JPH04196149A - Method of recognizing semiconductor wafer - Google Patents

Method of recognizing semiconductor wafer

Info

Publication number
JPH04196149A
JPH04196149A JP2321802A JP32180290A JPH04196149A JP H04196149 A JPH04196149 A JP H04196149A JP 2321802 A JP2321802 A JP 2321802A JP 32180290 A JP32180290 A JP 32180290A JP H04196149 A JPH04196149 A JP H04196149A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
recognized
manufacturing equipment
semiconductor
semiconductor manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2321802A
Other languages
Japanese (ja)
Inventor
Masakuni Shiozawa
雅邦 塩澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2321802A priority Critical patent/JPH04196149A/en
Publication of JPH04196149A publication Critical patent/JPH04196149A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To contrive a space-saving and an improvement in precision of a location recognition by a method wherein wafers are recognized by moving a photoelectric type sensor in which the wafers are secured to a semiconductor manufacturing equipment. CONSTITUTION:A processing jig 1 receiving a semiconductor wafer 2 is secured to a semiconductor manufacturing equipment. A photoelectric type sensor 6 is fitted into a stage 7 and moves in the moving directions 13, 14. A driving shaft 9 is rotated by a driving motor 10 to move the stage 7. A reference plate 3 is fitted into a blacket 5 through a spacer 4 and secured to the semiconductor manufacturing equipment. Thus, the photoelectric type sensor 6 is moved, whereby the wafer 2 can be recognized to contrive to space-save the semiconductor manufacturing equipment. Moreover, after the reference plate 3 is recognized by the sensor 6, the wafer 2 is successively recognized and it is possible to read a location of the wafer from the plate 3 as a moving distance of the sensor 6.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体製造装置などに用いる、半導体ウェハ
の認識方法に関する [従来の技術] 従来の技術としては、第3図、第4図に示す如き半導体
ウェハの認識方法であった。即ち、第3図において、1
は処理用治具、2は1の処理用治具に納められている半
導体ウェハ、18は処理用治具1を載せて移動するステ
ージ、15.16はステージ18が水平移動する為の軌
道レール、9はステージ18を水平移動させる駆動軸、
11.12は駆動軸9をサポートするホルダー、10は
駆動軸9に回転を与える駆動モータ、6は半導体ウェハ
2を認識する為の光電式センサー、17は光電式センサ
ー6を保持するブラケット、13゜14はステージ18
の移動方向であり、光電式センサー6を固定させ、処理
用治具1を移動させて半導体ウェハ2を認識するもので
ある。第4図においても第3図同様に処理用治具1を移
動させて半導体ウェハ2をブラケット20に取り付けら
れ固定されたカメラ19で認識するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor wafer recognition method used in semiconductor manufacturing equipment, etc. [Prior Art] The conventional technology is shown in FIGS. 3 and 4. This was a method for recognizing semiconductor wafers as shown in the figure. That is, in FIG. 3, 1
1 is a processing jig, 2 is a semiconductor wafer contained in the processing jig 1, 18 is a stage on which the processing jig 1 is placed, and 15.16 is a track rail for horizontal movement of the stage 18. , 9 is a drive shaft for horizontally moving the stage 18;
11.12 is a holder that supports the drive shaft 9; 10 is a drive motor that rotates the drive shaft 9; 6 is a photoelectric sensor for recognizing the semiconductor wafer 2; 17 is a bracket that holds the photoelectric sensor 6;゜14 is stage 18
The photoelectric sensor 6 is fixed, the processing jig 1 is moved, and the semiconductor wafer 2 is recognized. Similarly to FIG. 3, in FIG. 4, the processing jig 1 is moved and the semiconductor wafer 2 is recognized by the camera 19 attached and fixed to the bracket 20.

[発明が解決しようとする課題] しかしながら、前述の従来技術にあっては、半導体ウェ
ハ2が納められた距離の移動を行わなければならず、半
導体製造装置においてスペースを大きくとらなければな
らない問題を有する。
[Problems to be Solved by the Invention] However, in the above-mentioned conventional technology, the semiconductor wafer 2 has to be moved by the distance that it is stored, which causes the problem that it requires a large space in the semiconductor manufacturing equipment. have

また第3図においては、光電式センサー6を取り外した
場合に、半導体製造装置の基準位置に対して、認識され
た半導体ウェハ2の位置が不安定になってしまう問題が
ある。さらに第4図においては、半導体ウェハ2が製造
工程の処理において色調が変わり、カメラ19で半導体
ウェハ2を認識できないという問題を有する。  そこ
で本発明はこのような問題点を解決するもので、その目
的は、半導体製造装置において、省スペースであり、光
電式センサーの取り外し後も基準位置対して認識された
半導体ウェハの位置が一定であり、又製造工程の前後に
おいても安定して行える半導体ウェハの認識方法を提供
するものである。
Furthermore, in FIG. 3, there is a problem in that when the photoelectric sensor 6 is removed, the recognized position of the semiconductor wafer 2 becomes unstable with respect to the reference position of the semiconductor manufacturing apparatus. Furthermore, in FIG. 4, there is a problem that the color tone of the semiconductor wafer 2 changes during the manufacturing process, and the camera 19 cannot recognize the semiconductor wafer 2. The present invention is intended to solve these problems.The purpose of the present invention is to save space in semiconductor manufacturing equipment, and to maintain the recognized position of the semiconductor wafer with respect to the reference position even after the photoelectric sensor is removed. The present invention also provides a semiconductor wafer recognition method that can be performed stably before and after the manufacturing process.

[課題を解決するための手段] 本発明の半導体ウェハの認識方法は半導体製造装置にお
ける、搬送ケース及び処理用治具に納められている半導
体ウェハの認識方法において、前記搬送ケース及び処理
用治具を固定さぜ、光電式センサーを移動させることに
よって、半導体ウェハな認識することを特徴とする。
[Means for Solving the Problems] A method for recognizing a semiconductor wafer of the present invention is a method for recognizing a semiconductor wafer housed in a transport case and a processing jig in a semiconductor manufacturing apparatus. The semiconductor wafer is recognized by fixing the wafer and moving the photoelectric sensor.

[実施例] 以下に本発明の実施例を図面に基づいて説明する。第1
図は、半導体ウェハの認識方法を示す平面図であり、第
2図は、第1図の断面図である。
[Example] Examples of the present invention will be described below based on the drawings. 1st
The figure is a plan view showing a method for recognizing a semiconductor wafer, and FIG. 2 is a sectional view of FIG. 1.

第1図において、半導体ウェハ2を納めた処理用治具1
が半導体製造装置に固定されている。光電式センサー6
はステージ7に取り付けられ、軌道レール8に案内され
ステージ7と共に移動方向13.14に移動する。ホル
ダー11.12に保持される駆動軸9は、駆動モーター
10によって回転させられ、ステージ7を移動させる。
In FIG. 1, a processing jig 1 containing a semiconductor wafer 2 is shown.
is fixed to semiconductor manufacturing equipment. Photoelectric sensor 6
is attached to the stage 7, guided by the track rail 8, and moves together with the stage 7 in the movement direction 13.14. A drive shaft 9 held in a holder 11.12 is rotated by a drive motor 10 and moves the stage 7.

又ホルダー11.12、及び軌道レール8は、ベース2
1に取り付けられている。基準プレート3は、スペーサ
4を介してブラケット5に取り付けられて半導体製造装
置に固定されている。この様に光電式センサー6を移動
させることで半導体ウェハ2を認識することが可能であ
り半導体製造装置の省スペース化が図られる。
Furthermore, the holders 11, 12 and the track rail 8 are attached to the base 2.
It is attached to 1. The reference plate 3 is attached to a bracket 5 via a spacer 4 and is fixed to semiconductor manufacturing equipment. By moving the photoelectric sensor 6 in this manner, the semiconductor wafer 2 can be recognized, and the space of the semiconductor manufacturing apparatus can be saved.

又半導体製造装置に固定されている基準プレート3を光
電式センサー6で認識した後半導体ウェハ2を順次認識
し、基準プレート3からの半導体ウェハの位置を光電式
センサー6の移動距離から読み取ることで半導体製造装
置の基準位置からの半導体ウェハ2の各々の距離を読み
取ることができ、光電式センサー6を交換した場合でも
安定して正確な距離を読み取ることができる。
Further, the reference plate 3 fixed to the semiconductor manufacturing equipment is recognized by the photoelectric sensor 6, and then the semiconductor wafers 2 are sequentially recognized, and the position of the semiconductor wafer from the reference plate 3 is read from the distance traveled by the photoelectric sensor 6. The distance of each semiconductor wafer 2 from the reference position of the semiconductor manufacturing apparatus can be read, and even when the photoelectric sensor 6 is replaced, the distance can be read stably and accurately.

ざらに光電式センサー6を用いることで製造工程におけ
る半導体ウェハの色調に影響されることがない。
By using the photoelectric sensor 6, it is not affected by the color tone of the semiconductor wafer during the manufacturing process.

[発明の効果] 以上述べた様に本発明によれば、半導体ウェハを収納し
た搬送ケース及び処理用治具を半導体製造装置に固定し
、光電式センサーを移動させることで半導体ウェハを認
識することにより、半導体製造装置の省スペース化が図
れるとともに、光電式センサーを交換した場合でも半導
体ウェハの位置認識が確実に行える。さらに光電式セン
サーで認識することで半導体ウェハの色調にも影響され
ない。またかかる半導体ウェハの認識方法により半導体
製造装置での半導体ウェハの移載においても確実な作業
ができるメリットを有する。
[Effects of the Invention] As described above, according to the present invention, the transport case containing the semiconductor wafer and the processing jig are fixed to the semiconductor manufacturing equipment, and the semiconductor wafer can be recognized by moving the photoelectric sensor. As a result, the space of the semiconductor manufacturing equipment can be saved, and the position of the semiconductor wafer can be reliably recognized even when the photoelectric sensor is replaced. Furthermore, since it is recognized using a photoelectric sensor, it is not affected by the color tone of the semiconductor wafer. Further, this semiconductor wafer recognition method has the advantage that reliable work can be performed when transferring semiconductor wafers in semiconductor manufacturing equipment.

【図面の簡単な説明】[Brief explanation of the drawing]

第11図は、本発明の半導体ウェハの認識方法を示す平
面図。第2図は、第1図の断面図である。 第3図は、従来の半導体ウェハの認識方法を示す平面図
。第4図は、他の従来の半導体ウェハの認識方法を示す
平面図である。 1・・・処理用治具 2・・・半導体ウェハ 3・・・基準プレート 4・・・スペーサ 5・・・ブラケット 6・・・光電式センサー 7・・・ステージ 8・・・軌道レール 9・・・駆動軸 10・・・駆動モーター 11.12・・・ホルダー 13.14・・・移動方向 15.16・・・軌道レール 17・・・ブラケット 18・・・ステージ 19・・・カメラ 2o・・・ブラケット 21・・・ベース 以上 出願人 セイコーエプソン株式会社
FIG. 11 is a plan view showing the semiconductor wafer recognition method of the present invention. FIG. 2 is a sectional view of FIG. 1. FIG. 3 is a plan view showing a conventional semiconductor wafer recognition method. FIG. 4 is a plan view showing another conventional semiconductor wafer recognition method. 1... Processing jig 2... Semiconductor wafer 3... Reference plate 4... Spacer 5... Bracket 6... Photoelectric sensor 7... Stage 8... Track rail 9. ... Drive shaft 10 ... Drive motor 11.12 ... Holder 13.14 ... Movement direction 15.16 ... Track rail 17 ... Bracket 18 ... Stage 19 ... Camera 2o. ...Bracket 21...Base or above Applicant Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims] 半導体製造装置における、搬送ケース及び処理用治具に
納められている半導体ウェハの認識方法において、前記
搬送ケース及び処理用治具を固定させ、光電式センサー
を移動させることによつて、半導体ウェハを認識するこ
とを特徴とする半導体ウェハの認識方法
In a method for recognizing semiconductor wafers housed in a transport case and a processing jig in semiconductor manufacturing equipment, the semiconductor wafer is recognized by fixing the transport case and processing jig and moving a photoelectric sensor. A semiconductor wafer recognition method characterized by recognition
JP2321802A 1990-11-26 1990-11-26 Method of recognizing semiconductor wafer Pending JPH04196149A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2321802A JPH04196149A (en) 1990-11-26 1990-11-26 Method of recognizing semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2321802A JPH04196149A (en) 1990-11-26 1990-11-26 Method of recognizing semiconductor wafer

Publications (1)

Publication Number Publication Date
JPH04196149A true JPH04196149A (en) 1992-07-15

Family

ID=18136577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2321802A Pending JPH04196149A (en) 1990-11-26 1990-11-26 Method of recognizing semiconductor wafer

Country Status (1)

Country Link
JP (1) JPH04196149A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100286335B1 (en) * 1998-04-09 2001-05-02 김영환 Orienting apparatus for semiconductor wafer manufacturing implanter
JP2013531379A (en) * 2010-06-29 2013-08-01 セントロターム・サーマル・ソルーションズ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンデイトゲゼルシヤフト Apparatus and method for calibrating a wafer transfer robot

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100286335B1 (en) * 1998-04-09 2001-05-02 김영환 Orienting apparatus for semiconductor wafer manufacturing implanter
JP2013531379A (en) * 2010-06-29 2013-08-01 セントロターム・サーマル・ソルーションズ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング・ウント・コンパニー・コマンデイトゲゼルシヤフト Apparatus and method for calibrating a wafer transfer robot

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