JPH04278983A - Method for sealing display panel - Google Patents

Method for sealing display panel

Info

Publication number
JPH04278983A
JPH04278983A JP3040335A JP4033591A JPH04278983A JP H04278983 A JPH04278983 A JP H04278983A JP 3040335 A JP3040335 A JP 3040335A JP 4033591 A JP4033591 A JP 4033591A JP H04278983 A JPH04278983 A JP H04278983A
Authority
JP
Japan
Prior art keywords
sealing
film
insulating substrate
metal
sealing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3040335A
Other languages
Japanese (ja)
Inventor
Harutaka Taniguchi
谷口 春隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP3040335A priority Critical patent/JPH04278983A/en
Publication of JPH04278983A publication Critical patent/JPH04278983A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To improve the hermetic property of the sealing part of an insulating substrate and a sealing plate and to enhance a sealing effect at the time of sealing the display part of a display panel by the sealing plate form the rear side of the insulating substrate. CONSTITUTION:An insulating film 50 is attached onto the leads 21a led out to the peripheral edge of the insulating substrate 10 from the display part 20 and a metallic film 60 of an annular pattern enclosing the display part 20 is provided thereon. In addition, the metallic film of the pattern corresponding to the insulating substrate 10 side is placed on the sealing plate 40 and thereafter, the metallic films on the insulating substrate 40 side and the sealing plate side are joined to each other by using a low melting metal 70 at a low temp.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は表示パネルを外気の影響
から保護する封止方法であって、その透明な絶縁基板上
に組み込まれた表示部をパネルの裏面側に配設される封
止板によって封止する方法に関する。
[Industrial Application Field] The present invention is a sealing method for protecting a display panel from the influence of outside air, and the present invention is a sealing method for protecting a display panel from the influence of outside air, in which a display section incorporated on a transparent insulating substrate is sealed by a sealing method disposed on the back side of the panel. This invention relates to a method of sealing with a plate.

【0002】0002

【従来の技術】エレクトロルミネッセンス形(以下EL
という),液晶形,プラズマ形等のいわゆるフラットデ
ィスプレイパネルは透明な絶縁基板の上に表示部として
薄膜積層構造を組み込んでなるが、外気中の水分や汚染
物質の影響を受けないよう充分に表示部を封止した上で
使用する必要がある。
[Prior art] Electroluminescent type (hereinafter referred to as EL)
), liquid crystal type, plasma type, and other so-called flat display panels incorporate a thin film laminated structure as a display part on a transparent insulating substrate, but the display panel has a sufficient display area so that it is not affected by moisture or pollutants in the outside air. It is necessary to seal the area before use.

【0003】かかる表示パネルの封止は最も簡単にはそ
の裏面側に樹脂等のコーティングを施すことによっても
可能であるが、外気に対する高い保護効果を得るには気
密性の高いガラスや金属等からなる封止板を用いて、そ
れと絶縁基板との間に外気の影響を受けやすい表示部を
完全に閉じ込めてしまうのが最も確実である。本発明は
この封止板を利用する表示パネルの封止方法に関し、そ
の代表的な従来技術の例を図4を参照して簡単に説明す
る。
The simplest way to seal such a display panel is to apply a coating of resin or the like to the back side of the display panel, but in order to obtain a high protection effect against the outside air, it is possible to seal the display panel using a highly airtight glass or metal coating. The most reliable method is to completely confine the display section, which is susceptible to outside air, between the sealing plate and the insulating substrate. The present invention relates to a display panel sealing method using this sealing plate, and a typical example of the prior art will be briefly explained with reference to FIG. 4.

【0004】図4に示された表示パネル30はEL表示
パネルであり、透明なガラスからなる絶縁基板10上に
薄膜積層構造の表示部20を組み込んでなる。周知のよ
うに、EL方式の表示部20は図の前後方向に細長いス
トライプ状パターンの透明電極膜21,表側絶縁膜22
, EL発光膜23, 裏側絶縁膜24, および図の
左右方向に細長いストライプ状パターンの裏側電極膜2
5を積層してなり、透明電極膜21と裏側電極膜25と
の交点に対応するEL発光膜23の部分を各画素として
EL発光させた表示光を絶縁基板10側から取り出すよ
うになっている。
[0004] The display panel 30 shown in FIG. 4 is an EL display panel, and is constructed by incorporating a display section 20 having a thin film laminated structure on an insulating substrate 10 made of transparent glass. As is well known, the EL display section 20 includes a transparent electrode film 21 and a front insulating film 22 in a striped pattern elongated in the front and back direction of the figure.
, an EL light-emitting film 23, a backside insulating film 24, and a backside electrode film 2 with a striped pattern elongated in the horizontal direction of the figure.
5 are laminated, and display light emitted by EL is extracted from the insulating substrate 10 side by using a portion of the EL light emitting film 23 corresponding to the intersection of the transparent electrode film 21 and the back side electrode film 25 as each pixel. .

【0005】封止板40としては絶縁基板10と同じガ
ラス板がふつう用いられ、図示のようにこれを表示パネ
ル30の裏側に配設してその周縁を封着材90を介して
絶縁基板10に封着することにより、表示部20を絶縁
基板10と封止板40との間に閉じ込めて封止する。封
着材90にはエポキシ等の樹脂接着剤やガラスの粉末な
いしはフリットを用い、絶縁基板10と封止板40の間
に装入して置いた上で適度の加圧条件下で前者は 15
0〜180 ℃で加熱硬化させ、後者は 400〜80
0 ℃で加熱溶融させる。
As the sealing plate 40, the same glass plate as the insulating substrate 10 is usually used, and as shown in the figure, this glass plate is disposed on the back side of the display panel 30, and its periphery is connected to the insulating substrate 10 through a sealing material 90. By sealing, the display section 20 is confined and sealed between the insulating substrate 10 and the sealing plate 40. A resin adhesive such as epoxy, glass powder, or frit is used as the sealing material 90, and the former is placed between the insulating substrate 10 and the sealing plate 40 and then under moderate pressure conditions.
Cured by heating at 0 to 180 °C, the latter at 400 to 80 °C
Heat and melt at 0°C.

【0006】なお、表示部20の外部との接続のために
上述の封着部を通してリードを外側に導出する。図4の
例では裏側電極膜25の延出部がリード25cとして利
用される。このリード25cはふつう左右交互に導出さ
れるが、図の断面では右側に導出した場合が示されてい
る。もちろん、透明電極膜21についてもリードが必要
なので、同様に封着材90による封着部を通して透明電
極膜21を図の前後方向に交互に延出させてリードとす
る。
[0006] In order to connect the display section 20 to the outside, leads are led to the outside through the above-mentioned sealing section. In the example of FIG. 4, the extended portion of the back side electrode film 25 is used as the lead 25c. The leads 25c are normally led out alternately on the left and right sides, but the cross section of the figure shows a case where they are led out on the right side. Of course, the transparent electrode film 21 also requires a lead, so the transparent electrode film 21 is similarly extended alternately in the front-rear direction in the figure through the sealed portion by the sealing material 90 to form a lead.

【0007】[0007]

【発明が解決しようとする課題】図4で説明した表示パ
ネル30の封止方法では、ガラスの絶縁基板10は気密
性が非常に高く封止板40にも気密性の充分高いものを
利用できるが、封着材90による封着部の気密性が必ず
しも充分でない問題があって、従来からこの封着部が表
示パネルの封止上の弱点になっている。
[Problems to be Solved by the Invention] In the method of sealing the display panel 30 explained in FIG. 4, the glass insulating substrate 10 has very high airtightness, and the sealing plate 40 can also be made of a material with sufficiently high airtightness. However, there is a problem in that the airtightness of the sealed portion by the sealing material 90 is not necessarily sufficient, and this sealed portion has traditionally been a weak point in sealing the display panel.

【0008】封着材90にエポキシ系等の樹脂接着剤を
用いた場合、絶縁基板10, 封止板40,リード25
cのいずれにも接着性が良好で封着面の気密性は高いも
のの、樹脂自体に若干の透気性があるので表示パネルの
長期の使用中にその表示特性が劣化することがある。ま
た、ガラス封着材の場合は材料自体の気密性は高いが、
封着面の気密性に問題がある。この一つの原因はガラス
のフリット等を加熱溶融して封着する際にリードの金属
との接着面に欠陥が発生しやすい点にある。また、封着
部から例えば 0.2mmの細幅のリードを 0.4m
m程度の狭いピッチで並べて導出するので、それによる
微細な凹凸面の隅部分で封着が不完全になりやすいのが
もう一つの原因である。 ガラスの加熱溶融温度を高めるとかかる封着上の問題は
若干改善されるが、表示部に表示特性の劣化等の悪影響
を与えやすい。
[0008] When a resin adhesive such as epoxy is used as the sealing material 90, the insulating substrate 10, the sealing plate 40, and the leads 25
Although both of c. have good adhesion and high airtightness of the sealed surface, the resin itself has some air permeability, so the display characteristics may deteriorate during long-term use of the display panel. In addition, in the case of glass sealing materials, although the material itself has high airtightness,
There is a problem with the airtightness of the sealing surface. One reason for this is that defects are likely to occur on the bonding surface of the lead to the metal when glass frit or the like is heated and melted to seal it. Also, connect a narrow lead of, for example, 0.2 mm to 0.4 m from the sealing part.
Another reason is that the sealing tends to be incomplete at the corners of the finely uneven surface because they are lined up and guided at a narrow pitch of about m. Although such sealing problems can be slightly improved by increasing the heating and melting temperature of the glass, it is likely to have an adverse effect on the display section, such as deterioration of display characteristics.

【0009】かかる現状に立脚して本発明の目的は、従
来からの弱点である封着部の気密性を高めて表示パネル
の封止をより完全にすることにある。
Based on the current situation, an object of the present invention is to improve the airtightness of the sealing portion, which has been a weak point in the past, and to more completely seal the display panel.

【0010】0010

【課題を解決するための手段】この目的は本発明によれ
ば、冒頭記載のように表示パネルの透明な絶縁基板上に
組み込まれた表示部をパネルの裏面側から封止板を用い
て封止するに当たり、絶縁基板の周縁部に表示部から導
出されたリードの上にその外部接続部を外側に露出させ
て絶縁膜と表示部を囲む環状パターンの金属膜を順次被
覆し、封止板側にはその周縁部の絶縁基板側の金属膜に
対応する位置に金属膜を被覆して置いた上で、絶縁基板
側金属膜と封止板側金属膜とを低融点金属を介して低温
加熱下で相互に接合することにより達成される。
[Means for Solving the Problems] According to the present invention, the display portion incorporated on the transparent insulating substrate of the display panel is sealed from the back side of the panel using a sealing plate as described at the beginning. To do this, the leads led out from the display part at the peripheral edge of the insulating substrate are sequentially coated with an insulating film and a metal film in an annular pattern surrounding the display part, with the external connection parts exposed to the outside, and a sealing plate is placed on the lead. A metal film is coated on the peripheral edge of the side at a position corresponding to the metal film on the insulating substrate side, and then the metal film on the insulating substrate side and the metal film on the sealing plate side are coated at a low temperature via a low melting point metal. This is accomplished by bonding them together under heat.

【0011】なお、本発明による上記封止方法はEL形
,液晶形,プラズマ形,エレクトロクロミック形等の表
示パネル一般に適用でき、いずれの場合にも封止板には
表示パネルの絶縁基板と同系の材料,例えばガラスを用
いるのが高い封止効果を長期に亘って維持する上で望ま
しい。
The above-mentioned sealing method according to the present invention can be applied to display panels in general such as EL type, liquid crystal type, plasma type, electrochromic type, etc. In any case, the sealing plate has a material similar to the insulating substrate of the display panel. It is desirable to use a material such as glass in order to maintain a high sealing effect over a long period of time.

【0012】本発明方式の実施面では、上記構成にいう
表示パネルの絶縁基板側の絶縁膜と金属膜を表示部用と
同じ材料を用いて表示部と共通の工程で組み込むのがと
くに有利である。この際、絶縁膜を表示部と連続したパ
ターンおよびそれと分離したパターンで同時形成し、金
属膜の少なくとも一部を表示部用の金属電極膜と同じ材
料,例えばEL表示パネルでは裏側電極膜用のアルミを
用いて表示部とは分離されたパターンで同時形成するの
が有利である。また、封止板側の金属膜は絶縁基板側と
同じ材料を用いかつ同じパターンに形成するのが有利で
ある。
In implementing the method of the present invention, it is particularly advantageous to incorporate the insulating film and metal film on the insulating substrate side of the display panel in the above structure using the same material as that for the display part and in the same process as that for the display part. be. At this time, an insulating film is simultaneously formed in a pattern continuous with the display part and a pattern separated from it, and at least part of the metal film is made of the same material as the metal electrode film for the display part, for example, in the case of an EL display panel, it is made of the same material as the metal electrode film for the back side electrode film. It is advantageous to use aluminum and simultaneously form a pattern separated from the display section. Further, it is advantageous that the metal film on the sealing plate side is made of the same material and formed in the same pattern as that on the insulating substrate side.

【0013】絶縁基板側と封止板側の金属膜を相互に接
合する低融点金属としてははんだ,とくに共晶合金はん
だを用いるのが好適であり、接合に先立ってこの低融点
金属を電解めっき膜や箔の形で絶縁基板と封止板との一
方の側に,とくに後者の方にあらかじめ付けて置くのが
有利である。かかる低融点金属のめっき膜や箔の厚みは
数十μm, 望ましくは20〜80μmとするのがよく
、幅は数mm以下, 望ましくは1〜3mmとするのが
よい。接合は低融点金属の種類に応じて 180〜25
0 ℃の温度で行ない、この際の加熱方法は最も簡単に
は熱板を利用して絶縁基板と封止板の全体を加熱するこ
とでよいが、赤外線やレーザ光のビームの照射により金
属膜を介して低融点金属を局部加熱するのがより望まし
い。
[0013] It is preferable to use solder, especially eutectic alloy solder, as the low melting point metal for bonding the metal films on the insulating substrate side and the sealing plate side to each other, and prior to bonding, this low melting point metal is electrolytically plated. It is advantageous to pre-apply it in the form of a film or foil to one side of the insulating substrate and the sealing plate, in particular on the latter. The thickness of such a plating film or foil of a low melting point metal is preferably several tens of micrometers, preferably 20 to 80 micrometers, and the width is several mm or less, preferably 1 to 3 mm. Bonding is 180 to 25 depending on the type of low melting point metal.
The heating method at this time is to use a hot plate to heat the entire insulating substrate and sealing plate, but the metal film is heated by irradiation with an infrared ray or laser beam. It is more preferable to locally heat the low melting point metal through the heating process.

【0014】さらに、絶縁基板側と封止板側のいずれの
金属膜も低融点金属となじみやすい金属を被覆した複合
膜とするのが有利である。例えば、金属膜の本体に表示
部用のアルミを利用する場合はその上に低融点金属とし
てのはんだ等と相合性のよいニッケル, 銅, 金等の
薄膜をスパッタ蒸着法や無電解めっき法によって被覆し
た複合金属膜とするのが有利である。
Furthermore, it is advantageous that both the metal films on the insulating substrate side and the sealing plate side are composite films coated with a metal that is easily compatible with a low melting point metal. For example, when using aluminum for the display part as the main body of the metal film, a thin film of nickel, copper, gold, etc., which is compatible with low melting point metals such as solder, is coated on top by sputter deposition or electroless plating. Advantageously, it is a coated composite metal membrane.

【0015】[0015]

【作用】本発明方法は、従来から封着材として用いられ
て来た樹脂やガラスよりも金属がそれ自体および金属間
接合の気密性の点で優れることに着目して、この封止用
金属として低温で接合が容易な低融点金属を用い、かつ
封止欠陥が発生しやすいリードの導出部分を封止する役
目を絶縁膜に受け持たせることによって、前述の問題点
の解決に成功したものである。
[Operation] The method of the present invention focuses on the fact that metals are superior to resins and glass, which have been conventionally used as sealing materials, in terms of the airtightness of the metal itself and of the bond between metals. We succeeded in solving the above-mentioned problems by using a low-melting point metal that can be easily bonded at low temperatures, and by having an insulating film take on the role of sealing the lead-out part of the lead, where sealing defects are likely to occur. It is.

【0016】すなわち本発明方法では前項の構成にいう
ように、絶縁基板の周縁部のリードの導出部の上にまず
絶縁膜を被覆して、リードと絶縁基板面を含む凹凸面を
封止するとともに、リードに対する絶縁の役目を持たせ
る。もちろん、この絶縁膜はリードの外部接続部を外側
に向けて露出させるように被覆され、かつこれによりリ
ードによる凹凸面がかなり平坦化される。次に、絶縁膜
の上に金属膜を表示部を囲む環状パターンで被覆して低
融点金属膜との接合用とするとともに、絶縁膜と密着さ
せて上述のように平坦化された絶縁膜の表面を封止する
That is, in the method of the present invention, as described in the configuration in the previous section, an insulating film is first coated on the lead-out portion of the lead at the peripheral edge of the insulating substrate, and the uneven surface including the lead and the insulating substrate surface is sealed. It also serves as an insulator for the leads. Of course, this insulating film is coated so as to expose the external connection portions of the leads to the outside, and thereby the uneven surface caused by the leads is considerably flattened. Next, a metal film is coated on the insulating film in an annular pattern surrounding the display area for bonding with the low melting point metal film, and the insulating film is brought into close contact with the insulating film and flattened as described above. Seal the surface.

【0017】一方、封止板側にはその周縁部の絶縁基板
側の金属膜に対応する位置に同様に金属膜を被覆して置
いた上で、絶縁基板側と封止板側の金属膜とを低融点金
属を介して低温加熱下で相互に接合することにより、絶
縁基板と封止板の間を気密性の高い金属により封止する
。この際、絶縁基板側のリードに基づく凹凸は上述のよ
うに絶縁膜で平坦化された上でさらに金属膜で平坦化さ
れるので、絶縁基板側の金属膜面はほぼ完全に平坦化さ
れており、もちろん封止板側の金属膜面も平坦なので、
両金属膜の平坦な表面間を低融点金属によって容易に低
温下で接合して高い気密性で封止することができる。
On the other hand, the sealing plate side is coated with a metal film in the same manner at a position corresponding to the metal film on the insulating substrate side at the peripheral edge thereof, and then the metal film on the insulating substrate side and the sealing plate side is coated. By bonding them to each other via a low melting point metal under low temperature heating, the space between the insulating substrate and the sealing plate is sealed with a highly airtight metal. At this time, the unevenness caused by the leads on the insulating substrate side is flattened by the insulating film as described above, and then further flattened by the metal film, so the metal film surface on the insulating substrate side is almost completely flattened. Of course, the metal film surface on the sealing plate side is also flat, so
The flat surfaces of both metal films can be easily bonded together at low temperatures using a low melting point metal and sealed with high airtightness.

【0018】[0018]

【実施例】以下、図を参照して本発明による封止方法の
実施例を説明する。図1と図2はそれぞれ本発明をEL
表示パネルに適用した第1実施例と第2実施例とを示し
、前述の図4に対応する部分には同じ符号が付けられて
いる。
[Embodiments] Hereinafter, embodiments of the sealing method according to the present invention will be described with reference to the drawings. Figures 1 and 2 illustrate the present invention, respectively.
A first embodiment and a second embodiment applied to a display panel are shown, and parts corresponding to those in FIG. 4 described above are given the same reference numerals.

【0019】図1の第1実施例において、同図(a) 
は表示パネル30を前の図4と同じ方向で切った断面図
であり、同図(b) はこれと直角方向に切った断面図
である。 また、図3には参考用にこの第1の実施例に関連する部
分のパターンが要部の平面図で示されている。
In the first embodiment shown in FIG.
4 is a cross-sectional view of the display panel 30 taken in the same direction as in FIG. 4, and FIG. 4B is a cross-sectional view taken in a direction perpendicular to this. Further, for reference, FIG. 3 shows a pattern of a portion related to the first embodiment in a plan view of the main part.

【0020】図1の表示パネル30の表示部20用には
その絶縁基板10上にITO(インジウム錫酸化物)等
からなる透明電極膜21が2000Å程度の膜厚で付け
られるが、これを図3(a) に示すようなストライプ
状にパターンニングする際に、この実施例ではリード2
1aと21bを同時に形成する。図のようにリード21
aの方は透明電極膜21から分離されたパターンに形成
され、リード21bの方は透明電極膜21と連続したパ
ターンに形成される。さらにこの際に、絶縁基板10側
の図1に示す金属膜60の表面をできるだけ平坦にする
ため図3(a)に示すようにリード21aの相互間等に
スペーサ用パターン21cや21dを適宜に形成して置
くのが望ましい。
For the display section 20 of the display panel 30 in FIG. 1, a transparent electrode film 21 made of ITO (indium tin oxide) or the like is formed on the insulating substrate 10 to a thickness of about 2000 Å. In this example, when patterning into stripes as shown in 3(a), the lead 2
1a and 21b are formed simultaneously. Lead 21 as shown
The lead a is formed in a pattern separated from the transparent electrode film 21, and the lead 21b is formed in a pattern continuous with the transparent electrode film 21. Furthermore, at this time, in order to make the surface of the metal film 60 shown in FIG. 1 on the insulating substrate 10 side as flat as possible, spacer patterns 21c and 21d are appropriately formed between the leads 21a as shown in FIG. 3(a). It is preferable to form it.

【0021】次に、表示部20用にアルミナや窒化シリ
コンの表側絶縁膜22をメタルマスクを用いるスパッタ
法等により例えば4000Åの膜厚に成膜し、その上に
 0.5%程度のMnを添加したZnS等のEL発光膜
23を電子ビーム蒸着法等により4000〜8000Å
の膜厚に成膜し、通例のように 500〜700 ℃,
 1〜2Hr程度の熱処理を施す。その上側の裏側絶縁
膜24用にはアルミナ等を表側絶縁膜22と同程度の膜
厚に, ただし全面に成膜した上でフォトエッチングを
施すことにより、裏側絶縁膜24と同時にリード21a
や21bを覆う絶縁膜50を形成する。図3(b) の
ようにこの実施例では裏側絶縁膜24の上下部分と左右
の延出部分が絶縁膜50として利用される。
Next, a front insulating film 22 of alumina or silicon nitride for the display section 20 is formed to a thickness of, for example, 4000 Å by sputtering using a metal mask, and about 0.5% Mn is deposited thereon. The EL light emitting film 23 made of doped ZnS or the like is deposited to a thickness of 4000 to 8000 Å by electron beam evaporation or the like.
The film was deposited to a film thickness of 500 to 700 °C as usual.
Heat treatment is performed for about 1 to 2 hours. For the back side insulating film 24 on the upper side, alumina or the like is formed to the same thickness as the front side insulating film 22, but by forming the film on the entire surface and photo-etching, it is possible to form the lead 21a at the same time as the back side insulating film 24.
An insulating film 50 is formed to cover the layers 21b and 21b. As shown in FIG. 3(b), in this embodiment, the upper and lower portions and left and right extending portions of the back side insulating film 24 are used as the insulating film 50.

【0022】表示部20の裏側電極膜26はスパッタ法
等により 0.5〜1μmの膜厚に全面被着した金属を
フォトエッチングして、図3(c) に示すストライプ
状パターンに形成するが、この際に本発明に用いる金属
膜60と,この実施例ではリード21a, 21bの外
部接続部25a, 25b用金属とを図示のパターンに
同時に形成する。金属膜60は表示部20を囲む1〜3
mmの狭い幅の枠状パターンに形成される。
The back side electrode film 26 of the display section 20 is formed by photo-etching a metal coated on the entire surface to a thickness of 0.5 to 1 μm by sputtering or the like to form a striped pattern as shown in FIG. 3(c). At this time, the metal film 60 used in the present invention and the metal for the external connection parts 25a, 25b of the leads 21a, 21b in this embodiment are simultaneously formed in the pattern shown. The metal film 60 surrounds the display section 20 from 1 to 3.
It is formed into a frame-like pattern with a narrow width of mm.

【0023】この実施例では封止用の低融点金属として
はんだを用いるので、金属膜60用の金属としては裏側
電極膜26に適する例えばアルミの下側電極膜61の上
にはんだと相合性の良好な例えばニッケルの薄い上側電
極膜62を重ねた複合膜構成とする。上側電極膜62と
してはこのニッケルのかわりに,またはそれと重ねて銅
や金等を用いることができ、とくに金は無電解めっきや
電解めっき法によりニッケルの上にごく薄く重ねてはん
だ付け性を向上するのに有利である。
In this embodiment, solder is used as the low melting point metal for sealing, so the metal for the metal film 60 is a metal suitable for the back electrode film 26, for example, on the lower electrode film 61 of aluminum, which is compatible with the solder. A composite film structure is used in which thin upper electrode films 62 of good quality, for example, nickel are stacked. For the upper electrode film 62, copper, gold, etc. can be used instead of or in addition to this nickel. In particular, gold can be layered very thinly on nickel by electroless plating or electrolytic plating to improve solderability. It is advantageous to do so.

【0024】封止板40の材料は気密性が高いものであ
ればよいのでとくに絶縁物である必要はないが、実際は
絶縁基板10と同様なガラス板を用いるのが熱膨張係数
を揃える上で望ましく、本発明方法のためにその周縁部
に設ける金属膜60も絶縁基板10側と同じ複合膜構成
とするのがよく、もちろん絶縁基板10側と同じパター
ンに形成する必要がある。この金属膜60は絶縁基板1
0側と同様に封止板40に全面被着した金属のフォトエ
ッチングにより形成され、あるいはパターンが簡単なの
でメタルマスクを用いるスパッタ法等により枠状パター
ンで被着される。
The material of the sealing plate 40 does not need to be an insulator as long as it has high airtightness, but in reality, it is best to use a glass plate similar to the insulating substrate 10 in order to make the thermal expansion coefficients the same. Preferably, the metal film 60 provided on the peripheral edge of the metal film 60 for the method of the present invention should have the same composite film structure as the insulating substrate 10 side, and of course needs to be formed in the same pattern as the insulating substrate 10 side. This metal film 60 is the insulating substrate 1
Similarly to the 0 side, it is formed by photo-etching the metal that is completely deposited on the sealing plate 40, or because the pattern is simple, it is deposited in a frame-like pattern by sputtering using a metal mask or the like.

【0025】封止用の低融点金属70には鉛と錫の4:
6の共晶合金はんだ等を用いることでよく、例えばその
20〜80μmの厚みの箔ないしフィルムを絶縁基板1
0と封止板40の一方, 望ましくは後者の方にはんだ
付けフラックス等により貼着して置くのがよい。はんだ
箔は非常に薄いので、台紙にあらかじめ担持させたもの
をいわゆる転写法により封止板40に移し換えるのが便
利である。あるいは、電解めっき法により低融点金属7
0の薄膜を封止板40側の金属膜60上に成長させても
よい。
The low melting point metal 70 for sealing includes lead and tin.
For example, a foil or film with a thickness of 20 to 80 μm may be used on the insulating substrate 1.
0 and the sealing plate 40, preferably the latter, with soldering flux or the like. Since the solder foil is very thin, it is convenient to carry it on a mount in advance and transfer it to the sealing plate 40 by a so-called transfer method. Alternatively, low melting point metal 7 can be formed by electrolytic plating.
A thin film of 0 may be grown on the metal film 60 on the sealing plate 40 side.

【0026】この低融点金属70を介する絶縁基板10
側と封止板40側の金属膜60の接合による封止は 1
80〜250 ℃,この実施例では 200℃程度の温
度下でなされる。このため適宜な金属の治具内に絶縁基
板10と封止板40を重ね合わせて位置決めし、例えば
熱板上に治具を置いて低融点金属70を溶融させること
により1分程度の短時間内に接合を完了できる。赤外線
やレーザ光のビームの照射により金属膜60を介して低
融点金属70を局部加熱することでもよい。
Insulating substrate 10 via this low melting point metal 70
The sealing by joining the metal film 60 on the side and the sealing plate 40 side is 1
It is carried out at a temperature of 80 to 250°C, approximately 200°C in this example. For this purpose, the insulating substrate 10 and the sealing plate 40 are superimposed and positioned in a suitable metal jig, and the jig is placed on a hot plate to melt the low melting point metal 70 for a short time of about 1 minute. The joining can be completed within 24 hours. Alternatively, the low melting point metal 70 may be locally heated through the metal film 60 by irradiation with an infrared ray or laser beam.

【0027】なお、この接合は絶縁基板10と封止板4
0の間の表示部20を閉じ込める空間内を清浄に保つた
めによく乾燥した窒素等の不活性ガスふん囲気内でする
のがよく、このためには例えば上述の治具に窒素ガス等
を供給した状態で接合するのが有利である。このように
低融点金属70を加熱溶融させて接合を終えた後は、図
1(a)に示す封止板40の小孔41を接着剤42等で
塞ぎ例えば紫外線硬化させることにより表示パネル30
の封止が完了する。
Note that this bonding is performed between the insulating substrate 10 and the sealing plate 4.
In order to keep the space that confines the display unit 20 between 0 and 0 clean, it is best to do this in an atmosphere filled with a well-dried inert gas such as nitrogen. It is advantageous to join the parts in the same state. After the low melting point metal 70 is heated and melted to complete the bonding, the small holes 41 of the sealing plate 40 shown in FIG.
The sealing is completed.

【0028】以上のようにして封止された表示パネル3
0では、絶縁膜50がリード21a, 21bおよびそ
れらの相互間の絶縁基板10の表面によく密着して凹凸
面を高い気密性で封止する。また、スパッタ法等により
被着された金属膜60は絶縁膜50と封止板40の表面
とよく密着して相互間を気密に封止する。絶縁基板10
の表面のリード21aや21bによる細かな凹凸は絶縁
膜50と金属膜60によって平坦化されて金属膜60の
接合面がほぼ完全に平坦になるので、この絶縁基板10
側と封止板40側の金属膜60相互間の低融点金属70
の加熱溶融による接合ないしはんだ付けが容易かつ確実
になされて高気密性の封止が確実に得られる。
Display panel 3 sealed as described above
0, the insulating film 50 is in close contact with the leads 21a, 21b and the surface of the insulating substrate 10 between them, and seals the uneven surface with high airtightness. Further, the metal film 60 deposited by sputtering or the like is in close contact with the surfaces of the insulating film 50 and the sealing plate 40, thereby airtightly sealing the space between them. Insulating substrate 10
The fine irregularities on the surface of the insulating substrate 10 caused by the leads 21a and 21b are flattened by the insulating film 50 and the metal film 60, and the bonding surface of the metal film 60 becomes almost completely flat.
Low melting point metal 70 between the metal film 60 on the side and the sealing plate 40 side
Bonding or soldering by heating and melting can be easily and reliably performed, and a highly airtight seal can be reliably obtained.

【0029】この第1実施例により 150x220 
mmの寸法をもつ表示パネル30を封止した結果では、
絶縁基板10と封止板40の間で6kgの高い接合強度
が得られた。また、この表示パネル30の内部空間に1
気圧のヘリウムを封入してその漏洩を試験した結果では
検出可能な漏洩はなく、従来に比べて格段に高い気密性
が得られた。
According to this first embodiment, 150x220
The result of sealing the display panel 30 with dimensions of mm is as follows:
A high bonding strength of 6 kg was obtained between the insulating substrate 10 and the sealing plate 40. Moreover, in the internal space of this display panel 30,
Testing for leakage by filling the chamber with helium at atmospheric pressure showed that there was no detectable leakage, and airtightness was significantly higher than in the past.

【0030】次に、図2を参照して本発明方法の第2実
施例を説明する。図2(a) と(b) は表示パネル
30を図1(a) と(b) にそれぞれ対応する方向
で切った断面図である。この実施例の第1実施例と異な
るところは、表示部20の裏側電極膜25を保護膜26
で覆い、これを金属膜60の下側にまで延出させて絶縁
膜80とする点にある。この保護膜26と絶縁膜80に
は緻密な膜質で気密性にとくに優れる例えば窒化シリコ
ンを用いるのが望ましく、これをプラズマCVD法等に
より 0.5〜1μmの膜厚に成膜するのがよい。
Next, a second embodiment of the method of the present invention will be described with reference to FIG. 2A and 2B are cross-sectional views of the display panel 30 taken in directions corresponding to FIGS. 1A and 1B, respectively. The difference between this embodiment and the first embodiment is that the back electrode film 25 of the display section 20 is replaced by a protective film 26.
The insulating film 80 is formed by covering the metal film 60 with a metal film 60 and extending it to the underside of the metal film 60 . For the protective film 26 and the insulating film 80, it is desirable to use, for example, silicon nitride, which has a dense film quality and is particularly excellent in airtightness, and is preferably formed to a thickness of 0.5 to 1 μm by a plasma CVD method or the like. .

【0031】また、この絶縁膜80の上側に設ける金属
膜60はこの実施例では裏側電極膜25用の金属とは別
個に形成する必要があり、このため例えば封止板40側
の金属膜60用と同じメタルマスクを用いて被着される
ので、この金属膜60には裏側電極膜25用とは別個に
低融点金属70と相合性が良好な銅等の金属を用いるの
が有利であり、もちろん必要に応じこれに薄いニッケル
膜等を重ねた図示のような複合膜とすることができる。 さらに、図2(a) に示すように、図1の表示部20
の透明電極膜21用のITO等を用いるリード21aの
かわりに、裏側電極膜25用の金属を延出してリード2
5cおよびその外部接続部として用いることができる。
Further, in this embodiment, the metal film 60 provided on the upper side of the insulating film 80 needs to be formed separately from the metal for the back side electrode film 25. Therefore, for example, the metal film 60 on the sealing plate 40 side It is advantageous to use a metal such as copper that has good compatibility with the low melting point metal 70 for this metal film 60, separately from that for the back electrode film 25, since it is deposited using the same metal mask as that used for the metal film 60. Of course, if necessary, a thin nickel film or the like can be superimposed on this to form a composite film as shown in the figure. Furthermore, as shown in FIG. 2(a), the display section 20 of FIG.
Instead of the lead 21a made of ITO or the like for the transparent electrode film 21, a metal for the back side electrode film 25 is extended and the lead 21a is made of ITO or the like.
5c and its external connection.

【0032】以上からわかるように、この第2実施例で
は絶縁基板10に絶縁膜80と金属膜60を作り込むに
要する工程数が第1実施例より若干増えるが、表示部2
0を保護膜26と封止板40によって二重に封止し、か
つ金属膜60に低融点金属70との接合に最も適する金
属を用いて封止効果を一層高めることができる。
As can be seen from the above, in this second embodiment, the number of steps required to form the insulating film 80 and the metal film 60 on the insulating substrate 10 is slightly increased compared to the first embodiment.
The sealing effect can be further enhanced by doubly sealing 0 with the protective film 26 and the sealing plate 40, and using a metal most suitable for bonding to the low melting point metal 70 for the metal film 60.

【0033】なお以上の説明からわかるように、本発明
は上述の実施例に限らず種々の態様で実施をすることが
できる。上述の封止用の絶縁膜や金属膜の材料や寸法は
あくまで例示であり、必要ないし場合に応じて適宜に選
択すべきものである。また、それらを表示部の電極膜や
絶縁膜と共用する際の具体構造やパターンについても同
様に種々な選択が可能である。
As can be seen from the above description, the present invention is not limited to the embodiments described above, but can be implemented in various forms. The materials and dimensions of the above-mentioned sealing insulating film and metal film are merely examples, and should be appropriately selected depending on necessity or circumstances. Furthermore, various choices can be made regarding the specific structure and pattern when these are used in common with the electrode film and insulating film of the display section.

【0034】[0034]

【発明の効果】以上説明したとおり本発明方法では、表
示パネルの絶縁基板上に組み込まれた表示部をパネルの
裏面側から封止板により封止するに際し、絶縁基板の周
縁部に表示部から導出されたリードの上にその外部接続
部を外側に露出させるように、絶縁膜と,表示部を囲む
環状パターンの金属膜とを順次被覆し、封止板側にその
周縁部の絶縁基板側の金属膜に対応するパターンで金属
膜を被覆し、絶縁基板側と封止板側の金属膜を低融点金
属を介して低温加熱下で接合することによって、次の効
果を上げることができる。
[Effects of the Invention] As explained above, in the method of the present invention, when sealing the display part incorporated on the insulating substrate of the display panel with the sealing plate from the back side of the panel, An insulating film and a metal film in an annular pattern surrounding the display area are sequentially coated on the lead-out leads so as to expose their external connection parts to the outside, and the insulating substrate side of the periphery is coated on the sealing plate side. The following effects can be achieved by coating a metal film with a pattern corresponding to the metal film and bonding the metal films on the insulating substrate side and the sealing plate side via a low melting point metal under low temperature heating.

【0035】(a) 絶縁基板と封止板の間を気密性の
高い金属で封着するので封着部を通して外気が侵入する
おそれがほとんどなく、従来の封止方法,とくに樹脂封
止方法と比べて封止効果が格段に高い。
(a) Since the insulating substrate and the sealing plate are sealed with a metal with high airtightness, there is almost no risk of outside air entering through the sealed portion, and compared to conventional sealing methods, especially resin sealing methods. The sealing effect is extremely high.

【0036】(b) 封着部を介してリードを外側に導
出するために生じる封止面の細かな凹凸を絶縁膜で埋め
て封止するので、凹凸面の隅に封止欠陥が生じるおそれ
が少なく封止の信頼性を向上できる。また、絶縁膜によ
り凹凸面が平坦化されるので金属による封着の信頼性も
向上する。
(b) Since the fine irregularities on the sealing surface caused by leading the leads to the outside through the sealing part are filled with an insulating film for sealing, there is a risk that sealing defects may occur at the corners of the irregular surface. The reliability of sealing can be improved by reducing the amount of damage. Furthermore, since the uneven surface is flattened by the insulating film, the reliability of metal sealing is also improved.

【0037】(c) 封着材として低融点金属を用いて
低温下の接合により絶縁基板と封止板を封着するので作
業性がよく、封着の信頼性が向上する。また、 400
℃以上の高温を要するガラス封着と比べて封着温度が低
くてよいので、表示パネルの表示特性が高温により劣化
するおそれがない。
(c) Since the insulating substrate and the sealing plate are sealed by low-temperature bonding using a low-melting point metal as the sealing material, workability is good and reliability of sealing is improved. Also, 400
Since the sealing temperature may be lower than that required for glass sealing which requires a high temperature of .degree. C. or higher, there is no risk that the display characteristics of the display panel will deteriorate due to high temperatures.

【0038】(d) 金属膜と低融点金属の金属間接合
により封着するので、ガラス封着の場合と比べて封着面
の欠陥が少なく、封止の信頼性が向上する。
(d) Since the sealing is performed by intermetallic bonding between the metal film and the low melting point metal, there are fewer defects on the sealing surface compared to glass sealing, and the reliability of the sealing is improved.

【0039】(e) 絶縁基板と封止板を金属接合によ
り封着するので両板間の封着ないし接着の強度が非常に
高く、かつ衝撃力に対する耐性も高いので表示パネルの
機械強度を大幅に向上できる。
(e) Since the insulating substrate and the sealing plate are sealed by metal bonding, the strength of the sealing or adhesion between the two plates is extremely high, and the resistance to impact force is also high, so the mechanical strength of the display panel can be greatly increased. can be improved.

【0040】(f) 金属封着なので樹脂封着と比べて
耐熱性が高く、ガラス封着と比べて表示パネルの使用中
の熱応力により封止効果が劣化するおそれがない。
(f) Metal sealing has higher heat resistance than resin sealing, and there is no risk of the sealing effect being degraded by thermal stress during use of the display panel compared to glass sealing.

【0041】このように、本発明は封止効果を高めなが
ら封着作業を容易にし、封止ないし封着面に生じやすい
欠陥を減少させて封止の信頼性を向上し、かつ高い封止
効果を長期に亘って安定に維持し得る効果をもち、表示
パネルの表示特性の劣化防止に貢献することが期待され
る。
As described above, the present invention facilitates the sealing work while enhancing the sealing effect, reduces defects that are likely to occur in the seal or the sealing surface, improves the reliability of the seal, and achieves high sealing. It has the effect of stably maintaining the effect over a long period of time, and is expected to contribute to preventing deterioration of the display characteristics of the display panel.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明による表示パネルの封止方法の第1実施
例を同図(a) と(b) にそれぞれ互いに直角な方
向に切った断面で示す表示パネルの断面図である。
FIGS. 1A and 1B are cross-sectional views of a display panel, each showing a first embodiment of the display panel sealing method according to the present invention, taken in a direction perpendicular to each other; FIGS.

【図2】本発明による表示パネルの封止方法の第2実施
例を同図(a) と(b) にそれぞれ互いに直角な方
向に切った断面で示す表示パネルの断面図である。
FIG. 2 is a cross-sectional view of a display panel showing a second embodiment of the display panel sealing method according to the present invention, taken in a direction perpendicular to each other in FIGS.

【図3】第1実施例による表示パネルの封止に関連する
主な部分の平面的なパターンを同図(a) のリード,
 同図(b) の絶縁膜, および同図(c) の金属
膜につきそれぞれ示す平面図である。
[Fig. 3] The planar pattern of the main parts related to sealing of the display panel according to the first embodiment is shown in Fig. 3(a).
FIG. 4 is a plan view showing the insulating film shown in FIG. 12(b) and the metal film shown in FIG. 10(c), respectively.

【図4】従来の封止方法を示す表示パネルの断面図であ
る。
FIG. 4 is a sectional view of a display panel showing a conventional sealing method.

【符号の説明】[Explanation of symbols]

10      絶縁基板 20      表示パネルの表示部 21a    リード 21b    リード 25a    リードの外部接続部 25b    リードの外部接続部 25c    リード 30      表示パネル 40      封止板 50      絶縁膜 60      金属膜 70      低融点金属 80      絶縁膜 10 Insulating substrate 20 Display section of display panel 21a Lead 21b Lead 25a   External connection part of the lead 25b External connection part of lead 25c lead 30 Display panel 40 Sealing plate 50 Insulating film 60 Metal film 70 Low melting point metal 80 Insulating film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】表示パネルの透明な絶縁基板上に組み込ま
れた表示部をパネルの裏面側に配設される封止板によっ
て封止する方法であって、絶縁基板の周縁部に表示部か
ら導出されたリードの上にその外部接続部を外側に露出
させるように絶縁膜と,表示部を囲む環状パターンの金
属膜とを順次被覆し、封止板側にその周縁部の絶縁基板
側の金属膜に対応するパターンで金属膜を被覆し、絶縁
基板側金属膜と封止板側金属膜を低融点金属を介して低
温加熱下で相互に接合するようにしたことを特徴とする
表示パネルの封止方法。
Claim 1: A method for sealing a display section incorporated on a transparent insulating substrate of a display panel with a sealing plate disposed on the back side of the panel, the method comprising: The lead-out leads are sequentially coated with an insulating film so as to expose their external connection parts to the outside, and a metal film with an annular pattern surrounding the display part is coated on the sealing plate side. A display panel characterized in that the metal film is coated with a pattern corresponding to the metal film, and the metal film on the insulating substrate side and the metal film on the sealing plate side are bonded to each other under low-temperature heating via a low melting point metal. Sealing method.
【請求項2】請求項1に記載の方法において、絶縁膜が
表示部用の絶縁膜と同じ材料で構成され、かつそれと共
通の工程により同時に形成されることを特徴とする表示
パネルの封止方法。
2. The method according to claim 1, wherein the insulating film is made of the same material as the insulating film for the display section and is formed at the same time by a common process. Method.
【請求項3】請求項1に記載の方法において、絶縁基板
側の金属膜の少なくとも一部が表示部用の電極膜と同じ
材料で構成され、かつそれと共通の工程によりただしそ
れとは分離されたパターンに同時に形成されることを特
徴とする表示パネルの封止方法。
3. The method according to claim 1, wherein at least a part of the metal film on the insulating substrate side is made of the same material as the electrode film for the display section, and is separated from it by a common process. A method for sealing a display panel, characterized in that a pattern is formed at the same time.
JP3040335A 1991-03-07 1991-03-07 Method for sealing display panel Pending JPH04278983A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3040335A JPH04278983A (en) 1991-03-07 1991-03-07 Method for sealing display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3040335A JPH04278983A (en) 1991-03-07 1991-03-07 Method for sealing display panel

Publications (1)

Publication Number Publication Date
JPH04278983A true JPH04278983A (en) 1992-10-05

Family

ID=12577759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3040335A Pending JPH04278983A (en) 1991-03-07 1991-03-07 Method for sealing display panel

Country Status (1)

Country Link
JP (1) JPH04278983A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6596134B2 (en) 1994-12-13 2003-07-22 The Trustees Of Princeton University Method of fabricating transparent contacts for organic devices
KR100619626B1 (en) * 2004-02-20 2006-09-12 엘지전자 주식회사 Flat panel display device
JP2007017590A (en) * 2005-07-06 2007-01-25 Seiko Epson Corp Liquid crystal device, manufacturing method of liquid crystal device and electronic equipment
JP2007293273A (en) * 2006-03-27 2007-11-08 Citizen Holdings Co Ltd Liquid crystal optical modulation device and manufacturing method thereof
WO2008120452A1 (en) * 2007-03-29 2008-10-09 Fujifilm Corporation Electronic device and method for manufacturing the same
JP2011159630A (en) * 1998-08-03 2011-08-18 Dupont Displays Inc Encapsulation of polymer-based solid state device with inorganic material
JP2011175300A (en) * 2002-01-16 2011-09-08 Seiko Epson Corp Display device and electronic equipment
JP2015069761A (en) * 2013-09-27 2015-04-13 富士フイルム株式会社 Organic electronic device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6596134B2 (en) 1994-12-13 2003-07-22 The Trustees Of Princeton University Method of fabricating transparent contacts for organic devices
JP2011159630A (en) * 1998-08-03 2011-08-18 Dupont Displays Inc Encapsulation of polymer-based solid state device with inorganic material
JP2011175300A (en) * 2002-01-16 2011-09-08 Seiko Epson Corp Display device and electronic equipment
USRE45556E1 (en) 2002-01-16 2015-06-09 Seiko Epson Corporation Display device having a connection area outside the display area
USRE44902E1 (en) 2002-01-16 2014-05-20 Seiko Epson Corporation Display device having a connection area outside the display area
USRE43738E1 (en) 2002-01-16 2012-10-16 Seiko Epson Corporation Display device having a connection area outside the display area
KR100619626B1 (en) * 2004-02-20 2006-09-12 엘지전자 주식회사 Flat panel display device
JP2007017590A (en) * 2005-07-06 2007-01-25 Seiko Epson Corp Liquid crystal device, manufacturing method of liquid crystal device and electronic equipment
JP2007293273A (en) * 2006-03-27 2007-11-08 Citizen Holdings Co Ltd Liquid crystal optical modulation device and manufacturing method thereof
US7889307B2 (en) 2006-03-27 2011-02-15 Citizen Holdings Co., Ltd. Liquid crystal optical modulator and the process for producing the same
JP2008251242A (en) * 2007-03-29 2008-10-16 Fujifilm Corp Electronic device and its manufacturing method
WO2008120452A1 (en) * 2007-03-29 2008-10-09 Fujifilm Corporation Electronic device and method for manufacturing the same
JP2015069761A (en) * 2013-09-27 2015-04-13 富士フイルム株式会社 Organic electronic device

Similar Documents

Publication Publication Date Title
US5827102A (en) Low temperature method for evacuating and sealing field emission displays
KR101535316B1 (en) Frit sealing of large device
US4954746A (en) Thin film electroluminescence displaying apparatus
JPS61114492A (en) Sealed wrapping body for thin film apparatus
US4599538A (en) Electroluminescent display device
JPH04278983A (en) Method for sealing display panel
US4106860A (en) Liquid-crystal cell
JP2001189191A (en) Sealing plate for organic el display element and sealing method
JP2002526884A (en) Method of manufacturing a component and a component
JPH043609A (en) Oscillator
JPH06151642A (en) Ic package
EP0105408B1 (en) Electroluminescent display
JP2587819Y2 (en) Fluorescent display
US20060232188A1 (en) Flat image display device
JPS62259329A (en) Fluorescent character display tube
KR100786828B1 (en) Flat panel display device and manufacturing method of the same
JPH0551158B2 (en)
JP2002184330A (en) Image display device and its manufacturing method
JPH0766237B2 (en) Display panel manufacturing method
JP2871496B2 (en) Manufacturing method of flat fluorescent lamp
JPH01195602A (en) Panel with electroluminescence layer
JPH0620627A (en) Fluorescent character display tube
JPH1021860A (en) Field emission display
JPH05174733A (en) Vacuum vessel for flat plate type display device
JPH0521626A (en) Manufacturing method of metal lid