JPH04283589A - Production of vinyl silane compounds - Google Patents
Production of vinyl silane compoundsInfo
- Publication number
- JPH04283589A JPH04283589A JP3046837A JP4683791A JPH04283589A JP H04283589 A JPH04283589 A JP H04283589A JP 3046837 A JP3046837 A JP 3046837A JP 4683791 A JP4683791 A JP 4683791A JP H04283589 A JPH04283589 A JP H04283589A
- Authority
- JP
- Japan
- Prior art keywords
- lower alkyl
- group
- alkyl group
- formula
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 title description 8
- -1 vinyl silane compound Chemical class 0.000 claims abstract description 36
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 35
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 21
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 7
- 239000000203 mixture Substances 0.000 claims abstract description 5
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 44
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 claims description 25
- 229910052707 ruthenium Inorganic materials 0.000 claims description 16
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 6
- 150000001336 alkenes Chemical class 0.000 claims description 5
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 abstract description 25
- 238000006243 chemical reaction Methods 0.000 abstract description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract description 13
- 239000003054 catalyst Substances 0.000 abstract description 9
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 abstract description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 5
- 238000007323 disproportionation reaction Methods 0.000 abstract description 5
- 239000011261 inert gas Substances 0.000 abstract description 3
- 239000003814 drug Substances 0.000 abstract description 2
- 238000003786 synthesis reaction Methods 0.000 abstract description 2
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- 229940079593 drug Drugs 0.000 abstract 1
- 239000000543 intermediate Substances 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 4
- 238000011088 calibration curve Methods 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- 101100167062 Caenorhabditis elegans chch-3 gene Proteins 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- UUFQTNFCRMXOAE-UHFFFAOYSA-N 1-methylmethylene Chemical compound C[CH] UUFQTNFCRMXOAE-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical compound [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、ルテニウム触媒を利用
したビニルシラン類の製造方法、新規ルテニウムシリル
錯体及びその製造方法、及び該ルテニウムシリル錯体を
用いたビニルシラン類の製造方法に関する。FIELD OF THE INVENTION The present invention relates to a method for producing vinylsilanes using a ruthenium catalyst, a new ruthenium silyl complex and a method for producing the same, and a method for producing vinylsilanes using the ruthenium silyl complex.
【0002】0002
【従来の技術】従来、ビニルシラン類と一置換オレフィ
ンとの不均化触媒反応としては、ルテニウム触媒である
Ru3(CO)12 を使用しCH2=CHSi(OE
t)3と CH2=CH(CH2)n CH3 との組
合せで(EtO)3SiCH=CH(CH2)n CH
3 を製造する方法(B.Marciniec, et
al. J. Mol. Catal., 46,
(1988) 329)、CH2=CHSiMe3 と
CH2=CHC6H5との組合せでMe3SiCH=C
HC6H5を製造する方法(Y.Seki, et a
l. J. Organomet. Chem., 3
69 ,(1988)117)が知られている。しかし
これらの反応においてはそれぞれホモ不均化生成物であ
る(EtO)3SiCH=CHSi(OEt)3 や
Me3SiCH=CHSiMe3等が副生するという問
題があった。[Prior Art] Conventionally, a ruthenium catalyst Ru3(CO)12 was used for the disproportionation catalytic reaction between vinylsilanes and monosubstituted olefins, and CH2=CHSi(OE
t)3 and CH2=CH(CH2)n CH3 in combination with (EtO)3SiCH=CH(CH2)n CH
3 (B. Marciniec, et
al. J. Mol. Catal. , 46,
(1988) 329), Me3SiCH=C in the combination of CH2=CHSiMe3 and CH2=CHC6H5
Method for producing HC6H5 (Y. Seki, et a
l. J. Organomet. Chem. , 3
69, (1988) 117) is known. However, in these reactions, the homodisproportionation products (EtO)3SiCH=CHSi(OEt)3 and
There was a problem that Me3SiCH=CHSiMe3 and the like were produced as by-products.
【0003】0003
【発明が解決しようとする課題及び課題を解決するため
の手段】本発明者はビニルシラン類の不均化反応につい
て鋭意研究を進めた結果、ルテニウム触媒であるRu(
Cl)(CO)H(PPh3)3を触媒として使用する
と、ホモ不均化生成物がほとんど生成することなくオレ
フィンの不均化反応が進行することを見出し、本発明を
完成するに至った。Problems to be Solved by the Invention and Means for Solving the Problems As a result of intensive research into the disproportionation reaction of vinylsilanes, the present inventors discovered that the ruthenium catalyst Ru(
The present inventors have discovered that when Cl)(CO)H(PPh3)3 is used as a catalyst, the olefin disproportionation reaction proceeds with almost no homodisproportionation products produced, and the present invention has been completed.
【0004】すなわち本発明は、一般式 CH2=CH
SiR1R2R3で示されるビニルシラン化合物(式中
、R1は低級アルキル基又は低級アルコキシ基を示し、
R2及びR3は独立に低級アルキル基を示す)と、一般
式 CH2=CHR4で示される一置換オレフィン化合
物(式中、R4は低級アルキル基、低級アルコキシ基、
低級アルコキシカルボニル基、アリール基、またはSi
R5R6R7(式中、R5は低級アルキル基、低級アル
コキシ基を示し、R6及びR7は独立に低級アルキル基
である)を示す)とを、Ru(Cl)(CO)H(PP
h3)3若しくはRuCl(CO)(PPh3)2(S
iR1R2R3) (式中、R1は低級アルキル基又は
低級アルコキシ基を示し、R2及びR3は独立に低級ア
ルキル基を示す)又はそれらの混合物の存在下に反応さ
せることを特徴とする、一般式R4CH=CHSiR1
R2R3で示されるビニルシラン化合物(式中、R1、
R2、R3、及びR4は前記定義と同じである)の製造
方法また、本発明は以下の式:RuCl(CO)(PP
h3)2(SiR1R2R3) (式中、R1、R2、
及びR3は前記定義と同じである)で示される新規ルテ
ニウムシリル錯体、一般式 CH2=CHSiR1R2
R3で示されるビニルシラン化合物(式中、R1、R2
、及びR3は前記定義と同じである)と、Ru(Cl)
(CO)H(PPh3)3を反応させることを特徴とす
る該ルテニウムシリル錯体の製造方法、及び該錯体と一
般式 CH2=CHR4で示される一置換オレフィン化
合物(式中、R4は前記定義と同じである)とを反応さ
せることを特徴とする、一般式R4CH=CHSiR1
R2R3で示されるビニルシラン化合物(式中、R1、
R2、R3、及びR4は前記定義と同じである)の製造
方法を提供するのもである。That is, the present invention provides the general formula CH2=CH
A vinyl silane compound represented by SiR1R2R3 (wherein R1 represents a lower alkyl group or a lower alkoxy group,
R2 and R3 independently represent a lower alkyl group), and a monosubstituted olefin compound represented by the general formula CH2=CHR4 (wherein R4 is a lower alkyl group, a lower alkoxy group,
Lower alkoxycarbonyl group, aryl group, or Si
R5R6R7 (in the formula, R5 represents a lower alkyl group or a lower alkoxy group, and R6 and R7 independently represent a lower alkyl group)), Ru(Cl)(CO)H(PP
h3)3 or RuCl(CO)(PPh3)2(S
iR1R2R3) (wherein R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group) or a mixture thereof, with the general formula R4CH= CHSiR1
A vinyl silane compound represented by R2R3 (wherein R1,
R2, R3, and R4 are the same as defined above) The present invention also provides the following formula: RuCl(CO)(PP
h3)2(SiR1R2R3) (wherein, R1, R2,
and R3 are the same as defined above), a novel ruthenium silyl complex represented by the general formula CH2=CHSiR1R2
A vinyl silane compound represented by R3 (in the formula, R1, R2
, and R3 are the same as defined above) and Ru(Cl)
A method for producing the ruthenium silyl complex, characterized by reacting (CO)H(PPh3)3, and a monosubstituted olefin compound represented by the general formula CH2=CHR4 (wherein R4 is the same as defined above). with the general formula R4CH=CHSiR1
A vinyl silane compound represented by R2R3 (wherein R1,
R2, R3, and R4 are the same as defined above).
【0005】本発明の方法において反応原料として使用
されるビニルシラン化合物は一般式CH2=CHSiR
1R2R3で示され、式中、R1は低級アルキル基、低
級アルコキシ基を示し、R2及びR3は独立に低級アル
キル基を示す。本明細書において低級アルキル基は炭素
数が1〜6のアルキル基を示し、例えばメチル基、エチ
ル基、ピロピル基、イソプロピル基、n−ブチル基、s
ec−ブチル基、または tert−ブチル基等をあげ
ることができ、低級アルコキシ基は炭素数1〜6のアル
コキシ基を示し、例えばメトキシ基、エトキシ基、プロ
ポキシ基、イソプロポキシ基、n−ブトキシ基、sec
−ブトキシ基、またはtert−ブトキシ基を挙げるこ
とができる。これらのビニルシラン化合物はいずれも公
知化合物であり、市販品または文献記載の方法により製
造したものを使用することができる。The vinyl silane compound used as a reaction raw material in the method of the present invention has the general formula CH2=CHSiR.
It is represented by 1R2R3, where R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group. In this specification, lower alkyl group refers to an alkyl group having 1 to 6 carbon atoms, such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, s
Examples include ec-butyl group or tert-butyl group, and lower alkoxy group represents an alkoxy group having 1 to 6 carbon atoms, such as methoxy group, ethoxy group, propoxy group, isopropoxy group, n-butoxy group. , sec
-butoxy group or tert-butoxy group. All of these vinylsilane compounds are known compounds, and commercially available products or those produced by methods described in literature can be used.
【0006】本発明の方法において反応原料として使用
される一置換オレフィン化合物は一般式 CH2=CH
R4で示され、式中、R4は低級アルキル基、低級アル
コキシ基、低級アルコキシカルボニル基、アリール基、
またはSiR5R6R7(式中、R5は低級アルキル基
、低級アルコキシ基を示し、R6及びR7は独立に低級
アルキル基を示す)を示す。本明細書において低級アル
コキシカルボニル基は、炭素数が1〜6のアルコキシ基
により置換されたカルボニル基を示し、例えばメトキシ
カルボニル基、エトキシカルボニル基、プロポキシカル
ボニル基、イソプロポキシカルボニル基、n−ブトキシ
カルボニル基、sec−ブトキシカルボニル基、または
tert−ブトキシカルボニル基を挙げることができ
、アリール基としてはフェニル基、置換フェニル基、ピ
リジル基等を挙げることができる。これら一置換オレフ
ィン化合物はいずれも公知化合物であり、市販品または
文献記載の方法により製造したものを使用することがで
きる。The monosubstituted olefin compound used as a reaction raw material in the method of the present invention has the general formula CH2=CH
It is represented by R4, where R4 is a lower alkyl group, a lower alkoxy group, a lower alkoxycarbonyl group, an aryl group,
or SiR5R6R7 (in the formula, R5 represents a lower alkyl group or a lower alkoxy group, and R6 and R7 independently represent a lower alkyl group). In this specification, a lower alkoxycarbonyl group refers to a carbonyl group substituted with an alkoxy group having 1 to 6 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, an isopropoxycarbonyl group, and a n-butoxycarbonyl group. Examples of the aryl group include a phenyl group, a substituted phenyl group, a pyridyl group, and the like. All of these monosubstituted olefin compounds are known compounds, and commercially available products or those produced by methods described in literature can be used.
【0007】本発明の方法において使用されるルテニウ
ム触媒Ru(Cl)(CO)H(PPh3)3は公知の
錯体であり、Inorg. Syn.,15, 48(
1974)に記載された方法により製造される。また、
本発明において使用される式RuCl(CO)(PPh
3)2(SiR1R2R3) (式中、R1、R2、及
びR3は前記の通りである)で示されるルテニウムシリ
ル錯体は新規錯体であり、一般式 CH2=CHSiR
1R2R3で示されるビニルシラン化合物(式中、R1
、R2、及びR3は前記の通りである)と、Ru(Cl
)(CO)H(PPh3)3を反応させることにより製
造される。反応条件の1例としては、Ru(Cl)(C
O)H(PPh3)3に対して、過剰量の CH2=C
HSiR1R2R3で示されるビニルシラン化合物を、
例えばテトラヒドロフラン等の溶媒中で封管により60
〜70℃で15〜18時間反応させ、必要に応じてカラ
ムクロマトグラフィー等で生成する方法を挙げることが
できる。該錯体のIRスペクトルはCO吸収がKBr法
では2本観測されるが(R1、R2、及びR3が全てメ
チル基の化合物で1900、1920cm−1;R1が
エトキシ基でR2及びR3がメチル基の化合物で190
5、1923cm−1)、塩化メチレン溶液では一本で
ある(例えばR1、R2、及びR3が全てメチル基の化
合物で1916cm−1;R1がエトキシ基でR2及び
R3がメチル基の化合物で1922cm−1)ことから
、固体状態では2種類の結晶状態が存在することが判明
している。本発明の方法においては、これらの錯体を反
応触媒として単独で、若しくは混合物として使用するこ
とができる。触媒としてRu(Cl)(CO)H(PP
h3)3を使用した場合には、上記条件下において反応
系中に式RuCl(CO)(PPh3)2(SiR1R
2R3) (式中、R1、R2、及びR3は前記の通り
である)で示されるルテニウム錯体が一部生成するが、
この様な混合触媒状態も本発明の方法に含まれる。The ruthenium catalyst Ru(Cl)(CO)H(PPh3)3 used in the process of the invention is a known complex, described by Inorg. Syn. , 15, 48 (
1974). Also,
The formula used in the present invention is RuCl(CO)(PPh
3) The ruthenium silyl complex represented by 2(SiR1R2R3) (wherein R1, R2, and R3 are as described above) is a new complex, and has the general formula CH2=CHSiR
A vinyl silane compound represented by 1R2R3 (wherein R1
, R2, and R3 are as described above) and Ru(Cl
)(CO)H(PPh3)3. One example of reaction conditions is Ru(Cl)(C
O)H(PPh3)3, excess amount of CH2=C
A vinyl silane compound represented by HSiR1R2R3,
For example, in a solvent such as tetrahydrofuran in a sealed tube,
Examples include a method of reacting at ~70°C for 15 to 18 hours and, if necessary, producing the product by column chromatography or the like. In the IR spectrum of the complex, two CO absorption lines are observed using the KBr method (1900 and 1920 cm for a compound in which R1, R2, and R3 are all methyl groups; R1 is an ethoxy group and R2 and R3 are methyl groups). 190 in compound
5, 1923 cm-1), and one in methylene chloride solution (for example, 1916 cm-1 in a compound where R1, R2, and R3 are all methyl groups; 1922 cm-1 in a compound where R1 is an ethoxy group and R2 and R3 are methyl groups) 1) It has been found that there are two types of crystalline states in the solid state. In the method of the present invention, these complexes can be used alone or as a mixture as reaction catalysts. Ru(Cl)(CO)H(PP
When using h3)3, the formula RuCl(CO)(PPh3)2(SiR1R
2R3) (wherein R1, R2, and R3 are as described above) is partially produced,
Such a mixed catalyst state is also included in the method of the present invention.
【0008】ビニルシラン化合物及び一置換オレフィン
化合物を本発明の方法により反応させるにあたり、上記
のルテニウム触媒を原料ビニルシラン化合物に対して0
.005〜0.05モルとなる様に使用し、溶媒として
例えばテトラヒドロフラン、塩化メチレン、トルエン、
ベンゼン等を原料ビニルシラン化合物に対して1〜10
0倍容の割合で使用すればよい。反応は好ましくは封管
中で行われ、例えば窒素、アルゴン等の不活性ガス雰囲
気中で反応温度を70℃以上、好ましくは120℃以上
として5〜40時間反応を行えばよい。また、該一置換
オレフィン化合物に対するビニルシラン化合物の使用量
は0.5〜10当量、好ましくは2当量以上とすること
によりホモ不均化物の生成を抑制することができる。[0008] When reacting a vinyl silane compound and a monosubstituted olefin compound by the method of the present invention, the above-mentioned ruthenium catalyst is added to the raw material vinyl silane compound at a rate of 0.
.. 005 to 0.05 mol, and as a solvent, for example, tetrahydrofuran, methylene chloride, toluene,
1 to 10% of benzene etc. to the raw material vinyl silane compound
It may be used at a ratio of 0 times the volume. The reaction is preferably carried out in a sealed tube, and the reaction may be carried out for 5 to 40 hours at a reaction temperature of 70° C. or higher, preferably 120° C. or higher, in an inert gas atmosphere such as nitrogen or argon. Furthermore, the amount of the vinylsilane compound used relative to the monosubstituted olefin compound is 0.5 to 10 equivalents, preferably 2 equivalents or more, thereby suppressing the formation of homodisproportionated products.
【0009】この様な反応条件で不均化反応をおこなう
ことにより一般式R4CH=CHSiR1R2R3で示
されるビニルシラン化合物(式中、R1、R2、R3、
及びR4は前記定義と同じである)を効率よく製造する
ことができる。これらの化合物のうちR1、R2、及び
R3がメチル基であり、R4がメトキシカルボニル基で
ある化合物;R1、R2、及びR3がメチル基であり、
R4がn−ブトキシカルボニル基である化合物;R1及
びR2がメチル基であり、R3がエトキシ基であり、R
4がフェニル基である化合物;R1及びR2がメチル基
であり、R3がエトキシ基であり、R4がメトキシカル
ボニル基である化合物;及びR1及びR2がメチル基で
あり、R3がエトキシ基であり、R4がn−ブトキシカ
ルボニル基である化合物等は新規化合物であり、いずれ
も医薬品、有機合成原料等として有用な化合物である。By carrying out the disproportionation reaction under such reaction conditions, a vinylsilane compound represented by the general formula R4CH=CHSiR1R2R3 (wherein R1, R2, R3,
and R4 are the same as defined above) can be efficiently produced. Among these compounds, R1, R2, and R3 are methyl groups, and R4 is a methoxycarbonyl group; R1, R2, and R3 are methyl groups,
A compound in which R4 is an n-butoxycarbonyl group; R1 and R2 are a methyl group, R3 is an ethoxy group, and R
A compound where 4 is a phenyl group; a compound where R1 and R2 are a methyl group, R3 is an ethoxy group, and R4 is a methoxycarbonyl group; and a compound where R1 and R2 are a methyl group and R3 is an ethoxy group; Compounds in which R4 is an n-butoxycarbonyl group are new compounds, and all are useful compounds as pharmaceuticals, raw materials for organic synthesis, etc.
【0010】式RuCl(CO)(PPh3)2(Si
R1R2R3) (式中、R1、R2、及びR3は前記
の通りである)で示される錯体と、エチレン、または一
般式 CH2=CHR4で示される一置換オレフィン化
合物(式中、R4は低級アルキル基、低級アルコキシ基
、低級アルコキシカルボニル基、アリール基、またはS
iR5R6R7(式中、R5は低級アルキル基、低級ア
ルコキシ基を示し、R6及びR7は独立に低級アルキル
基である)を示す)を反応させることにより、R4CH
=CHSiR1R2R3(式中、R1、R2、R3、及
びR4は前記の通りである)で示されるビニルシランが
製造される。反応は通常は封管中で、例えばトルエン、
ベンゼン、テトラヒドロフラン、塩化エチレン等の溶媒
を用いて40〜160℃、好ましくは70℃〜120℃
で行われる。オレフィンがエチレン、プロピレン等のガ
ス状の場合にはオートクレーブ中で1気圧以上の加圧下
で反応を行えばよい。[0010] Formula RuCl(CO)(PPh3)2(Si
R1R2R3) (wherein R1, R2, and R3 are as described above) and ethylene, or a monosubstituted olefin compound represented by the general formula CH2=CHR4 (wherein R4 is a lower alkyl group, Lower alkoxy group, lower alkoxycarbonyl group, aryl group, or S
R4CH
A vinylsilane having the formula =CHSiR1R2R3 (wherein R1, R2, R3, and R4 are as described above) is produced. The reaction is usually carried out in a sealed tube, e.g. toluene,
40 to 160°C, preferably 70 to 120°C using a solvent such as benzene, tetrahydrofuran, or ethylene chloride.
It will be held in When the olefin is a gas such as ethylene or propylene, the reaction may be carried out in an autoclave under pressure of 1 atmosphere or more.
【0011】[0011]
【発明の効果】本発明の方法により、ビニルシラン化合
物が効率的に製造される。特に本発明の方法によれば、
ホモ不均化物の副生なしにオレフィンを不均化すること
ができるので極めて有用である。また、本発明により提
供されたルテニウムシリル錯体は、一置換オレフィン化
合物を効率よくシリル化することができるので有用であ
る。[Effects of the Invention] Vinylsilane compounds can be efficiently produced by the method of the present invention. In particular, according to the method of the invention,
It is extremely useful because it allows olefins to be disproportioned without producing homodisproportionate by-products. Furthermore, the ruthenium silyl complex provided by the present invention is useful because it can efficiently silylate monosubstituted olefin compounds.
【0012】0012
【実施例】以下に本発明を実施例によりさらに具体的に
説明するが、本発明はこれらの実施例に限定されること
はない。以下の実施例において全ての反応及び生成物の
処理は不活性ガス(窒素またはアルゴン)の雰囲気下で
行った。溶媒は市販の特級試薬をアルゴンガスでバブル
することにより脱酸素したものを使用した。テトラヒド
ロフランはナトリウムとベンゾフェノンを用いて乾燥さ
せた後に蒸留して使用した。カラムクロマトグラフィー
にはシリカゲル(和光純薬製)を脱気して使用した。生
成物の同定は、IR(島津製、IR−27G)、NMR
(日本電子製、GSX−500、GSX−400、GS
X−100)、CH元素分析(理化学研究所微量分析室
)、GLC(HP−5890A、キャピラリーカラムJ
&W DB1 30m)により行った。[Examples] The present invention will be explained in more detail with reference to Examples below, but the present invention is not limited to these Examples. In the following examples all reactions and work-up of products were carried out under an atmosphere of inert gas (nitrogen or argon). The solvent used was a commercially available special grade reagent deoxygenated by bubbling with argon gas. Tetrahydrofuran was used by drying it with sodium and benzophenone and then distilling it. Degassed silica gel (manufactured by Wako Pure Chemical Industries, Ltd.) was used for column chromatography. The product was identified using IR (Shimadzu, IR-27G), NMR.
(JEOL, GSX-500, GSX-400, GS
X-100), CH elemental analysis (RIKEN Microanalysis Laboratory), GLC (HP-5890A, capillary column J
&W DB1 30m).
【0013】実施例1
20mgのRu(Cl)(CO)H(PPh3)3(0
.021mmol)、0.2mlのCH2=CHSiR
1R2R3(R1、R2、及びR3が全てメチル基の化
合物1.30mmol、又はR1がエトキシ基でR2及
びR3がメチル基の化合物1.21mmol)、0.4
mlの CH2=CHR4(R4=SiMe3 の化合
物2.60mmol、R4=SiMe2(OEt)の化
合物2.42mmol、R4=COOMe の化合物4
.44mmol、R4=C6H5の化合物3.49mm
ol、又はR4=O−n−Buの化合物3.09mmo
l)、及び2mlのテトラヒドロフランを封管し、14
0℃で14時間加熱した。その反応溶液に所定量の内部
標準(C n H2n+2)を加えた後GLCで収率を
定量した。検量線の作成は以下の様に行った。蒸留単離
した生成物(50mg)をサンプル管に取り、生成物の
半分のモル数の標準物質(C n H2n+2)がテト
ラヒドロフランに含まれる様に調製した溶液を1、2、
3、4mlと加えた。それをGLCで分析することによ
り検量線を作成した。プロットが線上に乗らないときは
ことなる比で再度プロットした。上記の量の5〜10倍
のスケールで反応を行った反応液を用いて生成物を蒸留
単離し、NMR、IR、元素分析を行った。Example 1 20 mg of Ru(Cl)(CO)H(PPh3)3(0
.. 021 mmol), 0.2 ml CH2=CHSiR
1R2R3 (1.30 mmol of a compound where R1, R2, and R3 are all methyl groups, or 1.21 mmol of a compound where R1 is an ethoxy group and R2 and R3 are methyl groups), 0.4
ml of CH2=CHR4(R4=SiMe3 compound 2.60 mmol, R4=SiMe2(OEt) compound 2.42 mmol, R4=COOMe compound 4
.. 44 mmol, 3.49 mm of compound with R4=C6H5
ol, or 3.09 mmo of a compound where R4=O-n-Bu
1), and 2 ml of tetrahydrofuran in a sealed tube,
Heated at 0°C for 14 hours. After adding a predetermined amount of internal standard (C n H2n+2) to the reaction solution, the yield was determined by GLC. The calibration curve was created as follows. The product (50 mg) isolated by distillation was taken into a sample tube, and a solution prepared so that the standard substance (C n H2n + 2) containing half the number of moles of the product in tetrahydrofuran was added 1, 2,
3 or 4 ml was added. A calibration curve was created by analyzing it by GLC. When the plot did not fall on the line, it was plotted again using a different ratio. The product was isolated by distillation using a reaction solution that was reacted on a scale of 5 to 10 times the above amount, and subjected to NMR, IR, and elemental analysis.
【0014】以上の結果を以下の表1に示す。
表 1
CH2=CHSiR1R2R3 C
H2=CHR4 R4CH=C
HSiR1R2R3 R1
R2 R3 R4
収率(%)1) trans/cis tur
n over Me Me Me2)
SiMe3 37.6
44/56 34 Me
Me Me Me
74.3 76/24
92 Me Me Me
Ph 66.0
99/ 1 41 M
e Me Me COOMe
59.4 93/ 7
37 Me Me
Me O−n−Bu 74.
5 78/22 4
6 OEt Me Me2) Si
Me2OEt 49.1 67
/33 42 OEt Me
Me Ph
72.2 99/ 1
42 OEt Me Me
COOMe 69.7
83/17 40 OEt
Me Me O−n−Bu
83.8 84/16
48 1) CH2=CHSiMe
2R1 基準2) CH2=CHSiR1R2R3 0
.6mlThe above results are shown in Table 1 below.
Table 1
CH2=CHSiR1R2R3C
H2=CHR4 R4CH=C
HSiR1R2R3 R1
R2 R3 R4
Yield (%) 1) trans/cis tur
over Me Me Me2)
SiMe3 37.6
44/56 34 Me
Me Me Me
74.3 76/24
92 Me Me Me
Ph 66.0
99/ 1 41 M
e Me Me COOMe
59.4 93/7
37 Me Me
Me On-Bu 74.
5 78/22 4
6 OEt Me Me2) Si
Me2OEt 49.1 67
/33 42 OEt Me
Me Ph
72.2 99/ 1
42 OEt Me Me
COOMe 69.7
83/17 40 OEt
Me Me O-n-Bu
83.8 84/16
48 1) CH2=CHSiMe
2R1 Standard 2) CH2=CHSiR1R2R3 0
.. 6ml
【0015】実施例2 本発明の方法におけ
る温度の影響
20mgのRu(Cl)(CO)H(PPh3)3(0
.021mmol)、0.2mlのCH2=CHSiM
e3(1.30mmol)、0.4mlの CH2=C
HC6H5(3. 49mmol) 、及び4mlのテ
トラヒドロフランを封管し、70℃、100度、120
℃、及び140℃で14時間加熱した。その結果、各温
度における収率は24.2%(70℃)、49.7%(
100℃)、69.4%(120℃)、及び66.0%
(140℃)であった。Example 2 Effect of temperature on the process of the invention 20 mg of Ru(Cl)(CO)H(PPh3)3(0
.. 021 mmol), 0.2 ml CH2=CHSiM
e3 (1.30 mmol), 0.4 ml CH2=C
HC6H5 (3.49 mmol) and 4 ml of tetrahydrofuran were sealed in a tube and heated at 70°C, 100°C, 120°C.
°C, and heated at 140 °C for 14 hours. As a result, the yield at each temperature was 24.2% (70°C) and 49.7% (
100℃), 69.4% (120℃), and 66.0%
(140°C).
【0016】実施例3 本発明の方法における溶媒量
の影響
100mg のRu(Cl)(CO)H(PPh3)3
(0.11mmol) と2mlのCH2=CHSiM
e3(13.3mmol) に反応温度70℃でプロピ
レン(CH2=CHCH3)を4.5Kg/cm2の圧
力で加え、各容のトルエンの存在下にオートクレーブ中
で反応させた。結果を以下の表2に示す。Example 3 Effect of the amount of solvent in the process of the invention 100 mg of Ru(Cl)(CO)H(PPh3)3
(0.11 mmol) and 2 ml of CH2=CHSiM
Propylene (CH2=CHCH3) was added to e3 (13.3 mmol) at a reaction temperature of 70°C at a pressure of 4.5 Kg/cm2, and the mixture was reacted in an autoclave in the presence of each volume of toluene. The results are shown in Table 2 below.
【0017】
表 2
Ru(Cl)(CO)H(PPh3)
3 トルエン 反応時間 生成物分布(
GLC分析%)
A B C
100mg 5ml
13時間 82.1 3.4
14.5 100 20
15 64.1
6.4 29.1 100
5 24
74.2 5.0 20.8
100 10
21 68.9 5.3
25.8 A: CH2=CHSiMe3
B: cis−CH3CH=CHSiMe
3 C: trans−CH3CH=CHS
iMe3 各実施例において得られたビニルシラン
化合物の物理化学的性質は以下に示す通りである。[0017]
Table 2
Ru(Cl)(CO)H(PPh3)
3 Toluene Reaction time Product distribution (
GLC analysis%)
A B C
100mg 5ml
13 hours 82.1 3.4
14.5 100 20
15 64.1
6.4 29.1 100
5 24
74.2 5.0 20.8
100 10
21 68.9 5.3
25.8 A: CH2=CHSiMe3
B: cis-CH3CH=CHSiMe
3C: trans-CH3CH=CHS
iMe3 The physicochemical properties of the vinylsilane compound obtained in each example are as shown below.
【0018】[0018]
【化1】[Chemical formula 1]
【0019】[0019]
【化2】[Case 2]
【0020】[0020]
【化3】[Chemical formula 3]
【0021】[0021]
【化4】[C4]
【0022】[0022]
【表1】[Table 1]
【0023】[0023]
【表2】[Table 2]
【0024】実施例4−A ルテニウムシリル錯体R
uCl(CO)(PPh3)2(SiMe3)の製造2
00mgのRuCl(CO)H(PPh3)3(0.2
1mmol)、38mlのテトラヒドロフラン、及び0
.5mlのCH2=CHSiMe3 (3.24mmo
l)を封管し70℃で18時間加熱した。溶媒を減圧留
去して最小量の塩化メチレンに溶解した後に、シリカゲ
ルカラムクロマトグラフィーにかけベンゼン/ヘキサン
(3/1)により黄色のバンドを溶出した。溶媒を減圧
留去後、塩化メチレン/ヘキサンにて再結晶することに
よりオレンジ色結晶を得た。収量 101mg(収率
63%)
分解点 159〜161℃
IR(KBr、cm−1):1900、1920(CO
)、845(Si−C)
IR(CH2Cl2、cm−1) 1916(CO)1
H−NMR(C6D6) SiMe3 0.6
2 ppm31P−NMR(CDCl3) PPh
3 35.15Example 4-A Ruthenium silyl complex R
Production of uCl(CO)(PPh3)2(SiMe3) 2
00mg RuCl(CO)H(PPh3)3(0.2
1 mmol), 38 ml of tetrahydrofuran, and 0
.. 5 ml CH2=CHSiMe3 (3.24 mmo
1) was sealed and heated at 70°C for 18 hours. After evaporating the solvent under reduced pressure and dissolving in the minimum amount of methylene chloride, the residue was subjected to silica gel column chromatography and a yellow band was eluted with benzene/hexane (3/1). After distilling off the solvent under reduced pressure, orange crystals were obtained by recrystallizing from methylene chloride/hexane. Yield 101 mg (yield 63%) Decomposition point 159-161°C IR (KBr, cm-1): 1900, 1920 (CO
), 845 (Si-C) IR (CH2Cl2, cm-1) 1916 (CO)1
H-NMR (C6D6) SiMe3 0.6
2 ppm31P-NMR (CDCl3) PPh
3 35.15
【0025】実施例4−B ル
テニウムシリル錯体RuCl(CO)(PPh3)2
SiMe2(OEt) の製造200mgのRuCl
(CO)H(PPh3)3(0.21mmol)、10
mlのテトラヒドロフラン、及び1mlのCH2=CH
SiMe2(OEt)(6.05mmol)を封管し6
0℃で15時間加熱した。溶媒を減圧留去後、ベンゼン
/ヘキサンにて再結晶することにより黄色結晶を得た。
収量 99mg(収率60%)分解点 176
〜178℃
IR(KBr、cm−1):1905、1923(CO
)IR(CH2Cl2、cm−1) 1922(CO)
1H−NMR(CDCl3) SiMe3
0.25 ppmCH3(EtO) 0.76
(t、J=7Hz)CH2(EtO) 3.27
(q、J=7Hz)Example 4-B Ruthenium silyl complex RuCl(CO)(PPh3)2
Preparation of SiMe2(OEt) 200 mg RuCl
(CO)H(PPh3)3 (0.21 mmol), 10
ml of tetrahydrofuran and 1 ml of CH2=CH
SiMe2(OEt) (6.05 mmol) was sealed in a tube and 6
Heated at 0°C for 15 hours. After distilling off the solvent under reduced pressure, yellow crystals were obtained by recrystallizing from benzene/hexane. Yield 99mg (yield 60%) Decomposition point 176
~178°C IR (KBr, cm-1): 1905, 1923 (CO
)IR(CH2Cl2, cm-1) 1922(CO)
1H-NMR (CDCl3) SiMe3
0.25 ppmCH3(EtO) 0.76
(t, J=7Hz) CH2(EtO) 3.27
(q, J=7Hz)
【0026】実施例5 ルテニウ
ムシリル錯体を用いたビニルシラン化合物の製造
100mg のRu(Cl)(CO)(PPh3)2(
SiMe3)(0.11mmol) 、2mlのCH2
=CHSiMe3(13.3mmol) 、及び20m
lのトルエンを50ml容のオートクレーブ中に仕込み
、そこにプロピレン(CH2=CHCH3)を4.5K
g/cm2の圧力で加え30分間ボンベとつないだまま
攪拌した。その後、オートクレーブをボンベから外して
140℃の油浴で14時間加熱した。反応液を実施例1
と同様に分析した。検量線にはCH2=CHSiMe3
の検量線を用いた。その結果、トランス/シス異性体
比が76/24であるCH3CH=CHSiMe3 が
収率74%で得られた。Example 5 Preparation of vinylsilane compound using ruthenium silyl complex 100 mg of Ru(Cl)(CO)(PPh3)2(
SiMe3) (0.11 mmol), 2 ml CH2
=CHSiMe3 (13.3 mmol) and 20 m
1 of toluene was charged into a 50 ml autoclave, and propylene (CH2=CHCH3) was added thereto at 4.5K.
It was added at a pressure of g/cm2 and stirred for 30 minutes while connected to the bomb. Thereafter, the autoclave was removed from the cylinder and heated in an oil bath at 140° C. for 14 hours. The reaction solution was prepared in Example 1.
Analyzed in the same way. For the calibration curve, CH2=CHSiMe3
A calibration curve was used. As a result, CH3CH=CHSiMe3 with a trans/cis isomer ratio of 76/24 was obtained in a yield of 74%.
Claims (6)
3で示されるビニルシラン化合物(式中、R1は低級ア
ルキル基又は低級アルコキシ基を示し、R2及びR3は
独立に低級アルキル基を示す)と、一般式 CH2=C
HR4で示される一置換オレフィン化合物(式中、R4
は低級アルキル基、低級アルコキシ基、低級アルコキシ
カルボニル基、アリール基、またはSiR5R6R7(
式中、R5は低級アルキル基、低級アルコキシ基を示し
、R6及びR7は独立に低級アルキル基である)を示す
)とを、Ru(Cl)(CO)H(PPh3)3若しく
はRuCl(CO)(PPh3)2(SiR1R2R3
) (式中、R1は低級アルキル基又は低級アルコキシ
基を示し、R2及びR3は独立に低級アルキル基を示す
)又はそれらの混合物の存在下に反応させることを特徴
とする、一般式R4CH=CHSiR1R2R3で示さ
れるビニルシラン化合物(式中、R1、R2、R3、及
びR4は前記定義と同じである)の製造方法。[Claim 1] General formula CH2=CHSiR1R2R
3 (wherein R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group), and a vinylsilane compound represented by the general formula CH2=C
A monosubstituted olefin compound represented by HR4 (wherein R4
is a lower alkyl group, a lower alkoxy group, a lower alkoxycarbonyl group, an aryl group, or a SiR5R6R7 (
In the formula, R5 represents a lower alkyl group or a lower alkoxy group, and R6 and R7 independently represent a lower alkyl group), and Ru(Cl)(CO)H(PPh3)3 or RuCl(CO) (PPh3)2(SiR1R2R3
) (wherein R1 represents a lower alkyl group or a lower alkoxy group, R2 and R3 independently represent a lower alkyl group) or a mixture thereof, with the general formula R4CH=CHSiR1R2R3 A method for producing a vinylsilane compound represented by (wherein R1, R2, R3, and R4 are the same as defined above).
3)2(SiR1R2R3) (式中、R1は低級アル
キル基又は低級アルコキシ基を示し、R2及びR3は独
立に低級アルキル基を示す)で示される新規ルテニウム
シリル錯体。Claim 2: The following formula: RuCl(CO)(PPh
3) A novel ruthenium silyl complex represented by 2(SiR1R2R3) (wherein R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group).
3で示されるビニルシラン化合物(式中、R1は低級ア
ルキル基又は低級アルコキシ基を示し、R2及びR3は
独立に低級アルキル基を示す)と、Ru(Cl)(CO
)H(PPh3)3を反応させることを特徴とする、R
uCl(CO)(PPh3)2(SiR1R2R3)
(式中、R1、R2、及びR3は前記の通りである)の
製造方法。[Claim 3] General formula CH2=CHSiR1R2R
3 (in the formula, R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group) and Ru(Cl)(CO
)H(PPh3)3, R
uCl(CO)(PPh3)2(SiR1R2R3)
(wherein R1, R2, and R3 are as described above).
SiR1R2R3) (式中、R1は低級アルキル基又
は低級アルコキシ基を示し、R2及びR3は独立に低級
アルキル基を示す)で示されるルテニウムシリル錯体と
一般式 CH2=CHR4で示される一置換オレフィン
化合物(式中、R4は低級アルキル基、低級アルコキシ
基、低級アルコキシカルボニル基、アリール基、または
SiR5R6R7(式中、R5は低級アルキル基、低級
アルコキシ基を示し、R6及びR7は独立に低級アルキ
ル基である)を示す)を反応させることを特徴とする、
R4CH=CHSiR1R2R3(式中、R1、R2、
R3、及びR4は前記の通りである)の製造方法。4. Formula RuCl(CO)(PPh3)2(
SiR1R2R3) (wherein, R1 represents a lower alkyl group or a lower alkoxy group, and R2 and R3 independently represent a lower alkyl group) and a monosubstituted olefin compound represented by the general formula CH2=CHR4 ( In the formula, R4 is a lower alkyl group, a lower alkoxy group, a lower alkoxycarbonyl group, an aryl group, or a SiR5R6R7 (wherein, R5 represents a lower alkyl group or a lower alkoxy group, and R6 and R7 are independently lower alkyl groups. ),
R4CH=CHSiR1R2R3 (wherein, R1, R2,
R3 and R4 are as described above).
を含むシリル化剤。5. A silylating agent comprising the ruthenium silyl complex according to claim 2.
の請求項5記載のシリル化剤。6. The silylating agent according to claim 5 for silylating monosubstituted olefins.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3046837A JPH04283589A (en) | 1991-03-12 | 1991-03-12 | Production of vinyl silane compounds |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3046837A JPH04283589A (en) | 1991-03-12 | 1991-03-12 | Production of vinyl silane compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04283589A true JPH04283589A (en) | 1992-10-08 |
Family
ID=12758453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3046837A Pending JPH04283589A (en) | 1991-03-12 | 1991-03-12 | Production of vinyl silane compounds |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04283589A (en) |
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