JPH04202260A - Metal chelate compound and optical recording medium using the compound - Google Patents
Metal chelate compound and optical recording medium using the compoundInfo
- Publication number
- JPH04202260A JPH04202260A JP2331672A JP33167290A JPH04202260A JP H04202260 A JPH04202260 A JP H04202260A JP 2331672 A JP2331672 A JP 2331672A JP 33167290 A JP33167290 A JP 33167290A JP H04202260 A JPH04202260 A JP H04202260A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- compound
- metal chelate
- optical recording
- chelate compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 28
- 239000002184 metal Substances 0.000 title claims abstract description 28
- 239000013522 chelant Substances 0.000 title claims abstract description 23
- 150000001875 compounds Chemical class 0.000 title claims description 47
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 4
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 125000004429 atom Chemical group 0.000 claims abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 3
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 3
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 3
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 19
- 238000003860 storage Methods 0.000 abstract description 8
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 14
- 239000010410 layer Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 239000000975 dye Substances 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 229920005668 polycarbonate resin Polymers 0.000 description 7
- 239000004431 polycarbonate resin Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- KUGBQWBWWNPMIT-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluoropentan-1-ol Chemical compound CC(F)(F)C(F)(F)C(F)(F)C(O)(F)F KUGBQWBWWNPMIT-UHFFFAOYSA-N 0.000 description 4
- BNDRWEVUODOUDW-UHFFFAOYSA-N 3-Hydroxy-3-methylbutan-2-one Chemical compound CC(=O)C(C)(C)O BNDRWEVUODOUDW-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910052724 xenon Inorganic materials 0.000 description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
- -1 Pulmoform Chemical compound 0.000 description 3
- CSUFEOXMCRPQBB-UHFFFAOYSA-N 1,1,2,2-tetrafluoropropan-1-ol Chemical compound CC(F)(F)C(O)(F)F CSUFEOXMCRPQBB-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 230000008033 biological extinction Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229940057867 methyl lactate Drugs 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- VRVRGVPWCUEOGV-UHFFFAOYSA-N 2-aminothiophenol Chemical compound NC1=CC=CC=C1S VRVRGVPWCUEOGV-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Duplication Or Marking (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、新規な金属キレート化合物および該化合物を
用いた光学的記録媒体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel metal chelate compound and an optical recording medium using the compound.
[従来の技術]
レーザーを用いた光学記録は、高密度の情報記録保存お
よび再生を可能とするため、近年、特にその開発が取り
進められている。[Prior Art] Optical recording using lasers has been particularly developed in recent years because it enables high-density information recording storage and reproduction.
光学記録媒体の一例としては、光ディスクを挙げること
ができる。An example of an optical recording medium is an optical disc.
一般に、光ディスクは、円形の基体に設けられた薄い記
録層に、1μm程度に集束したレーザー光照射し、高密
度の情報記録を行なうものである。In general, optical discs record high-density information by irradiating a thin recording layer provided on a circular base with a laser beam focused to about 1 μm.
その記録は、照射されたレーザー光エネルギーの吸収に
よって、その箇所の記録層に、分解、蒸発、溶解等の熱
的変形が生成することにより行なわれる。また、記録さ
れた情報の再生は、レーザー光により変形が起きている
部分と起きていない部分の反射率の差を読み取ることに
より行なわれる。The recording is performed by thermal deformation such as decomposition, evaporation, melting, etc. occurring in the recording layer at that location due to absorption of the irradiated laser light energy. Further, recorded information is reproduced by reading the difference in reflectance between a portion where deformation has occurred and a portion where no deformation has occurred by laser light.
したがって、光学的記録媒体としては、レーザー光のエ
ネルギーを効率よく吸収する必要があり、記録層には、
例えば、レーザー吸収色素が用いられる。Therefore, as an optical recording medium, it is necessary to efficiently absorb the energy of laser light, and the recording layer must
For example, laser absorbing dyes are used.
この種の光学的記録媒体としては、種々の構成のものが
知られている。Various configurations of this type of optical recording medium are known.
例えば、特開昭55−97033号公報には、基板上に
フタロシアニン系色素の単層を設けたものが開示されて
る。しかしながらフタロシアニン系色素は感度が低く、
また分解点が高く蒸着しにくい等の問題点を有し、さら
に有機溶媒に対する溶解性゛が著しく低く、塗布による
コーティングに使用することができないという問題点も
有している。For example, JP-A-55-97033 discloses a device in which a single layer of phthalocyanine dye is provided on a substrate. However, phthalocyanine dyes have low sensitivity;
Further, it has problems such as a high decomposition point and difficulty in vapor deposition, and also has an extremely low solubility in organic solvents, making it impossible to use it for coating by coating.
また、特開昭58−112790号公報、同58−11
4989号、同59−85791号および同60−83
236号各公報には、シアニン系色素を記録層に設けた
のもが開示されている。しかしこのような色素は溶解性
が高く、塗布によるコーティングが可能であるという利
点の反面、耐光性が劣るという問題点を有している。Also, JP-A-58-112790, JP-A-58-11
No. 4989, No. 59-85791 and No. 60-83
No. 236 discloses a recording layer in which a cyanine dye is provided. However, although such dyes have the advantage of being highly soluble and can be coated by coating, they have the problem of poor light resistance.
このため、特開昭59−55795号公報には、このシ
アニン系色素にクエンチャ−を加えて耐光性を向上させ
ることが、検討されているがまだまだ不十分なレベルで
ある。For this reason, Japanese Patent Laid-Open No. 59-55795 discusses adding a quencher to this cyanine dye to improve light resistance, but this is still at an insufficient level.
[発明が解決しようとする課題]
本発明は、上記の問題点を解決し、保存安定性および耐
光性にすぐれたスピナー法による成膜に適した金属キレ
ート化合物および該化合物を用いた光学記録媒体を提供
することを目的とするものである。[Problems to be Solved by the Invention] The present invention solves the above problems and provides a metal chelate compound suitable for film formation by a spinner method with excellent storage stability and light resistance, and an optical recording medium using the compound. The purpose is to provide the following.
[課題を解決するための手段]
本発明は下記−数式(I)
(式中、Mはニッケル、コバルト、亜鉛または銅から選
ばれる金属原子を表わし、R1は炭素数1〜12のアル
キル基を表わし、R2、R3、R4、R5およびR6は
それぞれ独立して水素原子、アルキル基、アルコキシ基
またはハロゲン原子を表わし、Xは硫黄原子または酸素
原子を表わし、2−は陰イオンを表わす。nは、2また
は3である。)で示される金属キレート化合物、および
該化合物を用いた光学的記録媒体をその要旨とするもの
である。[Means for Solving the Problems] The present invention has the following formula (I) (wherein M represents a metal atom selected from nickel, cobalt, zinc or copper, and R1 represents an alkyl group having 1 to 12 carbon atoms. In the formula, R2, R3, R4, R5 and R6 each independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom, X represents a sulfur atom or an oxygen atom, 2- represents an anion, and n represents an anion. , 2 or 3) and an optical recording medium using the compound.
以下、本発明につき詳細に説明する。Hereinafter, the present invention will be explained in detail.
前記−数式(I)で示される金属キレート化合物は60
0〜800 nmの波長帯域で吸収を有し、しかも分子
吸光係数が104〜106cm−’である。The metal chelate compound represented by formula (I) is 60
It has absorption in the wavelength band of 0 to 800 nm, and has a molecular extinction coefficient of 104 to 106 cm-'.
−数式(I)中、R2、R3、R4、R5およびR6と
しては水素原子;メチル基、エチル基、プロピル基、ブ
チル基、オクチル基等の直鎖状ないし分岐状のアルキル
基;メト・キシ基、エトキシ基、プロポキシ基、ブトキ
シ基、オクチルオキシ基等の直鎖状ないし分岐状のアル
コキシ基;フッ素原子、塩素原子、臭素原子、ヨウ素原
子のハロゲン原子が挙げられ、2−とじてはl−1Br
−1C1−1CIO,−1SCN−1CI04〜、PF
6−1SbF、−1BF4−1(1>5o3−1CH3
coo−1StF6−1TiF6−1B −(Q )4
等ノ陰イ!り鳴(挙げられる。- In formula (I), R2, R3, R4, R5 and R6 are hydrogen atoms; linear or branched alkyl groups such as methyl, ethyl, propyl, butyl and octyl groups; meth-oxy linear or branched alkoxy groups such as ethoxy group, propoxy group, butoxy group, octyloxy group; halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom; -1Br
-1C1-1CIO, -1SCN-1CI04~, PF
6-1SbF, -1BF4-1 (1>5o3-1CH3
coo-1StF6-1TiF6-1B-(Q)4
Tonoyin! ring (can be mentioned)
本発明の −数式(Ilで示される金属キレート化合物
の一般的合成は、たとえば、−数式(式中、R1,R2
およびR3は前記定義に同じ。)で示される化合物と、
下記−数式(II口(式中、R4は前記定義に同じ。)
で示される化合物との酸化的縮合を行ない、下記−数式
(IV)
(式中、R1、R2・R3およびR4は前記定義に同じ
。)で示される化合物を得、さらに下記−数式(V)(
式中、R6、R6・およびXは前記定義に同じ。)で示
される化合物をアルカリ存在下で反応させ、さらに下記
−数式(VI)
に″
(式中、R1、R2−R3−R4−R5−R6オヨヒX
ハ前記定義に同じ。)
で示される化合物を得る。次いで上記−数式(VI)と
下記−数式[■]
M”(Z−)2 ・・・[■]
で示される金属塩とを反応させることによって製造する
ことができる。The general synthesis of the metal chelate compound represented by the formula (Il) of the present invention is, for example,
and R3 are the same as defined above. ) and the compound shown by
Oxidative condensation is carried out with a compound represented by the following formula (II (in which R4 is the same as defined above)), and the compound represented by the following formula (IV) (wherein R1, R2, R3 and R4 are the same as defined above) ) was obtained, and the compound represented by the following formula (V) (
In the formula, R6, R6. and X are the same as defined above. ) is reacted in the presence of an alkali, and further converted into the following formula (VI) (where R1, R2-R3-R4-R5-R6
Same as above definition. ) is obtained. Then, it can be produced by reacting the above-mentioned formula (VI) with a metal salt represented by the following formula [■] M''(Z-)2 ... [■].
本発明の金属キレート化合物は光学記録媒体の色素とし
て好適に用いられるが光学記録媒体は、基本的には基板
と金属キレート化合物を含む記録層とから構成され、さ
らに必要に応じて基板上に下引き層がまた記録層上に金
属反射層、保護層等が設けられる。The metal chelate compound of the present invention is suitably used as a dye in an optical recording medium, and an optical recording medium basically consists of a substrate and a recording layer containing a metal chelate compound, and if necessary, a layer is formed on the substrate. A pull layer is also provided on the recording layer, such as a metal reflective layer, a protective layer, etc.
本発明における基板としては、使用するレーザー光に対
して透明なものが良く、基板材料の材質としては、ガラ
ス、プラスチック等の一般の記録材料の支持体が挙げら
れるが、プラスチックが種々の点から好適である。プラ
スチックとしては、アクリル樹脂、メタクリル樹脂、酢
酸ビニル樹脂、塩化ビニル樹脂、ニトロセルロース、ポ
リエチレン樹脂、ポリカーボネート樹脂、ポリアミド樹
脂、エポキシ樹脂、ポリサルホン樹脂等が挙げられる。The substrate used in the present invention is preferably one that is transparent to the laser beam used, and examples of the substrate material include supports for general recording materials such as glass and plastic, but plastic is preferable from various points of view. suitable. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, vinyl chloride resin, nitrocellulose, polyethylene resin, polycarbonate resin, polyamide resin, epoxy resin, polysulfone resin, and the like.
二の中で、高生産性、コスト、耐吸湿性の点から射出成
型ポリカーボネート樹脂基板が特に好ましい。Among the two, injection molded polycarbonate resin substrates are particularly preferred from the viewpoint of high productivity, cost, and moisture absorption resistance.
本発明の光学的記録媒体における金属キレート化合物を
含有する記録層は、膜厚10〇八〜5μm、好ましくは
700人〜3□mである。成膜法としては真空蒸着法、
スパッタリング法、ドクターブレード法、キャスト法、
スピナー法、浸漬法など一般に行なわれている薄膜形成
法で成膜することができるが、量産性、コスト面からス
ピナー法が好ましい。The recording layer containing a metal chelate compound in the optical recording medium of the present invention has a thickness of 1008 to 5 μm, preferably 700 to 3 μm. The film forming method is vacuum evaporation method,
Sputtering method, doctor blade method, casting method,
The film can be formed by a commonly used thin film forming method such as a spinner method or a dipping method, but the spinner method is preferable from the viewpoint of mass productivity and cost.
また、必要に応じてバインダーを使用することもできる
。バインダーとしては、ポリビニルアルコール、ポリビ
ニルピロリドン、ケトン樹脂、ニトロセルロース、酢酸
セルロース、ポリビニルブチラール、ポリカーボネート
など既知のものが用いられる。スピナー法により成膜の
場合、回転数は500〜5000rpmが好ましく、ス
ピンコードの後、場合によっては、加熱あるいは溶媒蒸
気にあてる等の処理を行なってもよい。Moreover, a binder can also be used if necessary. As the binder, known binders such as polyvinyl alcohol, polyvinylpyrrolidone, ketone resin, nitrocellulose, cellulose acetate, polyvinyl butyral, and polycarbonate can be used. In the case of film formation by the spinner method, the rotational speed is preferably 500 to 5000 rpm, and after the spin code, treatment such as heating or exposure to solvent vapor may be performed as the case requires.
また、記録体の安定性や耐光性向上のために、−重項酸
素クエンチャーとして遷移金属キレート化合物(たとえ
ば、アセチルアセトナートキレート、ビスフエニルジチ
オール、サリチルアルデヒドオキシム、ビスジチオ−α
−ジケトン等ンを含有していてもよい。更に、必要に応
じて他の色素を併用することができる。他の色素として
は別の種類の同系統の化合物でもよいし、トリアリール
メタン系色素、アゾ染料、シアニン系色素、スクワリリ
ウム系色素、モノアゾ化合物の金属錯体、Ni−インド
アニリン系色素等他系統の色素でもよい。In addition, to improve the stability and light resistance of the recording material, transition metal chelate compounds (e.g., acetylacetonate chelate, bisphenyldithiol, salicylaldehyde oxime, bisdithio-α) are used as heavyt oxygen quenchers.
- May contain diketones, etc. Furthermore, other dyes can be used in combination as necessary. Other dyes may be other types of compounds of the same type, or other types of dyes such as triarylmethane dyes, azo dyes, cyanine dyes, squarylium dyes, metal complexes of monoazo compounds, and Ni-indoaniline dyes. It can also be a dye.
ドクターブレード法、キャスト法、スピナー法、浸漬法
、特に、スピナル法の塗布方法により記録層を形成する
場合の塗布溶媒としては、テトラフルオロプロパツール
、オクタフルオロペンタノール、テトラクロロエタン、
プルモホルム、ジブロモエタン、ジアセトンアルコール
、エチニルセロソルブ、キシレン、3−ヒドロキシ−3
−メチル−2−ブタノン、クロロベンゼン、シクロヘキ
サノン、乳酸メチル等の沸点120〜160’Cのもの
が好適に使用される。Coating solvents used when forming a recording layer by a coating method such as a doctor blade method, a casting method, a spinner method, or a dipping method, especially the spinal method, include tetrafluoropropanol, octafluoropentanol, tetrachloroethane,
Pulmoform, dibromoethane, diacetone alcohol, ethynyl cellosolve, xylene, 3-hydroxy-3
-Methyl-2-butanone, chlorobenzene, cyclohexanone, methyl lactate and the like having a boiling point of 120 to 160'C are preferably used.
この中でも1、高生産性、コスト、耐吸湿性にすぐれる
射出成型ポリカーボネート樹脂基板に対しては、該基板
をおかすことなく、好適に使用できる溶媒として特に、
ジアセトンアルコール、3−ヒドロキシ−3−メチル−
2−ブタノン等のケトンアルコール系溶媒;メチルセル
ソルブ、エチルセルソルブ等のセルソルブ系溶媒;テト
ラフルオロプロパツール、オクタフルオロペンタノール
等のパーフルオロアルキルアルコール系溶媒;乳酸メチ
ル、イン酪酸メチル等のヒドロキシエステル系溶媒;が
挙げられる。Among these, 1. For injection molded polycarbonate resin substrates that are excellent in high productivity, cost, and moisture absorption resistance, especially as a solvent that can be suitably used without destroying the substrate,
Diacetone alcohol, 3-hydroxy-3-methyl-
Ketone alcohol solvents such as 2-butanone; Cellsolve solvents such as methyl cellosolve and ethyl cellosolve; perfluoroalkyl alcohol solvents such as tetrafluoropropanol and octafluoropentanol; hydroxyl solvents such as methyl lactate and methyl imbutyrate Examples include ester solvents.
本発明の光学記録媒体の記録層は基板の画面に設けもて
もよいし、片面だけに設けてもよい。The recording layer of the optical recording medium of the present invention may be provided on the screen of the substrate, or may be provided on only one side.
上記に様にして得られた記録媒体への記録は、基板両面
または、片面に設けた記録層にIAtm程度に集束した
レーザー光、好ましくは、半導体レーザーの光をあてる
ことにより行なう。レーザー光の照射された部分には、
レーザーエネルギーの吸収による、分解、蒸発、溶解等
の記録層の熱的変形が起こる。Recording on the recording medium obtained as described above is carried out by irradiating the recording layer provided on both sides or one side of the substrate with laser light, preferably semiconductor laser light, focused to about IAtm. The area irradiated with the laser light is
Thermal deformation of the recording layer, such as decomposition, evaporation, and melting, occurs due to absorption of laser energy.
記録された情報の再生は、レーサー光により、熱的変形
が起きている部分と起きていない部分の反射率の差を読
み取ることにより行なう。The recorded information is reproduced by using a laser beam to read the difference in reflectance between a portion where thermal deformation has occurred and a portion where no thermal deformation has occurred.
本発明の光学記録媒体について使用されるレーザー光は
N2、He−Cd、 Ar、 He−Ne、ルビー半導
体、色素レーザーなどのが挙げられる。Laser beams used for the optical recording medium of the present invention include N2, He--Cd, Ar, He--Ne, ruby semiconductor, and dye lasers.
[実施例]
以下、実施例によりこの発明を具体的に説明するが、か
かる実施例は本発明を限定するのもではない。[Examples] Hereinafter, the present invention will be specifically explained with reference to Examples, but these Examples do not limit the present invention.
実施例1
(a)化合物製造例
下記−数式
で表わされる化合物1.8gおよび下記構造式で表わさ
れる化合物2.14 gとを水60m1、メタノール1
40m1に混合し、25〜30°Cの温度で、この溶液
にLFe (CN )614.48 g、メタノール1
00m1、水100m1および25%アンモニア水20
m1の混合溶液を滴下した。室温で3時間撹拌したのち
、沈殿物を濾過し、下記−数式
で表わされる化合物を得た。Example 1 (a) Example of compound production: 1.8 g of the compound represented by the following formula and 2.14 g of the compound represented by the following structural formula were added to 60 ml of water and 1 ml of methanol.
614.48 g of LFe(CN), 1 methanol were added to this solution at a temperature of 25-30 °C.
00ml, 100ml of water and 20ml of 25% ammonia water
A mixed solution of ml was added dropwise. After stirring at room temperature for 3 hours, the precipitate was filtered to obtain a compound represented by the following formula.
次いで得られた化合物2.0gを400 mlエタノー
ルと混合し、加熱、環流させながら、下記構造式で表わ
される2−アミノ−チオフェノール1.42 g水酸化
カリウム0.75gおよびエタノール80m1の混合物
を滴下した。3時間環流下にて反応させ、室温まで冷却
の後、水中1.2eへ排出、濾過、水洗い、下記構造式
で表わされる化合物を得た。Next, 2.0 g of the obtained compound was mixed with 400 ml of ethanol, and while heating and refluxing, a mixture of 1.42 g of 2-amino-thiophenol represented by the following structural formula, 0.75 g of potassium hydroxide, and 80 ml of ethanol was added. dripped. The reaction was carried out under reflux for 3 hours, and after cooling to room temperature, the mixture was discharged into 1.2e water, filtered, and washed with water to obtain a compound represented by the following structural formula.
次いで、上記で得た1、84gをテトラヒドロフラン1
00m1に溶解させ、室温にて下記構造式%式%)
で表わされるニッケル塩の40%水溶液5.Ogを添加
し、−昼夜室温にて撹拌した後、析出結晶を消散で表わ
される金属キレート化合物(No、1)を得た。Next, 1.84g of the above obtained was added to 1.84g of tetrahydrofuran.
5. A 40% aqueous solution of a nickel salt represented by the following structural formula (%) at room temperature. After adding Og and stirring at room temperature day and night, a metal chelate compound (No. 1) represented by dissipation of precipitated crystals was obtained.
本品のλmax (クロロホルム中)は680nmであ
り、分子吸光係数(ε)は6.2 X 104であった
。The λmax (in chloroform) of this product was 680 nm, and the molecular extinction coefficient (ε) was 6.2×104.
(b)光学的記録媒体製造例
前記製造例(a)で得た金属キレート化合物0.3 g
をオクタフルオロペンタノール7.5gに溶解し、0.
22μmのフィルターでろ過し、溶解液を得た。この溶
液5mlを深さ700人、幅0.7□mの溝(グループ
)つき、射出成型ポリカーボネート樹脂基板(直径5イ
ンチ)上に滴下し、スピナー法により500rpmの回
転数で塗布した。塗布後、60°Cで10分間乾燥した
。塗布膜の最大吸収波長は658nmであった。(b) Optical recording medium production example 0.3 g of the metal chelate compound obtained in the above production example (a)
was dissolved in 7.5 g of octafluoropentanol, and 0.
The solution was filtered through a 22 μm filter to obtain a solution. 5 ml of this solution was dropped onto an injection molded polycarbonate resin substrate (5 inches in diameter) with grooves (groups) 700 mm deep and 0.7 □m wide, and coated using a spinner at a rotation speed of 500 rpm. After coating, it was dried at 60°C for 10 minutes. The maximum absorption wavelength of the coating film was 658 nm.
第1図に、塗布膜の吸収スペクトルを示す。スペクトル
の形状は幅広がった。FIG. 1 shows the absorption spectrum of the coating film. The shape of the spectrum broadened.
(C)光記録法
上記記録媒体を1.2m/sで回転させながら、中心波
長633 nmのHe −Neレーサー光で、記録パワ
ー7.0mWで照射したところ、輪郭の極めて明瞭なピ
ットが形成された。(C) Optical recording method When the above recording medium was rotated at 1.2 m/s and irradiated with a He-Ne laser beam with a center wavelength of 633 nm and a recording power of 7.0 mW, pits with extremely clear outlines were formed. It was done.
得られた光ディスクは、耐光性(キセノンフェードメー
ター加速テスl−;60時間)及び保存安定性(700
C185%RH;500時間ン試験を行った結果、初期
と比べて感度および再生信号の劣化はみられず、光学的
記録媒体としてきわめて優れたものであった。The obtained optical disc had light resistance (xenon fade meter acceleration test l-; 60 hours) and storage stability (700 hours).
C185%RH; As a result of a 500 hour test, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be an extremely excellent optical recording medium.
実施例2
(a)化合物製造例
実施例1において下記構造式
で表わされる化合物1.87 gを用いたこと以外は実
施例1と同様に行ない、下記構造式で表わされる金属本
化合物の可視部吸収スペクトル(クロロホルム中)はλ
max 682 nmであった。Example 2 (a) Compound Production Example The same procedure as Example 1 was carried out except that 1.87 g of the compound represented by the following structural formula was used in Example 1, and the visible part of the metal main compound represented by the following structural formula was prepared in the same manner as in Example 1. The absorption spectrum (in chloroform) is λ
The maximum wavelength was 682 nm.
(b)光学的記録媒体製造例
前記製造例(a)で得た金属キレート化合物0.15
gをテトラフルオロプロパツール7.5gに溶解し、0
.22μmのフィルターでろ過し、溶解液を得た。この
溶液5mlを深さ700人、幅0.7□mの溝(グルー
プ)つき、射出成型ポリカーボネート樹脂基板(直径5
インチ)上に滴下し、スピナー法により500rpmの
回転数で塗布した。塗布後、60°Cで10分間乾燥し
た。塗布膜の最大吸収波長は689nmで、スペクトル
の形状は巾広であった。(b) Optical recording medium production example Metal chelate compound obtained in the above production example (a) 0.15
g was dissolved in 7.5 g of tetrafluoropropanol, and 0
.. The solution was filtered through a 22 μm filter to obtain a solution. 5 ml of this solution was placed on an injection-molded polycarbonate resin substrate (diameter 5 mm) with grooves (groups) 700 mm deep and 0.7 m wide.
inch) and applied using a spinner at a rotation speed of 500 rpm. After coating, it was dried at 60°C for 10 minutes. The maximum absorption wavelength of the coating film was 689 nm, and the shape of the spectrum was wide.
(Cン光記録法
上記記録媒体を1.2m/sで回転させながら、中心波
長633 nmのHe−Neレーザー光で、記録パワー
8.0mWで照射したところ、輪郭の極めて明瞭なピッ
トが形成された。(C-n optical recording method When the above recording medium was rotated at 1.2 m/s and irradiated with a He-Ne laser beam with a center wavelength of 633 nm and a recording power of 8.0 mW, pits with extremely clear outlines were formed. It was done.
得られた光ディスクは、耐光性(キセノンフェードメー
ター加速テスト;60時間)及び保存安定性(70°C
185%RH;500時間)試験を行った結果、初期と
比べて感度および再生信号の劣化はみられず、光学的記
録媒体としてきわめて優れたものであった。The obtained optical disc has good light resistance (xenon fade meter accelerated test; 60 hours) and storage stability (70°C
As a result of a test (185% RH; 500 hours), no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be an extremely excellent optical recording medium.
実施例3
(a)化合物製造例
実施例1において、下記構造式
で表わされる化合物1.84gの代りに、下記構造式゛
で表わされる化合物1.90 gを用いたこと以外は、
実施例1と同様に行ない、下記構造式で表わされる金属
キレート化合物(NO,3)を得た。Example 3 (a) Compound production example In Example 1, except that 1.90 g of the compound represented by the following structural formula was used instead of 1.84 g of the compound represented by the following structural formula.
A metal chelate compound (NO, 3) represented by the following structural formula was obtained in the same manner as in Example 1.
本化合物の可視部吸収スペクトル(クロロホルム中)は
λmax 683 nmであった。The visible absorption spectrum (in chloroform) of this compound was λmax 683 nm.
(b)光学的記録媒体製造例
前記製造例(a)で得た金属キレート化合物0.15
gを3−ヒドロキシ−3−メチル−2−ブタノン7.5
gに溶解し、0.22μmのフィルターでろ過し、溶解
液を得た。この溶液5 mlを深さ700A、幅0.7
μmのグループつき、射出成型ポリカーボネート樹脂基
板(直径5インチ)上に滴下し、スピナー法により50
0rpmの回転数で塗布した。塗布後、60’Cで10
分間乾燥した。塗布膜の最大吸収波長は689nmで、
スペクトルの形状は巾広であった。(b) Optical recording medium production example Metal chelate compound obtained in the above production example (a) 0.15
g to 3-hydroxy-3-methyl-2-butanone 7.5
g and filtered through a 0.22 μm filter to obtain a solution. Transfer 5 ml of this solution to a depth of 700 A and a width of 0.7
A droplet was placed on an injection-molded polycarbonate resin substrate (5 inches in diameter) with a group of μm, and 50 μm was added using a spinner method.
Coating was performed at a rotation speed of 0 rpm. After application, 10 at 60'C
Dry for a minute. The maximum absorption wavelength of the coating film is 689 nm,
The shape of the spectrum was broad.
(e)光記録法
上記記録媒体を1.2m/sで回転させながら、中心波
長670nmの半導体レーザー光で、記録パワー5.0
mWで照射したところ、輪郭の明瞭なピットが形成され
た。(e) Optical recording method While rotating the recording medium at 1.2 m/s, a semiconductor laser beam with a center wavelength of 670 nm is used to record at a recording power of 5.0.
When irradiated with mW, pits with clear outlines were formed.
得られた光ディスクは、耐光性(キセノンフェードメー
ター加速テスト:60時間)及び保存安定性(70°C
185%RH;500時間)試験を行った結果、初期と
比べて感度および再生信号の劣化はみられず、光学的記
録媒体としてきわめて優れたものであった。The obtained optical disc has excellent light resistance (xenon fade meter accelerated test: 60 hours) and storage stability (70°C
As a result of a test (185% RH; 500 hours), no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be an extremely excellent optical recording medium.
実施例4
実施例1において、下記構造式
で表わされる化合物1.84gの代りに、下記構造式で
表わされる化合物1.95gを用いたこと以外は、実施
例1と同様に行ない、下記構造式で表わされる本化合物
の可視部吸収スペクトル(クロロホルム中)はλmax
680 nmであった。Example 4 The same procedure as in Example 1 was carried out except that 1.95 g of the compound represented by the following structural formula was used instead of 1.84 g of the compound represented by the following structural formula, and the compound represented by the following structural formula was The visible absorption spectrum (in chloroform) of this compound is expressed by λmax
It was 680 nm.
(b)光学的記録製造例
前記製造例(a)で得た金属キレート化合物0.15g
をオクタフルオロペンタノール7.5gに溶解し、0.
22μmのフィルターでろ過し、溶解液を得た。この溶
液5 mlを深さ700人、幅0,7□mの溝(グルー
プ)つき、射出成型ポリカーボネート樹脂基板(直径5
インチ)上に滴下し、スピナー法により500rpmの
回転数で塗布した。塗布後、60°Cで10分間乾燥し
た。塗布膜の最大吸収波長は685nmであった。(b) Optical recording manufacturing example 0.15 g of the metal chelate compound obtained in the above manufacturing example (a)
was dissolved in 7.5 g of octafluoropentanol, and 0.
The solution was filtered through a 22 μm filter to obtain a solution. 5 ml of this solution was placed on an injection molded polycarbonate resin substrate (5 ml in diameter) with grooves (groups) 700 m deep and 0.7 m wide.
inch) and applied using a spinner at a rotation speed of 500 rpm. After coating, it was dried at 60°C for 10 minutes. The maximum absorption wavelength of the coating film was 685 nm.
(c)光記録法
上記記録媒体を1.2m/sで回転させながら、中心波
長670 nmの半導体レーザー光で、記録パワー5.
0mWで照射したところ、輪郭の極めて明瞭なピットが
形成された。(c) Optical recording method While rotating the recording medium at 1.2 m/s, a semiconductor laser beam with a center wavelength of 670 nm was used to record at a recording power of 5.
When irradiated with 0 mW, pits with extremely clear outlines were formed.
得られた光ディスクは、耐光性(キセノンフェードメー
ター加速テスト;60時間)及び保存安定性(70°C
185%RH;500時間)試験を行った結果、初期と
比べて感度および再生信号の劣化はみられず、光学的記
録媒体としてきわめて優れたものであった。The obtained optical disc has good light resistance (xenon fade meter accelerated test; 60 hours) and storage stability (70°C
As a result of a test (185% RH; 500 hours), no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be an extremely excellent optical recording medium.
前記実施例で用いた化合物の信奉発明の光学的記録媒体
に好適に使用される金属キレート化合物の具体的を第1
表に示す。The following describes the specific metal chelate compounds preferably used in the optical recording medium of the invention.
Shown in the table.
[発明の効果]
本発明の金属キレート化合物は保存安定性および耐光性
にすぐれ、スピナー法による成膜に適したものであり、
該化合物を用いた光学的記録媒体は工業的に極めて有用
なものである。[Effects of the Invention] The metal chelate compound of the present invention has excellent storage stability and light resistance, and is suitable for film formation by a spinner method.
Optical recording media using this compound are extremely useful industrially.
第1図は、本発明の金属キレート化合物(実施例1で得
られたもの)の溶液中の可視部吸収スペクトルを表わす
図面であり、縦軸は吸光度、横軸波長(nm)を表わす
。FIG. 1 is a drawing showing the visible region absorption spectrum of the metal chelate compound of the present invention (obtained in Example 1) in a solution, where the vertical axis represents absorbance and the horizontal axis represents wavelength (nm).
Claims (2)
ばれる金属原子を表わし、R^1は炭素数1〜12のア
ルキル基を表わし、R^2、R^3、R^4、R^5お
よびR^6はそれぞれ独立して水素原子、アルキル基、
アルコキシ基またはハロゲン原子を表わし、Xは硫黄原
子または酸素原子を表わし、Z−は陰イオンを表わす。 nは、2または3である。)で示される金属キレート化
合物。(1) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼... [I] (In the formula, M represents a metal atom selected from nickel, cobalt, zinc or copper, and R^1 is carbon Represents an alkyl group of numbers 1 to 12, and R^2, R^3, R^4, R^5 and R^6 each independently represent a hydrogen atom, an alkyl group,
It represents an alkoxy group or a halogen atom, X represents a sulfur atom or an oxygen atom, and Z- represents an anion. n is 2 or 3. ) metal chelate compound.
または読み取りが可能な記録層が設けられた光学的記録
媒体において、該記録層が特許請求の範囲第1項記載の
金属キレート化合物を含有することを特徴とする光学的
記録媒体。(2) Writing information on the board using a laser and/or
Alternatively, an optical recording medium provided with a readable recording layer, wherein the recording layer contains the metal chelate compound according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2331672A JP2993117B2 (en) | 1990-11-29 | 1990-11-29 | Metal chelate compound and optical recording medium using the compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2331672A JP2993117B2 (en) | 1990-11-29 | 1990-11-29 | Metal chelate compound and optical recording medium using the compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04202260A true JPH04202260A (en) | 1992-07-23 |
JP2993117B2 JP2993117B2 (en) | 1999-12-20 |
Family
ID=18246297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2331672A Expired - Fee Related JP2993117B2 (en) | 1990-11-29 | 1990-11-29 | Metal chelate compound and optical recording medium using the compound |
Country Status (1)
Country | Link |
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JP (1) | JP2993117B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6218072B1 (en) * | 1997-11-20 | 2001-04-17 | Taiyo Yuden Co., Ltd. | Optical information recording medium |
-
1990
- 1990-11-29 JP JP2331672A patent/JP2993117B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6218072B1 (en) * | 1997-11-20 | 2001-04-17 | Taiyo Yuden Co., Ltd. | Optical information recording medium |
Also Published As
Publication number | Publication date |
---|---|
JP2993117B2 (en) | 1999-12-20 |
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