JPH04278919A - Liquid crystal display element - Google Patents

Abstract

PURPOSE:To provide the liquid crystal display element which hardly generates the electric discharge between transparent electrodes and has uniform orientability. CONSTITUTION:The liquid crystal display element constituted by disposing two sheets of transparent electrode substrates 11a, 11b provided with transparent electrode layers formed with plural band-shaped transparent electrodes in a stripe shape, insulating films consisting of an inorg. compd. and oriented films in this order on substrates in such a manner that the respective oriented films are positioned on the inner side and sealing a liquid crystal 17 therebetween is constituted of the liquid crystal display element formed with the insulating film 15b only on the wall surfaces on both sides of the band-shaped transparent electrodes 14b and the liquid crystal display element which has the above- mentioned constitution and with which the thickness of the insulating film on the wall surfaces on both sides of the band-shaped transparent electrodes is larger than the film thickness of the front surface part of the band-shaped transparent electrodes and larger than the film thickness between the band- shaped transparent electrodes.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display element having an insulating film.

0002

[Prior Art] Liquid crystal display elements conventionally used in watches, computers, word processors, etc.
Its basic structure is usually such that two transparent electrode substrates each having an alignment film provided on a transparent electrode are arranged with the alignment film inside, and a liquid crystal is sealed between them. The transparent electrodes of such liquid crystal display elements are generally formed in the form of display patterns such as stripes or grids on a substrate, and the alignment film is formed on the transparent electrodes and the exposed substrate (other than the display pattern). It is provided on the entire surface by coating or vapor deposition. These two transparent electrode substrates are each arranged with the alignment film on the inside, and liquid crystal is sealed between them to produce a liquid crystal display element. Generally, the alignment film is provided because it is necessary to align, or align, the liquid crystals in a certain direction, and thereby aligns the liquid crystal molecules.

The mainstream of such liquid crystal display elements is a twisted nematic (TN) mode display in which a nematic liquid crystal has a twisted structure. However, this TN type liquid crystal display element has a drawback that the response speed is slow, and the response speed is currently limited to 20 milliseconds. In contrast, recently, ferroelectric liquid crystals with high-speed response are expected to open up a new field of displays and are being studied.

Ferroelectric liquid crystals not only respond quickly to changes in electric field, but also assume one of two optically stable states in response to an applied electric field, and remain in one of two optically stable states when no voltage is applied. It also has the property of maintaining its state, that is, memory property (also called bistability). Therefore, with liquid crystal display elements that use ferroelectric liquid crystal, it is only necessary to apply a pulsed voltage when switching between two states, so there is no need for a power supply or electronic circuit to maintain the optical state as in the past. Therefore, power consumption is also reduced compared to conventional liquid crystal display elements. In other words, a liquid crystal display element using ferroelectric liquid crystal can be said to be a liquid crystal display element that has a simple structure and achieves high-speed response.

For example, in a conventional liquid crystal display element (liquid crystal display panel) for a television panel, a transparent electrode layer and an alignment film are laminated in this order on two transparent substrates. These two transparent electrode substrates are arranged so that their respective alignment films face each other,
It has a structure in which liquid crystal such as ferroelectric liquid crystal is sealed between them.

[0006] In the liquid crystal display element described above, the distance between the transparent electrode substrates (cell gap) is extremely narrow, about 2 μm, in order to exhibit the high-speed response characteristic of ferroelectric liquid crystals. Therefore, during the process of manufacturing the above-mentioned element, discharge is likely to occur between the electrodes. In particular, if conductive impurities or dust are mixed into the liquid crystal, a short circuit will occur between the transparent electrodes, and even if a voltage is applied to the pixels, no potential difference will be obtained and display will likely become impossible.

In addition to the demand for shortening the distance between transparent electrode substrates (reducing the gap), there is a demand for an increase in the number of band-shaped transparent electrodes formed on the substrate in order to meet the demand for improving display accuracy. ing. When the number of transparent electrodes is increased in this way, there is a problem in that the space between the electrodes becomes narrower, and discharge between the electrodes becomes more likely to occur.

In general, the above-mentioned transparent electrode is made by patterning a transparent conductive film formed on a substrate into an electrode pattern using a photoresist, removing unnecessary conductive film with an etching solution, and then forming a transparent conductive film on the obtained transparent electrode. It is formed by removing the photoresist. Such a band-shaped transparent electrode has an angular shape at both ends, and it has been thought that discharge is likely to occur between the electrodes due to this reason.

[0009] In order to solve the above problem, Japanese Unexamined Patent Publication No. 2-2
Japanese Patent No. 72428 proposes rounding both raised ends, ie, corners, of a band-shaped transparent electrode by immersing them in an etching solution. As a result, there are no partially short distances between the upper and lower electrodes, and the above-mentioned discharge can be prevented.

However, although the above method can considerably prevent discharge between the upper and lower electrodes, it can hardly prevent discharge between adjacent electrodes.

Furthermore, JP-A-54-143246 discloses a liquid crystal display element in which an insulating film made of SiO2, ceramic, etc. is formed on the transparent electrode (between the transparent electrode and the alignment film) for the purpose of preventing discharge. is disclosed. Although the formation of such an insulating film is effective in preventing discharge, it also impairs the uniform alignment of liquid crystals, such as deteriorating the above-mentioned memory property (bistability), which is the most important feature of ferroelectric liquid crystals. There is a problem with interference.

[0012] Therefore, discharge between the transparent electrodes is difficult to occur,
Moreover, a liquid crystal display element that does not impede good alignment of liquid crystal is desired.

[0013]

SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid crystal display element in which almost no discharge occurs between transparent electrodes. Another object of the present invention is to provide a liquid crystal display element having uniform alignment. A further object of the present invention is to provide a liquid crystal display element in which the surface of the transparent electrode substrate is smooth and further transparent electrodes can be laminated thereon.

[0014]

[Means for solving the problem] The above purpose is to
Two transparent electrode substrates each having a transparent electrode layer in which a plurality of strip-shaped transparent electrodes are arranged in parallel, an insulating film made of an inorganic compound, and an alignment film are provided in this order, each with the alignment film inside. However, in a liquid crystal display element formed by sealing a liquid crystal between them, an insulating film is formed on the wall surfaces on both sides of a band-shaped transparent electrode (
A), and two transparent electrode substrates on which a transparent electrode layer in which a plurality of band-shaped transparent electrodes are arranged in parallel, an insulating layer made of an inorganic compound, and an alignment film are provided in this order, In a liquid crystal display element in which an alignment film is placed on the inside and a liquid crystal is sealed in between, the thickness of the insulating film on the wall surfaces on both sides of the strip-shaped transparent electrode is greater than the film thickness on the top surface of the strip-shaped transparent electrode. This can be achieved by using a liquid crystal display element (B) that is thick and thicker than the film thickness of the region between the strip-shaped transparent electrodes.

Preferred embodiments of the liquid crystal display element of the present invention are as follows.

1) The thickness of the insulating film is 25 to 500 nm.
The above liquid crystal display element (A) characterized in that it is in the range of
.

2) The above-mentioned liquid crystal display element (A) characterized in that no insulating film is provided on the upper surface of the band-shaped transparent electrode and the area between the band-shaped transparent electrodes.

3) The above-mentioned liquid crystal display element (B), wherein the thickness of the insulating film on both side walls of the band-shaped transparent electrode is in the range of 25 to 500 nm.

4) The above-mentioned liquid crystal display element (B), wherein the thickness of the insulating film on the upper surface of the band-shaped transparent electrode and the area between the transparent electrodes is in the range of 10 to 200 nm.

5) The ratio of the thickness of the insulating film on both side walls of the strip-shaped transparent electrode to the thickness of the upper surface of the strip-shaped transparent electrode is in the range of 99:1 to 60:40. The above liquid crystal display element (B).

6) The above liquid crystal display elements (A) and (B), characterized in that a transparent electrode layer and an insulating film are further provided in this order on the insulating film.

7) The above liquid crystal display elements (A) and (B), wherein the insulating film is formed of an inorganic oxide.

8) The material of the insulating film is SiO2, Si
The above liquid crystal display element (A) characterized in that it is any one of O, TiO2, Al2O3 and ZrO2.
and (B).

9) The liquid crystal display elements (A) and (B) above, wherein the insulating film is formed by anisotropic plasma etching of a deposited film of an inorganic compound.

[0025]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of a liquid crystal display element according to the present invention will be explained with reference to the accompanying drawings.

FIG. 1 is a sectional view of an example of the liquid crystal display element (A) of the present invention.

A black matrix 12b, color filters (R (red), G
(consisting of green), B (blue)) 13a, 13b
, a transparent electrode layer 14b in which band-shaped transparent electrodes 14a are arranged in parallel, an insulating film 15b, and alignment films 16a and 16b are laminated in this order to constitute two transparent electrode substrates. Two of the above-mentioned transparent electrode substrates are arranged with their alignment films facing inside, and liquid crystal 17 is sealed between them. The insulating film 15b is formed on the wall surfaces on both sides of the transparent electrode 14b. The black matrix (corresponding to 12a) and the insulating film (corresponding to 15a) formed on the transparent substrate 11a are not shown because the upper and lower transparent electrode substrates are arranged to be perpendicular to each other.

Since FIG. 1 is an example of a cross-sectional view of a liquid crystal display element for color display, a black matrix and a color filter are shown, but of course they are not necessary unless it is for color display.

The insulating film 15b, which is a characteristic feature of the present invention, is formed only on the wall surfaces on both sides of the band-shaped transparent electrode 14b. No or substantially no insulating film is present on the upper surface of the transparent electrode and the color filter between the transparent electrodes.

FIG. 2 is a partially enlarged sectional view showing the vicinity of the insulating film of the liquid crystal display element (A) of FIG.

Insulating films 15b are formed on both side walls of the band-shaped transparent electrode 14b. The thickness of the insulating film is the vertical distance T from the side wall surface of the transparent electrode, and T is 25 to 500 nm.
It is preferably in the range of 50 to 200 nm, especially 50 to 200 nm.
It is preferable that it is in the range of . In this way, the transparent electrode 14
Insulating films 15b are formed on the walls on both sides of the transparent electrodes 15b, and the corner portions of the transparent electrodes are covered with the insulating films, so that almost no discharge occurs between adjacent transparent electrodes. In addition, discharge between the upper and lower transparent electrodes is difficult to occur due to the presence of insulating films on both side wall surfaces. Furthermore, since the surface is considerably smoothed by forming the insulating film, the alignment film 16b provided thereon also becomes smooth, and the alignment state of the liquid crystal tends to be uniform.

FIG. 3 is a sectional view of an example of the liquid crystal display element (B) of the present invention.

[0033] On the transparent substrates 31a, 31b, a black matrix 32b, color filters 33a, 33b,
A transparent electrode layer in which band-shaped transparent electrodes 34a, 34b are arranged in parallel, insulating films 35a, 35b, and alignment films 36a, 3
6b are laminated in this order to form two transparent electrode substrates. Two of the above transparent electrode substrates are arranged with their alignment films facing inside, and a liquid crystal 37 is sealed between them. The black matrix (corresponding to 32a) formed on the transparent substrate 31a is not shown because the upper and lower transparent electrode substrates are arranged to be perpendicular to each other.

Since FIG. 3 is an example of a cross-sectional view of a liquid crystal display element for color display, a black matrix and a color filter are shown, but of course they are not necessary unless the display is for color display.

The insulating film 35b, which is a characteristic feature of the present invention, is formed with a large thickness on both side walls of the transparent electrode 34b, and is formed on the upper surface of the transparent electrode 34b and the color filter between the transparent electrodes 34b. It is provided with a thinner film thickness than the wall surfaces on both sides.

FIG. 4 is a partially enlarged sectional view showing the vicinity of the insulating film of the liquid crystal display element (B) of FIG.

An insulating film 35b is shown formed on the entire surface of the band-shaped transparent electrode 34b. Insulating film 35b
is formed with a thick film thickness on the wall surface portions on both sides of the transparent electrode 34b, and is formed with a thin film thickness than the wall surface portions on both sides on the upper surface portion of the transparent electrode 34b and on the color filter between the transparent electrodes 34b. The thickness of the insulating film on the wall surfaces on both sides of the transparent electrode is the vertical distance T3 from the wall surface, and T3 is 25 to 5.
It is preferably in the range of 00 nm, especially 50 to 20 nm.
It is preferably in the range of 0 nm. The thickness of the insulating film on the upper surface of the transparent electrodes and the thickness of the insulating film on the color filter (substrate) between the transparent electrodes are preferably in the range of 10 to 200 nm. The thickness of the insulating film on the upper surface of the transparent electrode and the thickness of the insulating film on the color filter (substrate) between the transparent electrodes are substantially the same. Further, the ratio of the thickness of the insulating film on both side walls of the transparent electrode to the thickness of the substrate surface between the band-shaped transparent electrodes is preferably in the range of 99:1 to 60:40, more preferably 99:1 to 60. : It is preferable that it is in the range of 40.

In this way, the liquid crystal display element (B) has the insulating film 35 formed on both side walls of the band-shaped transparent electrode 34b, and also has a thin insulating film on the transparent electrode and on the substrate surface between the transparent electrodes. Since the film is formed, not only almost no discharge occurs between adjacent transparent electrodes, but also almost no discharge occurs between the upper and lower substrates even when the gap between the transparent electrode substrates is small. Further, since the surface is considerably smoothed by forming the insulating film, the alignment film provided thereon also becomes smooth, and the alignment state of the liquid crystal tends to be uniform. Furthermore, even if a transparent electrode and an insulating film are further formed on this smoothed insulating film, since the underlying layer is smooth, the transparent electrodes can be arranged uniformly, making it possible to increase the number of electrodes, resulting in high image quality. It can also be used for display.

The liquid crystal display element of the present invention is not limited to those shown in FIGS. 1 to 4, and can be modified in any manner that is used for ordinary liquid crystal display elements, such as using a spacer or providing a polarizing plate. be. In particular, it is preferable to use a spacer to ensure a gap between both alignment films (ie, the thickness of the liquid crystal layer). As a spacer,
Glass fibers, glass beads, plastic beads, and metal oxide particles such as alumina and silica are used. The particle size of the spacer varies depending on the liquid crystal used, the alignment film material, the setting of the cell gap, the particles used as the spacer, etc., but is generally 1.2 μm to 6 μm.

The transparent substrate, black matrix, color filter, transparent electrode, insulating film, alignment film, liquid crystal, etc. used in the liquid crystal display element of the present invention are all known materials that have been conventionally used in liquid crystal display elements. can.

Next, an example of manufacturing the liquid crystal display element of the present invention will be described in order. The material for the transparent substrate is
In addition to glass such as float glass with good smoothness, polyesters such as polyethylene terephthalate and polybutylene terephthalate, epoxy resins, phenol resins, polyimides, polycarbonates, polysulfones, polyethersulfones, polyetherimides, acetyl cellulose, polyamino acid esters, and aromas. Plastics made from heat-resistant resins such as polyamides, vinyl polymers such as polystyrene, polyacrylic esters, polymethacrylic esters, polyacrylamide, polyethylene, polypropylene, fluorine-containing resins such as polyvinylidene fluoride, and modified products thereof. Films can be mentioned.

Examples of the material for the transparent electrode provided on the transparent substrate include indium oxide (In2O3), tin oxide (SnO2), and ITO (indium tin oxide). The transparent electrode is formed in stripes on the substrate.

Examples of the material of the insulating film of the present invention provided on the transparent electrode include SiO2, SiO, and TiO2.
, Al2O3, ZrO2, CeO2, cerium bromide, tungsten oxide, magnesium fluoride, calcium fluoride, silicon nitride, and other inorganic compounds. Among these, inorganic oxides are preferred, with SiO2, SiO, TiO2, Al2 O3 and ZrO2 being particularly preferred. The above compounds may be used alone or in combination of two or more.

The method for forming an insulating film according to the present invention will be explained in detail with reference to FIG.

FIG. 5A shows a cross-sectional view of a transparent electrode substrate in which a black matrix 52, a color filter 53, and a band-shaped transparent electrode 54 are laminated in this order on a transparent substrate 51.

[0046] An inorganic vapor deposited film (an insulating film before etching treatment) is formed on the transparent electrode substrate by sputtering or the like the inorganic compound that is the insulating film material.

In other words, the inorganic vapor deposited film can be formed by conventional inorganic compound film forming methods such as a vacuum vapor deposition method using resistance heating, a vacuum vapor deposition method using electron beam (EB) heating, a sputtering method, and an ion plating method. etc. can be used. The thickness of the inorganic vapor deposited film is generally 2
The range is from 5 to 500 nm, preferably from 50 to 200 nm.

FIG. 5(b) shows (a) as described above.
This shows a state in which an inorganic vapor deposited film 55 is formed on a transparent electrode substrate. That is, since the inorganic vapor deposited film is formed by a vacuum evaporation method or a sputtering method, it is formed with approximately the same thickness on the upper surface portion of the transparent electrode, the side wall portion, and the portion between the transparent electrodes. Therefore, the inorganic vapor deposited film is formed thickly on the side wall surface of the transparent electrode, which is effective in preventing discharge, but it is also formed thickly in other parts. For this reason,
Although a discharge prevention effect can be obtained, the formation of uniform alignment of liquid crystals is inhibited.

In the present invention, the above-mentioned inorganic vapor deposited film is mainly formed on both side wall surfaces of the transparent electrode, and this is used as an insulating film. The insulating film of the present invention further includes the upper surface of the inorganic vapor deposited film 55.
It is formed by removal by anisotropic plasma etching.

Plasma etching generally includes a method using a cylindrical type device and a method using a parallel plate type device, and anisotropic plasma etching is performed using a parallel plate type device. A parallel plate type device applies a high frequency voltage (generally 13.56 MHz) to one side through a capacitor,
This device has a parallel plate electrode structure with the other side grounded. In a parallel plate type device, electrons in the plasma accumulate on an insulated electrode to which a high frequency voltage is applied or on the surface of the object to be etched (the surface of an inorganic vapor deposited film), and the device is self-biased to a negative potential. Usually the reaction gas pressure inside the device is 10-3 to 10-2 Torr.
It will be held at r. This stored electron creates an ion sheath on these surfaces (because the mobility of electrons is much greater than that of ions). This bias voltage (cathode drop voltage) is approximately 500V to 1kV. Ions accelerated by this voltage etch the surface of the object to be etched (the surface of the inorganic vapor deposited film) on the electrode, so that so-called anisotropic etching with directionality can be performed. Regarding anisotropic plasma etching, see "Semiconductor Plasma Process Technology" (published by Sangyo Tosho, 218-2).
(page 21).

The anisotropic plasma etching of the inorganic vapor deposited film 55 is performed by applying a high frequency voltage of 13.56 MHz using, for example, the parallel plate type device described above, and using a reactive gas (eg, CHF).
3, C2 F6, CF4, optionally further O2
The insulating film shown in (c-A) of FIG. 5 can be formed by performing the process at a pressure of 10 -3 Torr for 1 to 15 minutes.

FIG. 5(c-A) shows an insulating film of the present invention obtained by subjecting the inorganic vapor deposited film 55 to the above-described anisotropic plasma etching.

FIG. 5(c-A) shows that on the transparent substrate 51,
A cross-sectional view showing an example of the liquid crystal display element (A) of the present invention, in which a black matrix 52, a color filter 53, and a band-shaped transparent electrode 54 are laminated in this order, and an insulating film 55a is formed on a transparent electrode substrate. be.

Further, the inorganic vapor deposited film 55 was subjected to a high frequency voltage of 13.56 MHz using the parallel plate type device described above.
and reactant gas (e.g. CHF3, C2 F6,
CF4, additional O2 if desired) pressure 1
By performing anisotropic plasma etching at 0-3 Torr for 0.5-15 minutes, the insulating film shown in FIG. 5(c-B) is formed.

FIG. 5(c-B) shows that on the transparent substrate 51,
A transparent electrode layer in which a black matrix 52, a color filter 53, and a band-shaped transparent electrode 54 are arranged in parallel,
It is a sectional view showing an example of the liquid crystal display element (B) of the present invention in which an insulating film 55a is formed on the transparent electrode substrates laminated in this order.

As described above, by performing the anisotropic plasma etching process on the inorganic vapor deposited film 55, the inorganic vapor deposited film is etched only in the vertical direction. As the etching progresses, the state shown in (c-B) in Figure 5, that is, the insulating film on both side walls of the transparent electrode becomes quite thick, and even the upper surface of the band-shaped transparent electrode and the surface of the color filter (substrate) between the transparent electrodes are insulated. The film has a certain layer thickness. Then, as the etching progresses further, the state shown in FIG. 5(c-A) is reached, that is, the state where the insulating film remains only on the wall surfaces on both sides of the transparent electrode.

After forming the above insulating film, an alignment film is provided thereon. Examples of alignment films include polymer films such as polyimide, polyvinyl alcohol, and polyamide (nylon), films formed by rubbing an organic silane compound, and SiO2 formed by vacuum evaporation.
, SiO, TiO2, and the like.

To form the above-mentioned organic alignment film such as a polymer, first, a coating solution for forming an alignment film is mixed with a conventional alignment film material such as polyimide and its precursor polyamic acid, polyamide, polyvinyl alcohol, polyimide amide, etc. A solution is prepared by dissolving a known polymer material in an appropriate solvent such as N-methyl-2-pyrrolidone, dioxane, THF, or a glycol derivative. In addition to the above-mentioned components, this coating solution may contain other subcomponents such as high molecular weight polymers and organic metals for the purpose of increasing adhesion to the substrate or adjusting the viscosity of the coating solution. good.

[0059] The above coating solution for forming an alignment film is applied onto the insulating film or transparent electrode of the present invention provided on a transparent substrate by a conventional method using a spin coater or the like, dried, and heat-treated to form an organic coating film. can be formed.

The coating film provided on the insulating film or the transparent electrode substrate is heated and then rubbed with synthetic fibers such as nylon, polyester, and polyacrylonitrile, and natural fibers such as cotton and wool. be done. This forms an alignment film. As the material for the above-mentioned alignment film, the above-mentioned organic polymer is used in the case of coating, and the above-mentioned inorganic compound is used in the case of vapor deposition. The thickness of the alignment film varies depending on the liquid crystal used and the type of alignment film, but is generally 20 to 500 mm thick.
nm, preferably 30 to 100 nm.

Further, as the liquid crystal used in the present invention, conventionally known liquid crystals can be used. Specifically, the liquid crystal having ferroelectricity is chiral smectic C phase (Sm
C*), H phase (SmH*), I phase (SmI*),
J phase (SmJ*), K phase (SmK*), G phase (Sm
G*) or F phase (SmF*). These can be found, for example, in "High-speed Liquid Crystal Technology" (published by CMC), p. 127-161.

[0062] Specific liquid crystal compositions include CS-1018, CS-1023, and CS- manufactured by Chisso Corporation.
1025, CS-1026, DO manufactured by Roddick Co., Ltd.
F0004, DOF0006, DOF0008, ZLI-4237-000, ZLI-4237- manufactured by Merck & Co.
100, ZLI-4654-100, etc., but are not limited thereto. There is no problem in adding dichroic dyes, viscosity reducers, etc. which are soluble in the liquid crystal to these liquid crystals.

[0063] A pair of transparent electrode substrates each having at least one of the transparent electrode substrates made of a transparent substrate, a transparent electrode, an insulating film, and an alignment film manufactured as described above are arranged so that the alignment film is on the inside, and the gap is closed. Open and face each other to form a cell. The size of this gap, or cell gap, is 0.5
Generally, the thickness is about μm to 6 μm. Next, a liquid crystal such as a ferroelectric liquid crystal is injected into the cell, sealed, and then slowly cooled.

The liquid crystal display element of the present invention can be manufactured in the manner described above. Of course, the liquid crystal display element of the present invention can be provided with structures provided in conventional liquid crystal display elements, such as a polarizing plate, a reflection plate, and a retardation plate, depending on the purpose of use.

[0065]

Effects of the Invention In the liquid crystal display element of the present invention, an insulating film made of an inorganic compound is formed on both side walls of a band-shaped transparent electrode, and an insulating film is formed on the substrate surface on the transparent electrode and between the transparent electrodes. Either it is not formed, or even if it is formed, it is formed with a much thinner film thickness than the walls on both sides. Since insulating films are formed on both side walls of the band-shaped transparent electrode and the corners of the transparent electrode are covered with the insulating film, almost no discharge occurs between adjacent transparent electrodes. Furthermore, discharge between the upper and lower transparent electrodes is difficult to occur due to the presence of insulating films on both side wall surfaces. Furthermore, since the surface is considerably smoothed by forming the insulating film, the alignment film provided thereon also becomes smooth, and the alignment state of the liquid crystal tends to be uniform. In addition, if an insulating film is formed on the walls on both sides of the transparent electrode, and a thin insulating film is also formed on the transparent electrode and on the substrate surface between the transparent electrodes, discharge between adjacent transparent electrodes will occur as described above. Not only does this hardly occur, but even if the gap between the transparent electrode substrates is made small, almost no discharge occurs between the upper and lower substrates. Furthermore, since the surface is considerably smoothed by forming the insulating film as described above, the alignment film provided thereon also becomes smooth, and the alignment state of the liquid crystal tends to be uniform. Furthermore, even if a transparent electrode and an insulating film are further formed on this smoothed insulating film, the underlying layer is smooth and the transparent electrodes can be arranged uniformly. It is possible to increase the number of electrodes.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional view schematically showing a configuration example of a liquid crystal display element (A) of the present invention.

FIG. 2 is a partially enlarged sectional view of the liquid crystal display element (A) of FIG. 1.

FIG. 3 is a cross-sectional view schematically showing a configuration example of a liquid crystal display element (B) of the present invention.

4 is a partially enlarged sectional view of the liquid crystal display element (B) of FIG. 1. FIG.

FIG. 5 is a cross-sectional view for explaining the method for manufacturing a liquid crystal display element of the present invention.

[Explanation of symbols]

11a, 11b, 31a, 31b, 51: transparent substrate 12
b, 32a, 32b, 52: black matrix 13a
, 13b, 33a, 33b, 53: Color filters 14a, 14b, 34a, 34b, 54: Band-shaped transparent electrodes 15b, 33b, 55a, 55b: Insulating films 16a, 16
b, 36a, 36b: alignment film 17, 37: liquid crystal 55: inorganic vapor deposited film

Claims (2)

[Claims] Claim 1: Two transparent electrode substrates each having a transparent electrode layer formed by a plurality of strip-shaped transparent electrodes arranged in parallel, an insulating film made of an inorganic compound, and an alignment film provided in this order on the substrate. A liquid crystal display element in which an alignment film is placed on the inside and a liquid crystal is sealed between them, wherein an insulating film is formed on the wall surfaces on both sides of a band-shaped transparent electrode. 2. Two transparent electrode substrates each having a transparent electrode layer formed by a plurality of band-shaped transparent electrodes arranged in parallel, an insulating film made of an inorganic compound, and an alignment film provided in this order on the substrate. In a liquid crystal display element in which the alignment film is placed on the inside and liquid crystal is sealed between them, the thickness of the insulating film on the wall surfaces on both sides of the strip-shaped transparent electrode is equal to the thickness of the top surface of the strip-shaped transparent electrode. A liquid crystal display element characterized by being thicker and thicker than the film thickness between band-shaped transparent electrodes.