JPH04231316A - Decarburization method of metal silicon - Google Patents
Decarburization method of metal siliconInfo
- Publication number
- JPH04231316A JPH04231316A JP40851790A JP40851790A JPH04231316A JP H04231316 A JPH04231316 A JP H04231316A JP 40851790 A JP40851790 A JP 40851790A JP 40851790 A JP40851790 A JP 40851790A JP H04231316 A JPH04231316 A JP H04231316A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- gas
- filter
- holes
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010703 silicon Substances 0.000 title claims abstract description 39
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 39
- 238000000034 method Methods 0.000 title claims description 18
- 238000005261 decarburization Methods 0.000 title abstract description 4
- 239000002184 metal Substances 0.000 title abstract 2
- 239000000463 material Substances 0.000 claims abstract description 13
- 238000002844 melting Methods 0.000 claims abstract description 6
- 230000008018 melting Effects 0.000 claims abstract description 6
- 239000007789 gas Substances 0.000 claims description 16
- 238000001914 filtration Methods 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 6
- 150000003377 silicon compounds Chemical class 0.000 claims description 4
- 229920001296 polysiloxane Polymers 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 7
- 239000010453 quartz Substances 0.000 abstract description 5
- 238000012856 packing Methods 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 239000000945 filler Substances 0.000 description 13
- 239000010410 layer Substances 0.000 description 13
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 7
- 229910010271 silicon carbide Inorganic materials 0.000 description 6
- 238000004062 sedimentation Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は金属けい素の精製方法
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a method for purifying silicon metal.
【0002】0002
【従来の技術】近年、高純度けい素を安価に製造する方
法として、高純度シリカを高純度炭素によって還元する
方法が開発されている。しかし、このような炭素を還元
剤として用いる方法では、製造されたけい素中には 5
00〜1000ppmwの炭素が含有されている。この
ためけい素中の炭素を除去する方法が必要となる。BACKGROUND OF THE INVENTION In recent years, a method of reducing high-purity silica with high-purity carbon has been developed as a method for producing high-purity silicon at low cost. However, in this method of using carbon as a reducing agent, the produced silicon contains 5
00 to 1000 ppmw of carbon is contained. Therefore, a method for removing carbon from silicon is required.
【0003】けい素中の炭素の存在形態はシリコンに溶
解した溶存炭素(C)と飽和溶解度以上の炭素が折出し
た炭化珪素(SiC) がある。この炭素の除去方法と
して、特開昭64−56312号公報や特開平1−17
6211 号公報等に示されるように、SiC に関し
てはろ過,沈降分離が有効な方法であることが分かって
いるが、Cに関しては除去することが困難であった。一
方、Cの除去に関しては溶融けい素に減圧または酸素供
給を行って、C+O→CO↑の反応を促進させ、COガ
スとして除去する方法が有効であることが分かっている
が、比較的手間、時間のかかる方法である。Carbon exists in silicon in two forms: dissolved carbon (C) dissolved in silicon and silicon carbide (SiC) in which carbon with a saturated solubility or higher is precipitated. As a method for removing this carbon, Japanese Patent Application Laid-Open No. 64-56312 and Japanese Patent Application Laid-Open No. 1-17
As shown in Publication No. 6211, etc., filtration and sedimentation separation are known to be effective methods for SiC, but it has been difficult to remove C. On the other hand, regarding the removal of C, it has been found that the method of reducing pressure or supplying oxygen to molten silicon to promote the reaction of C+O→CO↑ and removing it as CO gas is effective, but it is relatively laborious and This is a time-consuming method.
【0004】0004
【発明が解決しようとする課題】このように従来技術に
おいては、まずろ過,沈降分離などによりSiC の除
去を行い、続いて、減圧,酸素供給によりCの除去を行
う方法を採用していたので、時間がかかりすぎていた。
また、ろ過,沈降分離の後、一方向凝固を直接行ない炭
素濃度を下げる方法もあるが、歩留りが低く、高コスト
であり、有利な方法とは言えない。[Problems to be Solved by the Invention] As described above, in the prior art, a method was adopted in which SiC was first removed by filtration, sedimentation, etc., and then C was removed by depressurization and oxygen supply. , it was taking too long. There is also a method of directly performing unidirectional coagulation after filtration and sedimentation separation to lower the carbon concentration, but this method has a low yield and high cost, and cannot be said to be an advantageous method.
【0005】そこで、本発明は、比較的容易に短時間で
、しかも低コストで炭素を含む金属シリコンを脱炭精製
する方法を提供することを課題とするものである。SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a method for decarburizing metallic silicon containing carbon relatively easily, in a short time, and at low cost.
【0006】[0006]
【課題を解決するための手段】すなわち、本発明は、底
部に貫通孔を有し、珪素化合物を主成分とする物質から
構成されたろ過容器に、珪素化合物を主成分とする物質
をフィルター材として充填し、該フィルター材をシリコ
ンの融点以上に加熱保持した状態で溶融シリコンを給湯
すると共に該ろ過容器底部より酸素含有気体を供給する
ことを特徴とする金属シリコンの脱炭方法である。[Means for Solving the Problems] That is, the present invention has a through hole in the bottom and is provided with a filter material containing a substance mainly composed of a silicon compound in a filtration container made of a substance mainly composed of a silicon compound. This is a method for decarburizing metallic silicon, characterized in that molten silicon is supplied while the filter material is heated and held above the melting point of silicon, and an oxygen-containing gas is supplied from the bottom of the filtration container.
【0007】[0007]
【作用】本発明では石英,炭化けい素,窒化けい素など
、珪素,酸素,窒素,炭素を主成分とする物質から構成
された容器およびフィルターとして作用する充填材層を
シリコンの融点以上、例えば1410〜1650℃に保
持し、その充填材層に溶融シリコンを通すと同時に、充
填材層に酸素を含む気体を容器底部より向流あるいは並
流して流すので、SiC のろ過と同時に、C+O→C
O↑の反応が生じ、シリコン中の炭素を除去することが
できる。[Operation] In the present invention, a container made of a substance mainly composed of silicon, oxygen, nitrogen, and carbon, such as quartz, silicon carbide, and silicon nitride, and a filler layer that acts as a filter are heated to a temperature higher than the melting point of silicon, for example. The temperature is maintained at 1,410 to 1,650°C, and molten silicon is passed through the filling layer.At the same time, gas containing oxygen is flowed through the filling layer from the bottom of the container in countercurrent or cocurrent.As a result, at the same time as SiC filtration, C+O→C
A reaction O↑ occurs, and carbon in silicon can be removed.
【0008】けい素を充填材層を通過させてSiC を
ろ過するためにはけい素が溶融状態であることが必要で
あり、けい素の融点である1410℃以上に加熱保持す
る必要がある。一方、C+O→CO↑の反応を促進させ
るためには高温の方が有利であるが、しかし充填材およ
びろ過容器が耐えられる温度限界があるため、通常は1
650℃以下の温度で処理することが望ましい。仮に1
650℃超では充填材層の寿命を短くする。[0008] In order to filter SiC by passing the silicon through the filler layer, the silicon must be in a molten state, and it is necessary to heat and maintain the silicon at a temperature of 1410° C. or higher, which is the melting point of silicon. On the other hand, high temperatures are more advantageous in order to promote the C+O→CO↑ reaction, but there is a temperature limit that the packing material and filtration container can withstand;
It is desirable to process at a temperature of 650°C or less. If 1
If the temperature exceeds 650°C, the life of the filler layer will be shortened.
【0009】充填材の素材はシリコンを汚染しない物質
または汚染しても容易に除去できる元素を主成分とする
ものが望ましい。充填材の形状は、球,管,粒,繊維な
どがあるが、他の形状でも溶融けい素と気体の通過を著
しく防げないものなら使用できる。気体および溶融けい
素の通りをよくするためには、5mm以上の径を持つも
のが望ましい。また充填材層の代りに板に穴を開けたも
のを重さねたものも使用できる。[0009] The material of the filler is preferably one whose main component is a substance that does not contaminate silicon or an element that can be easily removed even if it contaminates silicon. The shape of the filler includes spheres, tubes, particles, fibers, etc., but other shapes can be used as long as they do not significantly prevent the passage of molten silicon and gas. In order to improve the passage of gas and molten silicon, it is desirable to have a diameter of 5 mm or more. Also, instead of a filler layer, a stack of plates with holes drilled therein can be used.
【0010】充填材層でけい素と接触させる気体として
は、O2,Ar−O2,H2O ,大気等、酸素を含む
ものなら使用可能であり、けい素を汚染しないために高
純度のものが望ましい。酸素含有気体の供給は図1に示
すように、容器底部の孔より吹込むことが望ましいが、
容器底部近傍の容器壁に気体吹込み孔を設けておき、フ
ィルター材に水平に吹込んでもよい。[0010] As the gas to be brought into contact with silicon in the filler layer, any gas containing oxygen such as O2, Ar-O2, H2O, air, etc. can be used, and a high purity gas is desirable in order not to contaminate silicon. . It is desirable to supply the oxygen-containing gas through the hole at the bottom of the container, as shown in Figure 1.
A gas blowing hole may be provided in the container wall near the bottom of the container, and the gas may be blown horizontally into the filter material.
【0011】また容器および充填材層の成分に酸素があ
り、けい素に充分酸素が供給される場合は、酸素を含ま
ない気体を供給してもよい。本方法は、大気圧下で行う
が、脱炭反応を進めるためには雰囲気のCO分圧を低く
酸素分圧を高くする方が有利であり、減圧下で行うとさ
らに良い結果が得られる。COガスをシリコンから抜く
のにやや不利になるが多少の加圧をしても十分脱炭反応
は進む。[0011] Furthermore, if oxygen is a component of the container and the filler layer and sufficient oxygen is supplied to silicon, an oxygen-free gas may be supplied. This method is carried out under atmospheric pressure, but in order to advance the decarburization reaction, it is advantageous to lower the CO partial pressure and increase the oxygen partial pressure in the atmosphere, and even better results can be obtained when carried out under reduced pressure. Although this is somewhat disadvantageous in extracting CO gas from silicon, the decarburization reaction proceeds sufficiently even if a certain amount of pressure is applied.
【0012】けい素中に含まれるSiC の除去に関し
ては充填材層表層で殆んど除去され、充填材層が表面ろ
過のフィルター材として作用する。[0012] Regarding the removal of SiC contained in silicon, most of it is removed at the surface layer of the filler layer, and the filler layer acts as a filter material for surface filtration.
【0013】[0013]
【実施例】実施例1
内径 100mmの石英容器にフィルター材として、粒
径10mmの石英粒を厚さ 200mmに充填し、10
%H2O −90%Arを図1に示すようにけい素と向
流になるように下から上に10l/minで通し、15
00℃に保持した。[Example] Example 1 A quartz container with an inner diameter of 100 mm was filled with quartz grains with a particle diameter of 10 mm as a filter material to a thickness of 200 mm.
%H2O-90%Ar was passed from bottom to top at 10 l/min in countercurrent to silicon as shown in Figure 1.
The temperature was maintained at 00°C.
【0014】この充填材層上に炭素濃度平均2000p
pmwのけい素を10分間に、20kg,10kg,5
kg,2.5kg ずつそれぞれ通したところ、平均炭
素濃度はそれぞれ50ppmw,40ppmw,30p
pmw,20ppmwまで下がった。
比較例1
実施例1と同じ容器および充填材層を用い同じ温度で気
体を通さず、シリコンを10分間に、20kg,10k
g,5kg,2.5kg 処理したところ、70,70
,70,60ppmwまでしか炭素濃度は下らなかった
。[0014] The average carbon concentration on this filler layer is 2000p.
pmw of silicon in 10 minutes, 20kg, 10kg, 5
When passing through 2.5 kg and 2.5 kg, the average carbon concentration was 50 ppmw, 40 ppmw, and 30 p, respectively.
pmw, decreased to 20ppmw. Comparative Example 1 Using the same container and filler layer as in Example 1, 20 kg, 10 kg of silicon was heated for 10 minutes at the same temperature without passing gas.
g, 5kg, 2.5kg When processed, 70,70
, 70, the carbon concentration decreased only to 60 ppmw.
【0015】このように従来のろ過処理と同じような処
理で容易に従来と同程度に低い炭素濃度のけい素を得る
ことができる。[0015] As described above, silicon having a carbon concentration as low as that in the conventional method can be easily obtained by a treatment similar to the conventional filtration treatment.
【0016】[0016]
【発明の効果】この発明により、シリコンの脱炭を容易
に行うことができ、より低コストでシリコンが製造する
ことができるようになった。[Effects of the Invention] According to the present invention, silicon can be easily decarburized and silicon can be produced at a lower cost.
【図1】本発明に用いるろ過容器の1例を示す断面図で
ある。FIG. 1 is a sectional view showing one example of a filtration container used in the present invention.
1 ろ過容器 2 溶融シリコン 3 充填材層 4 容器底部貫通孔 5 酸素含有気体 6 ヒータ 1. Filtration container 2 Molten silicon 3 Filler layer 4 Container bottom through hole 5 Oxygen-containing gas 6 Heater
Claims (1)
成分とする物質から構成されたろ過容器に、珪素化合物
を主成分とする物質をフィルター材として充填し、該フ
ィルター材をシリコンの融点以上に加熱保持した状態で
溶融シリコンを給湯すると共に該ろ過容器底部より酸素
含有気体を供給することを特徴とする金属シリコンの脱
炭方法。Claim 1: A filtration container having a through hole in the bottom and made of a substance containing a silicon compound as its main component is filled with a substance containing a silicon compound as a filter material, and the filter material is filled with silicone. 1. A method for decarburizing metallic silicon, which comprises supplying molten silicon while keeping it heated above its melting point, and supplying an oxygen-containing gas from the bottom of the filtration vessel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40851790A JPH04231316A (en) | 1990-12-27 | 1990-12-27 | Decarburization method of metal silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40851790A JPH04231316A (en) | 1990-12-27 | 1990-12-27 | Decarburization method of metal silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04231316A true JPH04231316A (en) | 1992-08-20 |
Family
ID=18517959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP40851790A Pending JPH04231316A (en) | 1990-12-27 | 1990-12-27 | Decarburization method of metal silicon |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04231316A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010001093A1 (en) | 2010-01-21 | 2011-07-28 | Evonik Degussa GmbH, 45128 | Process for the coarse decarburization of a silicon melt |
DE102010001094A1 (en) | 2010-01-21 | 2011-07-28 | Evonik Degussa GmbH, 45128 | Method for decarburizing a silicon melt |
-
1990
- 1990-12-27 JP JP40851790A patent/JPH04231316A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010001093A1 (en) | 2010-01-21 | 2011-07-28 | Evonik Degussa GmbH, 45128 | Process for the coarse decarburization of a silicon melt |
DE102010001094A1 (en) | 2010-01-21 | 2011-07-28 | Evonik Degussa GmbH, 45128 | Method for decarburizing a silicon melt |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4837376A (en) | Process for refining silicon and silicon purified thereby | |
US6319550B1 (en) | Method and apparatus for treating silica granules using porous graphite crucible | |
JP2006188412A (en) | Process for treating synthetic silica powder and synthetic silica powder treated by the same | |
JPH08268727A (en) | Fused quartz crucible and its production | |
US4676968A (en) | Melt consolidation of silicon powder | |
SE1150277A1 (en) | Process and system for producing silicon and silicon carbide | |
JPH0136981B2 (en) | ||
US2535659A (en) | Amorphous silica and process for making same | |
JPH04231316A (en) | Decarburization method of metal silicon | |
JPH0379288B2 (en) | ||
JPH0640713A (en) | Method for dehydrating quartz powder | |
JPH05330815A (en) | Method for refining silicon | |
JPS6350308A (en) | Method of removing carbon from fused silicon | |
US20110120365A1 (en) | Process for removal of contaminants from a melt of non-ferrous metals and apparatus for growing high purity silicon crystals | |
JPS6197187A (en) | Device for recovering inert gas for pulling device of single crystal | |
RU2635157C1 (en) | Method of technical silicon cleaning | |
JPH02267110A (en) | Lance for decarburizing metal silicon and decarburization | |
JPH05139713A (en) | Method and device for refining silicon | |
JP3123696B2 (en) | Method for manufacturing quartz glass crucible | |
JP2651611B2 (en) | Hydride gas purification method | |
JPS63310711A (en) | Method for decarburizing silicon | |
JPH05147918A (en) | Refining method for metal silicon | |
JPH09301726A (en) | Production of quarts glass tube | |
JPH05246708A (en) | Production for powdery dry gel, silica glass powder and silica glass fusion molded goods | |
JPH01230975A (en) | Ar gas recovery method |