JPH04261083A - Pulse laser device - Google Patents
Pulse laser deviceInfo
- Publication number
- JPH04261083A JPH04261083A JP1993491A JP1993491A JPH04261083A JP H04261083 A JPH04261083 A JP H04261083A JP 1993491 A JP1993491 A JP 1993491A JP 1993491 A JP1993491 A JP 1993491A JP H04261083 A JPH04261083 A JP H04261083A
- Authority
- JP
- Japan
- Prior art keywords
- pulse width
- beam diameter
- expansion device
- pulse
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005372 isotope separation Methods 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical group [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Lasers (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は、例えばウラン原子の
同位体分離に用いられる色素レーザーを励起する銅蒸気
レーザーのように、高指向性でかつ大出力のパルスレー
ザー装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a highly directional and high output pulse laser device, such as a copper vapor laser that excites a dye laser used for isotopic separation of uranium atoms.
【0002】0002
【従来の技術】図4は、ビーム径拡大装置を備えた従来
のパルスレーザー装置の構成図である。図において1は
発振器、2はビーム径拡大装置、3はパルス幅伸長装置
、4は増幅器である。2. Description of the Related Art FIG. 4 is a block diagram of a conventional pulse laser device equipped with a beam diameter enlarging device. In the figure, 1 is an oscillator, 2 is a beam diameter expanding device, 3 is a pulse width expanding device, and 4 is an amplifier.
【0003】次に動作に付いて説明する。発振器1は、
小口径で共振器の長さの短い(約1m)発振器である。
このため発散角は極めて小さい(0.1mrad 以下
)が、ビーム径は小さく(約18mmφ)、パルス幅も
狭い(約20ns)ため、出力は約3Wと小さい。これ
を、2枚の凸レンズ2a,2bで構成されたビーム径拡
大装置2により、ビーム径は約65mmφに拡大され、
次いでパルス幅伸長装置3によってパルス幅を伸長され
る。パルス幅伸長装置3は、反射率が約63%の1枚の
部分反射鏡3aと、4枚の全反射鏡3bで構成されてお
り、入射ビームの約37%が直進する。残りの約63%
は部分反射鏡3aで反射され矢印の方向に、4枚の全反
射鏡3bを経由し、約6m循廻して、約20ns遅れて
、部分反射鏡3aに戻る。そこで、その約63%(入射
ビームの約37%は直進)が反射されて、先に直進した
ビームに重なり、パルス幅が約40nsとなって増幅器
4aに向かう。Next, the operation will be explained. Oscillator 1 is
This is an oscillator with a small diameter and short resonator length (approximately 1 m). Therefore, the divergence angle is extremely small (0.1 mrad or less), but the beam diameter is small (about 18 mmφ) and the pulse width is narrow (about 20 ns), so the output is small at about 3 W. The beam diameter is expanded to approximately 65 mmφ by a beam diameter expanding device 2 composed of two convex lenses 2a and 2b.
Next, the pulse width is expanded by the pulse width expansion device 3. The pulse width extension device 3 is composed of one partial reflection mirror 3a with a reflectance of about 63% and four total reflection mirrors 3b, and about 37% of the incident beam travels straight. The remaining approximately 63%
is reflected by the partial reflecting mirror 3a, passes through four total reflecting mirrors 3b, circulates about 6 m in the direction of the arrow, and returns to the partial reflecting mirror 3a with a delay of about 20 ns. Approximately 63% of the reflected beam (approximately 37% of the incident beam goes straight) is reflected and overlaps the beam that went straight ahead, with a pulse width of about 40 ns and heads toward the amplifier 4a.
【0004】ビーム径を拡大され、パスル幅を伸長され
たレーザーは、大口径(65mmφ)で長パルス幅(約
40ns)の100W級大型増幅器4により、多段4a
,4b,4cに増幅される。これにより、レーザー出力
は3段目で約300Wに増幅されるとともに、発散角は
0.3mrad 以下で、高指向性が維持される。[0004] The laser whose beam diameter has been enlarged and whose pulse width has been extended is powered by a multi-stage 4a by a large 100W class amplifier 4 with a large diameter (65 mmφ) and long pulse width (approximately 40 ns).
, 4b, 4c. As a result, the laser output is amplified to about 300 W at the third stage, and the divergence angle is 0.3 mrad or less, maintaining high directivity.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、従来の
パルスレーザー装置は、以上のように構成されているの
で、全長が長くなるという欠点があった。この発明は、
上記のような、欠点を解消するためになされたもので、
全長の短いパルスレーザー装置を得ることを目的とする
。[Problems to be Solved by the Invention] However, since the conventional pulse laser device is constructed as described above, it has the disadvantage that the overall length becomes long. This invention is
This was done to eliminate the drawbacks mentioned above.
The aim is to obtain a pulsed laser device with a short overall length.
【0006】[0006]
【課題を解決するための手段】この発明に係るパルスレ
ーザー装置は、パルス幅伸長装置の部分反射鏡をビーム
径拡大装置の出口側に配置し、ビーム径拡大装置の少な
くとも出口側レンズを、パルス伸長装置内に設置したも
のである。[Means for Solving the Problems] In the pulse laser device according to the present invention, the partial reflecting mirror of the pulse width expansion device is disposed on the exit side of the beam diameter expansion device, and at least the exit side lens of the beam diameter expansion device is connected to the pulse width expansion device. It is installed inside the expansion device.
【0007】[0007]
【作用】この発明において、パルス幅伸長装置の部分反
射鏡がビーム径拡大装置の出口側にあり、ビーム径拡大
装置の少なくとも出口側レンズがパルス幅伸長装置を構
成する複数の全反射鏡で囲まれた空間内にあるため、全
長を短かくすることができる。[Operation] In this invention, the partial reflection mirror of the pulse width expansion device is located on the exit side of the beam diameter expansion device, and at least the exit side lens of the beam diameter expansion device is surrounded by the plurality of total reflection mirrors constituting the pulse width expansion device. Since it is located in a closed space, the overall length can be shortened.
【0008】[0008]
【実施例】以下、この発明の一実施例を図について説明
する。図1において、1は発振器、2はビーム径拡大装
置、3はパルス幅伸長装置、4は増幅器である。パルス
幅伸長装置3を構成する部分反射鏡3aをビーム径拡大
装置の出口側に配置し、矢印の方向に、レーザービーム
を循廻するようにし、ビーム径拡大装置2を構成する出
口側レンズ2bを、パルス幅伸長装置3の内部に設置す
ることにより、パルス幅伸長装置とビーム径拡大装置を
一体に形成している。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, 1 is an oscillator, 2 is a beam diameter expanding device, 3 is a pulse width expanding device, and 4 is an amplifier. A partial reflecting mirror 3a constituting the pulse width expansion device 3 is arranged on the exit side of the beam diameter expansion device so as to circulate the laser beam in the direction of the arrow, and an exit side lens 2b constituting the beam diameter expansion device 2 By installing this inside the pulse width expansion device 3, the pulse width expansion device and the beam diameter expansion device are integrally formed.
【0009】次に動作に付いて説明する。発振器1は、
小口径で共振器の長さが短い(約1m)発振器である。
このため発散角は小さい(0.1mrad 以下)が、
ビーム径は小さく(約18mmφ)、パルス幅も狭い(
約20ns)ため、出力は約3Wと小さい。発振器1を
出たレーザーは2枚の凸レンズ2a,2bで構成された
ビーム径拡大装置2により、ビーム径は約65mmφに
拡大される。次いでこのビームは、1枚の部分反射鏡3
aと、4枚の全反射鏡3bで構成されるパルス幅伸長装
置により、パルス幅を約2倍に伸長される。パルス幅伸
長装置では、部分反射鏡3aの反射率は、約63%であ
るので、入射したレーザーのうち、約37%が直進し、
残りのレーザーは反射されて、図1の矢印の方向へ向い
、全反射鏡3bにより、ビーム径拡大装置のまわりを約
6m循廻し、約20ns遅れて、部分反射鏡3aに戻り
、その約63%(入射ビームの約37%は直進)が反射
されて、先に直進したレーザービームに重なり、パルス
幅は約40nsとなって増幅器4に向かう。ビーム径を
拡大され、パスル幅を伸長されたレーザービームは、大
口径(65mmφ)で長パルス幅(約40ns)の10
0W級大型増幅器4により、多段4a,4b,4cに増
幅される。これにより、レーザー出力は3段目で約30
0Wに増幅されるとともに、発散角は0.3mrad
以下で、高指向性が維持される。Next, the operation will be explained. Oscillator 1 is
This is an oscillator with a small diameter and short resonator length (approximately 1 m). Therefore, the divergence angle is small (less than 0.1 mrad), but
The beam diameter is small (approximately 18 mmφ) and the pulse width is narrow (
(about 20 ns), the output is as small as about 3 W. The beam diameter of the laser beam emitted from the oscillator 1 is expanded to approximately 65 mmφ by a beam diameter expanding device 2 composed of two convex lenses 2a and 2b. This beam is then passed through a single partially reflecting mirror 3
The pulse width is expanded to about twice by a pulse width expansion device consisting of a mirror a and four total reflection mirrors 3b. In the pulse width stretching device, the reflectance of the partial reflecting mirror 3a is about 63%, so about 37% of the incident laser beam goes straight;
The remaining laser is reflected and directed in the direction of the arrow in FIG. 1, circulates around the beam diameter expander by about 6 m by the total reflection mirror 3b, returns to the partial reflection mirror 3a after a delay of about 20 ns, and returns to the partial reflection mirror 3a. % (approximately 37% of the incident beam goes straight) is reflected and overlaps the laser beam that went straight ahead, and the pulse width becomes about 40 ns and heads toward the amplifier 4. The laser beam, whose beam diameter has been expanded and pulse width has been extended, has a large diameter (65 mmφ) and a long pulse width (approximately 40 ns).
A large 0W class amplifier 4 amplifies the signal into multiple stages 4a, 4b, and 4c. As a result, the laser output at the third stage is approximately 30
It is amplified to 0W and the divergence angle is 0.3mrad.
High directivity is maintained below.
【0010】なお、上記実施例では、パルス幅伸長装置
において、レーザーを方形に循廻させたが、図2に示す
ように8の字形に循廻させてもよい。この方が、より狭
いスペースで、長い光路長が得られるので、パルスレー
ザー装置を一層コンパクトにすることができる。又、図
3に示すように、ビーム径拡大装置2を凹レンズと凸レ
ンズで構成してもよい。この方で、より短かくなり、パ
ルス幅伸長装置3の内部に納めやすくなる。また、図1
や図3に示した実施例では、ビーム拡大装置を構成する
入口側の凸レンズを、パルス幅伸長装置の外に設置した
が、凸レンズの焦点距離を短かくして、パスル幅伸長装
置の内側に、入口側のレンズも設置する構成にしてもよ
い。かくして、一層コンパクトになる。In the above embodiment, the laser is circulated in a rectangular manner in the pulse width stretching device, but it may be circulated in a figure 8 shape as shown in FIG. This allows a longer optical path length to be obtained in a smaller space, making it possible to make the pulse laser device even more compact. Further, as shown in FIG. 3, the beam diameter enlarging device 2 may be constructed of a concave lens and a convex lens. In this case, it is shorter and easier to fit inside the pulse width stretching device 3. Also, Figure 1
In the embodiment shown in FIG. A configuration may also be adopted in which a side lens is also installed. This makes it even more compact.
【0011】[0011]
【発明の効果】以上のように、この発明によれば、パル
ス幅伸長装置の部分反射鏡をパルス幅伸長装置からのビ
ームの出口側に設け、ビーム拡大装置の出口側のレンズ
あるいは全てのレンズをパルス幅伸長装置内に納めるよ
うに構成したので、装置がコンパクトになり、省スペー
ス化がはかれるとともに、安価になるという効果が得ら
れる。As described above, according to the present invention, the partial reflecting mirror of the pulse width expansion device is provided on the exit side of the beam from the pulse width expansion device, and the lens on the exit side of the beam expansion device or all the lenses Since the device is configured to be housed within the pulse width expansion device, the device can be made compact, space-saving, and inexpensive.
【図1】この発明の一実施例によるパルスレーザー装置
を示す構成図である。FIG. 1 is a configuration diagram showing a pulse laser device according to an embodiment of the present invention.
【図2】この発明の第二の実施例を示す構成図である。FIG. 2 is a configuration diagram showing a second embodiment of the invention.
【図3】この発明の第三の実施例を示す構成図である。FIG. 3 is a configuration diagram showing a third embodiment of the invention.
【図4】従来のパルスレーザー装置の構成図である。FIG. 4 is a configuration diagram of a conventional pulse laser device.
1 発振器 2 ビーム径拡大装置 2a 入口側レンズ 2b 出口側レンズ 3 パルス幅伸長装置 3a 部分反射鏡 3b 全反射鏡 4 増幅器 4a 1段目の増幅器 4b 2段目の増幅器 4c 3段目の増幅器 1 Oscillator 2 Beam diameter expansion device 2a Entrance side lens 2b Exit side lens 3 Pulse width extension device 3a Partial reflector 3b Total reflection mirror 4 Amplifier 4a 1st stage amplifier 4b 2nd stage amplifier 4c 3rd stage amplifier
Claims (2)
伸長装置と増幅器とを備えたパルスレーザー装置におい
て、パルス幅伸長装置の部分反射鏡をビーム径拡大装置
のビーム出口側に設置し、ビーム径拡大装置の少なくと
も出口側レンズをパルス幅伸長装置を構成する複数の全
反射鏡で囲まれる空間内に設置したことを特徴とするパ
ルスレーザー装置。Claim 1: In a pulsed laser device comprising an oscillator, a beam diameter expansion device, a pulse width expansion device, and an amplifier, a partial reflecting mirror of the pulse width expansion device is installed on the beam exit side of the beam diameter expansion device, and the beam diameter A pulse laser device characterized in that at least an exit side lens of a magnifying device is installed in a space surrounded by a plurality of total reflection mirrors constituting a pulse width stretching device.
たことを特徴とする請求項1のパルスレーザー装置。2. The pulse laser device according to claim 1, wherein the optical path of the pulse width stretching device is shaped like a figure eight.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3019934A JP2760159B2 (en) | 1991-02-13 | 1991-02-13 | Pulse laser equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3019934A JP2760159B2 (en) | 1991-02-13 | 1991-02-13 | Pulse laser equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04261083A true JPH04261083A (en) | 1992-09-17 |
JP2760159B2 JP2760159B2 (en) | 1998-05-28 |
Family
ID=12013045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3019934A Expired - Lifetime JP2760159B2 (en) | 1991-02-13 | 1991-02-13 | Pulse laser equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2760159B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005148550A (en) * | 2003-11-18 | 2005-06-09 | Gigaphoton Inc | Optical pulse expander and discharge exciting gas laser device for exposure |
JP2006186046A (en) * | 2004-12-27 | 2006-07-13 | Komatsu Ltd | Optical pulse stretch device and pulsed laser apparatus using this |
US9541137B2 (en) | 2012-09-24 | 2017-01-10 | Ntn Corporation | Cooling structure for bearing device |
US11025026B2 (en) | 2017-01-26 | 2021-06-01 | Gigaphoton Inc. | Laser system |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6358886A (en) * | 1986-08-29 | 1988-03-14 | Toshiba Corp | Pulse discharge type laser device |
JPS63157173A (en) * | 1986-12-22 | 1988-06-30 | Toshiba Corp | Recorder |
JPS63174318U (en) * | 1986-11-27 | 1988-11-11 |
-
1991
- 1991-02-13 JP JP3019934A patent/JP2760159B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6358886A (en) * | 1986-08-29 | 1988-03-14 | Toshiba Corp | Pulse discharge type laser device |
JPS63174318U (en) * | 1986-11-27 | 1988-11-11 | ||
JPS63157173A (en) * | 1986-12-22 | 1988-06-30 | Toshiba Corp | Recorder |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005148550A (en) * | 2003-11-18 | 2005-06-09 | Gigaphoton Inc | Optical pulse expander and discharge exciting gas laser device for exposure |
JP2006186046A (en) * | 2004-12-27 | 2006-07-13 | Komatsu Ltd | Optical pulse stretch device and pulsed laser apparatus using this |
JP4627185B2 (en) * | 2004-12-27 | 2011-02-09 | 株式会社小松製作所 | Method for setting delay optical path length in optical pulse stretcher |
US9541137B2 (en) | 2012-09-24 | 2017-01-10 | Ntn Corporation | Cooling structure for bearing device |
US11025026B2 (en) | 2017-01-26 | 2021-06-01 | Gigaphoton Inc. | Laser system |
US11682877B2 (en) | 2017-01-26 | 2023-06-20 | Gigaphoton Inc. | Laser system |
Also Published As
Publication number | Publication date |
---|---|
JP2760159B2 (en) | 1998-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2954938B2 (en) | Line narrowing device having diffraction grating with two functions | |
US6101211A (en) | Narrow-band laser apparatus | |
JP2002141589A (en) | Diode pumped laser amplifier | |
US4156852A (en) | Multipass laser amplification with near-field far-field optical separation | |
KR950031358A (en) | Laser oscillator | |
JPH04261083A (en) | Pulse laser device | |
JPH0298919A (en) | Laser apparatus | |
JPH098389A (en) | Narrow band excimer laser oscillator | |
JPH08228038A (en) | Narrow-band laser generator | |
JP2729447B2 (en) | Narrow band laser device | |
JPH0423480A (en) | Narrow band laser device | |
JPH09199781A (en) | Laser amplifier | |
JP2526946B2 (en) | Laser device | |
US7254156B2 (en) | Line-narrowed dye laser | |
JPH0472782A (en) | Narrow band laser oscillation method | |
JP2987644B2 (en) | Narrow band laser device | |
JPH0426174A (en) | Narrow-band laser apparatus | |
JP2671268B2 (en) | Backward stimulated Raman pulse amplifier | |
JP2924261B2 (en) | Narrow band excimer laser device | |
JPH03233988A (en) | Laser device | |
JPH05102587A (en) | Narrow-band excimer laser | |
JPS6095986A (en) | Discharge tube excitation laser device | |
JPH0626272B2 (en) | Polarizer for laser device | |
JPH03209887A (en) | Narrow band laser device | |
JPH04186684A (en) | Narrow band excimer laser |