JPH042624A - Production of quartz glass - Google Patents
Production of quartz glassInfo
- Publication number
- JPH042624A JPH042624A JP9953290A JP9953290A JPH042624A JP H042624 A JPH042624 A JP H042624A JP 9953290 A JP9953290 A JP 9953290A JP 9953290 A JP9953290 A JP 9953290A JP H042624 A JPH042624 A JP H042624A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- cracks
- quartz glass
- gel
- maturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 238000003980 solgel method Methods 0.000 claims abstract description 7
- 230000032683 aging Effects 0.000 claims description 11
- 239000011521 glass Substances 0.000 abstract description 5
- 206010011376 Crepitations Diseases 0.000 abstract 1
- 208000037656 Respiratory Sounds Diseases 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000005070 ripening Effects 0.000 description 14
- 239000000499 gel Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 230000001364 causal effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011240 wet gel Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野１
本発明は、シリカ微粒子を用いたゾル−ゲル法による石
英ガラスの製造工程における、熟成時の熟成方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application 1] The present invention relates to a maturing method during maturing in a quartz glass manufacturing process by a sol-gel method using silica fine particles.
［従来の技術］
ゾル−ゲル法によるガラスの製造の中で熟成工程は重要
な工程のひとつであるが、従来この工程の内容がよく解
っていなかった。こと厚肉ガラス（１５ｍｍ以上）に関
しては、はとんど解明出来ていないのが現状である。[Prior Art] A maturing step is one of the important steps in the production of glass by the sol-gel method, but the contents of this step have not been well understood so far. Regarding thick-walled glass (15 mm or more), the current situation is that very little has been elucidated.
従って、問題点としては熟成中のクラックの発生と、そ
の後におけるクラック発生の熟成との因果関係がはっき
りせず問題となっている。Therefore, the problem is that the causal relationship between the occurrence of cracks during ripening and the subsequent ripening of cracks is not clear.
そこで、クラックレスでガラス化できるゲルの製造方法
が要望されてる。Therefore, there is a need for a method for producing gel that can be vitrified without cracks.
［発明が解決しようとする課題］
前述の従来技術では、ゾル−ゲル法による石英ガラスの
製造方法の中で、熟成中にクラックの発生のため、歩留
まりも上がらないことが間顕であった。そこで本発明に
おいては、
ｌ）熟成中にクラックの発生しない熟成方法を可能化さ
せ、
２）クラックのない石英ガラスを造り
３）必然的にコストダウンを計る。[Problems to be Solved by the Invention] In the above-mentioned prior art, in the method for manufacturing quartz glass using the sol-gel method, it has been found that the yield cannot be improved due to the occurrence of cracks during aging. Therefore, the present invention aims to: 1) enable a ripening method that does not generate cracks during ripening; 2) produce crack-free quartz glass; and 3) necessarily reduce costs.
・・・等の課題を設定し、新規なゾル−ゲル法の製造方
法を模索して、新しいガラス製品を提供する事を目的と
する。The purpose of this project is to provide new glass products by setting issues such as... and exploring new sol-gel manufacturing methods.
［課題を解決するための手段］
本発明によるガラスの製造方法は、熟成時に熟成温度を
上昇させる際に、熟成温度を階段状に上昇させる事を特
徴とする。[Means for Solving the Problems] The method for producing glass according to the present invention is characterized in that the aging temperature is raised in steps when increasing the aging temperature during aging.
［作 用］
本発明の上記の方法によれば、熟成時のウェットゲルの
内外部の温度差を少なくして熟成温度を上昇できるので
、ゲル内外部の審度差が少なくなり従ってクラックの発
生がなくなる。[Function] According to the above-mentioned method of the present invention, the temperature difference between the inside and outside of the wet gel during ripening can be reduced and the ripening temperature can be increased, so the difference in quality between the inside and outside of the gel is reduced, thus preventing the occurrence of cracks. disappears.
［実 施 例］
第１図は、本発明による実施例のグラフである。横軸に
熟成時間をとり、縦軸に熟成温度をとっである。ある熟
成温度Ａ点から熟成温度Ｂ 、６、（Ａ＜Ｂ）まで熟成
温度を上昇する場合、−気にＡ点からＢ点まで上げずに
、グラフに示すように階段状に温度を上げていく。階段
状に上げることでゲルの内外部の温度が均一化され、内
外部で密度の差が小さくなり、従ってゲルの内部歪が小
さくなりクラックの発生が減少する。この階段状の温度
範囲は、５度から１０度位が適当である。高すぎると上
記に記した如く、クラ・ンクが発生する。この温度の範
囲だと、実際のゲルの内外部の温度差が３度から５度以
内になり烹度差がかなり小さくなり、クラックの発生す
る密度範囲より下まわるためクラックの発生を押える事
が可能となる。この階段状の回数は、熟成温度により異
なり、高温熟成（７０度〜８０度）の場合等においては
、多くなる。又、温度の上昇勾配は、１時間に１５度か
ら３０度の範囲が実験的に良い。[Example] FIG. 1 is a graph of an example according to the present invention. The horizontal axis shows the ripening time, and the vertical axis shows the ripening temperature. When increasing the ripening temperature from a certain ripening temperature point A to a ripening temperature B, 6, (A<B), the temperature should be raised stepwise as shown in the graph, without raising the temperature from point A to point B. go. By increasing the temperature in a stepwise manner, the temperature inside and outside of the gel is made uniform, and the difference in density between the inside and outside becomes smaller, which reduces the internal strain of the gel and reduces the occurrence of cracks. Appropriately, this stepped temperature range is about 5 degrees to 10 degrees. If it is too high, cracks will occur as described above. In this temperature range, the actual temperature difference between the inside and outside of the gel is within 3 to 5 degrees, which makes the difference in temperature considerably small, and below the density range where cracks occur, making it possible to suppress the occurrence of cracks. It becomes possible. The number of steps varies depending on the aging temperature, and increases in the case of high temperature aging (70 degrees to 80 degrees). Furthermore, it has been experimentally shown that the temperature increase gradient is preferably in the range of 15 to 30 degrees per hour.
［発明の効果］
以上の述べたように、シリカ微粒子を用いたゾル−ゲル
法で、熟成温度を階段状に上昇させる事により、
１）熟成中のクツラックの発生を防止した対策となり、
２）従って、熟成歩留まりを上げ、
３）そして、コストダウンとなった。[Effects of the invention] As described above, by raising the ripening temperature in steps using the sol-gel method using fine silica particles, 1) a countermeasure was taken to prevent the occurrence of cutulak during ripening, and 2) Therefore, the ripening yield was increased, 3) and the cost was reduced.
・・・等の効果をもたらした。...and other effects.
第１図は、本発明の実施例の図で熟成時の熟成温度と熟
成経過時間のグラフである。
・・熟成開始点
Ｂ・・・熟成到達点
出願人 セイコーエプソン株式会社
以上
経過時間
ノ＜ｋ
弔
１図FIG. 1 is a diagram of an example of the present invention, and is a graph of the aging temperature and aging elapsed time. ...Raturation start point B...Raturation point Applicant Seiko Epson Corporation Elapsed time<k Funeral figure 1
Claims (2)
の製造方法において、熟成温度を階段状に上昇させる事
を特徴とする石英ガラスの製造方法。(1) A method for producing silica glass using a sol-gel method using fine silica particles, which is characterized by increasing the aging temperature stepwise.
することを特徴とする請求項１記載の石英ガラスの製造
方法。(2) The method for producing quartz glass according to claim 1, characterized in that the aging temperature during aging is varied in the range of 5 degrees to 10 degrees.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9953290A JPH042624A (en) | 1990-04-16 | 1990-04-16 | Production of quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9953290A JPH042624A (en) | 1990-04-16 | 1990-04-16 | Production of quartz glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH042624A true JPH042624A (en) | 1992-01-07 |
Family
ID=14249827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9953290A Pending JPH042624A (en) | 1990-04-16 | 1990-04-16 | Production of quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH042624A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6225433B1 (en) | 1997-10-13 | 2001-05-01 | Dow Corning Toray Silicone Co., Ltd. | Curable silicone composition and electronic components |
-
1990
- 1990-04-16 JP JP9953290A patent/JPH042624A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6225433B1 (en) | 1997-10-13 | 2001-05-01 | Dow Corning Toray Silicone Co., Ltd. | Curable silicone composition and electronic components |
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