JP2001247973A - Cleaning and conditioning agent and electroless copper plating method for printed circuit board - Google Patents

Cleaning and conditioning agent and electroless copper plating method for printed circuit board

Info

Publication number
JP2001247973A
JP2001247973A JP2000060006A JP2000060006A JP2001247973A JP 2001247973 A JP2001247973 A JP 2001247973A JP 2000060006 A JP2000060006 A JP 2000060006A JP 2000060006 A JP2000060006 A JP 2000060006A JP 2001247973 A JP2001247973 A JP 2001247973A
Authority
JP
Japan
Prior art keywords
copper plating
cleaning
electroless copper
printed wiring
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000060006A
Other languages
Japanese (ja)
Inventor
Yoshiyasu Kuwata
能安 桑田
Teruyuki Hotta
輝幸 堀田
Shinko Maruko
真弘 丸子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C Uyemura and Co Ltd
Original Assignee
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C Uyemura and Co Ltd filed Critical C Uyemura and Co Ltd
Priority to JP2000060006A priority Critical patent/JP2001247973A/en
Publication of JP2001247973A publication Critical patent/JP2001247973A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Detergent Compositions (AREA)
  • Chemically Coating (AREA)

Abstract

PROBLEM TO BE SOLVED: To uniformly form electroless copper plating films to various printed circuit boards with tight adhesion. SOLUTION: This cleaning and conditioning agent for electroless copper plating of various kinds of printed circuit boards contains a water soluble titanate coupling agent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント配線板の
非導電性面(貫通孔壁面、非貫通孔面を含む)に無電解
銅めっき皮膜を形成する際の前処理に用いられる洗浄・
調整剤、及びこれを使用したプリント配線板の無電解銅
めっき方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning and cleaning method used for a pretreatment before forming an electroless copper plating film on a non-conductive surface (including a through-hole wall surface and a non-through hole surface) of a printed wiring board.
The present invention relates to a conditioner and a method for electroless copper plating of a printed wiring board using the conditioner.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】プリン
ト配線板の非導電性表面に無電解銅めっきを施すために
は、非導電性表面に無電解銅めっきに対して触媒作用を
持つパラジウムの付与が必要である。
2. Description of the Related Art In order to apply electroless copper plating to a non-conductive surface of a printed wiring board, palladium having a catalytic action on electroless copper plating on a non-conductive surface is required. Grant is required.

【0003】従来、パラジウムの付与を行うための無電
解銅めっきの前処理工程は、プリント配線板の貫通孔表
面に露出するガラス繊維に均一に無電解銅めっきを施す
に足るパラジウムを付与することを主目的とし、ガラス
繊維の陰電荷を中和するために陽イオン化合物が含まれ
る洗浄・調整のための処理液を必要とした。そのため、
層間樹脂絶縁層と導体回路とを交互に積層してなる多層
プリント配線板(いわゆるビルドアップ多層プリント配
線板)のガラス繊維の存在しない層間樹脂絶縁層では、
陽イオン化合物の層が層間樹脂絶縁層の上に形成され、
無電解銅めっきの密着力を低下させる問題があった。
Conventionally, a pretreatment step of electroless copper plating for applying palladium is to apply palladium sufficient to uniformly apply electroless copper plating to glass fibers exposed on the surface of a through hole of a printed wiring board. In order to neutralize the negative charge of the glass fiber, a processing solution containing a cationic compound for cleaning and adjustment was required. for that reason,
In a multi-layer printed wiring board (a so-called build-up multi-layer printed wiring board) in which an interlayer resin insulating layer and a conductor circuit are alternately laminated, an interlayer resin insulating layer in which no glass fiber exists,
A layer of a cationic compound is formed on the interlayer resin insulation layer,
There is a problem that the adhesion of the electroless copper plating is reduced.

【0004】本発明は上記事情を改善するためになされ
たもので、ガラス繊維の露呈する非導電性面は勿論、ガ
ラス繊維の存在しない非導電性面に対しても密着よく無
電解銅めっき皮膜を形成させる洗浄・調整剤及びこれを
用いたプリント配線板の無電解銅めっき方法を提供する
ことを目的とする。
The present invention has been made to improve the above circumstances, and has good electroless copper plating film adhesion not only to a non-conductive surface where glass fiber is exposed but also to a non-conductive surface where no glass fiber is present. It is an object of the present invention to provide a cleaning / adjusting agent for forming a liquid crystal and a method for electroless copper plating of a printed wiring board using the same.

【0005】[0005]

【課題を解決するための手段及び発明の実施の形態】本
発明者は、上記目的を達成するため鋭意検討を行った結
果、プリント配線板を洗浄・調整剤で処理した後、パラ
ジウム付与処理を行い、次いで無電解銅めっきを施して
プリント配線板の非導電性表面に無電解銅めっき層を形
成する場合、上記洗浄・調整剤にチタネートカップリン
グ剤を含有させたものを使用することにより、ガラス繊
維の露出したプリント配線板の貫通孔壁面に、従来の陽
イオン化合物を含む洗浄・調整剤により処理した場合と
同様に、密着よく均一に無電解銅めっき皮膜を形成し得
る上、ガラス繊維の存在しない層間樹脂絶縁層のプリン
ト配線板に対しても優れた密着力で無電解銅めっき皮膜
を形成することができ、このようにプリント配線板の非
導電性表面(貫通孔壁面、非貫通孔面も含む)をチタネ
ートカップリング剤を含む洗浄・調整のための水溶液で
処理することにより、密着よく無電解銅めっきを施すこ
とができることを知見し、本発明をなすに至った。
Means for Solving the Problems and Embodiments of the Invention As a result of diligent studies to achieve the above object, the present inventor has conducted a palladium application treatment after treating a printed wiring board with a cleaning and conditioning agent. Performing, then, when performing electroless copper plating to form an electroless copper plating layer on the non-conductive surface of the printed wiring board, by using a cleaning and conditioning agent containing a titanate coupling agent, In the same manner as when a conventional cleaning / conditioning agent containing a cationic compound is applied to the through-hole wall surface of a printed wiring board where glass fibers are exposed, an electroless copper plating film can be formed with good adhesion and uniformity. An electroless copper plating film can be formed with excellent adhesion to a printed wiring board of an interlayer resin insulation layer free of the presence of a non-conductive surface. It has been found that by treating a wall surface and a non-through hole surface with an aqueous solution for cleaning and adjustment containing a titanate coupling agent, electroless copper plating can be performed with good adhesion, and the present invention has been accomplished. Was.

【0006】従って、本発明は、(1)水溶性チタネー
トカップリング剤を含有することを特徴とするプリント
配線板の無電解銅めっき用洗浄・調整剤、(2)プリン
ト配線板を洗浄・調整剤で処理した後、パラジウム付与
処理を行い、次いで無電解銅めっきを施してプリント配
線板の非導電性表面に無電解銅めっき層を形成するプリ
ント配線板の無電解銅めっき方法において、上記洗浄・
調整剤として、水溶性チタネートカップリング剤を含有
する洗浄・調整剤を使用することを特徴とするプリント
配線板の無電解銅めっき方法を提供する。
Accordingly, the present invention provides (1) a cleaning and conditioning agent for electroless copper plating of a printed wiring board, which comprises a water-soluble titanate coupling agent, and (2) cleaning and conditioning of a printed wiring board. In the method of electroless copper plating of a printed wiring board, in which a palladium imparting treatment is performed after the treatment with an agent, and then an electroless copper plating is performed to form an electroless copper plating layer on a non-conductive surface of the printed wiring board,・
Provided is a method for electroless copper plating of a printed wiring board, characterized by using a cleaning / conditioning agent containing a water-soluble titanate coupling agent as a conditioner.

【0007】以下、本発明につき更に詳しく説明する。
本発明のプリント配線板の無電解銅めっき方法におい
て、その工程は公知の工程に従って行うことができ、プ
リント配線板の表面コンディショニングのために洗浄・
調整剤に浸漬処理し、金属パラジウム核の付与処理を行
い、無電解銅めっきを行うという公知の方法を採用し得
る。
Hereinafter, the present invention will be described in more detail.
In the method for electroless copper plating of a printed wiring board according to the present invention, the steps can be performed according to a known step, and cleaning and cleaning are performed for surface conditioning of the printed wiring board.
It is possible to adopt a known method of immersing in an adjusting agent, applying a metal palladium nucleus, and performing electroless copper plating.

【0008】ここで、プリント配線板としては、ガラス
エポキシ樹脂等のガラス繊維を有するもの、層間樹脂絶
縁層等のガラス繊維の存在しないもの、これらが積層さ
れたものなどが挙げられ、片面又は両面に銅箔を有する
銅張り板であってもよい。また、貫通孔(スルホール)
を有するものでも、非貫通孔を有するものでもよい。本
発明によれば、これらプリント配線板の非導電性部分、
即ちプリント配線板の表面(銅箔が積層されていない場
合)、貫通孔壁面や非貫通孔の壁面、底面などに無電解
銅めっき皮膜が形成される。なお、銅張り板の場合も、
その銅箔表面に無電解銅めっきが施される。
Examples of the printed wiring board include those having glass fibers such as glass epoxy resin, those having no glass fibers such as an interlayer resin insulating layer, and those having these laminated. May be a copper-clad board having a copper foil. In addition, through-holes (through holes)
Or a non-through hole. According to the present invention, the non-conductive portion of these printed wiring boards,
That is, the electroless copper plating film is formed on the surface of the printed wiring board (when the copper foil is not laminated), the wall surface of the through hole, the wall surface of the non-through hole, and the bottom surface. In the case of copper-clad boards,
Electroless copper plating is applied to the copper foil surface.

【0009】本発明においては、このようなプリント配
線板に対し、基板表面、貫通孔、非貫通孔の洗浄・調整
(クリーニング及びコンディショニング)のために、ま
ず洗浄・調整剤に浸漬処理を施すものであるが、本発明
は、この洗浄・調整剤として水溶性チタネートカップリ
ング剤を含有するものを使用する。
In the present invention, such a printed wiring board is first immersed in a cleaning / conditioning agent for cleaning / adjustment (cleaning and conditioning) of the substrate surface, through holes and non-through holes. However, in the present invention, a cleaning / conditioning agent containing a water-soluble titanate coupling agent is used.

【0010】この場合、水溶性チタネートカップリング
剤としては、例えば、イソプロピルトリ(N−アミドエ
チルアミノエチル)チタネート、イソプロピルトリス
(ジオクチルピロホスフェート)チタネート、ビス(ジ
オクチルピロホスフェート)オキシアセテートチタネー
ト、ビス(ジオクチルピロホスフェート)エチレンチタ
ネートなどが挙げられ、これらチタネートカップリング
剤は、0.1〜50g/L、特に1〜10g/Lの量で
洗浄・調整剤に含有させることが好ましい。
In this case, as the water-soluble titanate coupling agent, for example, isopropyl tri (N-amidoethylaminoethyl) titanate, isopropyl tris (dioctyl pyrophosphate) titanate, bis (dioctyl pyrophosphate) oxyacetate titanate, bis ( Dioctyl pyrophosphate) ethylene titanate. These titanate coupling agents are preferably contained in the washing / conditioning agent in an amount of 0.1 to 50 g / L, particularly 1 to 10 g / L.

【0011】この洗浄・調整剤には、チタネートカップ
リング剤に加えて、非イオン界面活性剤、銅の錯化剤、
pH調整剤などを配合することができる。非イオン界面
活性剤としては、例えばポリオキシアルキレンアルキル
エーテル、ポリアルキレングリコール、ポリアルキレン
グリコールのコポリマーなどを使用することができ、そ
の配合量は0.1〜50g/L、特に1〜10g/Lと
することができる。また、銅の錯化剤としては、ジエチ
レントリアミン、モノエタノールアミン、トリエタノー
ルアミン、グルコン酸ナトリウム等を配合でき、その配
合量は0.1〜10g/L、特に0.5〜10g/Lと
することができる。更に、pH調整剤としては、アンモ
ニア水、水酸化ナトリウム、四ホウ酸ナトリウム等を配
合でき、この場合、pH調整剤は、本発明の洗浄・調整
剤のpHを7〜13、特に10〜12にするように配合
することができる。
The washing / conditioning agent includes a nonionic surfactant, a copper complexing agent,
A pH adjuster or the like can be blended. As the nonionic surfactant, for example, polyoxyalkylene alkyl ether, polyalkylene glycol, a copolymer of polyalkylene glycol, and the like can be used, and the blending amount is 0.1 to 50 g / L, particularly 1 to 10 g / L. It can be. Further, as a copper complexing agent, diethylene triamine, monoethanolamine, triethanolamine, sodium gluconate and the like can be compounded, and the compounding amount is 0.1 to 10 g / L, particularly 0.5 to 10 g / L. be able to. Further, as the pH adjuster, ammonia water, sodium hydroxide, sodium tetraborate and the like can be blended. In this case, the pH adjuster adjusts the pH of the cleaning / adjusting agent of the present invention to 7 to 13, especially 10 to 12 Can be blended.

【0012】プリント配線板は、この洗浄・調整剤に浸
漬することにより処理することができるが、処理条件と
しては、30〜70℃、特に40〜60℃で、1〜20
分、特に3〜10分の条件とすることが好ましい。
The printed wiring board can be treated by immersing it in this cleaning / conditioning agent. The treatment conditions are 30 to 70 ° C., particularly 40 to 60 ° C., and 1 to 20 ° C.
Minutes, particularly preferably 3 to 10 minutes.

【0013】本発明においては、上記洗浄・調整剤によ
る処理後は、パラジウム付与処理を行うが、この場合、
銅張りプリント板にあっては、パラジウム付与処理前に
銅表面のエッチング処理(ソフトエッチング)、銅表面
の洗浄のための酸洗浄を常法に従って行うことができ
る。
In the present invention, after the treatment with the above-mentioned washing / conditioning agent, palladium imparting treatment is performed.
In the case of a copper-clad printed board, an etching process (soft etching) of the copper surface and an acid cleaning for cleaning the copper surface can be performed according to a conventional method before the palladium application process.

【0014】上記パラジウム付与処理も公知方法で行う
ことができ、例えば上村工業(株)製アルカッププロセ
スを採用し得る。
The above-mentioned palladium imparting treatment can also be performed by a known method, for example, an Alcup process manufactured by Uemura Kogyo KK can be adopted.

【0015】次いで、無電解銅めっきを行うが、これも
公知の方法を採用でき、無電解銅めっき液としては公知
のものを用い、その通常の条件でめっきを行うことがで
きる。
Next, electroless copper plating is performed, and a known method can also be adopted. A known electroless copper plating solution can be used, and plating can be performed under the usual conditions.

【0016】本発明によれば、上述したチタネートカッ
プリング剤を配合した洗浄・調整剤を使用したことによ
り、ガラス繊維の存在しない層間樹脂絶縁層のプリント
配線板に対して密着よく無電解銅めっき皮膜を形成で
き、またガラス繊維の露出したプリント配線板に対して
も密着性よく無電解銅めっき皮膜を形成することができ
る。このため、層間樹脂絶縁層と導体回路とを交互に積
層したビルドアップ多層プリント配線板等の多層プリン
ト配線板のスルホールめっきなどに有効である。
According to the present invention, the use of the above-mentioned cleaning / adjusting agent containing the titanate coupling agent makes it possible to obtain an electroless copper plating with good adhesion to a printed wiring board having an interlayer resin insulating layer free of glass fibers. A film can be formed, and an electroless copper plating film can be formed with good adhesiveness to a printed wiring board on which glass fibers are exposed. Therefore, it is effective for through-hole plating of a multilayer printed wiring board such as a build-up multilayer printed wiring board in which interlayer resin insulating layers and conductive circuits are alternately laminated.

【0017】[0017]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。
EXAMPLES The present invention will be described below in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples.

【0018】[実施例1]表面がエポキシ系層間樹脂絶
縁層のプリント配線板に対し、下記洗浄・調整剤に50
℃で7分間浸漬処理した後、常法に従ってパラジウム付
与処理を行い(上村工業(株)製アルカッププロセス使
用)、次いで無電解銅めっき液(上村工業(株)製スル
カップPEA)に36℃で30分間浸漬し、無電解銅め
っきを行った。その後、密着強度測定のために、補助め
っきとして電気銅めっきを30μm施した後、150
℃,1時間の熱処理を行い、次いで90°ピール強度を
測定した。洗浄・調整剤組成 イソプロピルトリ(N−アミドエチルアミノエチル)チタネート 5g/L ポリエチレングリコール 5g/L ジエチレントリアミン 5g/L
Example 1 For a printed wiring board having a surface of an epoxy-based interlayer resin insulating layer, 50
After immersion treatment at 7 ° C. for 7 minutes, palladium imparting treatment is performed in accordance with a conventional method (using Alcup process manufactured by Uemura Kogyo Co., Ltd.), and then into an electroless copper plating solution (Sulcup PEA manufactured by Uemura Kogyo Co., Ltd.) at 36 ° C. It was immersed for 30 minutes to perform electroless copper plating. Thereafter, for the purpose of measuring the adhesion strength, 30 μm of electrolytic copper plating was applied as auxiliary plating, and then 150 μm was applied.
C. for 1 hour, and then measured the 90.degree. Peel strength. Cleaning / conditioning agent composition Isopropyl tri (N-amidoethylaminoethyl) titanate 5 g / L Polyethylene glycol 5 g / L Diethylene triamine 5 g / L

【0019】[実施例2]表面がガラスエポキシ樹脂の
プリント配線板を試験に用いたこと以外は実施例1と同
様に実施した。
Example 2 Example 2 was performed in the same manner as in Example 1 except that a printed wiring board having a surface made of glass epoxy resin was used for the test.

【0020】[実施例3]ガラス繊維の露出した貫通孔
を有する表面が銅箔のガラスエポキシ樹脂のプリント配
線板を試験に用いたこと以外は実施例1と同様に実施し
た。
Example 3 A test was performed in the same manner as in Example 1 except that a printed wiring board made of a glass epoxy resin having a copper foil and a surface having an exposed through-hole of glass fiber was used for the test.

【0021】[比較例1]洗浄・調整剤を陽イオン化合
物を含む下記組成にしたこと以外は実施例1と同様に実
施した。洗浄・調整剤組成 ポリビニルイミダゾールの4級化合物 5g/L ポリエチレングリコール 5g/L ジエチレントリアミン 5g/L
Comparative Example 1 The same operation as in Example 1 was carried out except that the cleaning / conditioning agent had the following composition containing a cationic compound. Cleaning / conditioning agent composition Quaternary compound of polyvinylimidazole 5 g / L Polyethylene glycol 5 g / L Diethylenetriamine 5 g / L

【0022】[比較例2]表面がガラスエポキシ樹脂の
プリント配線板を試験に用いたこと以外は比較例1と同
様に実施した。
[Comparative Example 2] The same operation as in Comparative Example 1 was carried out except that a printed wiring board having a surface made of glass epoxy resin was used for the test.

【0023】[比較例3]ガラス繊維の露出した貫通孔
を有する表面が銅箔のガラスエポキシ樹脂のプリント配
線板を試験に用いたこと以外は比較例1と同様に実施し
た。
[Comparative Example 3] The same procedure as in Comparative Example 1 was carried out except that a printed wiring board made of a glass epoxy resin having a copper foil and a surface having an exposed through-hole of glass fiber was used for the test.

【0024】[比較例4]洗浄・調整剤にチタネートカ
ップリング剤及び陽イオン化合物を含まない下記組成に
したこと以外は実施例1と同様に実施した。洗浄・調整剤組成 ポリエチレングリコール 5g/L ジエチレントリアミン 5g/L
Comparative Example 4 The same procedure as in Example 1 was carried out except that the cleaning / conditioning agent had the following composition without a titanate coupling agent and a cationic compound. Cleaning / conditioning agent composition Polyethylene glycol 5 g / L Diethylene triamine 5 g / L

【0025】[比較例5]表面がガラスエポキシ樹脂の
プリント配線板を試験に用いたこと以外は比較例4と同
様に実施した。
[Comparative Example 5] The same procedure as in Comparative Example 4 was carried out except that a printed wiring board having a surface made of glass epoxy resin was used for the test.

【0026】[比較例6]ガラス繊維の露出した貫通孔
を有する表面が銅箔のガラスエポキシ樹脂のプリント配
線板を試験に用いたこと以外は比較例4と同様に実施し
た。以上の結果を表1に示す。
Comparative Example 6 The same procedure as in Comparative Example 4 was carried out except that a printed wiring board made of a glass epoxy resin having a copper foil and having a through hole in which glass fibers were exposed was used for the test. Table 1 shows the above results.

【0027】[0027]

【表1】 [Table 1]

【0028】[0028]

【発明の効果】本発明によれば、各種プリント配線板に
対し、均一で密着よく無電解銅めっき皮膜を形成するこ
とができる。
According to the present invention, an electroless copper plating film can be formed on various printed wiring boards uniformly and with good adhesion.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/26 H05K 3/26 E (72)発明者 丸子 真弘 大阪府枚方市出口1丁目5番1号 上村工 業株式会社中央研究所内 Fターム(参考) 4H003 BA12 DA15 EB13 EB26 EB36 ED02 4K022 AA02 AA13 AA18 AA37 BA08 CA03 CA06 CA16 CA17 CA21 CA22 DA01 5E343 AA15 AA17 BB24 BB67 CC73 DD33 EE02 GG02 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 3/26 H05K 3/26 E (72) Inventor Masahiro Maruko 1-5-1, Exit Hirakata-shi, Osaka 4H003 BA12 DA15 EB13 EB26 EB36 ED02 4K022 AA02 AA13 AA18 AA37 BA08 CA03 CA06 CA16 CA17 CA21 CA22 DA01 5E343 AA15 AA17 BB24 BB67 CC73 DD33 EE02 GG02

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 水溶性チタネートカップリング剤を含有
することを特徴とするプリント配線板の無電解銅めっき
用洗浄・調整剤。
1. A cleaning / conditioning agent for electroless copper plating of a printed wiring board, comprising a water-soluble titanate coupling agent.
【請求項2】 プリント配線板を洗浄・調整剤で処理し
た後、パラジウム付与処理を行い、次いで無電解銅めっ
きを施してプリント配線板の非導電性表面に無電解銅め
っき層を形成するプリント配線板の無電解銅めっき方法
において、上記洗浄・調整剤として、水溶性チタネート
カップリング剤を含有する洗浄・調整剤を使用すること
を特徴とするプリント配線板の無電解銅めっき方法。
2. A printed circuit board comprising a printed wiring board, which is treated with a cleaning and conditioning agent, palladium is applied, and then electroless copper plating is performed to form an electroless copper plating layer on a non-conductive surface of the printed wiring board. An electroless copper plating method for a printed wiring board, wherein a cleaning / conditioning agent containing a water-soluble titanate coupling agent is used as the cleaning / conditioning agent.
JP2000060006A 2000-03-06 2000-03-06 Cleaning and conditioning agent and electroless copper plating method for printed circuit board Pending JP2001247973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000060006A JP2001247973A (en) 2000-03-06 2000-03-06 Cleaning and conditioning agent and electroless copper plating method for printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000060006A JP2001247973A (en) 2000-03-06 2000-03-06 Cleaning and conditioning agent and electroless copper plating method for printed circuit board

Publications (1)

Publication Number Publication Date
JP2001247973A true JP2001247973A (en) 2001-09-14

Family

ID=18580385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000060006A Pending JP2001247973A (en) 2000-03-06 2000-03-06 Cleaning and conditioning agent and electroless copper plating method for printed circuit board

Country Status (1)

Country Link
JP (1) JP2001247973A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101979709A (en) * 2010-11-15 2011-02-23 深圳市成功科技有限公司 Novel chemical copper plating method
CN115029749A (en) * 2022-06-01 2022-09-09 南通赛可特电子有限公司 Alkaline pore-finishing agent and application thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101979709A (en) * 2010-11-15 2011-02-23 深圳市成功科技有限公司 Novel chemical copper plating method
CN101979709B (en) * 2010-11-15 2012-11-21 深圳市成功科技有限公司 Novel chemical copper plating method
CN115029749A (en) * 2022-06-01 2022-09-09 南通赛可特电子有限公司 Alkaline pore-finishing agent and application thereof

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