JPH04214117A - Gas flow rate controller - Google Patents
Gas flow rate controllerInfo
- Publication number
- JPH04214117A JPH04214117A JP40145090A JP40145090A JPH04214117A JP H04214117 A JPH04214117 A JP H04214117A JP 40145090 A JP40145090 A JP 40145090A JP 40145090 A JP40145090 A JP 40145090A JP H04214117 A JPH04214117 A JP H04214117A
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- valve
- rate control
- gas
- shutoff valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000694 effects Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はガス流量制御装置に関し
、特にしゃ断弁とマスフローコントローラーを備えたガ
ス流量制御装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas flow rate control device, and more particularly to a gas flow rate control device equipped with a shutoff valve and a mass flow controller.
【0002】0002
【従来の技術】従来のガス流量制御装置は、図2の一部
断面にした正面図に示すように、マスフローコントロー
ラー3と、しゃ断弁1と、この双方を接続する接続管6
とを有している。次にその動作について説明する。ガス
流出側はガスを使用する装置に接続されており、しゃ断
弁1内の弁体2を開け、マスフローコントローラー3内
の流量制御用弁体4が必要に応じた量だけ開閉動作する
事により、ガス流入側からガス流出側への流量が制御さ
れる。2. Description of the Related Art A conventional gas flow rate control device includes a mass flow controller 3, a shutoff valve 1, and a connecting pipe 6 connecting both of them, as shown in a partially sectional front view of FIG.
It has Next, its operation will be explained. The gas outlet side is connected to a device that uses gas, and by opening the valve body 2 in the shutoff valve 1 and opening and closing the flow rate control valve body 4 in the mass flow controller 3 as required, The flow rate from the gas inflow side to the gas outflow side is controlled.
【0003】0003
【発明が解決しようとする課題】この従来のガス流量制
御装置では、しゃ断弁弁体2と流量制御用弁体4との間
のガス溜り5の容積が大きい為、図3のように、しゃ断
弁1が開いた瞬間に、ガス溜り5に溜っていた流量制御
の効かないガスが急激に放出され、微量な流量制御の安
定性が悪化するという問題点があった。尚、図3におい
ては、マスフローコントローラーの流量制御量を0とし
て示した。[Problems to be Solved by the Invention] In this conventional gas flow rate control device, since the volume of the gas reservoir 5 between the shutoff valve valve body 2 and the flow rate control valve body 4 is large, it is difficult to shut off the gas as shown in FIG. There is a problem in that the moment the valve 1 opens, the gas that has accumulated in the gas reservoir 5 and whose flow rate cannot be controlled is suddenly released, which deteriorates the stability of minute flow control. In addition, in FIG. 3, the flow rate control amount of the mass flow controller is shown as 0.
【0004】0004
【課題を解決するための手段】本発明のガス流量制御装
置は、しゃ断弁とマスフローコントローラーとの接続に
接続管を使用せず、マスフローコントローラーにしゃ断
弁を直接接続して、一体化した。[Means for Solving the Problems] The gas flow rate control device of the present invention does not use a connecting pipe to connect the shutoff valve and the mass flow controller, but directly connects the shutoff valve to the mass flow controller and integrates the shutoff valve with the mass flow controller.
【0005】[0005]
【実施例】次に本発明について図面を参照して説明する
。図1は本発明の一実施例のガス流量制御装置を示す一
部断面図にした正面図である。本実施例は、しゃ断弁弁
体2と流量制御用弁体4とを接近させて取り付けること
によって、しゃ断弁1とマスフローコントローラー3を
一体化し、しゃ断弁弁体2と流量制御用弁体4との間の
ガス溜り5の容積を小さくした。各弁の動作タイミング
については従来のガス流量制御装置と同等である。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings. FIG. 1 is a partially sectional front view showing a gas flow rate control device according to an embodiment of the present invention. In this embodiment, the shutoff valve 1 and the mass flow controller 3 are integrated by mounting the shutoff valve body 2 and the flow rate control valve body 4 close to each other. The volume of the gas reservoir 5 between the two was reduced. The operating timing of each valve is the same as that of a conventional gas flow rate control device.
【0006】[0006]
【発明の効果】以上説明したように本発明は、マスフロ
ーコントローラーとしゃ断弁との間のガス溜りの容積を
小さくしたので、しゃ断弁が開いた瞬間の急激なガスの
流出が微小に抑えられ、流量制御の安定性が増すという
効果を有する。[Effects of the Invention] As explained above, the present invention reduces the volume of the gas reservoir between the mass flow controller and the shutoff valve, so that the sudden outflow of gas at the moment the shutoff valve opens is suppressed to a minute level. This has the effect of increasing the stability of flow control.
【図1】本発明の一実施例のガス流量制御装置を示す一
部断面にした正面図である。FIG. 1 is a partially sectional front view showing a gas flow rate control device according to an embodiment of the present invention.
【図2】従来のガス流量制御装置を示す一部断面図にし
た正面図である。FIG. 2 is a partially sectional front view showing a conventional gas flow rate control device.
【図3】従来のしゃ断弁の開閉によるガス流量の変化を
示すグラフである。FIG. 3 is a graph showing changes in gas flow rate due to opening and closing of a conventional shutoff valve.
1 しゃ断弁 2 しゃ断弁弁体 3 マスフローコントローラー 4 流量制御用弁体 5 ガス溜り 6 接続管 1 Shutoff valve 2 Shutoff valve body 3 Mass flow controller 4 Valve body for flow rate control 5 Gas accumulation 6 Connecting pipe
Claims (1)
るしゃ断弁と、流量を制御するマスフローコントローラ
ーとを有するガス流量制御装置において、前記しゃ断弁
とマスフローコントローラーとを一体化した事を特徴と
するガス流量制御装置。1. A gas flow rate control device comprising a shutoff valve that opens and closes a flow to a device that uses gas, and a mass flow controller that controls the flow rate, characterized in that the shutoff valve and the mass flow controller are integrated. gas flow control device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40145090A JPH04214117A (en) | 1990-12-12 | 1990-12-12 | Gas flow rate controller |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40145090A JPH04214117A (en) | 1990-12-12 | 1990-12-12 | Gas flow rate controller |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04214117A true JPH04214117A (en) | 1992-08-05 |
Family
ID=18511275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP40145090A Pending JPH04214117A (en) | 1990-12-12 | 1990-12-12 | Gas flow rate controller |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04214117A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06318116A (en) * | 1993-05-10 | 1994-11-15 | Nec Corp | Gas flow rate controller |
WO2004017150A1 (en) * | 2002-08-14 | 2004-02-26 | Young-Chul Chang | Time based flow controller for incompressible fluid and method for controlling flow rate of incompressible fluid using it |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6325411A (en) * | 1986-01-29 | 1988-02-02 | Matsushita Electric Ind Co Ltd | Gas supply controller of gas instrument |
-
1990
- 1990-12-12 JP JP40145090A patent/JPH04214117A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6325411A (en) * | 1986-01-29 | 1988-02-02 | Matsushita Electric Ind Co Ltd | Gas supply controller of gas instrument |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06318116A (en) * | 1993-05-10 | 1994-11-15 | Nec Corp | Gas flow rate controller |
WO2004017150A1 (en) * | 2002-08-14 | 2004-02-26 | Young-Chul Chang | Time based flow controller for incompressible fluid and method for controlling flow rate of incompressible fluid using it |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19970729 |