JPH04177377A - Contact charger and manufacture thereof - Google Patents
Contact charger and manufacture thereofInfo
- Publication number
- JPH04177377A JPH04177377A JP30406690A JP30406690A JPH04177377A JP H04177377 A JPH04177377 A JP H04177377A JP 30406690 A JP30406690 A JP 30406690A JP 30406690 A JP30406690 A JP 30406690A JP H04177377 A JPH04177377 A JP H04177377A
- Authority
- JP
- Japan
- Prior art keywords
- contact
- charging device
- parting line
- layer
- surface layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000010410 layer Substances 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 27
- 239000002344 surface layer Substances 0.000 claims abstract description 27
- 108091008695 photoreceptors Proteins 0.000 claims description 12
- 230000005684 electric field Effects 0.000 claims description 4
- 239000013013 elastic material Substances 0.000 claims description 3
- 229920001971 elastomer Polymers 0.000 abstract description 3
- 239000000806 elastomer Substances 0.000 abstract description 2
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
- 239000000463 material Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000013011 mating Effects 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004073 vulcanization Methods 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical group N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 ethylene propylene diene Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010734 process oil Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Landscapes
- Electrostatic Charge, Transfer And Separation In Electrography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電子写真式画像形成装置に用いられる帯電装
置及びその製造方法に関し、特に、帯電装置を感光体等
の静電潜像担持体に押圧させ帯電させる接触帯電装置及
びその製造方法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a charging device used in an electrophotographic image forming apparatus and a method for manufacturing the same, and in particular, the present invention relates to a charging device used in an electrophotographic image forming apparatus and a method for manufacturing the same. The present invention relates to a contact charging device for charging by pressing the object, and a method for manufacturing the same.
[従来の技術]
最近、感光体に直接当接させ帯電させる接触帯電装置が
、特開昭63−167380号公報等に記載されている
如く提案されており、従来より用いられているコロナ帯
電方式に比較して、低い印加電圧を使用しうること、オ
ゾン発生が少ないこと等の利点を有していることが認め
られている。[Prior Art] Recently, a contact charging device that charges a photoreceptor by directly contacting it has been proposed as described in Japanese Patent Application Laid-Open No. 63-167380, etc., and a conventional corona charging method has been proposed. It has been recognized that this method has advantages such as being able to use a lower applied voltage and generating less ozone.
この接触帯電方法を示すと、例えば第1図に図示するよ
うに、電子写真感光体ドラム1に帯電部材である帯電ロ
ーラー5を接触従動させ、交流電圧V AC及び直流電
圧V Doとを印加手段3により印加することにより、
感光体ドラム1を均一に帯電させる。従って、帯電ロー
ラー5は導電性を保つ必要があり、また接触部を均一に
保つため芯金58の周囲に設けた基層5bは弾性体によ
り構成される必要がある。かかる手段として従来は、導
電性は基層5b中に導電性カーボンブラック等の導電物
質を添加することにより調整され、また、弾性は基層5
bに添加されるプロセス油、可塑剤等の添加剤により調
整されている。In this contact charging method, for example, as shown in FIG. 1, a charging roller 5, which is a charging member, is caused to contact and follow an electrophotographic photosensitive drum 1, and an AC voltage V AC and a DC voltage V Do are applied to the electrophotographic photosensitive drum 1 by applying means. By applying 3,
A photosensitive drum 1 is uniformly charged. Therefore, the charging roller 5 needs to maintain conductivity, and the base layer 5b provided around the core bar 58 needs to be made of an elastic material in order to keep the contact area uniform. Conventionally, as such means, the conductivity is adjusted by adding a conductive substance such as conductive carbon black into the base layer 5b, and the elasticity is adjusted by adding a conductive substance such as conductive carbon black into the base layer 5b.
It is adjusted by additives such as process oil and plasticizer added to b.
この方式の場合、帯電面は円周方向の面(以下円周面)
上であり、この面の均一性が帯電特性に影響を与えるこ
とが知られている。これに対し、通常は円筒状の型を用
い円周面にパーティングラインが発生しないようにする
か、もしくは合わせ型を用いて成形した後、研磨等によ
り円周面を均一にすることが行われている。かかる円筒
状の型を用いた場合は、円周面の均一性は確保されるも
のの、脱型の際に型からの取り外しが難しく、工程数が
かかり好ましくない。また、研磨の場合は、帯電性の絡
みより被研磨物の硬度が低いため、研磨面の表面は荒れ
やすく均一な面の実現は難しい。In this method, the charged surface is a surface in the circumferential direction (hereinafter referred to as the circumferential surface).
It is known that the uniformity of this surface affects the charging characteristics. On the other hand, usually a cylindrical mold is used to prevent parting lines from forming on the circumferential surface, or a mating mold is used to form the mold and then the circumferential surface is made uniform by polishing etc. It is being said. When such a cylindrical mold is used, although the uniformity of the circumferential surface is ensured, it is difficult to remove from the mold during demolding, and the number of steps is undesirable. Furthermore, in the case of polishing, the hardness of the object to be polished is lower than the chargeability involved, so the surface of the polished surface tends to be rough and it is difficult to achieve a uniform surface.
さらに、当接部において例えば感光体の損傷等による過
電流を防止するため、弾性層からの可塑材等がブリード
するのを防止するために、例えば特開平1−19116
1号公報に記載されているように、弾性層の上を更に4
.0XIO9Ωcm以上の体積抵抗率を有する部材にて
被覆する接触帯電装置が提案されている。これによれば
、表面に被膜を有することで弾性層上の凹凸の影響は緩
和されるものの、まだ充分ではなく均一な面の実現は難
しい。Furthermore, in order to prevent overcurrent due to damage to the photoreceptor, etc. at the contact portion, and to prevent the plastic material etc. from bleeding out from the elastic layer, for example,
As described in Publication No. 1, the top of the elastic layer is further
.. A contact charging device coated with a member having a volume resistivity of 0XIO9Ωcm or more has been proposed. According to this, although the effect of unevenness on the elastic layer is alleviated by having a coating on the surface, it is still insufficient and it is difficult to realize a uniform surface.
[発明が解決しようとする課題]
すなわち、本発明の目的とするところは、上述のごとき
欠点を解決した接触帯電装置を提供することにある。[Problems to be Solved by the Invention] That is, an object of the present invention is to provide a contact charging device that solves the above-mentioned drawbacks.
また、工程数が少なく安価に製造し得る接触帯電装置の
製造方法を提供することにある。Another object of the present invention is to provide a method for manufacturing a contact charging device that can be manufactured at low cost with a small number of steps.
さらには、帯電表面の平滑性が高く安定した帯電が行わ
れる接触帯電装置及びその製造方法を提供することにあ
る。Another object of the present invention is to provide a contact charging device that has a highly smooth charging surface and can perform stable charging, and a method for manufacturing the same.
[課題を解決するための手段及び作用]上述目的は、以
下の構成を有する接触帯電装置及びその製造方法により
達成される。すなわち、第1に、感光体に当接させかつ
電界を印加して帯電を行う、電子写真装置に用いられる
接触帯電装置であって、該接触帯電装置の当接部は、少
なくとも下層及び表層の2層より構成され、該下層は弾
性を有し・かつパーティングラインが当接面側に生じる
ように合わせ型により型成形されたものであり、該表層
は前記下層を被覆するように設けかつその膜厚が前記パ
ーティングライン凹凸差の最大値の10倍以上である構
成を成した接触帯電装置、により達成される。[Means and operations for solving the problem] The above object is achieved by a contact charging device and a method for manufacturing the same having the following configuration. That is, firstly, it is a contact charging device used in an electrophotographic apparatus that performs charging by bringing it into contact with a photoreceptor and applying an electric field, and the contact portion of the contact charging device charges at least the lower layer and the surface layer. Consisting of two layers, the lower layer has elasticity and is molded using a matching mold so that the parting line is formed on the contact surface side, and the surface layer is provided to cover the lower layer and This is achieved by a contact charging device configured such that the film thickness is 10 times or more the maximum value of the difference in unevenness of the parting line.
第2に、感光体に当接させかつ電界を印加して帯電を行
う、電子写真装置に用いられる接触帯電装置の製造方法
であって、該接触帯電装置の当接部を少なくとも下層及
び表層の2層より形成するに際し、該下層を弾性材料に
より合わせ型を用いて成形すると共にそのパーティング
ラインが当接面側に生じるようにし、該表層をその膜厚
が前記パーティングライン凹凸差の最大値の10倍以上
になるよう前記下層を被覆する接触帯電装置の製造方法
、により達成される。Second, there is a method for manufacturing a contact charging device used in an electrophotographic apparatus, in which the contact charging device is brought into contact with a photoreceptor and charged by applying an electric field, and the contact portion of the contact charging device is connected to at least a lower layer and a surface layer. When forming two layers, the lower layer is molded using an elastic material using a matching mold, and the parting line is formed on the contact surface side, and the surface layer is formed so that its film thickness is the maximum of the difference in unevenness of the parting line. This is achieved by a method for manufacturing a contact charging device, in which the lower layer is coated so as to have a value of 10 times or more.
以下、本発明の構成について詳細に説明する。Hereinafter, the configuration of the present invention will be explained in detail.
先ず、本発明の接触帯電装置における第1の特徴点は、
その構造が少なくとも弾性を司る下層(以下、弾性層と
称す。)とその表面を慣らす表層(以下、被膜層と称す
。)との2層により構成されていることである。かかる
2層構造にする点は、従来同様帯電作用を成す為の導電
性を有すると共に、帯電が均一に行われるように当接に
柔軟性を持たせる為の弾性を有する構造を得るためであ
る。First, the first feature of the contact charging device of the present invention is that
Its structure consists of at least two layers: a lower layer that controls elasticity (hereinafter referred to as the elastic layer) and a surface layer that adjusts the surface (hereinafter referred to as the coating layer). The reason for having such a two-layer structure is to obtain a structure that has conductivity to perform the charging action as in the conventional case, and also has elasticity to provide flexibility in contact so that charging is performed uniformly. .
ここで弾性層材料としては、弾性・抵抗等の緒特性によ
り選定されている材料、例えば、エチレンプロピレンジ
エンターボリマー(EPDM)。Here, the material for the elastic layer is a material selected based on its properties such as elasticity and resistance, such as ethylene propylene diene polymer (EPDM).
ジメチルシリコンゴム(Q−Me)、ブタジエンゴム(
BR)、天然ゴム(NR)等の樹脂エラストマーに対し
導電性顔料を添加した材料等が挙げられる。Dimethyl silicone rubber (Q-Me), butadiene rubber (
Examples include materials in which conductive pigments are added to resin elastomers such as BR) and natural rubber (NR).
また、感光体接触部の表層材料としては、帯電部分にお
ける当接状態の安定性及び感光体の消耗より、常温で柔
軟性を有する材料が好ましく、例えば、ポリアミド、ポ
リイミド、ポリウレタン。Further, as the surface layer material of the photoconductor contacting part, a material that is flexible at room temperature is preferable in view of the stability of the contact state in the charged part and wear of the photoconductor, such as polyamide, polyimide, and polyurethane.
ポリビニルアルコール、テフロン、シリコン、ポリエス
テル等が挙げられる。Examples include polyvinyl alcohol, Teflon, silicone, polyester, and the like.
次に、上述筒1の特徴を前提条件として、本発明におけ
る第2の特徴点は、下層たる弾性層を、パーティングラ
インが感光体との当接面側に生じるように、合わせ型に
より注入成形することにある。Next, with the characteristics of the cylinder 1 mentioned above as a prerequisite, the second feature of the present invention is to inject the lower elastic layer using a mating mold so that the parting line is formed on the side of the contact surface with the photoreceptor. It lies in shaping.
例えば、第2図に示すようなローラータイプの接触帯電
装置部材を形成する場合、芯金5aの外周に設ける下層
(弾性層)5bの成形は、生産性等の面から熱硬化性エ
ラストマーを金型中に圧入し加熱架橋させる方法、熱可
塑性エラストマーを加熱下において金型中に注入し成形
する方法、熱可塑性樹脂を加熱下において金型中に注入
し成形する方法等による合わせ型を用いた型成形が好ま
しく、その際のパーティングラインを何処に設けるかが
問題となる。For example, when forming a roller-type contact charging device member as shown in FIG. A method of press-fitting into a mold and heat crosslinking, a method of injecting a thermoplastic elastomer into a mold under heating and molding, a method of injecting a thermoplastic resin into a mold under heating and molding, etc. were used. Mold forming is preferable, and the problem is where to set the parting line.
本来、型の合わせ面のずれによって、成形品に発生する
パーティングライン部の段差は皆無に越したことはな(
、とは言うものの製造技術面から精度上の制約があり、
段差をなくすことはできない。Originally, it is better to eliminate the level difference at the parting line that occurs in the molded product due to misalignment of the mating surfaces of the mold (
However, there are limitations on accuracy due to manufacturing technology.
It is not possible to eliminate the gap.
通常、割型方式により成形を行った場合、パーティング
ラインを消滅させるために表面の研磨等が行われている
が、接触帯電装置の場合にあっては、JIS K63
01−Aにより規定される硬度が20〜90°である必
要があり、被研磨物が柔らかいことから、金型により作
られる表面相当の平滑性を研磨により実現するのは困難
である。Normally, when molding is performed using the split mold method, the surface is polished to eliminate parting lines, but in the case of contact charging devices, JIS K63
Since the hardness specified by 01-A must be 20 to 90° and the object to be polished is soft, it is difficult to achieve a surface smoothness equivalent to that produced by a mold by polishing.
そこで、型から製品を離脱する際の容易性等を考慮して
、第2図に示す円柱状(ローラー)の場合には長平方向
にパーティングラインがくるように、例えば型を上下に
2分割する方法を採り、その結果生じた段差を、後述す
る表層(被膜層)で覆うことによって解決しようとする
ものである。Therefore, in consideration of the ease of removing the product from the mold, for example, in the case of a cylindrical (roller) shape as shown in Figure 2, the mold is divided into upper and lower halves so that the parting line is in the elongated direction. This method attempts to solve the resulting step difference by covering it with a surface layer (coating layer), which will be described later.
上述の「パーティングラインが感光体との当接面側に生
じるように」とは、当しく形成界を型から離脱する際の
容易性(時間の短縮化)を得るがために、結果的に生じ
る構成要件である。The above-mentioned "parting line should be formed on the side of the contact surface with the photoconductor" is intended to make it easier (to shorten the time) when removing the forming field from the mold. This is a configuration requirement that occurs in
尚、本発明に係る金型成形用のゲート口は、上述内容か
らも理解されるように、パーティングライン上に配置し
ないことが好ましい。ゲート口では、パーティングライ
ン以上に凹凸が太き(なり、被膜層を設けても表面均一
性が実現されにくいからである。従って、ゲート口の好
ましい形態としては、第2図に示すような円筒状であれ
ば、長手両端に配置し、かつ感光体と当接しない面に設
けて軸方向にコンパウンド材が注入される形態が好まし
い。この場合、帯電装置の抵抗は軸方向に変動が現れや
すくなり、特に両端部において抵抗が上昇しやす(なる
。これに対しては、加硫温度を低く抑えること、注入時
の圧力を低(抑えること等コンパウンド材に対する歪み
を低く抑える方法で対処することができる。Note that, as understood from the above, it is preferable that the gate opening for mold forming according to the present invention is not arranged on the parting line. At the gate opening, the unevenness is thicker than the parting line (this is because it is difficult to achieve surface uniformity even if a coating layer is provided. Therefore, the preferred form of the gate opening is as shown in Figure 2. If it is cylindrical, it is preferable that the compound material is injected in the axial direction by placing it on both longitudinal ends and on the surface that does not come into contact with the photoreceptor.In this case, the resistance of the charging device will fluctuate in the axial direction. The resistance tends to increase, especially at both ends.This can be countered by methods to keep strain on the compound material low, such as by keeping the vulcanization temperature low and the pressure during injection. be able to.
次に、本発明の第3の特徴点は、上述のようにして得ら
れた下層(弾性層)5bの表面(当接側面)にパーティ
ングラインによる段差(凹凸)を有したものの上から、
さらに第3図に示すような表層(被膜層)10を、その
膜厚が段差(凹凸)の10倍以上の厚みを有するように
被覆形成することにある。これにより、均一な当接面が
得られることになる。Next, the third characteristic point of the present invention is that from above the lower layer (elastic layer) 5b obtained as described above, which has a step (irregularity) due to a parting line on the surface (abutting side surface),
Furthermore, a surface layer (coating layer) 10 as shown in FIG. 3 is formed so that the thickness thereof is ten times or more that of the steps (irregularities). This results in a uniform contact surface.
すなわち、接触式の帯電作用において、均一な分布を有
する帯電を行うことが可能となる。That is, in the contact type charging action, it is possible to perform charging with a uniform distribution.
ここで、パーティングラインによる段差(凹凸)は、接
触式・非接触式のいずれかの測定方法を用いても良く、
それより得られた凹凸量のうち最大値を持って代表値と
する。Here, the level difference (unevenness) due to the parting line may be measured using either a contact method or a non-contact method.
The maximum value among the amounts of unevenness obtained from this is taken as the representative value.
また、表層10の膜厚としては、パーティングラインの
凹凸に対し10倍以上の膜厚を有することを要件として
いるが、これが10倍未満であると、凹凸の影響を緩和
しきれずパーティングラインピッチの帯電不良が発生し
好ましくない。−方、膜厚の上限は、使う表層材の体積
抵抗により決められる。尚、本発明における抵抗値は次
のようにして測定される。第4図に示すように接触帯電
装置11に1cm幅の金属箔12を巻つけ、芯金部5a
と金属箔12とを電極として250vを印加し、その1
分後の電流値を計測しそれより抵抗値を算出する。かか
る測定方法に従い、抵抗値が10’〜109Ωになるよ
うに弾性層5b及び表層10の抵抗は決められる。好ま
しい組み合わせとしては、弾性層5bの抵抗としては1
0”〜10’Ωであり、この上に106〜1010Ωc
mの体積抵抗を有する表層10を100μ以上の膜厚に
なるように成形する。通常、パーティングラインの凹凸
は金型精度を向上させても10μが限度であり、これよ
り、表層10の膜厚としては100μ以上が必要となる
。In addition, the thickness of the surface layer 10 is required to be at least 10 times as thick as the unevenness of the parting line, but if it is less than 10 times, the effect of the unevenness cannot be fully alleviated and the parting line This is undesirable because it causes poor charging of the pitch. - On the other hand, the upper limit of the film thickness is determined by the volume resistance of the surface layer material used. Note that the resistance value in the present invention is measured as follows. As shown in FIG. 4, a metal foil 12 with a width of 1 cm is wrapped around the contact charging device 11, and the core metal portion 5a is
250V is applied using the and metal foil 12 as electrodes, part 1
Measure the current value after minutes and calculate the resistance value from it. According to this measuring method, the resistances of the elastic layer 5b and the surface layer 10 are determined so that the resistance value is 10' to 109Ω. As a preferable combination, the resistance of the elastic layer 5b is 1.
0"~10'Ω, and on top of this 106~1010Ωc
A surface layer 10 having a volume resistivity of m is formed to have a thickness of 100 μm or more. Normally, the unevenness of the parting line is limited to 10 μm even if the mold precision is improved, and from this, the thickness of the surface layer 10 is required to be 100 μm or more.
弾性層10の抵抗が103Ω未満では、感光体上にピン
ホール等の欠陥が生じた場合、印加電圧が表層に集中し
絶縁破壊等を起こし好ましくない。一方、10’Ωを超
えると成形による影響を受けやす(なり、抵抗に不均一
性が現れ好ましくない。If the resistance of the elastic layer 10 is less than 10<3 >[Omega], if a defect such as a pinhole occurs on the photoreceptor, the applied voltage will concentrate on the surface layer, causing dielectric breakdown, etc., which is undesirable. On the other hand, if it exceeds 10'Ω, it is unfavorable because it is susceptible to the effects of molding and non-uniformity appears in the resistance.
表層10の体積抵抗率が106Ωcm以下では、適正抵
抗にするための膜厚が厚くなり帯電器の表面硬度が上昇
し好ましくない。一方、10IOΩcm以上では、膜厚
を挙げることができず好ましくない。If the volume resistivity of the surface layer 10 is less than 10 6 Ωcm, it is not preferable because the film thickness to obtain a proper resistance becomes thick and the surface hardness of the charger increases. On the other hand, if it is 10IOΩcm or more, the film thickness cannot be increased, which is not preferable.
さらに、本発明に係る弾性層5bは、電極を支持するた
めに用いられるため、難燃性であることが好ましく、特
にUL−94規格にて94HB以上の難燃性を有してい
ることが好ましい。Furthermore, since the elastic layer 5b according to the present invention is used to support the electrode, it is preferably flame retardant, and particularly preferably has a flame retardance of 94HB or higher according to the UL-94 standard. preferable.
[実施例] 以下、本発明の実施例を具体的に示す。[Example] Examples of the present invention will be specifically shown below.
以上の材料を20℃に冷却した2本ロール上にて30分
間混合し、原料コンパウンドを調整する。以上原料10
0重量部に対し加硫剤としてジクミルパーオキサイド2
重量部を加え更にロール上にて2時間混合する。このコ
ンパウンドを用い、φ6ステンレス製芯金5aの周囲に
、外径φ12になるように弾性層5bを加硫、成型する
。The above materials are mixed for 30 minutes on two rolls cooled to 20° C. to prepare a raw material compound. Above 10 raw materials
0 parts by weight of dicumyl peroxide 2 as a vulcanizing agent
Add parts by weight and mix on a roll for 2 hours. Using this compound, an elastic layer 5b is vulcanized and molded around a φ6 stainless steel core metal 5a so as to have an outer diameter of φ12.
この際、成形型として長手方向に2分割した内径φ12
の円筒状の型を用い、加硫後これを分解し帯電装置用弾
性層を取り出す。この弾性層上のパーティングラインの
凹凸は、レーザー顕微鏡により測定したところ10μで
あった。また、抵抗を測定したところ1o″Ωであった
。この弾性層5bの上に表層10を設けるために、
をメタノール/トルエンの混合溶媒にて溶解し被膜用塗
料を作成する。この塗料を用い、先の弾性層上にロール
コーティング法により200μの表面層を形成し、接触
帯電装置11を作製した。At this time, the inner diameter of the mold is φ12, which is divided into two in the longitudinal direction.
After vulcanization, the cylindrical mold is disassembled and the elastic layer for the charging device is taken out. The unevenness of the parting line on this elastic layer was measured using a laser microscope and was found to be 10 μm. Further, the resistance was measured and found to be 1 o''Ω. In order to provide the surface layer 10 on the elastic layer 5b, a coating material was prepared by dissolving in a mixed solvent of methanol/toluene. Using this coating material, A contact charging device 11 was prepared by forming a 200 μm surface layer on the above elastic layer by roll coating.
この帯電装置表層上のパーティングライン跡の凹凸は、
レーザー顕微鏡により測定したところ、2μ以下であっ
た。また、抵抗を測定したところ106Ωであった。こ
の帯電装置をLBP−811(キャノン社製)に用いる
カートリッジの帯電装置位置に取りつけ、芯金5a部に
のバイアスを印加し帯電を行わせ、通電初期及び1万枚
通紙後について以下の項目について評価を行った。The unevenness of the parting line trace on the surface layer of the charging device is
When measured using a laser microscope, it was 2 μ or less. Further, when the resistance was measured, it was 106Ω. This charging device was attached to the charging device position of the cartridge used in LBP-811 (manufactured by Canon), and a bias was applied to the core bar 5a to perform charging. We evaluated the following.
(1)電位安定性
感光体を除電した後、上記バイアスを印加し帯電を行い
感光体表面電位を表面電位計により計測し、チャート上
の電位のフレのうち帯電ローラーピッチのフレにより評
価した。(1) Potential Stability After neutralizing the photoreceptor, it was charged by applying the above bias, and the surface potential of the photoreceptor was measured with a surface potentiometer, and evaluated by the fluctuation of the charging roller pitch among the potential fluctuations on the chart.
○→電位のフレが 5V以内
06時 同上 5〜IOV
△に) 同上 10〜20V
△×に) 同上 20〜30V
×に) 同上 30V以上
(2)耐ピンホール性
感光体に故意にピンホールを着け、100回ピンホール
を帯電部に通し、異常電流が流れる頻度を計測する。○→Potential fluctuation within 5V 06:00 Same as above 5 to IOV △) Same as above 10 to 20V △ ×) Same as above 20 to 30V Then, pass a pinhole through the charged part 100 times to measure the frequency at which abnormal current flows.
○中具常電流発生が3回以内
○△中 同上 3〜5 回
△に) 同上 5〜10回
△×に) 同上 10〜20回
×に) 同上 20回以上
この結果は、後述する第1表に示すように、−方杖まで
帯電性・耐ピンホール性とも異常な(、安定した特性を
示した。○ Medium current generation occurred within 3 times ○ △ Medium Same as above 3 to 5 times △) Same as above 5 to 10 times △ ×) Same as above 10 to 20 times As shown in the table, both the chargeability and pinhole resistance were abnormal (and stable) up to the negative side.
尚、表中0は上記現象が認められないことを示す。Note that 0 in the table indicates that the above phenomenon was not observed.
比1硼↓
表層10の膜厚を50μとした以外は、実施例1と同様
にして評価を行った。Ratio 1↓ Evaluation was performed in the same manner as in Example 1 except that the thickness of the surface layer 10 was 50 μm.
その結果は、第1表に示すように、初期よりパーティン
グピッチの帯電不良が発生し、また耐久により耐ピンホ
ール性にも悪化の傾向が認められた
犬1d匣1
弾性層5bの処方として、
とした以外は、実施例1と同様にして評価を行った。As shown in Table 1, the results showed that charging defects occurred at the parting pitch from the initial stage, and pinhole resistance tended to deteriorate with durability. The evaluation was performed in the same manner as in Example 1, except that .
その結果を第1表に示す。The results are shown in Table 1.
血校エユ
金型を円筒状の一体型とした以外は、実施例2と同様に
して評価を行った。その結果は、第1表に示すように、
金型に対しヒドリンゴムが付着し、弾性層5b表面が不
均一となり、帯電装置ピッチの激しい帯電不良が発生し
た。Evaluation was carried out in the same manner as in Example 2, except that the blood mold was made into a cylindrical integral type. The results are as shown in Table 1.
Hydrin rubber adhered to the mold, the surface of the elastic layer 5b became non-uniform, and charging defects occurred with severe pitch of the charging device.
見立■ユ
金型精度を下げパーティングラインの凹凸が20μとな
った弾性層5bを用いた以外は、実施例1と同様にして
評価を行った。Evaluation was carried out in the same manner as in Example 1, except that the precision of the Mitate mold was lowered and the elastic layer 5b with a parting line unevenness of 20 μm was used.
その結果、第1表に示すように、実施例1と同様に帯電
性・耐ピンホール性とも安定した特性を示した。As a result, as shown in Table 1, similar to Example 1, stable charging properties and pinhole resistance were exhibited.
支i正A
弾性層5bのうち、カーボン量を3重量部とした以外は
、実施例3と同様にして評価を行った。Support I Positive A Evaluation was performed in the same manner as in Example 3 except that the amount of carbon in the elastic layer 5b was 3 parts by weight.
その結果は、第1表に示すように、耐ピンホール性にお
いては著しく効果が認められた。As shown in Table 1, the results showed that the pinhole resistance was significantly improved.
夫五土二
表層10の処方のうち、酸化チタン量を100重量部と
した以外は、実施例3と同様にして評価を行った。その
結果は、第1表に示すように、帯電性・耐ピンホール性
共に充分な特性を示した。Evaluation was performed in the same manner as in Example 3, except that the amount of titanium oxide in the formulation of Fugotoji surface layer 10 was 100 parts by weight. As shown in Table 1, the results showed sufficient charging properties and pinhole resistance.
第 1 表
〔発明の効果]
以上説明したように、本発明の接触帯電装置及びその製
造方法によれば、
00割型を用いることにより成形を簡便に行うことがで
き、
■、また、それにより発生するパーティングラインの段
差(凹凸)は、その凹凸に対し10倍以上の厚さを有す
る膜にて被膜することにより、影響を除去する事が可能
となり、均一な帯電作用を得ることが可能となった。Table 1 [Effects of the Invention] As explained above, according to the contact charging device and the manufacturing method thereof of the present invention, molding can be easily performed by using a 00% mold; By coating the parting line with a film that is 10 times or more thicker than the unevenness that occurs, it is possible to remove the effect and obtain a uniform charging effect. It became.
第1図は、従来の接触帯電装置を用いた電子写真式画像
形成装置の一部を示すものである。
第2図は、本発明に係る接触帯電装置用弾性層の製造方
法の一例を示す図である。
第3は、本発明の接触帯電装置の構成図を示す。
第4図は、本発明の接触帯電装置の抵抗を測定する手段
を示す図である。
1・・・感光体 3・・・電圧印加手段5
・・・接触帯電装置 5a・・・芯金5b・・・
下層(弾性層)FIG. 1 shows a part of an electrophotographic image forming apparatus using a conventional contact charging device. FIG. 2 is a diagram showing an example of a method for manufacturing an elastic layer for a contact charging device according to the present invention. The third diagram shows a configuration diagram of the contact charging device of the present invention. FIG. 4 is a diagram showing means for measuring the resistance of the contact charging device of the present invention. 1... Photoreceptor 3... Voltage application means 5
... Contact charging device 5a ... Core metal 5b ...
Lower layer (elastic layer)
Claims (2)
、電子写真装置に用いられる接触帯電装置であって、該
接触帯電装置の当接部は、少なくとも下層及び表層の2
層より構成され、該下層は弾性を有しかつパーティング
ラインが当接面側に生じるように合わせ型により型成形
されたものであり、該表層は前記下層を被覆するように
設けかつその膜厚が前記パーティングライン凹凸差の最
大値の10倍以上であることを特徴とする接触帯電装置
。(1) A contact charging device used in an electrophotographic device that performs charging by contacting a photoreceptor and applying an electric field, the contact charging device having at least two contact portions, a lower layer and a surface layer.
The lower layer has elasticity and is formed by a matching mold so that the parting line is formed on the contact surface side, and the surface layer is provided to cover the lower layer and the film is A contact charging device characterized in that the thickness is 10 times or more the maximum value of the difference in unevenness of the parting line.
、電子写真装置に用いられる接触帯電装置の製造方法で
あって、該接触帯電装置の当接部を少なくとも下層及び
表層の2層より形成するに際し、該下層を弾性材料によ
り合わせ型を用いて成形すると共にそのパーティングラ
インが当接面側に生じるようにし、該表層をその膜厚が
前記パーティングライン凹凸差の最大値の10倍以上に
なるよう前記下層を被覆することを特徴とする接触帯電
装置の製造方法。(2) A method for manufacturing a contact charging device used in an electrophotographic device, in which the contact charging device is charged by bringing it into contact with a photoreceptor and applying an electric field, the contact charging device having at least two contact portions, a lower layer and a surface layer. When forming layers, the lower layer is molded using an elastic material using a matching mold, and the parting line is formed on the contact surface side, and the surface layer is formed so that its film thickness is the maximum value of the difference in unevenness of the parting line. A method for manufacturing a contact charging device, characterized in that the lower layer is coated to a thickness of 10 times or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2304066A JP3000481B2 (en) | 1990-11-13 | 1990-11-13 | Contact charging device and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2304066A JP3000481B2 (en) | 1990-11-13 | 1990-11-13 | Contact charging device and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04177377A true JPH04177377A (en) | 1992-06-24 |
JP3000481B2 JP3000481B2 (en) | 2000-01-17 |
Family
ID=17928625
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---|---|---|---|
JP2304066A Expired - Fee Related JP3000481B2 (en) | 1990-11-13 | 1990-11-13 | Contact charging device and method of manufacturing the same |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5497219A (en) * | 1993-05-31 | 1996-03-05 | Ricoh Company, Ltd. | Charge rollers having improved layer structure and/or surface characteristics in an image forming apparatus |
US7856200B2 (en) | 2006-02-03 | 2010-12-21 | Fuji Xerox Co., Ltd. | Semiconductive belt, semiconductive roll and image forming apparatus using these members |
-
1990
- 1990-11-13 JP JP2304066A patent/JP3000481B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5497219A (en) * | 1993-05-31 | 1996-03-05 | Ricoh Company, Ltd. | Charge rollers having improved layer structure and/or surface characteristics in an image forming apparatus |
US7856200B2 (en) | 2006-02-03 | 2010-12-21 | Fuji Xerox Co., Ltd. | Semiconductive belt, semiconductive roll and image forming apparatus using these members |
Also Published As
Publication number | Publication date |
---|---|
JP3000481B2 (en) | 2000-01-17 |
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