JPH04193984A - Sealing solution and method - Google Patents
Sealing solution and methodInfo
- Publication number
- JPH04193984A JPH04193984A JP32319490A JP32319490A JPH04193984A JP H04193984 A JPH04193984 A JP H04193984A JP 32319490 A JP32319490 A JP 32319490A JP 32319490 A JP32319490 A JP 32319490A JP H04193984 A JPH04193984 A JP H04193984A
- Authority
- JP
- Japan
- Prior art keywords
- sealing
- gold
- plating
- plated
- palladium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 title claims description 20
- 238000007747 plating Methods 0.000 claims abstract description 41
- 229910052737 gold Inorganic materials 0.000 claims abstract description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 17
- 239000007769 metal material Substances 0.000 claims abstract description 14
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052802 copper Inorganic materials 0.000 claims abstract description 12
- 239000010949 copper Substances 0.000 claims abstract description 12
- 229910052742 iron Inorganic materials 0.000 claims abstract description 11
- 235000019271 petrolatum Nutrition 0.000 claims abstract description 9
- 239000004264 Petrolatum Substances 0.000 claims abstract description 7
- 229940066842 petrolatum Drugs 0.000 claims abstract description 7
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 26
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 23
- 239000010931 gold Substances 0.000 claims description 23
- 239000010410 layer Substances 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 15
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 12
- -1 cyclic nitrogen compounds Chemical class 0.000 claims description 12
- 229910001020 Au alloy Inorganic materials 0.000 claims description 10
- 239000003353 gold alloy Substances 0.000 claims description 10
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 4
- 238000009713 electroplating Methods 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003963 antioxidant agent Substances 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 22
- 238000005260 corrosion Methods 0.000 abstract description 22
- 239000002904 solvent Substances 0.000 abstract description 7
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 abstract description 4
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical class C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 description 18
- 239000001257 hydrogen Substances 0.000 description 16
- 239000002585 base Substances 0.000 description 11
- 150000002431 hydrogen Chemical group 0.000 description 10
- 239000011148 porous material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 238000012360 testing method Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002199 base oil Substances 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
- 239000012964 benzotriazole Substances 0.000 description 3
- 239000010974 bronze Substances 0.000 description 3
- WBLIXGSTEMXDSM-UHFFFAOYSA-N chloromethane Chemical compound Cl[CH2] WBLIXGSTEMXDSM-UHFFFAOYSA-N 0.000 description 3
- WDNQRCVBPNOTNV-UHFFFAOYSA-N dinonylnaphthylsulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 WDNQRCVBPNOTNV-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- YSIQDTZQRDDQNF-UHFFFAOYSA-L barium(2+);2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Ba+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 YSIQDTZQRDDQNF-UHFFFAOYSA-L 0.000 description 2
- MKFUUBCXQNCPIP-UHFFFAOYSA-L calcium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Ca+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 MKFUUBCXQNCPIP-UHFFFAOYSA-L 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- WTHCDEDKJUFXJG-UHFFFAOYSA-M lithium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical class [Li+].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 WTHCDEDKJUFXJG-UHFFFAOYSA-M 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000002530 phenolic antioxidant Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- COGHWIKGZJHSAG-UHFFFAOYSA-L zinc;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Zn+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 COGHWIKGZJHSAG-UHFFFAOYSA-L 0.000 description 2
- RAADJDWNEAXLBL-UHFFFAOYSA-N 1,2-di(nonyl)naphthalene Chemical compound C1=CC=CC2=C(CCCCCCCCC)C(CCCCCCCCC)=CC=C21 RAADJDWNEAXLBL-UHFFFAOYSA-N 0.000 description 1
- HCITUYXHCZGFEO-UHFFFAOYSA-N 1,3,5-triazine-2,4,6-triamine Chemical compound NC1=NC(N)=NC(N)=N1.N=C1NC(=N)NC(=N)N1 HCITUYXHCZGFEO-UHFFFAOYSA-N 0.000 description 1
- KKKDZZRICRFGSD-UHFFFAOYSA-N 1-benzylimidazole Chemical compound C1=CN=CN1CC1=CC=CC=C1 KKKDZZRICRFGSD-UHFFFAOYSA-N 0.000 description 1
- ODFXXBQMLWHOAH-UHFFFAOYSA-N 1-indazol-1-ylethanone Chemical compound C1=CC=C2N(C(=O)C)N=CC2=C1 ODFXXBQMLWHOAH-UHFFFAOYSA-N 0.000 description 1
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 1
- BLRHMMGNCXNXJL-UHFFFAOYSA-N 1-methylindole Chemical compound C1=CC=C2N(C)C=CC2=C1 BLRHMMGNCXNXJL-UHFFFAOYSA-N 0.000 description 1
- LWCOSGCLJGQXIV-UHFFFAOYSA-N 2,3-di(nonyl)naphthalene-1-sulfonic acid;ethane-1,2-diamine Chemical compound NCCN.C1=CC=C2C(S(O)(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 LWCOSGCLJGQXIV-UHFFFAOYSA-N 0.000 description 1
- VOXHHUSCWMAPPY-UHFFFAOYSA-N 2-benzylindazole Chemical compound C1=C2C=CC=CC2=NN1CC1=CC=CC=C1 VOXHHUSCWMAPPY-UHFFFAOYSA-N 0.000 description 1
- OAZHXZJUWHKFMP-UHFFFAOYSA-N 2-methylindazole Chemical compound C1=CC=CC2=NN(C)C=C21 OAZHXZJUWHKFMP-UHFFFAOYSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 239000004255 Butylated hydroxyanisole Substances 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- QAPVYZRWKDXNDK-UHFFFAOYSA-N P,P-Dioctyldiphenylamine Chemical compound C1=CC(CCCCCCCC)=CC=C1NC1=CC=C(CCCCCCCC)C=C1 QAPVYZRWKDXNDK-UHFFFAOYSA-N 0.000 description 1
- 229910000639 Spring steel Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- IYVBKVVOHXVKRD-UHFFFAOYSA-N benzimidazol-1-yl(phenyl)methanone Chemical compound C1=NC2=CC=CC=C2N1C(=O)C1=CC=CC=C1 IYVBKVVOHXVKRD-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 229940043253 butylated hydroxyanisole Drugs 0.000 description 1
- 235000019282 butylated hydroxyanisole Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- UTWGRMYWDUMKNY-UHFFFAOYSA-N indole-1-carboxylic acid Chemical compound C1=CC=C2N(C(=O)O)C=CC2=C1 UTWGRMYWDUMKNY-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 150000002475 indoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- GPJPBLLWYCLERP-UHFFFAOYSA-N n-(benzotriazol-1-ylmethyl)-n-octyloctan-1-amine Chemical compound C1=CC=C2N(CN(CCCCCCCC)CCCCCCCC)N=NC2=C1 GPJPBLLWYCLERP-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000012169 petroleum derived wax Substances 0.000 description 1
- 235000019381 petroleum wax Nutrition 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- DHQIJSYTNIUZRY-UHFFFAOYSA-M sodium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 DHQIJSYTNIUZRY-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、金めつき電気接点の封孔処理液、封孔処理方
法及び封孔処理されたコネクタ接触子に関する。特には
潤滑、防錆及び電気的接続性が長期的に安定して優九る
封孔処理液、封孔処理方法及び封孔処理されたコネクタ
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a sealing solution for gold-plated electrical contacts, a sealing method, and a sealed connector contact. In particular, the present invention relates to a sealing liquid, a sealing method, and a sealed connector that exhibit excellent long-term stability in lubrication, rust prevention, and electrical connectivity.
[従来の技術]
電子機器用接続部品としてコネクタは最も代表的なもの
であり多種多様のコネクタが実用化されている。電算機
や通信用機器等高度の信頼性が要求される、いわゆる産
業用電子機器に使用されるコネクタは、りん青銅、ベリ
リウム鋼等のバネ用鋼合金を母材とし、接点用金属被膜
としてニッケル下地めっき後その上に金めつきを施した
ものが一般に利用されている。[Prior Art] Connectors are the most typical connecting parts for electronic devices, and a wide variety of connectors have been put into practical use. Connectors used in so-called industrial electronic devices that require a high level of reliability, such as computers and communication equipment, are made of spring steel alloys such as phosphor bronze and beryllium steel, and nickel is used as the metal coating for the contacts. Generally used is a base plating followed by gold plating.
金は貴金属の中でも極めて耐食性が高く、表面に酸化物
や他の被膜を形成しないため電気的接続性に優れ、接点
用金属として”広く使用されている。Gold has extremely high corrosion resistance among noble metals, and because it does not form oxides or other films on its surface, it has excellent electrical connectivity and is widely used as a contact metal.
しかし、金は高価であるため、コネクタの裏道コストを
下げる目的で様々な省令化策が採られてきた。その代表
的方法が金めつきの厚みを薄くする方法であるが、金め
つきの厚みを薄くするとともに、被膜のピンホールの数
が指数関数的に増え、耐食性が著しく低下するという問
題を抱えている3そこで、ニッケル下地めっき後、中間
めっきとしてパラジウムまたはパラジウム合金をめっき
し、その上に金めっきしたものが利用さ九でいる。しか
し、この3層めっきでも十分な耐食性が得られていない
。この問題を解決する方法のひとつに封孔処理がある。However, since gold is expensive, various ministerial measures have been taken to reduce the cost of connectors. The typical method is to reduce the thickness of the gold plating, but as the thickness of the gold plating becomes thinner, the number of pinholes in the coating increases exponentially, resulting in a significant decrease in corrosion resistance. 3. Therefore, after plating a nickel base, palladium or palladium alloy is plated as an intermediate plating, and then gold plating is used. However, even this three-layer plating does not provide sufficient corrosion resistance. One method to solve this problem is pore sealing.
すなわち、各種の無機性、あるいは有機性の薬品で金め
つき面を処理し、ピンホールを塞ぎ耐食性を向上させよ
うとするものであるが、下地層としてニッケルをめっき
し、中間層としてパラジウムまたはパラジウム合金をめ
っきし、その上に金めっきした材料への封孔処理液及び
封孔処理方法は公知のものがない。In other words, the gold-plated surface is treated with various inorganic or organic chemicals to close pinholes and improve corrosion resistance, but nickel is plated as the base layer and palladium or palladium is plated as the intermediate layer. There are no known sealing liquids or sealing methods for materials plated with palladium alloy and gold plated thereon.
[発明が解決しようとする課題]
封孔処理、特に有機性の薬品による封孔処理は、金めつ
き被膜の厚み低減に対し、耐食性を維持する効果に優れ
ている。ところが従来の封孔処理液は鉄系金属材料や銅
系金属材料の防錆剤として知られでいた化合物を中心と
して選択されたものか、あるいは省令化以前にも金めつ
き接点の潤滑を目的として使用されていた潤滑剤をその
まま使用したものが一般的であった。封孔処理された金
めつきに要求される特性としては、
■ 潤滑性がよいこと、
■ 耐食性が優れていること、
■ 接触抵抗が低く安定していること、■ はんだ付性
がよいこと、及び
■ それらの特性が各種の環境、使用条件下で長期に亘
り持続すること、
である。[Problems to be Solved by the Invention] A pore sealing treatment, particularly a pore sealing treatment using an organic chemical, is excellent in maintaining corrosion resistance while reducing the thickness of a gold plating film. However, conventional sealing liquids were mainly selected from compounds known as rust preventive agents for iron-based metal materials and copper-based metal materials, or they were used for the purpose of lubricating gold-plated contacts even before the ministerial ordinance was established. It was common to use the same lubricant that was used as a lubricant. The properties required for sealed gold plating include: ■ Good lubricity; ■ Excellent corrosion resistance; ■ Low and stable contact resistance; ■ Good solderability. and ■ Those characteristics persist over a long period of time under various environments and usage conditions.
ところが従来の封孔処理液は、そのような総合的観点か
ら必ずしも満足できるものではなく、なんらかの品質面
で劣っているものが一般的であった。However, conventional sealing liquids are not necessarily satisfactory from such a comprehensive viewpoint, and are generally inferior in some quality aspect.
特に自動車の電子機器化、いわゆるカーエレクトロニク
ス化の急激な進展とともに自動車に使用される電子回路
用コネクタの材料で金めっきされたものが増えている。In particular, with the rapid development of electronic equipment in automobiles, so-called car electronics, the number of connectors for electronic circuits used in automobiles that are gold-plated is increasing.
そのような状況にあって、上記■〜■の特性のうち■の
耐食性において、耐工業ガス(H2S、So2混合)性
及び耐塩水噴霧性を、更に■において、過酷な温湿度サ
イクル環境下における耐久性を、従来の封孔処理よりも
大巾に改善しつつ、かつその他の特性については、同等
もしくはそれ以上の特性を有する封孔処理液技術が必要
となった。In such a situation, among the above properties (■) to (■), corrosion resistance (■) is good for industrial gas (H2S, So2 mixture) and salt water spray resistance, and (■) is good for corrosion resistance under harsh temperature and humidity cycle environments. There is now a need for a sealing liquid technology that has significantly improved durability compared to conventional sealing treatments and has other properties that are equivalent or better.
本発明は、このような要求を満たすことのできる改善さ
れた封孔処理液及びそれを用いる封孔処理方法を提供す
ることを目的とし、あわせてそれにより処理されたコネ
クタを提供することを目的とするものである。An object of the present invention is to provide an improved sealing liquid that can meet such demands and a sealing method using the same, and also to provide a connector treated with the same. That is.
[課題を解決するための手段]
かかる状況に鑑み、本発明者等は鋭意研究を行った結果
、以下に示す封孔処理液、方法及び封孔処理さ九たコネ
クタを発明するに至った。[Means for Solving the Problems] In view of the above situation, the present inventors conducted intensive research and as a result, came to invent the following sealing liquid, method, and sealing connector.
すなわち、本発明は。That is, the present invention.
(1)銅系または鉄系金属材料に下地層としてニッケル
めっき、中間層としてパラジウムまたはパラジウム合金
をめっき後、金または金合金をめっきした材料を処理す
る封孔処理液であって、(A)ペトロラタム0.1〜3
υt%及び(B)アルキル置換ナフタレンスルフォン酸
塩の1種または2種以上0.05〜3wt%を必須成分
とする有機溶剤溶液よりなることを特徴とする封孔処理
液。(1) A sealing solution for treating a copper-based or iron-based metal material plated with nickel as a base layer and palladium or palladium alloy as an intermediate layer, and then plated with gold or gold alloy, comprising (A) Petrolatum 0.1-3
A pore-sealing treatment liquid comprising an organic solvent solution containing as essential components 0.05 to 3 wt% of one or more of (B) alkyl-substituted naphthalene sulfonates.
(2)キレート形成性環状窒素化合物の1種もしくは2
種以上0.05〜3−t%をさらに含有することを特徴
とする前記(1)記載の封孔処理液。(2) One or two chelate-forming cyclic nitrogen compounds
The pore-sealing treatment liquid according to (1) above, further comprising 0.05 to 3-t% of 0.05 to 3-t%.
(3)アミン系又はフェノール系酸化防止剤の1種もし
くは2種以上0.001〜1νt%を、さらに含有する
ことを特徴とする前記(1)又は(2)記載の封孔処理
液。(3) The sealing solution according to (1) or (2) above, further comprising 0.001 to 1 νt% of one or more amine-based or phenolic antioxidants.
(4)銅系又は鉄系金属材料に下地層としてニッケルめ
っき、中間層としてパラジウムまたはパラジウム合金を
めっき後、さらにその上に金または金合金を電気めっき
後、前記(1)、(2)または(3)記載の封孔処理液
で処理することを特徴とする封孔処理方法。(4) After plating a copper-based or iron-based metal material with nickel as a base layer, palladium or palladium alloy as an intermediate layer, and then electroplating gold or a gold alloy thereon, the above (1), (2) or (3) A pore-sealing method characterized by treating with the pore-sealing solution described in (3).
(5)下地層としてニッケルめっき、中間層としてパラ
ジウムまたはパラジウム合金をめっき後、金または金合
金めっきされた銅系または鉄系金属材料をプレス加工後
、前記(1)、(2)または(3)に記載の封孔処理液
で処理することを特徴とする封孔処理方法。(5) After plating nickel as the base layer and plating palladium or palladium alloy as the intermediate layer, press the copper-based or iron-based metal material plated with gold or gold alloy, and then apply ) A pore-sealing treatment method characterized by treating with the pore-sealing treatment liquid described in .).
(6)銅系または鉄系金属材料に下地層としてニッケル
めっき、中間層としてパラジウムまたはパラジウム合金
をめっき後、金又は金合金をめっきしためっき材よりな
り、前記(1)、(2)または(3)記載の封孔処理液
で封孔処理したことを特徴とするコネクタ。(6) It consists of a copper-based or iron-based metal material plated with nickel as a base layer, palladium or palladium alloy as an intermediate layer, and then plated with gold or gold alloy, and is made of a plating material that is plated with gold or gold alloy as described above (1), (2) or ( 3) A connector characterized by being sealed with the sealing solution described above.
本発明の封孔処理液の必須成分であるペトロラタムは石
油から得られるゼリー状半固体のろうであり、真空蒸留
残渣から溶剤脱ろう、遠心分離等により得られる軟膏状
の石油ワックスである。パラフィンワックスに比べ正パ
ラフィンが少なくイソパラフィンが多く、また5員環ナ
フテンも含まれ融点が低い。ペトロラタムは鉄鋼におけ
る防錆剤の成分の一つとしても知ら九でいるものである
が、本発明においては基油としての機能を有する、すな
わちそれ自体、多数のピンホールの存在する金めつき表
面に皮膜を形成し、ピンホール等金めっきの微視的な欠
陥を通して、大気中の水分、酸素、及び各種の腐食媒が
下地ニッケルと接触するのを防いでいる。Petrolatum, which is an essential component of the pore sealing solution of the present invention, is a jelly-like semisolid wax obtained from petroleum, and is an ointment-like petroleum wax obtained from the vacuum distillation residue by solvent dewaxing, centrifugation, etc. Compared to paraffin wax, it contains less normal paraffins and more isoparaffins, and also contains 5-membered ring naphthenes, so it has a low melting point. Petrolatum is well-known as one of the components of a rust preventive agent in steel, but in the present invention it has a function as a base oil, that is, it itself has a gold-plated surface with many pinholes. This prevents atmospheric moisture, oxygen, and various corrosive media from coming into contact with the nickel base through pinholes and other microscopic defects in the gold plating.
本発明において、この基油の選択は他の成分の作用と相
俟って相乗的に前述の耐食性、耐久性を向上させるうえ
で重要な成分である。特に鉄鋼等の防錆剤とは異なり、
場合によっては、マイクロアンペアオーダーの微弱電流
を確実に相手端子と接続しなければならないコネクタ等
電子部品の接点表面の封孔処理剤であるから、基油の選
択は防錆効果のみではなく、電気的接続性が極めて重要
となる。そして、その濃度は0.1wt%より小さいと
、耐食性、耐久性が小さくなり、所望の効果を得ること
ができない。一方3wt%より大きいと接触抵抗が上昇
し接点用の封孔処理として価値がなくなるので好ましく
ない。In the present invention, the selection of this base oil is an important component in synergistically improving the above-mentioned corrosion resistance and durability in conjunction with the effects of other components. Especially unlike rust inhibitors for steel, etc.
In some cases, the base oil is used as a sealing agent for the contact surfaces of electronic components such as connectors that must reliably connect a weak current on the order of microamperes to a mating terminal. physical connectivity will be extremely important. If the concentration is less than 0.1 wt%, corrosion resistance and durability will decrease, making it impossible to obtain the desired effects. On the other hand, if it is more than 3 wt%, the contact resistance increases and the sealing treatment for contacts becomes useless, which is not preferable.
本発明の封孔処理液のもう一つの必須成分は、次式で表
されるアルキル置換ナフタレンスルフォン酸塩である。Another essential component of the pore sealing solution of the present invention is an alkyl-substituted naphthalene sulfonate represented by the following formula.
5O1
(Rは炭素数6〜12のアルキル基;Mは塩形成成分;
nは1〜2の整数、mはMの価数に一致する整数)
好ましいものを具体的に例示すれば、たとえば。5O1 (R is an alkyl group having 6 to 12 carbon atoms; M is a salt-forming component;
(n is an integer of 1 to 2, m is an integer that matches the valence of M) Preferred examples include, for example.
ジノニルナフタレンスルフオン酸バリウム塩、ジノニル
ナフタレンスルフオン酸カルシウム塩、ジノニルナフタ
レンスルフオン酸亜鉛塩、ジノニルナフタレンスルフオ
ン酸バリウム塩基性塩、ジノニルナフタレンスルフオン
酸エチレンジアミン塩、ジノニルナフタレンスルフオン
酸ナトリウム塩、及びジノニルナフタレンスルフォン酸
リチウム塩、ジノニルナフタレンスルフォン酸鉛塩、ジ
ノニルナフタレンスルフォン酸アンモニウム塩、ジノニ
ルナフタレンスルフオン酸トリエタノールアミン塩等を
挙げることができる。これらは1種又は2種以上混合し
て添加され、耐食性向上に寄与する。Dinonylnaphthalenesulfonate barium salt, dinonylnaphthalenesulfonate calcium salt, dinonylnaphthalenesulfonate zinc salt, dinonylnaphthalenesulfonate barium basic salt, dinonylnaphthalenesulfonate ethylenediamine salt, dinonylnaphthalene Examples include sodium sulfonate salt, lithium dinonylnaphthalene sulfonate salt, lead salt of dinonylnaphthalene sulfonate, ammonium salt of dinonylnaphthalene sulfonate, and triethanolamine salt of dinonylnaphthalene sulfonate. These are added singly or in a mixture of two or more, and contribute to improving corrosion resistance.
添加量は0.05〜3wt%である。0.05wt%未
満では耐食性向上効果が得られず、3wt%を越えると
、接触抵抗への悪影響が認められる。The amount added is 0.05 to 3 wt%. If it is less than 0.05 wt%, no effect of improving corrosion resistance can be obtained, and if it exceeds 3 wt%, an adverse effect on contact resistance is observed.
本発明の封孔処理液には必要に応じてキレート形成性環
状窒素化合物:アミン系又はフェノール系酸化防止剤を
添加することができる。キレート形成性環状窒素化合物
は、銅、ニッケル等に配位して安定なキレートを形成す
る化合物で、特にベンゼン環を有する環状窒素化合物、
あるいはトリアジン系化合物が好ましい。具体例を挙げ
れば、ベンゼン環を有する環状窒素化合物としては、た
とえば、
ベンゾトリアゾール系
N
インダゾール系
ベンズイミダゾール系
八
インドール系
(上記各式中、R工は水素、アルキル、置換アルキルを
表わし、R2はアルカリ金属、水素、アルキル、置換ア
ルキルを表わす)
等を挙げることができる。A chelate-forming cyclic nitrogen compound: an amine-based or phenol-based antioxidant may be added to the pore-sealing solution of the present invention, if necessary. Chelate-forming cyclic nitrogen compounds are compounds that form stable chelates by coordinating with copper, nickel, etc., and in particular, cyclic nitrogen compounds having a benzene ring,
Alternatively, triazine compounds are preferred. To give specific examples, cyclic nitrogen compounds having a benzene ring include, for example, benzotriazole-based N, indazole-based benzimidazole-based octa-indole-based (in each of the above formulas, R represents hydrogen, alkyl, or substituted alkyl, and R2 represents (representing an alkali metal, hydrogen, alkyl, substituted alkyl), etc.
ベンゾトリアゾール系としては、例えばベンゾトリアゾ
ール(Rz−Rzともに水素)、1−メチルベンゾトリ
アゾール(R1が水素、R2がメチル)、1−(N、N
−ジオクチルアミノメチル)ベンゾトリアゾール(R1
が水素、R2がN、N−ジオクチルアミノメチル)、ト
リルトリアゾール(R工がメチ 1ル、R2が水素
)、ソジウムトリルトリアゾール(Rユがメチル、R2
がナトリウム)等が好ましい。Examples of benzotriazole systems include benzotriazole (Rz-Rz are both hydrogen), 1-methylbenzotriazole (R1 is hydrogen, R2 is methyl), 1-(N, N
-dioctylaminomethyl)benzotriazole (R1
is hydrogen, R2 is N, N-dioctylaminomethyl), tolyltriazole (R is methyl, R2 is hydrogen), sodium tolyltriazole (R is methyl, R2
is preferably sodium).
インダゾール系としては、例えばインダゾール(RいR
2ともに水素)、2−メチルインダゾール(R,が水素
、R2がメチル)、2−ベンジルインダゾール(R工が
水素、R2がC,H,CH,)、1 1−アセチル
インダゾール(R工が水素、R2がc。As an indazole type, for example, indazole (R
2 are both hydrogen), 2-methylindazole (R is hydrogen, R2 is methyl), 2-benzylindazole (R is hydrogen, R2 is C, H, CH,), 1 1-acetylindazole (R is hydrogen) , R2 is c.
CM、)等が好ましい。CM, ) etc. are preferred.
ベンズイミダゾール系としては、例えばベンズ l
イミダゾール(RいR2ともに水素)、N−アセチイベ
ンズイミダゾール(R工が水素、R2がC○CH,)+
N−ベンゾイルベンズイミダゾール(R□が水素、R
2がc o c g Hs )等が好ましい。As a benzimidazole type, for example, benzyl
Imidazole (both R and R2 are hydrogen), N-acetiibenzimidazole (R is hydrogen, R2 is C○CH,) +
N-benzoylbenzimidazole (R□ is hydrogen, R
2 is co c g Hs), etc. are preferred.
インドール系としては1例えばインドール(R1、R2
ともに水素)、インドール−1−カルボン酸(R工が水
素、R2がC00H)、1−メチルインドール(R□が
水素、R2がCH,)等が好ましい。Examples of indole series include 1, for example, indole (R1, R2
(both are hydrogen), indole-1-carboxylic acid (R is hydrogen, R2 is C00H), 1-methylindole (R□ is hydrogen, R2 is CH,), and the like are preferred.
また、トリアジン系化合物の具体例を挙げれば、例えば
、6−置換−1,3,5−トリアジン−2,4−ジチオ
ール−ナトリウム塩
(Rはアルキル基で置換されたアミノ基で、好ましくは
−N(C,R9)2.−N(C,H工?)、、 −N(
C工zHzs)z、NHC,H,、CH= CHC,H
,、等である)シアヌル酸(2,4,6−トリオキシ−
1,3,5−トリアジン)、
メラミン(2,4,6−トリアミノ−1,3,5−トリ
アジン)、
を挙げることができる。これらは1種または2種以上混
合して添加され、パラフィンワツスと共に耐食性、耐久
性を向上させる。その濃度は総量で0.05〜3wt%
である。0.05tit%より小さいと耐食性、耐久性
が低く、また、3υt%より大きいと電気的接続性に支
障が生じる。Further, specific examples of triazine compounds include 6-substituted-1,3,5-triazine-2,4-dithiol-sodium salt (R is an amino group substituted with an alkyl group, preferably - N(C,R9)2.-N(C,H?),,-N(
C hzHzs)z,NHC,H,,CH=CHC,H
, etc.) cyanuric acid (2,4,6-trioxy-
1,3,5-triazine), and melamine (2,4,6-triamino-1,3,5-triazine). These are added singly or as a mixture of two or more to improve corrosion resistance and durability together with paraffin wax. Its concentration is 0.05-3wt% in total
It is. If it is less than 0.05 tit%, corrosion resistance and durability will be low, and if it is more than 3 vt%, electrical connectivity will be impaired.
又、本発明の封孔処理液に、必要に応じて添加される上
記のアミン系又はフェノール系酸化防止剤としては、た
とえば、
P、P ’−ジオクチルジフェニルアミン4.4′−テ
トラメチルジアミノジフェニルメタ4.4′−メチレン
−ビス−(2,6−ジーt−ブチルフェノール)
(CH,)、 CC(CH,)。In addition, examples of the above-mentioned amine-based or phenolic antioxidants which may be added to the sealing solution of the present invention as needed include P,P'-dioctyldiphenylamine 4,4'-tetramethyldiaminodiphenylmeth. 4.4'-methylene-bis-(2,6-di-tert-butylphenol) (CH,), CC(CH,).
2.2′−メチレン−ビス−(4−メチル−6−を−ブ
チルフェノール)
CH2Cl。2.2'-Methylene-bis-(4-methyl-6-butylphenol) CH2Cl.
2.2′−メチレン−ビス−(4−エチル−6−を−ブ
チルフェノール)
OH0H
CH2Cl、 CH2Cl。2.2'-Methylene-bis-(4-ethyl-6-butylphenol) OH0H CH2Cl, CH2Cl.
2.6−ジーt−ブチル−p−クレゾールH CH。2.6-di-t-butyl-p-cresol H CH.
ブチル化ヒドロキシアニゾール OH0H QC)l、 OCH。Butylated hydroxyanisole OH0H QC)l, OCH.
2.6−ジーt−ブチル−4−エチルフェノールH CH,CH。2.6-di-t-butyl-4-ethylphenol H CH, CH.
等を挙げることができる。etc. can be mentioned.
これらは、1種又は2種以上を0.001〜1wt%添
加することができる。One or more of these can be added in an amount of 0.001 to 1 wt%.
これらの成分を添加することにより、耐久性を一層向上
させることができる。すなわち、封孔処理皮膜の機能を
長期に亘り安定させ、また高温環境における皮膜の劣化
を抑制する効果を有する。By adding these components, durability can be further improved. That is, it has the effect of stabilizing the function of the sealing film over a long period of time and suppressing deterioration of the film in a high-temperature environment.
0.001wt%未満ではその効果を得ることはできず
、1wt%を超えると接触抵抗の低下現象が認められる
。If it is less than 0.001 wt%, this effect cannot be obtained, and if it exceeds 1 wt%, a decrease in contact resistance is observed.
封孔処理液は上述の成分を有するが、溶媒としては特に
制限されず、公知の有機溶媒より適宜選択することがで
きる。例えばトルエン、キシレン等の石油系溶媒、トリ
クロロエチレン、トリクロロエタン等のハロゲン系溶媒
、あるいはフロン系溶媒等である。Although the pore-sealing liquid has the above-mentioned components, the solvent is not particularly limited and can be appropriately selected from known organic solvents. Examples include petroleum-based solvents such as toluene and xylene, halogen-based solvents such as trichloroethylene and trichloroethane, and fluorocarbon-based solvents.
処理方法としては、めっき品を封孔処理液中に浸漬する
か、封孔処理液をスプレー、あるいは塗布するなど、何
れの方法によることもできる。しかし本発明において、
めっき品の形状が抜・条、プレス部品であるを問わず、
めっき直後すなわち連続ラインであれば、そのラインの
中で処理することが、封孔処理の各種機能を高める効果
が高いことを見いだした。As a treatment method, any method can be used, such as immersing the plated product in a pore sealing solution, or spraying or applying the pore sealing solution. However, in the present invention,
Regardless of the shape of the plated product, whether it is a blank, strip, or pressed part,
It has been found that performing the treatment immediately after plating, that is, in a continuous line, is highly effective in enhancing various functions of the sealing treatment.
さらに、めっき品をプレス加工後に本発明の封孔処理液
で封孔処理する事も有効である。めっき後封孔処理した
金属材料であっても、その後のプレス加工で付着したプ
レス油を洗浄する工程において、封孔処理の機能の多く
は喪失する、そこで再度の封孔処理が有効となる。Furthermore, it is also effective to seal the plated product with the sealing solution of the present invention after press working. Even for metal materials that have been sealed after plating, much of the sealing function is lost in the process of cleaning press oil adhering during subsequent press working, so re-sealing becomes effective.
その後のコネクタの加工工程においても、最終の電子機
器の組み立てまで、めっき品の洗浄工程があれば同様に
封孔処理機能は喪失するため、適宜本発明により封孔処
理する事が有効である。さらには電子機器にコネクタと
して組み込まれ実使用に際しても、使用にともない接点
性能が低下するなどの場合は、適宜本封孔処理液により
処理することができる。従って、本発明は本発明封孔処
理液により処理されたコネクタをも包含するものである
。In the subsequent connector processing steps as well, if there is a cleaning step for the plated product until the final assembly of the electronic device, the hole sealing function will be similarly lost, so it is effective to perform hole sealing according to the present invention as appropriate. Furthermore, even if it is incorporated into an electronic device as a connector and used in actual use, if the contact performance deteriorates with use, it can be treated with the present pore sealing treatment liquid as appropriate. Therefore, the present invention also includes connectors treated with the sealing solution of the present invention.
なお、本発明における、めっき母材となる金属材料は、
銅及び、黄銅、りん青銅、チタン鋼等の各種鋼合金、鉄
、ステンレス鋼、高ニッケル合金等、コネクタの要求性
能に従い適宜選択でき、何等制限されない。下地層とし
てのニッケルめっき、あるいは中間層としてのパラジウ
ムまたはパラジウム合金めっきは、電気めっき、無電解
めっき、あるいはCVD、PVD等の乾式めっき等の公
知のものを適用でき、めっきの方法は制限されない。In addition, in the present invention, the metal material serving as the plating base material is:
Copper, various steel alloys such as brass, phosphor bronze, titanium steel, iron, stainless steel, high nickel alloy, etc. can be selected as appropriate according to the required performance of the connector, and there are no restrictions in any way. For the nickel plating as the base layer or the palladium or palladium alloy plating as the intermediate layer, known methods such as electroplating, electroless plating, or dry plating such as CVD or PVD can be applied, and the plating method is not limited.
金めつきは各種のアルカリ性浴、酸性浴から純金めっき
の他、コバルト等の合金成分を含有する金合金めっきも
包含するものである。Gold plating includes pure gold plating from various alkaline baths and acidic baths, as well as gold alloy plating containing alloy components such as cobalt.
[実施例] 以下に実施例を挙げて本発明をさらに詳細に説明する。[Example] The present invention will be explained in more detail with reference to Examples below.
ばね用りん青銅(C5210)の厚み0.2m+の冷間
圧延材を用い、雄、及び雌の連続端子をそれぞれプレス
成形した。これらをリール・ツウ・リールの連続電気め
っきラインを通して電気めっきを施した。めっきライン
においては、脱脂、酸洗後ワット浴により1μmのニッ
ケルめっき後、中性タイプのパラジウム−ニッケル合金
めっき浴により0゜3μmのパラジウム−ニッケル合金
めっき後、酸性めっき浴により金を0.1μmの厚みで
接点部に部分めっきした。また、連続めっきラインでは
、金めつき後に封孔処理工程を設け、同工程ではトリク
ロロエタンを溶媒とした各種封孔処理液に連続端子を通
入することにより封孔処理を施した。Male and female continuous terminals were each press-molded using cold-rolled spring material of phosphor bronze (C5210) with a thickness of 0.2 m+. These were electroplated through a reel-to-reel continuous electroplating line. In the plating line, after degreasing and pickling, 1 μm nickel plating in Watt bath, 0.3 μm palladium-nickel alloy plating in neutral palladium-nickel alloy plating bath, and 0.1 μm gold plating in acid plating bath. The contacts were partially plated to a thickness of . In addition, in the continuous plating line, a sealing process was provided after gold plating, and in this process, the continuous terminal was passed through various sealing solutions using trichloroethane as a solvent to perform the sealing process.
こうして表面処理した雄と雌の端子をキャリア一部から
切断しリード線を圧着した後、それぞれを嵌合し評価試
験に供した。After the male and female terminals thus surface-treated were cut from a portion of the carrier and the lead wires were crimped, they were fitted together and subjected to an evaluation test.
接触抵抗は直流10mmA、開放電圧50aoVで測定
した。腐食試験は次の条件で行った。The contact resistance was measured at a DC of 10 mmA and an open circuit voltage of 50 aoV. The corrosion test was conducted under the following conditions.
ガス組成:H2S 3±lppm5o2 10±
3pprn
温 度: 40± 2℃
湿 度: 75± 5%RH
時 間: 96時間
加熱試験は125℃大気中で1000時間保持した。Gas composition: H2S 3±lppm5o2 10±
3pprn Temperature: 40±2°C Humidity: 75±5%RH Time: 96 hours The heating test was held at 125°C in the atmosphere for 1000 hours.
結果を第1表に示す。The results are shown in Table 1.
第 1 表
注1)ただし、表中封孔処理液の略号は以下の通りであ
る。Table 1 Note 1) However, the abbreviations for the sealing liquids in the table are as follows.
A ペトロラタム
B−1ジノニルナフタレンスルフオン酸バリウム塩−2
ジノニルナフタレンスルフオン酸カルシウム塩−3ジノ
ニルナフタレンスルフオン酸亜鉛塩−4ジノニルナフタ
レンスルフオン酸バリウム塩基性塩
−5ジノニルナフタレンスルフオン酸エチレンジアミン
塩
−6ジノニルナフタレンスルフオン酸ナトリウム塩−7
ジノニルナフタレンスルフォン酸リチウム塩C−1ベン
ゾトリアゾール
−2インダゾール
−3ベンズイミダゾール
−4インドール
−51−メチルベンゾトリアゾール
−6トリルトリアゾール
−7ソジウムトリルトリアゾール
−81−(N、N−ジオクチルアミノメチル)ベンゾト
リアゾール
−9メラミン
D−I P、P’ −ジオクチルジフェニルアミン−
24,4’−テトラメチルジアミノジフェニルメタン
−34,4’−メチレン−ビス−(2,6−ジーt−ブ
チルフェノール)
−42,2’ −メチレン−ビス−(4−メチル−6−
を−ブチルフェノール)
−52,2’−メチレン−ビス−(4−エチル−6−を
−ブチルフェノール)
−62,6−ジーt−ブチル−p−クレゾール=7 ブ
チル化ヒトロキシアニゾール
−82,6−ジーt−ブチル−4−エチルフェノール注
2)試験の判定基準は次の通りである。A petrolatum B-1 dinonylnaphthalene sulfonate barium salt-2
Dinonylnaphthalenesulfonate calcium salt - 3 Dinonylnaphthalenesulfonate zinc salt - 4 Dinonylnaphthalenesulfonate barium basic salt - 5 Dinonylnaphthalenesulfonate ethylene diamine salt - 6 Dinonylnaphthalenesulfonate sodium salt -7
Dinonylnaphthalenesulfonic acid lithium salt C-1 Benzotriazole-2 Indazole-3 Benzimidazole-4 Indole-51-Methylbenzotriazole-6 Tolyltriazole-7 Sodium tolyltriazole-81-(N,N-dioctylaminomethyl) Benzotriazole-9 Melamine D-I P, P' -Dioctyldiphenylamine-
24,4'-Tetramethyldiaminodiphenylmethane-34,4'-methylene-bis-(2,6-di-t-butylphenol) -42,2'-methylene-bis-(4-methyl-6-
-butylphenol) -52,2'-methylene-bis-(4-ethyl-6-butylphenol) -62,6-di-t-butyl-p-cresol = 7 Butylated hydroxyanisole-82,6 -di-t-butyl-4-ethylphenol Note 2) The test criteria are as follows.
■ 初期接触抵抗、加熱試験後接触抵抗(n=5の平均
値)Q : 25mo+Ω以下
△:25〜50mmΩ
X : 50mmΩ以上
■ 腐食試験後外観
◎:腐食生成物全く認められず
○:腐食生成物痕跡あり
Δ 腐食生成物点在
×:腐食点が全面に認められる
[発明の効果]
以上述べたように、本発明により封孔処理された下地層
としてニッケルめっき、中間層としてパラジウムまたは
パラジウム合金めっき後、金めつきの接点は、処理直後
の接触抵抗が低く、過酷な腐食環境においても優れた耐
食性を示し、また熱履歴によっても接触抵抗が上昇せず
、接触性能が安定しているという利点を有する。■ Initial contact resistance, contact resistance after heating test (average value of n = 5) Q: 25 mo + Ω or less △: 25 to 50 mm Ω X: 50 mm Ω or more ■ Appearance after corrosion test ◎: No corrosion products observed ○: Corrosion products Traces present Δ Corrosion products dotted ×: Corrosion points are observed on the entire surface [Effects of the invention] As described above, nickel plating is used as the base layer sealed by the present invention, and palladium or palladium alloy plating is used as the intermediate layer. Gold-plated contacts have the advantage of low contact resistance immediately after treatment, excellent corrosion resistance even in harsh corrosive environments, and stable contact performance with no increase in contact resistance due to thermal history. have
Claims (6)
めっき、中間層としてパラジウムまたはパラジウム合金
をめっき後、金または金合金をめっきした材料を処理す
る封孔処理液であって、(A)ペトロラタム0.1〜3
wt%及び(B)アルキル置換ナフタレンスルフォン酸
塩の1種または2種以上0.05〜3wt%を必須成分
とする有機溶剤溶液よりなることを特徴とする封孔処理
液。(1) A sealing solution for treating a copper-based or iron-based metal material plated with nickel as a base layer and palladium or palladium alloy as an intermediate layer, and then plated with gold or gold alloy, comprising (A) Petrolatum 0.1-3
1. A pore-sealing solution comprising an organic solvent solution containing as essential components 0.05 to 3 wt% of one or more of (B) alkyl-substituted naphthalene sulfonates.
種以上0.05〜3wt%をさらに含有することを特徴
とする請求項(1)記載の封孔処理液。(2) One or two chelate-forming cyclic nitrogen compounds
The pore-sealing treatment liquid according to claim 1, further comprising 0.05 to 3 wt% of at least one species.
くは2種以上0.001〜1wt%を、さらに含有する
ことを特徴とする請求項(1)又は(2)記載の封孔処
理液。(3) The pore-sealing treatment liquid according to claim (1) or (2), further comprising 0.001 to 1 wt % of one or more amine-based or phenol-based antioxidants.
っき、中間層としてパラジウムまたはパラジウム合金を
めっき後、さらにその上に金または金合金を電気めっき
後、請求項(1)、(2)または(3)記載の封孔処理
液で処理することを特徴とする封孔処理方法。(4) After plating a copper-based or iron-based metal material with nickel as a base layer, palladium or a palladium alloy as an intermediate layer, and then electroplating gold or a gold alloy thereon, claims (1) and (2) Or (3) A pore-sealing method characterized by treating with the pore-sealing solution described in (3).
ジウムまたはパラジウム合金をめっき後、金または金合
金めっきされた銅系または鉄系金属材料をプレス加工後
、請求項(1)、(2)または(3)に記載の封孔処理
液で処理することを特徴とする封孔処理方法。(5) After plating nickel as a base layer, plating palladium or palladium alloy as an intermediate layer, and pressing a copper-based or iron-based metal material plated with gold or gold alloy, claim (1), (2) or ( 3) A method for sealing, characterized by treating with the sealing solution according to item 3).
めっき、中間層としてパラジウムまたはパラジウム合金
をめっき後、金又は金合金をめっきしためっき材よりな
り、請求項(1)、(2)または(3)記載の封孔処理
液で封孔処理したことを特徴とするコネクタ。(6) It is made of a plated material in which a copper-based or iron-based metal material is plated with nickel as a base layer, palladium or palladium alloy as an intermediate layer, and then plated with gold or a gold alloy, and claims (1), (2) or (3) A connector characterized in that it has been sealed with the sealing solution described above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32319490A JPH04193984A (en) | 1990-11-28 | 1990-11-28 | Sealing solution and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32319490A JPH04193984A (en) | 1990-11-28 | 1990-11-28 | Sealing solution and method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04193984A true JPH04193984A (en) | 1992-07-14 |
Family
ID=18152108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32319490A Pending JPH04193984A (en) | 1990-11-28 | 1990-11-28 | Sealing solution and method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04193984A (en) |
-
1990
- 1990-11-28 JP JP32319490A patent/JPH04193984A/en active Pending
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