JPH0425859U - - Google Patents
Info
- Publication number
- JPH0425859U JPH0425859U JP6458090U JP6458090U JPH0425859U JP H0425859 U JPH0425859 U JP H0425859U JP 6458090 U JP6458090 U JP 6458090U JP 6458090 U JP6458090 U JP 6458090U JP H0425859 U JPH0425859 U JP H0425859U
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- thin film
- optical information
- film forming
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 8
- 238000005070 sampling Methods 0.000 claims description 3
- 238000012806 monitoring device Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 7
- 238000001514 detection method Methods 0.000 claims 3
- 238000012544 monitoring process Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Description
第１図は本考案に係る薄膜形成装置の監視装置
の要部拡大図、第２図は本考案に係る薄膜形成装
置の断面図である。
１０……薄膜形成装置、１２……真空チヤンバ
、１４……ＥＢ／ＧＵＮ、１６……信号処理部、
３１……ワーク、４４……モニタ装置、５２Ａ，
５２Ｂ，５２Ｃ……サンプリング透明体、６０Ａ
，６０Ｂ……光フアイバ、６２……フレキシブル
チユーブ、６６……光電変換部。
FIG. 1 is an enlarged view of a main part of a monitoring device for a thin film forming apparatus according to the present invention, and FIG. 2 is a sectional view of the thin film forming apparatus according to the present invention. 10... Thin film forming device, 12... Vacuum chamber, 14... EB/GUN, 16... Signal processing unit,
31...Work, 44...Monitor device, 52A,
52B, 52C...Sampling transparent body, 60A
, 60B... Optical fiber, 62... Flexible tube, 66... Photoelectric conversion section.
Claims (1)
と、 前記薄膜形成手段により薄膜が形成されるサン
プリング透明体を有し、真空チャンバ内の任意の
位置に配置可能なモニタ装置と、 光入射端側が前記モニタ装置と接続されサンプ
リング透明体の光学的情報を伝送する光フアイバ
と、 前記真空チヤンバ内の前記光フアイバを密封被
覆して真空から遮断するフレキシブルチユーブと
、 前記光フアイバの光出射端側が接続され光フア
イバにより伝送された光学的情報に応じて前記薄
膜形成手段を制御して薄膜形成条件を変える制御
手段と、 を有することを特徴とする薄膜形成装置。 (2) 光学的情報検出部と、 光入射端側が前記光学的情報検知部と接続され
、前記光学的情報検知部で検出した光学的情報を
伝送する光フアイバと、 光フアイバの出射端側に接続され前記光学的情
報を受信する監視部と、 該光フアイバを密封被覆して真空から遮断する
フレキシブルチユーブと、 を有する監視装置。[Claims for Utility Model Registration] (1) A vacuum chamber, a thin film forming means provided in the vacuum chamber, and a sampling transparent body on which a thin film is formed by the thin film forming means, and any part of the vacuum chamber provided in the vacuum chamber. a monitor device that can be placed at a position; an optical fiber whose light incident end side is connected to the monitor device and transmits optical information of the sampling transparent body; and the optical fiber in the vacuum chamber is hermetically coated and isolated from the vacuum. a flexible tube connected to the light emitting end side of the optical fiber, and control means that controls the thin film forming means to change thin film forming conditions according to optical information transmitted by the optical fiber. Thin film forming equipment. (2) an optical information detection section; an optical fiber whose light input end side is connected to the optical information detection section and transmits the optical information detected by the optical information detection section; and an output end side of the optical fiber; A monitoring device comprising: a monitoring unit connected to receive the optical information; and a flexible tube hermetically covering the optical fiber to isolate it from vacuum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6458090U JPH0425859U (en) | 1990-06-19 | 1990-06-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6458090U JPH0425859U (en) | 1990-06-19 | 1990-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0425859U true JPH0425859U (en) | 1992-03-02 |
Family
ID=31595653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6458090U Pending JPH0425859U (en) | 1990-06-19 | 1990-06-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0425859U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022545500A (en) * | 2019-08-30 | 2022-10-27 | アプライド マテリアルズ インコーポレイテッド | E-beam PVD endpoint detection and closed-loop process control system |
-
1990
- 1990-06-19 JP JP6458090U patent/JPH0425859U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022545500A (en) * | 2019-08-30 | 2022-10-27 | アプライド マテリアルズ インコーポレイテッド | E-beam PVD endpoint detection and closed-loop process control system |
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