JPH0424255U - - Google Patents
Info
- Publication number
- JPH0424255U JPH0424255U JP6461490U JP6461490U JPH0424255U JP H0424255 U JPH0424255 U JP H0424255U JP 6461490 U JP6461490 U JP 6461490U JP 6461490 U JP6461490 U JP 6461490U JP H0424255 U JPH0424255 U JP H0424255U
- Authority
- JP
- Japan
- Prior art keywords
- resistance
- emission
- emission power
- filament
- series
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は、この考案の一実施例に係るイオン注
入装置を示す図である。第２図は、この考案の背
景となるイオン注入装置の一例を示す図である。
２……イオンビーム、８……フアラデーケース
、１６……基板、１８……ホルダ、２０……フイ
ラメント、２４……フイラメント電源、２６……
フイラメント電流制御回路、３０……サプレツサ
電源、３２……エミツシヨン電源、３４……エミ
ツシヨン電流計測用の抵抗、３６……エミツシヨ
ン電流計測回路、４０……中性化制御回路、４２
……ホルダバイアス電源、４４……フアラデーバ
イアス電源、４６……ビーム電流計測器、５０〜
５９……リレー、６０……ダイオード、６２……
第２の抵抗。
FIG. 1 is a diagram showing an ion implantation apparatus according to an embodiment of this invention. FIG. 2 is a diagram showing an example of an ion implantation apparatus that is the background of this invention. 2... Ion beam, 8... Faraday case, 16... Substrate, 18... Holder, 20... Filament, 24... Filament power supply, 26...
Filament current control circuit, 30... Suppressor power supply, 32... Emission power supply, 34... Resistor for emission current measurement, 36... Emission current measurement circuit, 40... Neutralization control circuit, 42
... Holder bias power supply, 44 ... Faraday bias power supply, 46 ... Beam current measuring device, 50 ~
59...Relay, 60...Diode, 62...
Second resistance.
Claims (1)
デーケースに当ててそこから二次電子を放出させ
、この二次電子をホルダ上のイオン注入されるべ
き基板に供給するようにしたイオン注入装置であ
つて、前記フイラメントと前記フアラデーケース
との間に接続されていて後者に正の電圧を与える
エミツシヨン電源と、このエミツシヨン電源に直
列に挿入されたエミツシヨン電流計測用の抵抗と
、この抵抗に並列に接続されていてそこを流れる
エミツシヨン電流を計測するエミツシヨン電流計
測回路とを備えるものにおいて、前記エミツシヨ
ン電流計測用の抵抗を前記エミツシヨン電源と前
記フイラメントとの間に直列に挿入し、かつ同抵
抗に並列にダイオードをエミツシヨン電源に対し
て順方向に接続し、更に同抵抗とエミツシヨン電
源との間に第２の抵抗を直列に挿入したことを特
徴とするイオン注入装置。 An ion implantation device in which primary electrons emitted from a filament are applied to a Faraday case to emit secondary electrons therefrom, and the secondary electrons are supplied to a substrate on a holder into which ions are to be implanted. , an emission power supply connected between the filament and the Faraday case and giving a positive voltage to the latter, a resistance for measuring the emission current inserted in series with this emission power supply, and a resistance connected in parallel with this resistance. and an emission current measurement circuit that measures the emission current flowing therethrough, the resistance for measuring the emission current being inserted in series between the emission power source and the filament, and in parallel with the resistance. An ion implantation device characterized in that a diode is connected in a forward direction to an emission power source, and a second resistor is inserted in series between the resistor and the emission power source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6461490U JPH0424255U (en) | 1990-06-19 | 1990-06-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6461490U JPH0424255U (en) | 1990-06-19 | 1990-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0424255U true JPH0424255U (en) | 1992-02-27 |
Family
ID=31595714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6461490U Pending JPH0424255U (en) | 1990-06-19 | 1990-06-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0424255U (en) |
-
1990
- 1990-06-19 JP JP6461490U patent/JPH0424255U/ja active Pending
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