1
- WTDZKAAEDZRBIC-UHFFFAOYSA-N 1-[2-[2-[2-(2,5-dioxopyrrol-1-yl)phenyl]thiophen-3-yl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1C1=C(C=2C(=CC=CC=2)N2C(C=CC2=O)=O)SC=C1 WTDZKAAEDZRBIC-UHFFFAOYSA-N 0.000 description 1
- MTQUPZGGYDCXEU-UHFFFAOYSA-N 1-[3-[1-[3-[2-[3-(2,5-dioxopyrrol-1-yl)phenyl]propyl]phenyl]propan-2-yl]phenyl]pyrrole-2,5-dione Chemical compound C=1C=CC(N2C(C=CC2=O)=O)=CC=1C(C)CC(C=1)=CC=CC=1CC(C)C(C=1)=CC=CC=1N1C(=O)C=CC1=O MTQUPZGGYDCXEU-UHFFFAOYSA-N 0.000 description 1
- MPCOJNCMPZMOQK-UHFFFAOYSA-N 1-[4-(2,5-dioxopyrrol-1-yl)cyclohexyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCC(N2C(C=CC2=O)=O)CC1 MPCOJNCMPZMOQK-UHFFFAOYSA-N 0.000 description 1
- XAZPKEBWNIUCKF-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(C)(C)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O XAZPKEBWNIUCKF-UHFFFAOYSA-N 0.000 description 1
- NJMJISMIDHAPSG-UHFFFAOYSA-N 1-[4-[4-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]sulfonylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)C=C1 NJMJISMIDHAPSG-UHFFFAOYSA-N 0.000 description 1
- YNSSPVZNXLACMW-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)-3-ethyl-5-methylphenyl]methyl]-2-ethyl-6-methylphenyl]pyrrole-2,5-dione Chemical compound C=1C(C)=C(N2C(C=CC2=O)=O)C(CC)=CC=1CC(C=C1CC)=CC(C)=C1N1C(=O)C=CC1=O YNSSPVZNXLACMW-UHFFFAOYSA-N 0.000 description 1
- MZXBGQAYUVYKAL-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)-3-ethylphenyl]methyl]-2-ethylphenyl]pyrrole-2,5-dione Chemical compound C=1C=C(N2C(C=CC2=O)=O)C(CC)=CC=1CC(C=C1CC)=CC=C1N1C(=O)C=CC1=O MZXBGQAYUVYKAL-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- AONLIHICKRLBAR-UHFFFAOYSA-N 3-hydroxy-1-[3-(3-hydroxy-2,5-dioxopyrrolidin-1-yl)phenyl]pyrrolidine-2,5-dione Chemical compound OC1CC(=O)N(C1=O)c1cccc(c1)N1C(=O)CC(O)C1=O AONLIHICKRLBAR-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- MTMKZABGIQJAEX-UHFFFAOYSA-N 4,4'-sulfonylbis[2-(prop-2-en-1-yl)phenol] Chemical compound C1=C(CC=C)C(O)=CC=C1S(=O)(=O)C1=CC=C(O)C(CC=C)=C1 MTMKZABGIQJAEX-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ISBWNEKJSSLXOD-UHFFFAOYSA-N Butyl levulinate Chemical compound CCCCOC(=O)CCC(C)=O ISBWNEKJSSLXOD-UHFFFAOYSA-N 0.000 description 1
- CXLIXWDRHCKXJT-UHFFFAOYSA-N C1(=CC=C(C=C1)N1C(C(O)CC1=O)=O)N1C(C(O)CC1=O)=O Chemical compound C1(=CC=C(C=C1)N1C(C(O)CC1=O)=O)N1C(C(O)CC1=O)=O CXLIXWDRHCKXJT-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004129 EU approved improving agent Substances 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940005460 butyl levulinate Drugs 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- JOOXCMJARBKPKM-UHFFFAOYSA-N laevulinic acid Natural products CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 1
- 229940040102 levulinic acid Drugs 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000001225 nuclear magnetic resonance method Methods 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- VJPIFPYWTTUINA-UHFFFAOYSA-N trimethyl 3-(oxiran-2-ylmethoxy)propyl silicate Chemical compound CO[Si](OC)(OC)OCCCOCC1CO1 VJPIFPYWTTUINA-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は半導体封止用樹脂組成物
に関するものであり、流動性に優れかつ成形加工性の優
れた樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for encapsulating semiconductors, and more particularly to a resin composition having excellent fluidity and moldability.
【0002】0002
【従来の技術】従来熱硬化性樹脂としてはエポキシ樹脂
が数多く用いられてきた。しかし、成形品に対する使用
条件が近年はますます厳しさを帯びてきておりその結果
全体の特性を満足することがエポキシ樹脂では次第に困
難になってきた。エポキシ樹脂よりも更に耐熱性の高い
樹脂としてはポリイミド樹脂がよく知られているが、一
般にポリイミド樹脂は有機溶剤に対する溶解性が低く、
また融点または軟化温度が高く成形加工性が必ずしも良
好とは言い難かった。BACKGROUND OF THE INVENTION Conventionally, many epoxy resins have been used as thermosetting resins. However, the usage conditions for molded products have become increasingly severe in recent years, and as a result, it has become increasingly difficult for epoxy resins to satisfy the overall properties. Polyimide resin is well known as a resin with higher heat resistance than epoxy resin, but polyimide resin generally has low solubility in organic solvents,
In addition, the melting point or softening temperature is high, and moldability is not necessarily good.
【0003】熱硬化性のポリイミド樹脂であるポリマレ
イミド樹脂とo,o’−ジアリルビスフェノールAとの
樹脂組成物については公告特許公報昭55−39242
号、ビスマレイミド化合物とビスフェノールSのジアリ
ルエーテル化物との組成物については公開特許公報昭5
3−134099号、ビスマレイミド化合物とフェノー
ルノボラックのアリルエーテル化物との組成物について
は公開特許公報昭62−11716号などの例が知られ
ている。さらに、IC,LSIの表面での熱ストレスを
軽減するためプラスチック封止用として熱膨張係数の低
いシリカを加えることが知られており、ビスマレイミド
化合物にシリカを加え半導体封止用に開発された樹脂組
成物については公開特許公報昭63−230728号な
どの例が知られている。しかし、これらにおいてはシリ
カの形状、平均粒径、充填量がおよぼす成形時の流動性
や成形加工性への影響については何ら記述がない。[0003]Resin compositions of polymaleimide resin, which is a thermosetting polyimide resin, and o,o'-diallyl bisphenol A are described in Japanese Patent Publication No. 1983-39242.
For the composition of a bismaleimide compound and a diallyl ether of bisphenol S, see Japanese Patent Publication No. 1983.
Examples of compositions of a bismaleimide compound and an allyl etherified phenol novolak are known, such as No. 3-134099 and Japanese Patent Publication No. 11716/1983. Furthermore, it is known that silica with a low coefficient of thermal expansion is added to plastic encapsulation to reduce thermal stress on the surface of ICs and LSIs, and silica was added to bismaleimide compounds and developed for semiconductor encapsulation. Examples of resin compositions are known, such as Japanese Patent Publication No. 63-230728. However, in these documents, there is no description of the influence of the shape, average particle size, and filling amount of silica on fluidity during molding and moldability.
【0004】0004
【発明が解決しようとする課題】プラスチック封止材に
おいて熱ストレスの軽減のために熱膨張係数の低いシリ
カが必要であるが、シリカを単純にふやしていくと成形
時の流動性が低下し望みの成形が充分に行えないことが
予想される。[Problem to be solved by the invention] Silica with a low coefficient of thermal expansion is necessary for reducing thermal stress in plastic encapsulants, but simply increasing the amount of silica lowers the fluidity during molding, which is not desirable. It is expected that the molding will not be carried out satisfactorily.
【0005】[0005]
【課題を解決するための手段】本発明者らは上記課題を
解決すべく鋭意検討した結果、ポリマレイミド化合物、
フェノール化合物と複数のシリカを組み合わせることに
より流動性に富みかつ成形加工性の良好な樹脂組成物が
得られることを見いだし本発明に到達した。すなわち、
本発明の要旨は、
A.下記の一般式(2)で示される分子内に2個以上の
マレイミド基を有するポリマレイミド化合物(ここにお
いてnは2以上の整数、Yは2価以上の多価残基を表わ
す。)、[Means for Solving the Problems] As a result of intensive studies to solve the above problems, the present inventors found that a polymaleimide compound,
The present invention was achieved by discovering that a resin composition with high fluidity and good moldability can be obtained by combining a phenol compound and a plurality of silicas. That is,
The gist of the present invention is as follows:A. A polymaleimide compound having two or more maleimide groups in the molecule represented by the following general formula (2) (where n is an integer of 2 or more, and Y represents a polyvalent residue of 2 or more valences),
【0006】[0006]
【化2】[Case 2]
【0007】B.下記の一般式(1)で示されるアリル
フェノール化合物(XはC(CH3 )2 ,SO2
,SO,S,O,COのいずれかよりなる)、B. An allylphenol compound represented by the following general formula (1) (X is C(CH3)2, SO2
, SO, S, O, CO),
【000
8】000
8]
【化3】[Chemical formula 3]
【0009】C.一次粒子の平均粒径が7nm以上50
nm以下の球状シリカを全シリカの0.5重量%以上7
重量%以下を占める球状シリカを必須成分とすることを
特徴とする半導体封止用樹脂組成物に存する。C. The average particle diameter of primary particles is 7 nm or more50
At least 0.5% by weight of spherical silica of nm or less in total silica7
A resin composition for semiconductor encapsulation is characterized in that it contains spherical silica as an essential component, which accounts for less than % by weight.
【0010】以下に本発明の詳細を説明する。The details of the present invention will be explained below.
【0011】本発明で用いられるA成分である分子内に
2個以上のマレイミド基を有するポリマレイミド化合物
は一般式(2)で表わされる分子内に2個以上のマレイ
ミド基を有するポリマレイミド化合物であれば特に限定
されるものではない。ここにおいてnは2以上の整数、
Yは2価以上の多価残基を表わす。Yは2価以上の多価
残基であれば脂肪族、芳香族、脂環式、複素環式のいず
れでもよいが、芳香族であることが好ましい。The polymaleimide compound having two or more maleimide groups in the molecule, which is component A used in the present invention, is a polymaleimide compound having two or more maleimide groups in the molecule represented by general formula (2). If so, it is not particularly limited. Here, n is an integer of 2 or more,
Y represents a multivalent residue having a valence of two or more. Y may be aliphatic, aromatic, alicyclic, or heterocyclic as long as it is a divalent or higher polyvalent residue, but aromatic is preferable.
【0012】本発明で用いるA成分は、ジアミンもしく
はポリアミンと無水マレイン酸との反応で容易に得られ
る。ジアミンとしては一般式(H2 N)n Y(nは
2であり、Yは一般式(2)のYに同じで2価の残基を
表わす)で表わされる化合物である。ジアミンと無水マ
レイン酸との反応で得られるビスマレイミド化合物とし
て具体的には、1,2−ジマレイミドエタン、1,3−
ジマレイミドプロパンなどのような脂肪族ポリマレイミ
ド、ビス(4−マレイミドフェニル)メタン、ビス(3
−エチル−4−マレイミドフェニル)メタン、ビス(3
−エチル−4−マレイミド−5−メチルフェニル)メタ
ン、2,7−ジマレイミドフルオレン、1,3−ジマレ
イミドベンゼン、1,4−ジマレイミドベンゼン、2,
4−ジマレイミドトルエン、ビス(マレイミドフェニル
)スルホン、ビス(マレイミドフェニル)エーテル、2
,2−ビス(4−(4−マレイミドフェノキシ)フェニ
ル)プロパン、ビス(4−(4−マレイミドフェノキシ
)フェニル)スルホン、1,3−ビス(2−(3−マレ
イミドフェニル)プロピル)ベンゼン(各々異性体を含
む)などのような芳香族ポリマレイミド、1,4−ジマ
レイミドシクロヘキサンなどのような脂環式ポリマレイ
ミド、ビス(マレイミドフェニル)チオフェン(異性体
を含む)などのような複素環式ポリマレイミドなどが例
示できる。本発明において用いられるポリマレイミド化
合物は特に限定されるものではないが、耐熱性の点から
芳香族ポリマレイミドが好ましい。ポリアミンとしては
一般式(H2 N)n Y(nは3以上の整数であり、
Yは一般式(2)のYに同じで3価以上の残基を表わす
)で表わされる化合物である。また、ポリアミンと無水
マレイン酸との反応で得られるポリマレイミド化合物と
して具体的には、アニリンまたはその誘導体とホルマリ
ンとの重縮合物のマレイミド化物などが例示できる。Component A used in the present invention can be easily obtained by reacting a diamine or polyamine with maleic anhydride. The diamine is a compound represented by the general formula (H2N)nY (n is 2, and Y is the same as Y in the general formula (2) and represents a divalent residue). Specifically, the bismaleimide compounds obtained by the reaction of diamine and maleic anhydride include 1,2-dimaleimidoethane, 1,3-
Aliphatic polymaleimides such as dimaleimidopropane, bis(4-maleimidophenyl)methane, bis(3
-ethyl-4-maleimidophenyl)methane, bis(3
-ethyl-4-maleimido-5-methylphenyl)methane, 2,7-dimalimidofluorene, 1,3-dimalimidobenzene, 1,4-dimalimidobenzene, 2,
4-dimalimidotoluene, bis(maleimidophenyl) sulfone, bis(maleimidophenyl) ether, 2
, 2-bis(4-(4-maleimidophenoxy)phenyl)propane, bis(4-(4-maleimidophenoxy)phenyl)sulfone, 1,3-bis(2-(3-maleimidophenyl)propyl)benzene (each Aromatic polymaleimides such as (including isomers), alicyclic polymaleimides such as 1,4-dimaleimidocyclohexane, etc., heterocyclics such as bis(maleimidophenyl)thiophene (including isomers), etc. Examples include polymaleimide. The polymaleimide compound used in the present invention is not particularly limited, but aromatic polymaleimide is preferred from the viewpoint of heat resistance. The polyamine has the general formula (H2N)nY (n is an integer of 3 or more,
Y is the same as Y in general formula (2) and represents a trivalent or higher valent residue). Further, specific examples of the polymaleimide compound obtained by the reaction of a polyamine and maleic anhydride include a maleimide of a polycondensate of aniline or a derivative thereof and formalin.
【0013】また以上のように得られる各種ポリマレイ
ミド化合物と芳香族ジアミンや脂肪族ジアミン等を、マ
レイミド官能基が残るように反応させて得られた付加物
などが例としてあげられる。さらに、これらのポリマレ
イミド化合物を2種類あるいはそれ以上を組み合わせて
使用することや、上記ジアミンもしくはポリアミンを混
ぜ合わせてマレイミド化しポリマレイミド化合物の混合
物として使用することも可能である。流動性や成形加工
性を損なわない範囲においてモノマレイミドを加えるこ
とができる。Examples include adducts obtained by reacting the various polymaleimide compounds obtained as described above with aromatic diamines, aliphatic diamines, etc. so that maleimide functional groups remain. Furthermore, it is also possible to use two or more of these polymaleimide compounds in combination, or to mix the above diamines or polyamines to form maleimide and use it as a mixture of polymaleimide compounds. Monomaleimide can be added within a range that does not impair fluidity or moldability.
【0014】本発明のB成分である一般式(1)で表わ
されるフェノール化合物においてXはC(CH3 )2
,SO2 ,SO,S,O,COのいずれかよりなる
フェノール化合物であれば特に限定されるものではない
。具体的には、2,2−ビス(3−アリル−4−ヒドロ
キシフェニル)プロパン、ビス(3−アリル−4−ヒド
ロキシフェニル)スルホン、ビス(3−アリル−4−ヒ
ドロキシフェニル)スルホキシド、ビス(3−アリル−
4−ヒドロキシフェニル)スルフィド、ビス(3−アリ
ル−4−ヒドロキシフェニル)エーテル、ビス(3−ア
リル−4−ヒドロキシフェニル)ケトンなどが例示でき
る。さらに、これらを2種類あるいはそれ以上を組み合
わせて使用することも可能である。In the phenol compound represented by the general formula (1) which is component B of the present invention, X is C(CH3)2
, SO2, SO, S, O, and CO, there is no particular limitation. Specifically, 2,2-bis(3-allyl-4-hydroxyphenyl)propane, bis(3-allyl-4-hydroxyphenyl)sulfone, bis(3-allyl-4-hydroxyphenyl)sulfoxide, bis( 3-Allyl-
Examples include 4-hydroxyphenyl) sulfide, bis(3-allyl-4-hydroxyphenyl) ether, and bis(3-allyl-4-hydroxyphenyl) ketone. Furthermore, it is also possible to use two or more types of these in combination.
【0015】B成分を用いなくともA成分だけでも反応
は進行するが得られた硬化物は弾性率が高く極めて脆い
。またA成分中のマレイミド基はビニル基やアリル基等
と共重合して硬化物を与えるが、C成分や他の機能性付
与剤との混合中は反応は余り進まず、さらに混合温度よ
り高い温度で成形する時には速やかに反応することが望
ましい。そうした点からB成分のアリルフェノールは必
須である。Although the reaction proceeds with component A alone without component B, the resulting cured product has a high modulus of elasticity and is extremely brittle. In addition, the maleimide group in component A copolymerizes with vinyl groups, allyl groups, etc. to give a cured product, but the reaction does not proceed much during mixing with component C and other functional agents, and the temperature is higher than the mixing temperature. When molding at high temperatures, it is desirable to react quickly. From this point of view, component B, allylphenol, is essential.
【0016】本発明で用いるC成分は、一次粒子の平均
粒径が7nm以上50nm以下の球状シリカを全シリカ
の0.5重量%以上7重量%以下を占める球状シリカで
あるが、粒径分布の極大が1つである必要はない。一次
粒子の平均粒径が7以上50nm以下のシリカは商品名
アエロジルとして市販されている。このシリカは全シリ
カの0.5重量%以上7重量%以下を占めるのが良い。
0.5重量%未満の場合、樹脂との組成物の充填性はよ
いが、取扱性、成形加工性が悪く半導体封止のようなイ
ンサート成形をするとキュビティ周囲からバリとよばれ
る樹脂のもれが顕著に発生する。7重量%以上を超すと
組成物の流動性が低下する。用いられる球状シリカの好
ましい粒径範囲は7nm以上150μm以下である。平
均粒径150μmを越える球状シリカ群は、分離しやす
いため均一混合、均一成形が困難となる。7nm以下の
球状シリカはシリカの比表面積が増大し凝集をおこし易
くかつ樹脂組成物の粘度が上がり結果として流動性が低
下する傾向にある。球状シリカは、結晶性シリカを火炎
溶射等で異方性を低下して製造したシリカや、アルキル
シリケートや四塩化ケイ素の加水分解で合成したシリカ
などがあげられるが、ここで用いられる球状シリカは製
造法には関係なく形状が球状であればよい。Component C used in the present invention is spherical silica whose primary particles have an average particle diameter of 7 nm or more and 50 nm or less, and accounts for 0.5% or more and 7% or less of the total silica, but the particle size distribution is It is not necessary that there is only one maximum. Silica whose primary particles have an average particle size of 7 to 50 nm is commercially available under the trade name Aerosil. This silica preferably accounts for 0.5% by weight or more and 7% by weight or less of the total silica. If it is less than 0.5% by weight, the filling properties of the composition with the resin are good, but the handling and molding properties are poor, and when insert molding such as semiconductor encapsulation is performed, resin leakage called burr from around the cubitity occurs. occurs significantly. If it exceeds 7% by weight, the fluidity of the composition will decrease. The preferred particle size range of the spherical silica used is 7 nm or more and 150 μm or less. Spherical silica groups with an average particle size exceeding 150 μm are easily separated, making uniform mixing and uniform molding difficult. Spherical silica with a diameter of 7 nm or less increases the specific surface area of the silica and tends to cause aggregation, and the viscosity of the resin composition increases, resulting in a decrease in fluidity. Examples of spherical silica include silica produced by reducing the anisotropy of crystalline silica by flame spraying, etc., and silica synthesized by hydrolyzing alkyl silicate or silicon tetrachloride, but the spherical silica used here is Regardless of the manufacturing method, it is sufficient that the shape is spherical.
【0017】本発明で用いる球状シリカは好ましくは平
均粒径が50nm以上150μm以下の球状シリカと一
次粒子の平均粒径が7nm以上50nm以下の球状シリ
カを混合することにより得られる。この混合は予め混合
していてもよいし、他の成分と混練するときに初めて混
合してもよい。特に好ましくは、上記の平均粒径が50
nm以上150μm以下の球状シリカが平均粒径が10
0nm以上2μm以下の球状シリカと平均粒径が10μ
m以上100μm以下の球状シリカの混合により得られ
たシリカであることが好ましい。The spherical silica used in the present invention is preferably obtained by mixing spherical silica with an average particle size of 50 nm or more and 150 μm or less and spherical silica whose primary particles have an average particle size of 7 nm or more and 50 nm or less. This mixing may be done in advance, or may be done for the first time when kneading with other components. Particularly preferably, the above average particle size is 50
Spherical silica with an average particle size of nm or more and 150 μm or less is 10
Spherical silica of 0 nm or more and 2 μm or less and average particle size of 10 μm
Preferably, the silica is obtained by mixing spherical silica with a size of 100 μm or more.
【0018】半導体封止の場合メモリを破壊し誤動作を
引き起こすことは避けねばならない。この原因は封止材
に含まれるα線源であるウラン、トリウムなどの放射性
元素によって起こるといわれているのでこうした元素が
少ないことが望ましい。本発明においては、これらの各
成分を必須成分とするものであり、好ましくは配合比率
として分子内に2個以上のマレイミド基を有するポリマ
レイミド化合物(A成分)のマレイミド官能基1当量に
対して、フェノール化合物(B成分)のアリル基が0.
5から1.5当量の範囲にあることが好ましい。アリル
基が0.5当量より少ない場合は成形物が脆くなり、1
.5当量より多い場合は耐熱性が低下する。またC成分
は樹脂組成物全体の20から95体積%を占めているこ
とが望ましく、好ましくは60から90体積%である。
充填率が20体積%に満たない場合は熱膨張係数の低下
の効果が不十分であり、また充填率が95体積%を越す
場合は成形に必要な流動性を確保できなくなる。In the case of semiconductor encapsulation, it is necessary to avoid destroying the memory and causing malfunction. This is said to be caused by radioactive elements such as uranium and thorium, which are α-ray sources, contained in the sealing material, so it is desirable that these elements be contained in a small amount. In the present invention, each of these components is an essential component, and preferably the blending ratio is based on 1 equivalent of the maleimide functional group of the polymaleimide compound (component A) having two or more maleimide groups in the molecule. , the allyl group of the phenol compound (component B) is 0.
Preferably, it is in the range of 5 to 1.5 equivalents. If the amount of allyl group is less than 0.5 equivalent, the molded product becomes brittle and 1
.. When the amount is more than 5 equivalents, heat resistance decreases. Further, it is desirable that the C component occupies 20 to 95% by volume of the entire resin composition, preferably 60 to 90% by volume. If the filling rate is less than 20% by volume, the effect of reducing the coefficient of thermal expansion will be insufficient, and if the filling rate exceeds 95% by volume, it will not be possible to ensure the fluidity necessary for molding.
【0019】以上のようなシリカの平均粒径、形状、及
びシリカの体積割合の条件を満足したシリカを上記のポ
リマレイミド化合物とアリルフェノール化合物と混練す
ることにより、良好な流動性かつ良好な成形加工性が可
能となる。この様な樹脂組成物は熱膨張率が小さく耐熱
性が良好でしかも流動性が高く成形性の良好な半導体封
止用樹脂組成物として用いることができる。ここで本発
明の組成物の硬化方法は外部より加熱することにより容
易に達成されるが、さらに触媒や硬化促進剤を添加し成
形方法や成形品の形状などに応じて成形温度あるいは成
形時間を制御することができる。これに使われる触媒や
硬化促進剤としては、有機過酸化物やアゾ化合物などの
ラジカル発生剤、有機アミン化合物や有機リン化合物な
どがあげられる。その具体例としては、アゾイソブチロ
ニトリル、ターシャリブチルパーベンゾエート、ジクミ
ルパーオキシド、ベンゾイルパーオキシド、レブリン酸
エステルのパーオキシケタールあるいはトリブチルアミ
ン、4−(N,N−ジメチルアミノ)ピリジン,ルチジ
ン,2−エチル−4−メチルイミダゾール、トリトリル
ホスフィンなどがあげられる。[0019] By kneading silica that satisfies the conditions of average particle size, shape, and volume ratio of silica with the above-mentioned polymaleimide compound and allylphenol compound, good fluidity and good molding can be achieved. Processability becomes possible. Such a resin composition has a small coefficient of thermal expansion, good heat resistance, high fluidity, and good moldability, and can be used as a resin composition for semiconductor encapsulation. Here, the method of curing the composition of the present invention can be easily achieved by heating from the outside, but by adding a catalyst or curing accelerator, the molding temperature or molding time can be adjusted depending on the molding method, the shape of the molded product, etc. can be controlled. Examples of catalysts and curing accelerators used for this include radical generators such as organic peroxides and azo compounds, organic amine compounds, and organic phosphorus compounds. Specific examples include azoisobutyronitrile, tert-butyl perbenzoate, dicumyl peroxide, benzoyl peroxide, peroxyketal of levulinic acid ester or tributylamine, 4-(N,N-dimethylamino)pyridine, Examples include lutidine, 2-ethyl-4-methylimidazole, and tritolylphosphine.
【0020】また、本発明の樹脂組成物にシリカ以外の
無機充填材や強化繊維などを加えることもできる。その
具体例としては、アルミナ粉、マイカ、チタニア、ジル
コニアあるいはガラス繊維、炭素繊維、アラミド繊維、
ボロン繊維などがあげられる。さらに、必要に応じて天
然ワックス、合成ワックス、有機脂肪酸、有機脂肪酸の
金属塩などの内部離型剤、ハロゲン化合物、酸化アンチ
モンなどの難燃化剤、カーボンブラックなどの着色剤、
シランカップリング剤、チタンカップリング剤などの表
面処理剤、ニトリルゴム、シリコーン樹脂などの可撓性
付与剤などの機能性改善剤を加えることができる。[0020] Furthermore, inorganic fillers other than silica, reinforcing fibers, etc. can be added to the resin composition of the present invention. Specific examples include alumina powder, mica, titania, zirconia, glass fiber, carbon fiber, aramid fiber,
Examples include boron fiber. Furthermore, if necessary, natural waxes, synthetic waxes, organic fatty acids, internal mold release agents such as organic fatty acid metal salts, halogen compounds, flame retardants such as antimony oxide, coloring agents such as carbon black, etc.
Functionality improving agents such as surface treatment agents such as silane coupling agents and titanium coupling agents, and flexibility imparting agents such as nitrile rubber and silicone resins can be added.
【0021】[0021]
【実施例】次に実施例により本発明をさらに詳細に説明
するが、本発明はその要旨を逸脱しない限り実施例によ
り限定されるものではない。EXAMPLES Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the Examples unless it departs from the gist thereof.
【0022】合成例
ビス(4−マレイミドフェニル)メタン100g、ビス
(4−アミノフェニル)メタン27.7gを200ml
のジメチルホルムアミド(DMF)中で120℃に30
分間加熱し、これを水にあけ得られた沈澱物をろ過、乾
燥し付加物Aを120.2g得た。核磁気共鳴法により
マレイミドのビニルプロトンを確認した。Synthesis Example 100g of bis(4-maleimidophenyl)methane, 27.7g of bis(4-aminophenyl)methane in 200ml
in dimethylformamide (DMF) at 120 °C for 30
The mixture was heated for 1 minute, poured into water, and the resulting precipitate was filtered and dried to obtain 120.2 g of adduct A. The vinyl proton of maleimide was confirmed by nuclear magnetic resonance method.
【0023】実施例1
ビス(4−マレイミドフェニル)メタン41.7g、2
,2−ビス(3−アリル−4−ヒドロキシフェニル)プ
ロパン31.6g、平均粒径18μmの球状シリカ29
9gと平均粒径0.9μmの球状シリカ117g、一次
粒子の平均粒径12nmのシリカ(日本アエロジル社製
アエロジル(AEROSIL)200(AEROSIL
は登録商標))4g、γ−グリシドキシプロポキシトリ
メトキシシラン4.2g、レブリン酸ブチル−tert
−ブチルパーオキシケタール1.5g、1,4−ビス(
2−(2−(tert−ブチルパーオキシ)プロピル)
)ベンゼン0.4g、カルナウバワックス0.7gを2
本ロールで均一に混合し樹脂組成物を得た。得られた樹
脂組成物の流動性、バリの様子を表2に示す。Example 1 41.7 g of bis(4-maleimidophenyl)methane, 2
, 31.6 g of 2-bis(3-allyl-4-hydroxyphenyl)propane, 29 spherical silica with an average particle size of 18 μm
9 g of spherical silica with an average particle size of 0.9 μm, 117 g of spherical silica with an average particle size of 0.9 μm, and silica with an average primary particle size of 12 nm (AEROSIL 200 manufactured by Nippon Aerosil Co., Ltd.)
(registered trademark)) 4g, γ-glycidoxypropoxytrimethoxysilane 4.2g, butyl levulinate-tert
-butyl peroxyketal 1.5 g, 1,4-bis(
2-(2-(tert-butylperoxy)propyl)
) 0.4g of benzene, 0.7g of carnauba wax 2
A resin composition was obtained by uniformly mixing with this roll. Table 2 shows the fluidity and appearance of burrs of the obtained resin composition.
【0024】実施例2
実施例1中の平均粒径18μmの球状シリカを288g
、平均粒径0.9μmの球状シリカを112g、アエロ
ジル200を20gを使った以外は実施例1と同じ操作
で組成物を得た。得られた樹脂組成物の特性を表2に示
す。Example 2 288 g of spherical silica with an average particle size of 18 μm in Example 1
A composition was obtained in the same manner as in Example 1, except that 112 g of spherical silica with an average particle size of 0.9 μm and 20 g of Aerosil 200 were used. Table 2 shows the properties of the obtained resin composition.
【0025】実施例3
ビス(4−マレイミドフェニル)メタン31.7g、2
,2−ビス(3−アリル−4−ヒドロキシフェニル)プ
ロパン13.6g、合成例にあげた付加物A13.6g
、平均粒径18μmの球状シリカを294gと平均粒径
0.9μmの球状シリカ114g、アエロジル200を
12gを使った以外は実施例1と同じ操作で組成物を得
た。得られた樹脂組成物の流動性、バリの様子を表2に
示す。Example 3 31.7 g of bis(4-maleimidophenyl)methane, 2
, 13.6 g of 2-bis(3-allyl-4-hydroxyphenyl)propane, 13.6 g of adduct A listed in the synthesis example
A composition was obtained in the same manner as in Example 1, except that 294 g of spherical silica with an average particle size of 18 μm, 114 g of spherical silica with an average particle size of 0.9 μm, and 12 g of Aerosil 200 were used. Table 2 shows the fluidity and appearance of burrs of the obtained resin composition.
【0026】実施例4
実施例1中の平均粒径0.9μmの球状シリカを44.
9g使い、これに平均粒径0.3μmの球状シリカ69
.3g加えた以外は実施例1と同じ組成で組成物を得た
。得られた樹脂組成物の流動性を表2に示す。Example 4 The spherical silica of Example 1 having an average particle diameter of 0.9 μm was mixed with 44.
I used 9g of spherical silica 69 with an average particle size of 0.3μm.
.. A composition was obtained with the same composition as in Example 1 except that 3 g was added. Table 2 shows the fluidity of the obtained resin composition.
【0027】比較例1
実施例1中の平均粒径18μmの球状シリカを302g
、平均粒径0.9μmの球状シリカ118gを使い、一
次粒子の平均粒径7から50nmのシリカを加えなかっ
たこと以外は実施例1と同じ操作で組成物を得た。得ら
れた樹脂組成物の特性を表2に示す。Comparative Example 1 302 g of spherical silica with an average particle size of 18 μm in Example 1
A composition was obtained in the same manner as in Example 1, except that 118 g of spherical silica with an average particle size of 0.9 μm was used and silica with an average primary particle size of 7 to 50 nm was not added. Table 2 shows the properties of the obtained resin composition.
【0028】比較例2
実施例1中の平均粒径18μmの球状シリカを275g
、平均粒径0.9μmの球状シリカ107g、アエロジ
ル200を38gを使った以外は実施例1と同じ操作で
組成物を得た。得られた樹脂組成物の特性を表2に示す
。Comparative Example 2 275 g of spherical silica with an average particle size of 18 μm in Example 1
A composition was obtained in the same manner as in Example 1, except that 107 g of spherical silica with an average particle size of 0.9 μm and 38 g of Aerosil 200 were used. Table 2 shows the properties of the obtained resin composition.
【0029】表2より明らかなように本発明は流動性お
よび成形加工性に優れていることがわかる。As is clear from Table 2, the present invention has excellent fluidity and moldability.
【0030】[0030]
【表1】[Table 1]
【0031】但しビスマレイミドA=ビス(4−マレイ
ミドフェニル)メタン
アリルフェノールA=2,2−ビス(3−アリル−4−
ヒドロキシフェニル)プロパン
球状シリカA=平均粒径18μmの球状シリカ球状シリ
カB=平均粒径0.9μmの球状シリカ球状シリカC=
平均粒径0.3μmの球状シリカ球状シリカD=アエロ
ジル200
カップリング剤A=γ−グリシドキシプロポキシトリメ
トキシシラン
過酸化物A=レブリン酸ブチルジ−tert−ブチルパ
ーオキシケタール
過酸化物B=1,4−ビス(2−(2−(tert−ブ
チルパーオキシ)プロピル))ベンゼンHowever, bismaleimide A = bis(4-maleimidophenyl)methane allylphenol A = 2,2-bis(3-allyl-4-
Hydroxyphenyl)propane Spherical silica A = Spherical silica with an average particle size of 18 μm Spherical silica B = Spherical silica with an average particle size of 0.9 μm Spherical silica C =
Spherical silica with an average particle size of 0.3 μm Spherical silica D = Aerosil 200 Coupling agent A = γ-glycidoxypropoxytrimethoxysilane peroxide A = Butyl levulinate di-tert-butyl peroxyketal peroxide B = 1 ,4-bis(2-(2-(tert-butylperoxy)propyl))benzene
【0032】[0032]
【表2】[Table 2]
【0033】(1)流動性はフローテスター(島津製)
で180℃、ノズル径1mm、加重10kgの条件で測
定した。(1) Fluidity was measured using a flow tester (manufactured by Shimadzu)
The measurement was carried out under the conditions of 180° C., nozzle diameter of 1 mm, and load of 10 kg.
【0034】(2)トランスファー成形機を用いて射出
圧100kg/mm2で射出し、金型温度180℃で3
min保持したあと、ギャップ30μのエアベントに出
たバリ(樹脂もれ)の長さをエアベント入口から測定し
た。(2) Inject using a transfer molding machine at an injection pressure of 100 kg/mm2, and at a mold temperature of 180°C.
After holding the air vent for 30 μm, the length of the burr (resin leakage) that appeared on the air vent with a gap of 30 μm was measured from the air vent inlet.
【0035】[0035]
【発明の効果】本発明組成物は、特定の樹脂成分を採用
することにより、耐熱性及び成形加工性に優れ、特に、
特定のシリカを使用することにより、成形時の流動性に
優れ、且つバリが発生しにくい。Effects of the Invention The composition of the present invention has excellent heat resistance and moldability by employing a specific resin component, and in particular,
By using a specific silica, it has excellent fluidity during molding and is less likely to generate burrs.
Claims (1)
を有するポリマレイミド化合物、 B.下記の一般式(1)で示されるアリルフェノール化
合物(XはC(CH3 )2 ,SO2 ,SO,S,
O,COいずれかよりなる)、 【化1】 C.一次粒子の平均粒径が7nm以上50nm以下の球
状シリカを全シリカの0.5重量%以上7重量%以下を
占める球状シリカを必須成分とすることを特徴とする半
導体封止用樹脂組成物。[Claim 1] A. A polymaleimide compound having two or more maleimide groups in the molecule; B. An allylphenol compound represented by the following general formula (1) (X is C(CH3)2, SO2, SO, S,
consisting of either O or CO), [Chemical formula 1]C. A resin composition for semiconductor encapsulation, comprising as an essential component spherical silica whose primary particles have an average particle size of 7 nm or more and 50 nm or less, accounting for 0.5% by weight or more and 7% by weight or less of the total silica.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5165291A JPH04285617A (en) | 1991-03-15 | 1991-03-15 | Resin composition for sealing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5165291A JPH04285617A (en) | 1991-03-15 | 1991-03-15 | Resin composition for sealing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04285617A true JPH04285617A (en) | 1992-10-09 |
Family
ID=12892802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5165291A Pending JPH04285617A (en) | 1991-03-15 | 1991-03-15 | Resin composition for sealing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04285617A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2290297A (en) * | 1994-06-13 | 1995-12-20 | Sumitomo Chemical Co | Filler/resin composition |
JP2010118649A (en) * | 2008-10-16 | 2010-05-27 | Hitachi Chem Co Ltd | Liquid resin composition for sealing, and electronic component device using the same |
-
1991
- 1991-03-15 JP JP5165291A patent/JPH04285617A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2290297A (en) * | 1994-06-13 | 1995-12-20 | Sumitomo Chemical Co | Filler/resin composition |
US5719225A (en) * | 1994-06-13 | 1998-02-17 | Sumitomo Chemical Company, Ltd. | Filler-containing resin composition suitable for injection molding and transfer molding |
GB2290297B (en) * | 1994-06-13 | 1998-05-06 | Sumitomo Chemical Co | Filler-containing resin composition suitable for injection molding and transfer molding |
US5780145A (en) * | 1994-06-13 | 1998-07-14 | Sumitomo Chemical Company, Limited | Filler-containing resin composition suitable for injection molding and transfer molding |
JP2010118649A (en) * | 2008-10-16 | 2010-05-27 | Hitachi Chem Co Ltd | Liquid resin composition for sealing, and electronic component device using the same |
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