JPH04263426A - Vapor drying device - Google Patents

Vapor drying device

Info

Publication number
JPH04263426A
JPH04263426A JP2352591A JP2352591A JPH04263426A JP H04263426 A JPH04263426 A JP H04263426A JP 2352591 A JP2352591 A JP 2352591A JP 2352591 A JP2352591 A JP 2352591A JP H04263426 A JPH04263426 A JP H04263426A
Authority
JP
Japan
Prior art keywords
ipa
vapor
steam
drying
dried
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2352591A
Other languages
Japanese (ja)
Inventor
Tsuyoshi Shioda
塩田 堅
Takahisa Fukao
深尾 隆久
Masaaki Mita
三田 雅昭
Seiji Sudo
須藤 誠司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP2352591A priority Critical patent/JPH04263426A/en
Priority to US07/835,582 priority patent/US5243768A/en
Priority to MYPI92000244A priority patent/MY108104A/en
Priority to KR1019920002405A priority patent/KR920016804A/en
Publication of JPH04263426A publication Critical patent/JPH04263426A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reproduce and reuse isopropyl alcohol by selectively providing a film-separating device, which is composed of a water-transmitting film, in the vapor-filled space above the surface of the drying liquid in a vapor- generating section. CONSTITUTION:The vapor of isopropyl alcohol(IPA), which is heated up by a heater block 4 and evaporated, is filled up in the part, which is lower than the vapor surface 7, of a vapor drying section 1. At this point, when the material 5 to be dried up such as an electronic part and the like is retained in the vapor drying section, IPA vapor is conde sed on the surface of the material 5 to be dried up. The highly hydrofilic IPA flows down together with the moisture adhered to the surface of the material 5 to be dried up. The material 5 to be dried is dried up by repeating the aforesaid condensation and flowing down. Also, the moisture contained in the IPA vapor is removed by a film- separating device 8.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は電子部品などの精密製品
の乾燥に適した乾燥装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drying apparatus suitable for drying precision products such as electronic parts.

【0002】0002

【従来の技術】水洗後の被処理物を乾燥する方法に、い
わゆる蒸気乾燥方法がある。上記乾燥方法は、たとえば
イソプロピルアルコール(以下、「IPA」ともいう。 )のような水との親和性が高く、かつ低沸点の有機溶媒
からなる乾燥液を用いて行われる。具体的には、たとえ
ば基本的構成が上方に冷却部を有し下部に加熱可能な蒸
気発生槽を有す装置を用いて行うことができる。上記の
蒸気発生槽の上方空間部に被乾燥物を位置せしめると、
加熱された蒸気発生槽から蒸発したIPA蒸気が被処理
物表面に凝縮する。凝縮したIPAは付着していた水分
をともなって流下していくため、被乾燥物の乾燥が達成
される。
2. Description of the Related Art There is a so-called steam drying method as a method for drying an object to be treated after washing with water. The above drying method is performed using a drying liquid made of an organic solvent having a high affinity for water and a low boiling point, such as isopropyl alcohol (hereinafter also referred to as "IPA"). Specifically, for example, this can be carried out using an apparatus whose basic configuration includes a cooling section above and a heatable steam generation tank below. When the material to be dried is placed in the space above the steam generating tank,
IPA vapor evaporated from the heated steam generation tank condenses on the surface of the object to be treated. Since the condensed IPA flows down with the attached moisture, drying of the material to be dried is achieved.

【0003】0003

【発明が解決しようとする課題】被乾燥物の表面に凝縮
したIPAを、乾燥液槽へ落下させたのでは、すぐに槽
内にIPAに溶存する水分の濃度が高くなり、蒸発して
いくIPA蒸気中の水分濃度も高くなっていく。その結
果、乾燥効率の低下を生じることになる。そこで、被乾
燥物の表面に凝縮したIPAは全て廃棄し、蒸気発生槽
には入り込まない構造にすることが考えられる。このよ
うにすると、槽内のIPAに直接水分が入り込むことを
防止できることになる。
[Problem to be solved by the invention] If IPA that has condensed on the surface of an object to be dried is dropped into a drying liquid tank, the concentration of water dissolved in the IPA in the tank will quickly increase and evaporate. The moisture concentration in the IPA vapor also increases. As a result, drying efficiency will be reduced. Therefore, it is conceivable to discard all of the IPA that has condensed on the surface of the material to be dried, and to create a structure that prevents it from entering the steam generation tank. In this way, it is possible to prevent moisture from directly entering the IPA in the tank.

【0004】しかし、装置内においては、被乾燥物表面
に凝縮しなかったIPA蒸気が上方の冷却部で還流され
、乾燥液槽に戻され、再び加熱され蒸発を繰り返してい
る。一方、前記の如く直接蒸気発生槽に入り込まない構
造にしたとはいえ、被乾燥物に付着した水滴からは、僅
かながら水分が直接蒸発していき、その水蒸気はIPA
蒸気とともに還流されることになる。したがって、乾燥
処理を繰り返すに従い、槽内の乾燥液の水分濃度も増大
していき、前記の如き問題が生じる。
However, within the apparatus, the IPA vapor that has not condensed on the surface of the object to be dried is refluxed in the upper cooling section, returned to the drying liquid tank, heated again, and repeatedly evaporated. On the other hand, even though the structure is such that it does not directly enter the steam generation tank, a small amount of water evaporates directly from the water droplets attached to the material to be dried, and the water vapor is transferred to the IPA.
It will be refluxed together with steam. Therefore, as the drying process is repeated, the water concentration of the drying liquid in the tank also increases, causing the above-mentioned problems.

【0005】上記問題は、被乾燥物が半導体ウエハであ
る場合に特に重要であることが知られている。なお、乾
燥装置については、株式会社工業調査会発行「電子材料
」1983年3月号第68〜71頁に説明がある。
It is known that the above problem is particularly important when the object to be dried is a semiconductor wafer. The drying device is described in "Electronic Materials", March 1983 issue, pages 68 to 71, published by Kogyo Kenkyukai Co., Ltd.

【0006】また、上記問題点を解決する対策として蒸
気乾燥装置内における乾燥液蒸気中に存在する水蒸気を
低濃度に自動制御できる技術が特開昭62−45127
号に開示されている。この技術は蒸気発生槽内の乾燥液
の廃棄手段と新乾燥液の供給手段とを備えた蒸気乾燥装
置において、蒸気発生槽内における乾燥液中の水分濃度
が所定値に達した場合に、該槽内の乾燥液の全部または
一部を廃棄し、新乾燥液を供給し補充することにより、
蒸気発生槽内における乾燥液中の水分濃度が所定値以下
に制御することができるものであり、同時に該蒸気発生
槽から蒸発する乾燥液蒸気中の水蒸気濃度をも所定濃度
以下に制御することが達成されるものである。
[0006] In addition, as a measure to solve the above-mentioned problems, a technique for automatically controlling the water vapor present in the drying liquid vapor in a steam drying apparatus to a low concentration was disclosed in Japanese Patent Laid-Open No. 62-45127.
Disclosed in the issue. This technology is a steam drying device equipped with means for disposing of drying liquid in a steam generation tank and means for supplying new drying liquid, and when the moisture concentration in the drying liquid in the steam generation tank reaches a predetermined value, By discarding all or part of the drying liquid in the tank and replenishing it with new drying liquid,
The moisture concentration in the drying liquid in the steam generation tank can be controlled to a predetermined value or less, and at the same time, the water vapor concentration in the drying liquid vapor evaporated from the steam generation tank can also be controlled to a predetermined concentration or less. It is something that can be achieved.

【0007】これにより乾燥液中の水分濃度を制御する
ことは可能であるが、上記方法では常に新たなIPAの
補充を続けなければならないため、コストの上昇を招来
し、また使用済IPAの廃棄処理の問題も生じてくる。
[0007] Although it is possible to control the water concentration in the drying liquid by this method, the above method requires constant replenishment of new IPA, which increases costs and also makes it difficult to dispose of used IPA. Processing issues also arise.

【0008】[0008]

【課題を解決するための手段】本発明者ら、鋭意検討し
た結果、蒸気発生部の乾燥液上の蒸気が充満した空間に
膜分離装置を設置することにより上記課題を解決した。 すなわち、本願発明の要旨は、水洗後の被処理物を乾燥
する蒸気乾燥装置であって、乾燥液を加熱して乾燥液の
蒸気を発生させる蒸気発生部および該発生蒸気により被
処理物を乾燥させる蒸気乾燥部を有し、かつ該蒸気発生
部内の乾燥液面上の蒸気が充満している空間に、選択的
に水を透過する膜によって構成される膜分離装置を有す
ることを特徴とする蒸気乾燥装置に存する。
[Means for Solving the Problems] As a result of intensive studies, the present inventors have solved the above problems by installing a membrane separation device in a space filled with steam above the drying liquid in the steam generation section. That is, the gist of the present invention is a steam drying apparatus for drying a processed object after washing with water, which includes a steam generating section that heats a drying liquid to generate vapor of the drying liquid, and a steam generating section that dries the processed object using the generated steam. and a membrane separation device constituted by a membrane that selectively permeates water in a space filled with steam above the dried liquid level in the steam generating section. Located in steam drying equipment.

【0009】以下、本発明を詳述する。本発明の蒸気乾
燥装置は主として蒸気発生部、蒸気乾燥部及び蒸気発生
部内の乾燥液の液面上の蒸気が充満している空間にある
膜分離装置からなる。乾燥液は水との親和性の高い有機
溶剤であり、水と共沸点を有する有機溶剤が好適である
。かかる有機溶剤を例示すれば、イソプロピルアルコー
ル(IPA)、エタノール、n−プロパノール、イソブ
タノール、イソアミルアルコール等のアルコール類、塩
化メチル、塩化メチレン、四塩化炭素等の塩素化炭化水
素等が挙げられる。これらのうち特にIPAが好適であ
る。以下乾燥液としてIPAを例にとり説明するが、本
発明はIPAに限定されるものではない。
The present invention will be explained in detail below. The steam drying apparatus of the present invention mainly includes a steam generation section, a steam drying section, and a membrane separation device located in a space filled with steam above the surface of the drying liquid in the steam generation section. The drying liquid is an organic solvent that has a high affinity with water, and an organic solvent that has an azeotropic point with water is suitable. Examples of such organic solvents include alcohols such as isopropyl alcohol (IPA), ethanol, n-propanol, isobutanol, and isoamyl alcohol, and chlorinated hydrocarbons such as methyl chloride, methylene chloride, and carbon tetrachloride. Among these, IPA is particularly suitable. Although IPA will be explained below as an example of the drying liquid, the present invention is not limited to IPA.

【0010】本発明では蒸気発生部の上方のIPA蒸気
中に選択的に水を透過する膜によって構成される膜分離
装置を設置する。これにより水分濃度の高くなったIP
Aを再生利用することができ、IPA中の水分濃度を制
御することができる。
[0010] In the present invention, a membrane separation device constituted by a membrane that selectively permeates water into the IPA vapor above the steam generation section is installed. This results in IP with a high moisture concentration.
A can be recycled and the water concentration in IPA can be controlled.

【0011】上記の膜分離装置においては、通常ベーパ
ーパーミエーション法によりIPA中に含有される水の
大部分が除去される。膜分離装置としてはIPA−水の
系において水を選択的に透過し得る膜を使用するもので
あれば、公知の装置が特に制限なく採用される。分離膜
としては蒸気の透過係数が0.1kg/m2 ・Hr以
上好ましくは1kg/m2 ・Hr以上、分離係数が1
00以上、好ましくは1000以上のものが好適に使用
される。なお、分離係数は
[0011] In the above-mentioned membrane separator, most of the water contained in IPA is usually removed by the vapor permeation method. As the membrane separation device, any known device may be used without particular limitation as long as it uses a membrane that can selectively permeate water in an IPA-water system. As a separation membrane, the vapor permeability coefficient is 0.1 kg/m2 - Hr or more, preferably 1 kg/m2 - Hr or more, and the separation coefficient is 1
00 or more, preferably 1000 or more is suitably used. In addition, the separation coefficient is

【0012】0012

【数1】[Math 1]

【0013】で表わされる。It is expressed as:

【0014】膜分離装置の運転条件は1次側の温度が6
0〜120℃、膜分離装置の透過蒸気室の真空度が0〜
100Torrとなるように行なうことが好ましい。こ
のようにして膜分離装置によりIPAから水分が除去さ
れるが、少量のIPAが分離係数値に応じて透過蒸気室
側に移行し、IPAの損失となる。しかし、前述の透過
係数、分離係数の膜分離装置を用いて10%含水IPA
から500ppm 含水IPAまで脱水処理する時にお
いても、乾燥液の損失は一般的に5%以下であり、定期
的に全量新液に交換する場合と比べて非常に経済的とな
る。
[0014] The operating conditions of the membrane separator are that the temperature on the primary side is 6
0 to 120℃, the degree of vacuum in the permeation vapor chamber of the membrane separator is 0 to 120℃
It is preferable to conduct the heating at a pressure of 100 Torr. In this way, water is removed from IPA by the membrane separator, but a small amount of IPA migrates to the permeation vapor chamber depending on the separation coefficient value, resulting in a loss of IPA. However, using a membrane separator with the above-mentioned permeability coefficient and separation coefficient, 10% hydrated IPA
Even when dehydrating IPA from 500 ppm to 500 ppm, the loss of drying liquid is generally less than 5%, which is much more economical than replacing the entire amount with fresh liquid periodically.

【0015】上記膜分離装置によって除去される水の量
はIPA中の水の大部分であればよいが、特に、半導体
ウエハなど精密洗浄工程で用いるときは、その品質面か
らみて水含有量がIPAに対して1%以下、好ましくは
500ppm 以下に低減するよう水を除去することが
望ましい。
[0015] The amount of water removed by the membrane separation device may be the majority of the water in IPA, but especially when used in a precision cleaning process for semiconductor wafers, the water content is important from the viewpoint of quality. It is desirable to remove water so that the amount is reduced to 1% or less, preferably 500 ppm or less based on IPA.

【0016】また、ベーパーパーミエーション法が採用
される装置及び条件を具体的に示せば、装置としては中
空糸状分離膜により区画された1次側と2次側との2室
を基本的に有するものが一般に使用される。また、装置
は中空糸状分離膜を束ねたいわゆる中空糸モジュール型
の装置が好適である。また配置する中空糸膜モジュール
の本数はレイアウトの許す範囲で複数化することができ
る。
[0016] Also, to specifically show the equipment and conditions in which the vapor permeation method is adopted, the equipment basically has two chambers, a primary side and a secondary side, separated by a hollow fiber separation membrane. things are commonly used. Furthermore, a so-called hollow fiber module type device in which hollow fiber separation membranes are bundled is suitable as the device. Further, the number of hollow fiber membrane modules to be arranged can be increased within the range permitted by the layout.

【0017】ここで中空糸膜モジュールとしては多数の
中空糸膜の両端を開口させて樹脂で接着固定して用いる
もの(両端開口モジュール)と、一端が封止され他端を
開口して樹脂で接着固定して用いるもの(一端封止モジ
ュール)が知られている。かかるモジュールは多数の中
空糸膜の少なくとも一端を束ね、この束がばらばらにな
ることを防止する目的で接着剤で集束端部を固定する。
[0017] Here, the hollow fiber membrane modules include those in which both ends of a large number of hollow fiber membranes are open and fixed with resin (double-end open module), and those in which one end is sealed and the other end is open and resin is used. A module that is used by adhesively fixing it (one-end sealed module) is known. Such a module bundles at least one end of a large number of hollow fiber membranes, and fixes the bundled ends with an adhesive to prevent the bundle from coming apart.

【0018】この接着剤には熱硬化性樹脂であるビスフ
ェノール型、ノボラック型ほか種々のエポキシ樹脂が好
ましく用いられる。また、ポリエステル樹脂、フェノー
ル樹脂、メラミン樹脂等を用いることもできる。
[0018] For this adhesive, thermosetting resins such as bisphenol type, novolac type, and various epoxy resins are preferably used. Moreover, polyester resin, phenol resin, melamine resin, etc. can also be used.

【0019】中空糸膜の素材としての好ましい例として
はポリスルホン、ポリエーテルスルホン、ポリイミド、
ポリフェニレンアセチレンなどが挙げられるが、軟化点
が蒸気処理温度40℃以上高い素材からなる多孔質支持
膜であれば差し支えない。
Preferred examples of hollow fiber membrane materials include polysulfone, polyethersulfone, polyimide,
Examples include polyphenylene acetylene, but any porous support film may be used as long as it is made of a material whose softening point is 40° C. or higher than the steam treatment temperature.

【0020】以下、図を用いて本発明を説明する。図1
は本発明の蒸気乾燥装置の一例を示す模式図である。1
は蒸気乾燥部であり、2は蒸気発生部である。蒸気発生
部2には乾燥液であるIPA3が貯えられている。蒸気
発生部2の底面下にはIPAを加熱、蒸発するためのヒ
ーターブロック4が設置されている。蒸気乾燥部1には
被乾燥物5が保持されており、その上方に冷却管6が設
置される。蒸気発生部2のIPAの液面より上方に膜分
離装置8が設置される。尚、本発明は図1に示すような
蒸気発生部上方に蒸気乾燥部を配する型式に限定される
わけではない。被処理物の表面での溶剤凝縮液滴を蒸気
発生部に導けば、蒸気発生部と蒸気乾燥部を分離した型
式にも適用可能である。
The present invention will be explained below with reference to the drawings. Figure 1
FIG. 1 is a schematic diagram showing an example of a steam drying apparatus of the present invention. 1
2 is a steam drying section, and 2 is a steam generating section. IPA3, which is a drying liquid, is stored in the steam generating section 2. A heater block 4 for heating and evaporating IPA is installed under the bottom of the steam generating section 2. A material to be dried 5 is held in the steam drying section 1, and a cooling pipe 6 is installed above it. A membrane separator 8 is installed above the IPA liquid level in the steam generating section 2 . Note that the present invention is not limited to the type shown in FIG. 1 in which the steam drying section is disposed above the steam generation section. If the solvent condensed droplets on the surface of the object to be treated are guided to the steam generation section, it is also applicable to a type in which the steam generation section and the steam drying section are separated.

【0021】[0021]

【作用】次に本発明の作用を図1を用いて説明する。蒸
気乾燥部1の蒸気面7より下部はヒーターブロック4に
よって加熱、蒸発されたIPA蒸気で充満している。被
乾燥物5を蒸気乾燥部内に保持すると、被乾燥物5の表
面にIPA蒸気が凝縮する。親水性の高いIPAは被乾
燥物5の表面に付着している水分を伴なって流下してい
く。この凝縮、流下を繰り返すことにより、被乾燥物が
乾燥する。IPA蒸気中に含まれる水分は膜分離装置8
によって除去される。
[Operation] Next, the operation of the present invention will be explained with reference to FIG. The area below the steam surface 7 of the steam drying section 1 is filled with IPA steam heated and evaporated by the heater block 4. When the material to be dried 5 is held in the steam drying section, IPA vapor condenses on the surface of the material to be dried 5. The highly hydrophilic IPA flows down together with the moisture adhering to the surface of the material to be dried 5. By repeating this condensation and flowing down, the material to be dried is dried. Moisture contained in IPA vapor is removed by membrane separator 8.
removed by

【0022】[0022]

【実施例】以下、本発明を実施例により詳述するが、本
発明はその要旨を超えない限り実施例により限定される
ものではない。 実施例1 中空糸膜モジュールとして中空糸膜の素材としてポリイ
ミドを用いて、エポキシ樹脂接着剤を用いて集束端部を
固定した一端封止モジュールを用いた。半導体基材用シ
リコンウェハーを、超純水槽に浸漬した後に、IPA蒸
気乾燥装置に5分間隔で送り、20バッチの蒸気乾燥処
理を実施した。このとき、シリコンウェハー及び保持治
具一式に付着する水分は、20〔g/一式〕であった。 即ち、シリコンウェハーの持込み水分量は240〔g/
Hr〕である。ここでIPA蒸気乾燥装置の蒸気発生部
のIPA、滞留液量は60〔l〕=48〔kg〕である
。該IPA滞留液を、沸点82〔℃〕に保持し、蒸気発
生部の溶剤液面上方の蒸気が充填した空間に耐熱樹脂性
中空糸状分離膜の1次側を配し、2次側を真空度10T
orrに調節しながら、シリコンウェハーの蒸気乾燥を
実施したところ、蒸気発生部中のIPA液中の水分濃度
を測定した結果を図2に示す。ここで、処理開始前に蒸
気発生部に張り込むIPAは含水率で500〔ppm 
〕品を用いた。尚、ベーパーパーミエーションに伴い若
干減じるIPAは、蒸気発生部の液面が一定となるよう
に前記仕様と同一のIPAを、自動補給した。
[Examples] The present invention will be explained in detail with reference to Examples below, but the present invention is not limited by the Examples unless it exceeds the gist thereof. Example 1 As a hollow fiber membrane module, a one-end sealed module was used in which polyimide was used as the material for the hollow fiber membrane and the bundle end was fixed using an epoxy resin adhesive. After the silicon wafers for semiconductor substrates were immersed in an ultrapure water bath, they were sent to an IPA steam drying device at 5 minute intervals to perform 20 batches of steam drying treatment. At this time, the amount of moisture adhering to the silicon wafer and the holding jig set was 20 [g/set]. In other words, the amount of moisture brought into the silicon wafer is 240 [g/
Hr]. Here, the amount of IPA and retained liquid in the steam generation section of the IPA steam drying apparatus is 60 [l] = 48 [kg]. The IPA retentate is maintained at a boiling point of 82 [°C], and the primary side of a heat-resistant resin hollow fiber separation membrane is placed in the space filled with steam above the solvent level in the steam generation section, and the secondary side is evacuated. Degree 10T
FIG. 2 shows the results of measuring the moisture concentration in the IPA liquid in the steam generating section when steam drying of the silicon wafer was carried out while adjusting the temperature to 0.0 or more. Here, the IPA poured into the steam generation section before the start of treatment has a water content of 500 [ppm].
] product was used. Incidentally, IPA, which was slightly reduced due to vapor permeation, was automatically replenished with IPA of the same specification as above so that the liquid level in the steam generation section was constant.

【0023】[0023]

【発明の効果】本発明の蒸気乾燥装置は、膜分離装置を
設けることにより水分濃度の高くなったIPAを再生使
用すると同時にIPA蒸気中の水分濃度を制御すること
により、安定した、信頼性の高い処理条件を合理的に実
現することができる。しかも処理液を全て廃棄すること
なく繰り返し使用するため、廃液処理が不要となり大巾
なコストの低減が達成できる。
Effects of the Invention The steam drying device of the present invention provides stable and reliable performance by reusing IPA with a high water concentration by providing a membrane separator and at the same time controlling the water concentration in IPA vapor. High processing conditions can be reasonably achieved. Furthermore, since the treated liquid is used repeatedly without being completely discarded, waste liquid treatment becomes unnecessary and a significant cost reduction can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の蒸気乾燥装置の一例を示す模式図であ
る。
FIG. 1 is a schematic diagram showing an example of a steam drying apparatus of the present invention.

【図2】実施例におけるIPA中の水分量の推移を示す
グラフである。
FIG. 2 is a graph showing changes in water content in IPA in Examples.

【符号の説明】[Explanation of symbols]

1    蒸気乾燥部 2    蒸気発生部 3    乾燥液(IPA) 4    ヒーターブロック 5    被乾燥物 6    冷却管 7    蒸発面 8    膜分離装置 1 Steam drying section 2 Steam generation section 3 Drying liquid (IPA) 4 Heater block 5. Materials to be dried 6 Cooling pipe 7 Evaporation surface 8 Membrane separation equipment

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  水洗後の被処理物を乾燥する蒸気乾燥
装置であって、乾燥液を加熱して乾燥液の蒸気を発生さ
せる蒸気発生部および該発生蒸気により被処理物を乾燥
させる蒸気乾燥部を有し、かつ該蒸気発生部内の乾燥液
面上の蒸気の充満した空間に、選択的に水を透過する膜
によって構成される膜分離装置を有することを特徴とす
る蒸気乾燥装置。
1. A steam drying device for drying a processed object after washing with water, comprising: a steam generating section that heats a drying liquid to generate vapor of the drying liquid; and a steam drying device that dries the processed object using the generated steam. 1. A steam drying device comprising a membrane separation device comprising a membrane that selectively permeates water in a space filled with steam above the drying liquid level in the steam generating portion.
JP2352591A 1991-02-18 1991-02-18 Vapor drying device Pending JPH04263426A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2352591A JPH04263426A (en) 1991-02-18 1991-02-18 Vapor drying device
US07/835,582 US5243768A (en) 1991-02-18 1992-02-14 Vapor drier
MYPI92000244A MY108104A (en) 1991-02-18 1992-02-17 Vapor drier
KR1019920002405A KR920016804A (en) 1991-02-18 1992-02-18 Steam drying apparatus and its operation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2352591A JPH04263426A (en) 1991-02-18 1991-02-18 Vapor drying device

Publications (1)

Publication Number Publication Date
JPH04263426A true JPH04263426A (en) 1992-09-18

Family

ID=12112864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2352591A Pending JPH04263426A (en) 1991-02-18 1991-02-18 Vapor drying device

Country Status (1)

Country Link
JP (1) JPH04263426A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4870837B2 (en) * 2007-05-23 2012-02-08 セメス カンパニー リミテッド Substrate drying apparatus and method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4870837B2 (en) * 2007-05-23 2012-02-08 セメス カンパニー リミテッド Substrate drying apparatus and method
US8793898B2 (en) 2007-05-23 2014-08-05 Semes Co., Ltd. Apparatus and method for drying substrates

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