JPH04271038A - Magneto-optical recording medium - Google Patents

Magneto-optical recording medium

Info

Publication number
JPH04271038A
JPH04271038A JP5014691A JP5014691A JPH04271038A JP H04271038 A JPH04271038 A JP H04271038A JP 5014691 A JP5014691 A JP 5014691A JP 5014691 A JP5014691 A JP 5014691A JP H04271038 A JPH04271038 A JP H04271038A
Authority
JP
Japan
Prior art keywords
magneto
optical recording
recording medium
transparent
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5014691A
Other languages
Japanese (ja)
Inventor
Kazutomi Suzuki
鈴木 和富
Shinji Arai
進二 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP5014691A priority Critical patent/JPH04271038A/en
Publication of JPH04271038A publication Critical patent/JPH04271038A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent a stain from sticking to a light incoming face and to prevent the face from being damaged at the time of cleaning the stuck stain when a magneto-optical recording medium is provided with a recording layer to record/reproduce information by light on the face opposite to the light incoming face of a transparent substrate. CONSTITUTION:On the light incoming face the transparent thin film of oxide is provided, whose Gibbs' oxide generating free energy per one atom of a metal element is >=860kJ/mol in an absolute value.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本願発明は、レーザ等の光により
情報の記録、再生、消去等を行う光磁気記録媒体に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical recording medium on which information is recorded, reproduced, erased, etc. using light such as a laser.

【0002】さらに詳細には、記録層が膜面に垂直な方
向に磁化容易軸を有した金属薄膜よりなり、該記録層が
光熱磁気効果により情報を記録し、磁気光学効果により
情報を再生する光磁気記録層であるところの、光磁気記
録媒体に適用できる。
More specifically, the recording layer is made of a metal thin film having an axis of easy magnetization perpendicular to the film surface, and the recording layer records information by a photothermal magnetic effect and reproduces information by a magneto-optic effect. It can be applied to a magneto-optical recording medium which is a magneto-optical recording layer.

【0003】0003

【従来の技術】光磁気記録媒体は、高密度、大容量の情
報記録媒体として種々の研究開発が行われている。特に
情報の消去可能な光磁気記録媒体は、応用範囲が広く種
々の材料やシステムの発表がなされており、その実用化
が開始されている。
2. Description of the Related Art Various research and developments are being conducted on magneto-optical recording media as high-density, large-capacity information recording media. In particular, magneto-optical recording media from which information can be erased have a wide range of applications, and various materials and systems have been announced, and their practical use has begun.

【0004】該光磁気記録媒体の基板は、通常では直径
約130mm もしくは約90mmで、厚さ約1.2m
m の電気絶縁性の透明有機高分子円板である。その片
面にはグルーブおよび/またはプレピットを形成したグ
ルーブ等形成面が設けられ、その上に誘電体層/光磁気
記録層/誘電体層/反射金属層を積層構成の一例とする
積層体からなる記録層を設け、さらに該反射金属層上に
無機物および/または有機樹脂の保護層が設けらている
The substrate of the magneto-optical recording medium usually has a diameter of about 130 mm or about 90 mm and a thickness of about 1.2 m.
m electrically insulating transparent organic polymer disk. One side thereof is provided with a groove-forming surface on which grooves and/or pre-pits are formed, and a laminate including a dielectric layer/magneto-optical recording layer/dielectric layer/reflective metal layer is provided thereon as an example of a laminated structure. A recording layer is provided, and a protective layer of an inorganic material and/or an organic resin is further provided on the reflective metal layer.

【0005】そして該光磁気記録媒体への情報の記録、
あるいは情報の再生を行うための光磁気ディスク装置で
は、該光磁気記録媒体の光入射表面でのゴミや傷の影響
を受け難くする必要がある。そのために、該光磁気記録
媒体に対しては、記録層を形成した面の反対側から、該
光磁気記録媒体の透明基板を通してレーザを照射するこ
とにより記録、再生、消去が行われている。
[0005] Recording information on the magneto-optical recording medium;
Alternatively, in a magneto-optical disk device for reproducing information, it is necessary to make the light incident surface of the magneto-optical recording medium less susceptible to dust and scratches. For this purpose, recording, reproduction, and erasing are performed on the magneto-optical recording medium by irradiating a laser beam through the transparent substrate of the magneto-optical recording medium from the side opposite to the surface on which the recording layer is formed.

【0006】[0006]

【発明が解決しようとする課題】該光磁気ディスク装置
が使用される環境は、高い清浄度が確保されている場所
ばかりではない。そのため高い清浄度を期待できない通
常の環境で該光磁気ディスク装置を使用すると、該光磁
気記録媒体表面の静電気や塵芥の落下、付着などで、信
号の誤り率(エラーレート)が増加することになる。
SUMMARY OF THE INVENTION The environment in which the magneto-optical disk device is used is not limited to a place where a high level of cleanliness is ensured. Therefore, if the magneto-optical disk device is used in a normal environment where high cleanliness cannot be expected, the signal error rate will increase due to static electricity, falling dust, and adhesion on the surface of the magneto-optical recording medium. Become.

【0007】このため、静電気防止性と耐摩擦性とを兼
ね合わせた層を、該光磁気記録媒体の表面に付加するこ
とにより、塵埃の付着防止と汚れを清掃するときの傷つ
きを防止するという検討がなされている。しかしこの方
法ではまだ満足な効果が得られておらず、またいくつか
の問題も抱えている。
[0007] For this reason, by adding a layer that has both anti-static properties and anti-friction properties to the surface of the magneto-optical recording medium, it is possible to prevent dust from adhering and to prevent scratches when cleaning dirt. It is being considered. However, this method has not yet produced satisfactory effects and also has some problems.

【0008】すなわち一般的にその方法としては、静電
気防止剤を含有した紫外線硬化樹脂を数μm 〜十数μ
m の厚さに塗布することが行われる。しかし実使用環
境の温度10〜50℃、かつ相対湿度10〜80%にお
いて、これによる十分な静電気防止効果が得られていな
い。また耐摩擦性を向上させるため、数μm 以上の塗
布層を形成した場合、塗り斑や塗膜中の異物のためにエ
ラーレートが増大し、生産歩留りを低下させてしまう。
[0008] That is, the general method is to apply an ultraviolet curable resin containing an antistatic agent to a thickness of several micrometers to several tens of micrometers.
A coating is carried out to a thickness of m. However, this does not provide a sufficient antistatic effect at a temperature of 10 to 50° C. and a relative humidity of 10 to 80%, which is the actual use environment. Furthermore, when a coating layer of several μm or more is formed in order to improve the abrasion resistance, the error rate increases due to coating spots and foreign matter in the coating film, resulting in a decrease in production yield.

【0009】一方、該光磁気記録媒体へ付着した塵芥を
除去する方法の検討もされている。しかしこの場合除去
方法によっては、該光磁気記録媒体の透明有機高分子基
板が大きく帯電し、逆に塵埃が再付着しやすくなる。例
えば最近は、眼鏡拭きのような極細繊維からなる布を該
光磁気ディスクに接触させて回転させる自動クリーナ(
日本電気(株)製オートディスククリーナー PC−0
D101−11など)が販売されている。しかしこのよ
うな方法では、一時的には清浄化されても、該透明有機
高分子基板が帯電し、塵埃の再付着が起こりやすくなる
という課題があった。
On the other hand, methods for removing dust adhering to the magneto-optical recording medium are also being studied. However, in this case, depending on the removal method, the transparent organic polymer substrate of the magneto-optical recording medium may become heavily charged, making it easier for dust to re-adhere. For example, recently, automatic cleaners (such as those used to clean glasses) that rotate a cloth made of ultra-fine fibers in contact with the magneto-optical disk have been introduced.
Auto disc cleaner PC-0 manufactured by NEC Corporation
D101-11 etc.) are on sale. However, this method has a problem in that even if it is temporarily cleaned, the transparent organic polymer substrate becomes electrically charged, making it easy for dust to re-adhere.

【0010】0010

【課題を解決するための手段】本願発明は上記課題を解
決するためになされたもので、光磁気記録媒体の透明基
板の光入射面に、金属元素の1原子当たりギブスの酸化
物生成自由エネルギが絶対値で860kJ/mol 以
上である透明酸化物薄膜を設けたことを特徴としている
[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and includes the Gibbs oxide formation free energy per atom of a metal element on the light incident surface of a transparent substrate of a magneto-optical recording medium. It is characterized by providing a transparent oxide thin film whose absolute value is 860 kJ/mol or more.

【0011】[0011]

【作用】本願発明における光磁気記録媒体としては、前
述の光磁気記録媒体の他、周知のコンパクトディスク(
CD)、ビデオディスク、WORMとして知られる文書
等の保存に用いられる追記型光磁気ディスク等、基板を
通して記録層にレーザを照射することにより情報を記録
および/または再生するものであれば特に限定されない
。しかし、中でも連続使用されることが多いコンンピュ
ータの外部メモリとして使用が期待される光磁気記録媒
体に特に好適である。
[Operation] In addition to the above-mentioned magneto-optical recording medium, the magneto-optical recording medium according to the present invention may be the well-known compact disc (
There are no particular limitations as long as information is recorded and/or reproduced by irradiating a laser onto the recording layer through the substrate, such as write-once magneto-optical disks used for storing documents such as CDs, video disks, and WORMs. . However, it is particularly suitable for magneto-optical recording media that are expected to be used as external memory for computers, which are often used continuously.

【0012】そして光磁気記録媒体の透明基板としては
、ガラス、ポリカーボネート(PC)、アモルファスポ
リオレフィン(APO)、アクリル樹脂、エポキシ樹脂
、およびこれらの変成品などが用いられるが、とりわけ
、成形しやすい有機樹脂が好ましく、中でもPCが価格
、機械的特性、および耐熱性の観点より好適である。
[0012] As the transparent substrate of the magneto-optical recording medium, glass, polycarbonate (PC), amorphous polyolefin (APO), acrylic resin, epoxy resin, modified products thereof, etc. are used, but in particular, organic materials that are easy to mold are used. Resins are preferred, and among them, PC is preferred from the viewpoints of cost, mechanical properties, and heat resistance.

【0013】本願発明は、透明酸化物薄膜を構成する金
属元素の1原子当たりのギブスの酸化物生成自由エネル
ギが小さくなると、表面硬度が不足し、布などによる摩
擦清掃時に傷がつきやすく、これが絶対値で 860k
J/mol以上でなければ、耐摩耗性と耐汚れ防止性と
を兼ね備えたものが得られないことを見出だし、なされ
たものである。この値が 860kJ/mol未満の透
明酸化物薄膜では、例えばIn2 O3 −SnO2 
などは耐汚れ防止性に優れても耐摩耗性に劣り、SiO
2 やAl2 O3 などは耐摩耗性に優れても耐汚れ
防止性に劣る。またSiN、AlSiNなどの窒化物薄
膜では、汚れがつきやすい。
[0013] In the present invention, when the Gibbs oxide formation free energy per atom of the metal element constituting the transparent oxide thin film becomes small, the surface hardness is insufficient and scratches occur easily during friction cleaning with a cloth. 860k in absolute value
This was done based on the discovery that unless it is at least J/mol, it is not possible to obtain a product that has both wear resistance and stain resistance. In a transparent oxide thin film with this value of less than 860 kJ/mol, for example, In2 O3 -SnO2
Although SiO has excellent stain resistance, it has poor wear resistance.
2 and Al2O3 have excellent wear resistance but poor stain resistance. Further, nitride thin films such as SiN and AlSiN are easily contaminated.

【0014】ここで金属元素(M)1原子当たりのギブ
スの酸化物生成自由エネルギとは、例えば、Mx + 
(y/2)O2     →    Mx Oy とい
う反応の自由エネルギ変化をΔGとすると、ΔG/x 
を意味する。
Here, the Gibbs oxide formation free energy per atom of the metal element (M) is, for example, Mx +
If the free energy change of the reaction (y/2)O2 → Mx Oy is ΔG, then ΔG/x
means.

【0015】HfO2 の場合、ΔGは−1027kJ
/molであるので、1原子当たりの値は−1027k
J/mol となる。またTa2 O5 のΔGは−1
911kJ/mol であるが、x=2 なので、1原
子当たりの値は−956kJ/molとなる。
[0015] In the case of HfO2, ΔG is -1027kJ
/mol, so the value per atom is -1027k
J/mol. Also, ΔG of Ta2O5 is -1
However, since x=2, the value per atom is -956 kJ/mol.

【0016】ほとんどの元素のΔGは負の値であるが、
本願発明でいう絶対値とは、この符号を除いた値を意味
する。
[0016] Although ΔG of most elements is a negative value,
The absolute value in the present invention means a value excluding this sign.

【0017】またある元素は、いくつかの酸化物の形態
をとりうる場合もある。しかしこの場合には、標準状態
(大気中、1気圧、気温25℃)で最も安定な形態での
値で評価する。
[0017] Certain elements may also take the form of several oxides. However, in this case, the value in the most stable form under standard conditions (atmosphere, 1 atm, temperature 25°C) is used for evaluation.

【0018】このような条件を満足する酸化物としては
、前述したHfO2 、Ta2 O5 の他、ZrO2
 、Y2 O3 、TiO2 、Er2 O3 などが
ある。
Oxides that satisfy such conditions include, in addition to the aforementioned HfO2 and Ta2O5, ZrO2
, Y2 O3, TiO2, Er2 O3, etc.

【0019】上述した酸化物の中では、Ta2 O5 
、HfO2 、ZrO2 、Y2 O3 が、表面硬度
、耐汚れ防止性、安定性、耐久性に優れ、とりわけ好ま
しい。これら4種の酸化物は、それぞれの混合物とする
こともでき、また表面抵抗、耐久性なとを改善する目的
で、他の酸化物、窒化物などを添加することもできる。
Among the oxides mentioned above, Ta2 O5
, HfO2, ZrO2, and Y2O3 are particularly preferred because they have excellent surface hardness, stain resistance, stability, and durability. These four types of oxides may be used as a mixture, or other oxides, nitrides, etc. may be added for the purpose of improving surface resistance, durability, etc.

【0020】これら透明酸化物薄膜の膜厚は、その硬度
および前述した光干渉効果が媒体反射率に及ぼす影響な
どを考慮して、適宜選択される。表面硬度の観点からは
、膜厚は少なくとも10nm以上必要である。一方媒体
反射率は透明酸化物薄膜の膜厚によって周期的に変化し
、波長830nm のレーザ光を使用する場合には、膜
厚 100nmと 300nm周辺ではその影響が大き
くなる。そして膜厚200nm 付近では屈折率によら
ず、媒体反射率はほとんど変化しない。膜厚が厚くなり
過ぎると、生産性が低下するだけでなく、膜応力の点で
も不利になるため、500nm 以下が好ましい。
The thickness of the transparent oxide thin film is appropriately selected in consideration of its hardness and the influence of the above-mentioned optical interference effect on the medium reflectance. From the viewpoint of surface hardness, the film thickness needs to be at least 10 nm or more. On the other hand, the medium reflectance changes periodically depending on the thickness of the transparent oxide thin film, and when using a laser beam with a wavelength of 830 nm, the influence becomes large around film thicknesses of 100 nm and 300 nm. When the film thickness is around 200 nm, the medium reflectance hardly changes regardless of the refractive index. If the film thickness becomes too thick, it will not only reduce productivity but also be disadvantageous in terms of film stress, so it is preferably 500 nm or less.

【0021】これら透明酸化物薄膜の形成法としては、
通常の物理的、化学的堆積法が用いられるが、中でもス
パッタリング法、蒸着法が好適に用いられる。なお、透
明基板と透明酸化物薄膜の間に、両層の接着性を改善す
る目的で、シランカップリング剤、有機シリケートなど
の下塗り層を設けても良い。
The method for forming these transparent oxide thin films is as follows:
Although ordinary physical and chemical deposition methods are used, sputtering methods and vapor deposition methods are preferably used. Note that an undercoat layer of a silane coupling agent, an organic silicate, or the like may be provided between the transparent substrate and the transparent oxide thin film for the purpose of improving the adhesion between both layers.

【0022】以下、実施例により本願発明を説明する。 そのために、まずは試料の評価方法について説明する。The present invention will be explained below with reference to Examples. To this end, we will first explain the sample evaluation method.

【0023】耐摩耗性の評価は、1平方cm当たり 1
00gの荷重をかけたガーゼで、被測定面を100 回
往復摩擦し、その前後の被測定面状況を目視により観察
して評価した。その際に、被測定面に傷が見つけられな
かったものを「○」とし、傷が見つけられたものを「×
」とした。
[0023] The evaluation of wear resistance is 1 per square cm.
The surface to be measured was rubbed back and forth 100 times with a gauze to which a load of 0.00 g was applied, and the condition of the surface to be measured before and after was visually observed and evaluated. At that time, those for which no scratches were found on the surface to be measured were marked as "○", and those for which scratches were found were marked as "×".
”.

【0024】また汚れの付着性は、シャーレに粉体を入
れ、サンプルの被測定面を粉体に接触させた後、取り出
し、接触前後の波長 500nmの光の垂直透過率を測
定し、透過率保持率(=接触後透過率/接触前透過率)
 を求めることにより評価した。粉体としては、SiO
2 (JIS試験用ダスト3種)、関東ローム層(同8
種)、カーボンブラック(同12種)、ならびに馬鈴薯
デンプンの4種類を用いた。また被測定面については、
極細繊維からなる布(帝人(株)製ミクロスター)によ
って摩擦し、表面帯電の影響についても検討を行った。
[0024] In addition, the adhesion of dirt was determined by placing powder in a petri dish, bringing the surface of the sample to be measured into contact with the powder, taking it out, measuring the vertical transmittance of light at a wavelength of 500 nm before and after contact, and calculating the transmittance. Retention rate (=transmittance after contact/transmittance before contact)
The evaluation was made by determining the As a powder, SiO
2 (JIS test dust type 3), Kanto loam layer (JIS test dust type 8)
Four types of starch were used: carbon black (seed), carbon black (12 types), and potato starch. Regarding the surface to be measured,
The effect of surface charging was also investigated by rubbing with a cloth made of ultrafine fibers (Microstar manufactured by Teijin Ltd.).

【0025】測定時の環境は気温26℃、相対湿度42
%であった。測定は各5回行い、その平均値を求めて、
表1にまとめた。
[0025] The environment at the time of measurement was a temperature of 26°C and a relative humidity of 42°C.
%Met. Each measurement was performed five times, and the average value was calculated.
The results are summarized in Table 1.

【0026】実施例と比較例に用いた光磁気記録媒体は
、次のようにして製造した。
Magneto-optical recording media used in Examples and Comparative Examples were manufactured as follows.

【0027】まず、直径 130mm、厚さ1.2mm
 の円板形状で、 1.6μm ピッチのグルーブを有
するPC製の基板を、3ターゲット設置可能なマグネト
ロンスパッタ装置の真空槽内に配置し、真空槽内を 0
.4μTorrになるまで排気した。
First, the diameter is 130 mm and the thickness is 1.2 mm.
A PC board with a disk shape and grooves at a pitch of 1.6 μm was placed in a vacuum chamber of a magnetron sputtering device capable of installing 3 targets, and the inside of the vacuum chamber was set to 0.
.. It was evacuated until the pressure became 4 μTorr.

【0028】次にAr/N2 混合ガス (Ar:N2
 =70:30 vol%) を真空槽内に導入し、圧
力を10mTorr になるように調整した。ターゲッ
トとしては直径 100mmで厚さ5mm のAlSi
合金(Al:Si=30:70atom%) の焼結体
からなる円板を用い、放電電力500W、放電周波数1
3.56MHzで高周波スパッタリングを行い、PC基
板を回転(自転)させながら、透明誘電体層としてAl
SiN膜を120nm 堆積させた。このAlSiN膜
の組成は、オージェ電子分光装置 (PHI社製SAM
610)で分析したところ、組成比はAl:Si:N=
19:39:42atom%であった。
Next, Ar/N2 mixed gas (Ar:N2
=70:30 vol%) was introduced into the vacuum chamber, and the pressure was adjusted to 10 mTorr. The target is AlSi with a diameter of 100 mm and a thickness of 5 mm.
Using a disk made of a sintered body of an alloy (Al:Si=30:70 atom%), the discharge power was 500 W, and the discharge frequency was 1.
High-frequency sputtering was performed at 3.56 MHz, and while rotating (rotating) the PC board, Al was sputtered as a transparent dielectric layer.
A 120 nm thick SiN film was deposited. The composition of this AlSiN film was determined using an Auger electron spectrometer (SAM manufactured by PHI).
610), the composition ratio was found to be Al:Si:N=
It was 19:39:42 atom%.

【0029】続いて光磁気記録層として、直径100m
m で厚さ4.5mm のTbFeCo合金ターゲット
(Tb:Fe:Co=19:72.5:8.5 ato
m%) を用い、Arガス圧4mTorr、放電電力1
50Wの条件でDCスパッタリングを行い、膜厚22.
5nmのTbFeCo非晶質合金膜(Tb:Fe:Co
=20.5:70.9:8.6 atom%)を堆積さ
せた。
Next, a magneto-optical recording layer with a diameter of 100 m was prepared.
A TbFeCo alloy target with a thickness of 4.5 mm (Tb:Fe:Co=19:72.5:8.5 ato
m%), Ar gas pressure 4 mTorr, discharge power 1
DC sputtering was performed under the condition of 50W, and the film thickness was 22.
5 nm TbFeCo amorphous alloy film (Tb:Fe:Co
=20.5:70.9:8.6 atom%) was deposited.

【0030】合金膜の組成は、誘導結合高周波プラズマ
分光分析 (IPC)により求めた。以下に挙げるその
他の合金膜の組成も全てIPCによるものである。
The composition of the alloy film was determined by inductively coupled high frequency plasma spectroscopy (IPC). The compositions of the other alloy films listed below are all based on IPC.

【0031】さらに引き続いて、前記と同様の条件で、
AlSiN膜を窒化物透明誘電体層として30nm堆積
させた。
[0031] Further, under the same conditions as above,
A 30 nm thick AlSiN film was deposited as a nitride transparent dielectric layer.

【0032】さらに金属反射層として、直径100mm
 で厚さ3mm のAgターゲットを用い、Arガス圧
2mTorr、放電電力60W の条件で、DCスパッ
タリングを行い、30nmのAg膜を堆積させた。
Furthermore, as a metal reflective layer, a diameter of 100 mm is provided.
Using a 3 mm thick Ag target, DC sputtering was performed under the conditions of Ar gas pressure of 2 mTorr and discharge power of 60 W to deposit a 30 nm thick Ag film.

【0033】これら各層の形成時において、PC基板は
20rpm で回転させた。
[0033] During the formation of each of these layers, the PC board was rotated at 20 rpm.

【0034】続いて、金属反射層上に、スピンコーター
で紫外線硬化型のフェノールボラックエポキシアクリレ
ート樹脂を塗布し、その後紫外線照射により硬化させ、
約10μm の有機保護層を設けた。
Next, an ultraviolet-curable phenol borac epoxy acrylate resin was applied onto the metal reflective layer using a spin coater, and then cured by ultraviolet irradiation.
An organic protective layer of approximately 10 μm was provided.

【0035】このように作製した光磁気記録媒体の反対
側の面 (光入射面) に、次に示すようなPC基板の
保護層を形成した。そして耐磨耗性の評価を行った。ま
た汚れの付着性については、PC基板のみに酸化物層を
設け、前述した方法で評価を行った。
A protective layer for a PC board as shown below was formed on the opposite surface (light incident surface) of the magneto-optical recording medium thus produced. Then, the wear resistance was evaluated. Further, regarding the adhesion of dirt, an oxide layer was provided only on the PC board, and evaluation was performed using the method described above.

【0036】[0036]

【実施例1〜4】PC基板にTa2 O5 、HfO2
 、ZrO2 、Y2 O3 膜を高周波スパッタリン
グ法により形成した。ターゲットは各々の酸化物ターゲ
ットを用い、Ar/O2 混合ガス(Ar:O2 =8
0:20 vol%) 5mTorrの雰囲気下で、放
電電力500W、放電周波数13.56MHzを投入し
た。膜厚は、堆積時間を変化させることにより制御した
[Examples 1 to 4] Ta2O5, HfO2 on PC board
, ZrO2, and Y2O3 films were formed by high frequency sputtering. Each oxide target was used as the target, and Ar/O2 mixed gas (Ar:O2 = 8
0:20 vol%) In an atmosphere of 5 mTorr, a discharge power of 500 W and a discharge frequency of 13.56 MHz were applied. Film thickness was controlled by varying the deposition time.

【0037】[0037]

【比較例1】PC基板の光入射面には保護層を付けなか
った。
[Comparative Example 1] No protective layer was attached to the light incident surface of the PC board.

【0038】[0038]

【比較例2】AlSiターゲット (Al:Si=30
:70atom%) を用い、Ar/N2 混合ガス(
Ar:N2 =70:30 vol%) 5mTorr
の雰囲気下で、放電電力500W、放電周波数13.5
6MHzを投入して、高周波スパッタリング法によりA
lSiN膜を堆積させた。
[Comparative Example 2] AlSi target (Al:Si=30
:70atom%) and Ar/N2 mixed gas (
Ar:N2 =70:30 vol%) 5mTorr
Under the atmosphere, discharge power 500W, discharge frequency 13.5
By inputting 6MHz, A by high frequency sputtering method.
A lSiN film was deposited.

【0039】[0039]

【比較例3】PC基板に、スピンコーターで紫外線硬化
型フェノールルボラックエポキシアクリレート樹脂を塗
布し、その後紫外線照射により、10μmの厚さの膜を
形成した。
[Comparative Example 3] An ultraviolet curable phenolvolac epoxy acrylate resin was coated on a PC board using a spin coater, and then a film with a thickness of 10 μm was formed by irradiation with ultraviolet rays.

【0040】[0040]

【比較例4】Siターゲットを用い、比較例2と同条件
でSiN膜を堆積した。
Comparative Example 4 A SiN film was deposited using a Si target under the same conditions as Comparative Example 2.

【0041】[0041]

【比較例5】In2 O3 − SnO2 ターゲット
 (In2 O3 :SnO2 =95:5 wt%)
 を用い、実施例1と同条件で堆積した。
[Comparative Example 5] In2 O3 - SnO2 target (In2 O3 :SnO2 =95:5 wt%)
Deposition was carried out under the same conditions as in Example 1.

【0042】[0042]

【比較例6】SiO2 ターゲットを用い、比較例1と
同条件でSiO2 膜を堆積した。
[Comparative Example 6] Using a SiO2 target, a SiO2 film was deposited under the same conditions as in Comparative Example 1.

【0043】[0043]

【発明の効果】本願発明は以上詳述したごとく、光磁気
記録媒体が、透明基板の光入射面と反対側の面に、光に
よる情報を記録または再生する記録層を設けたものであ
るときに、該透明基板の光入射面に、金属元素の1原子
当たりギブスの酸化物生成自由エネルギが絶対値で 8
60kJ/mol以上である透明酸化物薄膜を設けるこ
とによって、汚れの付着を防止し、かつ付着した汚れの
清掃時の傷つきを防止するための層を形成し、信頼性に
優れた光磁気記録媒体を得ることができるという顕著な
効果が得られる。
[Effects of the Invention] As detailed above, the present invention provides a magneto-optical recording medium in which a recording layer for recording or reproducing information using light is provided on the surface of a transparent substrate opposite to the light incident surface. Then, on the light incident surface of the transparent substrate, the Gibbs oxide free energy of formation per atom of the metal element is 8 in absolute value.
By providing a transparent oxide thin film with a density of 60 kJ/mol or more, a layer is formed to prevent the adhesion of dirt and damage during cleaning of the adhered dirt, and the magneto-optical recording medium has excellent reliability. This has the remarkable effect of being able to obtain .

【0044】[0044]

【表1】[Table 1]

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】透明基板の光入射面と反対側の面に、光に
よる情報を記録または再生する記録層を有する光磁気記
録媒体において、該透明基板の光入射面に、金属元素の
1原子当たりギブスの酸化物生成自由エネルギが絶対値
で 860kJ/mol以上である透明酸化物薄膜を設
けたことを特徴とする光磁気記録媒体。
1. A magneto-optical recording medium having a recording layer for recording or reproducing information by light on the surface opposite to the light incident surface of a transparent substrate, wherein one atom of a metal element is provided on the light incident surface of the transparent substrate. 1. A magneto-optical recording medium comprising a transparent oxide thin film having a Gibbs oxide formation free energy of 860 kJ/mol or more in absolute value.
【請求項2】前記透明酸化物薄膜がTa2 O5 もし
くはHfO2 、ZrO2 、Y2 O3 である請求
項1記載の光磁気記録媒体。
2. The magneto-optical recording medium according to claim 1, wherein the transparent oxide thin film is Ta2 O5, HfO2, ZrO2 or Y2 O3.
JP5014691A 1991-02-25 1991-02-25 Magneto-optical recording medium Pending JPH04271038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5014691A JPH04271038A (en) 1991-02-25 1991-02-25 Magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5014691A JPH04271038A (en) 1991-02-25 1991-02-25 Magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH04271038A true JPH04271038A (en) 1992-09-28

Family

ID=12851039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5014691A Pending JPH04271038A (en) 1991-02-25 1991-02-25 Magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH04271038A (en)

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