JPH04202776A - Loading device - Google Patents

Loading device

Info

Publication number
JPH04202776A
JPH04202776A JP33669190A JP33669190A JPH04202776A JP H04202776 A JPH04202776 A JP H04202776A JP 33669190 A JP33669190 A JP 33669190A JP 33669190 A JP33669190 A JP 33669190A JP H04202776 A JPH04202776 A JP H04202776A
Authority
JP
Japan
Prior art keywords
rotating shaft
substrate
suction head
loading device
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33669190A
Other languages
Japanese (ja)
Other versions
JPH0639698B2 (en
Inventor
Eiji Konoshima
此島 栄次
Naoki Kato
直樹 加藤
Kyoji Kinokiri
恭治 木ノ切
Jiro Ikeda
池田 治朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Sony Corp
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp, Tokuda Seisakusho Co Ltd filed Critical Sony Corp
Priority to JP2336691A priority Critical patent/JPH0639698B2/en
Publication of JPH04202776A publication Critical patent/JPH04202776A/en
Publication of JPH0639698B2 publication Critical patent/JPH0639698B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Controlling Sheets Or Webs (AREA)
  • Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To reduce the load on a driving mechanism and to smoothly rotate and reciprocate a loading device by winding a pipeline on a rotating shaft, then connecting the pipeline to an external device and absorbing the shock produced when a suction head is reversed. CONSTITUTION:The vacuum chucks 41 and 41' for a substrate 2 are provided on both sides of a suction head 42 in plural stages. The head is vertically moved by an air cylinder 442, and the substrate 2 is loaded into a film forming chamber 5 and simultaneously delivered to a substrate conveyor from the chamber 5. A couple of pipelines 45 and 45' are wound on a rotating shaft 43 and then connected to external devices 46 and 46', and the momentum of the rotating shaft 43 is absorbed by the circumferential direction of the pipelines 45 and 45' to reduce the load on a driving mechanism 44. A couple of shock absorbers 47 and 47' are integrated with the moving part of the air cylinder 442 with the shaft 43 in between to absorb the shock produced when the head 42 is reversed.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) この発明は、例えば連続スパッタリング装置に好適なロ
ーディング装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a loading device suitable for, for example, a continuous sputtering device.

(従来の技術) デジタル化された音声情報や画像情報を大量に記録する
のにコンパクトディスク(以下、CDと略称する)が広
く使用されるようになってきた。
(Prior Art) Compact discs (hereinafter abbreviated as CDs) have become widely used for recording large amounts of digitized audio information and image information.

CDは、ポリカーボネート等の透明な合成樹脂性基板の
表面にスパッタリングにより光反射率の高いアルミニュ
ーム(A1)薄膜層か形成されて構成され、「1」か「
0」のデジタル情報に合わせて、その基板にビット(p
lt)と称する小さな孔を開け、その孔の有無をレーザ
光の反射波あるいは透過波の有無によりその記録情報を
読み出し得るものである。
A CD is constructed by forming a thin film layer of aluminum (A1) with high light reflectance on the surface of a transparent synthetic resin substrate such as polycarbonate by sputtering.
According to the digital information of "0", the bit (p
A small hole called lt) is made, and the recorded information can be read out by checking the presence or absence of a reflected wave or transmitted wave of a laser beam.

1枚の基板への成膜は、スパッタにより比較的短時間で
行われることから、多数の基板への連続成膜か可能であ
る。
Since film formation on one substrate is performed by sputtering in a relatively short time, continuous film formation on a large number of substrates is possible.

従来の連続スパッタリング装置は、第3図に示すように
構成されている。
A conventional continuous sputtering apparatus is constructed as shown in FIG.

まずヘルドコンヘア等の外部搬送装置1で順次搬送され
てくるCD等の基板2は、軸3aを中心に回転(矢印X
1方向)及び上下(矢印Yl)方向に移動可能な基板搬
送装置3の吸着パット21に吸着され、ローディング(
loading)装置4に搬送される。
First, substrates 2 such as CDs, which are sequentially transported by an external transport device 1 such as a held conveyor, rotate around an axis 3a (arrow
1 direction) and up and down (arrow Yl) directions, the substrate is attracted to the suction pad 21 of the substrate transport device 3, and the loading (
loading) device 4.

ローディング装置4は、基板搬送装置3から受けた基板
2をバキュームチャック41で吸引しつつ、成膜室5内
の内部搬送装置51にローディングするもので、第4図
に拡大して示すように構成されている。
The loading device 4 is for loading the substrate 2 received from the substrate transfer device 3 into an internal transfer device 51 in the film forming chamber 5 while suctioning it with a vacuum chuck 41, and is configured as shown in an enlarged view in FIG. has been done.

即ち、バキュームチャック41か設けられた吸着ヘッド
42は、回転軸43に固定され、駆動機構44のモータ
441及び歯車装置441aにより矢印X2方向に回転
自在に構成されるとともに、エアーシリンダ442によ
り、上下(矢印Y2)方向に移動自在に構成されている
。バキュームチャック41は吸着ヘッド42及び回転軸
43内の吸排空洞431.取出し口432を経て、配管
45により外部機器46に接続されている。
That is, the suction head 42 provided with the vacuum chuck 41 is fixed to a rotating shaft 43, is configured to be rotatable in the direction of arrow X2 by a motor 441 of a drive mechanism 44 and a gear device 441a, and is rotated vertically by an air cylinder 442. It is configured to be movable in the direction (arrow Y2). The vacuum chuck 41 includes a suction head 42 and a suction/discharge cavity 431 within the rotating shaft 43. It is connected to an external device 46 via a pipe 45 via an outlet 432 .

外部機器46は、バキュームチャック41が基板2を着
脱させる作動源をなし、分岐管46a、バルブ46b、
4[ic 、及び真空ポンプ等の排気ポンプ46dから
構成されている。
The external device 46 serves as an operating source for the vacuum chuck 41 to attach and detach the substrate 2, and includes a branch pipe 46a, a valve 46b,
4[ic] and an exhaust pump 46d such as a vacuum pump.

ローディング装置4が基板搬送装置3から基板2を受け
、成膜室5内の内部搬送装置51ヘローデイングすると
きは、まずバルブ46bを開け、基板2をバキュームチ
ャック41で吸引捕捉した後、モータ441の駆動によ
り回転軸43を180度回転させて基板2を成膜室5側
に向くよう操作される。
When the loading device 4 receives the substrate 2 from the substrate transfer device 3 and loads it to the internal transfer device 51 in the film forming chamber 5, the valve 46b is first opened, the substrate 2 is suctioned and captured by the vacuum chuck 41, and then the motor 441 is turned on. By driving, the rotating shaft 43 is rotated 180 degrees and the substrate 2 is operated to face the film forming chamber 5 side.

次に、エアーシリンダ442によって吸着ヘッド42を
成膜室5に向は降下させるとともに、第3図に示すよう
に成膜室5内で上昇させた搬送テーブル51a上に基板
2が接近したとき、バルブ46bを閉し、バルブ46C
を開けて大気を導入して、基板2を内部搬送装置51に
移動させるものである。
Next, the suction head 42 is lowered into the film forming chamber 5 by the air cylinder 442, and when the substrate 2 approaches the transport table 51a raised within the film forming chamber 5 as shown in FIG. Close valve 46b and close valve 46C.
The substrate 2 is moved to the internal transfer device 51 by opening the chamber and introducing the atmosphere.

内部搬送装置51もローディング装置4と同様に、軸5
1b中心に上下(矢印Y3)方向は勿論のこと矢印X3
方向に回転可能に構成されているから、基板2は順次ス
パッタ源52まで搬送され成膜される。
Similarly to the loading device 4, the internal conveyance device 51 also has a shaft 5.
Centered on 1b not only in the up and down (arrow Y3) direction but also in the arrow X3
Since the substrate 2 is configured to be rotatable in this direction, the substrate 2 is sequentially transported to the sputtering source 52 and a film is formed thereon.

スパッタ成膜後の基板2は上記と逆操作により、内部搬
送装置51からローディング装置4.基板搬送装置3を
経て他のベルトコンベアからなる外部搬送装置により搬
出される。
The substrate 2 after sputtering film formation is transferred from the internal transport device 51 to the loading device 4. by the reverse operation to the above. After passing through the substrate transport device 3, the substrate is carried out by an external transport device consisting of another belt conveyor.

ところで、上述のローディング動作において、回転軸4
3や吸着ヘッド42は、据付は固定された外部機器46
に対して、上下動を伴った180度の反復回転運動を行
うから、配管45は、他端か外部機器46に固定されつ
つ、回転軸43とともに上下動を伴った往復回転運動が
繰返される。
By the way, in the above-mentioned loading operation, the rotating shaft 4
3 and the suction head 42 are installed on a fixed external device 46.
Since the piping 45 repeatedly rotates 180 degrees with vertical movement, the piping 45 repeats reciprocating rotational movement with vertical movement together with the rotation shaft 43 while the other end is fixed to the external device 46.

その結果、配管45は、いわゆるねじれ往復動が要求さ
れ、配管45にせん断応力が加わるほか、駆動機構44
に対して機械的な負荷を与えることとなるので、配管4
5の長さを長くしてたるみを持たせ、そのたるみの部分
で負荷の軽減を図るようにしていた。
As a result, the piping 45 is required to make a so-called torsional reciprocating motion, which applies shear stress to the piping 45, and the drive mechanism 44
Since the mechanical load will be applied to the piping 4.
5 was made longer to give it slack, and the load was reduced by using the slack.

しかし、配管45は長さか長いから、ねじれ往復動によ
る旋回動作に要する空間は広く必要とし、そのため操作
員にとっても危険が伴うという欠点があった。
However, since the piping 45 is long, a large space is required for the turning operation due to the twisting and reciprocating motion, which is disadvantageous in that it is dangerous for the operator.

また、駆動機構44は、回転軸43を中心に繰返し上下
及び回転往復動を行うものであるが、重い吸着ヘッド4
2の反転往復の繰返し動作による慣性モーメントは、モ
ータ441及び歯車装置441aへの負荷となり、モー
タ44の過負荷や歯車の摩耗等を引起こす要因となった
The drive mechanism 44 repeatedly moves up and down and rotates back and forth around the rotating shaft 43, but the heavy suction head 4
The moment of inertia caused by the repeated reciprocating motion of 2 becomes a load on the motor 441 and the gear device 441a, causing overload on the motor 44 and wear of the gears.

特にローディング装置の用途を考えると、反復往復動の
サイクルを短縮することか、適用機種の機能向上につな
がる重要な決め手となることが多いたけに、衝撃負荷を
いかに軽減し、故障を少なくし、信頼性を上げるかが課
題とされた。
In particular, when considering the application of loading devices, shortening the cycle of repeated reciprocating motion is often an important deciding factor that leads to improving the functionality of the applicable model. The challenge was to improve reliability.

(発明か解決しようとする課題) 従来のC−ディング装置は、配管を接続させた状態でヘ
ッド′を反転往復動させた場合、配管の旋回空間が広が
り、また駆動機構への負荷が大となる欠点があった。
(Problem to be solved by the invention) In the conventional C-ding device, when the head' is reversed and reciprocated with the pipe connected, the turning space of the pipe increases and the load on the drive mechanism becomes large. There was a drawback.

この発明は、上記従来の欠点を解消し、駆動機構への負
荷を軽減せしめ、同時により全体をよりコンパクトに構
成し得るローディング装置を提供することを目的とする
SUMMARY OF THE INVENTION An object of the present invention is to provide a loading device that eliminates the above-mentioned conventional drawbacks, reduces the load on the drive mechanism, and at the same time allows for a more compact overall structure.

[発明の構成コ (課題を解決するための手段) この発明は、搬送されてくる基板を吸着ヘツドのバキュ
ームチャックに吸着しつつ成膜室にローディングするロ
ーディング装置において、前記吸着ヘッドを上下往復動
させ得るとともに成膜室から離隔させた状態で回転軸を
中心に吸着ヘッドを回転往復動作させる駆動機構と、前
記吸着ヘッドの回転往復動作に伴う衝撃を吸収するショ
ックアブソーバと、前記バキュームチャックに連なり前
記回転軸回りに巻回後排気ポンプに接続された配管とを
具備することを特徴とする。
[Structure of the Invention (Means for Solving the Problems) This invention provides a loading device that loads a substrate being transported into a film forming chamber while adsorbing it to a vacuum chuck of a suction head, in which the suction head is reciprocated up and down. a drive mechanism that rotates and reciprocates the suction head around a rotating shaft while being separated from the film forming chamber; a shock absorber that absorbs shock accompanying the rotation and reciprocation of the suction head; and a shock absorber connected to the vacuum chuck. It is characterized by comprising a pipe connected to an exhaust pump after being wound around the rotation axis.

(作用) この発明は、配管を回転軸周りに巻回して後、外部機器
と接続させたので、仮に反復回転機構が動作しても、巻
回された配管の径は大きく広からず、全体はコンパクト
に構成されるとともに、駆動機構への負荷は小さくなる
(Function) In this invention, since the piping is connected to an external device after being wound around the rotating shaft, even if the repetitive rotation mechanism operates, the diameter of the wound piping does not widen significantly, and the entire The structure is compact and the load on the drive mechanism is reduced.

また、ショックアブソーバを設けたので、慣性モーメン
トによる反転時の衝撃は吸収され、駆動機構に対する負
荷を更に小さくすることかできる。
Furthermore, since the shock absorber is provided, the impact caused by the moment of inertia during reversal is absorbed, making it possible to further reduce the load on the drive mechanism.

(実施例) 以下、第1図及び第2図を参照し、この発明によるロー
ディング装置の実施例を説明する。なお、この実施例の
説明では従来の説明と同様に、連続スパッタリングによ
る成膜装置に適用した場合について説明し、また第3図
及び第4図に示した従来の装置と同一構成には同一符号
を付して詳細な説明は省略する。
(Embodiment) Hereinafter, an embodiment of a loading device according to the present invention will be described with reference to FIGS. 1 and 2. In addition, in the explanation of this embodiment, as in the conventional explanation, a case will be explained in which it is applied to a film forming apparatus using continuous sputtering, and the same components as the conventional apparatus shown in FIGS. 3 and 4 are denoted by the same reference numerals. Detailed explanation will be omitted.

第1図はこの発明によるローディング装置の一実施例を
示す構成図である。
FIG. 1 is a block diagram showing an embodiment of a loading device according to the present invention.

即ち、ローディング装置4は、円盤状の吸着ヘッド42
の両面に夫々基板2のバキュームチャック41、41’
か複数設けられて、夫々対応する吸排空洞431.43
1’ 、配管45.45’を介して一対の外部機器48
.46’ に接続されている。
That is, the loading device 4 includes a disk-shaped suction head 42.
Vacuum chucks 41, 41' of the substrate 2 are placed on both sides of the board 2, respectively.
A plurality of suction and exhaust cavities 431 and 43 are provided, each having a corresponding suction and exhaust cavity.
1', a pair of external equipment 48 via piping 45, 45'
.. 46'.

配管45.45’ はフレキシブルな合成樹脂製の透明
なパイプからなり、一端が回転軸43の径方向に取付け
られた取出し口432.432’ に接続され、回転軸
43の外側に沿って比較的緩やかに複数回巻回されて後
、他端を夫々一対の外部機器46.4G’ に接続され
ている。
The piping 45.45' consists of a transparent pipe made of flexible synthetic resin, and one end is connected to the outlet port 432.432' installed in the radial direction of the rotating shaft 43. After being gently wound several times, the other ends are connected to a pair of external devices 46.4G', respectively.

そこで、このロープインク装置4での基板2の着脱は、
従来と同様に外部機器48.46’ におけるバルブ4
6b、 46b’ 、46c、46c’ の開閉操作に
よって行われる。このバルブ開閉操作は駆動機構44の
動作とともに、図示しない制御装置の制御を受けて、基
板搬送装置(3)及び成膜室(5)内の内部搬送装置(
51,)の動作と連携するように構成されている。
Therefore, the attachment and detachment of the board 2 with this rope ink device 4 is as follows.
As before, valve 4 in external equipment 48.46'
This is done by opening and closing operations of 6b, 46b', 46c, and 46c'. This valve opening/closing operation is controlled by a control device (not shown) together with the operation of the drive mechanism 44, and is controlled by a substrate transfer device (3) and an internal transfer device (
51,).

なお、この実施例では、吸着ヘッド42の両面にバキュ
ームチャック41.41’を設けたので、エアーシリン
ダ442による1つの上下動作の中で、成膜室(5)へ
のローディングと同時に、逆に成膜室(5)から基板搬
送装置(3)への基板2受は渡しを行うこともできるか
ら、ローディングの作業効率は著しく向上する。
In this embodiment, vacuum chucks 41 and 41' are provided on both sides of the suction head 42, so that during one vertical movement by the air cylinder 442, loading into the film forming chamber (5) is simultaneously performed, and vice versa. Since the substrate 2 can be transferred from the film forming chamber (5) to the substrate transport device (3), the loading efficiency is significantly improved.

また、一対の配管45.45’ は回転軸43の軸周り
にコイル状に巻回して後、外部機器46.46’ に接
続させたので、回転軸43側で回転往復動作を受けても
、その運動量は巻回された配管45.45’ 円周方向
で吸収されるから、配管45.45’ 自体へ加わるせ
ん断力は小さくなる。つまり、配管45.45’に加わ
る回転往復運動はコイル状の円周方向で受けるので、回
転軸43に巻回された配管45.45’の径における小
さな伸縮に止どまり、またこれにエアーシリンダ442
による上下反復動が加わったとしても、駆動機構44に
与える機械的負荷は小さく押えられる。また、回転軸4
3に巻回された配管45゜45′ は回転軸43の端部
に設けたストッパ機構433によって、回転軸43から
はみ出るのを防止され、かつコンパクトに収納される。
In addition, since the pair of pipes 45, 45' are coiled around the axis of the rotating shaft 43 and then connected to the external equipment 46, 46', even when subjected to rotational reciprocating motion on the rotating shaft 43 side, Since the momentum is absorbed in the circumferential direction of the wound pipe 45.45', the shear force applied to the pipe 45.45' itself becomes small. In other words, since the rotational reciprocating motion applied to the piping 45.45' is received in the circumferential direction of the coil, the expansion and contraction is limited to a small amount in the diameter of the piping 45.45' wound around the rotating shaft 43. 442
Even if repeated vertical movements are applied, the mechanical load applied to the drive mechanism 44 can be kept small. In addition, the rotating shaft 4
A stopper mechanism 433 provided at the end of the rotating shaft 43 prevents the pipe 45° 45' wound around the rotating shaft 43 from protruding from the rotating shaft 43, and is stored compactly.

なお、ストッパ機構433は、円板状の止め具433a
とこれを回転軸43に垂直に固定するためのねし433
bとで構成されている。
Note that the stopper mechanism 433 includes a disk-shaped stopper 433a.
and a screw 433 for fixing this perpendicularly to the rotating shaft 43
It is composed of b.

また、一対の各配管45.45’を互いに異なる色のも
ので構成し、バキュームチャック41.41’ と配管
45.45’ との組合わせを識別できるようにして、
製造組立て時あるいは保守点検時に便利なように構成し
ている。
Furthermore, each of the pair of pipes 45.45' is configured with a different color so that the combination of the vacuum chuck 41.41' and the pipe 45.45' can be identified.
It is configured to be convenient during manufacturing and assembly or maintenance and inspection.

また、この実施例では、ローディング装置4の反復回転
動作の駆動源を、従来のモータ441に代えて、回転軸
43に一体に取付けたピニオン(小歯車) 441aを
ラック(rack)441bと噛合わせ、このうツク4
4】bをバイブ441cによる高圧空気の交互供給によ
り摺動移動させることによって、直線往復運動を回転往
復運動に変えられることから、回転軸43は180度回
転往復運動を行うように構成されている。
Further, in this embodiment, the driving source for the repetitive rotational operation of the loading device 4 is replaced with the conventional motor 441, and a pinion (small gear) 441a integrally attached to the rotating shaft 43 is meshed with a rack 441b. , Konutsuku 4
4) By slidingly moving b by alternately supplying high-pressure air with the vibrator 441c, linear reciprocating motion can be changed to rotational reciprocating motion, so the rotating shaft 43 is configured to perform 180 degree rotational reciprocating motion. .

このピニオン441aとラック441bによる往復回転
運動でも、吸着ヘッド42による慣性モーメントの反動
を受けるので、新たに設けた一対のショックアブソーバ
47.47’によって、その反転時の衝撃を吸収し、ピ
ニオン441a及びラック441b等に与える負荷の軽
減を図っている。
This reciprocating rotational movement by the pinion 441a and the rack 441b is also affected by the reaction of the moment of inertia by the suction head 42, so a pair of newly installed shock absorbers 47, 47' absorbs the impact at the time of reversal, and the pinion 441a and the rack 441b This is intended to reduce the load on the rack 441b and the like.

即ち、第2図に示すように、一対のショックアブソーバ
47.47’ は回転軸43を挟んで、エアーシリンダ
442の可動部分と一体に取付けられ、中央部にゴム材
49aか充填されている。そこで回転軸43と一体に固
定されたアーム434は、吸着ヘッド42か丁度矢印Y
方向に交互に移動して180度反転する度に、アーム4
34の先端頭部434aがショックアブソーバ47.4
7’に交互に当り、反転時の衝撃を吸収するように構成
されている。
That is, as shown in FIG. 2, a pair of shock absorbers 47 and 47' are integrally attached to the movable portion of the air cylinder 442 with the rotating shaft 43 in between, and the central portion thereof is filled with a rubber material 49a. Therefore, the arm 434, which is fixed integrally with the rotating shaft 43, is placed between the suction head 42 and the arrow Y.
Each time the arm 4 moves alternately in the direction and rotates 180 degrees,
The tip head 434a of 34 is a shock absorber 47.4
7' alternately, and is configured to absorb the impact when reversing.

もっとも、このショックアブソーバ47.47’ は、
ゴム材49aに代えて、例えば油を充填した凹部にコイ
ルスプリングを収納し、その弾力性を利用して衝撃を吸
収する構造とすることもできる。
However, this shock absorber 47.47' is
Instead of the rubber material 49a, for example, a structure may be adopted in which a coil spring is housed in a recess filled with oil and the elasticity of the coil spring is used to absorb shock.

以上のように、この発明によるローディング装置は、配
管45.45’を回転軸43周りに巻回して後、外部機
器46.46’ と接続させたので、仮に駆動機構44
か往復回転動作を行っても、巻回された配管の径は大き
く広からず、駆動機構44への負荷も小さくなる。
As described above, in the loading device according to the present invention, the piping 45, 45' is wound around the rotating shaft 43 and then connected to the external device 46, 46'.
Even if a reciprocating rotational operation is performed, the diameter of the wound pipe does not increase significantly, and the load on the drive mechanism 44 also becomes smaller.

また、ショックアブソーバ47を設けたので、反転回転
時の慣性モーメントを吸収し、反転時の衝撃を和らげる
駆動機構44に対する負荷は更に小さくなり、駆動機構
の寿命を向上させることかできる。
Further, since the shock absorber 47 is provided, the load on the drive mechanism 44 that absorbs the moment of inertia during reverse rotation and softens the impact during reverse rotation is further reduced, and the life of the drive mechanism can be extended.

[発明の効果コ この発明によるローディング装置は、簡単な構成で、回
転往復運動がスムーズに行われ、機械的負荷の軽減と吸
収を図ることによって、信頼性を高め寿命を向上せしめ
たものであり、実用上の効果大である。
[Effects of the Invention] The loading device according to the present invention has a simple structure, allows smooth rotation and reciprocation, and reduces and absorbs mechanical loads, thereby increasing reliability and extending life. , which has great practical effects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明にょるローディング装置の一実施例を
示す構成図、第2図は第1図に示す装置のA−A線断面
図、第3図は従来のローディング装置を適用した連続ス
パッタリング装置を示す構成図、第4図は第3図のロー
ディング装置を示す構成図である。 1・・・外部搬送装置、   2・・・基板、3・・・
基板搬送装置、 4・・ローディング装置、 41バキユームチヤツク、42・・・吸着ヘッド、43
・・・回転軸、     44・・駆動機構、441a
・・・ピニオン、  441b・・ラック、442・・
・エアーシリンダ、 45.45’ ・・・配管、 46.46′・・・外部機器、 47.47’  ・・ショックアブソーバ、5・・・成
膜室。 代理人  弁理士 大 胡 典 夫 2 ・ 基箱         45.45’ :  
凶己階4+、4+’:  バキ、コー−ム チャーノア
         46d、46d’:  4引)LI
ルフ042;へ7r47:シ鳳ツ27フ“・ノーバ43
;  回転軸       5 ・ ぺ謄!44・愚d
b模O眸 第2図
FIG. 1 is a configuration diagram showing an embodiment of a loading device according to the present invention, FIG. 2 is a sectional view taken along line A-A of the device shown in FIG. 1, and FIG. 3 is a continuous sputtering process using a conventional loading device. FIG. 4 is a block diagram showing the loading device of FIG. 3. 1... External transport device, 2... Board, 3...
Substrate transfer device, 4...Loading device, 41 Vacuum chuck, 42... Suction head, 43
... Rotating shaft, 44... Drive mechanism, 441a
...Pinion, 441b...Rack, 442...
・Air cylinder, 45.45'... Piping, 46.46'... External equipment, 47.47'... Shock absorber, 5... Film forming chamber. Agent Patent Attorney Norio Ogo 2 Base box 45.45':
Evil Kikai 4+, 4+': Baki, Comb Charnoa 46d, 46d': 4 draws) LI
Ruf 042; to 7r47: Shihotsu 27f “Nova 43
;Rotary axis 5 ・Peg! 44. stupid
b Model O-view Figure 2

Claims (1)

【特許請求の範囲】[Claims] 搬送されてくる基板を吸着ヘッドのバキュームチャック
に吸着しつつ成膜室にローディングするローディング装
置において、前記吸着ヘッドを上下往復動させ得るとと
もに成膜室から離隔させた状態で回転軸を中心に吸着ヘ
ッドを回転往復動作せる駆動機構と、前記吸着ヘッドの
回転往復動作に伴う衝撃を吸収するショックアブソーバ
と、前記バキュームチャックに連なり前記回転軸回りに
巻回後排気ポンプに接続された配管とを具備することを
特徴とするローディング装置。
In a loading device that loads a transported substrate into a film formation chamber while adsorbing it to a vacuum chuck of a suction head, the suction head can be moved up and down and back and forth, and the suction head is sucked around a rotating shaft while being separated from the film formation chamber. The suction head is equipped with a drive mechanism that rotates and reciprocates the head, a shock absorber that absorbs shock caused by the rotation and reciprocation of the suction head, and a pipe connected to the vacuum chuck and connected to an exhaust pump after winding around the rotation axis. A loading device characterized by:
JP2336691A 1990-11-30 1990-11-30 Loading device Expired - Fee Related JPH0639698B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2336691A JPH0639698B2 (en) 1990-11-30 1990-11-30 Loading device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2336691A JPH0639698B2 (en) 1990-11-30 1990-11-30 Loading device

Publications (2)

Publication Number Publication Date
JPH04202776A true JPH04202776A (en) 1992-07-23
JPH0639698B2 JPH0639698B2 (en) 1994-05-25

Family

ID=18301811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2336691A Expired - Fee Related JPH0639698B2 (en) 1990-11-30 1990-11-30 Loading device

Country Status (1)

Country Link
JP (1) JPH0639698B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010181428A (en) * 2009-02-03 2010-08-19 Hitachi High-Technologies Corp Display panel substrate conveyance device and display panel module assembling apparatus
JP2012213842A (en) * 2011-04-01 2012-11-08 Hallys Corp Device for machining thin planar material and method for manufacturing thin planar material
JP2014065126A (en) * 2012-09-26 2014-04-17 Hallys Corp Grinding apparatus of thin plate-like workpiece, and method for manufacturing thin plate-like member

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010181428A (en) * 2009-02-03 2010-08-19 Hitachi High-Technologies Corp Display panel substrate conveyance device and display panel module assembling apparatus
JP2012213842A (en) * 2011-04-01 2012-11-08 Hallys Corp Device for machining thin planar material and method for manufacturing thin planar material
TWI494258B (en) * 2011-04-01 2015-08-01 Hallys Corp Sheet metal processing apparatus and sheet-like member manufacturing method
JP2014065126A (en) * 2012-09-26 2014-04-17 Hallys Corp Grinding apparatus of thin plate-like workpiece, and method for manufacturing thin plate-like member

Also Published As

Publication number Publication date
JPH0639698B2 (en) 1994-05-25

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