JPH04223390A - Thick film circuit forming device - Google Patents

Thick film circuit forming device

Info

Publication number
JPH04223390A
JPH04223390A JP40649690A JP40649690A JPH04223390A JP H04223390 A JPH04223390 A JP H04223390A JP 40649690 A JP40649690 A JP 40649690A JP 40649690 A JP40649690 A JP 40649690A JP H04223390 A JPH04223390 A JP H04223390A
Authority
JP
Japan
Prior art keywords
thick film
nozzle
substrate
film circuit
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP40649690A
Other languages
Japanese (ja)
Other versions
JP3149439B2 (en
Inventor
Makoto Imanishi
今西 誠
Akira Kabeshita
朗 壁下
Takeo Ando
安藤 健男
Satoshi Shida
智 仕田
Hiroaki Fujiwara
宏章 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP40649690A priority Critical patent/JP3149439B2/en
Publication of JPH04223390A publication Critical patent/JPH04223390A/en
Application granted granted Critical
Publication of JP3149439B2 publication Critical patent/JP3149439B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To enable a thick film circuit forming device where an electronic circuit is formed through drawing to accurately form a fine circuit pattern always by a method wherein a problem that a distance between a drawing head and the surface of a drawing object can not be kept constant when a thick film circuit or the like has been already formed on a board is solved, and the measurement error of a measuring sensor is corrected by a control. CONSTITUTION:A nozzle 1 which discharges a thick film paste 3 onto a board 2, a board level measuring sensor 4 which measures the distance between the nozzle 1 and the board 2, a head 5 which controls the nozzle 1 in height, and a control 7 which corrects the head 5 in quantity of drive are provided.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、電子回路等を構成する
厚膜回路の形成装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for forming thick film circuits constituting electronic circuits and the like.

【0002】0002

【従来の技術】従来の描画方式を用いた厚膜回路の形成
装置を図7にもとづき説明する。図において、1はノズ
ルで、基板2上に厚膜ペースト3を吐出するものである
。4は基板高さ測定センサで、描画前に描画軌跡上の基
板2よりの高さを測定する。5はノズル1の高さを制御
するヘッド部であり、基板高さ測定センサ4で測定した
値により、ノズル1と基板2との間隔を保持するように
ヘッド部5を駆動させながら、ノズル1が基板2上を厚
膜ペースト3を吐出しながら移動し、描画する。このよ
うに従来の厚膜回路はペースト描画工程,乾燥工程,燃
成工程を数度繰り返し、その後部品の実装工程等を経て
、形成されるのが一般的である。
2. Description of the Related Art A thick film circuit forming apparatus using a conventional drawing method will be described with reference to FIG. In the figure, 1 is a nozzle that discharges a thick film paste 3 onto a substrate 2. A substrate height measuring sensor 4 measures the height above the substrate 2 on the drawing trajectory before drawing. Reference numeral 5 denotes a head unit that controls the height of the nozzle 1. The head unit 5 controls the height of the nozzle 1 while driving the head unit 5 to maintain the distance between the nozzle 1 and the substrate 2 based on the value measured by the substrate height measurement sensor 4. moves on the substrate 2 while discharging the thick film paste 3 to draw. As described above, conventional thick film circuits are generally formed by repeating a paste drawing process, a drying process, and a combustion process several times, and then going through a component mounting process and the like.

【0003】0003

【発明が解決しようとする課題】しかしながら上記従来
の装置では、図7に示す基板高さ測定センサ4に三角測
量方式を採用した半導体レーザ光を用いているため、そ
の原理的な理由から図8に示すように厚膜回路等の被測
定物6によっては半導体レーザ光7のしみこみまたはも
ぐりこみが起こり、本来の反射光路8(図8中に示す一
点鎖線)よりずれてしまうため、被測定物(以下厚膜回
路ともいう)6の材質,表面粗さまたは色等によって誤
測定することになり、正確な測定ができず、基板2とノ
ズル1との間隔を一定に保持できないという課題を有し
ていた。
However, in the above-mentioned conventional apparatus, since a semiconductor laser beam employing a triangulation method is used for the substrate height measurement sensor 4 shown in FIG. As shown in FIG. 8, the semiconductor laser beam 7 may penetrate or sink into the object 6 to be measured, such as a thick film circuit, and it will deviate from the original reflected optical path 8 (dotted chain line shown in FIG. 8). (hereinafter also referred to as a thick film circuit) 6, the material, surface roughness, color, etc. may lead to erroneous measurements, making it impossible to make accurate measurements and making it impossible to maintain a constant distance between the substrate 2 and the nozzle 1. was.

【0004】本発明は上記課題を解決するものであり、
基板高さ測定センサが誤動作してもその値を補正し、基
板とノズルとの間隔を一定に保持することにより、描画
された厚膜ペーストの線幅および厚膜のばらつきが小さ
く、精度のよい微細な回路パターンを形成することが可
能となり、電子回路の品質を大幅に向上させることがで
きる厚膜回路の形成装置を提供することを目的とするも
のである。
[0004] The present invention solves the above problems,
Even if the substrate height measurement sensor malfunctions, the value is corrected and the distance between the substrate and nozzle is maintained constant, resulting in small variations in the line width and thickness of the drawn thick film paste and high precision. It is an object of the present invention to provide a thick film circuit forming apparatus that can form fine circuit patterns and significantly improve the quality of electronic circuits.

【0005】[0005]

【課題を解決するための手段】本発明は上記目的を達成
するために、基板上に厚膜ペーストを吐出するノズルと
、そのノズルの基板よりの高さをノズルに先行して測定
する基板高さ測定センサと、そのセンサの値によりノズ
ルの高さを制御するヘッド部と、そのヘッド部の駆動量
を補正する制御部とを備えてなるものである。
[Means for Solving the Problems] In order to achieve the above object, the present invention provides a nozzle for discharging a thick film paste onto a substrate, and a substrate height that measures the height of the nozzle from the substrate prior to the nozzle. The nozzle height measurement sensor includes a head section that controls the height of the nozzle based on the sensor value, and a control section that corrects the drive amount of the head section.

【0006】[0006]

【作用】したがって本発明の構成によれば、基板高さ測
定センサが誤動作してもその値は補正され、基板とノズ
ルとの間隔が一定値に保持されることにより、描画され
た厚膜ペーストの線幅および膜厚のばらつきが小さく、
精度のよい微細な回路パターンを形成することが可能と
なり、電子回路の品質を大幅に向上させることができる
[Operation] Therefore, according to the structure of the present invention, even if the substrate height measurement sensor malfunctions, its value is corrected, and the distance between the substrate and the nozzle is maintained at a constant value, so that thick film paste The variation in line width and film thickness is small,
It becomes possible to form fine circuit patterns with high precision, and the quality of electronic circuits can be significantly improved.

【0007】[0007]

【実施例】以下、本発明の一実施例について図1〜図6
とともに図7,図8と同一部分については同一番号を付
して詳しい説明を省略し、相違する点について説明する
[Example] An example of the present invention will be described below with reference to FIGS. 1 to 6.
Also, the same parts as those in FIGS. 7 and 8 are given the same reference numerals, detailed explanations are omitted, and differences will be explained.

【0008】(実施例1)図1は本発明の第1の実施例
における描画方式による厚膜回路の形成装置の構成を示
すものであり、図において、7はヘッド部5の駆動量を
補正することのできる制御部である。基板高さ測定セン
サ4の測定値の増減量と同じ量だけノズル1が上下12
駆動されて、ノズル1と基板2との間隔を保持している
。その際、既に描画形成された厚膜回路6のように、基
板2と材質等が異なる物質を測定すると制御部7により
ヘッド部5を通じてノズル1の駆動量を補正させ、図に
示すように適正な値Xを保持しながらノズル1は厚膜ペ
ースト3を、例えば圧力によってノズル1の先端部より
吐出し、基板2または厚膜回路6の上に描画させること
ができる。
(Embodiment 1) FIG. 1 shows the configuration of a thick film circuit forming apparatus using a drawing method in a first embodiment of the present invention. This is a control unit that can The nozzle 1 moves up and down 12 by the same amount as the increase/decrease in the measured value of the substrate height measurement sensor 4.
It is driven to maintain the distance between the nozzle 1 and the substrate 2. At this time, when measuring a substance made of a material different from that of the substrate 2, such as a thick film circuit 6 that has already been formed by drawing, the control unit 7 corrects the drive amount of the nozzle 1 through the head unit 5, so that the amount of drive of the nozzle 1 is corrected as shown in the figure. While maintaining the value X, the nozzle 1 can discharge the thick film paste 3 from the tip of the nozzle 1 using pressure, for example, and draw it on the substrate 2 or the thick film circuit 6.

【0009】制御部7は基板高さ測定センサ4の誤動作
量を補正する機能を有するものであり、制御方式として
は、基板高さ測定センサ4の測定値と同時に得られる受
光量を用いる。その受光量は、すでに描画された厚膜回
路6など、材質,表面粗さ等の異なる物質によって決ま
っているので、あらかじめ被測定物6の受光量データを
制御部に入力しておくことにより被測定物6の測定をす
ることが可能となる。さらに、被測定物6と基板2との
相違による測定誤差量を、それぞれの被測定物6に対し
てあらかじめ測定しておき、データとして制御部7に入
力しておく。そうすれば、受光量から被測定物6の材質
,表面粗さを判定し、被測定物6による誤差量を入力デ
ータから読み出し、補正量としてヘッド部5の駆動量を
補正し、図1に示すように、基板2または厚膜回路6と
ノズル1との間隔Xは一定値に保たれることになる。
The control unit 7 has a function of correcting the amount of malfunction of the substrate height measurement sensor 4, and uses the amount of received light obtained simultaneously with the measurement value of the substrate height measurement sensor 4 as a control method. The amount of light received is determined by materials with different materials, surface roughness, etc., such as the already drawn thick film circuit 6, so by inputting the data of the amount of light received from the object 6 into the control section in advance, It becomes possible to measure the measurement object 6. Further, the amount of measurement error due to the difference between the object to be measured 6 and the substrate 2 is measured in advance for each object to be measured 6, and inputted as data to the control section 7. Then, the material and surface roughness of the object to be measured 6 are determined from the amount of light received, the amount of error due to the object to be measured 6 is read out from the input data, and the amount of drive of the head unit 5 is corrected as the correction amount. As shown, the distance X between the substrate 2 or the thick film circuit 6 and the nozzle 1 is maintained at a constant value.

【0010】基板高さ測定センサ4としては、レーザ光
により距離測定装置(例えばアンリツ(株)製光マイク
ロ(品番M532A,可測範囲±800〔μm〕))が
用いられる。厚膜ペースト3としては、導体または抵抗
体等、各種の厚膜ペーストが使用可能である(導体では
、例えばデュポン社製,Ag/Pdペースト、#613
4)。基板2としては、セラミック基板またはガラスエ
ポキシ基板等が用いられる。
As the substrate height measuring sensor 4, a distance measuring device using a laser beam (for example, Hikari Micro manufactured by Anritsu Corporation (product number M532A, measurable range: ±800 [μm])) is used. As the thick film paste 3, various thick film pastes such as conductors or resistors can be used (for conductors, for example, Ag/Pd paste, #613 manufactured by DuPont Co., Ltd.
4). As the substrate 2, a ceramic substrate, a glass epoxy substrate, or the like is used.

【0011】このように上記実施例によれば、基板高さ
測定センサ4が誤動作してもその値は制御部7によって
補正されるため、基板2とノズル1との間隔は常に一定
値に保持され、描画される厚膜ペースト3の線幅、膜厚
はばらつきが小さく、したがって精度のよい微細な回路
パターンを形成することが可能となり、電子回路の品質
を大幅に向上させることができる。
According to the embodiment described above, even if the substrate height measurement sensor 4 malfunctions, its value is corrected by the control section 7, so that the distance between the substrate 2 and the nozzle 1 is always maintained at a constant value. The line width and film thickness of the thick film paste 3 drawn are small in variation, and therefore it is possible to form fine circuit patterns with high precision, and the quality of electronic circuits can be greatly improved.

【0012】(実施例2)図2は本発明の第2の実施例
における描画装置の構成を示すものであり、図において
、第1の実施例と異なる点は、制御部7の制御データを
、CAD/CAMシステム8から得ている点であり、こ
のCAD/CAMシステム8には、あらかじめ被測定物
6の描画軌跡を入力してある。したがってこのCAD/
CAMシステム8はその中に、描画軌跡位置または被測
定物の種類等のデータを持つことができるので、実施例
1と同様、被測定物6と基板2との測定誤差量を、それ
ぞれの被測定物6に対してあらかじめ測定しておき、デ
ータとして入力しておくことにより、ヘッド部5側から
送られるノズル1の現在位置のデータを照合して、その
位置に見合う補正量だけヘッド部5を補正し、駆動する
ことにより、図2に示すように、基板2とノズル1との
間隔Xは一定値に保持されることになる。
(Embodiment 2) FIG. 2 shows the configuration of a drawing apparatus in a second embodiment of the present invention. In the figure, the difference from the first embodiment is that the control data of the control section 7 , which is obtained from the CAD/CAM system 8, into which the drawing locus of the object to be measured 6 is input in advance. Therefore, this CAD/
Since the CAM system 8 can have data such as the drawing locus position or the type of object to be measured, the amount of measurement error between the object to be measured 6 and the substrate 2 can be calculated for each object, as in the first embodiment. By measuring the object 6 in advance and inputting it as data, the data on the current position of the nozzle 1 sent from the head section 5 side can be checked, and the head section 5 can be adjusted by the amount of correction commensurate with the position. By correcting and driving, the distance X between the substrate 2 and the nozzle 1 is maintained at a constant value, as shown in FIG.

【0013】次に本実施例において用いられるCAD/
CAMシステムの機能について説明すると、例えば図3
に示すような描画軌跡A→B→C→D(既に描画した厚
膜回路6の上をのりこえる)の場合、従来のNCプログ
ラムでは、描画開始点(A点)と終了点(D点)の2点
の座標で制御されるため、途中のB点,C点では描画条
件(例えばノズル1と基板2や厚膜回路6とのギャップ
量)を変更することができないが、本実施例におけるC
AD/CAMシステムではB点,C点を算出し、描画条
件を変更することが可能となる上、補正データも描画条
件の1つとして制御できるので、制御方式が非常に簡単
になる。
Next, the CAD/
To explain the functions of the CAM system, for example, Figure 3
In the case of the drawing trajectory A→B→C→D (crossing over the already drawn thick film circuit 6) as shown in the figure, in the conventional NC program, the drawing start point (point A) and end point (point D) are Since the control is based on the coordinates of two points, it is not possible to change the drawing conditions (for example, the gap between the nozzle 1 and the substrate 2 or the thick film circuit 6) at points B and C in the middle.
In the AD/CAM system, it is possible to calculate points B and C and change the drawing conditions, and correction data can also be controlled as one of the drawing conditions, so the control method becomes very simple.

【0014】また図4に示すように、厚膜回路6の端部
の場合、基板高さ測定センサ4での材質判定が中途半端
で、センシングが安定せず、ノズル1がすでに描画され
た厚膜回路6に接触する可能性があるが、本実施例にお
けるCAD/CAMシステムでは、ノズル1の先端の径
を前もって入力しておくことができるため、ノズル1の
先端と厚膜回路6が重なった時は、図に示すように、す
でに描画された厚膜回路6の厚膜tの分だけ、一定量ノ
ズル1を上方へ逃がす方向に制御することができる。
Furthermore, as shown in FIG. 4, in the case of the end of the thick film circuit 6, the material determination by the substrate height measurement sensor 4 is incomplete, the sensing is not stable, and the nozzle 1 However, in the CAD/CAM system of this embodiment, the diameter of the tip of the nozzle 1 can be input in advance, so the tip of the nozzle 1 and the thick film circuit 6 may overlap. In this case, as shown in the figure, the nozzle 1 can be controlled to escape upward by a certain amount by the thickness t of the thick film circuit 6 that has already been drawn.

【0015】さらに本実施例におけるCAD/CAMシ
ステムによる厚膜回路6に関するデータの保持内容とし
ては、図5に示すように、設計データから送られた描画
範囲AおよびBに対応した材質種類データがあるが、そ
の他データの保持内容としては図6に示すように、基板
2の全体の微小分割し、各分割単位毎に材質の種類等に
ついてのデータを持つことも可能である。
Furthermore, as shown in FIG. 5, the data held by the CAD/CAM system regarding the thick film circuit 6 in this embodiment includes material type data corresponding to the drawing ranges A and B sent from the design data. However, as shown in FIG. 6, other data can be held by dividing the entire substrate 2 into small parts and having data on the type of material, etc. for each division unit.

【0016】このように上記実施例によれば、基板高さ
測定センサ4が誤動作してもその値は制御部7に連結す
るCAD/CAMシステム8による補正量で補正される
ため、基板2とノズル1との間隔は常に一定値に保持さ
れ、描画される厚膜ペースト3の線幅,膜厚のばらつき
が小さく、精度のよい微細な回路パターンを形成するこ
とが可能となり、電子回路の品質を大幅に向上させるこ
とができる。
As described above, according to the above embodiment, even if the substrate height measurement sensor 4 malfunctions, its value is corrected by the correction amount by the CAD/CAM system 8 connected to the control section 7. The distance between the nozzle 1 and the nozzle 1 is always maintained at a constant value, and the line width and film thickness of the drawn thick film paste 3 have small variations, making it possible to form fine circuit patterns with high precision and improving the quality of electronic circuits. can be significantly improved.

【0017】[0017]

【発明の効果】本発明は上記実施例より明らかなように
して、基板上に厚膜ペーストを吐出するノズルと、その
ノズルの基板よりの高さをノズルに先行して測定する基
板高さ測定センサと、そのセンサの値によりノズルの高
さを制御するヘッド部と、そのヘッド部の駆動量を補正
する制御部とを備えているので、基板高さの測定センサ
が誤動作してもその値は補正され、基板とノズルとの間
隔は一定値に保持されることとなり、描画された厚膜ペ
ーストの線幅,膜厚のばらつきが小さく、したがって精
度のよい微細な回路パターンを形成することが可能とな
り、したがって電子回路の品質を大幅に向上させること
ができる。
Effects of the Invention As is clear from the above embodiments, the present invention provides a nozzle for discharging thick film paste onto a substrate, and a substrate height measurement method for measuring the height of the nozzle from the substrate prior to the nozzle. Since it is equipped with a sensor, a head section that controls the nozzle height based on the value of the sensor, and a control section that corrects the amount of drive of the head section, even if the substrate height measurement sensor malfunctions, the value will be corrected. is corrected, and the distance between the substrate and the nozzle is maintained at a constant value, and the variation in line width and film thickness of the drawn thick film paste is small, making it possible to form fine circuit patterns with high precision. This makes it possible to significantly improve the quality of electronic circuits.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の第1の実施例における厚膜回路の形成
装置の構成を示す部分断面側面図
FIG. 1 is a partially sectional side view showing the configuration of a thick film circuit forming apparatus in a first embodiment of the present invention.

【図2】本発明の第2の実施例における厚膜回路の形成
装置の構成を示す部分断面側面図
FIG. 2 is a partially sectional side view showing the configuration of a thick film circuit forming apparatus according to a second embodiment of the present invention.

【図3】本発明の実施例において形成装置のノズルの描
画軌跡と厚膜回路との位置関係を示す平面図
FIG. 3 is a plan view showing the positional relationship between the drawing locus of the nozzle of the forming apparatus and the thick film circuit in the embodiment of the present invention.

【図4】本
発明の実施例においてノズルの移動の状況を説明するた
めの図
FIG. 4 is a diagram for explaining the situation of nozzle movement in the embodiment of the present invention.

【図5】本発明の実施例における形成装置のCAD/C
AMシステムが保持する描画範囲等のデータを示す概念
FIG. 5: CAD/C of a forming apparatus in an embodiment of the present invention
Conceptual diagram showing data such as drawing range held by the AM system

【図6】同じく本発明の実施例におけるCAD/CAM
システムが保持する描画範囲等のデータを示す概念図
FIG. 6: CAD/CAM in the embodiment of the present invention
Conceptual diagram showing data such as drawing range held by the system


図7】従来の厚膜回路の形成装置の構成を示す部分断面
側面図
[
FIG. 7: Partial cross-sectional side view showing the configuration of a conventional thick film circuit forming apparatus

【図8】従来の形成装置における誤測定の原因を示す基
板と厚膜回路の要部断面概念図
[Figure 8] A cross-sectional conceptual diagram of the main parts of a substrate and thick film circuit, showing the causes of measurement errors in conventional forming equipment.

【符号の説明】[Explanation of symbols]

1    ノズル 2    基板 3    厚膜ペースト 4    基板高さ測定センサ 5    ヘッド部 7    制御部 8    CAD/CAMシステム 1 Nozzle 2    Substrate 3 Thick film paste 4 Board height measurement sensor 5 Head part 7 Control section 8 CAD/CAM system

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  基板上に厚膜ペーストを吐出するノズ
ルと、そのノズルの基板よりの高さをノズルに先行して
測定する基板高さ測定センサと、そのセンサの値により
ノズルの高さを制御するヘッド部と、そのヘッド部の駆
動量を補正する制御部とを備えた厚膜回路の形成装置。
1. A nozzle that discharges a thick film paste onto a substrate, a substrate height measurement sensor that measures the height of the nozzle from the substrate prior to the nozzle, and a height of the nozzle that is determined based on the value of the sensor. A thick film circuit forming apparatus includes a head section for controlling and a control section for correcting the amount of drive of the head section.
【請求項2】  制御部が、基板高さ測定センサの被測
定物の材質等による受光量の変化を利用して被測定物を
判定し、ヘッド部の駆動量を補正することを特徴とする
請求項1記載の厚膜回路の形成装置。
2. The control unit determines the object to be measured using changes in the amount of light received by the substrate height measurement sensor depending on the material of the object to be measured, and corrects the amount of drive of the head unit. The thick film circuit forming apparatus according to claim 1.
【請求項3】  制御部が、あらかじめ被測定物の描画
軌跡を入力してあるCAD/CAMシステムより描画個
所毎に被測定物に応じた補正値を与えることにより、ヘ
ッド部の駆動量を補正することを特徴とする請求項1記
載の厚膜回路の形成装置。
3. The control unit corrects the drive amount of the head unit by giving a correction value according to the object to be measured for each drawing point from a CAD/CAM system into which the drawing locus of the object to be measured is input in advance. 2. The thick film circuit forming apparatus according to claim 1.
JP40649690A 1990-12-26 1990-12-26 Apparatus and method for forming thick film circuit Expired - Fee Related JP3149439B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP40649690A JP3149439B2 (en) 1990-12-26 1990-12-26 Apparatus and method for forming thick film circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP40649690A JP3149439B2 (en) 1990-12-26 1990-12-26 Apparatus and method for forming thick film circuit

Publications (2)

Publication Number Publication Date
JPH04223390A true JPH04223390A (en) 1992-08-13
JP3149439B2 JP3149439B2 (en) 2001-03-26

Family

ID=18516117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP40649690A Expired - Fee Related JP3149439B2 (en) 1990-12-26 1990-12-26 Apparatus and method for forming thick film circuit

Country Status (1)

Country Link
JP (1) JP3149439B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003061357A1 (en) * 2001-12-27 2003-07-24 New System Srl System to form a layering of electronically-interactive material
US7572481B2 (en) 2003-12-22 2009-08-11 Canon Kabushiki Kaisha Pattern forming method and pattern forming apparatus
JP2014504968A (en) * 2010-12-16 2014-02-27 アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ System and method for digitally creating a printing master with a liquid droplet deposition apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003061357A1 (en) * 2001-12-27 2003-07-24 New System Srl System to form a layering of electronically-interactive material
US7757628B2 (en) 2001-12-27 2010-07-20 New System Srl System for depositing electronically interactive liquefied material onto a support surface
US8196544B2 (en) 2001-12-27 2012-06-12 Cesare Fumo System for depositing liquid material onto a substrate
US7572481B2 (en) 2003-12-22 2009-08-11 Canon Kabushiki Kaisha Pattern forming method and pattern forming apparatus
JP2014504968A (en) * 2010-12-16 2014-02-27 アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ System and method for digitally creating a printing master with a liquid droplet deposition apparatus

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