JPH0426202Y2 - - Google Patents

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Publication number
JPH0426202Y2
JPH0426202Y2 JP1986133608U JP13360886U JPH0426202Y2 JP H0426202 Y2 JPH0426202 Y2 JP H0426202Y2 JP 1986133608 U JP1986133608 U JP 1986133608U JP 13360886 U JP13360886 U JP 13360886U JP H0426202 Y2 JPH0426202 Y2 JP H0426202Y2
Authority
JP
Japan
Prior art keywords
water
substrate
stone
cap
skirt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1986133608U
Other languages
Japanese (ja)
Other versions
JPS6338969U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986133608U priority Critical patent/JPH0426202Y2/ja
Publication of JPS6338969U publication Critical patent/JPS6338969U/ja
Application granted granted Critical
Publication of JPH0426202Y2 publication Critical patent/JPH0426202Y2/ja
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は墓石、踏み台その他の石材表面を研削
するための石材用研磨盤の水飛防止装置に関す
る。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a water splash prevention device for a stone polishing machine for grinding tombstones, stepping stones, and other stone surfaces.

(従来技術) 一般に石材用研磨盤は基板の上面中央に回転力
継手と注水口を備え、下面に環状、チツプ状等の
砥石を備えており、砥石を石材研削面上に置き、
注水口から砥石と研削面の間に冷却水を供給しな
がら研磨機搭載のモータで回転させながら研磨機
を手動又は自動的に石材研削面上で移動させるよ
うになつている。ところが研磨機の主軸にボス付
研磨盤を取付けて石材面を磨くとき、湿式である
ため作業者に石材面を研削した水(白濁水)がか
かる。特にダイヤモンドチツプを有する鋳物製の
基板は軽量化を図るため複数の窓孔を設けている
ので、研磨盤の側面からばかりでなく上面からも
水が飛散し、作業者が前かけ(ゴム製)だけでは
首の付近まで飛散した白濁水を防ぐことができ
ず、作業がしにくくなり高精度の仕上面が得にく
いという問題があつた。この対策として研削機側
に水飛防止用のカバーを装着することも考えられ
るが、その場合は砥石付近の石材面を観察しなが
ら作業することができず、作業性が低下する。
(Prior art) In general, a stone grinder is equipped with a rotary force joint and a water inlet at the center of the top surface of the substrate, and a ring-shaped, chip-shaped, etc. grindstone on the bottom surface, and the grinding wheel is placed on the stone grinding surface.
The grinder is manually or automatically moved on the stone grinding surface while being rotated by a motor mounted on the grinder while supplying cooling water between the grindstone and the grinding surface from the water inlet. However, when polishing a stone surface by attaching a polishing disk with a boss to the main shaft of a polishing machine, since it is a wet process, the water (cloudy water) used to grind the stone surface is splashed onto the worker. In particular, cast metal substrates with diamond chips have multiple window holes to reduce weight, so water splashes not only from the sides of the polishing machine but also from the top, making it difficult for workers to use the apron (rubber apron). However, there was a problem in that it was not possible to prevent the cloudy water from splashing around the neck area, making it difficult to work and obtaining a highly accurate finished surface. As a countermeasure to this problem, it is possible to install a cover on the grinding machine side to prevent water from flying away, but in that case, it is not possible to work while observing the stone surface near the grindstone, which reduces work efficiency.

(考案の目的) 本考案は研磨盤にワンタツチで装着でき、しか
も石材研削面に傷を付けることのない、軽量安価
な水飛防止装置を提供することを目的としてい
る。
(Purpose of the invention) The object of the invention is to provide a lightweight and inexpensive water splash prevention device that can be attached to a polishing machine with one touch and does not damage the stone grinding surface.

(考案の構成) 本考案は多数の窓孔を有する基板の上面中央に
回転力継手と注水口を備え、下面に多数の砥石チ
ツプを有する石材用研磨盤において、基板の上面
に当接して上記窓孔を塞ぐ環状の上板と、その外
周縁に連続して基板の外周面にしつくり嵌る円筒
状スカートとを有する軟質不透水薄板材キヤツプ
を取付け、スカートの下縁が常時自重により石材
の研削面に摺接するようにスカートの高さを基板
とチツプの合計高さより大きくしたことを特徴と
する石材用研磨盤の水飛防止装置である。
(Structure of the invention) The present invention is a stone polishing machine that is equipped with a rotary force joint and a water inlet at the center of the upper surface of a substrate having a large number of window holes, and has a large number of grinding wheel chips on the lower surface. A soft, water-impermeable thin plate material cap is attached, which has an annular upper plate that closes the window hole and a cylindrical skirt that is continuously formed on the outer periphery of the upper plate and fits onto the outer peripheral surface of the base plate, and the lower edge of the skirt is constantly grounded by its own weight. This is a water-splatter prevention device for a stone polishing machine, characterized in that the height of the skirt is greater than the total height of the substrate and the chip so that it comes into sliding contact with the surface.

研磨盤から飛散しようとする白濁水は軟質不透
水キヤツプに遮られてキヤツプ内の石材面上に滞
留し、研磨盤が石材の縁から一部はみだした時等
に一挙に排出される。
The cloudy water that tries to scatter from the polishing disk is blocked by the soft water-impermeable cap and stays on the stone surface inside the cap, and is discharged all at once when the polishing disk partially protrudes from the edge of the stone.

(実施例) 第1図は荒加工用の研磨盤1の一部縦断正面図
で、鋳鉄製の基板2は上面中央に回転力継手3
(ボス)と注水口4を備え、下面にダイヤモンド
チツプ5(砥石)を一体に有する。継手3は複数
個のボルト6により基板2に固定されており、ピ
ン孔7の部分に研磨機の主軸8に設けたピン9が
嵌合し、これにより主軸8の回転が継手3を介し
て基板2に伝達されるようになつている。主軸8
内の冷却水通路10は、上端部が研磨機内の冷却
水ポンプ(図示せず)に接続し、下端は注水口4
を介して石材研削面11上に開放している。基板
2は軽量化を図るためと覗き窓を兼ねる複数個の
窓孔12を備え、隣接した窓孔12の間にダイヤ
モンドチツプ5がろう付け等の手段により固定さ
れている。チツプ5の高さは例えば8〜9mmであ
る。
(Example) Fig. 1 is a partial longitudinal sectional front view of a polishing machine 1 for rough machining.
(boss) and water inlet 4, and has a diamond chip 5 (grindstone) integrally on the lower surface. The joint 3 is fixed to the substrate 2 by a plurality of bolts 6, and a pin 9 provided on the main shaft 8 of the polishing machine is fitted into the pin hole 7, so that the rotation of the main shaft 8 is caused through the joint 3. The signal is transmitted to the substrate 2. Main shaft 8
The cooling water passage 10 inside is connected at its upper end to a cooling water pump (not shown) inside the polishing machine, and at its lower end to a water inlet 4.
It is open onto the stone grinding surface 11 through. The substrate 2 is provided with a plurality of window holes 12 for weight reduction and also as viewing windows, and diamond chips 5 are fixed between adjacent window holes 12 by means such as brazing. The height of the chip 5 is, for example, 8 to 9 mm.

研磨盤1の基板2とチツプ5を覆うように軟質
不透水キヤツプ14が装着されており、キヤツプ
14の環状の上板15は基板2の上面に当接し、
上板15の外周縁に連続した円筒状のスカート1
6は研磨盤1の外周面17にしつくり嵌合し、ス
カート16の下縁18は石材研削面11に軽く当
接している。キヤツプ14は概ね第3図のような
外観を備え、例えば厚さ0.3mmの透明な軟質ビニ
ール製で、スカート16は帯板状素材の両端部を
第3図の継目20の部分で重ね合わせて高周波ミ
シン等により熱融着し、上板15の外周縁とスカ
ート16の上端縁は第3図右上に示す断面図のよ
うに重ね合せて熱融着している。上板15の内周
縁21はボス3の外周面に密着状に嵌合する程度
に寸法が定められている。
A soft water-impermeable cap 14 is attached to cover the substrate 2 and chip 5 of the polishing disk 1, and the annular upper plate 15 of the cap 14 is in contact with the upper surface of the substrate 2.
A cylindrical skirt 1 continuous to the outer peripheral edge of the upper plate 15
6 is tightly fitted to the outer circumferential surface 17 of the polishing disk 1, and the lower edge 18 of the skirt 16 is in light contact with the stone grinding surface 11. The cap 14 generally has an appearance as shown in Fig. 3, and is made of transparent soft vinyl with a thickness of 0.3 mm, for example, and the skirt 16 is made by overlapping both ends of a strip-like material at the seam 20 in Fig. 3. The outer peripheral edge of the upper plate 15 and the upper end edge of the skirt 16 are overlapped and heat-fused using a high-frequency sewing machine or the like, as shown in the sectional view shown in the upper right corner of FIG. The inner circumferential edge 21 of the upper plate 15 is dimensioned to such an extent that it fits tightly onto the outer circumferential surface of the boss 3.

注水口4から実線矢印のように冷却水を供給し
ながら研磨機により研磨盤1を回転させ、砥石チ
ツプ5を石材研削面11上で回転させながら前後
左右に移動して作業を行う時、チツプ5により跳
ね飛ばされた白濁冷却水はスカート6に遮られて
外方へ飛散することなくスカート16内に保持さ
れる。この白濁水は石材研削面11上にとどま
り、砥石チツプ5と石材研削面11の間に水膜を
作り、冷却潤滑作用を行う。研磨盤1が研削面1
1の角部22から一部外れると、スカート16内
に滞留していた白濁水は矢印Bで示すように一挙
に排出される。
When performing work by rotating the polishing disk 1 by the polishing machine while supplying cooling water from the water inlet 4 as shown by the solid line arrow, and moving the grinding wheel tip 5 back and forth and left and right while rotating it on the stone grinding surface 11, the tip The cloudy cooling water splashed away by the skirt 5 is blocked by the skirt 6 and is held within the skirt 16 without being scattered outward. This cloudy water stays on the stone grinding surface 11 and forms a water film between the grinding wheel tip 5 and the stone grinding surface 11, thereby performing a cooling and lubricating action. Polishing disk 1 is grinding surface 1
When the skirt 16 is partially removed from the corner 22 of the skirt 16, the cloudy water that has accumulated inside the skirt 16 is discharged all at once as shown by the arrow B.

(考案の効果) 以上説明したように本考案によるとスタンド用
笠のような軟質不透水キヤツプ14により研磨盤
1の上面と側面から出る水の飛散を確実に防ぐこ
とができる。又キヤツプ14は軟質ビニールのよ
うな軟質材であるため軽量で取扱いやすく、ワン
タツチで脱着ができ、硬質材でないため別部材に
衝突した場合にも破損して飛散つたり、怪我の原
因になる恐れがなく、安全性が高い。又キヤツプ
14は軟質材でできているためスカート16の下
縁18が研削面11に摺接しても研削面11に傷
を付ける恐れがなく、仕上用研磨盤に採用しても
美しい仕上面が得られる。更に本考案のキヤツプ
14は軽量であるため研磨盤1のバランスが崩れ
る恐れがなく、研磨盤の性能に悪影響を及ぼさな
い。又砥石チツプ5が摩耗してもスカート16が
追従し、スカート下縁18が共に摩耗するか又は
上方へずれて同一面圧により研削面11との接触
状態を保ち、水飛防止機能が長期間安定に維持さ
れる。チツプ5が石材研削面11から跳ね飛ばし
た水は遠心力を受けてチツプ5の回転方向前側の
スカート16の部分を半径方向外方へ押し出し、
他の部分が窪む為、基板外周面17への食い付き
が良くなり、石材研削面11に軽く当接した状態
で基板2と一体回転し、スカート下縁18からの
水の飛散を防止すると共に、窓孔12から上方へ
飛び出ようとする水により上板15が上向きの力
を受けても、キヤツプ14が浮くことは無い。更
に本考案において透明なキヤツプ14を採用する
と作業中に研削面11を観察しながら作業を進め
ることができ、特に研削盤1が研削面から大幅に
外れないようにコントロールすることが容易にな
る。更に軟質ビニールを採用すると低温時にも硬
度変化が少なく、研削面11に対する傷を可及的
に防止しうる。又スカート16の下縁18を適当
にカツトすることにより各種サイズの研磨盤に流
用でき、汎用性が向上する。
(Effects of the Invention) As explained above, according to the present invention, the soft water-impermeable cap 14 like a stand shade can reliably prevent water from scattering from the top and side surfaces of the polishing disk 1. Also, since the cap 14 is made of a soft material such as soft vinyl, it is lightweight and easy to handle, and can be attached and detached with a single touch.Since the cap 14 is not made of a hard material, even if it collides with another component, there is a risk that it may break, fly off, or cause injury. There is no In addition, since the cap 14 is made of a soft material, there is no risk of scratching the grinding surface 11 even if the lower edge 18 of the skirt 16 comes into sliding contact with the grinding surface 11, and even when used in a finishing polisher, a beautiful finished surface can be obtained. can get. Furthermore, since the cap 14 of the present invention is lightweight, there is no risk of the polishing disc 1 becoming unbalanced, and does not adversely affect the performance of the polishing disc. Furthermore, even if the grinding wheel tip 5 wears out, the skirt 16 follows, and the lower edge 18 of the skirt wears out together or shifts upward and maintains contact with the grinding surface 11 with the same surface pressure, so that the water splash prevention function is maintained for a long period of time. Maintained stably. The water splashed by the chip 5 from the stone grinding surface 11 is subjected to centrifugal force and pushes the portion of the skirt 16 on the front side in the rotational direction of the chip 5 radially outward.
Since the other parts are recessed, it bites into the outer circumferential surface 17 of the substrate better, rotates together with the substrate 2 while lightly abutting the stone grinding surface 11, and prevents water from scattering from the lower edge 18 of the skirt. At the same time, even if the upper plate 15 receives an upward force from water trying to jump upward from the window hole 12, the cap 14 will not float. Furthermore, by adopting the transparent cap 14 in the present invention, it is possible to proceed with the work while observing the grinding surface 11, and in particular, it is easy to control the grinding machine 1 so that it does not come off the grinding surface to a large extent. Furthermore, if soft vinyl is used, there is little change in hardness even at low temperatures, and scratches on the grinding surface 11 can be prevented as much as possible. Furthermore, by appropriately cutting the lower edge 18 of the skirt 16, it can be used for polishing discs of various sizes, improving versatility.

(別の実施例) キヤツプの材質としては軟質不透水製のもので
あれば、塩化ビニールの他の樹脂、レザー、布地
のような薄板材を採用することもできる。
(Another Embodiment) As the material of the cap, as long as it is soft and water-impermeable, resins other than vinyl chloride, leather, thin plate materials such as cloth can also be used.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案を適用した石材用研磨盤の一部
縦断正面図、第2図は底面部分図、第3図はキヤ
ツプの斜視図である。1……石材用研磨盤、2…
…基板、3……継手(ボス)、4……注水口、5
……砥石チツプ、11……石材研削面、14……
キヤツプ、15……上板、16……スカート。
FIG. 1 is a partially vertical front view of a stone polishing machine to which the present invention is applied, FIG. 2 is a partial bottom view, and FIG. 3 is a perspective view of the cap. 1... Stone polishing machine, 2...
... Board, 3 ... Joint (boss), 4 ... Water inlet, 5
...Whetstone tip, 11...Stone grinding surface, 14...
Cap, 15...Top plate, 16...Skirt.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 多数の窓孔を有する基板の上面中央に回転力継
手と注水口を備え、下面に多数の砥石チツプを有
する石材用研磨盤において、基板の上面に当接し
て上記窓孔を塞ぐ環状の上板と、その外周縁に連
続して基板の外周面にしつくり嵌る円筒状スカー
トとを有する軟質不透水薄板材キヤツプを取付
け、スカートの下縁が常時自重により石材の研削
面に摺接するようにスカートの高さを基板とチツ
プの合計高さより大きくしたことを特徴とする石
材用研磨盤の水飛防止装置。
In a stone polishing machine that has a rotary force joint and a water inlet in the center of the upper surface of a substrate having a large number of window holes, and has a large number of grindstone chips on the lower surface, an annular upper plate that comes into contact with the upper surface of the substrate to close the window holes. A soft water-impermeable thin plate material cap is attached, which has a cylindrical skirt that is continuously formed on the outer peripheral edge of the cap and fits onto the outer peripheral surface of the substrate. A water splash prevention device for a stone polishing machine, characterized in that its height is greater than the total height of a substrate and chips.
JP1986133608U 1986-08-29 1986-08-29 Expired JPH0426202Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986133608U JPH0426202Y2 (en) 1986-08-29 1986-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986133608U JPH0426202Y2 (en) 1986-08-29 1986-08-29

Publications (2)

Publication Number Publication Date
JPS6338969U JPS6338969U (en) 1988-03-12
JPH0426202Y2 true JPH0426202Y2 (en) 1992-06-24

Family

ID=31034072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986133608U Expired JPH0426202Y2 (en) 1986-08-29 1986-08-29

Country Status (1)

Country Link
JP (1) JPH0426202Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5696488B2 (en) * 2011-01-19 2015-04-08 日立工機株式会社 Dust collecting cover and power tool for grinding

Also Published As

Publication number Publication date
JPS6338969U (en) 1988-03-12

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