JPH04180600A - Electropolishing solution for stainless steel - Google Patents
Electropolishing solution for stainless steelInfo
- Publication number
- JPH04180600A JPH04180600A JP30998790A JP30998790A JPH04180600A JP H04180600 A JPH04180600 A JP H04180600A JP 30998790 A JP30998790 A JP 30998790A JP 30998790 A JP30998790 A JP 30998790A JP H04180600 A JPH04180600 A JP H04180600A
- Authority
- JP
- Japan
- Prior art keywords
- stainless steel
- acid
- steel material
- salts
- current density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910001220 stainless steel Inorganic materials 0.000 title claims abstract description 31
- 239000010935 stainless steel Substances 0.000 title claims abstract description 30
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims abstract description 10
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000003839 salts Chemical class 0.000 claims abstract description 6
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 8
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 abstract description 3
- 239000005819 Potassium phosphonate Substances 0.000 abstract description 3
- YXXXKCDYKKSZHL-UHFFFAOYSA-M dipotassium;dioxido(oxo)phosphanium Chemical compound [K+].[K+].[O-][P+]([O-])=O YXXXKCDYKKSZHL-UHFFFAOYSA-M 0.000 abstract description 3
- 150000002500 ions Chemical class 0.000 abstract description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 abstract description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 16
- 239000007788 liquid Substances 0.000 description 11
- 238000005498 polishing Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229960002050 hydrofluoric acid Drugs 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Chemical compound O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はステンレス鋼のスケールの除去、並びに加工材
などを鏡面にするための電解研磨液に関するものである
。今日、エレクトロニクス、化学プラント、建材等に用
いるステンレス鋼の鏡面化は多彩化し、その用途は広範
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an electrolytic polishing liquid for removing scale from stainless steel and for making processed materials mirror-finished. Nowadays, mirror finishing of stainless steel used in electronics, chemical plants, building materials, etc. is diversified, and its applications are wide-ranging.
ステンレス鋼の焼鈍スケールは通常ショツトブラスト或
いはパフ研磨後、硫酸ナトリウム→硝弗酸→硝酸ナトリ
ウムなどの水溶液中で電解研磨を行なっている。一方、
溶接スケールな−どはリン酸を主成分とし、これに硫酸
、硝酸、゛シュウ酸、クエン酸などを付加した混酸或は
硝弗酸などの水溶液に浸種（化学研磨）するか、電解研
磨を行なっている。このほか、砥石による機械研磨もひ
ろく行なわれている。Stainless steel annealing scales are usually shot blasted or puff polished and then electrolytically polished in an aqueous solution such as sodium sulfate → nitric hydrofluoric acid → sodium nitrate. on the other hand,
Welding scale, etc., should be immersed (chemically polished) in a mixed acid containing phosphoric acid as a main component and added with sulfuric acid, nitric acid, oxalic acid, citric acid, etc., or in an aqueous solution such as nitric-fluoric acid, or electrolytically polished. I am doing it. In addition, mechanical polishing using whetstones is also widely practiced.
然し乍ら、工業界のステンレス鋼に関する鏡面率（平滑
度）の要求は止まるところを知らない。However, there is no end to the demand for specularity (smoothness) for stainless steel in the industrial world.
本発明はステンレス鋼のスケールを除去すると共に更に
これを優れた鏡面にする安易な電解研磨液を開発するこ
とにある。The object of the present invention is to develop a simple electrolytic polishing solution that removes scale from stainless steel and also gives it an excellent mirror finish.
今日、ステンレス鋼の鏡面を目的とする電解研磨液の殆
どはリン酸を主成分とするものである。Today, most of the electrolytic polishing solutions intended for polishing stainless steel have phosphoric acid as a main component.
本発明では次亜リン酸あるいは亜リン酸、並びにこれら
の各種の塩を含む電解液を作成し、鏡面試験を行なった
。尚、鏡面率の測定には光輝度測定装置を用いた。In the present invention, an electrolytic solution containing hypophosphorous acid, phosphorous acid, and various salts thereof was prepared, and a mirror surface test was conducted. Note that a brightness measuring device was used to measure the specularity.
リン酸より亜リン酸、亜リン酸より次亜リン酸の方が還
元力は強い。これらに直流を通電するとイオンは著しく
活性化する。この活性化されたイオン（例えばＨ，ｐｏ
；、Ｈ，ＰＯコ）はステンレス鋼の凸部を選択的に溶解
するため、平滑化し、鏡面が得られるものと考えられる
。Phosphorous acid has a stronger reducing power than phosphoric acid, and hypophosphorous acid has a stronger reducing power than phosphorous acid. When direct current is applied to these, the ions are significantly activated. This activated ion (e.g. H, po
;, H, PO) selectively melts the convex parts of the stainless steel, so it is thought that the stainless steel is smoothed and a mirror surface is obtained.
ステンレス鋼の代表的なもの、即ち５ＵＳ３０４および
５ＵＳ４３０（５０ｘ ５０ Ｘ １Ｍ板）で以ッテ試
験を行なった。Tests were conducted on representative stainless steels, namely 5US304 and 5US430 (50 x 50 x 1M plates).
この試験片を焼鈍（８５０℃、２時間）し、スケールを
つくり、リン酸を含む従来の電解研磨液と本発明の次亜
リン酸、亜リン酸、並びにこれらの塩を含む電解研磨液
とで鏡面率の比較を行なった。This test piece was annealed (850°C, 2 hours) to form a scale, and then mixed with a conventional electropolishing solution containing phosphoric acid and an electropolishing solution containing hypophosphorous acid, phosphorous acid, and salts thereof of the present invention. We compared the mirror surface ratio.
電解研磨液、並びに電解条件は下記の如くである。The electrolytic polishing solution and electrolytic conditions are as follows.
Ａ液
リンｆｉ ・−・−＝−＝ ・＝ −・−・・−・・・
＝・１００％陽極電流密度・・・・・・・・・・・・・
・・・・・１５〜３０Ａ ／ ｄ ｍ”温度・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
９０〜９５℃−時間・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・１０〜３０分陰極・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・ステンレス鋼板Ｂ液
リン酸−−−−−−−−・−４４ｘ
硫酸・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・４０％クロム酸−＝ −−−−・−・・−
−−−−−−□＝−６Ｘ陽極電流密度・・・・・・・・
・・・・・・・・・・３０〜５０Ａ／ｄｍ’温度・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・４０〜５０℃時間・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・４５〜６０分陰極・・
・・・・・−・・・・・・・・・・・・・・・・・・・
・ステンレス鋼板Ｃ液
次亜リン酸・・・・ ・−・・・・・・５０％水・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・５０％陽極電流密度・・・・・・・・・・・・・
・・・１５〜３０Ａ ／ ｄ ｍ’湿温度・・・・・・
・・・・ ・・・・・・・・・・・・・・９０〜９５℃
時間・・・・・・・・・・・・・・・・・・・・・・・
・・１０〜３０分陰極・・・・・・・・・・・・・・・
・・・・・・・・・・・ステンレス鋼板り液
次亜リン酸アンモニウム・・・・・・５０％水・・・・
・・・・・・・・・・・・−・・・・・・・・・・・・
・・・・・・５０％陽極電流密度・・・・・・・・・・
・・・・・・・・・・・１５〜３０Ａ／ｄｍ’温度・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・９０〜９５℃時間・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・１０〜
３０分陰極・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・ステンレス鋼板Ｅ液
次亜リン酸ナトリウム・・・・・・・・・５０％水・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・５０％陽極電流密度・・・・・・・
・・・・・・・・・・・・・・１５〜３０Ａ／ｄｍ’温
度・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・９０〜９５℃時間・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・１０
〜３０分陰極・・・・・・・・・・・・・・・・・・・
・−・・・−・・・・・・・・ステンレス鋼板Ｆ液
亜リン酸・・・・・・・・・・・・・・・・・・・・・
・・・・・・５０％水・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・５０％陽極
電流密度・・・・・・・・・・・・・・・・・・・・・
１５〜３０Ａ／ｄｍ”温度・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・９０〜９５
℃時間・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・１０〜３０分陰極・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・ステンレス鋼板Ｃ液
亜リン酸カリウム・・・・・・・・・・・・・・・５０
％水・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・５０％陽極電流密度・・・
・・・・・・・・・・・・・・・・・・１５〜３０Ａ／
ｄｍ”温度・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・９０〜９５℃時間・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・・１０〜３０分陰極・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・ステンレス
鋼板Ｈ液
リン酸・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・５０％次亜リン酸・・・・・・・・・
・・・・・・・・・・・・・・・２５％水・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・２５％陽極電流密度・・・・・・・・・・・
・・・・・・・・・・１５〜３０Ａ／ｄゴ温度・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・−・・９０〜９５℃時間・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・１０〜３０
分陰極・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・ステンレス鋼板１液
リン酸−＝ ・−・＝ −・−・＝ ・＝・・−＝・＝
５０％亜リン酸・・・・・・・・・・・・・・・・・
・・・・・・・・・・２５％水・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
２５％陽極電流密度・・・・・・・・・・・・・・・・
・・・・・１５〜３０Ａ ／ ｄ ｍ”温度・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・９０〜９５℃時間・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・１０〜３０分陰
極・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・−・・ステンレス鋼板Ｊ液
リン酸−・−・−−−−−−−−−−−・−−−−−−
−・・−・５０％次亜リン酸ナトリウム・・・・−・・
・・２５％水・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・２５％陽極電流密
度・・・・・・・・・・・・・・・・・・・・・１５〜
３０分温度・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・９０〜９５℃時間・・・・
・・・・・・・・・・・・・・・・・・・・・・・・・
・・・・１０〜３０分陰極・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・ステンレス
鋼板に液
リン酸・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・５０％亜リン酸カリウム・・・・・・
・・・・・・・・・２５％水・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・２
５％陽極電流密度・・・・・・・・・・・・・・・・・
・・・・１５〜３０分温度・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・９０〜９５
℃時間・ ； ・ ・−−・・ １０〜３０分陰極
・ ・・−ステンレス鋼板上記Ａ−にの１１種類
の電解研磨液を用い、上記条件でステンレス鋼の鏡面率
を測定した。結果は下記の如くである。A liquid phosphorus fi ・−・−=−= ・= −・−・・−・・
=・100% anode current density・・・・・・・・・・・・・
...15~30A/dm" temperature...
・・・・・・・・・・・・・・・・・・・・・・・・
90~95℃-hour・・・・・・・・・・・・・・・・
・・・・・・・・・・・・10-30 minutes cathode...
・・・・・・・・・・・・・・・・・・・・・・・・
・・Stainless Steel Plate B Liquid Phosphoric Acid−−−−−−−−・−44x Sulfuric Acid・・・・・・・・・・・・・・・・・・・・・
・・・・・・40% chromic acid −= −−−−・−・・−
−−−−−−□=−6X anode current density・・・・・・・・・
・・・・・・・・・30～50A/dm'Temperature...
・・・・・・・・・・・・・・・・・・・・・・・・
・40~50℃ time・・・・・・・・・・・・・・・
・・・・・・・・・・・・45-60 minutes cathode...
・・・・・・－・・・・・・・・・・・・・・・・・・
・Stainless steel plate C liquid hypophosphorous acid・・・・・・・・50% water・・・
・・・・・・・・・・・・・・・・・・・・・・・・
...50% anode current density...
...15-30A/d m' humidity temperature...
・・・・・・・・・・・・・・・・・・90～95℃
time·······················
・・10-30 minutes cathode・・・・・・・・・・・・・・・
・・・・・・・・・・・・Stainless steel plate solution Ammonium hypophosphite・・・50% water・・・・
・・・・・・・・・・・・－・・・・・・・・・・・・
・・・・・・50% anode current density・・・・・・・・・
・・・・・・・・・15～30A/dm'Temperature...
・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・90~95℃ time・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・10～
30 minutes cathode・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・Stainless steel plate E liquid Sodium hypophosphite・・・・・・50% water・・
・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・50% anode current density・・・・・・
・・・・・・・・・・・・・・・15～30A/dm'Temperature・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・90~95℃ time・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・10
~30 minutes cathode・・・・・・・・・・・・・・・・・・
・−・−・・・・・Stainless steel plate F liquid phosphorous acid・・・・・・・・・・・・・・・・・・・・・・
・・・・・・50% water・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・50% anode current density・・・・・・・・・・・・・・・・・・・・・
15-30A/dm" temperature...
・・・・・・・・・・・・・・・・・・90～95
°C time・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・10-30 minutes cathode・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
・・Stainless steel plate C liquid potassium phosphite・・・・・・・・・・・・・・・50
%water·······················
・・・・・・・・・・・・50% anode current density...
・・・・・・・・・・・・・・・15～30A/
dm” Temperature・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・90-95℃ time・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
・・・10-30 minutes cathode・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・Stainless steel plate H liquid phosphoric acid・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・50% hypophosphorous acid・・・・・・・・・
・・・・・・・・・・・・25% water・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・・25% anode current density・・・・・・・・・・・・
......15-30A/d temperature...
・・・・・・・・・・・・・・・・・・・・・・・・
・-・90~95℃ time・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・10～30
Cathode・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・Stainless steel plate 1-liquid phosphoric acid −= ・−・= −・−・= ・=・・−=・=
50% phosphorous acid・・・・・・・・・・・・・・・・・・
・・・・・・・・・25% water・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
25% anode current density・・・・・・・・・・・・・・・
...15~30A/dm" temperature...
・・・・・・・・・・・・・・・・・・・・・・・・
・・・90~95℃ time・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・10-30 minutes Cathode・・・・・・・・・・・・・・・・・・・・・・・・
・・・・・−・・Stainless steel plate J liquid phosphoric acid −・−・−−−−−−−−−−−・−−−
−・・−・50% Sodium hypophosphite・・・・−・・
・・25% water・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・25% anode current density・・・・・・・・・・・・・・・・・・15~
30 minutes temperature・・・・・・・・・・・・・・・・・・
・・・・・・・・・・・・90-95℃ time・・・・
・・・・・・・・・・・・・・・・・・・・・・・・
...10-30 minutes cathode...
・・・・・・・・・・・・・・・・・・・・・・Liquid phosphoric acid on stainless steel plate・・・・・・・・・・・・・・・・・・・・・・
・・・・・・・・・50% potassium phosphite・・・・・・
・・・・・・・・・25% water・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・・・・・・・2
5% anode current density・・・・・・・・・・・・・・・・・・
・・・15-30 minutes temperature・・・・・・・・・・・・
・・・・・・・・・・・・・・・・・・90～95
°C time: ； ・ ・---・・ 10 to 30 minutes Cathode
- Stainless Steel Plate The specularity of stainless steel was measured under the above conditions using the 11 types of electrolytic polishing solutions described in A- above. The results are as follows.
５ＵＳ（３０４）焼鈍 ： Ａ ｌ ６７〃
１ Ｂ １ ７８
■
／／ ｌ Ｇ ｌ ８７／、１Ｈ
１８８
／／１Ｉ１８４
／／ ＩＪ ：、 ８３１
：
〃 ｉ Ｋ ′ ８４
□
〔発明の効果〕
従来公知のリン酸を主成分とする電解研磨液を用い、ス
テンレス鋼を処理した場合の鏡面率は６２〜７８％であ
ったが、本発明の次亜リン酸、亜リン酸、並びにこれら
の塩を含む電解研磨液でステンレス鋼を処理した場合の
鏡面率は８３〜９２％と飛躍的に向上することが判明し
た。5US (304) Annealing: Al 67〃
1 B 1 78 ■ // l G l 87/, 1H
188 //1I184 // IJ:, 831
: 〃 i K ′ 84 □ [Effect of the invention] When stainless steel was treated with a conventionally known electrolytic polishing solution containing phosphoric acid as a main component, the mirror surface ratio was 62 to 78%, but the mirror surface ratio of the present invention was It has been found that when stainless steel is treated with an electrolytic polishing solution containing hypophosphorous acid, phosphorous acid, and salts thereof, the specularity is dramatically improved to 83 to 92%.
Claims (1)
を用いてステンレス鋼を電解研磨する。Stainless steel is electrolytically polished using an aqueous solution containing hypophosphorous acid, phosphorous acid, or their salts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30998790A JPH04180600A (en) | 1990-11-14 | 1990-11-14 | Electropolishing solution for stainless steel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30998790A JPH04180600A (en) | 1990-11-14 | 1990-11-14 | Electropolishing solution for stainless steel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04180600A true JPH04180600A (en) | 1992-06-26 |
Family
ID=17999775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30998790A Pending JPH04180600A (en) | 1990-11-14 | 1990-11-14 | Electropolishing solution for stainless steel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04180600A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006138110A2 (en) * | 2005-06-13 | 2006-12-28 | Cabot Microelectronics Corporation | Controlled electrochemical polishing method |
| JP2014043596A (en) * | 2012-08-24 | 2014-03-13 | Taseto:Kk | Electrolytic solution |
| JP2020109217A (en) * | 2020-04-20 | 2020-07-16 | 株式会社Ihi | Treatment method of stainless steel component |
-
1990
- 1990-11-14 JP JP30998790A patent/JPH04180600A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006138110A2 (en) * | 2005-06-13 | 2006-12-28 | Cabot Microelectronics Corporation | Controlled electrochemical polishing method |
| WO2006138110A3 (en) * | 2005-06-13 | 2007-06-07 | Cabot Microelectronics Corp | Controlled electrochemical polishing method |
| US7998335B2 (en) | 2005-06-13 | 2011-08-16 | Cabot Microelectronics Corporation | Controlled electrochemical polishing method |
| JP2014043596A (en) * | 2012-08-24 | 2014-03-13 | Taseto:Kk | Electrolytic solution |
| JP2020109217A (en) * | 2020-04-20 | 2020-07-16 | 株式会社Ihi | Treatment method of stainless steel component |
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