JPH04279867A - Three-dimensional acceleration sensor - Google Patents
Three-dimensional acceleration sensorInfo
- Publication number
- JPH04279867A JPH04279867A JP3043417A JP4341791A JPH04279867A JP H04279867 A JPH04279867 A JP H04279867A JP 3043417 A JP3043417 A JP 3043417A JP 4341791 A JP4341791 A JP 4341791A JP H04279867 A JPH04279867 A JP H04279867A
- Authority
- JP
- Japan
- Prior art keywords
- acceleration
- chip
- acceleration sensor
- thin
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001133 acceleration Effects 0.000 title claims abstract description 65
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000009792 diffusion process Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 230000000703 anti-shock Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
Landscapes
- Pressure Sensors (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はX,Y軸およびZ軸方向
の加速度を独立して検出するのに好適な三次元加速度セ
ンサに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional acceleration sensor suitable for independently detecting acceleration in the X-, Y-, and Z-axis directions.
【0002】0002
【従来の技術】三次元加速度センサとして、例えば特開
昭62ー118260号公報に開示されたものがある。
この三次元加速度センサはシリコンワンチップ上に独立
した3つの加速度センサチップを各次元方向に感度を持
たせて配置されている。各加速度センサチップは中央厚
肉部と周辺厚肉部が1つの薄肉部によって連結された片
持構造になっており、この薄肉部の応力発生部位に設け
られた歪ゲージによって加速度を検出するように構成さ
れている。2. Description of the Related Art A three-dimensional acceleration sensor is disclosed, for example, in Japanese Patent Application Laid-open No. 118260/1983. This three-dimensional acceleration sensor has three independent acceleration sensor chips arranged on a single silicon chip with sensitivity in each dimension direction. Each acceleration sensor chip has a cantilevered structure in which a central thick wall part and a peripheral thick wall part are connected by a single thin wall part, and acceleration is detected by a strain gauge provided at the stress generating site of this thin wall part. It is composed of
【0003】0003
【発明が解決しようとする課題】同一平面上にX,Yお
よびZ軸方向の加速度センサを配置する場合、各軸方向
の加速度センサを同じ片持構造にすることは検出したく
ない方向の加速度にも感度を持つことになり、この加速
度により発生する歪み応力が検出したい方向の加速度成
分に影響を与えることも考えられる。また片持構造では
加速度センサチップ面に平行なX,Y方向の加速度に対
して耐衝撃強度で不利になる。本発明の目的は、検出方
向でない加速度に対して耐衝撃強度を持たせた複数の一
次元加速度センサをワンチップ上に配置することにより
三次元の加速度を独立して検出できるようにした三次元
加速度センサを提供することである。[Problem to be Solved by the Invention] When arranging acceleration sensors in the X, Y, and Z axis directions on the same plane, using the same cantilevered structure for the acceleration sensors in each axis direction causes acceleration in directions that are not desired to be detected. It is also possible that the strain stress generated by this acceleration will affect the acceleration component in the direction that is desired to be detected. Furthermore, the cantilevered structure is disadvantageous in terms of impact resistance against acceleration in the X and Y directions parallel to the acceleration sensor chip surface. An object of the present invention is to provide a three-dimensional acceleration sensor that is capable of independently detecting three-dimensional acceleration by arranging a plurality of one-dimensional acceleration sensors on one chip that have impact resistance against acceleration that is not in the detection direction. An object of the present invention is to provide an acceleration sensor.
【0004】0004
【課題を解決するための手段】上記の目的を達成するた
めに、本発明は周辺厚肉部と中央厚肉部との間に貫通部
を設け、該厚肉部間が薄肉部により連結されていると共
に、前記中央厚肉部の振動により歪み応力が発生する前
記薄肉部に拡散歪ゲージを配置した半導体加速度センサ
であって、前記中央厚肉部が対向する薄肉部により両持
構造で支持され、前記両薄肉部に加わるチップに平行な
横方向の振動のみに感度を有するXおよびY方向加速度
センサと、前記中央厚肉部が薄肉部により片持構造で支
持され、チップの垂直方向の振動のみに感度を有するZ
方向加速度センサとを同一チップ上に配置すると共に、
各センサの拡散歪ゲージにより一方向加速度を独立して
検出するブリッジ回路が構成されている。[Means for Solving the Problems] In order to achieve the above object, the present invention provides a through part between a peripheral thick part and a central thick part, and the thick parts are connected by a thin part. and a diffusion strain gauge is disposed in the thin wall portion where strain stress is generated due to vibration of the central thick wall portion, wherein the central thick wall portion is supported by the opposing thin wall portion in a dual support structure. The center thick part is supported by the thin part in a cantilevered structure, and the center thick part is supported by the thin part in a cantilevered structure, and Z sensitive only to vibrations
In addition to placing the directional acceleration sensor on the same chip,
A bridge circuit is configured to independently detect unidirectional acceleration using the diffusion strain gauge of each sensor.
【0005】[0005]
【作用】一次元方向の振動に対してのみ感度を持たせた
加速度センサが三次元の各方向に対して配置されている
ため、各センサはそれぞれの方向の加速度成分を検出し
、これらのセンサ出力を解析することにより三次元方向
の加速度の大きさが計測できる。[Operation] Acceleration sensors that are sensitive only to vibrations in one-dimensional direction are arranged in each three-dimensional direction, so each sensor detects acceleration components in each direction, and these sensors By analyzing the output, the magnitude of acceleration in three-dimensional directions can be measured.
【0006】[0006]
【実施例】本発明の実施例を図面に基づいて説明する。
図1aは三次元加速度センサのセンサチップの配置が示
されている。三次元加速度センサ1は、同一基板上にX
方向加速度センサ2、Y方向加速度センサ3およびZ方
向加速度センサ4が配置され、各方向の加速度を独立し
て検出できるように構成されている。なお、X,Y方向
加速度センサ2,3は同一構造のものを用い、その感知
方向を90度ずらせて配置されるため、ここではX方向
加速度センサ2についてのみ説明する。[Embodiment] An embodiment of the present invention will be explained based on the drawings. FIG. 1a shows the arrangement of a sensor chip of a three-dimensional acceleration sensor. The three-dimensional acceleration sensor 1 is
A directional acceleration sensor 2, a Y-direction acceleration sensor 3, and a Z-direction acceleration sensor 4 are arranged so that acceleration in each direction can be detected independently. Note that since the X and Y direction acceleration sensors 2 and 3 have the same structure and are arranged with their sensing directions shifted by 90 degrees, only the X direction acceleration sensor 2 will be described here.
【0007】X方向加速度センサ2は、半導体製造技術
により作製される加速度センサチップを備えている。こ
のセンサチップは、図1bに示すように、シリコンウエ
ハ上に振動による応力歪みを検知する拡散歪ゲージ(以
下「歪ゲージ」という)、歪ゲージを増幅回路等の処理
回路に接続するための配線、ボンディング用パッド等の
電極パターン(図示せず)を形成した後、ウエハの両面
から異方性エッチングにより断面コ字状の貫通部5が形
成される。この貫通部5により四方が周辺厚肉部6に囲
われた中央厚肉部7が設けられており、この中央厚肉部
7は両貫通部の終端部分が形成する薄肉部8によって周
辺厚肉部6に連結されている。すなわち、薄肉部8は図
示の寸法においてa<<bになっており、貫通部(Xま
たはY)方向に対して変形し易く、またチップの厚み(
Z)方向に対して変形しにくい構造になっている。The X-direction acceleration sensor 2 includes an acceleration sensor chip manufactured using semiconductor manufacturing technology. As shown in Figure 1b, this sensor chip includes a diffusion strain gauge (hereinafter referred to as a "strain gauge") that detects stress strain caused by vibration on a silicon wafer, and wiring for connecting the strain gauge to a processing circuit such as an amplifier circuit. After forming an electrode pattern (not shown) such as a bonding pad, a through portion 5 having a U-shaped cross section is formed by anisotropic etching from both sides of the wafer. This penetrating portion 5 provides a central thick-walled portion 7 surrounded on all sides by peripheral thick-walled portions 6. It is connected to section 6. That is, the thin wall portion 8 has a<<b in the illustrated dimensions, is easily deformed in the direction of the through portion (X or Y), and has a thickness of the chip (
It has a structure that is difficult to deform in the Z) direction.
【0008】図示のX(またはY)方向の振動が加わっ
たとき、中央厚肉部7は薄肉部8による両持構造で支持
されているため、両薄肉部8と周辺厚肉部6の連結部分
に歪み応力が発生する。この歪み応力を検知するため、
各薄肉部8には振動感知方向に並べた対の歪ゲージRが
配置されている。これらの歪ゲージRは電気的に接続さ
れ、ブリッジ回路が構成される。例えば、図2aの如く
、一方の薄肉部8に歪ゲージR1,R2を、また他方の
薄肉部8に歪ゲージR3,R4とする歪ゲージ配置の場
合、図2cに示されるように、歪ゲージR1とR3およ
びR2とR4を対辺配置とするブリッジ回路が構成され
る。
ここで、歪ゲージの抵抗変化は引張応力に対して増加(
記号「↑」)し、一方圧縮応力に対して減少(記号「↓
」)する。例えば、図2aに示す矢印方向に加速度Gが
印加されたとき、歪ゲージR2,R4は引張応力により
抵抗が増加し、また歪ゲージR1,R3は圧縮応力によ
り抵抗が減少する。このときの抵抗変化を図2cに示す
。When vibration is applied in the X (or Y) direction as shown in the figure, since the central thick part 7 is supported by the thin part 8 in a dual support structure, the connection between the two thin parts 8 and the peripheral thick part 6 is interrupted. Distortion stress occurs in the part. In order to detect this strain stress,
A pair of strain gauges R are arranged in each thin wall portion 8 and arranged in the vibration sensing direction. These strain gauges R are electrically connected to form a bridge circuit. For example, in the case of a strain gauge arrangement in which strain gauges R1 and R2 are placed on one thin wall portion 8 and strain gauges R3 and R4 are placed on the other thin wall portion 8 as shown in FIG. 2c, as shown in FIG. A bridge circuit is constructed in which R1 and R3 and R2 and R4 are arranged on opposite sides. Here, the resistance change of the strain gauge increases (
(symbol “↑”), while decreasing for compressive stress (symbol “↓”)
")do. For example, when acceleration G is applied in the direction of the arrow shown in FIG. 2a, the resistance of strain gauges R2 and R4 increases due to tensile stress, and the resistance of strain gauges R1 and R3 decreases due to compressive stress. The resistance change at this time is shown in FIG. 2c.
【0009】Z方向加速度センサ4は上記同様の半導体
製造技術により作製され、貫通部10により四方が周辺
厚肉部11に囲われた中央厚肉部12が設けられており
、この中央厚肉部12は一つの薄肉部13によって周辺
厚肉部11に連結された片持構造になっている。すなわ
ち、薄肉部13は図示の寸法においてc>>dになって
おり、チップの垂直(Z)方向に対して変形し易く、一
方貫通部(XおよびY)方向に対して変形しにくい構造
になっている。したがって、中央厚肉部7は図示のZ方
向の振動が加わったとき、薄肉部13と周辺厚肉部11
の連結部分に歪み応力が発生する。この歪み応力を検知
するため、薄肉部13には振動の感知方向および非感知
方向に並べた対の歪ゲージR(R1〜R4)が図2bに
示す如く配置されている。この歪ゲージRは、図2cに
示すブリッジ回路が構成される。The Z-direction acceleration sensor 4 is manufactured using the same semiconductor manufacturing technology as described above, and is provided with a central thick portion 12 surrounded by peripheral thick portions 11 on all sides by a through portion 10. 12 has a cantilevered structure connected to the peripheral thick part 11 by one thin part 13. That is, the thin-walled portion 13 has c>>d in the illustrated dimensions, and has a structure that allows it to easily deform in the vertical (Z) direction of the chip, while being difficult to deform in the through-part (X and Y) directions. It has become. Therefore, when the center thick part 7 is subjected to vibration in the Z direction shown in the figure, the thin part 13 and the peripheral thick part 11
Distortion stress occurs in the connected parts. In order to detect this strain stress, a pair of strain gauges R (R1 to R4) arranged in the vibration sensing direction and the non-vibration sensing direction are arranged in the thin portion 13 as shown in FIG. 2b. This strain gauge R constitutes a bridge circuit shown in FIG. 2c.
【0010】上記実施例の三次元加速度センサの作用を
説明する。図1に示すように、各方向の振動に対しての
み感度を持たせるようにセンサチップが配置されている
ため、各センサチップは当該方向の加速度成分の大きさ
を検出することになる。したがって、3方向のセンサ出
力を解析することにより、加速度の方向や大きさを計測
することができる。The operation of the three-dimensional acceleration sensor of the above embodiment will be explained. As shown in FIG. 1, the sensor chips are arranged so as to be sensitive only to vibrations in each direction, so each sensor chip detects the magnitude of the acceleration component in that direction. Therefore, by analyzing sensor outputs in three directions, the direction and magnitude of acceleration can be measured.
【0011】ところで、センサ感度は中央厚肉部の質量
に応じて変化するため、更に中央厚肉部に重りを付加し
てセンサ感度を上げるように構成することもできる。例
えば、図1の2点鎖線で示すように中央厚肉部の上面ま
たは下面に球形の重り14を固着する。この重り14は
銅等のハンダ付けできる金属ボール、表面処理を施され
たボール若しくはガラスボールが用いられる。このよう
に構成した場合、中央厚肉部の質量が重りを加えたこと
で大きくなるため、センサチップがXまたは/およびY
方向の加速度を受けたとき、重心回りのねじりモーメン
トが発生し、X,Y軸方向の加速度を合成値として検出
することができる。By the way, since the sensor sensitivity changes depending on the mass of the central thick wall portion, it is also possible to further add weight to the central thick wall portion to increase the sensor sensitivity. For example, as shown by the two-dot chain line in FIG. 1, a spherical weight 14 is fixed to the upper or lower surface of the central thick portion. As the weight 14, a solderable metal ball such as copper, a surface-treated ball, or a glass ball is used. With this configuration, the mass of the central thick part increases due to the addition of weight, so the sensor chip
When receiving acceleration in this direction, a torsional moment is generated around the center of gravity, and the acceleration in the X and Y axis directions can be detected as a composite value.
【0012】0012
【発明の効果】上述のとおり、本発明によれば、一方向
の振動に対してのみ感度を持たせたセンサをワンチップ
上に多次元方向に感度を持たせて複数配置したので、セ
ンサ全体が小型化され、かつ低コスト化が図れる。Effects of the Invention As described above, according to the present invention, a plurality of sensors sensitive only to vibrations in one direction are arranged on one chip with sensitivity in multiple directions, so that the entire sensor can be made smaller and lower in cost.
【図1】本発明の三次元加速度センサを説明する図で、
(a)はセンサ配置図、(b)はX,Y方向加速度セン
サの斜視図、(c)はZ方向加速度センサの斜視図であ
る。FIG. 1 is a diagram illustrating a three-dimensional acceleration sensor of the present invention,
(a) is a sensor arrangement diagram, (b) is a perspective view of an X- and Y-direction acceleration sensor, and (c) is a perspective view of a Z-direction acceleration sensor.
【図2】図1に示す各方向の加速度検出を説明する図で
、(a)はX,Y方向加速度センサの歪ゲージ配置図、
(b)はZ方向加速度センサの歪ゲージ配置図、(c)
は各方向の歪ゲージにより構成されるブリッジ回路図で
ある。2 is a diagram illustrating acceleration detection in each direction shown in FIG. 1, where (a) is a strain gauge arrangement diagram of X and Y direction acceleration sensors;
(b) is a strain gauge layout diagram of the Z-direction acceleration sensor, (c)
is a bridge circuit diagram composed of strain gauges in each direction.
1 センサチップ 2 X方向加速度センサ 3 Y方向加速度センサ 4 Z方向加速度センサ 5,10 貫通部 6,11 周辺厚肉部 7,12 中央厚肉部 8,13 薄肉部 R 歪ゲージ 1 Sensor chip 2 X direction acceleration sensor 3 Y direction acceleration sensor 4 Z direction acceleration sensor 5,10 Penetration part 6,11 Peripheral thick wall part 7, 12 Central thick part 8,13 Thin wall part R Strain gauge
Claims (1)
部を設け、該厚肉部間が薄肉部により連結されていると
共に、前記中央厚肉部の振動により歪み応力が発生する
前記薄肉部に拡散歪ゲージを配置した半導体加速度セン
サであって、前記中央厚肉部が対向する薄肉部により両
持構造で支持され、前記両薄肉部に加わるチップに平行
な横方向の振動のみに感度を有するXおよびY方向加速
度センサと、前記中央厚肉部が薄肉部により片持構造で
支持され、チップの垂直方向の振動のみに感度を有する
Z方向加速度センサとを同一チップ上に配置すると共に
、各センサの拡散歪ゲージにより一方向加速度を独立し
て検出するブリッジ回路が構成されている三次元加速度
センサ。1. A penetrating portion is provided between a peripheral thick wall portion and a central thick wall portion, the thick wall portions are connected by a thin wall portion, and strain stress is generated by vibration of the central thick wall portion. A semiconductor acceleration sensor in which a diffusion strain gauge is disposed in the thin-walled portion, wherein the central thick-walled portion is supported by the opposing thin-walled portions in a dual-support structure, and lateral vibrations parallel to the chip are applied to both the thin-walled portions. An acceleration sensor in the X and Y directions that is sensitive only to vibrations in the vertical direction, and an acceleration sensor in the Z direction that is sensitive only to vibrations in the vertical direction of the chip, the central thick part of which is supported by a thin part in a cantilevered structure, and a Z direction acceleration sensor that is sensitive only to vibrations in the vertical direction of the chip are mounted on the same chip. The three-dimensional acceleration sensor is configured with a bridge circuit that independently detects unidirectional acceleration using the diffusion strain gauge of each sensor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3043417A JPH04279867A (en) | 1991-03-08 | 1991-03-08 | Three-dimensional acceleration sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3043417A JPH04279867A (en) | 1991-03-08 | 1991-03-08 | Three-dimensional acceleration sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04279867A true JPH04279867A (en) | 1992-10-05 |
Family
ID=12663139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3043417A Pending JPH04279867A (en) | 1991-03-08 | 1991-03-08 | Three-dimensional acceleration sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04279867A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10282135A (en) * | 1997-04-04 | 1998-10-23 | Ngk Insulators Ltd | Sensor unit |
KR100879958B1 (en) * | 2006-08-09 | 2009-01-23 | 히타치 긴조쿠 가부시키가이샤 | Multi-range three-axis acceleration sensor device |
US7679865B2 (en) | 2005-07-22 | 2010-03-16 | Tdk Corporation | Spring member for acceleration sensor, acceleration sensor and magnetic disk drive apparatus |
JP2010060336A (en) * | 2008-09-02 | 2010-03-18 | Dainippon Printing Co Ltd | Uniaxial semiconductor acceleration sensor |
JP2017504004A (en) * | 2013-12-13 | 2017-02-02 | インテル コーポレイション | Optical inertial sensor |
-
1991
- 1991-03-08 JP JP3043417A patent/JPH04279867A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10282135A (en) * | 1997-04-04 | 1998-10-23 | Ngk Insulators Ltd | Sensor unit |
US7679865B2 (en) | 2005-07-22 | 2010-03-16 | Tdk Corporation | Spring member for acceleration sensor, acceleration sensor and magnetic disk drive apparatus |
KR100879958B1 (en) * | 2006-08-09 | 2009-01-23 | 히타치 긴조쿠 가부시키가이샤 | Multi-range three-axis acceleration sensor device |
JP2010060336A (en) * | 2008-09-02 | 2010-03-18 | Dainippon Printing Co Ltd | Uniaxial semiconductor acceleration sensor |
JP2017504004A (en) * | 2013-12-13 | 2017-02-02 | インテル コーポレイション | Optical inertial sensor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7231802B2 (en) | Apparatus for detecting a physical quantity acting as an external force and method for testing and manufacturing the apparatus | |
US6512364B1 (en) | Testing sensor | |
US7360456B2 (en) | Six-axis sensor | |
US5531092A (en) | Device for moving a suspended weight body | |
US7500406B2 (en) | Multiaxial sensor | |
JP5007083B2 (en) | Force sensor chip | |
JPH04301770A (en) | Accelerometer device | |
JPS63169078A (en) | Semiconductor vibration and acceleration sensor | |
JPH04279867A (en) | Three-dimensional acceleration sensor | |
JP2008107257A (en) | Acceleration sensor | |
JPH04315056A (en) | Acceleration sensor | |
JP3010725B2 (en) | Semiconductor acceleration sensor | |
JP2006098323A (en) | Semiconductor-type three-axis acceleration sensor | |
JP3034620B2 (en) | 3D acceleration sensor | |
JP3265641B2 (en) | Semiconductor acceleration sensor | |
JPH0677052B2 (en) | Magnetic detection device | |
JP3642054B2 (en) | Piezoresistive 3-axis acceleration sensor | |
JPH0526754A (en) | Sensor utilizing change in electrostatic capacitance | |
JPH04339266A (en) | Acceleration sensor and its manufacture | |
JPH05340956A (en) | Acceleration sensor | |
JPH0830716B2 (en) | Semiconductor acceleration detector | |
JPH0523140U (en) | Acceleration sensor | |
JPH03214064A (en) | Acceleration sensor | |
JP3873438B2 (en) | Semiconductor device | |
JP2746298B2 (en) | Force detector for two or more components |