JPH04278218A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH04278218A JPH04278218A JP4160291A JP4160291A JPH04278218A JP H04278218 A JPH04278218 A JP H04278218A JP 4160291 A JP4160291 A JP 4160291A JP 4160291 A JP4160291 A JP 4160291A JP H04278218 A JPH04278218 A JP H04278218A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- magnetic
- magnetic recording
- group
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 25
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 230000000737 periodic effect Effects 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 238000007733 ion plating Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 238000005299 abrasion Methods 0.000 abstract description 3
- 238000010276 construction Methods 0.000 abstract 1
- 230000001050 lubricating effect Effects 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000036961 partial effect Effects 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 3
- 229910021385 hard carbon Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VLJQDHDVZJXNQL-UHFFFAOYSA-N 4-methyl-n-(oxomethylidene)benzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N=C=O)C=C1 VLJQDHDVZJXNQL-UHFFFAOYSA-N 0.000 description 1
- -1 Al4C3 Chemical class 0.000 description 1
- 229910016384 Al4C3 Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229910021340 platinum monosilicide Inorganic materials 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 229910006297 γ-Fe2O3 Inorganic materials 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は磁気記録媒体に係り、と
くに表面保護用の島状突起を有する磁気ディスクに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium, and more particularly to a magnetic disk having island-like protrusions for surface protection.
【0002】0002
【従来の技術】従来のCSS(コンタクト スタート
ストップ)方式の磁気ディスク装置では、ディスク
の停止時には磁気ヘッドがディスクに接触し、また、回
転の起動ならびに停止時には摺動してディスク表面を損
傷し易いので、図2の部分断面図に示すように、磁性膜
2を備えたディスク基板1の表面上に非晶質硬質炭素膜
4と潤滑膜5等を設けるようにしていた。[Prior Art] In conventional CSS (Contact Start Stop) type magnetic disk drives, the magnetic head comes into contact with the disk when the disk is stopped, and also slides when starting and stopping rotation, easily damaging the disk surface. Therefore, as shown in the partial sectional view of FIG. 2, an amorphous hard carbon film 4, a lubricating film 5, etc. were provided on the surface of the disk substrate 1 provided with the magnetic film 2.
【0003】また、表面の平滑度が良すぎるとの摩擦が
増えて磁気ヘッド部が吸着し、回転が阻害されたり磁気
ヘッドサスペンションが破損したりするので、ディスク
表面上にRaが50〜100Åの凹凸を設けるようにし
ていた。Furthermore, if the surface smoothness is too good, friction will increase and the magnetic head will stick, inhibiting rotation and damaging the magnetic head suspension. I tried to create unevenness.
【0004】このため、特開平1−134720号公報
では、磁気ディスク表面に島状の金属突起を生成しその
上に保護膜を生成するようにしていた。For this reason, in Japanese Patent Laid-Open No. 1-134720, island-shaped metal protrusions are formed on the surface of the magnetic disk, and a protective film is formed thereon.
【0005】また、特開平1−211236号公報では
、磁気ディスク表面に微粒子を帯電させて附着し、その
上に保護膜を生成するようにしていた。Furthermore, in Japanese Patent Application Laid-Open No. 1-211236, fine particles are charged and attached to the surface of a magnetic disk, and a protective film is formed thereon.
【0006】[0006]
【発明が解決しようとする課題】図2に示した従来の磁
気ディスクにおいては、上記表面の突起がヘッドとの接
触により摩耗し易いため、上記CSS試験においてヘッ
ドとの摩擦係数が徐々に増加するという問題があった。
また、非晶質硬質炭素膜4まで摩耗すると磁性膜2が露
出してクラッシュが発生するという問題もあった。[Problems to be Solved by the Invention] In the conventional magnetic disk shown in FIG. 2, the protrusions on the surface are easily worn out by contact with the head, so the coefficient of friction with the head gradually increases in the CSS test. There was a problem. Furthermore, there is also the problem that when the amorphous hard carbon film 4 is worn down, the magnetic film 2 is exposed and a crash occurs.
【0007】特開平1−134720号公報の磁気ディ
スクでは耐摩耗性が悪く、また、上記特開平1−211
236号公報の磁気ディスクでは、磁気ディスク表面と
微粒子間の密着性が低く剥離しやすいという問題があっ
た。The magnetic disk disclosed in Japanese Patent Application Laid-Open No. 1-134720 has poor wear resistance, and
The magnetic disk disclosed in Publication No. 236 had a problem in that the adhesion between the surface of the magnetic disk and the fine particles was low and they were likely to peel off.
【0008】本発明の目的は、上記保護膜の耐摩耗性を
向上して上記突起の損傷を軽減することのできる磁気記
録媒体を提供することにある。An object of the present invention is to provide a magnetic recording medium that can improve the abrasion resistance of the protective film and reduce damage to the protrusions.
【0009】[0009]
【課題を解決するための手段】本発明は上記課題を解決
するために、上記磁気ディスク表面上の突起部を、Al
,Si,Ge等の周期律表のIIIb族、およびIVb
族金属の酸化物、およびTi,Zr,Hf,V,Nb,
Ta,W,Mo,Cr等の周期律表のIVa族、Va族
、およびVIa族金属の硬質の金属酸化物で形成するよ
うにする。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention provides that the projections on the surface of the magnetic disk are made of aluminum.
, Si, Ge, etc., Group IIIb of the periodic table, and IVb
Group metal oxides, and Ti, Zr, Hf, V, Nb,
It is made of hard metal oxides of metals from groups IVa, Va, and VIa of the periodic table, such as Ta, W, Mo, and Cr.
【0010】さらに、上記金属酸化物の突起をプラズマ
CVD法、あるいはイオンプレーティング法にて形成す
るようにする。Furthermore, the metal oxide protrusions are formed by plasma CVD or ion plating.
【0011】[0011]
【作用】以上のように構成した本発明による磁気ディス
ク等の磁気記録媒体は、その表面上に設けた硬質の金属
酸化物の突起が、磁気ヘッドのクラッシュによる磁気デ
ィスク表面の損傷を防止し、さらに、度重なる上記クラ
ッシュによる上記突起の摩耗を軽減する。[Function] In the magnetic recording medium such as a magnetic disk according to the present invention constructed as described above, the hard metal oxide protrusions provided on the surface prevent damage to the magnetic disk surface due to a crash of the magnetic head. Furthermore, wear of the projections due to repeated crashes is reduced.
【0012】0012
【実施例】図1は本発明による磁気ディスクの部分断面
図であり、磁性膜2ディスク基板1上の磁性膜2表面に
金属酸化突起物3が設けられ、その上に非晶質硬質炭素
膜4と潤滑膜5が設けられている。Embodiment FIG. 1 is a partial sectional view of a magnetic disk according to the present invention, in which metal oxide protrusions 3 are provided on the surface of a magnetic film 2 on a disk substrate 1, and an amorphous hard carbon film is provided on the surface of the magnetic film 2. 4 and a lubricating film 5 are provided.
【0013】このような断面構造は上記した従来の磁気
ディスクと同様であるが、従来技術では上記突起部が比
較的軟質の金属材料で生成されていたのに対し、本発明
ではこれに硬質の金属酸化物を用いる点が異なっている
。Such a cross-sectional structure is similar to that of the conventional magnetic disk described above, but whereas in the conventional technology the protrusion was made of a relatively soft metal material, in the present invention it is made of a hard metal material. The difference is that metal oxides are used.
【0014】図1において、基板1、磁性膜2、非晶質
硬質炭化膜4および潤滑層5には従来の材料を用いる例
えば基板1には、アルミニューム製基板表面にNiPを
略10μmの厚みにめっきして鏡面研磨したもの、アル
ミニューム製基板を熱処理してアルマイト層を設けたも
の、あるいは、表面粗さRa、略5nmの強化ガラスや
セラミック等の表面にCrその他の合金非磁性金属また
はセラミック等の下地膜を設けた通常の基板を用いる。In FIG. 1, conventional materials are used for the substrate 1, the magnetic film 2, the amorphous hard carbide film 4, and the lubricating layer 5. For example, the substrate 1 is made of aluminum with NiP coated on the surface to a thickness of approximately 10 μm. An aluminum substrate plated and mirror-polished, an aluminum substrate heat-treated to provide an alumite layer, or a tempered glass or ceramic with a surface roughness Ra of about 5 nm coated with Cr or other alloyed non-magnetic metal or An ordinary substrate provided with a base film of ceramic or the like is used.
【0015】また、磁性膜2には、例えば、CoやCo
酸化物、CoNiやCoCr等の合金またはこれらにT
i,Mo,Zr,V,PtSi,Nb,W等の一部を加
えた複合金属を用いる。この他、Fe,γ−Fe2O3
,窒化鉄系統の材料を用いることがある。Further, the magnetic film 2 may contain, for example, Co or Co.
oxides, alloys such as CoNi and CoCr, or T in these
A composite metal containing some of i, Mo, Zr, V, PtSi, Nb, W, etc. is used. In addition, Fe, γ-Fe2O3
, iron nitride-based materials may be used.
【0016】図1に示した本発明実施例の磁性膜2には
スパッタリング法により形成された膜厚0.2μmのC
rと0.05μmのCoCrTaの積層膜を用いた。The magnetic film 2 of the embodiment of the present invention shown in FIG.
A laminated film of CoCrTa with a thickness of r and 0.05 μm was used.
【0017】本発明の金属酸化物突起3は、(1)加熱
蒸発させた金属酸化物に酸素を含む低温プラズマを当て
て磁性膜2上に生成するプラズマCVD法、(2)有機
金属化合物、または金属水素化物と酸素を主成分とする
プラズマにより生成される金属化合物微粒子を磁性膜2
に吹き付けて生成するイオンプレーティング法、(3)
金属酸化物の大電流スパッタリングにより生成する方法
(4)0.05μm以下の粒径に粉砕した金属酸化物を
磁性膜2上に並べて生成する方法等により生成すること
ができる。The metal oxide protrusions 3 of the present invention are produced by (1) a plasma CVD method in which a heated and evaporated metal oxide is exposed to low temperature plasma containing oxygen to form it on the magnetic film 2; (2) an organometallic compound; Alternatively, metal compound fine particles generated by plasma containing metal hydride and oxygen as main components are transferred to the magnetic film 2.
(3) Ion plating method that generates by spraying on
Method for producing metal oxide by large current sputtering (4) It can be produced by arranging metal oxides pulverized to a particle size of 0.05 μm or less on the magnetic film 2, or the like.
【0018】図1に示した本発明実施例では、電子ビー
ム蒸発法で生成した高速のSiの超微粒子を酸素ガスの
低温プラズマに当ててSiO2とし、これを磁性膜上に
付着させて金属酸化物突起3を生成した。In the embodiment of the present invention shown in FIG. 1, high-speed ultrafine particles of Si produced by electron beam evaporation are exposed to low-temperature plasma of oxygen gas to form SiO2, which is then deposited on a magnetic film to form metal oxide. Object protrusion 3 was generated.
【0019】上記金属酸化物突起3は磁性膜2の全表面
積の0.01〜30%を占めるように成長され、その高
さは磁性膜2の表面より平均0.001〜0.05μm
の範囲内になるが、0.02〜0.05μmの範囲に収
めるようにすることが望ましい。The metal oxide protrusions 3 are grown to occupy 0.01 to 30% of the total surface area of the magnetic film 2, and their height is on average 0.001 to 0.05 μm above the surface of the magnetic film 2.
However, it is desirable to keep it within the range of 0.02 to 0.05 μm.
【0020】上記本発明の金属酸化物突起3には原理的
に全ての金属酸化物を用いることができるが、その中で
も、B,Al,Si,Ge等の周期律表のIIIb族、
およびIVb族に属する金属の酸化物や、Ti,Zr,
Hf,V,Nb,Ta,W,Mo,Cr等の周期律表の
IVa族、Va族、およびVIa族に属する金属の酸化
物が比較的硬いうえ、非晶質硬質炭化膜4との間に金属
炭化物が形成されて密着性がよくなるので、とくに好適
である。In principle, all metal oxides can be used for the metal oxide protrusion 3 of the present invention, but among them, group IIIb of the periodic table such as B, Al, Si, Ge, etc.
and oxides of metals belonging to group IVb, Ti, Zr,
Oxides of metals belonging to groups IVa, Va, and VIa of the periodic table, such as Hf, V, Nb, Ta, W, Mo, and Cr, are relatively hard and have a hard surface between them and the amorphous hard carbide film 4. This is particularly suitable because metal carbide is formed on the surface of the material and the adhesion is improved.
【0021】上記金属酸化物突起3の生成後、表面に非
晶質硬質炭化膜4を生成する。After the metal oxide projections 3 are formed, an amorphous hard carbide film 4 is formed on the surface.
【0022】非晶質硬質炭化膜4には、例えばグラファ
イトをターゲットとしたスパッタリング、炭化水素系ガ
スの高周波プラズマによるCVD、または炭化水素系ガ
スのイオン加速法等によりマイクロビッカースで100
0Hv以上の硬さに生成したものを用いる。[0022] The amorphous hard carbonized film 4 is coated with a micro Vickers film of 100% by sputtering using graphite as a target, CVD using high-frequency plasma of a hydrocarbon gas, or ion acceleration method of a hydrocarbon gas.
Use one produced to a hardness of 0 Hv or higher.
【0023】この非晶質硬質炭化膜4は厚すぎると磁性
膜2と磁気ヘッド間の間隔が広がり過ぎるので50nm
以下とする必要があるが、本発明では摩耗による接触面
積の増加を防止するために5nm〜20nmの範囲に収
めるようにする。If this amorphous hard carbonized film 4 is too thick, the distance between the magnetic film 2 and the magnetic head will become too large, so the thickness is 50 nm.
Although it is necessary to keep the thickness below, in the present invention, it is set within a range of 5 nm to 20 nm in order to prevent an increase in the contact area due to wear.
【0024】非晶質硬質炭化膜4は金属酸化突起物3に
対してその界面にAl4C3,SiC,WC等の金属炭
化物が形成されるため優れた密着性を有する。金属酸化
突起物3における金属と酸素の比は化学量論的にみて1
:1ないし酸素が若干少ない方が良い密着性が得られる
。The amorphous hard carbide film 4 has excellent adhesion to the metal oxide protrusions 3 because metal carbides such as Al4C3, SiC, and WC are formed at the interface thereof. The ratio of metal to oxygen in the metal oxide protrusion 3 is 1 from a stoichiometric perspective.
:1 or slightly less oxygen provides better adhesion.
【0025】非晶質硬質炭化膜4の表面に直鎖状有機高
分子の潤滑層5を設け摺動特性を向上するようにする。A lubricating layer 5 of a linear organic polymer is provided on the surface of the amorphous hard carbonized film 4 to improve the sliding properties.
【0026】この潤滑層5には例えばパーフロロポリエ
ステルまたはパーフロロアルキの主鎖の少なくとも一方
の末端がエーテル基、水酸基、カルボニル基、アミノ基
、アミド基等で置換された分子量1000〜10000
程度の者が適している。また、この他に飽和脂肪酸やそ
の誘導体、高級アルコールやその誘導体等を用いること
もできる。This lubricating layer 5 includes, for example, perfluoropolyester or perfluoroalkyl whose main chain has at least one end substituted with an ether group, hydroxyl group, carbonyl group, amino group, amide group, etc. and has a molecular weight of 1000 to 10000.
Appropriate for those with a certain degree. In addition, saturated fatty acids, derivatives thereof, higher alcohols, derivatives thereof, etc. can also be used.
【0027】このようにして試作した磁気ディスクをC
SSテストしたところ、30k回までクラッシュが発生
せず、ヘッド・磁気ディスク間の摩擦係数の増加は無視
できる程度であった。The magnetic disk prototyped in this way was
When SS tests were carried out, no crash occurred up to 30k cycles, and the increase in the coefficient of friction between the head and the magnetic disk was negligible.
【0028】また、上記試作磁気ディスクの表面に主鎖
の末端を水酸基で置換した平均分子量が2000のパー
フロロポリエステルを潤滑膜5として湿式法で塗布後、
同様にしてCSSテストを行ったところ、100k回ま
でクラッシュが発生せず、この潤滑膜5がない場合に較
べてヘッドの汚れも少なかった。Further, after coating perfluoropolyester with an average molecular weight of 2,000, in which the end of the main chain is substituted with a hydroxyl group, as a lubricating film 5 on the surface of the above-mentioned prototype magnetic disk, by a wet method,
When a CSS test was conducted in the same manner, no crash occurred up to 100k cycles, and the head was less contaminated than in the case without this lubricant film 5.
【0029】また、上記試作磁気ディスクと同様な下地
膜と磁性膜を設けたディスク基板を回転治具に取付け、
高周波プラズマトーチを用いてSiH4とO2の混合プ
ラズマを生成して金属酸化突起物3を磁性膜2上に形成
し、その上にグラファイトをターゲットとするスパッタ
リングにより厚みが略20nmの非晶質硬質炭化膜4を
形成して磁気ディスクを試作した。In addition, a disk substrate provided with an underlayer and a magnetic film similar to those of the above-mentioned prototype magnetic disk was attached to a rotating jig, and
A mixed plasma of SiH4 and O2 is generated using a high-frequency plasma torch to form metal oxide protrusions 3 on the magnetic film 2, and amorphous hard carbonization with a thickness of approximately 20 nm is performed on the protrusions 3 by sputtering using graphite as a target. Film 4 was formed and a magnetic disk was prototyped.
【0030】この磁気ディスクのCSSテストを行った
ところ、30k回後でも摩擦係数の増加は1g以下であ
り、ディスク傷はなく、ヘッドの汚れも殆ど認められな
かった。When this magnetic disk was subjected to a CSS test, the increase in the coefficient of friction was less than 1 g even after 30k cycles, there were no scratches on the disk, and almost no staining on the head was observed.
【0031】[0031]
【発明の効果】本発明によれば、磁気ディスク等の磁気
記録媒体の表面上に設けた硬質の金属酸化物突起が、磁
気ヘッドのクラッシュによる磁気ディスク表面の損傷を
防止し、さらに、上記クラッシュによって摩耗すること
が少ないので、上記磁気記録媒体を超寿命化し、その信
頼性を高める。According to the present invention, hard metal oxide protrusions provided on the surface of a magnetic recording medium such as a magnetic disk prevent damage to the surface of the magnetic disk due to a crash of the magnetic head, and Since the magnetic recording medium is less likely to be worn out by the magnetic recording medium, the magnetic recording medium has a long service life and its reliability is increased.
【図1】本発明による磁気ディスクの部分断面図FIG. 1 is a partial cross-sectional view of a magnetic disk according to the present invention.
【図2
】従来磁気ディスクの部分断面図[Figure 2
] Partial cross-sectional view of a conventional magnetic disk
1…基板、2…磁性膜、3…金属酸化突起物、4…非晶
質硬質炭化膜、5…潤滑膜。DESCRIPTION OF SYMBOLS 1...Substrate, 2...Magnetic film, 3...Metal oxide projections, 4...Amorphous hard carbonized film, 5...Lubricating film.
Claims (5)
の磁性膜上に金属酸化物の突起を設けたことを特徴とす
る磁気記録媒体。1. A magnetic recording medium characterized in that metal oxide protrusions are provided on a magnetic film of a magnetic recording medium substrate.
i,Ge等の周期率表のIIIb族、およびIVb族金
属の酸化物としたことを特徴とする磁気記録媒体。2. In claim 1, the protrusion is made of Al, S.
1. A magnetic recording medium comprising an oxide of a group IIIb or group IVb metal of the periodic table, such as i, Ge, etc.
r,Hf,V,Nb,Ta,W,Mo,Cr等の周期律
表のIVa族、Va族、およびVIa族金属の酸化物と
したことを特徴とする磁気記録媒体。3. In claim 1, the protrusion is made of Ti, Z
1. A magnetic recording medium comprising an oxide of a metal of group IVa, group Va, or group VIa of the periodic table, such as r, Hf, V, Nb, Ta, W, Mo, or Cr.
をプラズマCVD(Chemical VaporDe
position、化学蒸着)法で形成するようにした
ことを特徴とする磁気記録媒体。4. According to claim 1, the protrusions of the metal oxide are formed by plasma CVD (Chemical VaporDeposition).
1. A magnetic recording medium characterized in that it is formed by a chemical vapor deposition method.
をイオンプレーティング法で形成するようにしたことを
特徴とする磁気記録媒体。5. The magnetic recording medium according to claim 1, wherein the protrusions of the metal oxide are formed by an ion plating method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4160291A JPH04278218A (en) | 1991-03-07 | 1991-03-07 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4160291A JPH04278218A (en) | 1991-03-07 | 1991-03-07 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04278218A true JPH04278218A (en) | 1992-10-02 |
Family
ID=12612929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4160291A Pending JPH04278218A (en) | 1991-03-07 | 1991-03-07 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04278218A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG143046A1 (en) * | 2003-06-30 | 2008-06-27 | Shinetsu Chemical Co | Substrate for magnetic recording medium |
-
1991
- 1991-03-07 JP JP4160291A patent/JPH04278218A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG143046A1 (en) * | 2003-06-30 | 2008-06-27 | Shinetsu Chemical Co | Substrate for magnetic recording medium |
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