JPH04195810A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH04195810A JPH04195810A JP32272990A JP32272990A JPH04195810A JP H04195810 A JPH04195810 A JP H04195810A JP 32272990 A JP32272990 A JP 32272990A JP 32272990 A JP32272990 A JP 32272990A JP H04195810 A JPH04195810 A JP H04195810A
- Authority
- JP
- Japan
- Prior art keywords
- tape
- sliding
- area
- head
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 17
- 239000010408 film Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims 1
- 230000003292 diminished effect Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000011162 core material Substances 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 3
- 238000003754 machining Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、VTR等の磁気記録再生装置に使用する薄膜
磁気ヘッドに係り、テープ当接を良好にし、さらに、薄
膜コイルの抵抗の低減を図った薄膜磁気ヘッドに関する
。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a thin film magnetic head used in magnetic recording and reproducing devices such as VTRs, which improves tape contact and further reduces the resistance of the thin film coil. The present invention relates to a thin film magnetic head.
従来、薄膜磁気ヘッドとしては、例えば特開平1182
907号公報に記載の様に、非磁性基板上に下部磁気コ
ア、信号コイル、コイル絶縁材を形成した後、下部磁気
コアと磁気回路を形成するように上部磁気コアを形成し
、さらに保護膜を成膜した後ヘツド素子毎に切断したも
のがあげられる。Conventionally, as a thin film magnetic head, for example, Japanese Patent Application Laid-Open No. 1182
As described in Publication No. 907, after forming a lower magnetic core, a signal coil, and a coil insulating material on a nonmagnetic substrate, an upper magnetic core is formed to form a magnetic circuit with the lower magnetic core, and a protective film is further formed. An example of this method is to form a film and then cut it into individual head elements.
第7図は、この従来技術により形成したヘッドの平面図
である。FIG. 7 is a plan view of a head formed by this conventional technique.
1は非磁性基板、6は信号コイル、7は上部磁気コア、
9は摺動幅規定用加工位置、Wはヘッド摺動幅、Twは
トラック幅である。テープとヘッドとの摺動性を良好に
するため、ヘッド摺動幅Wは狭い方が良い。従来は、信
号コイル6を切らない様に、コイル外周部から摺動面に
向がって狭くなる構造になっていた。1 is a non-magnetic substrate, 6 is a signal coil, 7 is an upper magnetic core,
9 is a processing position for defining the sliding width, W is the head sliding width, and Tw is the track width. In order to improve the slidability between the tape and the head, the head sliding width W is preferably narrower. Conventionally, in order to avoid cutting the signal coil 6, the structure was such that it became narrower from the outer periphery of the coil toward the sliding surface.
しかしながら、上記従来技術の摺動幅加工方法は、テー
プ摺動後ヘツドが摩耗し摺動幅が広がることにより、テ
ープ当接が悪くなるのを防ぐため、加工位t9のテーパ
ー角を最大でも60”までとしていた、このため、第8
図に示した様に、さらに摺動幅Wを狭くする場合、コイ
ルが切断されない様にコイルの形成領域を小さくしなけ
ればならず、コイル抵抗が大きくなるという問題があっ
た6また、摺動面の摩耗による摺動幅の広がりは、テー
パー角が小さい方が少なくなるが、従来はコイル形成領
域が小さくなりコイル抵抗が上がることを考慮すると最
小でも30°が限界となっており、経時的に良好なテー
プ当接を得ることが難しくなっていた。However, in the conventional sliding width processing method described above, in order to prevent tape contact from worsening due to wear of the head after tape sliding and widening of the sliding width, the taper angle at the processing position t9 is set at a maximum of 60°. For this reason, the 8th
As shown in the figure, when the sliding width W was further narrowed, the area where the coil was formed had to be made smaller to prevent the coil from being cut, which caused the problem of increased coil resistance6. The wider the sliding width due to surface wear is, the smaller the taper angle is, the smaller the taper angle, but in the past, the minimum limit was 30°, considering that the coil formation area became smaller and the coil resistance increased. It has become difficult to obtain good tape contact.
本発明は、摺動幅Wを狭くしてもコイル形成領域を確保
し抵抗を上げないことを目的としており、さらにテープ
摺動によるヘッド摺動幅の変化が小さい構造にすること
によって、経時的に良好なテープ当接を得ることを目的
とする。The purpose of the present invention is to secure a coil formation area and not increase resistance even if the sliding width W is narrowed. Furthermore, by creating a structure in which changes in the head sliding width due to tape sliding are small, it is possible to The purpose is to obtain good tape contact.
」二記目的を達成するために、ヘッドフロント部を、テ
ープ摺動面から少なくともギャップデプス零位までのテ
ーパー角θ1とそれにより後方のテーパー角02の大き
さがOl〈θ2の関係となる様に加工を行なうものであ
る。In order to achieve the second objective, the head front section is designed such that the taper angle θ1 from the tape sliding surface to at least the zero gap depth and the size of the rear taper angle 02 are in the relationship Ol<θ2. Processing is performed on the
また、コイル形成領域を広くとるために、ギャップデプ
ス零位より後方の加工を複数回に分けて行なうものであ
る。Further, in order to widen the coil forming area, the processing behind the zero gap depth position is performed in multiple steps.
さらに、ヘッドフロントの摺動面からギャップデプス零
位までのテーパー角01がOoとなる様に加工を行なう
ものである。Further, processing is performed so that the taper angle 01 from the sliding surface of the head front to the zero gap depth becomes Oo.
ヘッドフロント部のテープ摺動部とその後方の加工を各
々行うため、摺動幅を狭くしてもコイル形成領域は変わ
らずコイル抵抗が大きくなることがない。同様にコイル
抵抗にかかわらず摺動幅を狭くできるので、テープ当接
が良好になる。さらに、テープ摺動によるヘッド摺動幅
の変化が小さい構造であるため、テープ摺動後ヘツドが
摩耗しても初期と同様の良好なテープ当接が得られる。Since the tape sliding part of the head front part and the tape sliding part behind it are processed separately, even if the sliding width is narrowed, the coil forming area remains unchanged and the coil resistance does not increase. Similarly, since the sliding width can be narrowed regardless of the coil resistance, tape contact becomes better. Furthermore, since the structure is such that the change in head sliding width due to tape sliding is small, even if the head is worn out after tape sliding, good tape contact can be obtained as in the initial stage.
以下、本発明の実施例を図面によって説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第1図は、本発明による薄膜磁気ヘッドの平面図、第2
図は第1図の分断線A−A’に沿う断面図であって、l
は非磁性基板、2は下部磁気コア。FIG. 1 is a plan view of a thin film magnetic head according to the present invention, and FIG.
The figure is a sectional view taken along the dividing line AA' in FIG.
is a non-magnetic substrate, and 2 is a lower magnetic core.
3は下部磁気コア埋込み材、4はギャップ、5は信号コ
イル絶縁材、6は信号コイル、7は上部磁気コア、8は
保護膜、 91.92は摺動幅規定領域。3 is a lower magnetic core embedding material, 4 is a gap, 5 is a signal coil insulating material, 6 is a signal coil, 7 is an upper magnetic core, 8 is a protective film, 91.92 is a sliding width regulation area.
Wはヘッド摺動幅、Twはトラック幅である。W is the head sliding width, and Tw is the track width.
第1図、第2図において、磁気コアは、非磁性基板1に
形成された溝に埋め込まれた下部磁気コア2と、信号コ
イル絶縁層5と信号コイル6を介して形成された上部磁
気コア7から成る。また、上下磁気コア2,7は、絶縁
層5に開けられたリアコア接続部スルーホール及びフロ
ント部スルーホールに形成されたギャップ4を介して接
続している。尚、磁気コア材には、Co系非晶質合金を
スパッタリング等により形成している。1 and 2, the magnetic cores include a lower magnetic core 2 embedded in a groove formed in a non-magnetic substrate 1, and an upper magnetic core formed via a signal coil insulating layer 5 and a signal coil 6. Consists of 7. Further, the upper and lower magnetic cores 2 and 7 are connected via a gap 4 formed in a rear core connecting portion through hole and a front portion through hole opened in the insulating layer 5. Note that the magnetic core material is formed of a Co-based amorphous alloy by sputtering or the like.
信号コイル6は2層スパイラル構造であり、第1層目4
ターン、第2層目3ターンである。尚、コイルはCrを
接合層としてCuを蒸着等により形成している。The signal coil 6 has a two-layer spiral structure, with the first layer 4
Turn, 2nd layer 3 turns. Note that the coil is formed by evaporating Cu using Cr as a bonding layer.
上部磁気コア7の上層には、フォルステライト等の絶縁
材をスパッタリングや蒸着により形成している。An insulating material such as forsterite is formed on the upper layer of the upper magnetic core 7 by sputtering or vapor deposition.
以上の工程の後、機械加工により各ヘッド毎に切断する
。さらに、摺動幅規定領域91.92に沿って加工を行
う。この時、領域91は、上下磁気コアを切断しない幅
で、テープ摺動面がら少なくともギャップデプス零位ま
でとし、テーパー角θ1は、経時的なテープ摺動性を良
好にするためには小さい方が好ましい。また領域92は
、コイル最外周部に接しない形状で、テーパー角o2は
θ1より大きく、さらに、第3図に示した様にテープに
慴動じた際、湾曲したテープ10に点Bがあたらない形
状であれば良い。After the above steps, each head is cut by machining. Further, processing is performed along the sliding width defining regions 91 and 92. At this time, the region 91 has a width that does not cut the upper and lower magnetic cores, and the tape sliding surface extends to at least the zero gap depth, and the taper angle θ1 is set to be as small as possible in order to improve the tape sliding properties over time. is preferred. Further, the region 92 has a shape that does not touch the outermost circumference of the coil, the taper angle o2 is larger than θ1, and furthermore, when the tape moves as shown in FIG. 3, the point B does not hit the curved tape 10. Any shape is fine.
本実施例によれば、コイル形成領域を小さくせずに摺動
幅を狭くできるため、コイル抵抗を増加することなしに
良好なテープ当接を得ることができる。According to this embodiment, since the sliding width can be narrowed without reducing the coil forming area, good tape contact can be obtained without increasing the coil resistance.
第4図は、本発明の第2の実施例を示す薄膜磁気ヘッド
の平面図であり、第1図と同一部分は同一番号で示した
。第4図においてヘッド摺動部の領域91までの工程は
第1の実施例と同一であるので省略する。領域92は、
テーパー角θ1で加工した領域91より後方の点C1か
ら点C3までを示し、点C1から点C2,点C2から点
C3までの2回に分けて加工を行っている。この時点C
2は摺動面側に出る形の角を形成する構造にし、第1の
実施例と同様に点C2,点C3はテープに当たらない形
状であれば良い。この他、領域92の形状(点C1,C
2,C3を結んだ形状)が多角あるいは円弧状であって
も良い。FIG. 4 is a plan view of a thin film magnetic head showing a second embodiment of the present invention, and the same parts as in FIG. 1 are designated by the same numbers. In FIG. 4, the steps up to the area 91 of the head sliding portion are the same as those in the first embodiment, and will therefore be omitted. The area 92 is
The area from point C1 to point C3 behind the region 91 processed at taper angle θ1 is shown, and the processing is performed in two steps: from point C1 to point C2 and from point C2 to point C3. At this point C
2 has a structure in which a corner protrudes from the sliding surface side, and points C2 and C3 need only have a shape that does not come into contact with the tape, as in the first embodiment. In addition, the shape of the area 92 (points C1, C
2 and C3) may be polygonal or arcuate.
本実施例によれば、第1の実施例と同様な効果に加え、
さらにコイル抵抗を低減できる。According to this embodiment, in addition to the same effects as the first embodiment,
Furthermore, coil resistance can be reduced.
第5図は、本発明の第3の実施例を示す薄膜磁気ヘッド
の平面図であり、第1図と同一部分は同一番号で示した
。本実施例は、第1の実施例においてテーパー角θ1を
Ooとしたものである。第5図において、保護膜形成ま
での工程は第1の実施例と同一であるため省略する。FIG. 5 is a plan view of a thin film magnetic head showing a third embodiment of the present invention, and the same parts as in FIG. 1 are designated by the same numbers. In this embodiment, the taper angle θ1 is set to Oo in the first embodiment. In FIG. 5, the steps up to the formation of the protective film are the same as those in the first embodiment, and are therefore omitted.
機械加工により各ヘッド毎に切断後、摺動幅規定領域9
1..92に沿って加工を行う。この時、領域91はギ
ャップデプス方向と平行な方向に加工を行う。また、領
域92のテーパー角θ2はテープ摺動時、接触しない形
状であれば良い。但し、コイル抵抗を考慮し、できるだ
け大きい方がい。After cutting each head by machining, the sliding width specified area 9
1. .. Processing is performed along 92. At this time, the region 91 is processed in a direction parallel to the gap depth direction. Further, the taper angle θ2 of the region 92 may be any shape as long as it does not come into contact with the tape when sliding. However, considering the coil resistance, it is better to make it as large as possible.
本実施例によれば、コイル形成領域を小さくせずに、摺
動幅を狭くでき、またテープ摺動後もヘッド摺動幅は変
化しないため、コイル抵抗の増加を伴うことなしに、経
時的に安定したテープ当接が得られる。According to this embodiment, the sliding width can be narrowed without reducing the coil forming area, and the head sliding width does not change even after tape sliding, so that the sliding width can be reduced over time without increasing the coil resistance. Stable tape contact can be obtained.
第6図は、本発明の第4の実施例を示す薄膜磁気ヘッド
の平面図であり、第1図と同一部分は、同一番号で示し
た。本実施例は、第2の実施例において、テーパー角θ
1を0°としたものである。FIG. 6 is a plan view of a thin film magnetic head showing a fourth embodiment of the present invention, and the same parts as in FIG. 1 are designated by the same numbers. In this embodiment, in the second embodiment, the taper angle θ
1 is taken as 0°.
第6図においてヘッド摺動部の領域91までの工程 4
は第3の実施例と同一であるので省略する。領域92は
、第2の実施例と同様に2回に分けて加工を行い、点C
2が慴動面側へ出る形の角を形成する構造にする。この
時、点C2と点C3の位置はテープに接触しない範囲で
広げることができる。この他、領域92ノ形状(点C1
,C2,C3をムスんだ形状)が多角あるいは円弧状で
あっても良い。Step 4 up to area 91 of the head sliding part in FIG.
is the same as in the third embodiment, and will therefore be omitted. The area 92 is processed in two steps as in the second embodiment, and the point C
The structure is such that a corner 2 is formed to protrude toward the sliding surface. At this time, the positions of point C2 and point C3 can be expanded within a range that does not contact the tape. In addition, the shape of area 92 (point C1
, C2, and C3) may be polygonal or arcuate.
本実施例によれば、第3の実施例と同様な効果に加え、
さらにコイル抵抗を低減できる。According to this embodiment, in addition to the same effects as the third embodiment,
Furthermore, coil resistance can be reduced.
本発明によれば、コイル形成領域がテープ摺動幅に依存
しないため、所定のコイル抵抗を保持したまま、摺動幅
を狭くでき、良好なテープ当接を得ることができる。ま
た、コイル形成領域を広げることが可能となるため、コ
イル抵抗を低減するt・
ことができる。さらに、テープ摺動によるヘラ・ド摺動
幅の変化を小さくできるため、テープ摺動後ヘツドが摩
耗しても、初期と同様に良好な摺動性が得られる。According to the present invention, since the coil forming area does not depend on the tape sliding width, the sliding width can be narrowed while maintaining a predetermined coil resistance, and good tape contact can be obtained. Furthermore, since the coil formation area can be expanded, the coil resistance can be reduced. Furthermore, since the change in the sliding width of the head due to tape sliding can be made small, even if the head is worn out after tape sliding, good sliding performance can be obtained as in the initial stage.
第1図は本発明による薄膜磁気ヘッドの一実施発明によ
る薄膜磁気ヘッドの他の実施例を示す平面図、第7図、
第8図は従来の薄膜磁気ヘッドの平面図である。
■・−・非磁性基板 2・・・下部磁気コア6・・
・信号コイル 7・・・上部磁気コア91、.92
・・・摺動幅規定領域FIG. 1 is a plan view showing one embodiment of the thin film magnetic head according to the present invention; FIG. 7 is a plan view showing another embodiment of the thin film magnetic head according to the present invention;
FIG. 8 is a plan view of a conventional thin film magnetic head. ■--Nonmagnetic substrate 2... Lower magnetic core 6...
- Signal coil 7... Upper magnetic core 91, . 92
...Sliding width specified area
Claims (1)
(4)、信号コイル(6)、絶縁層(3)、(5)、保
護膜(8)を所定の形状に形成し各ヘッド毎に切断して
成る薄膜磁気ヘッドにおいて、膜堆積方向の正面から見
てヘッドリア部側の幅より狭く形成されたヘッドフロン
ト部側の形状が、 ギャップデプス零位までの領域(91)とそれに続く後
方の領域(92)の2つから成り、かつ、領域(91)
のテーパー角(θ1)と領域(92)のテーパー角(θ
2)との間に(θ1)<(θ2)なる関係があることを
特徴とする薄膜磁気ヘッド。 2、請求項1に記載の薄膜磁気ヘッドにおいて、上記領
域(92)の形状が、摺動面側に凸で、少なくとも1個
以上の変曲点を有する多角形状あるいは円弧状であるこ
とを特徴とする薄膜磁気ヘッド。 3、請求項1または2に記載の薄膜磁気ヘッドにおいて
、 上記領域(91)のテーパー角(θ1)が0゜であるこ
とを特徴とする薄膜磁気ヘッド。[Claims] 1. Magnetic cores (2), (7), gap (4), signal coil (6), insulating layers (3), (5), and protective film (8) on substrate (1). In a thin film magnetic head that is formed into a predetermined shape and cut into each head, the shape of the front side of the head, which is narrower than the width of the rear side of the head when viewed from the front in the film deposition direction, is the zero gap depth. It consists of two areas: the area up to (91) and the area behind it (92), and the area (91)
The taper angle (θ1) of the area (92) and the taper angle (θ1) of the area (92)
2) A thin film magnetic head characterized in that there is a relationship (θ1)<(θ2). 2. The thin film magnetic head according to claim 1, wherein the shape of the region (92) is polygonal or arcuate, which is convex toward the sliding surface and has at least one inflection point. Thin film magnetic head. 3. The thin film magnetic head according to claim 1 or 2, wherein the taper angle (θ1) of the region (91) is 0°.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32272990A JPH04195810A (en) | 1990-11-28 | 1990-11-28 | Thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32272990A JPH04195810A (en) | 1990-11-28 | 1990-11-28 | Thin film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04195810A true JPH04195810A (en) | 1992-07-15 |
Family
ID=18146973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32272990A Pending JPH04195810A (en) | 1990-11-28 | 1990-11-28 | Thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04195810A (en) |
-
1990
- 1990-11-28 JP JP32272990A patent/JPH04195810A/en active Pending
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