JPH0424253U - - Google Patents
Info
- Publication number
- JPH0424253U JPH0424253U JP6461290U JP6461290U JPH0424253U JP H0424253 U JPH0424253 U JP H0424253U JP 6461290 U JP6461290 U JP 6461290U JP 6461290 U JP6461290 U JP 6461290U JP H0424253 U JPH0424253 U JP H0424253U
- Authority
- JP
- Japan
- Prior art keywords
- holder
- power supply
- faraday
- bias power
- relays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6461290U JPH0424253U (en:Method) | 1990-06-19 | 1990-06-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6461290U JPH0424253U (en:Method) | 1990-06-19 | 1990-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0424253U true JPH0424253U (en:Method) | 1992-02-27 |
Family
ID=31595710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6461290U Pending JPH0424253U (en:Method) | 1990-06-19 | 1990-06-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0424253U (en:Method) |
-
1990
- 1990-06-19 JP JP6461290U patent/JPH0424253U/ja active Pending
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