JPH04281401A - Multilayer antireflection film - Google Patents
Multilayer antireflection filmInfo
- Publication number
- JPH04281401A JPH04281401A JP3069035A JP6903591A JPH04281401A JP H04281401 A JPH04281401 A JP H04281401A JP 3069035 A JP3069035 A JP 3069035A JP 6903591 A JP6903591 A JP 6903591A JP H04281401 A JPH04281401 A JP H04281401A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- antireflection film
- zro2
- multilayer antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 36
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 14
- 238000007733 ion plating Methods 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 9
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 abstract description 11
- 239000000645 desinfectant Substances 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 4
- 239000005304 optical glass Substances 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract 2
- -1 Ta2O2 Chemical compound 0.000 abstract 1
- 239000003599 detergent Substances 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000012528 membrane Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 230000000249 desinfective effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 229910004446 Ta2 O5 Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910004160 TaO2 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- NQKXFODBPINZFK-UHFFFAOYSA-N dioxotantalum Chemical compound O=[Ta]=O NQKXFODBPINZFK-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000028327 secretion Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Endoscopes (AREA)
- Instruments For Viewing The Inside Of Hollow Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、洗浄液，消毒液に対し
て耐久性を有する多層反射防止膜に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer antireflection coating that is resistant to cleaning and disinfecting solutions.
【０００２】0002
【従来の技術】近年、化学部品は様々な分野において使
用されるようになってきている。その中でも医療機器に
用いられるレンズ，プリズム等は、医療機器に必要とさ
れる各種の洗浄液，消毒液にさらされても最低限の化学
性能を維持することが要求される。特に、医療用内視鏡
は、生体器官等からの分泌物などがレンズ表面に付着す
るために頻繁に洗浄をする必要がある。2. Description of the Related Art In recent years, chemical parts have come to be used in various fields. Among them, lenses, prisms, etc. used in medical devices are required to maintain a minimum level of chemical performance even when exposed to various cleaning solutions and disinfectants required for medical devices. In particular, medical endoscopes require frequent cleaning because secretions from biological organs and the like adhere to the lens surface.
【０００３】通常使用される洗浄液，消毒液は、酸性か
らアルカリ性までの幅広い薬品で構成されている。この
ために、従来、内視鏡の先端部等の直接洗浄液にさらさ
れる部分のレンズには、化学的に安定したガラス硝材を
用いるのが一般的であった。そして、通常の反射防止膜
は、例えば特公昭５４−３８９０４号公報に開示される
ように、空気と接する最表層をＭｇＦ２ やＳｉＯ２に
より形成するが、医療機器に用いられるレンズ等では、
ＭｇＦ２ は膜の密度が低いこと、ＳｉＯ２ はアルカ
リ性に弱いことから、洗浄液，消毒液に侵されて膜がは
げ落ちるために、反射防止膜は施されていなかった。[0003] Commonly used cleaning solutions and disinfectants are composed of a wide range of chemicals ranging from acidic to alkaline chemicals. For this reason, it has conventionally been common to use a chemically stable glass material for lenses in portions directly exposed to the cleaning liquid, such as the distal end of the endoscope. In a normal antireflection film, the outermost layer in contact with air is formed of MgF2 or SiO2, as disclosed in Japanese Patent Publication No. 54-38904, for example, but in lenses used in medical equipment, etc.
Since MgF2 has a low film density and SiO2 is sensitive to alkalinity, the film would peel off when attacked by cleaning and disinfecting solutions, so no antireflection film was applied.
【０００４】0004
【発明が解決しようとする課題】ところが、少しでも光
学系を細くして小型化を図りたい内視鏡においては、反
射防止膜をレンズに施すことができれば透過光量を増や
すことが可能になり、設計上大いに有利に働く。しかし
、従来は、上述のように内視鏡レンズの先端部分には反
射防止膜が施されておらず、光学性能上や機能上からの
問題があった。[Problem to be solved by the invention] However, in endoscopes where it is desired to make the optical system as thin as possible to make it more compact, if an anti-reflection film can be applied to the lens, it is possible to increase the amount of transmitted light. This is a great advantage in terms of design. However, conventionally, as described above, the end portion of the endoscope lens was not coated with an antireflection film, which caused problems in terms of optical performance and functionality.
【０００５】本発明は、かかる従来の問題点に鑑みてな
されたもので、医療用機器、特に内視鏡に用いられる光
学ガラスレンズに適用でき、洗浄液，消毒液に対して耐
久性を有する多層反射防止膜を提供することを目的とす
る。The present invention has been made in view of the above conventional problems, and is a multilayer film that can be applied to optical glass lenses used in medical equipment, particularly endoscopes, and has durability against cleaning solutions and disinfectants. The purpose is to provide an anti-reflection film.
【０００６】[0006]
【課題を解決するための手段】空気と接する最表層をＭ
ｇＦ２ やＳｉＯ２ に形成した一般的な多層反射防止
膜が、洗浄液，消毒液に侵されて膜が剥離する現象は、
膜と膜との界面またはガラス基板表面と膜との界面に起
因していることが研究の結果判明した。そして、この現
象は、ポーラス（密度が低い）な膜の場合に、洗浄液で
ある酸，アルカリ溶液が膜中を浸透して、膜界面の不純
物を溶融するため、またガラスの主成分である酸化珪素
と反応してガラス基板表面と膜との界面でガラスが溶融
するために生じていることがわかった。このことは、同
じ条件で同じ膜を酸化珪素の含有率の異なるガラス基板
に成膜して比較したところ、明らかに酸化珪素の含有率
の少ないガラス硝材ほど薬品に対する耐久性が高いこと
がわかった。また、化学的に安定している蒸着材料でも
膜密度が低い物ほど耐久性が低いことが実験の結果確か
められた。[Means for solving the problem] The outermost layer in contact with air is M
The phenomenon in which a general multilayer antireflection film formed on gF2 or SiO2 peels off when it is attacked by a cleaning solution or disinfectant is as follows.
Research has revealed that this is caused by the interface between the films or the interface between the glass substrate surface and the film. This phenomenon occurs because when the membrane is porous (low density), the acid or alkaline cleaning solution permeates through the membrane and melts impurities at the membrane interface. It was found that this occurs because the glass reacts with silicon and melts at the interface between the glass substrate surface and the film. This was confirmed by comparing the same film formed on glass substrates with different silicon oxide contents under the same conditions, and it was found that glass materials with a lower silicon oxide content clearly had higher durability against chemicals. . Experiments have also confirmed that even chemically stable vapor deposition materials have lower durability as the film density decreases.
【０００７】そこで、上記目的を達成するために、本発
明は、多層反射防止膜において、空気と接する最表層を
イオンプレーティング法でＺｒＯ２ ，Ｔａ２ Ｏ５
，ＴｉＯ２ またはこれらの混合物により形成した。In order to achieve the above object, the present invention provides a multilayer antireflection film in which the outermost layer in contact with air is coated with ZrO2, Ta2O5, etc. by ion plating.
, TiO2 or a mixture thereof.
【０００８】また、本発明は、基板の表面に設けられる
５層構造の多層反射防止膜において、基板側から数えて
第１層、第３層および第５層をイオンプレーティング法
でＺｒＯ２ ，Ｔａ２ Ｏ５ ，ＴｉＯ２またはこれら
の混合物により形成するとともに、第２層および第４層
をＭｇＦ２ により形成した。The present invention also provides a multilayer anti-reflection film with a five-layer structure provided on the surface of a substrate, in which the first, third and fifth layers counted from the substrate are coated with ZrO2, Ta2, etc. by ion plating. O5, TiO2, or a mixture thereof, and the second and fourth layers were formed of MgF2.
【０００９】[0009]
【作用】すなわち、空気と接する最表層に化学的に安定
で、充填率（膜の密度）の高い膜材料、充填率を高めら
れる手法を用いることにした。そのために、空気と接す
る最表層には、化学的に安定しているＺｒＯ２ ，Ｔａ
２ Ｏ５ ，ＴａＯ２ またはこれらの混合物を用い、
充填率を高められる蒸着手法であるイオンプレーティン
グ法を使って成膜することで、洗浄液，消毒液が膜表面
からその下の膜やさらにはガラス基板に浸透するのを防
ぐことができる。[Operation] In other words, we decided to use a membrane material that is chemically stable and has a high filling rate (membrane density) and a method that can increase the filling rate for the outermost layer in contact with air. Therefore, the outermost layer in contact with air contains chemically stable ZrO2 and Ta.
Using 2O5, TaO2 or a mixture thereof,
By forming the film using ion plating, a vapor deposition method that can increase the filling rate, it is possible to prevent cleaning and disinfectant solutions from penetrating from the film surface into the underlying film and glass substrate.
【００１０】また、可視光の広い波長領域で反射防止効
果を得るうえで、高屈折率材料（ＺｒＯ２ ，Ｔａ２
Ｏ５ ，ＴｉＯ２）と低屈折率材料（ＭｇＦ２ ，Ｓｉ
Ｏ２ ）からなる５層構造の多層反射防止膜が必要とな
る。[0010] Furthermore, in order to obtain an antireflection effect in a wide wavelength range of visible light, high refractive index materials (ZrO2, Ta2
O5, TiO2) and low refractive index materials (MgF2, Si
A multilayer anti-reflection coating with a five-layer structure consisting of O2) is required.
【００１１】[0011]
【実施例１】ＢＫ７ガラス基板をイオンプレーティング
装置にセットし、基板温度を２５０℃に設定して排気を
始めた。真空度が１×１０−５Ｔｏｒｒに到達したとこ
ろで、Ｏ２ ガスを装置内に導入して１×１０−４Ｔｏ
ｒｒに設定した。そして、高周波出力を３００Ｗに設定
し、Ｏ２ プラズマを発生させ、第１層としてＺｒＯ２
層を電子銃を使って表１に示す膜圧となるまで蒸着を
行った。次に、第２層の成膜は、Ｏ２ ガスの導入を止
め、電子銃を使った通常の真空蒸着でＭｇＦ２ 層を表
１に示す膜厚となるまで蒸着を行った。以下、同様の手
段により、表１に示す膜厚となるまで第３層のＺｒＯ２
層、第４層のＭｇＦ２ 層および第５層のＺｒＯ２
層をそれぞれ蒸着した。[Example 1] A BK7 glass substrate was set in an ion plating apparatus, the substrate temperature was set at 250° C., and evacuation was started. When the degree of vacuum reaches 1 x 10-5 Torr, O2 gas is introduced into the device to increase the vacuum level to 1 x 10-4 Torr.
It was set to rr. Then, the high frequency output was set to 300W, O2 plasma was generated, and ZrO2 was formed as the first layer.
The layers were deposited using an electron gun until the film thicknesses shown in Table 1 were achieved. Next, in forming the second layer, the introduction of O2 gas was stopped, and a MgF2 layer was deposited by ordinary vacuum deposition using an electron gun until the film thickness shown in Table 1 was obtained. Thereafter, by the same means, the third layer of ZrO2 was
layer, fourth layer MgF2 layer and fifth layer ZrO2
The layers were individually deposited.
【００１２】0012
【表１】[Table 1]
【００１３】このようにして成膜した本実施例の多層反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の多層反射防止膜は
、５種類の洗浄液に対して全く変化が見られなかった。Table 2 shows the results of immersing the multilayer antireflection film of this example formed in this manner in five types of cleaning solutions. As can be seen from Table 2, the multilayer antireflection film of this example showed no change at all with respect to the five types of cleaning solutions.
【００１４】[0014]
【表２】[Table 2]
【００１５】また、本実施例の多層反射防止膜の反射率
特性を図１に示した。図１は縦軸に反射率を、横軸に波
長をそれぞれとったもので、本実施例の多層反射防止膜
は良好な反射率特性を有していた。Further, the reflectance characteristics of the multilayer antireflection film of this example are shown in FIG. FIG. 1 shows the reflectance on the vertical axis and the wavelength on the horizontal axis, and the multilayer antireflection film of this example had good reflectance characteristics.
【００１６】[0016]
【実施例２】ＢＫ７ガラス基板をイオンプレーティング
装置にセットし、基板温度を２５０℃に設定して排気を
始めた。真空度が１×１０−５Ｔｏｒｒに到達したとこ
ろで、Ｏ２ ガスを装置内に導入して１×１０−４Ｔｏ
ｒｒに設定した。そして、高周波出力を３００Ｗに設定
し、Ｏ２ プラズマを発生させ、第１層としてＴａ２
Ｏ５ 層を電子銃を使って表１に示す膜厚となるまで蒸
着を行った。
次に、第２層の成膜は、Ｏ２ ガスの導入を止め、電子
銃を使った通常の真空蒸着でＭｇＦ２ 層を表１に示す
膜厚となるまで蒸着を行った。以下、同様の手段により
、表１に示す膜厚となるまで第３層のＴａ２ Ｏ５ 層
、第４層のＭｇＦ２ 層および第５層のＴａ２ Ｏ５
層をそれぞれ蒸着した。[Example 2] A BK7 glass substrate was set in an ion plating apparatus, the substrate temperature was set at 250° C., and evacuation was started. When the degree of vacuum reaches 1 x 10-5 Torr, O2 gas is introduced into the device to increase the vacuum level to 1 x 10-4 Torr.
It was set to rr. Then, the high frequency output was set to 300W, O2 plasma was generated, and Ta2 was used as the first layer.
An O5 layer was deposited using an electron gun until the film thickness was as shown in Table 1. Next, in forming the second layer, the introduction of O2 gas was stopped, and a MgF2 layer was deposited by ordinary vacuum deposition using an electron gun until the film thickness shown in Table 1 was obtained. Thereafter, by similar means, the third Ta2O5 layer, the fourth MgF2 layer, and the fifth Ta2O5 layer were formed until the film thicknesses shown in Table 1 were obtained.
The layers were individually deposited.
【００１７】このようにして成膜した本実施例の多層反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の多層反射防止膜は
、５種類の洗浄液に対して全く変化が見られなかった。
また、本実施例の多層反射防止膜は、実施例１と同様に
して図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the thus formed multilayer antireflection film of this example in five types of cleaning solutions. As can be seen from Table 2, the multilayer antireflection film of this example showed no change at all with respect to the five types of cleaning solutions. Furthermore, the multilayer antireflection film of this example had good reflectance characteristics as shown in FIG. 1, similar to Example 1.
【００１８】[0018]
【実施例３】ＢＫ７ガラス基板をイオンプレーティング
装置にセットし、基板温度を２５０℃に設定して排気を
始めた。真空度が１×１０−５Ｔｏｒｒに到達したとこ
ろで、Ｏ２ ガスを装置内に導入して１×１０−４Ｔｏ
ｒｒに設定した。そして、高周波出力を３００Ｗに設定
し、Ｏ２ プラズマを発生させ、第１層として、ＺｒＯ
２ とＴａ２ Ｏ５ との混合層を、ＺｒＯ２ とＴａ
２ Ｏ５ の重量比を８：２として混合した材料を電子
銃を使って前記表１に示す膜厚となるまで蒸着を行った
。次に、第２層の成膜は、Ｏ２ ガスの導入を止め、電
子銃を使った通常の真空蒸着でＭｇＦ２ 層を表１に示
す膜厚となるまで蒸着を行った。以下、同様の手段によ
り、表１に示す膜厚となるまで第３層のＺｒＯ２ とＴ
ａ２ Ｏ５ との混合層、第４層のＭｇＦ２ 層および
第５層のＺｒＯ２ とＴａ２ Ｏ５ との混合層をそれ
ぞれ蒸着した。[Example 3] A BK7 glass substrate was set in an ion plating apparatus, the substrate temperature was set at 250° C., and evacuation was started. When the degree of vacuum reaches 1 x 10-5 Torr, O2 gas is introduced into the device to increase the vacuum level to 1 x 10-4 Torr.
It was set to rr. Then, the high frequency output was set to 300W, O2 plasma was generated, and ZrO was formed as the first layer.
2 and Ta2O5, ZrO2 and Ta
A material prepared by mixing 2O5 at a weight ratio of 8:2 was deposited using an electron gun until the film thickness shown in Table 1 was obtained. Next, in forming the second layer, the introduction of O2 gas was stopped, and a MgF2 layer was deposited by ordinary vacuum deposition using an electron gun until the film thickness shown in Table 1 was obtained. Thereafter, using the same method, the third layer ZrO2 and T
A mixed layer of a2 O5, a fourth layer of MgF2, and a fifth layer of a mixed layer of ZrO2 and Ta2 O5 were deposited.
【００１９】このようにして成膜した本実施例の多層反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の多層反射防止膜は
、５種類の洗浄液に対して全く変化が見られなかった。
また、本実施例の多層反射防止膜は、実施例１と同様に
して図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the multilayer antireflection film of this example formed in this manner in five types of cleaning solutions. As can be seen from Table 2, the multilayer antireflection film of this example showed no change at all with respect to the five types of cleaning solutions. Furthermore, the multilayer antireflection film of this example had good reflectance characteristics as shown in FIG. 1, similar to Example 1.
【００２０】[0020]
【実施例４】ＢＫ７ガラス基板をイオンプレーティング
装置にセットし、基板温度を２５０℃に設定して排気を
始めた。真空度が１×１０−５Ｔｏｒｒに到達したとこ
ろで、Ｏ２ ガスを装置内に導入して１×１０−４Ｔｏ
ｒｒに設定した。そして、高周波出力を３００Ｗに設定
し、Ｏ２ プラズマを発生させ、第１層として、ＺｒＯ
２ とＴｉＯ２ との混合層を、ＺｒＯ２ とＴｉＯ２
の重量比を９：１として混合した材料を電子銃を使っ
て前記表１に示す膜厚となるまで蒸着を行った。次に、
第２層の成膜は、Ｏ２ ガスの導入を止め、電子銃を使
った通常の真空蒸着でＭｇＦ２ 層を表１に示す膜厚と
なるまで蒸着を行った。以下、同様の手段により、表１
に示す膜厚となるまで第３層のＺｒＯ２ とＴｉＯ２
との混合層、第４層のＭｇＦ２ 層および第５層のＺｒ
Ｏ２ とＴｉＯ２ との混合層をそれぞれ蒸着した。[Example 4] A BK7 glass substrate was set in an ion plating apparatus, the substrate temperature was set at 250° C., and evacuation was started. When the degree of vacuum reaches 1 x 10-5 Torr, O2 gas is introduced into the device to increase the vacuum level to 1 x 10-4 Torr.
It was set to rr. Then, the high frequency output was set to 300W, O2 plasma was generated, and ZrO was formed as the first layer.
2 and TiO2, ZrO2 and TiO2
A mixture of materials with a weight ratio of 9:1 was deposited using an electron gun until the film thickness shown in Table 1 was obtained. next,
To form the second layer, the introduction of O2 gas was stopped, and a MgF2 layer was deposited by ordinary vacuum deposition using an electron gun until the thickness shown in Table 1 was obtained. Hereinafter, by the same means, Table 1
The third layer of ZrO2 and TiO2 is
mixed layer with MgF2 layer as the fourth layer and Zr layer as the fifth layer.
A mixed layer of O2 and TiO2 was deposited, respectively.
【００２１】このようにして成膜した本実施例の多層反
射防止膜を５種類の洗浄液に浸漬した結果を表２に示し
た。表２から判るように、本実施例の多層反射防止膜は
、５種類の洗浄液に対して全く変化が見られなかった。
また、本実施例の多層反射防止膜は、実施例１と同様に
して図１に示すような良好な反射率特性を有していた。Table 2 shows the results of immersing the multilayer antireflection film of this example formed in this manner in five types of cleaning solutions. As can be seen from Table 2, the multilayer antireflection film of this example showed no change at all with respect to the five types of cleaning solutions. Furthermore, the multilayer antireflection film of this example had good reflectance characteristics as shown in FIG. 1, similar to Example 1.
【００２２】なお、上記各実施例では第１層，第３層お
よび第５層をそれぞれ同一材料にて形成したが、本発明
はかかる実施例に限定されるものではなく、ＺｒＯ２
，Ｔａ２ Ｏ５ ，ＴｉＯ２ またはこれらの混合物に
より形成されていれば、第１層，第３層または第５層の
材料が異なっていてもよい。[0022] In each of the above embodiments, the first layer, third layer and fifth layer were formed of the same material, but the present invention is not limited to such embodiments, and ZrO2
, Ta2O5, TiO2, or a mixture thereof, the first layer, third layer, or fifth layer may be made of different materials.
【００２３】[0023]
【発明の効果】以上のように、本発明の多層反射防止膜
によれば、洗浄液，消毒液に対して耐久性を有し、膜剥
離を生じることがない。したがって、内視鏡先端レンズ
に反射防止膜を施すことができ、内視鏡画面のコントラ
スト向上、透過光量増加による光学系の精細化による内
視鏡本体の外径の縮小化に大きな効果をもたらす。As described above, the multilayer antireflection film of the present invention has durability against cleaning liquids and disinfecting liquids, and does not cause peeling of the film. Therefore, it is possible to apply an anti-reflection coating to the endoscope tip lens, which has a great effect on improving the contrast of the endoscope screen and reducing the outer diameter of the endoscope body by increasing the amount of transmitted light and making the optical system more precise. .
【図１】本発明の実施例１〜３の多層反射防止膜の反射
率特性を示すグラフである。FIG. 1 is a graph showing reflectance characteristics of multilayer antireflection films of Examples 1 to 3 of the present invention.
Claims (2)
ィング法でＺｒＯ２ ，Ｔａ２ Ｏ５ ，ＴｉＯ２ ま
たはこれらの混合物により形成したことを特徴とする多
層反射防止膜。1. A multilayer antireflection film characterized in that the outermost layer in contact with air is formed of ZrO2, Ta2O5, TiO2, or a mixture thereof by an ion plating method.
であり、基板側から数えて第１層，第３層および第５層
をイオンプレーティング法でＺｒＯ２ ，Ｔａ２ Ｏ５
，ＴｉＯ２ またはこれらの混合物により形成すると
ともに、第２層および第４層をＭｇＦ２ により形成し
たことを特徴とする多層反射防止膜。2. A film with a five-layer structure provided on the surface of a substrate, in which the first, third, and fifth layers counting from the substrate side are formed using ZrO2, Ta2O5, and ZrO2 by ion plating.
, TiO2 or a mixture thereof, and the second layer and the fourth layer are formed of MgF2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3069035A JPH04281401A (en) | 1991-03-08 | 1991-03-08 | Multilayer antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3069035A JPH04281401A (en) | 1991-03-08 | 1991-03-08 | Multilayer antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04281401A true JPH04281401A (en) | 1992-10-07 |
Family
ID=13390926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3069035A Withdrawn JPH04281401A (en) | 1991-03-08 | 1991-03-08 | Multilayer antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04281401A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5760853A (en) * | 1994-08-31 | 1998-06-02 | Sharp, Kabushiki Kaisha | Liquid crystal light valve with dielectric mirror containing semiconductor oxide, ferroelectric material or conductive material |
| CN107703567A (en) * | 2017-11-06 | 2018-02-16 | 广东弘景光电科技股份有限公司 | High rigidity antireflective plated film lens |
-
1991
- 1991-03-08 JP JP3069035A patent/JPH04281401A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5760853A (en) * | 1994-08-31 | 1998-06-02 | Sharp, Kabushiki Kaisha | Liquid crystal light valve with dielectric mirror containing semiconductor oxide, ferroelectric material or conductive material |
| CN107703567A (en) * | 2017-11-06 | 2018-02-16 | 广东弘景光电科技股份有限公司 | High rigidity antireflective plated film lens |
| CN107703567B (en) * | 2017-11-06 | 2024-05-03 | 广东弘景光电科技股份有限公司 | High-hardness antireflection coated lens |
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| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
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