JPH04215057A - Planar type ion electrode - Google Patents
Planar type ion electrodeInfo
- Publication number
- JPH04215057A JPH04215057A JP2410361A JP41036190A JPH04215057A JP H04215057 A JPH04215057 A JP H04215057A JP 2410361 A JP2410361 A JP 2410361A JP 41036190 A JP41036190 A JP 41036190A JP H04215057 A JPH04215057 A JP H04215057A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ion
- support substrate
- planar
- support base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims description 40
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 230000001681 protective effect Effects 0.000 claims description 7
- 229920005597 polymer membrane Polymers 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000005259 measurement Methods 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 229910052709 silver Inorganic materials 0.000 abstract description 8
- 239000004332 silver Substances 0.000 abstract description 8
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002120 nanofilm Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 30
- 239000010408 film Substances 0.000 description 16
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 13
- 229910001414 potassium ion Inorganic materials 0.000 description 13
- 239000010409 thin film Substances 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 229910021607 Silver chloride Inorganic materials 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical class [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 229920000260 silastic Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、イオン測定用の電極に
関し、さらに詳しく言えば、簡単な構造で製造が容易で
あり、低価格で取扱い易いプレーナ型イオン電極に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode for ion measurement, and more particularly to a planar ion electrode that has a simple structure, is easy to manufacture, and is inexpensive and easy to handle.
【0002】0002
【従来の技術】溶液中のイオンを測定するイオン電極は
、液膜型電極、固定膜型電極、ガス感応型電極等に分類
される。これらのイオン電極は、いずれも比較電極と一
対で使用されており、この比較電極は液絡部を有するガ
ラス管に飽和塩化カリウム溶液が満たされた中に、銀/
塩化銀電極が浸されたものが一般に使用されている。
また、これらのイオン電極は固定膜電極の一部を除き、
内部液を有している。2. Description of the Related Art Ion electrodes for measuring ions in a solution are classified into liquid film type electrodes, fixed membrane type electrodes, gas sensitive type electrodes, and the like. Each of these ion electrodes is used in pairs with a reference electrode, which is a glass tube with a liquid junction filled with a saturated potassium chloride solution.
Those immersed in silver chloride electrodes are generally used. In addition, these ion electrodes, except for some fixed membrane electrodes,
It has an internal fluid.
【0003】0003
【発明が解決しようとする課題】従来のイオン電極にあ
っては、内部液を内蔵するものが多く、また比較電極は
被検液との液絡部が不可欠であるため、以下に列挙する
問題点がある。[Problems to be Solved by the Invention] Many conventional ion electrodes contain an internal liquid, and the reference electrode requires a liquid junction with the test liquid, so the problems listed below arise. There is a point.
【0004】比較電極においては、内部液を貯留するス
ペース、内部液の注入口、液絡部など複雑な構造を有し
、量産が不可能で高価であり、小型化が困難である許か
りでなく、内部液が内蔵された形状のため、電極の形態
や使用状態が限定される。また、一般に傷つきやすく破
損しやすいため、慎重な取扱い等、保守管理に細心の注
意が要求される。さらに、ガラス製の電極は電気抵抗が
高く(室温で100乃至1000メグオーム)、イオン
測定には高入力抵抗の直流増幅器が必要で、測定回路は
特別の配慮と工夫が不可欠である。しかも、被検液中の
様々な物質が測定中に感応膜やガス透過膜(液膜型電極
にあっては多孔性膜)に付着し、測定精度の劣化をもた
らす等の欠点があった。[0004] The reference electrode has a complicated structure such as a space for storing the internal liquid, an injection port for the internal liquid, and a liquid junction, making it impossible to mass produce, expensive, and difficult to miniaturize. Since the electrode has a built-in internal liquid, the shape of the electrode and the conditions in which it can be used are limited. In addition, they are generally easily damaged and damaged, so careful handling and careful maintenance are required. Furthermore, glass electrodes have a high electrical resistance (100 to 1000 megohms at room temperature), and ion measurement requires a DC amplifier with high input resistance, requiring special consideration and ingenuity in the measurement circuit. Moreover, various substances in the test liquid adhere to the sensitive membrane or gas permeable membrane (porous membrane in the case of a liquid film type electrode) during measurement, resulting in deterioration of measurement accuracy.
【0005】この発明は、このような問題点に着目して
なされたもので、製造が容易で測定時の応答速度が速く
、測定精度の高い小型で安価なプレーナ型イオン電極を
提供することを目的とする。[0005] The present invention was made in view of these problems, and aims to provide a small and inexpensive planar ion electrode that is easy to manufacture, has a fast response speed during measurement, and has high measurement accuracy. purpose.
【0006】[0006]
【課題を解決するための手段及び作用】この目的を達成
させるために、この発明のプレーナ型イオン電極では、
次のような構成としている。[Means and operations for solving the problem] In order to achieve this object, the planar ion electrode of the present invention has the following features:
The structure is as follows.
【0007】プレーナ型イオン電極は、電極支持基板と
、この電極支持基板上に形成した薄膜状金属の上にイオ
ン選択性高分子膜を被覆してなる作用電極と、内部液を
上記電極支持基板に含浸させると共に、この内部液に接
するように支持基板上に形成された薄膜状の比較電極と
、上記作用電極の感応部及び比較電極の液絡部並びに作
用電極と比較電極の接続部を除いて全体を被覆する絶縁
保護膜とから成ることを特徴としている。A planar ion electrode consists of an electrode support substrate, a working electrode formed by covering a thin metal film formed on the electrode support substrate with an ion-selective polymer membrane, and an internal liquid that is connected to the electrode support substrate. and a thin film-like reference electrode formed on a supporting substrate so as to be in contact with this internal liquid, excluding the sensitive part of the working electrode, the liquid junction part of the reference electrode, and the connection part of the working electrode and the reference electrode. It is characterized by comprising an insulating protective film covering the entire surface.
【0008】このような構成を有するプレーナ型イオン
電極では、作用電極は例えば窒化チタンのような水素イ
オン選択性(pH特性)を有する金属を絶縁性の支持基
板上に帯状の薄膜に形成し、この上にイオン選択性高分
子薄膜が被覆される。そして、比較電極は例えば銀/塩
化銀のような金属を発泡性支持基板上に帯状の薄膜に形
成し、この支持基板に内部液を含浸させて構成している
。In a planar ion electrode having such a configuration, the working electrode is formed by forming a metal having hydrogen ion selectivity (pH characteristics), such as titanium nitride, into a band-shaped thin film on an insulating support substrate. An ion-selective polymer thin film is coated onto this. The comparison electrode is constructed by forming a metal such as silver/silver chloride into a strip-shaped thin film on a foamable support substrate, and impregnating this support substrate with an internal liquid.
【0009】この構造のプレーナ型イオン電極では、構
造及び製造が極めて簡単で、小型化、低価格化、量産化
が実現でき、特性や形状に関し電極間のバラツキが殆ど
ない許かりでなく、低価格のため使い捨てが可能となる
。また、単純な構成であり、支持基板は堅牢であり傷つ
いたり破損することがなく、取扱いも容易である。更に
、支持基板上に膜状の電極を形成しているため、これら
電極を直接コネクタに挿入して使用できる。しかも、測
定時の応答速度が速い許かりでなく、任意の形状に製作
することができ、使用形態も自由度が大きい。The planar ion electrode with this structure has an extremely simple structure and manufacture, and can be made smaller, lower in price, and mass-produced.There is almost no variation between electrodes in terms of characteristics and shape, and the The price makes it disposable. Furthermore, the structure is simple, the supporting substrate is robust and will not be damaged or damaged, and is easy to handle. Furthermore, since the film-like electrodes are formed on the support substrate, these electrodes can be used by directly inserting them into the connector. Moreover, it not only has a fast response speed during measurement, but also can be manufactured into any shape, giving a great degree of freedom in terms of usage.
【0010】0010
【実施例】図1は、この発明に係るプレーナ型イオン電
極の具体的な一実施例を示す斜視図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a perspective view showing a specific embodiment of a planar ion electrode according to the present invention.
【0011】プレーナ型イオン電極は、実施例ではプレ
ーナ型カリウムイオン電極を示しており、絶縁性電極支
持基板1と、この電極支持基板1上に形成された薄膜状
の作用電極2と、薄膜状の比較電極3とから成る。The planar ion electrode is a planar potassium ion electrode in the embodiment, and includes an insulating electrode support substrate 1, a thin film-like working electrode 2 formed on the electrode support substrate 1, and a thin film-like working electrode 2 formed on the electrode support substrate 1. and a comparison electrode 3.
【0012】作用電極2は、図2及び図4で示すように
、電極支持基板21と、この電極支持基板21上に膜状
に形成された電極金属22と、この電極金属22上に形
成された薄膜状のイオン選択性高分子膜23とから成る
。電極支持基板21は、アルミナ・セラミック薄板ある
いは耐熱性ポリイミドフィルムが用いられる。また、こ
の電極支持基板21上に形成される電極金属22は、窒
化チタン(TiN)が膜状に形成される。そして、感応
部2aと接続部2bを除いて、絶縁性保護膜(感光性ポ
リイミドフィルム)4により電極支持基板21を被覆し
ている。更に、この感応部2aの上にイオン選択性高分
子薄膜23が形成してある。イオン選択性高分子薄膜2
3は、ポリ塩化ビニール(PVC)薄膜中に、カリウム
イオン選択性物質としてビス〔(ベンゾ−15−クラウ
ン−5)−4’−メチル〕ピメレイトが含有されている
。As shown in FIGS. 2 and 4, the working electrode 2 includes an electrode support substrate 21, an electrode metal 22 formed in the form of a film on the electrode support substrate 21, and an electrode metal 22 formed on the electrode metal 22. The ion-selective polymer membrane 23 is a thin film. For the electrode support substrate 21, an alumina ceramic thin plate or a heat-resistant polyimide film is used. Further, the electrode metal 22 formed on the electrode support substrate 21 is made of titanium nitride (TiN) in the form of a film. The electrode supporting substrate 21 is covered with an insulating protective film (photosensitive polyimide film) 4 except for the sensitive part 2a and the connecting part 2b. Further, an ion-selective polymer thin film 23 is formed on the sensitive part 2a. Ion selective polymer thin film 2
No. 3 contains bis[(benzo-15-crown-5)-4'-methyl]pimelate as a potassium ion-selective substance in a polyvinyl chloride (PVC) thin film.
【0013】この作用電極2の詳細な製造工程は省略す
るが、量産が可能である。まず、窒化チタン22の形成
は、例えば50mm×50mmの電極支持基板(図示せ
ず)上にメタルマスクを利用して、イオンプレーティン
グやイオンスパッタリング、CVDなどの適切な手段に
より、何本かを一括して帯状の膜状(膜厚約1μm)に
形成し、この上にフォトリソグラフィにより絶縁性保護
膜4を被覆する。つまり、感光性ポリイミドを窒化チタ
ン22が形成されている電極支持基板の上にスピンコー
ティングし、ガラスマスクを覆って露光し、現像、リン
スすることにより感応部2aと接続部2bを除いて被覆
する。更に、適切な手段で一個の作用電極2の大きさに
切断する。次に、感応部2aの部分にイオン選択性高分
子薄膜23を形成する。すなわち、テトラヒドロフラン
3mlにビス〔(ベンゾ−15−クラウン−5)−4’
−メチル〕ビメレイト10mgとポリ塩化ビニール20
0mgを溶解し、o(オルト)−ニトロフェニルオクチ
ルエ−テル250μlを加えた適量液を、感応部2aの
部分に滴下し、60℃で60分間乾燥させて形成する。Although the detailed manufacturing process of this working electrode 2 will be omitted, mass production is possible. First, the titanium nitride 22 is formed by using a metal mask on an electrode support substrate (not shown) of 50 mm x 50 mm, and by an appropriate means such as ion plating, ion sputtering, or CVD. A band-like film (about 1 μm thick) is formed all at once, and an insulating protective film 4 is coated thereon by photolithography. That is, photosensitive polyimide is spin-coated on the electrode support substrate on which the titanium nitride 22 is formed, exposed to light while covering a glass mask, developed, and rinsed to cover the electrodes except for the sensitive parts 2a and the connecting parts 2b. . Furthermore, it is cut into the size of one working electrode 2 by suitable means. Next, an ion-selective polymer thin film 23 is formed on the sensitive part 2a. That is, bis[(benzo-15-crown-5)-4'
- 10 mg of methyl] bimelate and 20 mg of polyvinyl chloride
An appropriate amount of a solution prepared by dissolving 0 mg of the ester and adding 250 μl of o(ortho)-nitrophenyl octyl ether is dropped onto the sensitive area 2a and dried at 60° C. for 60 minutes.
【0014】上記比較電極3は、内部液を前記電極支持
基板1に含浸保持させた点に特徴がある。図3及び図5
で示すように、電極支持基板1は、絶縁性、耐熱性、機
械的強度に優れた材質を使用する。実施例では、多孔性
セラミックス(材質はアルミナ・ムライト、組成はAl
2 03 76%・SiO2 23%、気孔率43%)
を採用している。電極支持基板1には、電極金属として
銀(Ag)31が膜状(膜厚約1μm)に形成されてい
る。更に、電極支持基板1の表裏には、絶縁性保護膜5
が液絡部3aと接続部3bを除いて被覆されており、電
極支持基板1中には内部液が充填されている。The comparative electrode 3 is characterized in that the electrode supporting substrate 1 is impregnated with an internal liquid. Figures 3 and 5
As shown, the electrode support substrate 1 is made of a material with excellent insulation, heat resistance, and mechanical strength. In the example, porous ceramics (material is alumina mullite, composition is Al)
2 03 76%, SiO2 23%, porosity 43%)
is adopted. On the electrode support substrate 1, silver (Ag) 31 is formed as a film (film thickness of about 1 μm) as an electrode metal. Furthermore, an insulating protective film 5 is provided on the front and back surfaces of the electrode support substrate 1.
is coated except for the liquid junction part 3a and the connecting part 3b, and the electrode supporting substrate 1 is filled with an internal liquid.
【0015】この比較電極3の製造方法の概略は、次の
通りである。電極金属である銀31の形成は、例えば5
0mm×50mmの上記多孔性セラミックス上にスパッ
タリングにより、帯状に平行に形成する。膜厚は約1μ
mである。次に、上述したホトリソグラフィの手法によ
り、接続部3b、作用電極2の装着部11、液絡部3a
を除き絶縁性保護膜5を電極支持基板1の表裏に被覆す
る。作用電極2を装着部11に接着剤等の適当な手段で
装着する。更に、ダイシング等によりプレーナ型イオン
電極の一個の大きさに切断し、電極支持基板1の露出し
ている端面12、13、14をエポキシ樹脂6で絶縁モ
ールドする。The outline of the method for manufacturing the comparative electrode 3 is as follows. Formation of silver 31, which is an electrode metal, is carried out by, for example, 5
Parallel strips are formed by sputtering on the above-mentioned porous ceramic having a size of 0 mm x 50 mm. Film thickness is approximately 1μ
It is m. Next, by the photolithography method described above, the connecting part 3b, the mounting part 11 of the working electrode 2, and the liquid junction part 3a are
An insulating protective film 5 is coated on the front and back surfaces of the electrode support substrate 1 except for the electrode supporting substrate 1 . The working electrode 2 is attached to the attachment part 11 using an appropriate means such as adhesive. Furthermore, it is cut into the size of one planar type ion electrode by dicing or the like, and the exposed end surfaces 12, 13, and 14 of the electrode support substrate 1 are insulated and molded with epoxy resin 6.
【0016】このようにして製作したプレーナ型イオン
電極に、銀/塩化銀(Ag/AgCl)電極の形成と内
部液の充填を行う。まず、プレーナ型イオン電極を1.
0 N(規定)の塩酸(HCl)溶液中に浸漬し、陰圧
にて脱泡して電極支持基板1に塩酸を流入・充填させる
。次に、白金(Pt)線を当該塩酸中に浸し、白金線と
比較電極3の間に比較電極3が+0.5 V(ボルト)
になるように電圧を印加し、銀31の電極支持基板1側
の面に銀/塩化銀を形成する。更に、この塩酸溶液を完
全に除去し、4.0 M(モル)の塩化カリウム(KC
l)溶液を同様の方法で電極支持基板1内に充填させる
。A silver/silver chloride (Ag/AgCl) electrode is formed and an internal liquid is filled in the planar ion electrode thus manufactured. First, the planar ion electrode is 1.
It is immersed in a 0 N (normal) hydrochloric acid (HCl) solution and degassed under negative pressure to flow and fill the electrode support substrate 1 with hydrochloric acid. Next, the platinum (Pt) wire is immersed in the hydrochloric acid, and the comparison electrode 3 is connected between the platinum wire and the comparison electrode 3 at +0.5 V (volts).
A voltage is applied so as to form silver/silver chloride on the surface of the silver 31 on the electrode support substrate 1 side. Furthermore, this hydrochloric acid solution was completely removed and 4.0 M (mol) potassium chloride (KC
l) Fill the electrode support substrate 1 with the solution in the same manner.
【0017】なお、電極金属の種類、形状、作用電極2
の装着法、イオン選択性物質の種類、膜材料、銀/塩化
銀の形成法、内部液の充填法、絶縁モールド材としての
エポキシ樹脂6等は、これらに限定されるものではなく
、適宜変更可能である。Furthermore, the type and shape of the electrode metal, the working electrode 2
mounting method, type of ion-selective substance, membrane material, silver/silver chloride formation method, internal liquid filling method, epoxy resin 6 as an insulating mold material, etc. are not limited to these and may be changed as appropriate. It is possible.
【0018】以上のようにして製造したプレーナ型イオ
ン電極は、図1で示すように、直接、接続部2b、3b
をコネクタ7に挿入、接続して使用する。図6は、、実
施例プレーナ型カリウムイオン電極の特性を評価した説
明図である。図中のbは、市販されている従来のカリウ
ムイオン電極の電極出力特性で、aは実施例プレーナ型
カリウムイオン電極の特性を各々示している。この結果
より、実施例プレーナ型カリウムイオン電極が、カリウ
ムイオン電極として使用できることが証明されている。As shown in FIG. 1, the planar ion electrode manufactured as described above is directly connected to the connecting portions 2b and 3b.
Insert and connect to connector 7 to use. FIG. 6 is an explanatory diagram for evaluating the characteristics of the example planar potassium ion electrode. In the figure, b shows the electrode output characteristics of a conventional commercially available potassium ion electrode, and a shows the characteristics of the planar potassium ion electrode of the example. This result proves that the planar potassium ion electrode of the example can be used as a potassium ion electrode.
【0019】図7は、実施例プレーナ型カリウムイオン
電極Aを、ミニフローセル8に適用した例の分解斜視図
である。91は、アクリル板(支持部材)であり、この
図7では裏返して図示している。アクリル板91の裏面
91aには、シリコンシート(例えば厚さ0.13mm
のSILASTICシートティング、ダウ・コーニング
社製)92を周囲に配して、上記実施例プレーナ型カリ
ウムイオン電極Aが埋め込まれている。一方、ミニフロ
ーセル8には、試料流路81が設けられており、この両
端にはチューブライン82、82aがそれぞれ接続され
る。ミニフローセル8の上面8aには、この試料流路8
1が露出すると共に、リード線83を連結した接点金具
84が設けられている。また、85は一対の密着具で、
その溝部86には板バネ87を有している。すなわち、
アクリル板91とミニフローセル8は、密着具85によ
って装着され、板バネ87により密着させられる。この
時、プレーナ型カリウムイオン電極Aが、ミニフローセ
ル上面8aに密着し、試料流路84の露出部が作用電極
2の感応部2aと比較電極3の液絡部3aの部分に、ま
た接点金具84が接続部2b、3bにそれぞれ密着する
。FIG. 7 is an exploded perspective view of an example in which the planar potassium ion electrode A of the embodiment is applied to a mini flow cell 8. As shown in FIG. Reference numeral 91 denotes an acrylic plate (supporting member), which is shown upside down in FIG. On the back surface 91a of the acrylic plate 91, a silicone sheet (for example, 0.13 mm thick
The planar potassium ion electrode A of the above embodiment is embedded with SILASTIC sheeting (manufactured by Dow Corning) 92 arranged around the electrode. On the other hand, the mini-flow cell 8 is provided with a sample channel 81, and tube lines 82 and 82a are connected to both ends of the sample channel 81, respectively. This sample channel 8 is located on the top surface 8a of the mini flow cell 8.
1 is exposed, and a contact fitting 84 to which a lead wire 83 is connected is provided. Also, 85 is a pair of close fittings,
The groove portion 86 has a leaf spring 87. That is,
The acrylic plate 91 and the mini-flow cell 8 are attached by a contact tool 85 and brought into close contact by a leaf spring 87. At this time, the planar potassium ion electrode A is in close contact with the top surface 8a of the mini flow cell, and the exposed part of the sample flow path 84 is in contact with the sensitive part 2a of the working electrode 2, the liquid junction part 3a of the reference electrode 3, and the contact metal fitting. 84 are in close contact with the connecting portions 2b and 3b, respectively.
【0020】なお、図7は、プレーナ型カリウムイオン
電極を、ミニフローセルに適用した例であるが、適用例
はこれに限定されず、適宜変更可能である。Although FIG. 7 shows an example in which a planar potassium ion electrode is applied to a mini flow cell, the application example is not limited to this and can be modified as appropriate.
【0021】[0021]
【発明の効果】この発明では、以上のように、電極支持
基板上に形成した薄膜状金属の上にイオン選択性高分子
膜を被覆してなる作用電極を形成し、電極支持基板に含
浸させた内部液に接するように支持基板上に薄膜状の比
較電極を形成し、上記作用電極の感応部及び比較電極の
液絡部並びに作用電極と比較電極の接続部を除いて全体
を絶縁保護膜で被覆することとしたから、構造及び製造
が極めて簡単で、小型化、低価格化、量産化が実現でき
、特性や形状に関し電極間のバラツキが殆どない許かり
でなく、低価格のため使い捨てが可能となる。また、単
純な構成であり、支持基板は堅牢であり傷ついたり破損
することがなく、取扱いも容易である。更に、支持基板
上に膜状の電極を形成しているため、これら電極を直接
コネクタに挿入して使用できる。しかも、測定時の応答
速度が速い許かりでなく、任意の形状に製作することが
でき、使用形態も自由度が大きい等、発明目的を達成し
た優れた効果を有する。[Effects of the Invention] As described above, in the present invention, a working electrode is formed by coating an ion-selective polymer membrane on a thin metal film formed on an electrode support substrate, and the electrode support substrate is impregnated with the working electrode. A thin film-like comparison electrode is formed on the supporting substrate so as to be in contact with the internal liquid, and the entire area is covered with an insulating protective film except for the sensitive part of the working electrode, the liquid junction part of the reference electrode, and the connecting part of the working electrode and the reference electrode. Since the structure and manufacturing are extremely simple, miniaturization, low cost, and mass production can be realized, there is almost no variation between electrodes in terms of characteristics and shape, and the low price makes it disposable. becomes possible. Furthermore, the structure is simple, the supporting substrate is robust and will not be damaged or damaged, and is easy to handle. Furthermore, since the film-like electrodes are formed on the support substrate, these electrodes can be used by directly inserting them into the connector. Moreover, it not only has a fast response speed during measurement, but also can be manufactured into any shape and has a high degree of freedom in usage, and has excellent effects that achieve the purpose of the invention.
【図1】実施例プレーナ型イオン電極を示す斜視図であ
る。FIG. 1 is a perspective view showing an example planar ion electrode.
【図2】露出している感応部の横断面図である。FIG. 2 is a cross-sectional view of an exposed sensitive part.
【図3】被覆されている電極部分の横断面図である。FIG. 3 is a cross-sectional view of a coated electrode part.
【図4】作用電極の縦断面図である。FIG. 4 is a longitudinal cross-sectional view of a working electrode.
【図5】比較電極の縦断面図である。FIG. 5 is a longitudinal cross-sectional view of a comparison electrode.
【図6】実施例プレーナ型カリウムイオン電極の特性評
価説明図である。FIG. 6 is an explanatory diagram for evaluating the characteristics of the planar potassium ion electrode of the example.
【図7】プレーナ型カリウムイオン電極をミニフローセ
ルに適用した説明図である。FIG. 7 is an explanatory diagram in which a planar potassium ion electrode is applied to a mini flow cell.
1 絶縁性電極支持基板 2 作用電極 3 比較電極 23 イオン選択性高分子膜 2a 感応部 3a 液絡部 1 Insulating electrode support substrate 2 Working electrode 3. Reference electrode 23 Ion selective polymer membrane 2a Sensing part 3a Liquid junction
Claims (1)
に形成した薄膜状金属の上にイオン選択性高分子膜を被
覆してなる作用電極と、内部液を上記電極支持基板に含
浸させると共に、この内部液に接するように支持基板上
に形成された薄膜状の比較電極と、上記作用電極の感応
部及び比較電極の液絡部並びに作用電極と比較電極の接
続部を除いて全体を被覆する絶縁保護膜とから成るプレ
ーナ型イオン電極。1. An electrode supporting substrate, a working electrode formed by coating an ion-selective polymer membrane on a thin metal film formed on the electrode supporting substrate, and impregnating the electrode supporting substrate with an internal liquid; , a thin film-like comparison electrode formed on the support substrate so as to be in contact with this internal liquid, and covering the whole except for the sensitive part of the working electrode, the liquid junction part of the comparison electrode, and the connection part of the working electrode and the comparison electrode. A planar ion electrode consisting of an insulating protective film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2410361A JPH04215057A (en) | 1990-12-12 | 1990-12-12 | Planar type ion electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2410361A JPH04215057A (en) | 1990-12-12 | 1990-12-12 | Planar type ion electrode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04215057A true JPH04215057A (en) | 1992-08-05 |
Family
ID=18519535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2410361A Pending JPH04215057A (en) | 1990-12-12 | 1990-12-12 | Planar type ion electrode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04215057A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07159366A (en) * | 1993-12-07 | 1995-06-23 | Omron Corp | Portable measuring instrument |
KR100309223B1 (en) * | 1999-06-17 | 2001-09-29 | 배병우 | Planar type solid-state electrodes |
-
1990
- 1990-12-12 JP JP2410361A patent/JPH04215057A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07159366A (en) * | 1993-12-07 | 1995-06-23 | Omron Corp | Portable measuring instrument |
KR100309223B1 (en) * | 1999-06-17 | 2001-09-29 | 배병우 | Planar type solid-state electrodes |
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