JPH0428096A - Non-volatile semiconductor memory device - Google Patents

Non-volatile semiconductor memory device

Info

Publication number
JPH0428096A
JPH0428096A JP2133031A JP13303190A JPH0428096A JP H0428096 A JPH0428096 A JP H0428096A JP 2133031 A JP2133031 A JP 2133031A JP 13303190 A JP13303190 A JP 13303190A JP H0428096 A JPH0428096 A JP H0428096A
Authority
JP
Japan
Prior art keywords
sense amplifier
bit line
point
discrimination level
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2133031A
Other languages
Japanese (ja)
Other versions
JP2668150B2 (en
Inventor
Isao Nojiri
勲 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13303190A priority Critical patent/JP2668150B2/en
Publication of JPH0428096A publication Critical patent/JPH0428096A/en
Application granted granted Critical
Publication of JP2668150B2 publication Critical patent/JP2668150B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To increase the operation speed in any access method by equalizing a bit line and a reference line at the time of the stand-by state and setting them to a voltage approximately equal to the middle between the '0' discrimination level and the '1' discrimination level of a sense amplifier. CONSTITUTION:Q13 to Q15... are N-channel transistors in the circuit diagram of a differential sense amplifying circuit and its attached circuit, and a threshold VTH is used to reduce the supply voltage to an about middle between the '0' discrimination level and the '1' discrimination level of the sense amplifier. N-channel TRs Q11 and Q12 have gates connected to a chip enable signal Ce and have drains connected to point G and have sources connected to points A and F respectively. N-channel TRs Q11 and Q12 are made conductive to charge the bit line and the reference line to prescribed potentials at the time of the stand-by state (Ce='H'). Thus, the operation speed is increased in any access method.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は浮遊ゲート・トランジスタからなる不揮発性
半導体記憶装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a nonvolatile semiconductor memory device comprising a floating gate transistor.

〔従来の技術〕[Conventional technology]

第4図は従来の不揮発性半導体記憶装置の差動型センス
アンプ回路およびビット線デコーダ、メモリセル、比較
用メモリセルの接続を示す回路図で、図において、Ml
は制御ゲートがワード線W、 Lに接続されている浮遊
ゲート・トランジスタ、M2は同様に、制御ゲートがワ
ード線W、Lに接続されている比較用浮遊ゲート・トラ
ンジスタ、3は浮遊ゲート・トランジスタMlが複数個
並列接続された複数のビット線の内、1゛本のビット線
を選択するビット線デコーダ、1はビット線デコーダ3
と入力がB点で接続されたインバータ、Q3はインバー
タ1の出力がゲートに接続でれ、ドレイン・ソースがそ
れぞれ電源、B点に接続されたNチャネルトランジスタ
、Q2はゲート、ドレイン、ソースがそれぞれインバー
タ1の出力、D点、B点に接続されたNチャネルトラン
ジスタ、Qlはゲート。
FIG. 4 is a circuit diagram showing connections among a differential sense amplifier circuit, a bit line decoder, a memory cell, and a comparison memory cell of a conventional nonvolatile semiconductor memory device.
is a floating gate transistor whose control gate is connected to word lines W, L; M2 is a comparison floating gate transistor whose control gate is also connected to word lines W, L; 3 is a floating gate transistor. A bit line decoder that selects one bit line from among a plurality of bit lines in which a plurality of Ml are connected in parallel; 1 is a bit line decoder 3;
and an inverter whose input is connected to point B, Q3 has the output of inverter 1 connected to its gate, and its drain and source are the power supply, respectively. An N-channel transistor is connected to point B, and Q2 has its gate, drain, and source connected to each other. N-channel transistors connected to the output of inverter 1, points D and B, Ql is the gate.

ドレイン、ソースがそれぞれ、D点、D点、電源に接続
されたPチャネルトランジスタ、  Q9.QIOはゲ
ートが電源に接続されたNチャネルトランジスタ、2は
入力が0点で接続されたインバータ、Qlはインバータ
2の出力がゲートに接続され、ドレイン、ソースがそれ
ぞれ電源、0点に接続でれたNチャネルトランジスタ、
 Q7はゲート、ドレイン、ソースがそれぞれインバー
タ2の出力、E点。
A P-channel transistor whose drain and source are connected to point D, point D, and power supply, respectively, Q9. QIO is an N-channel transistor whose gate is connected to the power supply, 2 is an inverter whose input is connected to the 0 point, and Ql is an inverter whose output is connected to the gate, and whose drain and source are connected to the power supply and 0 point, respectively. N-channel transistor,
The gate, drain, and source of Q7 are the outputs of inverter 2, respectively, and point E.

0点に接続されたNチャネルトランジスタ、 Qgはゲ
ート、ドレイン、ソースがそれぞれE点、E点、電源に
接続されたPチャネルトランジスタである。
Qg is an N-channel transistor connected to point 0, and Qg is a P-channel transistor whose gate, drain, and source are connected to point E, point E, and the power supply, respectively.

次に動作について説明する。まず、浮遊ゲートトランジ
スタで構成されるメモリトランジスタM1は、その記憶
情報により浮遊ゲートに電荷が蓄積され、ワード線W、
Lが選択されても導通状態とはならない閾値電圧の高い
状態と、浮遊ゲートに蓄積された電荷が紫外線で消失せ
しめられ、ワード線W、Lが選択されると導通状態とな
る閾値電圧の低い状態という2通りの状態を持つ。複数
のメモリトランジスタMx、Mzの接続式れているビッ
ト線はビット線デコーダ3において、al 、 a2と
いう選択信号によりNチャネルトランジスタQ4 e 
QR2>f導通状態になることにより選択される、ざら
にワード線WLによりメモリトランジスタMlが選択さ
れると、ビット線の電位はインバータ1とNチャネルト
ランジスタロ3により構成される帰還型バイアス回路に
より、メモリトランジスタM1が導通状態か否かで所定
の振幅を持つ。この電圧振幅はビット線選択デコーダ3
を介してB点に現れ、Nチャネルトランジスタロ2はB
点電位が所定の電圧より高ければ非導通状態、低ければ
導通状態となる。
Next, the operation will be explained. First, in the memory transistor M1, which is a floating gate transistor, charge is accumulated in the floating gate due to the stored information, and the word line W,
A state with a high threshold voltage that does not become conductive even if L is selected, and a state with a low threshold voltage that causes the charge accumulated in the floating gate to be dissipated by ultraviolet rays and becomes conductive when word lines W and L are selected. It has two types of states. A bit line connected to a plurality of memory transistors Mx and Mz is connected to an N-channel transistor Q4 e by selection signals al and a2 in the bit line decoder 3.
When the memory transistor Ml is selected by the word line WL, which is selected when QR2>f becomes conductive, the potential of the bit line is changed by a feedback bias circuit composed of an inverter 1 and an N-channel transistor RO 3. , has a predetermined amplitude depending on whether the memory transistor M1 is in a conductive state or not. This voltage amplitude is determined by the bit line selection decoder 3.
appears at point B via
If the point potential is higher than a predetermined voltage, it is in a non-conducting state, and if it is lower, it is in a conducting state.

QRが非導通状態であれば、Pチャネルトランジスタロ
1により、D点には(電源レベル)−(Qlのしきい値
電圧)レベルが現れる。またQRが導通状態であれば、
Pチャネルトランジスタロ1の導通抵抗とQR、Q4 
、 QIS 、 M1全体の導通抵抗の比で分割された
電位が現れる。一方、比較用浮遊ゲートトランジスタM
z、NチャネルトランジスタQ7.Qg、Qg。
If QR is in a non-conductive state, a level of (power supply level) - (threshold voltage of Ql) appears at point D due to the P-channel transistor RO1. Also, if QR is conductive,
Conduction resistance of P-channel transistor Ro1 and QR, Q4
, QIS , a potential appears divided by the ratio of conduction resistances across M1. On the other hand, floating gate transistor M for comparison
z, N-channel transistor Q7. Qg, Qg.

Qlo、PチャネルトランジスタQ6、インバータ2も
同様の構成をとっており、 M2は導通状態の浮遊ゲー
トトランジスタで、E点にはQg 1 Q71 Qe 
* QIO、M2の導通抵抗の比で分割された電位が現
れる。
Qlo, P-channel transistor Q6, and inverter 2 have similar configurations, M2 is a floating gate transistor in a conductive state, and Qg 1 Q71 Qe at point E.
* A potential divided by the ratio of conduction resistance of QIO and M2 appears.

この電位が差動型センスアンプの基準電圧として人力さ
れる。すなわち、E点とD点のレベルを比較し、E点と
D点のわずかな電位差を大きく増幅して出力するや 〔発明が解決しようとする課題〕 従来の不揮発性半導体記憶装置は以上のように構FfC
されていたので、高集積化に伴なうメモリセルサイズの
縮少によりメモリセル電流が低下するため、ビット線を
充電させるNチャネルトランジスタロ3の充電能力も低
くせねばならず、このためビット線をGNDレベルから
所定の電位まで充電する時間が長くなり、高速化の妨げ
となるという問題点があった。
This potential is manually applied as a reference voltage for the differential sense amplifier. In other words, the levels at point E and point D are compared, and the slight potential difference between point E and point D is greatly amplified and output. NI structure FfC
However, as the memory cell size decreases due to higher integration, the memory cell current decreases, and the charging capacity of the N-channel transistor 3 that charges the bit line must also be lowered. There is a problem in that it takes a long time to charge the line from the GND level to a predetermined potential, which hinders speeding up.

この発明は上記のような問題点を解消するためになされ
たもので、メモリセルが縮少しても高速な不揮発性半導
体記憶装置を得ることを目的とする。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain a high-speed nonvolatile semiconductor memory device even if the memory cells are reduced.

〔課!aを解決するための手段〕[Division! Means to solve a]

この発明に係る不揮発性半導体記憶装置は、浮遊ゲート
トランジスタからなるメモリアレイのビア)線と、比較
用浮遊ゲートトランジスタラ持つリファレンスラインを
有する差動型センスアンプ回路において、 ビットラインおよびリファレンスラ’(7fスI’ンバ
イ時にイコライズし、かつ、センスアンプの1φ′判定
レベル111判定レベルの中間程度の電圧にするもので
ある。
A non-volatile semiconductor memory device according to the present invention includes a differential sense amplifier circuit having a via line of a memory array consisting of floating gate transistors and a reference line having a floating gate transistor line for comparison. The voltage is equalized at the time of 7f switch I' and is set to a voltage approximately intermediate between the 1φ' judgment level 111 judgment level of the sense amplifier.

〔作用〕[Effect]

この発明における差動型センスアンプは、スタンバイ時
にピントラインとリファレンスラインをイコライズし、
かつセンスアンプの1φ′判定レベルと′1′判定レベ
ルの中間程度の電圧にすることにより、ビットラインお
よびリファレンスラインの充電時間が殆んど無視でき、
どんなアクセス方法においても高速化できる。
The differential sense amplifier in this invention equalizes the focus line and reference line during standby,
In addition, by setting the voltage to be approximately between the 1φ' judgment level and the '1' judgment level of the sense amplifier, the charging time of the bit line and reference line can be almost ignored.
Any access method can be speeded up.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の一実施例を図について説明する。第1
図はこの発明の一実施例である差動型センスアンプ回路
とその付属回路の回路図を示し、前記従来のものと同一
符号は同一 または相当部分を示す。図において% Q
ts # Ql’ * QIllg・・・はNチャネル
トランジスタで、しきい値VTRを利用して。
An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure shows a circuit diagram of a differential sense amplifier circuit and its auxiliary circuits which are an embodiment of the present invention, and the same reference numerals as those in the conventional circuit designate the same or corresponding parts. In the figure %Q
ts # Ql' * QIllg... is an N-channel transistor, using a threshold voltage VTR.

電源電子をセンスアンプの“φ”牛定レベルと“1”判
定レベルの中間程度にまで降圧させるものである。Ql
l、Ql2はNチャネルトランジスタで、ゲートにはチ
ップ・イネーブル(o8)信号、ドレインは0点、ソー
スはそれぞれA点とF点に接続されている。こうして、
スタンバイ(Oe==’E’)時に、Nチャネルトラン
ジスタQll、Quが導通し、ビット線およびリファレ
ンスラインを所定の電位まで充電する。この状態を第2
図のタイミングチャートに示す。
This step lowers the voltage of the power supply electronics to an intermediate level between the "φ" constant level of the sense amplifier and the "1" determination level. Ql
1 and Ql2 are N-channel transistors whose gates are connected to a chip enable (o8) signal, whose drains are connected to point 0, and whose sources are connected to points A and F, respectively. thus,
During standby (Oe=='E'), N-channel transistors Qll and Qu conduct, charging the bit line and reference line to a predetermined potential. This state is the second
This is shown in the timing chart in the figure.

第3図はこの発明の他の実施例を示す回路図で図におい
て、4はリファレンス電圧発生回路でこのリファレンス
電圧発生回路4はスタンバイ時に活性化でれ、Nチャネ
ルトランジスタQll、Ql2のゲートへ接続でれてい
る。スタンバイ時ニ、リファレンス電圧である(センス
アンプの“φ”判定レベルと“1”判定レベルの中間程
度の電圧)+(NチャネルトランジスタQll、Ql2
のしきい値電圧)をQll 、 Ql2のゲートへ印加
することにより、ビット線へ所定の電位を与える。
FIG. 3 is a circuit diagram showing another embodiment of the present invention. In the figure, 4 is a reference voltage generating circuit. This reference voltage generating circuit 4 is activated during standby and is connected to the gates of N-channel transistors Qll and Ql2. It's visible. During standby, the reference voltage (a voltage approximately halfway between the sense amplifier's "φ" judgment level and "1" judgment level) + (N-channel transistors Qll, Ql2)
A predetermined potential is applied to the bit line by applying a threshold voltage of Qll and Ql2 to the gates of Qll and Ql2.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、スタンバイ時に、ビッ
トラインおよびリファレンスラインをイコライズし、か
つセンスアンプの“φ”判定レベルと′″11判定レベ
ルの中間程度にすることにより、いかなるアクセス法に
おいても高速となる。
As described above, according to the present invention, the bit line and the reference line are equalized during standby, and are set to an intermediate level between the "φ" judgment level and the ``11 judgment level of the sense amplifier, so that any access method can be used. It becomes faster.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例である差動型センスアンプ
回路およびその付属回路の回路図、第2図は第1図の回
路の動作を示すフローチャート図第3図はこの発明の他
の実施例を示す差動型センスアンプ回路およびその付属
回路の回路図、第4図は従来の不揮発性半導体装置の差
動型センスアンプ回路およびビット線デコーダ、メモリ
セル、比較用メモリセルの接続を示す回路図である。 図において、11)、(2)はインバータ、Ql 、 
QaはPチャネルトランジスタ、 Q2〜Q17はNチ
ャネルトランジスタ、Mlは浮遊ゲートトランジスタ(
メモリトランジスタ)、鱒は比較用浮遊ゲート・トラン
ジスタ、4はリファレンス回路を示す。 なお、図中、同一符号は同一 又は相当部分を示す。 第1図 封 1.2  インバータ Qr、Qa:P千−Fネ)レトランジスタQ2−On:
Nナイオルトクシシスタ Mt’:8Mゲートトランジスタ (メモリトランジスタ) /′IzJ乙較用浮遊ゲート)う、ジ′スタ第2図 第3図 ヱカ 第4図
FIG. 1 is a circuit diagram of a differential sense amplifier circuit and its auxiliary circuits which are one embodiment of the present invention, and FIG. 2 is a flow chart showing the operation of the circuit of FIG. 1. A circuit diagram of a differential sense amplifier circuit and its auxiliary circuits showing an embodiment. FIG. 4 shows the connections of the differential sense amplifier circuit, bit line decoder, memory cell, and comparison memory cell of a conventional nonvolatile semiconductor device. FIG. In the figure, 11) and (2) are inverters, Ql,
Qa is a P-channel transistor, Q2 to Q17 are N-channel transistors, and Ml is a floating gate transistor (
(memory transistor), square indicates a floating gate transistor for comparison, and 4 indicates a reference circuit. In addition, the same symbols in the figures indicate the same or equivalent parts. Figure 1 Enclosure 1.2 Inverter Qr, Qa: P10-F) Retransistor Q2-On:
N-type transistor Mt': 8M gate transistor (memory transistor) /'IzJ floating gate for comparison)

Claims (1)

【特許請求の範囲】[Claims]  浮遊ゲート・トランジスタからなるメモリアレイのビ
ットラインと、比較用浮遊ゲート・トランジスタを持つ
リフアレンスラインを有する差動型センスアンプ回路に
おいて、前記ビツトラインおよび前記リフアレンスライ
ンをスタンバイ時にイコライズし、かつセンスアンプの
“φ”判定レベルと“1”判定レベルの中間程度の電圧
にしたことを特徴とする不揮発性半導体記憶装置。
In a differential sense amplifier circuit having a bit line of a memory array consisting of floating gate transistors and a reference line having a floating gate transistor for comparison, the bit line and the reference line are equalized during standby, and the sense amplifier 1. A nonvolatile semiconductor memory device characterized in that the voltage is set to an intermediate voltage between a "φ" determination level and a "1" determination level.
JP13303190A 1990-05-23 1990-05-23 Nonvolatile semiconductor memory device Expired - Lifetime JP2668150B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13303190A JP2668150B2 (en) 1990-05-23 1990-05-23 Nonvolatile semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13303190A JP2668150B2 (en) 1990-05-23 1990-05-23 Nonvolatile semiconductor memory device

Publications (2)

Publication Number Publication Date
JPH0428096A true JPH0428096A (en) 1992-01-30
JP2668150B2 JP2668150B2 (en) 1997-10-27

Family

ID=15095191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13303190A Expired - Lifetime JP2668150B2 (en) 1990-05-23 1990-05-23 Nonvolatile semiconductor memory device

Country Status (1)

Country Link
JP (1) JP2668150B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08221996A (en) * 1995-02-17 1996-08-30 Nec Corp Semiconductor storage
EP1184873A1 (en) * 2000-08-16 2002-03-06 STMicroelectronics S.r.l. Direct-comparison reading circuit for a nonvolatile memory array
KR20220113671A (en) 2019-12-12 2022-08-16 미쓰비시 마테리알 가부시키가이샤 Dithiapolyetherdiol, its manufacturing method, SnAg plating solution containing dithiapolyetherdiol, and method for forming a plating film using SnAg plating solution

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204597A (en) * 1987-02-20 1988-08-24 Hitachi Ltd Semiconductor storage device
JPS643899A (en) * 1987-06-24 1989-01-09 Sharp Kk Nonvolatile semiconductor memory device
JPH01220295A (en) * 1988-02-29 1989-09-01 Nec Corp Semiconductor memory
JPH01251499A (en) * 1988-03-31 1989-10-06 Toshiba Corp Non-volatile semiconductor memory

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63204597A (en) * 1987-02-20 1988-08-24 Hitachi Ltd Semiconductor storage device
JPS643899A (en) * 1987-06-24 1989-01-09 Sharp Kk Nonvolatile semiconductor memory device
JPH01220295A (en) * 1988-02-29 1989-09-01 Nec Corp Semiconductor memory
JPH01251499A (en) * 1988-03-31 1989-10-06 Toshiba Corp Non-volatile semiconductor memory

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08221996A (en) * 1995-02-17 1996-08-30 Nec Corp Semiconductor storage
EP1184873A1 (en) * 2000-08-16 2002-03-06 STMicroelectronics S.r.l. Direct-comparison reading circuit for a nonvolatile memory array
US6462987B2 (en) 2000-08-16 2002-10-08 Stmicroelectronics S.R.L. Direct-comparison reading circuit for a nonvolatile memory array
KR20220113671A (en) 2019-12-12 2022-08-16 미쓰비시 마테리알 가부시키가이샤 Dithiapolyetherdiol, its manufacturing method, SnAg plating solution containing dithiapolyetherdiol, and method for forming a plating film using SnAg plating solution

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