JPH0426771A - Pretreating solution for electroless plating - Google Patents
Pretreating solution for electroless platingInfo
- Publication number
- JPH0426771A JPH0426771A JP13231290A JP13231290A JPH0426771A JP H0426771 A JPH0426771 A JP H0426771A JP 13231290 A JP13231290 A JP 13231290A JP 13231290 A JP13231290 A JP 13231290A JP H0426771 A JPH0426771 A JP H0426771A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- electroless
- electroless plating
- soln
- alkyl ester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007772 electroless plating Methods 0.000 title claims abstract description 16
- 239000004094 surface-active agent Substances 0.000 claims abstract description 9
- 229920002845 Poly(methacrylic acid) Polymers 0.000 claims abstract description 7
- 239000008139 complexing agent Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 239000002736 nonionic surfactant Substances 0.000 claims abstract description 7
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000011975 tartaric acid Substances 0.000 claims abstract description 3
- 235000002906 tartaric acid Nutrition 0.000 claims abstract description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract 3
- 239000007788 liquid Substances 0.000 claims description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 8
- 229910052731 fluorine Inorganic materials 0.000 claims description 8
- 239000011737 fluorine Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 2
- NSOXQYCFHDMMGV-UHFFFAOYSA-N Tetrakis(2-hydroxypropyl)ethylenediamine Chemical compound CC(O)CN(CC(C)O)CCN(CC(C)O)CC(C)O NSOXQYCFHDMMGV-UHFFFAOYSA-N 0.000 claims description 2
- 229920000193 polymethacrylate Polymers 0.000 claims description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims 1
- 239000000174 gluconic acid Substances 0.000 claims 1
- 235000012208 gluconic acid Nutrition 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 18
- -1 polyoxyethylene lauryl ether Polymers 0.000 abstract description 9
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 abstract description 2
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 abstract 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 229940095064 tartrate Drugs 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 230000008569 process Effects 0.000 description 13
- 230000000694 effects Effects 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 241000047703 Nonion Species 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical compound ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 235000006754 Taraxacum officinale Nutrition 0.000 description 1
- 240000001949 Taraxacum officinale Species 0.000 description 1
- 235000005187 Taraxacum officinale ssp. officinale Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- YSJGOMATDFSEED-UHFFFAOYSA-M behentrimonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCCCCCC[N+](C)(C)C YSJGOMATDFSEED-UHFFFAOYSA-M 0.000 description 1
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical class FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- PDJAZCSYYQODQF-UHFFFAOYSA-N iodine monofluoride Chemical class IF PDJAZCSYYQODQF-UHFFFAOYSA-N 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、無電解めっき用前処理液に関するものであり
、特に印刷配線板の無電解銅めっき用前処理液に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a pretreatment liquid for electroless plating, and particularly to a pretreatment liquid for electroless copper plating of printed wiring boards.
従来、無電解銅めっきの前処理工程としては、アルカリ
脱脂工程、コンディショニング工程、表面銅箔のソフト
エノチング工程、酸洗工程、増感工程(触媒付与)、密
着促進工程等を行っている。Conventionally, pretreatment steps for electroless copper plating include an alkaline degreasing step, a conditioning step, a soft etching step for the surface copper foil, an acid washing step, a sensitization step (catalyst application), and an adhesion promotion step.
無電解めっき前処理としての:1ンディショニングの働
きは、親油性を帯びている基拐を親水性にしてぬれ易く
し、後に行われる増感]工程での触媒の吸着効果を促進
させることにある。As a pretreatment for electroless plating: 1. The function of conditioning is to make the lipophilic substrate hydrophilic, making it easier to wet, and promoting the adsorption effect of the catalyst in the subsequent sensitization process. be.
ガラス等のめっきのつきにくい被めっき体に用いるもの
としてシランカンプリング剤を用いた特公昭59−52
701号公報に開示された技術?〔発明が解決しようと
する課題〕
しかしながら、従来の前処理液を用いると、コンディシ
ョニングでの水ぬれ性および脱泡性が必ずしも十分でな
い場合があり、半田浴浸漬でのブローホールの発生やス
ルーホール内に気泡が残存することによる触媒が吸着さ
れないで、リング状のめっきボイドが発生するという問
題が起こる。1986-52 Special Publication using a silane camping agent for use on objects to be plated that are difficult to plate, such as glass.
The technology disclosed in Publication No. 701? [Problems to be Solved by the Invention] However, when conventional pretreatment liquids are used, water wettability and defoaming properties during conditioning may not always be sufficient, and blowholes and through holes may occur during immersion in a solder bath. A problem arises in that the catalyst is not adsorbed due to air bubbles remaining within the plate, resulting in ring-shaped plating voids.
この傾向は、小穴(キリ径0.4mm以下)のスルーホ
ールにおいて、顕著である。また、合成樹脂に紙やガラ
ス繊維を混入された複合材料系の絶縁物質にあっては、
そのガラス繊維等が表面に露出していることがあり、好
適な条件を選んでも、この部分に無電解めっきが析出し
ない現象が問題視されている。本発明はこのような状況
に鑑みてなされたものであり、ぬれ性とめっき密着性に
優れた無電解めっき用前処理液を提供するものである。This tendency is remarkable in small through-holes (diameter of 0.4 mm or less). In addition, for composite insulating materials made of synthetic resin mixed with paper or glass fiber,
The glass fibers and the like may be exposed on the surface, and even if suitable conditions are selected, the phenomenon in which electroless plating is not deposited on this portion is considered a problem. The present invention has been made in view of these circumstances, and provides a pretreatment liquid for electroless plating that has excellent wettability and plating adhesion.
本発明の第1の請求項は、非イオン界面活性剤、フッ素
を含むイオン界面活性剤と金属錯化剤及びポリメタクリ
ル酸4級アンモニウムアルキルエステル化物を含むp
+(10以」二のアルカリ水溶液より成る無電解めっき
の前処理液である。The first claim of the present invention is a nonionic surfactant, a fluorine-containing ionic surfactant, a metal complexing agent, and a polymethacrylic acid quaternary ammonium alkyl ester.
+ (10 or more) This is a pretreatment liquid for electroless plating consisting of an aqueous alkali solution.
また、第2の請求項における非イオン界面活性剤として
は、H,L、 B (Hydrophile Lip
ophileBalance)がll−16のものが良
く、このものは、親水性の度合が脱脂を行う上で適し、
また、被めっき物の水ぬれ性を良くすると考えられる。In addition, as the nonionic surfactant in the second claim, H, L, B (Hydrophile Lip
ophile Balance) is 11-16, which is suitable for degreasing due to its hydrophilicity.
It is also thought to improve the water wettability of the object to be plated.
これらは、一般式RO(CHzCHzO) 、、H(但
し、R: C,H2−,1,C,、Hzo−+
)で示されるのが好ましく、具体的には、ポリオキシエ
チレンラウリルエーテル、ポリオキシエチレンセヂルコ
ニーテル、ポリオキシエチレンオレイルエーテル、ポリ
オキシエチレンステアリルエーテル、ポリオ;1−ンエ
チレンオクチルフェニルエーテル、ポリオキシエチl/
ンノニルフェニルエーテルが使用される。These have the general formula RO(CHzCHzO) ,,H (where R: C,H2-,1,C,,Hzo-+
), specifically, polyoxyethylene lauryl ether, polyoxyethylene cedylconite, polyoxyethylene oleyl ether, polyoxyethylene stearyl ether, polyol; 1-ethylene octylphenyl ether, polyoxyethylene l/
nonylphenyl ether is used.
また、第1の請求項におけるフッ素を含む界面活性剤と
しては、テトラフルオロエチレンの重合によって得られ
るベルフルオルアルケニル基を有するフッ素を含む界面
活性剤、ヘキサフルオルプロヘンの共重によって得られ
るベルフルオルアルケニル基を有するフッ素を含む界面
活性剤、電解フッ素化による直鎖ベルフルオルカルボン
酸フン化物から誘導されるもの、テロメリゼーションに
より得られるベルフルオルヨウ化物から誘導されるベル
フルオルアルキルエチルアルコール誘導体が例示される
。Further, the fluorine-containing surfactant in the first claim is a fluorine-containing surfactant having a perfluoroalkenyl group obtained by polymerization of tetrafluoroethylene, and a fluorine-containing surfactant obtained by copolymerizing hexafluoroprohene. Fluorine-containing surfactants having a perfluoroalkenyl group, those derived from linear perfluorocarboxylic acid fluorides by electrolytic fluorination, and perfluoroalkylethyl derived from perfluoro iodides obtained by telomerization. Alcohol derivatives are exemplified.
第3の請求項における金属錯化剤としては、酒石酸、又
はその塩、エチレンジアミン4酢酸又はその塩、エチレ
ンジアミンテトラ−2−プロパツール、トリエタノール
アミン、モノエタノールアミン、グルコン酸ナトリウム
、クエン酸、又はそれらの混合物が挙げられる。The metal complexing agent in the third claim includes tartaric acid or a salt thereof, ethylenediaminetetraacetic acid or a salt thereof, ethylenediaminetetra-2-propanol, triethanolamine, monoethanolamine, sodium gluconate, citric acid, or Mixtures thereof may be mentioned.
第4の請求項におけるポリメタクリル酸4級アンモニウ
ムアルキルコ〜ステル化物としては、構造式が
各成分の濃度は、通常次の範囲に設定すれば良い。すな
わち、非イオン界面活性剤は、0.1〜50 g#、フ
ッ素を含む界面活性剤は、0.01〜20.0. g
/ 1、金属錯化剤としては、0.5〜]Og/eが好
ましい。As for the quaternary ammonium alkyl co-stellate polymethacrylate in the fourth claim, the concentrations of the components having the structural formula may generally be set within the following ranges. That is, the nonionic surfactant is 0.1 to 50 g#, and the fluorine-containing surfactant is 0.01 to 20.0 g#. g
/1, as a metal complexing agent, 0.5~]Og/e is preferable.
」二足各成分の濃度が前記の範囲にないと、無電解めっ
き前処理として使用した際に、基板の穴内の水ぬれ性が
十分でなかったり、ブローホールが発生したり、スルー
ホール内に気泡が残存することがあり、その結果リング
状のめっきボイドが発生する場合がある。If the concentration of each component is not within the above range, when used as a pretreatment for electroless plating, water wettability in the holes of the substrate may not be sufficient, blowholes may occur, or there may be problems in the through-holes. Air bubbles may remain, resulting in ring-shaped plating voids.
本発明の前処理液を使用するにあたっては、1lll常
例えば次のように行えば良い。ずなわら、基材として基
板を用いる場合には、該基板に必要に応して穴明けを行
った後に、本発明の前処理液によって処理する。この前
処理は、単に基板を前処理液に浸漬するだけで十分であ
る。この前処理液を使用する際の処理温度は、40℃〜
80°Cとし、処理時間は2〜8分程程度すれば良い。When using the pretreatment liquid of the present invention, the following procedure may be used. When a substrate is used as the base material, holes are formed in the substrate as necessary, and then the substrate is treated with the pretreatment liquid of the present invention. For this pretreatment, simply immersing the substrate in a pretreatment liquid is sufficient. The treatment temperature when using this pretreatment liquid is 40℃~
The temperature may be 80° C., and the processing time may be about 2 to 8 minutes.
このようにして処理された基板は、簡単な水洗いを行っ
た後、ソフトエツチング工程、酸洗工程、プリデイツプ
処理、増感工程(パラジウム等のめっき開始剤の付与)
及び密着促進剤工程等の一般の前処理工程を経て、無電
解銅めっき工程に移すことができる。印刷配線板の製造
にあたっては、上記の無電解めっきを行った基板に、さ
らに電解めっき工程、はんだレジスト工程、はんだめっ
き工程、レジスト#I離工程、エツチング工程等の処理
を施して、製品を得ることができる。After a simple water wash, the substrate treated in this way is subjected to a soft etching process, a pickling process, a pre-dipping process, and a sensitizing process (applying a plating initiator such as palladium).
After passing through a general pretreatment process such as an adhesion promoter process, it can be transferred to an electroless copper plating process. In manufacturing printed wiring boards, the substrate subjected to the above electroless plating is further subjected to treatments such as electrolytic plating process, solder resist process, solder plating process, resist #I release process, etching process, etc. to obtain the product. be able to.
本発明の前処理液を用いると、基板表面の洗浄以外、基
板等の基材への水ぬれ性を著しく向上させ、ブローポー
ルの発生やスルーホール内の気泡の残存が防止できる。When the pretreatment liquid of the present invention is used, in addition to cleaning the substrate surface, it is possible to significantly improve the water wettability of a base material such as a substrate, and prevent the generation of blow poles and the remaining of air bubbles in through holes.
その結果、無電解めっきの析出性、均一性を著しく向」
二さセることができ、したがって、優れた印刷配線板の
製品を安定かつ効率良く製造できる。As a result, the deposition properties and uniformity of electroless plating are significantly improved.
Therefore, excellent printed wiring board products can be manufactured stably and efficiently.
各成分、もしくは、その組成液としての作用機構につい
ては、現段階では不明な点が多く、明確に述べることは
出来ないが推察すると、次のいくつかの点などを挙げる
ことができる。Regarding the mechanism of action of each component or its liquid composition, there are many points that are unclear at this stage and cannot be clearly stated, but the following points can be surmised.
本処理液中の非イオン界面活性剤は、親水性と疏水性と
の調整作用等によって水ぬれ性を向上する作用を及ぼす
ものと推察することができる。含フツ素界面活性剤は、
表面張力を低下せしめる作用を示すとともに、浸透性を
有しており、基板等の基材のスルーホール内の脱泡性の
向上などに有効に作用しているものと考えられる。It can be inferred that the nonionic surfactant in this treatment liquid has an effect of improving water wettability by adjusting hydrophilicity and hydrophobicity. Fluorine-containing surfactants are
In addition to exhibiting the effect of lowering surface tension, it also has permeability, and is considered to be effective in improving the defoaming properties in through-holes of base materials such as substrates.
ポリメタクリル酸4級アンモニウムアルキルエステルを
p H10以上のアルカリ水溶液で基材を処理すること
により、Pd6とキレート形成し易い活性官能基を分子
中に有しているポリメタクリル酸4級アンモニウムアル
キルエステルが増感工程で処理することによりPd°触
媒を吸着し易くなり、特にガラス部に均一に吸着する作
用を及ぼしていると推察される。その結果、スルーホー
ル内へのめっきつき回り性が著しく向上しブローホール
の抑制につながる。By treating the base material of polymethacrylic acid quaternary ammonium alkyl ester with an alkaline aqueous solution with a pH of 10 or higher, polymethacrylic acid quaternary ammonium alkyl ester, which has an active functional group that easily forms a chelate with Pd6 in the molecule, is produced. It is presumed that the treatment in the sensitization step makes it easier to adsorb the Pd° catalyst, and in particular has an effect of uniformly adsorbing it on the glass portion. As a result, the coverage of the plating inside the through-holes is significantly improved, leading to suppression of blowholes.
そして、これらの各成分の協同作用によって、前記した
優れた効果が生じるものと考えられる。It is believed that the above-mentioned excellent effects are produced by the cooperative action of these components.
実施例1
規格の異なる3種類の両面銅張積層板、板厚3゜0mm
(NEMA規格FR−4,OEM−1及びOEM−3材
)に直径0.3mmのドリルにて穴明けしたものを供試
料とした。穴数:600穴のこの基板を実施例1、実施
例本発明液に浸漬後、200g/I過硫酸アンモニウム
(ソフトエツチング)、10%HzSO4(酸洗い液)
、270g/IPD−201(ブリディンプ日立化成工
業製H3201B (増悪剤、日立化成工業製)、AD
P401 (密着促進剤、日立化成工業製)の無電解め
っき前処理を行い、CUST−201(無電解銅めっき
液、日立化成工業製)で20分間めっきを行い、その後
ピロリン酸銅めっきを3へ/dm”で64分間行い、回
路形成後、スルーホールボイドの発生とブローポールの
発生テストを行った。Example 1 Three types of double-sided copper-clad laminates with different standards, plate thickness 3゜0mm
(NEMA standard FR-4, OEM-1, and OEM-3 materials) were made into test samples by drilling holes with a drill having a diameter of 0.3 mm. Number of holes: This substrate with 600 holes was immersed in Example 1, Example invention solution, 200 g/I ammonium persulfate (soft etching), 10% Hz SO4 (pickling solution)
, 270g/IPD-201 (Bridimp Hitachi Chemical H3201B (exacerbant, Hitachi Chemical), AD
Perform electroless plating pretreatment with P401 (adhesion promoter, manufactured by Hitachi Chemical), perform plating with CUST-201 (electroless copper plating solution, manufactured by Hitachi Chemical) for 20 minutes, and then proceed to step 3 of copper pyrophosphate plating. /dm'' for 64 minutes, and after forming the circuit, a through hole void generation and blow pole generation test was performed.
実施例■、実施例2、比較例1、比較例2の結果を表1
に示す。Table 1 shows the results of Example ■, Example 2, Comparative Example 1, and Comparative Example 2.
Shown below.
実施例1の組成
1)ポリオキシエチレンオクチルフェニルエーテルであ
るノニオ7MS−210;2g/6(日本油脂株式会社
5商品名)
2)ユニセーフHFA−5820;Ig/j!(日本油
脂株式会社、商品名)
3)エチレンジアミン四酢酸(EDTA)i1g/ρ
4)ポリメタクリル酸4級アンモニウムアルキルエステ
ルであるネオフィックスR3
(日華化学株式会社、商品名) ;2g/ρ1)〜
4)を含むp H10のアルカリ水溶液の前処理液
実施例2の組成
1)ポリオキンエチレンノニルフェニルエーテルである
ノニオ7NS−212;4[X//(日本油脂株式会社
、商品名)
2)フタージュント251 (ネオ入社。商品名);I
g/j!
3)トリエタノールアミン ;2g/7!4)
ポリメククリル#4級アンモニウムアルキルエステルで
あるネオフィックスR5
; 2 g#
l)〜4)を含むp H12のアルカリ水溶液の前処理
液
比較例1の組成
1)ポリオキシエチレンオクヂルフェニルエーテルであ
るノニオンH3−210i2g/l(日本油脂株式会社
、商品名)
2)塩化ベヘニルトリメチルアンモニウムであるカチナ
ールDC−80:2g/l
(東邦化学株式会社、商品名)
比較例2の組成
l)ポリオキシエチレンノニル・フエノルエーテル ノ
ニオンH5−210;4g/j!(日木油脂株式会社、
商品名)
γ−アミノプロピルトリエトキシシラン人;2g/6
(日本ユニカー社
商品名)
フローホ
処理無し。Composition of Example 1 1) Nonio 7MS-210, which is polyoxyethylene octylphenyl ether; 2 g/6 (NOF Corporation 5 trade name) 2) Unisafe HFA-5820; Ig/j! (NOF Corporation, trade name) 3) Ethylenediaminetetraacetic acid (EDTA) i1g/ρ 4) Neofix R3, a polymethacrylic acid quaternary ammonium alkyl ester (NICCA Chemical Co., Ltd., trade name); 2g/ρ1) ~
Composition of Pretreatment Solution Example 2 of aqueous alkaline solution with pH 10 containing 4) 1) Nonio 7NS-212, which is polyoxine ethylene nonylphenyl ether; 251 (Joined Neo.Product name);I
g/j! 3) Triethanolamine; 2g/7!4)
Composition of Comparative Example 1 of pre-treatment liquid of alkaline aqueous solution at pH 12 containing Neofix R5, which is polymeccryl #quaternary ammonium alkyl ester; 2 g# l) to 4) 1) Nonion H3, which is polyoxyethylene ocdylphenyl ether -210i2g/l (Nippon Oil & Fats Co., Ltd., trade name) 2) Catinal DC-80, behenyltrimethylammonium chloride: 2g/l (Toho Chemical Co., Ltd., tradename) Composition of Comparative Example 2 l) Polyoxyethylene nonyl Phenol ether nonion H5-210; 4g/j! (Hiki Yushi Co., Ltd.,
(Product name) γ-Aminopropyltriethoxysilane; 2g/6 (Product name of Nippon Unicar Co., Ltd.) No flow treatment.
ルテスト;MIL規格p−5110にf$拠し湿度95
%温度65゛Cの場所に
7211r放置し、十分吸湿さゼ
たのち260“Cに加熱された
半田浴に浸漬した時に発生
するブローボール数をカラ
ントした。Le test; Humidity 95 according to MIL standard p-5110
The number of blow balls generated when the sample was left in a 7211r at a temperature of 65°C to sufficiently absorb moisture and then immersed in a solder bath heated to 260°C was counted.
実施例1へ2と比較例1〜2の結果を第1表に示すよう
に、実施例1〜2の前処理液は、比較例1〜2と比べて
明らかに優れていた。As the results of Examples 1 to 2 and Comparative Examples 1 and 2 are shown in Table 1, the pretreatment liquids of Examples 1 and 2 were clearly superior to Comparative Examples 1 and 2.
以」二に説明したように、本発明によって、印刷配線板
用基板等の法材への水ぬれ性に優れ、穴明き基板等のブ
ローホールの発生が少なく、スルーホール内の脱泡性に
優れ、無電解めっきの析出性、均一性を著しく向上でき
ることができ、めっきボイドの発生を防止することがで
きる無電解めっき用前処理液を提供することができる。As explained in Section 2 below, the present invention has excellent water wettability for substrates such as substrates for printed wiring boards, reduces the occurrence of blowholes in perforated substrates, and improves air release properties in through holes. It is possible to provide a pretreatment liquid for electroless plating that has excellent properties, can significantly improve the deposition properties and uniformity of electroless plating, and can prevent the occurrence of plating voids.
Claims (4)
属錯化剤及びポリメタクリル酸4級アンモニウムアルキ
ルエステル化物を含むpH10以上のアルカリ水溶液よ
り成る無電解めっきの前処理液。1. A pretreatment solution for electroless plating comprising an alkaline aqueous solution with a pH of 10 or more containing a nonionic surfactant, a fluorine-containing surfactant, a metal complexing agent, and a quaternary ammonium alkyl ester of polymethacrylate.
2O)_nH(但し、R:−C_nH_2_n_+_1
,C_nH_2_n_+_1−)で示される特許第1項
記載の無電解めっきの前処理液。2. Nonionic surfactants have the general formula RO(CH_2CH_
2O)_nH (However, R: -C_nH_2_n_+_1
, C_nH_2_n_+_1-).
4酢酸又はその塩、エチレンジアミンテトラ−2−プロ
パノール、トリエタノールアミン、モノエタノールアミ
ン、グルコン酸又はその塩、クエン酸又はその塩の単体
、又はそれらの混合物である特許請求の範囲第1項記載
の無電解めっき用前処理液。3. The metal complexing agent is tartaric acid or its salt, ethylenediaminetetraacetic acid or its salt, ethylenediaminetetra-2-propanol, triethanolamine, monoethanolamine, gluconic acid or its salt, citric acid or its salt, or a mixture thereof. A pretreatment liquid for electroless plating according to claim 1.
ル化物が下記の一般式であることを特徴とする特許請求
の範囲第1項記載の無電解めっき用前処理液。 ▲数式、化学式、表等があります▼ R;アルキル基,n=50,000以下4. The pretreatment liquid for electroless plating according to claim 1, wherein the quaternary ammonium alkyl ester of polymethacrylic acid has the following general formula. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ R: Alkyl group, n = 50,000 or less
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13231290A JPH0426771A (en) | 1990-05-22 | 1990-05-22 | Pretreating solution for electroless plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13231290A JPH0426771A (en) | 1990-05-22 | 1990-05-22 | Pretreating solution for electroless plating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0426771A true JPH0426771A (en) | 1992-01-29 |
Family
ID=15078373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13231290A Pending JPH0426771A (en) | 1990-05-22 | 1990-05-22 | Pretreating solution for electroless plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0426771A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2002072915A1 (en) * | 2001-03-13 | 2004-07-02 | 荏原ユージライト株式会社 | Conditioning agents and their use |
JP2006249520A (en) * | 2005-03-11 | 2006-09-21 | Hitachi Chem Co Ltd | Pretreatment liquid for electroless plating and electroless plating method using the same |
JP2006291244A (en) * | 2005-04-06 | 2006-10-26 | Hitachi Chem Co Ltd | Pre-treatment liquid for electroless plating, and electroless plating method using the same |
JP2008203442A (en) * | 2007-02-19 | 2008-09-04 | Fujitsu Ltd | Pattern forming method, method for manufacturing electronic apparatus, and electronic apparatus |
JP2014091858A (en) * | 2012-11-05 | 2014-05-19 | Hitachi Chemical Co Ltd | Pretreatment agent for electroless plating and production method thereof |
EP3670698A1 (en) * | 2018-12-17 | 2020-06-24 | ATOTECH Deutschland GmbH | Aqueous alkaline pre-treatment solution for use prior to deposition of a palladium activation layer, method and use thereof |
-
1990
- 1990-05-22 JP JP13231290A patent/JPH0426771A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2002072915A1 (en) * | 2001-03-13 | 2004-07-02 | 荏原ユージライト株式会社 | Conditioning agents and their use |
JP4651266B2 (en) * | 2001-03-13 | 2011-03-16 | 荏原ユージライト株式会社 | Conditioning agents and their use |
JP2006249520A (en) * | 2005-03-11 | 2006-09-21 | Hitachi Chem Co Ltd | Pretreatment liquid for electroless plating and electroless plating method using the same |
JP2006291244A (en) * | 2005-04-06 | 2006-10-26 | Hitachi Chem Co Ltd | Pre-treatment liquid for electroless plating, and electroless plating method using the same |
JP4640586B2 (en) * | 2005-04-06 | 2011-03-02 | 日立化成工業株式会社 | Pretreatment liquid for electroless plating and electroless plating method using the same |
JP2008203442A (en) * | 2007-02-19 | 2008-09-04 | Fujitsu Ltd | Pattern forming method, method for manufacturing electronic apparatus, and electronic apparatus |
JP2014091858A (en) * | 2012-11-05 | 2014-05-19 | Hitachi Chemical Co Ltd | Pretreatment agent for electroless plating and production method thereof |
EP3670698A1 (en) * | 2018-12-17 | 2020-06-24 | ATOTECH Deutschland GmbH | Aqueous alkaline pre-treatment solution for use prior to deposition of a palladium activation layer, method and use thereof |
WO2020126145A1 (en) * | 2018-12-17 | 2020-06-25 | Atotech Deutschland Gmbh | Aqueous alkaline pre-treatment solution for use prior to deposition of a palladium activation layer, method and use thereof |
KR20210095709A (en) * | 2018-12-17 | 2021-08-02 | 아토테크더치랜드게엠베하 | Aqueous alkaline pretreatment solution for use prior to deposition of palladium activation layer, method and use thereof |
JP2022515055A (en) * | 2018-12-17 | 2022-02-17 | アトテック ドイチェランド ゲーエムベーハー | Aqueous alkaline pretreatment solution to be used prior to the deposition of the palladium activated layer, its method and use |
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