JPH0426530A - Surface treatment of fluoride glass - Google Patents

Surface treatment of fluoride glass

Info

Publication number
JPH0426530A
JPH0426530A JP12818390A JP12818390A JPH0426530A JP H0426530 A JPH0426530 A JP H0426530A JP 12818390 A JP12818390 A JP 12818390A JP 12818390 A JP12818390 A JP 12818390A JP H0426530 A JPH0426530 A JP H0426530A
Authority
JP
Japan
Prior art keywords
gas
glass
crystallization
fluoride glass
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12818390A
Other languages
Japanese (ja)
Inventor
Yoshinori Kubota
能徳 久保田
Akira Sakagami
晃 坂上
Yasushi Kida
喜田 康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP12818390A priority Critical patent/JPH0426530A/en
Publication of JPH0426530A publication Critical patent/JPH0426530A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/02Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor
    • C03B37/025Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor from reheated softened tubes, rods, fibres or filaments, e.g. drawing fibres from preforms
    • C03B37/027Fibres composed of different sorts of glass, e.g. glass optical fibres
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/80Non-oxide glasses or glass-type compositions
    • C03B2201/82Fluoride glasses, e.g. ZBLAN glass

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To enable treatment for preventing crystallization in a fiber forming device when the title glass is formed into a fiber and to simplify a process by using F2 under specified conditions. CONSTITUTION:Gas having <=30vol.% F2 concn. is brought into contact with fluoride glass at <=50 deg.C or gas having 3-50% HF concn. may be brought into contact with the fluoride glass at <=40 deg.C. The fluoride glass has a polished surface or water, hydroxyl groups and oxide formed by a reaction may remain on the surface of the glass. Gas having <=30vol.% F2 concn. is effective in inhibiting crystallization but gas having about 1vol.% F2 concn. is most effective and crystallization is nearly halved. The effect is enhanced in accordance with the reduction of treatment temp. but crystallization is well inhibited at ordinary temp.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明はフッ化物ガラスの表面処理方法に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for surface treatment of fluoride glass.

[従来技術] フッ化物ガラスは紫外域から赤外域に至る幅広い′/l
、透過域を有しており、光学窓材やレーザー用母体材料
、光フアイバー用材料等として応用されている。
[Prior art] Fluoride glass has a wide range of '/l from ultraviolet to infrared range.
It has a transmission range and is used as optical window materials, laser matrix materials, optical fiber materials, etc.

フッ化物ガラスは、四フッ化ジルコニウム、二フフ化バ
リウム、三フフ化アルミニウム等のフッ化物を溶融して
鋳型中等に流し込み、急冷することにより成型物とし、
次いでその表面を平滑にするとともに清浄化される。こ
の平滑化および清浄化のため一般には水研磨法が適用さ
れている。
Fluoride glass is made into a molded product by melting fluorides such as zirconium tetrafluoride, barium difluoride, and aluminum trifluoride, pouring it into a mold, etc., and rapidly cooling it.
The surface is then smoothed and cleaned. A water polishing method is generally applied for this smoothing and cleaning.

フッ化物ガラスは、ガラス転移温度(Tg)と結晶化温
度(Tx)の差(Tx−Tg)が小さ(、熱的な安定性
が酸化物ガラスに比べてかなり悪いものであり、例えば
フッ化物ガラスをファイバー化する際には320℃程度
に温度を上げてガラスを軟化させておこなうものである
が、表面の汚れや付着した水分等の影響により表面が結
晶化しやすくなる。この結晶化によりファイバーの機械
的強度を著しく低下させることとなり、安定した品質の
製品を製造することができない。また、結晶化により散
乱損失を増加させるためファイバーの伝送損失が大きく
なるものである。
Fluoride glasses have a small difference (Tx - Tg) between glass transition temperature (Tg) and crystallization temperature (Tx) (and have significantly worse thermal stability than oxide glasses; for example, fluoride glasses When converting glass into fibers, the temperature is raised to about 320°C to soften the glass, but the surface tends to crystallize due to the effects of surface dirt and adhering moisture.This crystallization causes the fibers to form. This results in a significant decrease in the mechanical strength of the fiber, making it impossible to manufacture products of stable quality.Furthermore, crystallization increases scattering loss, which increases the transmission loss of the fiber.

従来よりかかる結晶化を防止するためフッ化物ガラスの
表面処理法として各種の方法が提案されており、例えば
NF3等のフッ素系ガスによるプラズマ処理[P、H,
Klein、5th 1nternatiOnal S
ymposium on Halide Glasse
s (1988)] 、−NF3 、CF4等のフ、!
l系ガス等によるスパッタ処理(特開昭60−1083
49号) 、NF3 、ClF3、F2等のフッ素系ガ
スを用い260℃程度で加熱処理する方法(特開昭64
−28252号)等が知られている。
In order to prevent such crystallization, various methods have been proposed as surface treatment methods for fluoride glass, such as plasma treatment with fluorine gas such as NF3 [P, H,
Klein, 5th 1nternatiOnal S
Symposium on Halide Glasse
s (1988)], -NF3, CF4, etc.,!
Sputtering treatment using l-based gas, etc.
49), a method of heat treatment at approximately 260°C using a fluorine gas such as NF3, ClF3, F2 (Japanese Patent Laid-Open No. 64
-28252) etc. are known.

しかし、これらの方法は減圧での処理あるいは加熱処理
をおこなうものであり、処理をファイバー化装置内でお
こなうことができず、工程が余計にかかるとともに別に
処理装置が必要となる等の問題がある。
However, these methods involve processing under reduced pressure or heat treatment, and the processing cannot be carried out within the fiberization equipment, resulting in additional steps and the need for separate processing equipment. .

「問題点を解決するための具体的手段〕本発明者らは、
このような従来法の問題点に鑑み鋭意検討の結果、)I
FまたはF2を特定の条件で用いることにより効率よく
フッ化物ガラスを処理することができ、ファイバー化の
際の結晶化を抑制することができることを見出し本発明
に到達した。
"Specific means for solving the problem" The present inventors
As a result of intensive study in view of these problems with the conventional method,
The present invention was achieved by discovering that by using F or F2 under specific conditions, fluoride glass can be efficiently treated and crystallization during fiberization can be suppressed.

すなわち本発明はF2′a度30vol%以下のガスを
50℃以下でフッ化物ガラスと接触させるフッ化物ガラ
スの表面処理方法および)IF濃度3〜50vol%の
ガスを40℃以下でフッ化物ガラスと接触させるフッ化
物ガラスの表面処理方法である。
That is, the present invention provides a surface treatment method for fluoride glass in which a gas with an F2'a degree of 30 vol% or less is brought into contact with fluoride glass at a temperature of 50°C or less, and a) a gas with an IF concentration of 3 to 50 vol% is brought into contact with fluoride glass at a temperature of 40°C or less. This is a method for surface treatment of fluoride glass.

本発明方法が対象とするフッ化物ガラスとしては表面が
研磨処理されたもの、水洗浄処理されたもの、あるいは
表面に水分や水酸基、反応生成した酸化物が残存してい
るものである。また、鋳込み成型されたプリフォーム等
に限定されず、レンズやプリズムのように完成されたフ
ッ化物ガラスにも適用できるものであり、結晶化の原因
となる加熱処理をおこなうものについては全て対象とな
る。
The fluoride glasses targeted by the method of the present invention include those whose surfaces have been polished, those which have been washed with water, or those in which moisture, hydroxyl groups, and oxides produced by reaction remain on the surfaces. In addition, it is not limited to cast-molded preforms, etc., but can also be applied to completed fluoride glasses such as lenses and prisms, and does not apply to all products that undergo heat treatment that can cause crystallization. Become.

本発明方法においては、処理ガスとしてF2またはHF
を用いるものであるが、従来より、F2を用いてフッ化
物ガラスが結晶化を生じない温度で加熱処理する方法、
具体的には260℃程度で処理する方法が知られており
、反応の活性という観点からは、より高温での処理をお
こなうことが一般的であるが、本発明者らが検討した結
果、意外にもむしろ処理温度が低い方がフッ化物ガラス
の結晶化を抑制御る効果があることを見いだしたもので
あり、しかもその処理ガス濃度が低い方が効果があるも
のである。処理ガスの濃度は30vol%以下で結晶化
抑制の効果があり、l vol%程度で最も効果があり
、未処理のものに比べて約半分に結晶化が抑制される。
In the method of the present invention, F2 or HF is used as the processing gas.
However, conventional methods include heat treatment using F2 at a temperature at which fluoride glass does not crystallize;
Specifically, a method of processing at around 260°C is known, and from the viewpoint of reaction activity, it is common to perform processing at higher temperatures, but as a result of our investigation, we found that However, it has been found that a lower treatment temperature is more effective in suppressing the crystallization of fluoride glass, and a lower treatment gas concentration is also more effective. A treatment gas concentration of 30 vol% or less has the effect of suppressing crystallization, and a concentration of about 1 vol% is most effective, suppressing crystallization to about half that of an untreated gas.

処理温度は低いほど効果かあるが、特に冷却手段を用い
ることなく、常温での処理で十分である。
Although the lower the treatment temperature, the better the effect, treatment at room temperature is sufficient without using any particular cooling means.

1(Fガスで処理する場合においてもほぼ同様の条件が
適用されるが、処理ガス濃度は3〜50vol%の範囲
、より好ましくは20〜40vol%の範囲であり、未
処理のものに比べて約2割に結晶化が抑制される。この
範囲より低くても高くても結晶化の抑制効果が低減する
。処理温度はF2の場合と同様に低いほど効果があり、
常温で十分である。
1 (Almost the same conditions are applied when processing with F gas, but the processing gas concentration is in the range of 3 to 50 vol%, more preferably in the range of 20 to 40 vol%, compared to the untreated one. Crystallization is suppressed by about 20%.The effect of suppressing crystallization is reduced when the temperature is lower or higher than this range.As with F2, the lower the treatment temperature, the more effective it is.
Room temperature is sufficient.

これらの処理ガスは水分の可及的に少ないものが好まし
い。また希釈ガスとしてはAr、  82等の不活性ガ
スが好ましい。
These processing gases preferably contain as little moisture as possible. Further, as the diluent gas, an inert gas such as Ar or 82 is preferable.

本発明の方法を実施するための装置は特に限定されず、
ガラスファイバー化の炉をそのまま用いる場合には、処
理ガスの導入口および排気口を有しており、装置内を密
閉系にできるようになっていればよく、その性別の装置
で処理してファイバー化するようにしてもよい。また、
処理時間は処理濃度、ガス流量にもよるが1時間程度で
十分である。
The apparatus for implementing the method of the present invention is not particularly limited,
When using a glass fiber processing furnace as is, it is sufficient that it has an inlet and an exhaust port for processing gas, and that the inside of the equipment can be made into a closed system. . Also,
Although the treatment time depends on the treatment concentration and gas flow rate, about one hour is sufficient.

これらの処理ガスは連続的に流通させた方がより処理効
果が発揮され、特にIFでの処理の場合には流通式での
処理が有効である。F2の場合には流通式にした場合、
やはり処理効果は向上するが、1(Fの場合はど顕著で
はない。
The processing effect is better exhibited when these processing gases are passed continuously, and a flow type processing is particularly effective in the case of IF processing. In the case of F2, if it is made into a flow type,
The processing effect still improves, but it is not as noticeable in the case of 1(F).

以下、本発明を実施例、比較例により具体的に説明する
Hereinafter, the present invention will be specifically explained with reference to Examples and Comparative Examples.

なお以下の実施例、比較例においてはいずれも次の組成
のフッ化物ガラスを使用した。
In the following examples and comparative examples, fluoride glass having the following composition was used.

ZrFa   (51)−8aF2   (20ン−L
aF3  (4,5)−〜aF(20)f()内はモル
%を示す] ファイバー線引き炉と一体の処理装置内に、光学研磨し
たガラスロッドを設置する。処理装置内を真空脱気し、
Arガスで置換した後に所定の濃度のF2またはHF4
こよって所定温度、所定時間で処理をおこなった。処理
後、装置内を真空脱気しArガスで置換した後、Arガ
ス中で325℃に加熱処理した。この結果ガラスロッド
表面に発生した結晶数を測定し、未処理のガラスロッド
を同様にAr中で加熱して表面に発生した結晶数を測定
し、(処理口・7ドの結晶数)/(未処理ロッドの結晶
数)の値を結晶数比としこれを処理効果として評価した
ZrFa (51)-8aF2 (20n-L
aF3(4,5)-~aF(20)f() indicates mol%] An optically polished glass rod is placed in a processing device integrated with a fiber drawing furnace. Vacuum degas the inside of the processing equipment,
F2 or HF4 at a predetermined concentration after replacing with Ar gas
Therefore, the treatment was performed at a predetermined temperature and for a predetermined time. After the treatment, the inside of the apparatus was vacuum degassed and replaced with Ar gas, and then heated to 325° C. in Ar gas. As a result, the number of crystals generated on the surface of the glass rod was measured, and the untreated glass rod was similarly heated in Ar to measure the number of crystals generated on the surface. The value of the number of crystals in the untreated rod was used as the crystal number ratio, and this was evaluated as the treatment effect.

処理時間を1時間とし処理ガス濃度、処理温度を変化さ
せて、結晶数比を測定した結果を条件とともに第1表〜
第4表に示した。
The results of measuring the crystal number ratio by changing the processing gas concentration and processing temperature with a processing time of 1 hour are shown in Table 1.
It is shown in Table 4.

注、処理温度は室温である。Note: Processing temperature is room temperature.

注、処理濃度は1vol%である。Note: The treatment concentration is 1 vol%.

注、表中XXXは結晶数が極めて多く評価困難なことを
示す。
Note: XXX in the table indicates that the number of crystals is extremely large and evaluation is difficult.

処理温度は室温である。The processing temperature is room temperature.

注、処理濃度は25νof%である。Note: The treatment concentration is 25νof%.

第1表より明らかな通り30vol%以下で結晶数の減
少が見られ、1 vol%以下で最も効果があり、未処
理に比べて結晶数が1/2も減少していることがわかる
As is clear from Table 1, a decrease in the number of crystals is seen at a concentration of 30 vol% or less, and the most effective is seen at a concentration of 1 vol% or less, with the number of crystals decreasing by half compared to the untreated case.

また第2表より明らかなようにF2濃度を1νOI%に
固定し処理温度を変化させたところより低温の方が効果
があり、室温以下の処理温度では結晶数を1/2に低減
できる。
Furthermore, as is clear from Table 2, a lower temperature is more effective than when the F2 concentration is fixed at 1 νOI% and the processing temperature is varied, and the number of crystals can be reduced to 1/2 at a processing temperature below room temperature.

第3表に示すとおりHF処理濃度を変化させたところ5
0vol%以下で結晶数の減少が見られた。特に20〜
30vo 1%の範囲が効果的であり、未処理に対し1
/5程度まで結晶数を減少させることができる。
When the HF treatment concentration was changed as shown in Table 3, 5
A decrease in the number of crystals was observed at 0 vol% or less. Especially from 20~
A range of 30vo 1% is effective, and 1% compared to untreated
The number of crystals can be reduced to about /5.

11F処理濃度を25VO1%に固定し、処理温度を変
化させたところ第4表に示すとおり低温の方が効果があ
る。
When the 11F treatment concentration was fixed at 25VO 1% and the treatment temperature was varied, as shown in Table 4, lower temperatures were more effective.

[発明の効果] 本発明の方法によればフッ化物ガラスのファイバー化の
際の結晶化を容易に抑制することができ、伝送損失の低
減を抑制し、安定的にファイバー化することができるも
のである。
[Effects of the Invention] According to the method of the present invention, crystallization during fiberization of fluoride glass can be easily suppressed, reduction in transmission loss can be suppressed, and fiberization can be stably achieved. It is.

Claims (2)

【特許請求の範囲】[Claims] (1)F_2濃度30vol%以下のガスを50℃以下
でフッ化物ガラスと接触させることを特徴とするフッ化
物ガラスの表面処理方法。
(1) A method for surface treatment of fluoride glass, which comprises bringing a gas having an F_2 concentration of 30 vol % or less into contact with the fluoride glass at a temperature of 50° C. or less.
(2)HF濃度3〜50vol%のガスを40℃以下で
フッ化物ガラスと接触させることを特徴とするフッ化物
ガラスの表面処理方法。
(2) A method for surface treatment of fluoride glass, which comprises bringing a gas having an HF concentration of 3 to 50 vol% into contact with the fluoride glass at 40°C or lower.
JP12818390A 1990-05-18 1990-05-18 Surface treatment of fluoride glass Pending JPH0426530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12818390A JPH0426530A (en) 1990-05-18 1990-05-18 Surface treatment of fluoride glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12818390A JPH0426530A (en) 1990-05-18 1990-05-18 Surface treatment of fluoride glass

Publications (1)

Publication Number Publication Date
JPH0426530A true JPH0426530A (en) 1992-01-29

Family

ID=14978490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12818390A Pending JPH0426530A (en) 1990-05-18 1990-05-18 Surface treatment of fluoride glass

Country Status (1)

Country Link
JP (1) JPH0426530A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561547A (en) * 1994-02-04 1996-10-01 Spectra-Physics Lasers, Inc. Thermal lens of controlled ellipicity

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6428252A (en) * 1987-07-24 1989-01-30 Sumitomo Electric Industries Surface treatment of fluoride glass

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6428252A (en) * 1987-07-24 1989-01-30 Sumitomo Electric Industries Surface treatment of fluoride glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5561547A (en) * 1994-02-04 1996-10-01 Spectra-Physics Lasers, Inc. Thermal lens of controlled ellipicity

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