JPH04189200A - Uneven surface transfer foil - Google Patents
Uneven surface transfer foilInfo
- Publication number
- JPH04189200A JPH04189200A JP2320016A JP32001690A JPH04189200A JP H04189200 A JPH04189200 A JP H04189200A JP 2320016 A JP2320016 A JP 2320016A JP 32001690 A JP32001690 A JP 32001690A JP H04189200 A JPH04189200 A JP H04189200A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- base sheet
- uneven
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011888 foil Substances 0.000 title claims description 22
- 239000010410 layer Substances 0.000 claims abstract description 105
- 239000010409 thin film Substances 0.000 claims abstract description 50
- 239000012790 adhesive layer Substances 0.000 claims abstract description 14
- 238000002834 transmittance Methods 0.000 claims abstract description 8
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- 238000001579 optical reflectometry Methods 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 21
- 239000011347 resin Substances 0.000 abstract description 21
- 238000000034 method Methods 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 10
- 230000000694 effects Effects 0.000 abstract description 6
- 239000010408 film Substances 0.000 abstract description 5
- 229920003023 plastic Polymers 0.000 abstract description 3
- 239000004033 plastic Substances 0.000 abstract description 3
- 230000035699 permeability Effects 0.000 abstract 2
- 230000035945 sensitivity Effects 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- -1 polyethylene terephthalate Polymers 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 3
- 238000007646 gravure printing Methods 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Decoration By Transfer Pictures (AREA)
- Laminated Bodies (AREA)
Abstract
Description
この発明は、凹凸意匠を表現することができる転写箔ｌ
こ関するものである。This invention provides a transfer foil l capable of expressing an uneven design.
This is related to this.
従来、成形品の表面に凹凸感のある意匠を表現する転写
箔としては、基体シートの表面をエンボス加工、ヘアラ
イン加工、スピン加工、プレス加工などにより凹凸にし
て、この上に剥離層、絵柄層、接着層のような転写層を
設けた転写箔がある。
また、凹凸を有する基体シートに、剥＃層、アンカー層
を設けた後、真空蒸着などにより光を透過しない金属薄
膜を設け、さらに接着層を設けた転写箔がある。
これらの転写箔は、基体シートの転写層を成形品に転写
して基体シートを剥離することにより、基体シートの凹
凸が剥離層に写し取られて剥離層の表面に凹凸が形成さ
れ、成形品表面が凹凸状態になるものである。Conventionally, transfer foils that express uneven designs on the surface of molded products have been made by making the surface of a base sheet uneven by embossing, hairline processing, spin processing, press processing, etc., and then applying a release layer and a pattern layer on top of this. There are transfer foils provided with a transfer layer such as an adhesive layer. There is also a transfer foil in which a peeling layer and an anchor layer are provided on a base sheet having irregularities, and then a metal thin film that does not transmit light is provided by vacuum deposition or the like, and an adhesive layer is further provided. These transfer foils transfer the transfer layer of the base sheet to the molded product and then peel the base sheet.The unevenness of the base sheet is transferred to the release layer, forming irregularities on the surface of the release layer, and the molded product The surface is uneven.
しかし、前者の転写箔を使用した場合は、凹凸状態とな
るのが基体シートより写し取られた剥離層の凹凸のみで
あり、凹凸の状態がわかりにくく意匠効果が劣るという
問題点があった。
また、剥離層の凹凸は、指紋などの手油その他の汚れが
付着した場合、あるいは前記手油や汚れ防止するために
塗布などによるオーバーコートを施した場合、それによ
って剥離層の凹凸が消えてしまうという問題点があった
。これは微細な凹凸による光の散乱程度が、汚れやオー
バーコートが付着することにより凹凸の程度が変化する
ためであり、磨ガラスの凹凸面に水をつけると、水がつ
かなかった部分と凹凸状態に差が生しるのと同様の現象
である。
したがって、従来、艷消し意匠または疑似工。
チング意匠を設けたいというデザイン的要望がありなが
ら、汚れの付着により凹凸感が損なわれるので、人の手
がよく触れる製品、たとえば化粧品容器や赤外線リモコ
ンスイッチなどユニは使用できないものであった。
藪た、後者の転写箔を使用した場合は、光を透過しない
金属薄膜により光が全反射するので、ギラギラ怒が強す
ぎる凹凸意匠しか得られず、剥離層の凹凸が過度に強調
されるという問題点があった。
この発明の目的は以上のような問題点を解決し、表面の
凹凸感の劣化がなく、またギラつきのない凹凸意匠を有
する転写箔を提供することにある。However, when the former transfer foil is used, the unevenness is only the unevenness of the release layer transferred from the base sheet, and there is a problem that the unevenness is difficult to understand and the design effect is inferior. In addition, the unevenness of the release layer disappears when fingerprints, hand oil, or other stains adhere to it, or when an overcoat is applied to prevent said hand oil or stains. There was a problem with it being put away. This is because the degree of light scattering due to fine irregularities changes as dirt and overcoat adhere to them. This is a phenomenon similar to the difference in state. Therefore, in the past, it was a design that had been removed or a pseudo-work. Although there was a design desire to have a tinging design, it was not possible to use uniforms on products that are often touched by human hands, such as cosmetic containers and infrared remote control switches, because the unevenness would be lost due to the adhesion of dirt. However, when using the latter type of transfer foil, the light is totally reflected by the thin metal film that does not transmit light, resulting in an uneven design that is too glaring, and the unevenness of the release layer is excessively emphasized. There was a problem. An object of the present invention is to solve the above-mentioned problems and provide a transfer foil having an uneven design without deterioration of the surface unevenness and without glare.
この発明は、以上の目的を達成するために、次のように
構成した。すなわちこの発明は、凹凸表面を有する基体
シート上に、前記基体シートから剥離可能な剥離層が全
面に設けられ、さらにこの上に光透過性と光反射性を有
する薄膜層が全面に設けられ、さらに接着層が全面に設
けられるように構成した。
上記構成においては、薄膜層が金属化合物であるように
することもできる。
また、薄膜層の膜厚が５０〜１０００人であるようにす
ることもできる。
また、薄膜層の光透過率が２０％〜９９％であるように
することもできる。
また、薄膜層と接着層との間に絵柄層が設けられるよう
にすることもできる。
また、剥離層と薄膜層との間に絵柄層が設けられるよう
にすることもできる。
また、基体シートが、互いに微小間隔で平行に配列され
た溝群からなる区画領域を複数個有する凹凸表面を有し
たものであるようにすることもできる。In order to achieve the above object, the present invention is configured as follows. That is, in this invention, a peeling layer that can be peeled off from the base sheet is provided on the entire surface of a base sheet having an uneven surface, and a thin film layer having light transmittance and light reflectivity is further provided on the entire surface of the base sheet, Furthermore, the structure was such that an adhesive layer was provided on the entire surface. In the above configuration, the thin film layer can also be made of a metal compound. Moreover, the thickness of the thin film layer can also be made to be 50 to 1000 layers. Moreover, the light transmittance of the thin film layer can also be made to be 20% to 99%. Furthermore, a pattern layer may be provided between the thin film layer and the adhesive layer. Furthermore, a pattern layer may be provided between the release layer and the thin film layer. Alternatively, the base sheet may have an uneven surface having a plurality of partitioned areas each consisting of a group of grooves arranged in parallel at minute intervals.
以下に、この発明にかかる実施例を第１図ムこ基づいて
説明する。
基体シート１としては、表面に細かな凹凸を有するもの
を用いる。具体的には、ポリエチレンテレフタレートや
ポリプロピレン・ポリエチレン・ナイロン・セロハンな
どのプラスチ・ンクフイルムあるいはこれらと紙との複
合フィルムなど通常の転写材の基体ソートとして用いら
れるものの上に、これに固着する凹凸層を設けたもの、
具体的にはソリ力・炭酸カルシウム・ポリエチレンワッ
クス・ガラスピーズなどの微細な粒径をもった微粉末を
含む樹脂層を印刷法などによりコーティングしたものを
使用するとよい。この場合の樹脂層としては、可塑性樹
脂以外にウレタン、ユポキシ等の硬化性樹脂、メチルメ
タアクリレート等の紫外線または電子線硬化性樹脂を用
いてもよい。
また、上記したプラスチックフィルムの成膜時、体質顔
料などの微粉末を練りこんだものを使用してもよい。
あるいは、前記のプラスチックフィルムの表面をサンド
ブラスト法やケミカルエツチング法などの物理的手段に
より凹凸を設けたものを使用してもよい。
基体シート１上の凹凸としては、単なる艶消し状のもの
のみでなく、ヘアライン形状やスピン形状などの形態で
あってもよい。または、互いに微小間隔で平行に配列さ
れた溝群からなる区画領域を複数個有する凹凸表面のも
のでもよく、このとき溝を形成する平行線は区画領域ご
とに方向が異なるようにすると、見る方向によって反射
のトーンが強いところと弱いところができる。したがっ
て、凹凸感がより一層強調されるので効果的である。
剥離層２は、基体シート１の凹凸に沿った凹凸状になる
ように全面に設けられ、成形品への転写後は基体シート
１から剥離し、基体ノー）１の凹凸に対応して剥離層２
表面に基体シート１と逆パターンの凹凸が形成されるも
のである。また、転写後には被転写体の表面になるため
、転写材自体を保護する機能をも有するものである。剥
離層２はロールツー１法や、グラビア印刷法・スクリー
ン印刷法などの通常の印刷方法により形成される。
剥＃Ｎ２としては、アクリル系樹脂・ビニル系樹脂など
の熱可塑性樹脂も使用できるが、保護層としての役目を
十分果たさせるためには、ウレタン系樹脂・エポキン系
樹脂などの熱硬化性樹脂、メチルメタアクル−トなどの
紫外線または電子線硬化性樹脂を用いてもよい。
また、アンカー層３は、後述する薄膜層４と隣合う他の
層との密着をより強固にするために必要により設けられ
る。したがって、剥離層２と薄膜層４との間に設けても
よいし、接着層６と薄膜層４との間に設けてもよい。前
者の場合は、薄膜層４の凹凸の小さいものができる。ア
ンカー層３は、剥離層２と同様にグラビア印刷法やスク
リーン印刷法により形成される。
″ｉｉｊ膜Ｎ４は、光透過性および光反射性を有するも
のである。この薄膜層４は、剥離層２あるいは必要によ
り形成されたアンカー層３上に形成される。この薄膜層
４もやはり、基体シート】の凹凸にそって凹凸状に形成
される。薄膜層４はたとえば、アルミニウム、銀などの
純粋な金属単体や、あるいは、酸化チタン、二酸化珪素
などの金属酸化物、硫化銅、硫化亜鉛金属硫化物、無機
物などの金属化合物を、蒸着法、イオンブレーティング
法、スパッタリング法などの薄膜形成方法で薄膜に形成
されるものであり、このような薄膜の膜厚としては５０
〜１０００人が好ましく、光透過率としては２０〜９９
％が好ましい。この薄膜層４は必要に応して部分的に設
けることもできる。部分的に設ける方法としては、薄膜
層４を必要としない部分に水溶性樹脂を形成し、その上
から全面に薄膜層４を形成し、水洗を行って、水溶性樹
脂とともに薄膜層４の不要な部分を除去する方法などが
ある。
なお、通常の金属単体を上記のような薄膜状に蒸着した
ときには不要な発色が起ることがあるが、薄膜層４を金
属化合物で形成することにより、無色透明または無色半
透明な１膜が確実に形成でき、意匠として無用な着色が
起こるのを防止することができるので効果的である。
また、剥離層２の膜厚が大きい場合は、剥離層２の薄膜
層４が形成される側の表面の凹凸が基体シート１側の凹
凸程度より小さくなることもあるが、この場合は、剥離
層２表面での光の反射と薄膜Ｎ４表面での光の反射との
度合の差により微妙な意匠効果が得られる。
絵柄層５は、所望の図柄、絵や模様を形成するために全
面あるいは部分的に必要により設けられる。したがって
、剥Ｈ層２と薄膜層４との間に設けてもよいし、薄膜層
４と後述する接着層６との間に設けてもよい。後者の場
合でも、薄膜層４が光透過性であり、後方にある層の絵
柄が透けて見えるので問題はない。絵柄層５は顔料、ま
たは染料および各種添加剤を含有する樹脂よりなるイン
キを用い、グラビア印刷法、スクリーン印刷法などの通
常の印刷法で設ければよい。
接着層６は、転写加工により転写材を被転写体に固着さ
せるだめのものであり、薄膜層４上に形成される。接着
層６としては、被転写体であるプラスチック成型品など
の表面素材に適した感熱性あるいは感圧性の樹脂を適宜
使用する。たとえば、被転写体がＡＳ樹脂の場合はアク
リル系樹脂やビニル系樹脂を、ポリプロピレンの場合は
塩素化ポリプロピレン系樹脂やエチレン酢酸ビニル共重
合樹脂などを用いるとよい。
なお、剥離層２、アンカー層３、薄膜層４、絵柄Ｎ５、
接着Ｎ６の相互の界面での固着性は優れたものを選択す
るのが好ましい。
このようにして、この発明の凹凸転写箔が完成する（第
１図参照）。
１拠
表面にダイヤカット模様を有する基体シート上にＰＭＭ
Ａよりなる剥離層を厚さ２μｍとなるようにグラビアコ
ーターにより形成した後、スパッタリング法により、二
酸化珪素の薄膜を５００人になるように形成し、塩化ビ
ニル樹脂よりなる接着層を２μｍとなるようにグラビア
コーターにより形成して凹凸転写箔を得た。
この凹凸転写箔を射出成形用の金型の中に挟み込みアク
リルスチレン樹脂を射出し転写成形品を得た。この成形
品は、二酸化珪素の薄膜を形成しない場合に比べて凹凸
の意匠性が高く、表面保護のための塗装をおこなっても
、凹凸の意匠が消えることもなかった。Embodiments of the present invention will be described below with reference to FIG. 1. As the base sheet 1, one having fine irregularities on the surface is used. Specifically, a concavo-convex layer that adheres to a plastic film such as polyethylene terephthalate, polypropylene, polyethylene, nylon, or cellophane, or a composite film of these and paper, which is used as a base material for transfer materials, is formed. what was set up,
Specifically, it is preferable to use a resin layer coated by a printing method or the like with a resin layer containing a fine powder having a fine particle size such as warp, calcium carbonate, polyethylene wax, glass beads, etc. As the resin layer in this case, in addition to plastic resins, curable resins such as urethane and upoxy, and ultraviolet or electron beam curable resins such as methyl methacrylate may be used. Further, when forming the above-mentioned plastic film, a material kneaded with fine powder such as an extender pigment may be used. Alternatively, the surface of the above-mentioned plastic film may be roughened by physical means such as sandblasting or chemical etching. The irregularities on the base sheet 1 are not limited to a simple matte shape, but may also be in the form of a hairline shape, a spin shape, or the like. Alternatively, it may have an uneven surface having a plurality of partitioned areas each consisting of a group of grooves arranged parallel to each other at minute intervals.In this case, if the parallel lines forming the grooves are arranged in different directions for each partitioned area, it is possible to This creates areas where the reflection tone is strong and areas where it is weak. Therefore, the unevenness is further emphasized, which is effective. The release layer 2 is provided over the entire surface so that it has an uneven shape that follows the unevenness of the base sheet 1, and after being transferred to the molded product, it is peeled off from the base sheet 1, and the release layer 2 is formed in accordance with the unevenness of the base sheet 1. 2
The surface is formed with unevenness in a pattern opposite to that of the base sheet 1. Furthermore, since it becomes the surface of the object to be transferred after transfer, it also has the function of protecting the transfer material itself. The release layer 2 is formed by a normal printing method such as a roll-to-one method, a gravure printing method, or a screen printing method. Thermoplastic resins such as acrylic resins and vinyl resins can also be used for the peeling #N2, but in order to fully fulfill the role of a protective layer, thermosetting resins such as urethane resins and Epoquin resins are recommended. UV or electron beam curable resins such as methyl methacrylate may also be used. Further, the anchor layer 3 is provided as necessary to further strengthen the adhesion between the thin film layer 4 and other adjacent layers, which will be described later. Therefore, it may be provided between the release layer 2 and the thin film layer 4, or between the adhesive layer 6 and the thin film layer 4. In the former case, the thin film layer 4 has small irregularities. The anchor layer 3, like the release layer 2, is formed by the gravure printing method or the screen printing method. The "iij film N4 has light transmittance and light reflectivity. This thin film layer 4 is formed on the peeling layer 2 or the anchor layer 3 formed as necessary. This thin film layer 4 also has the following properties: The thin film layer 4 is formed in an uneven shape along the unevenness of the base sheet.The thin film layer 4 is made of, for example, a pure metal such as aluminum or silver, or a metal oxide such as titanium oxide or silicon dioxide, copper sulfide, or zinc sulfide. A thin film is formed from a metal compound such as a metal sulfide or an inorganic substance by a thin film forming method such as a vapor deposition method, an ion blasting method, or a sputtering method, and the thickness of such a thin film is 50%
-1000 people is preferable, and the light transmittance is 20-99
% is preferred. This thin film layer 4 can also be provided partially if necessary. A method of partially providing the thin film layer 4 is to form a water-soluble resin in the area where the thin film layer 4 is not required, form the thin film layer 4 on the entire surface from above, and wash it with water to remove the need for the thin film layer 4 along with the water-soluble resin. There are ways to remove such parts. Incidentally, when ordinary metals are deposited in the form of a thin film as described above, unnecessary coloring may occur, but by forming the thin film layer 4 from a metal compound, a colorless transparent or colorless semitransparent film can be formed. It is effective because it can be formed reliably and coloring that is unnecessary for the design can be prevented. Furthermore, when the thickness of the release layer 2 is large, the unevenness on the surface of the release layer 2 on the side where the thin film layer 4 is formed may be smaller than the level of unevenness on the base sheet 1 side. Subtle design effects can be obtained due to the difference in degree of light reflection on the surface of layer 2 and light reflection on the surface of thin film N4. The pattern layer 5 is provided on the entire surface or in parts as necessary to form a desired pattern, picture, or pattern. Therefore, it may be provided between the peelable H layer 2 and the thin film layer 4, or between the thin film layer 4 and the adhesive layer 6, which will be described later. Even in the latter case, there is no problem because the thin film layer 4 is transparent and the pattern of the layer behind it can be seen through. The pattern layer 5 may be provided by a conventional printing method such as a gravure printing method or a screen printing method using an ink made of a resin containing a pigment or a dye and various additives. The adhesive layer 6 serves to fix the transfer material to the object to be transferred by the transfer process, and is formed on the thin film layer 4. As the adhesive layer 6, a heat-sensitive or pressure-sensitive resin suitable for the surface material of the plastic molded product or the like to be transferred is appropriately used. For example, if the material to be transferred is an AS resin, an acrylic resin or a vinyl resin may be used, and if the material is polypropylene, a chlorinated polypropylene resin or an ethylene-vinyl acetate copolymer resin may be used. In addition, release layer 2, anchor layer 3, thin film layer 4, pattern N5,
It is preferable to select adhesive N6 that has excellent adhesion at the mutual interface. In this way, the uneven transfer foil of the present invention is completed (see FIG. 1). 1. PMM on a base sheet with a diamond cut pattern on the surface
After forming a release layer made of A to a thickness of 2 μm using a gravure coater, a thin film of silicon dioxide was formed to a thickness of 500 by sputtering, and an adhesive layer made of vinyl chloride resin was formed to a thickness of 2 μm. A concavo-convex transfer foil was obtained using a gravure coater. This uneven transfer foil was inserted into a mold for injection molding, and acrylic styrene resin was injected to obtain a transfer molded product. This molded product had a higher level of unevenness design than a case without a silicon dioxide thin film, and the unevenness design did not disappear even after coating to protect the surface.
この発明の転写箔は、剥離層、薄膜層、接着層を成形品
に転写して基体ノートを剥離することにより、基体シー
トの凹凸が剥離層に写し取られて剥離層の表面に凹凸が
形成され、成形品表面が凹凸状態乙：なる（第２図参照
）。
このとき、剥離層の凹凸の下には光反射性を有する薄膜
層が剥離層の凹凸に沿うようムこ形成されており、その
ような薄膜層の凹凸によって光の反射性の差が生しる。
このため、剥則層の凹凸はその段差や凹凸の傾斜角度な
どが強調され凹凸の状態が認知でき意匠効果が充分に保
たれる。
また、剥離層の凹凸に汚れが付着したり、オーバーコー
トを施して、剥離層の凹凸が消えてしまっても、反射性
を有する薄膜層の凹凸によって凹凸が表現できるので、
剥離層とは無関係に依然凹凸感が保たれる。
また、薄膜層は光透過性をも有する層なので、ギラつき
のないほどよい反射程度となり、また、剥離層の凹凸が
過度に強調されすぎることもない。In the transfer foil of this invention, by transferring the release layer, thin film layer, and adhesive layer to the molded product and peeling off the base note, the unevenness of the base sheet is transferred to the release layer, forming unevenness on the surface of the release layer. As a result, the surface of the molded product becomes uneven (see Figure 2). At this time, a light-reflective thin film layer is formed under the unevenness of the release layer to follow the unevenness of the release layer, and the unevenness of the thin film layer causes differences in light reflectivity. Ru. For this reason, the unevenness of the peeling layer emphasizes the steps and the angle of inclination of the unevenness, allowing the condition of the unevenness to be recognized and the design effect to be maintained sufficiently. In addition, even if dirt adheres to the unevenness of the release layer or the unevenness of the release layer disappears due to overcoating, the unevenness can be expressed by the unevenness of the reflective thin film layer.
The uneven feel is still maintained regardless of the release layer. Furthermore, since the thin film layer also has light transmittance, the degree of reflection is good without glare, and the unevenness of the release layer is not excessively emphasized.
第１図はこの発明の凹凸転写箔の一実施例を示す断面図
である。第２図はこの発明の凹凸転写箔を成形品上に転
写しているところの断面図である。
１・・・基体シート、２・・・剥離層、３・・・アンカ
ー層、４・・・薄膜層、５・・・絵柄層、６・・・接着
層。
特許出願人 日本写真印刷株式会社
第】図
第２図FIG. 1 is a sectional view showing an embodiment of the uneven transfer foil of the present invention. FIG. 2 is a sectional view showing the uneven transfer foil of the present invention being transferred onto a molded product. DESCRIPTION OF SYMBOLS 1... Base sheet, 2... Peeling layer, 3... Anchor layer, 4... Thin film layer, 5... Pattern layer, 6... Adhesive layer. Patent applicant Nissha Printing Co., Ltd. Figure 2
Claims (7)
トから剥製可能な剥離層が全面に設けられ、さらにこの
上に光透過性と光反射性を有する薄膜層が全面に設けら
れ、さらに接着層が全面に設けられた凹凸転写箔。(1) A release layer that can be peeled off from the base sheet is provided on the entire surface of the base sheet having an uneven surface, and a thin film layer having light transmittance and light reflectivity is further provided on the entire surface of the base sheet, and further adhesive Concave and convex transfer foil with layers all over the surface.
に記載の凹凸転写箔。(2) Claim 1, wherein the thin film layer is made of a metal compound.
The uneven transfer foil described in .
〜２のいずれかに記載の凹凸転写箔。(3) Claim 1, wherein the thickness of the thin film layer is 50 to 1000 Å.
The uneven transfer foil according to any one of items 1 to 2.
〜３のいずれかに記載の凹凸転写箔。(4) Claim 1, wherein the thin film layer has a light transmittance of 20 to 99%.
The uneven transfer foil according to any one of items 1 to 3.
項１〜４のいずれかに記載の凹凸転写箔。(5) The uneven transfer foil according to any one of claims 1 to 4, wherein a pattern layer is provided between the thin film layer and the adhesive layer.
項１〜５のいずれかに記載の凹凸転写箔。(6) The uneven transfer foil according to any one of claims 1 to 5, wherein a pattern layer is provided between the release layer and the thin film layer.
た溝群からなる区画領域を複数個有することにより凹凸
表面となったものである請求項１〜６のいずれかに記載
の凹凸転写箔。(7) The uneven transfer foil according to any one of claims 1 to 6, wherein the base sheet has an uneven surface by having a plurality of divided regions each consisting of a group of grooves arranged parallel to each other at minute intervals. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2320016A JPH04189200A (en) | 1990-11-22 | 1990-11-22 | Uneven surface transfer foil |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2320016A JPH04189200A (en) | 1990-11-22 | 1990-11-22 | Uneven surface transfer foil |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04189200A true JPH04189200A (en) | 1992-07-07 |
Family
ID=18116813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2320016A Pending JPH04189200A (en) | 1990-11-22 | 1990-11-22 | Uneven surface transfer foil |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04189200A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5832415A (en) * | 1994-10-18 | 1998-11-03 | Eos Gmbh Electro Optical Systems | Method and apparatus for calibrating a control apparatus for deflecting a laser beam |
| WO2013061689A1 (en) * | 2011-10-24 | 2013-05-02 | 日本写真印刷株式会社 | Hairline-like decorative molded article providing sensation unique to hairline processing and providing fingerprint resistance |
| JP2014000745A (en) * | 2012-06-20 | 2014-01-09 | Reiko Co Ltd | Metallic molded product and transfer film used for the same |
| US10308057B2 (en) | 2016-12-02 | 2019-06-04 | Canon Finetech Nisca Inc. | Transfer material, printed material, and manufacturing method for printed material |
-
1990
- 1990-11-22 JP JP2320016A patent/JPH04189200A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5832415A (en) * | 1994-10-18 | 1998-11-03 | Eos Gmbh Electro Optical Systems | Method and apparatus for calibrating a control apparatus for deflecting a laser beam |
| WO2013061689A1 (en) * | 2011-10-24 | 2013-05-02 | 日本写真印刷株式会社 | Hairline-like decorative molded article providing sensation unique to hairline processing and providing fingerprint resistance |
| JP2014000745A (en) * | 2012-06-20 | 2014-01-09 | Reiko Co Ltd | Metallic molded product and transfer film used for the same |
| US10308057B2 (en) | 2016-12-02 | 2019-06-04 | Canon Finetech Nisca Inc. | Transfer material, printed material, and manufacturing method for printed material |
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