JPH0423222A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPH0423222A JPH0423222A JP12750590A JP12750590A JPH0423222A JP H0423222 A JPH0423222 A JP H0423222A JP 12750590 A JP12750590 A JP 12750590A JP 12750590 A JP12750590 A JP 12750590A JP H0423222 A JPH0423222 A JP H0423222A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- polishing
- magnetic
- recording medium
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000005498 polishing Methods 0.000 claims abstract description 20
- 230000001681 protective effect Effects 0.000 claims abstract description 9
- 238000007772 electroless plating Methods 0.000 claims abstract description 7
- 229910018104 Ni-P Inorganic materials 0.000 claims abstract description 4
- 229910018536 Ni—P Inorganic materials 0.000 claims abstract description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052782 aluminium Inorganic materials 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 10
- 238000007747 plating Methods 0.000 abstract description 10
- 238000004544 sputter deposition Methods 0.000 abstract description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- 239000000314 lubricant Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 13
- 230000003746 surface roughness Effects 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
[概要]
磁気記録媒体の製造方法に関し、
基板に対して均一な凹凸を形成することができる磁気記
録媒体の製造方法を提供することを目的とし、
非磁性基板上に研磨を行ない、研磨後、Ni−Pの無電
解メッキを行ない、その後、磁性膜、保護膜を形成する
。[Detailed Description of the Invention] [Summary] An object of the present invention is to provide a method for manufacturing a magnetic recording medium that can form uniform irregularities on a substrate, and to provide a method for manufacturing a magnetic recording medium that can form uniform irregularities on a non-magnetic substrate. Polishing is performed, and after polishing, Ni--P electroless plating is performed, and then a magnetic film and a protective film are formed.
[産業上の利用分野コ 本発明は、磁気記録媒体の製造方法に関する。[Industrial application fields] The present invention relates to a method of manufacturing a magnetic recording medium.
近年、磁気記憶媒体が用いられる磁気ディスク装置にお
いては、ヘットの低浮上化やcssゾーンてのヘッドの
吸着を防止することが要望されている。よって、磁気記
録媒体においては、表面mさの管理か重要となっている
。In recent years, in magnetic disk devices using magnetic storage media, it has been desired to lower the flying height of the head and to prevent the head from adhering to the CSS zone. Therefore, in magnetic recording media, management of surface thickness is important.
[従来の技術]
次に図面を用いて従来例を説明する。第6図は従来の磁
気記録媒体の製造方法を説明するフロ図である。[Prior Art] Next, a conventional example will be explained using the drawings. FIG. 6 is a flow diagram illustrating a conventional method of manufacturing a magnetic recording medium.
図において、先ず、アルミ基板上に、Ni−Pの無電解
メッキを行なう(ステップ])。In the figure, first, electroless plating of Ni--P is performed on an aluminum substrate (step).
メッキ終了後、洗浄・乾燥を行なう(ステップ2)。After plating is completed, cleaning and drying are performed (step 2).
次に、ポリッシング行ない、メッキ表面を美麗に仕上げ
る(ステップ3)。Next, polishing is performed to give a beautiful finish to the plated surface (Step 3).
ポリッシング終了後、洗浄・乾燥を行なう(ステップ4
)。After polishing, wash and dry (Step 4)
).
次に、テクスチャー処理と呼ばれるテープ研磨加工がな
される(ステップ5 )。この加工は基板上の表面粗さ
を調整するためになされる。Next, a tape polishing process called texturing process is performed (step 5). This processing is performed to adjust the surface roughness on the substrate.
テクスチャー終了後、洗浄・乾燥を行なう(ステップ6
)。After texture is finished, wash and dry (Step 6)
).
次に、スパッタリングにより基板上に磁性膜を形成する
(ステップ7)。Next, a magnetic film is formed on the substrate by sputtering (step 7).
続いて、スパッタリングにより磁性膜上にカーボンの保
護膜を形成する(ステップ8)。Subsequently, a carbon protective film is formed on the magnetic film by sputtering (step 8).
そして、実際に設定した磁気ヘッドの浮上量よりも低く
浮上量を設定した磁気ヘッドを用いて、微小突起をとる
ヘッドバニッシュがなされる(ステップ9)。Then, using a magnetic head whose flying height is set lower than the actually set flying height of the magnetic head, head vanishing is performed to remove minute protrusions (step 9).
最後に、摩擦を低減するために潤滑剤を塗布する(ステ
ップ10)。Finally, a lubricant is applied to reduce friction (step 10).
[発明か解決しようとする課題]
第7図は第6図においてステップ5のテクスチャーを行
なった後の基板の表面粗さの一例を示す図である。[Problems to be Solved by the Invention] FIG. 7 is a diagram showing an example of the surface roughness of the substrate after the texturing in step 5 in FIG. 6 is performed.
図に示すように、中心線平均粗さのラインよりも凹部の
突出が多く、均一な凹凸をつけることか難しいという問
題点かある。As shown in the figure, the concave portions protrude more than the center line average roughness line, and there is a problem in that it is difficult to create uniform unevenness.
本発明は上記問題点に鑑みてなされたもので、その目的
は、基板に対して均一な凹凸を形成することかできる磁
気記録媒体の製造方法を提供することにある。The present invention has been made in view of the above problems, and an object thereof is to provide a method for manufacturing a magnetic recording medium that can form uniform irregularities on a substrate.
[課題を解決するための手段]
第1図は本発明の原理図である。図において、ステップ
11は非磁性基板上に研磨を行なう工程、ステップ12
は研磨後、Ni−Pの無電解メッキを行なう工程、ステ
ップ13は磁性膜、保護膜を形成する工程である。[Means for Solving the Problems] FIG. 1 is a diagram showing the principle of the present invention. In the figure, step 11 is a step of polishing a non-magnetic substrate, step 12
Step 13 is a step of performing electroless Ni--P plating after polishing, and step 13 is a step of forming a magnetic film and a protective film.
[作用]
第1図に示す磁気記録媒体の製造方法において、非磁性
基板上に先ず研磨かなされ、次に、Ni−Pの無電解メ
ッキかなされる。この時、凸部に比べて凹部のほうに余
分にメッキか付き、均一な凹凸が形成される。そして、
磁性膜、保護膜か形成される。[Function] In the method for manufacturing a magnetic recording medium shown in FIG. 1, a nonmagnetic substrate is first polished and then electroless plated with Ni--P. At this time, more plating is applied to the concave portions than to the convex portions, forming uniform irregularities. and,
A magnetic film and a protective film are formed.
[実施例]
次に、図面を用いて本発明の一実施例を説明する。第2
図は本発明の磁気記録媒体の製造方法の一実施例を説明
するフロー図、第3図は第2図のステップ21において
研磨前のアルミ基板の表面粗さの一例を示す図、第4図
は第2図のステップ21において研磨後のアルミ基板の
表面粗さの一例を示す図、第5図は第2図のステップ2
2においてNj−Pメッキ後の表面粗さの一例を示す図
である。[Example] Next, an example of the present invention will be described using the drawings. Second
The figure is a flowchart explaining one embodiment of the method for manufacturing a magnetic recording medium of the present invention, FIG. 3 is a diagram showing an example of the surface roughness of the aluminum substrate before polishing in step 21 of FIG. 2, and FIG. is a diagram showing an example of the surface roughness of an aluminum substrate after polishing in step 21 of FIG. 2, and FIG.
2 is a diagram showing an example of the surface roughness after Nj-P plating in No. 2. FIG.
先ず、第2図を用いて本実施例の製造フローを説明する
。図において、先ず、アルミ基板に対して研磨を行う(
ステップ21)。First, the manufacturing flow of this embodiment will be explained using FIG. In the figure, first, the aluminum substrate is polished (
Step 21).
研磨終了後、洗浄・乾燥を行なう(ステップ22)。After polishing is completed, cleaning and drying are performed (step 22).
次に、アルミ基板上に、Nj−Pの無電解メッキを行な
う(ステップ23)。Next, electroless plating of Nj-P is performed on the aluminum substrate (step 23).
メッキ終了後、洗浄・乾燥を行なう(ステップ24)。After plating is completed, cleaning and drying are performed (step 24).
次に、ポリッンング行ない、メッキ表面を美麗に仕上げ
る(ステップ25)。Next, polishing is performed to finish the plated surface beautifully (step 25).
ポリッシング終了後、洗浄・乾燥を行なう(ステップ2
6)。After polishing, wash and dry (Step 2)
6).
次に、スパッタリングにより基板上に磁性膜を形成する
(ステップ27)。Next, a magnetic film is formed on the substrate by sputtering (step 27).
続いて、スパッタリングにより磁性膜上にカーボンの保
護膜を形成する(ステップ28)。Subsequently, a carbon protective film is formed on the magnetic film by sputtering (step 28).
そして、実際に設定した磁気ヘッドの浮上量よりも低く
浮上量を設定した磁気ヘットを用いて、微小突起をとる
ヘソドハニッンユがなされる(ステップ2つ)。Then, using a magnetic head whose flying height is set lower than the actually set flying height of the magnetic head, a process for removing minute protrusions is performed (two steps).
最後に、摩擦を低減するために潤滑剤を塗布する(ステ
ップ30)。Finally, a lubricant is applied to reduce friction (step 30).
上記製造方法によれば、第3図に示すような表面粗さの
アルミ基板に研磨を行うと、第4図に示すよな表面粗さ
となる。ここで、Ni−Pメッキを行うと、第5図に示
すように、凸部に比べて四部のほうに余分にメッキか付
くので、従来に比べて、アルミ基板に対して均一な凹凸
を形成することができる。According to the above manufacturing method, when an aluminum substrate having a surface roughness as shown in FIG. 3 is polished, the surface roughness becomes as shown in FIG. 4. When Ni-P plating is performed here, as shown in Figure 5, more plating is applied to the four parts than to the convex parts, so compared to the conventional method, uniform unevenness is formed on the aluminum substrate. can do.
[発明の効果コ
以上説明したように本発明によれば、非磁性基板上に研
磨を行ない、研磨後、JLI−Pの無電解メッキを行な
い、その後、磁性膜、保護膜を形成するようにしたこと
により、基板に対して均一な凹凸を形成することができ
る磁気記録媒体の製造方法を実現できる。[Effects of the Invention] As explained above, according to the present invention, polishing is performed on a non-magnetic substrate, electroless plating of JLI-P is performed after polishing, and then a magnetic film and a protective film are formed. By doing so, it is possible to realize a method for manufacturing a magnetic recording medium that can form uniform irregularities on a substrate.
第1図は本発明の原理図、
第2図は本発明の磁気記録媒体の製造方法の一実施例を
説明するフロー図、
第3図は第2図のステップ21において研磨前のアルミ
基板の表面粗さの一例を示す図、第4図は第2図のステ
ップ21において研磨後のアルミ基板の表面粗さの一例
を示す図、第5図は第2図のステップ22においてNi
−Pメッキ後の表面粗さの一例を示す図、
第6図は従来の磁気記録媒体の製造方法を説明するフロ
ー図、
第7図は第6図においてステップ5のテクスチャーを行
なった後の基板の表面粗さの一例を示す図である。Fig. 1 is a diagram of the principle of the present invention, Fig. 2 is a flow diagram illustrating an embodiment of the method for manufacturing a magnetic recording medium of the present invention, and Fig. 3 is a diagram of the aluminum substrate before polishing in step 21 of Fig. 2. FIG. 4 is a diagram showing an example of the surface roughness of the aluminum substrate polished in step 21 of FIG. 2, and FIG. 5 is a diagram showing an example of the surface roughness of the aluminum substrate polished in step 22 of FIG.
-A diagram showing an example of surface roughness after P plating; Figure 6 is a flow diagram explaining a conventional method of manufacturing a magnetic recording medium; Figure 7 is a substrate after texturing in step 5 in Figure 6; It is a figure showing an example of surface roughness of.
Claims (1)
、Ni−Pの無電解メッキを行ない(ステップ12)、 その後、磁性膜、保護膜を形成する(ステップ13)こ
とを特徴とする磁気記録媒体の製造方法。[Claims] Polishing is performed on a nonmagnetic substrate (step 11), and after polishing, electroless plating of Ni-P is performed (step 12). Then, a magnetic film and a protective film are formed (step 13). A method of manufacturing a magnetic recording medium, characterized in that:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12750590A JPH0423222A (en) | 1990-05-17 | 1990-05-17 | Production of magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12750590A JPH0423222A (en) | 1990-05-17 | 1990-05-17 | Production of magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0423222A true JPH0423222A (en) | 1992-01-27 |
Family
ID=14961649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12750590A Pending JPH0423222A (en) | 1990-05-17 | 1990-05-17 | Production of magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0423222A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100496181B1 (en) * | 1997-12-31 | 2005-09-07 | 삼성전자주식회사 | Disk Burnishing Method in Hard Disk Drive Manufacturing Process |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5651028A (en) * | 1979-10-02 | 1981-05-08 | Nec Corp | Manufacture for magnetic memory element |
JPS62226424A (en) * | 1986-03-26 | 1987-10-05 | Mitsubishi Electric Corp | Production of magnetic disk substrate |
JPS62248133A (en) * | 1986-04-21 | 1987-10-29 | Seiko Epson Corp | Magnetic disk |
JPS6455738A (en) * | 1987-08-26 | 1989-03-02 | Mitsubishi Electric Corp | Production of magnetic recording carrier |
-
1990
- 1990-05-17 JP JP12750590A patent/JPH0423222A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5651028A (en) * | 1979-10-02 | 1981-05-08 | Nec Corp | Manufacture for magnetic memory element |
JPS62226424A (en) * | 1986-03-26 | 1987-10-05 | Mitsubishi Electric Corp | Production of magnetic disk substrate |
JPS62248133A (en) * | 1986-04-21 | 1987-10-29 | Seiko Epson Corp | Magnetic disk |
JPS6455738A (en) * | 1987-08-26 | 1989-03-02 | Mitsubishi Electric Corp | Production of magnetic recording carrier |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100496181B1 (en) * | 1997-12-31 | 2005-09-07 | 삼성전자주식회사 | Disk Burnishing Method in Hard Disk Drive Manufacturing Process |
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