JPH04177336A - Silver halogenide film sensitive material - Google Patents
Silver halogenide film sensitive materialInfo
- Publication number
- JPH04177336A JPH04177336A JP30646290A JP30646290A JPH04177336A JP H04177336 A JPH04177336 A JP H04177336A JP 30646290 A JP30646290 A JP 30646290A JP 30646290 A JP30646290 A JP 30646290A JP H04177336 A JPH04177336 A JP H04177336A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- groups
- general formula
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 46
- 239000004332 silver Substances 0.000 title claims abstract description 46
- 239000000463 material Substances 0.000 title claims abstract description 25
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title abstract description 14
- 150000001875 compounds Chemical class 0.000 claims abstract description 51
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 14
- 125000003277 amino group Chemical group 0.000 claims abstract description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 6
- 230000007062 hydrolysis Effects 0.000 claims abstract description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 3
- -1 silver halide Chemical class 0.000 claims description 73
- 239000000839 emulsion Substances 0.000 claims description 55
- 125000003118 aryl group Chemical group 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 238000001179 sorption measurement Methods 0.000 claims description 10
- 125000001931 aliphatic group Chemical group 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 4
- 125000004104 aryloxy group Chemical group 0.000 claims description 4
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 3
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 claims description 2
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 44
- 206010070834 Sensitisation Diseases 0.000 abstract description 27
- 230000008313 sensitization Effects 0.000 abstract description 27
- 230000035945 sensitivity Effects 0.000 abstract description 23
- 239000003995 emulsifying agent Substances 0.000 abstract 2
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 36
- 125000004432 carbon atom Chemical group C* 0.000 description 35
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 30
- 108010010803 Gelatin Proteins 0.000 description 26
- 229920000159 gelatin Polymers 0.000 description 26
- 239000008273 gelatin Substances 0.000 description 26
- 235000019322 gelatine Nutrition 0.000 description 26
- 235000011852 gelatine desserts Nutrition 0.000 description 26
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 23
- 239000003795 chemical substances by application Substances 0.000 description 22
- 239000010410 layer Substances 0.000 description 22
- 239000007864 aqueous solution Substances 0.000 description 21
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 125000001424 substituent group Chemical group 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 238000011161 development Methods 0.000 description 14
- 238000012545 processing Methods 0.000 description 12
- 125000000623 heterocyclic group Chemical group 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 229910001961 silver nitrate Inorganic materials 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 239000000975 dye Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 8
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 8
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 6
- 235000019345 sodium thiosulphate Nutrition 0.000 description 6
- 239000011593 sulfur Substances 0.000 description 6
- 125000001391 thioamide group Chemical group 0.000 description 6
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Chemical class 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002429 hydrazines Chemical class 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 5
- 230000001737 promoting effect Effects 0.000 description 5
- 230000005070 ripening Effects 0.000 description 5
- 230000001235 sensitizing effect Effects 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000084 colloidal system Substances 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 3
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 3
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910021612 Silver iodide Inorganic materials 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 3
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- AEOCXXJPGCBFJA-UHFFFAOYSA-N ethionamide Chemical compound CCC1=CC(C(N)=S)=CC=N1 AEOCXXJPGCBFJA-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
- 239000004816 latex Substances 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- XULSCZPZVQIMFM-IPZQJPLYSA-N odevixibat Chemical compound C12=CC(SC)=C(OCC(=O)N[C@@H](C(=O)N[C@@H](CC)C(O)=O)C=3C=CC(O)=CC=3)C=C2S(=O)(=O)NC(CCCC)(CCCC)CN1C1=CC=CC=C1 XULSCZPZVQIMFM-IPZQJPLYSA-N 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000120 polyethyl acrylate Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- 229940045105 silver iodide Drugs 0.000 description 3
- 229940001482 sodium sulfite Drugs 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 3
- 125000000565 sulfonamide group Chemical group 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical compound SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 2
- TZNOQWZRUXSMSN-UHFFFAOYSA-N 2-ethenylsulfonyl-n-[1-[(2-ethenylsulfonylacetyl)amino]ethyl]acetamide Chemical compound C=CS(=O)(=O)CC(=O)NC(C)NC(=O)CS(=O)(=O)C=C TZNOQWZRUXSMSN-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 241001061127 Thione Species 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000002015 acyclic group Chemical group 0.000 description 2
- 125000004442 acylamino group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000005910 alkyl carbonate group Chemical group 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 229940101006 anhydrous sodium sulfite Drugs 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 2
- 125000005135 aryl sulfinyl group Chemical group 0.000 description 2
- 125000005110 aryl thio group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 150000002503 iridium Chemical class 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 2
- 229940116357 potassium thiocyanate Drugs 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- 235000017709 saponins Nutrition 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000004964 sulfoalkyl group Chemical group 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N thiocyanic acid Chemical compound SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- QIVUCLWGARAQIO-OLIXTKCUSA-N (3s)-n-[(3s,5s,6r)-6-methyl-2-oxo-1-(2,2,2-trifluoroethyl)-5-(2,3,6-trifluorophenyl)piperidin-3-yl]-2-oxospiro[1h-pyrrolo[2,3-b]pyridine-3,6'-5,7-dihydrocyclopenta[b]pyridine]-3'-carboxamide Chemical compound C1([C@H]2[C@H](N(C(=O)[C@@H](NC(=O)C=3C=C4C[C@]5(CC4=NC=3)C3=CC=CN=C3NC5=O)C2)CC(F)(F)F)C)=C(F)C=CC(F)=C1F QIVUCLWGARAQIO-OLIXTKCUSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
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- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- RWPGFSMJFRPDDP-UHFFFAOYSA-L potassium metabisulfite Chemical compound [K+].[K+].[O-]S(=O)S([O-])(=O)=O RWPGFSMJFRPDDP-UHFFFAOYSA-L 0.000 description 1
- 229940043349 potassium metabisulfite Drugs 0.000 description 1
- 235000010263 potassium metabisulphite Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- PODWXQQNRWNDGD-UHFFFAOYSA-L sodium thiosulfate pentahydrate Chemical compound O.O.O.O.O.[Na+].[Na+].[O-]S([S-])(=O)=O PODWXQQNRWNDGD-UHFFFAOYSA-L 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はハロゲン化銀写真感光材料に関し、特に、X−
レイ、写真製版、マイクロ、一般用アマチュアネガ等の
分野に用いられる感材に関するものであり、フィルム同
志がこすれたりした時に生ずるスリカプリ、圧力増感等
の改良されたハロゲン化銀写真感光材料に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to silver halide photographic materials, particularly X-
This relates to sensitive materials used in the fields of rays, photoengraving, micro, general amateur negatives, etc., and relates to improved silver halide photographic materials that are free from scratches and pressure sensitization that occur when films rub together. It is.
(従来の技術)
近年、感光材料の分野では迅速処理化が急速に進んでい
る。露光の迅速化では、露光時間の短縮(高感度化)、
露光装置(カメラ、スキャナーなど)の内部での搬送性
、取扱い上のタフネス等が要求される。また現像処理の
迅速化では自動現像機による高温迅速処理が行なわれ、
短時間で処理されるために現進性に優れかつ水洗後短時
間で乾燥する感材が要求される。(Prior Art) In recent years, rapid processing has been rapidly progressing in the field of photosensitive materials. Speeding up exposure involves shortening exposure time (higher sensitivity),
Transportability within exposure equipment (cameras, scanners, etc.) and toughness in handling are required. In addition, to speed up the development process, high-temperature and rapid processing is carried out using automatic processing machines.
Since it can be processed in a short time, a sensitive material is required that has excellent developing properties and dries in a short time after washing with water.
X−レイ感材、マイクロ用感材、一般用アマチュアネガ
感材等では高感度化技術においてカバーリングパワー(
単位銀量当りの光学濃度)向上が不可欠であり、特開昭
61−116347号、同57−182732号記載の
方法などによりゼラチン量を減らすことでカバーリング
パワーが向上することが知られている。Covering power (
It is essential to improve the optical density (optical density per unit silver amount), and it is known that the covering power can be improved by reducing the amount of gelatin by methods such as those described in JP-A-61-116347 and JP-A-57-182732. .
しかし、Agに対するゼラチン量を少なくすると、フィ
ルム同志のこすれ等でスリキズ部分が黒化しやすくなり
、スリカプリが発生しやすくなる。However, when the amount of gelatin relative to Ag is reduced, scratched areas tend to blacken due to rubbing between films, etc., and scratch capri is more likely to occur.
また高感度化の目的でハロゲン化銀粒子を高アスペクト
比平板状粒子を採用しようとすると、現像処理前の感材
の取扱いで、スリキズや折れ曲がりによる圧力増感を生
じやすくなる。Furthermore, if tabular grains with a high aspect ratio are used as silver halide grains for the purpose of increasing sensitivity, pressure sensitization is likely to occur due to scratches or bending during handling of the sensitive material before development.
また、感材の現進性向上および水洗後の乾燥スピードu
pの目的でバインダー量を減らそうとすると、写真性能
上、粒状性の悪化を招いたり、取扱い上の圧力増感が悪
化する。In addition, it improves the developability of photosensitive materials and the drying speed after washing with water.
If an attempt is made to reduce the amount of binder for the purpose of reducing the amount of binder, it may lead to deterioration of graininess in terms of photographic performance or worsen pressure sensitization during handling.
スリキズ耐性とカバーリングパワーの両立をはかる技術
として特開昭64−29834に、水溶性ポリエステル
を感材に含有させる方法が開示されているが、該技術も
問題の完全解決には至っておらず、さらに改良する技術
が求められていた。As a technique for achieving both scratch resistance and covering power, Japanese Patent Application Laid-Open No. 64-29834 discloses a method of incorporating water-soluble polyester into a photosensitive material, but this technique has not yet completely solved the problem. There was a need for further improved technology.
また、写真製版用感材の分野では、従来のリス現像にお
ける画像形成の不安定さを解消し、安定、迅速かつTが
10を超える超硬調のネガ画像を形成するシステムが、
米国特許4.166.742号、同4,168.977
号、同4,221,857号、同4,224,401号
、同4,243゜739号、同4.272,606号、
同4,311.781号等に記載されている。In addition, in the field of photolithographic materials, there is a system that eliminates the instability of image formation in conventional lithographic development and forms stable, rapid, ultra-high contrast negative images with a T of over 10.
U.S. Patent No. 4.166.742, U.S. Patent No. 4,168.977
No. 4,221,857, No. 4,224,401, No. 4,243゜739, No. 4,272,606,
It is described in No. 4,311.781, etc.
これらのシステムは、ヒドラジン化合物を使用すること
により、増感硬調化し、リス現像(現像時間60〜10
0秒)に比べ大巾な迅速処理(現像時間20#〜30′
)を達成した。しかしながら高感化、超硬調化を達成し
た反面、スリカプリ、圧力増感等も増巾されて、発生し
易いという欠点が生じる。これらのヒドラジン化合物を
使用した超硬調画像形成システムにおいて、圧力増感を
改良する方法としてハイドロキノンあるいは置換された
ポリヒドロキシベンゼンを使用することが特開昭62−
21143、同56−1936に開示されている。These systems use a hydrazine compound to increase the sensitization and contrast, and the development time is 60 to 10 minutes.
0 seconds), much faster processing (developing time 20#~30')
) was achieved. However, although high sensitivity and ultra-high contrast have been achieved, the disadvantage is that sharp capri, pressure sensitization, etc. are amplified and easily occur. In ultra-high contrast image forming systems using these hydrazine compounds, the use of hydroquinone or substituted polyhydroxybenzene as a method for improving pressure sensitization was disclosed in Japanese Patent Application Laid-Open No. 1986-62.
21143, No. 56-1936.
又、置換されたハイドロキノン、特にチオ基で置換され
たハイドロキノンを使用し、感度およびコントラストを
改良することが特開昭54−40629に開示されてい
る。Further, JP-A-54-40629 discloses the use of substituted hydroquinone, particularly hydroquinone substituted with a thio group, to improve sensitivity and contrast.
これら特開昭62−21143、同59−1936、同
54−40629は、いずれもハイドロキノン誘導体を
使用しているが本発明の一般式(1)とは異なる化合物
である。These JP-A Nos. 62-21143, 59-1936, and 54-40629 all use hydroquinone derivatives, but these are compounds different from the general formula (1) of the present invention.
(発明の目的)
本発明の目的は上記従来技術の問題点を解決し取扱い時
のスリキズや、圧力による黒化が改良されており、高感
度で迅速処理適性を有するハロゲン化銀写真感光材料を
提供することにある。(Objective of the Invention) The object of the present invention is to solve the above-mentioned problems of the prior art, and to provide a silver halide photographic material which has improved scratches during handling and blackening due to pressure, and has high sensitivity and suitability for rapid processing. It is about providing.
(発明の構成)
上記の目的は、支持体上に表面潜像型ハロゲン化銀乳剤
層を有し、該乳剤層および/または他の構成層中に下記
一般式(1)で表わされる化合物を含有することを特徴
とするハロゲン化銀写真感光材料により達成された。(Structure of the Invention) The above object is to have a surface latent image type silver halide emulsion layer on a support, and to contain a compound represented by the following general formula (1) in the emulsion layer and/or other constituent layers. This was achieved by a silver halide photographic material characterized by containing:
まず本発明に使用する一般式(1)の化合物について説
明する。First, the compound of general formula (1) used in the present invention will be explained.
一般式(I) x 、+c = z +x。General formula (I) x, +c = z +x.
式中、X、 、Xアはそれぞれ加水分解によって生成し
てもよいヒドロキシ基、または置換もしくは無置換のア
ミノ基を表わし、Zは=CR,−1=N−を表わし、R
,、R,は水素原子または置換可能な基を表わし、nは
0.1.2.3.4、または5を表わし、nが2〜5の
とき、繰り返し単位となる(C=Z(は同しでも異なっ
てもよく、単環または縮合環を形成していてもよい。In the formula, X,
,,R, represents a hydrogen atom or a substitutable group, n represents 0.1.2.3.4, or 5, and when n is 2 to 5, it becomes a repeating unit (C=Z( They may be the same or different, and may form a single ring or a condensed ring.
ここで、X3、Xz 、Rt 、Rtのうち少なくとも
一方は、その基の中に含まれる水素原子がハロゲン化銀
粒子への吸着促進基によって置換されている。Here, in at least one of X3, Xz, Rt, and Rt, a hydrogen atom contained in the group is substituted with a group that promotes adsorption to silver halide grains.
ただし、nが1〜5のとき、繰り返し単位となる一+C
=Z)−の少なくとも1つはZ=N−であり、nが0の
場合、X、 、X、が同時に置換もしくは無置換のアミ
ノ基になることはない。However, when n is 1 to 5, the repeating unit is 1+C
At least one of =Z)- is Z=N-, and when n is 0, X, , and X do not simultaneously become substituted or unsubstituted amino groups.
以下にさらに詳細に説明する。This will be explained in more detail below.
Rt、Rzで表される置換可能な基としては、ハロゲン
原子(フッ素、塩素、臭素)、アルキル基(好ましくは
炭素数1〜20のもの)、アリール基(好ましくは炭素
数6〜20のもの)、アルコキシ基(好ましくは炭素数
1〜20のもの)、アリールオキシ基(好ましくは炭素
数6〜20のもの)、アルキルチオ基(好ましくは炭素
数1〜20のもの)、アリールチオ基(好ましくは炭素
数6〜20のもの)、アシル基(好ましくは炭素数2〜
20のもの)、アシルアミノ基(好ましくは炭素数1〜
20のアルカノイルアミノ基、炭素数6〜20のベンゾ
イルアミノ基)、ニトロ基、シアノ基、オキシカルボニ
ル基(好ましくは炭素数1〜20のアルコキシカルボニ
ル基、炭素数6〜20のアリールオキシカルボニル基)
、カルボキシ基、スルホ基、ヒドロキシ基、ウレイド基
(好ましくは炭素数1〜20のアルキルウレイド基、炭
素数6〜20のアリールウレイド基)、スルホンアミド
基(好ましくは炭素数1〜20のアルキルスルホンアミ
ド基、炭素数6〜20のアリールスルホンアミド基)、
スルファモイル基(好ましくは炭素数1〜20のアルキ
ルスルファモイル基、炭素数6〜20のアリールスルフ
ァモイル基)、カルバモイル基(好ましくは炭素数1〜
20のアルキルカルバモイル基、炭素数6〜20のアリ
ールカルバモイル基)、アシルオキシ基(好ましくは炭
素数2〜20のアルカノイルオキシ基、炭素数7〜20
のベンゾイルオキシ基)、アミノ基(無置換アミノ、好
ましくは炭素数1〜20のアルキル基、または炭素数6
〜20のアリール基で置換した2級または3級のアミノ
基)、炭酸エステル基(好ましくは炭素数2〜20のア
ルキル炭酸エステル基、炭素数7〜20の了り−ル炭酸
エステル基)、スルホニル基(好ましくは炭素数1〜2
0のアルキルスルホニル基、炭素数6〜20のアリール
スルホニル基)、スルフィニル基(好ましくは炭素数1
〜20のアルキルスルフィニル基、炭素数6〜20のア
リールスルフィニル基)、及びヘテロ環基(ピリジル基
、イミダゾリル基、フリル基)などを挙げることができ
、置換基が2つ以上ある場合は同じでも異なってもよい
。Substitutable groups represented by Rt and Rz include halogen atoms (fluorine, chlorine, bromine), alkyl groups (preferably those with 1 to 20 carbon atoms), and aryl groups (preferably those with 6 to 20 carbon atoms). ), an alkoxy group (preferably one with 1 to 20 carbon atoms), an aryloxy group (preferably one with 6 to 20 carbon atoms), an alkylthio group (preferably one with 1 to 20 carbon atoms), an arylthio group (preferably one with 1 to 20 carbon atoms) 6 to 20 carbon atoms), acyl group (preferably 2 to 20 carbon atoms),
20), acylamino group (preferably carbon number 1 to
20 alkanoylamino group, benzoylamino group having 6 to 20 carbon atoms), nitro group, cyano group, oxycarbonyl group (preferably alkoxycarbonyl group having 1 to 20 carbon atoms, aryloxycarbonyl group having 6 to 20 carbon atoms)
, a carboxy group, a sulfo group, a hydroxy group, a ureido group (preferably an alkylureido group having 1 to 20 carbon atoms, an arylureido group having 6 to 20 carbon atoms), a sulfonamide group (preferably an alkylsulfone having 1 to 20 carbon atoms) amide group, arylsulfonamide group having 6 to 20 carbon atoms),
A sulfamoyl group (preferably an alkylsulfamoyl group having 1 to 20 carbon atoms, an arylsulfamoyl group having 6 to 20 carbon atoms), a carbamoyl group (preferably a carbon number 1 to 20),
20 alkylcarbamoyl group, arylcarbamoyl group having 6 to 20 carbon atoms), acyloxy group (preferably an alkanoyloxy group having 2 to 20 carbon atoms, 7 to 20 carbon atoms)
(benzoyloxy group), amino group (unsubstituted amino, preferably an alkyl group having 1 to 20 carbon atoms, or 6 carbon atoms)
~20 aryl group substituted secondary or tertiary amino group), carbonate group (preferably an alkyl carbonate group having 2 to 20 carbon atoms, an alkyl carbonate group having 7 to 20 carbon atoms), Sulfonyl group (preferably 1 to 2 carbon atoms)
0 alkylsulfonyl group, arylsulfonyl group having 6 to 20 carbon atoms), sulfinyl group (preferably 1 carbon number)
~20 alkylsulfinyl groups, arylsulfinyl groups having 6 to 20 carbon atoms), and heterocyclic groups (pyridyl groups, imidazolyl groups, furyl groups), and when there are two or more substituents, they may be the same. May be different.
これらの基はさらに置換されていてもよい。These groups may be further substituted.
X、、X、の加水分解によってヒドロキシ基を生成する
基として、好ましくはアシルオキシ基、カルバモイルオ
キシ基、スルファモイルオキシ基、炭酸エステル基、ス
ルホン酸エステル基、イミドメチルオキシ基、フタリド
オキシ基、4−ヒドロキシベンジルオキシ基などの他、
ラクトン環、オキサシロン環、オキサジンジオン環など
に代表される環形成しているものを表わす。As the group that generates a hydroxyl group by hydrolysis of -In addition to hydroxybenzyloxy groups, etc.
Represents a ring-forming ring represented by a lactone ring, oxacylone ring, oxazinedione ring, etc.
xl、Xgが置換アミノ基の場合、置換基としてはアル
キル基、アリール基、アシル基、スルホニル基、オキシ
カルボニル基、カルバモイル基、スルファモイル基、ヒ
ドロキシ基、ヘテロ環基などが挙げられ、加水分解によ
って−NH基を生成する基であってもよい、これらの置
換基の数は1個の方がより好ましいが、置換アミノ基が
ジ置換アミノ基の場合、置換基は同じでも異なってもよ
(、また、置換基が連結して含窒素へテロ環を形成して
もよい、 (例えば、モルホリノ基、ピペリジノ基、ピ
ロリジノ基、イミダゾリル基、ピペラジノ基なと)ヒド
ロキシ基を除くこれら置換基は、さらに置換されていて
もよく、置換基としてはR,、R,の置換可能な基とし
て挙げたものと同じものを挙げることができる。When xl and The number of these substituents is more preferably one, which may be a group that forms a -NH group, but when the substituted amino group is a di-substituted amino group, the substituents may be the same or different ( , and the substituents may be linked to form a nitrogen-containing heterocycle (for example, a morpholino group, a piperidino group, a pyrrolidino group, an imidazolyl group, a piperazino group), and these substituents other than the hydroxy group are: It may be further substituted, and examples of substituents include the same as those listed as substitutable groups for R, , R,.
一般式(1)で表わされる化合物はKenda 1−P
elz則を満たす化合物であり、(にendal P
elz則に従う化合物については、↑he Theor
y ofPhotographic Process、
Forth Edition 、 298頁〜327
頁、1977年、門ac*1llan Pub−1is
hing Co、、 Inc、に詳しく述べられている
。)具体的には、例えばヒドロキシルアミン類(n=0
のとき)、3−ピラゾリドン類、3−アミノ−2−ピラ
ゾリンIN(以上、n=1のとき)、2゜5−ジアミノ
ピリミジンN(n=2のとき)、4−アミノ−5−ヒド
ロキシピリミジン類、5−アミノ−4−ヒドロキシピリ
ミジン11(n=3のとき)などが挙げられる。The compound represented by general formula (1) is Kenda 1-P
It is a compound that satisfies the elz law, and (endal P
For compounds that follow the elz rule, ↑he Theor
y of Photographic Process,
Forth Edition, pages 298-327
Page, 1977, monac*1llan Pub-1is
hing Co., Inc. ) Specifically, for example, hydroxylamines (n=0
), 3-pyrazolidones, 3-amino-2-pyrazoline IN (when n = 1), 2゜5-diaminopyrimidine N (when n = 2), 4-amino-5-hydroxypyrimidine and 5-amino-4-hydroxypyrimidine 11 (when n=3).
ハロゲン化銀への吸着促進基は一般式(a)で表わすこ
とができる。The adsorption promoting group to silver halide can be represented by the general formula (a).
一般式(a) χイL+。General formula (a) χIL+.
Yはハロゲン化銀への吸着促進基であり、しは2価の連
結基である9mはOまたは1である。Yで表わされるハ
ロゲン化銀への吸着促進基の好ましい例としては、チオ
アミド基、メルカプト基、ジスルフィド結合を有する基
、または5ないし6員環の含窒素へテロ環基が挙げられ
る。Y is a group promoting adsorption to silver halide, and 9m, which is a divalent linking group, is O or 1. Preferred examples of the adsorption promoting group to silver halide represented by Y include a thioamide group, a mercapto group, a group having a disulfide bond, or a 5- or 6-membered nitrogen-containing heterocyclic group.
Yであられされるチオアミド吸着促進基は、−C−アミ
ノーで表わされる二価の基であり、環構造の一部であっ
てもよいし、また非環式チオアミド基であってもよい、
Ir用なチオアミド吸着促進基ば、例えば米国特許4,
030,925号、同4,031,127号、同4,0
80,207号、同4,245,037号、同4. 2
55. 511号、同4,266.013号、及び同4
.276.364号、ならびに、[リサーチ・ディスク
ロージャJ (Research Disclosu
re )誌第151巻嵐15162 (1976年11
月)、及び同第176巻隘1?626 (1978年1
2月)に開示されているものから選ぶことができる。The thioamide adsorption promoting group represented by Y is a divalent group represented by -C-amino, and may be a part of a ring structure, or may be an acyclic thioamide group.
Thioamide adsorption promoting groups for Ir, for example, U.S. Pat.
No. 030,925, No. 4,031,127, No. 4,0
No. 80,207, No. 4,245,037, No. 4. 2
55. No. 511, No. 4,266.013, and No. 4
.. No. 276.364, as well as [Research Disclosure J]
re ) Magazine Volume 151 Arashi 15162 (November 1976
), and Vol. 176, No. 1?626 (January 1978)
You can choose from those disclosed in February).
非環式チオアミド基の具体例としては、例えばチオウレ
イド基、チオウレタン基、ジチオカルバミン酸エステル
基など、また環状のチオアミド基の具体例としては、例
えば4−チアゾリン−2=チオン、4−イミダシリン−
2−チオン、2−チオヒダントイン、ローダニン、チオ
バルビッール酸、テトラゾリン−5−チオン、1.2.
4−ドリアゾリン−3−チオン、1.3.4−チアジア
ゾリン−2−チオン、1,3.4−オキサシアプリン−
2−千オン、ベンズイミダシリン−2−チオン、ベンズ
オキサゾリン−2−チオン及びヘンジチアゾリン−2−
チオンなどが挙げられ、これらは更に置換されていても
よい。Specific examples of acyclic thioamide groups include thiourido groups, thiourethane groups, dithiocarbamate groups, etc. Specific examples of cyclic thioamide groups include 4-thiazoline-2=thione, 4-imidacyline-
2-thione, 2-thiohydantoin, rhodanine, thiobarbic acid, tetrazoline-5-thione, 1.2.
4-Driazoline-3-thione, 1.3.4-thiadiazolin-2-thione, 1,3.4-oxacyapurine-
2-thousand, benzimidacillin-2-thione, benzoxazoline-2-thione and hendithiazoline-2-
Examples include thione, which may be further substituted.
Yのメルカプト基は脂肪族メルカプト基、芳香族メルカ
プト基やヘテロ環メルカプト基(−S H基が結合した
炭素原子の隣りが窒素原子の場合は、これと互変異性体
の関係にある環状チオアミド基と同義であり、この基の
具体例は上に列挙したものと同しである)が挙げられる
。The mercapto group of Y is an aliphatic mercapto group, an aromatic mercapto group, or a heterocyclic mercapto group (if the carbon atom to which the -SH group is bonded is a nitrogen atom, it is a cyclic thioamide that has a tautomeric relationship with the nitrogen atom). group, and specific examples of this group are the same as those listed above).
Yで表わされる5j!ないし6員の含窒素へテロ環基と
しては、窒素、酸素、硫黄及び炭素の組合せからなる5
員ないし6員の含窒素へテロ環があげられる。これらの
うち、好ましいものとしては、ベンゾトリアゾール、ト
リアゾール、テトラゾール、インダゾール、ベンズイミ
ダゾール、イミダプール、ベンゾチアゾール、チアゾー
ル、ヘンジオキサゾール、オキサゾール、チアジアゾー
ル、オキサジアゾール、トリアジンなどがあげられる。5j represented by Y! The 6-membered nitrogen-containing heterocyclic group is a 5-membered nitrogen-containing heterocyclic group consisting of a combination of nitrogen, oxygen, sulfur and carbon.
and 6-membered nitrogen-containing heterocycles. Among these, preferred are benzotriazole, triazole, tetrazole, indazole, benzimidazole, imidapool, benzothiazole, thiazole, hendioxazole, oxazole, thiadiazole, oxadiazole, triazine and the like.
これらはさらに適当な置換基で置換されていてもよい。These may be further substituted with a suitable substituent.
置換基としては、Rr 、Rzの置換可能な基として述
べたものがあげられる。Examples of the substituent include those described as substitutable groups for Rr and Rz.
Yで表わされるもののうち、好ましいものは環状のチオ
アミド基(すなわちメルカプト置換含窒素へテロ環で、
例えば2−メルカプトテトラゾ−ル基、3−メルカプト
−1,2,4−トリアゾール基、5−メルカプトテトラ
ゾール基、2−メルカプト−1,3,4−オキサジアゾ
ール基、2−メルカブトヘンズオキサゾール基など)、
又は含窒素へテロ環基(例えば、ヘンシトリアゾール基
、ベンズイミダゾール基、インダゾール基など)の場合
である。Among those represented by Y, preferred are cyclic thioamide groups (i.e., mercapto-substituted nitrogen-containing heterocycles,
For example, 2-mercaptotetrazole group, 3-mercapto-1,2,4-triazole group, 5-mercaptotetrazole group, 2-mercapto-1,3,4-oxadiazole group, 2-mercaptohenzuoxazole group base, etc.),
Or it is the case of a nitrogen-containing heterocyclic group (for example, a hensitriazole group, a benzimidazole group, an indazole group, etc.).
Y−(L3−、基は2個以上置換していてもよく、同じ
でも異なってもよい。Y-(L3-, two or more groups may be substituted and may be the same or different.
して表わされる二価の連結基としては、C,N、S、○
のうち少なくとも1種を含む原子又は原子団である。具
体的には、例えばアルキレン基、アルケニレン基、アル
キニレン基、アリーレン基、−0−1−S−1−NH−
1−N−1−CO−1−8O□−(これらの基は置換基
をもっていてもよい)等の単独またはこれらの組合せか
らなるものである。The divalent linking group represented by C, N, S, ○
An atom or atomic group containing at least one of the following. Specifically, for example, alkylene group, alkenylene group, alkynylene group, arylene group, -0-1-S-1-NH-
1-N-1-CO-1-8O□- (these groups may have a substituent) alone or in combination.
具体例としては、例えば
−CONH−1−NHCON)l−1−3O,NH−1
−COO−1−NHCOO−1−CH*CHxSOJH
−、−CH,CH□C0NB−、などが挙げられる。Specific examples include -CONH-1-NHCON)l-1-3O,NH-1
-COO-1-NHCOO-1-CH*CHxSOJH
-, -CH, CH□CONB-, and the like.
これらの連結基はさらに適当な置換基で置換されていて
もよい、置換基としてはRr、Rtの置換可能な基とし
て挙げたものと同じものを挙げることができる。These linking groups may be further substituted with a suitable substituent. Examples of the substituent include the same substituents as those listed as substitutable groups for Rr and Rt.
一般式(1)で表わされる具体的化合物としては、特開
昭61−90153号に記載されているものが挙げられ
る。Specific examples of the compound represented by the general formula (1) include those described in JP-A-61-90153.
次に一般式(1)で表わされる化合物の好ましい具体例
を示すが、本発明の範囲はこれらに限定されるものでは
ない。Preferred specific examples of the compound represented by the general formula (1) are shown next, but the scope of the present invention is not limited thereto.
■−1)
l−2)
n
!−3)
h□周
■−4)
■−5)
■−6)
■−7)
l−8)
■−9)
I−11)
I−12)
〇
一般式(1)で表わされる化合物の合成器よ、Kend
a 1−Pe I z則に従う公知の化合物およびカブ
リ防止剤として公知の化合物を連結基を工夫して結合さ
せるか、あるいはKendal−Pelz則に従う還元
剤に連結基を導入したのち、連結基部への吸着基の導入
により容易に合成できる、具体的には特開昭61−90
153号に記載の合成法に準じて合成することができる
。■-1) l-2) n! -3) h □ Shu ■-4) ■-5) ■-6) ■-7) l-8) ■-9) I-11) I-12) 〇Synthesis of the compound represented by general formula (1) Vessel, Kend
a 1-Pe I A known compound according to the Iz rule and a compound known as an antifoggant are combined by devising a connecting group, or a connecting group is introduced into a reducing agent according to the Kendal-Pelz rule, and then a compound known as an antifoggant is bonded to the connecting group. It can be easily synthesized by introducing an adsorption group, specifically, according to JP-A-61-90
It can be synthesized according to the synthesis method described in No. 153.
また一般式(1)で表わされる化合物はハロゲン化銀1
モルあたりlXl0−’モルないし1×10−1モル含
有させるのが好ましく特に1×10−’ないし5X10
−”モルの範囲が好ましい添加量である。Further, the compound represented by the general formula (1) is silver halide 1
Preferably, the content per mole ranges from lXl0-' mol to 1 x 10-1 mol, particularly from 1 x 10-' to 5 x 10
The preferable addition amount is in the range of 1 to 10 moles.
本発明にはヒドラジン化合物を使用してもよい。Hydrazine compounds may also be used in the present invention.
本発明に用いられるヒドラジン誘導体は、下記一般式(
II)によって表わされる化合物が好ましい。The hydrazine derivative used in the present invention has the following general formula (
Preference is given to compounds represented by II).
一般式(I[)
R,−、N−N−G、−R2
A、A2
式中、R,は脂肪族基または芳香族基を表わし、R1は
水素原子、アルキル基、アリール基、アルコキシ基、ア
リールオキシ基、アミノ基またはヒドラジノ基を表わし
、G1は一〇−基、−8O!■
R。General formula (I [) R, -, N-N-G, -R2 A, A2 In the formula, R represents an aliphatic group or an aromatic group, and R1 is a hydrogen atom, an alkyl group, an aryl group, an alkoxy group , represents an aryloxy group, an amino group or a hydrazino group, and G1 is a 10- group, -8O! ■R.
オカルボニル基又はイミノメチレン基を表わし、A、
、A2はともに水素原子あるいは一方が水素原子で他方
が置換もしくは無置換のアルキルスルホニル基、又は置
換もしくは無置換のアリールスルホニル基、又は置換も
しくは無置換のアシル基を表わす。represents an ocarbonyl group or iminomethylene group, A,
, A2 both represent a hydrogen atom, one a hydrogen atom and the other a substituted or unsubstituted alkylsulfonyl group, a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group.
一般式(II)において、R1で表される脂肪族基は好
ましくは炭素数1〜30のものであって、特に炭素数1
〜20の直鎖、分岐または環状のアルキル基である。こ
のアルキル基は置換基を有していてもよい。In general formula (II), the aliphatic group represented by R1 preferably has 1 to 30 carbon atoms, particularly 1 to 30 carbon atoms.
~20 straight chain, branched or cyclic alkyl groups. This alkyl group may have a substituent.
一般式(If)においてR1で表される芳香族基は単環
または2環のアリール基または不飽和へテロ環基である
。ここで不飽和へテロ環基はアリール基と縮環していて
もよい。In the general formula (If), the aromatic group represented by R1 is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be fused with an aryl group.
R1として好ましいものはアリール基であり、特に好ま
しくはベンゼン環を含むものである。′R1の脂肪族基
または芳香族基は置換されていてもよく、代表的な置換
基としては例えばアルキル基、アラルキル基、アルケニ
ル基、アルキニル基、アルコキシ基、アリール基、置換
アミノ基、ウレイド基、ウレタン基、アリールオキシ基
、スルファモイル基、カルバモイル基、アルキルまたは
アリールチオ基、アルキルまたはアリールスルホニル基
、アルキルまたはアリールスルフィニル基、ヒドロキシ
基、ハロゲン原子、シアノ基、スルホ基、アリールオキ
シカルボニル基、アシル基、アルコキシカルボニル基、
アシルオキシ基、カルボンアミド基、スルホンアミド基
、カルボキシル基、リン酸アミド基、ジアシルアミノ基
、イミドましい置換基としてはアルキル基(好ましくは
炭素数1〜20のもの)、アラルキル基(好ましくは炭
素数7〜30のもの)、アルコキシ基(好ましくは炭素
数1〜20のもの)、置換アミノ基(好ましくは炭素数
1〜20のアルキル基で置換されたアミノ基)、アシル
アミノ基(好ましくは炭素数2〜30を持つもの)、ス
ルホンアミド基(好ましくは炭素数1〜30を持つもの
)、ウレイド基(好ましくは炭素数1〜30を持つもの
)、リン酸アミド基(好ましくは炭素数1〜30のもの
)などである。Preferred as R1 is an aryl group, particularly preferably one containing a benzene ring. The aliphatic group or aromatic group of 'R1 may be substituted, and typical substituents include an alkyl group, an aralkyl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryl group, a substituted amino group, and a ureido group. , urethane group, aryloxy group, sulfamoyl group, carbamoyl group, alkyl or arylthio group, alkyl or arylsulfonyl group, alkyl or arylsulfinyl group, hydroxy group, halogen atom, cyano group, sulfo group, aryloxycarbonyl group, acyl group , alkoxycarbonyl group,
Preferred substituents include an acyloxy group, a carbonamide group, a sulfonamide group, a carboxyl group, a phosphoamide group, a diacylamino group, and an imidable substituent; 7 to 30 carbon atoms), alkoxy groups (preferably those having 1 to 20 carbon atoms), substituted amino groups (preferably amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups (preferably carbon atoms) (having a carbon number of 2 to 30), a sulfonamide group (preferably having a carbon number of 1 to 30), a ureido group (preferably having a carbon number of 1 to 30), a phosphoric acid amide group (preferably having a carbon number of 1 to 30), ~30).
一般式(n)においてR2で表わされるアルキル基とし
ては、好ましくは炭素数1〜4のアルキル基であり、ア
リール基としては単環または2環のアリール基が好まし
い(例えばベンゼン環を含むもの)。The alkyl group represented by R2 in general formula (n) is preferably an alkyl group having 1 to 4 carbon atoms, and the aryl group is preferably a monocyclic or bicyclic aryl group (for example, one containing a benzene ring). .
G、が−C−基の場合、R8で表わされる基のうち好ま
しいものは、水素原子、アルキル基(例えば、メチル基
、トリフルオロメチル基、3−ヒドロキシプロピル基、
3−メタンスルホンアミドプロピル基、フェニルスルホ
ニルメチル基など)、アラルキル基(例えば、0−ヒド
ロキシベンジル基など)、アリール基(例えば、フェニ
ル基、3゜5−ジクロロフェニル基、0−メタンスルポ
ンアミドフェニル基、4−メタンスルホニルフェニル基
、2−ヒドロキシメチルフェニル基など)などであり、
特に水素原子が好ましい。When G is a -C- group, preferred among the groups represented by R8 are a hydrogen atom, an alkyl group (e.g., a methyl group, a trifluoromethyl group, a 3-hydroxypropyl group,
(3-methanesulfonamidopropyl group, phenylsulfonylmethyl group, etc.), aralkyl group (e.g., 0-hydroxybenzyl group, etc.), aryl group (e.g., phenyl group, 3°5-dichlorophenyl group, 0-methanesulfonamidophenyl group, etc.) group, 4-methanesulfonylphenyl group, 2-hydroxymethylphenyl group, etc.),
Particularly preferred is a hydrogen atom.
R8は置換されていても良く、置換基としては、R1に
関して列挙した置換基が適用できる。R8 may be substituted, and the substituents listed for R1 can be used as substituents.
一般式(n)のGとしては一〇−基が最も好ましい。G in general formula (n) is most preferably a 10-group.
又、R7はG1−R2の部分を残余分子から分裂させ、
−01−R1部分の原子を含む環式構造を生成させる環
化反応を生起するようなものであってもよく、その例と
しては例えば特開昭63−29751号などに記載のも
のが挙げられる。Also, R7 splits the G1-R2 part from the remaining molecules,
It may be one that causes a cyclization reaction to produce a cyclic structure containing the atom of the -01-R1 moiety, such as the one described in JP-A No. 63-29751. .
A + 、A t としては水素原子が最も好ましい。A hydrogen atom is most preferable as A+ and At.
一般式(n)のR1またはR2はその中にカプラー等の
不動性写真用添加剤において常用されているバラスト基
またはポリマーが組み込まれているものでもよい。バラ
スト基は8以上の炭素数を有する写真性に対して比較的
不活性な基であり、例えばアルキル基、アルコキシ基、
フェニル基、アルキルフェニル基、フェノキシ基、アル
キルフェノキシ基などの中から選ぶことができる。また
ポリマーとしては例えば特開平1−100530号に記
載のものが挙げられる。R1 or R2 in the general formula (n) may have a ballast group or a polymer commonly used in immobile photographic additives such as couplers incorporated therein. A ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, such as an alkyl group, an alkoxy group,
It can be selected from phenyl group, alkylphenyl group, phenoxy group, alkylphenoxy group, etc. Examples of the polymer include those described in JP-A-1-100530.
一般式(n)のR1またはR2はその中にハロゲン化銀
粒子表面に対する吸着を強める基が組み込まれているも
のでもよい。かかる吸着基としては、チオ尿素基、複素
環チオアミド基、メルカプト複素環基、トリアゾール基
などの米国特許第4゜385.108号、同4,459
,347号、特開昭59−195,233号、同59−
200゜231号、同59−201.045号、同59
−201.046号、同59−201,047号、同5
9−20.1,048号、同59−201.049号、
特開昭61−170,733号、同61−270,74
4号、同62−948号、特願昭62−67.508号
、同62−67.501号、同62−67.510号に
記載された基があげられる。R1 or R2 in general formula (n) may have a group incorporated therein to enhance adsorption to the silver halide grain surface. Such adsorption groups include thiourea groups, heterocyclic thioamide groups, mercapto heterocyclic groups, triazole groups, etc.
, No. 347, JP-A No. 59-195, 233, No. 59-
200゜No. 231, No. 59-201.045, No. 59
-201.046, 59-201,047, 5
No. 9-20.1,048, No. 59-201.049,
JP-A-61-170,733, JP-A No. 61-270,74
No. 4, No. 62-948, Japanese Patent Application No. 62-67.508, No. 62-67.501, and No. 62-67.510.
一般式(n)で示される化合物の具体例を以下に示す。Specific examples of the compound represented by general formula (n) are shown below.
、但し本発明は以下の化合物に限定されるものではない
。However, the present invention is not limited to the following compounds.
I−1
I−3
l−6
f−8
l−10
■−13
■−14
■−15
■−16
I
−N
l−18
■−19
■−20
H
■−23
■−24
■−25
■−26
I
本発明に用いられるヒドラジン誘導体としては、上記の
ものの他に、RESEARCHDISCLO3LIRE
Item23516 (1983年11月号、P、3
46)およびそこに引用された文献の他、米国特許4゜
080.207号、同4,269,929号、同4.2
76.364号、同4,278,748号、同4.38
5,108号、同4,459,347号、同4,560
,638号、同4.478.928号、英国特許2,0
11,391B、特開昭60−179734号、同62
−270,948号、同63−29,751号、同61
−170゜733号、同61−270,744号、同6
2−948号、EP217,310号、またはUS 4
゜686.167号、特開昭62−178,246号、
同6332,538号、同63−104゜047号、同
63−121,838号、同63−129.337号、
同63−223,744号、同63−234,244号
、同63−234,245号、同63−234,246
号、同63−294.552号、同63−306.43
8号、特開平1−100,530号、同1. 105.
941号、同1−IO5,943号、特開昭64−1
0.233号、特開平1−90,439号、特願昭63
−105,682号、同63−114,118号、同6
3−110,051号、同63−114.119号、同
63−116,239号、同63−147,339号、
同63−179,760号、同63−229,163号
、特願平1−18.377号、同1−18,378号、
同1−18.379号、同1−15,755号、同1−
16.814号、同1−40,792号、同1−42.
615号、同1−42.616号、同1−123.69
3号、同1−126,284号に記載されたものを用い
ることができる。I-1 I-3 l-6 f-8 l-10 ■-13 ■-14 ■-15 ■-16 I -N l-18 ■-19 ■-20 H ■-23 ■-24 ■-25 ■ -26 I In addition to the above-mentioned hydrazine derivatives used in the present invention, RESEARCHDISCLO3LIRE
Item23516 (November 1983 issue, P, 3
46) and the documents cited therein, as well as U.S. Pat.
No. 76.364, No. 4,278,748, No. 4.38
No. 5,108, No. 4,459,347, No. 4,560
, No. 638, No. 4.478.928, British Patent No. 2,0
11,391B, JP-A-60-179734, JP-A No. 62
-270,948, 63-29,751, 61
-170゜733, 61-270,744, 6
No. 2-948, EP 217,310, or US 4
゜686.167, JP 62-178,246,
No. 6332,538, No. 63-104゜047, No. 63-121,838, No. 63-129.337,
No. 63-223,744, No. 63-234,244, No. 63-234,245, No. 63-234,246
No. 63-294.552, No. 63-306.43
No. 8, JP-A No. 1-100,530, 1. 105.
No. 941, No. 1-IO5,943, JP-A No. 1986-1
No. 0.233, Japanese Patent Application Publication No. 1-90,439, Patent Application No. 1983
-105,682, 63-114,118, 6
No. 3-110,051, No. 63-114.119, No. 63-116,239, No. 63-147,339,
63-179,760, 63-229,163, Japanese Patent Application No. 1-18.377, 1-18,378,
1-18.379, 1-15,755, 1-
No. 16.814, No. 1-40,792, No. 1-42.
No. 615, No. 1-42.616, No. 1-123.69
No. 3, No. 1-126,284 can be used.
本発明におけるヒドラジン誘導体の添加量としてはハロ
ゲン化銀1モルあたりlXl0−’モルないし5X10
−’モル含有されるのが好ましく、特にlXl0−’モ
ルないし2X10−”モルの範囲が好ましい添加量であ
る。The amount of the hydrazine derivative added in the present invention is from 1X10-' mole to 5X10 mole per mole of silver halide.
-' mol is preferable, and the addition amount is particularly preferably in the range of 1X10-' mol to 2X10-'' mol.
これら一般式(I)、および(II)の化合物を写真怒
光材料中に含有させるときは、水溶性の場合は水溶液と
して、水不溶性の場合はアルコール類(たとえばメタノ
ール、エタノール)エステルWA(たとえば酢酸エチル
)ケトン類(たとえばアセトン)などの水に混和しうる
有機溶媒の溶液として、ハロゲン化銀乳剤溶液又は、親
水性コロイド溶液に添加すればよい。When these compounds of general formulas (I) and (II) are incorporated into a photographic photonic material, they may be contained in an aqueous solution if water-soluble, or as an alcohol (e.g. methanol, ethanol) ester WA (e.g. It may be added to a silver halide emulsion solution or a hydrophilic colloid solution as a solution of a water-miscible organic solvent such as ethyl acetate (ethyl acetate) ketones (for example, acetone).
ハロゲン化銀乳剤溶液中に添加する場合は、その添加は
化学熟成の開始から塗布までの任意の時期に行うことが
できるが化学熟成終了後に行うのが好ましく、特に塗布
のために用意された塗布液中に添加するのが好ましい。When added to a silver halide emulsion solution, it can be added at any time from the start of chemical ripening to coating, but it is preferable to add it after chemical ripening, especially when the coating is prepared for coating. It is preferable to add it to the liquid.
本発明に用いられるハロゲン化銀乳剤の調製方法として
は、P、G]afkides著r Chimie et
Physique Photographique J
(Paul Monte1社刊1967年) 、G
、F、Duffin著「PhotographicEm
ulsion ChemistryJ (The F
ocal Press刊、1966 ) 、V、L、Z
elilvan et al著rMaking and
Coating Photographic EIII
ulsion J (The FocalPress
刊1964年)などに記載されている方法、米国特許第
2.592.250号、同第4.075.020号明細
書などに記載されているコンバージョン法、英国特許第
1.027.146号などに記載されているコア/シェ
ル乳剤調製方法を用いて調整することができる。The method for preparing the silver halide emulsion used in the present invention is described by Chimie et al.
Physique Photographique J
(Paul Monte1, 1967), G.
, F. Duffin, “Photographic Em
ulsion ChemistryJ (The F
(published by ocal Press, 1966), V, L, Z
Making and by Elilvan et al.
Coating Photographic EIII
ulsion J (The Focal Press
(1964), the conversion method described in U.S. Patent No. 2.592.250, U.S. Pat. It can be prepared using the core/shell emulsion preparation method described in et al.
水溶性銀塩(硝酸銀水溶液)と水溶性ハロゲン塩を反応
させる形式としては、片側混合法、同時混合法、それら
の組合せのいずれを用いてもよい。As a method of reacting the water-soluble silver salt (silver nitrate aqueous solution) and the water-soluble halogen salt, any one of a one-sided mixing method, a simultaneous mixing method, and a combination thereof may be used.
同時混合法の一つの形式としてハロゲン化銀の生成され
る液相中のpAgを一定に保つ方法、すなわちコントロ
ールダブルジェット法を用いることもできる。As one type of simultaneous mixing method, a method in which the pAg in the liquid phase in which silver halide is produced can be kept constant, that is, a controlled double jet method can also be used.
またアンモニア、チオエーテル、四置換チオ尿素などの
いわゆるハロゲン化銀溶剤を使用して粒子形成させるこ
ともできる。Grain formation can also be carried out using so-called silver halide solvents such as ammonia, thioethers, and tetrasubstituted thioureas.
コントロールダブルジェット法、およびノ10ゲン化銀
溶剤を使用した粒子形成方法では、結晶形が規則的で粒
子サイズ分布の狭いハロゲン化銀乳剤を作ることが容易
である。By the controlled double jet method and the grain forming method using a silver oxide solvent, it is easy to produce a silver halide emulsion with a regular crystal shape and a narrow grain size distribution.
本発明に用いられる写真乳剤中のノλロゲン化銀粒子は
、比較的広い粒子サイズ分布を持つこともで4るが、狭
い粒子サイズ分布を持つことが好ましく、特にハロゲン
化銀粒子の重量または数に関して全体の90%を占める
粒子のサイズが平均粒子サイズの±40%以内にあるこ
とが好ましい(一般にこのような乳剤は単分散乳剤と呼
ばれる)。The silver halide grains in the photographic emulsion used in the present invention may have a relatively wide grain size distribution, but preferably have a narrow grain size distribution. It is preferred that the size of the grains that account for 90% of the total in terms of number is within ±40% of the average grain size (such emulsions are generally referred to as monodisperse emulsions).
写真乳剤中のハロゲン化銀粒子は立方体、八面体のよう
な規則的な(regular)な結晶体を有するもので
もよく、また球状、板状などのような変則的(irre
gular)な結晶を持つもの、あるいはこれらの結晶
形の複合形をもつものであってもよい。Silver halide grains in photographic emulsions may have regular crystal structures such as cubes and octahedrons, or irregular crystal structures such as spherical and plate shapes.
It may have crystals such as gular or a composite of these crystal forms.
ハロゲン化銀粒子は内部と表層が均一な相から成ってい
ても、異なる相からなっていてもよい。The interior and surface layers of the silver halide grains may be composed of uniform phases or may be composed of different phases.
別々に形成した2種以上のハロゲン化銀乳剤を混合して
使用してもよい。Two or more silver halide emulsions formed separately may be used in combination.
本発明に用いるハロゲン化銀乳剤にはハロゲン化銀粒子
の形成または物理熟成の過程においてカドミウム塩、亜
硫酸塩、鉛塩、タリウム塩、イリジウム塩もしくはその
錯塩、ロジウム塩もしくはその錯塩などを共存させても
よい。In the silver halide emulsion used in the present invention, a cadmium salt, a sulfite salt, a lead salt, a thallium salt, an iridium salt or a complex salt thereof, a rhodium salt or a complex salt thereof, etc. are allowed to coexist in the silver halide grain formation or physical ripening process. Good too.
本発明に用いられるハロゲン化銀乳剤は化学増感されて
いてもいなくてもよいが、化学増感の方法としては金増
感などがあり、金増感にさらに硫黄増悪、還元増感、貴
金属増感法などを組み合わせて用いることができる。The silver halide emulsion used in the present invention may or may not be chemically sensitized, but methods of chemical sensitization include gold sensitization, gold sensitization, and sulfur sensitization, reduction sensitization, noble metal sensitization, etc. A combination of methods such as sensitization can be used.
貴金属増感法のうち金増感法はその代表的なもので金化
合物、主として金錯塩を用いる。全以外の貴金属、たと
えば白金、パラジウム、イリジウム等の錯塩を含有して
も差支えない。その具体例は米国特許2.448,06
0号、英国特許618.061号などに記載されている
。Among the noble metal sensitization methods, the gold sensitization method is a typical method and uses a gold compound, mainly a gold complex salt. There is no problem in containing complex salts of noble metals other than pure metals, such as platinum, palladium, and iridium. A specific example is U.S. Patent No. 2.448,06
No. 0, British Patent No. 618.061, etc.
硫黄増感剤としては、ゼラチン中に含まれる硫黄化合物
のほか、種々の硫黄化合物、たとえばチオ硫酸塩、チオ
尿素類、チアゾール類、ローダニン類等を用いることが
できる。具体例は米国特許1.574,944号、同2
,278.947号、同2,410.689号、同2.
728.668号、同3,501,313号、同3.
656.955号に記載されたものである。As the sulfur sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, rhodanines, etc. can be used. Specific examples are U.S. Patent Nos. 1,574,944 and 2.
, 278.947, 2,410.689, 2.
No. 728.668, No. 3,501,313, No. 3.
No. 656.955.
還元増感剤としては第一すず塩、アミン類、ホルムアミ
ジンスルフィン酸、シラン化合物などを用いることがで
き、それらの具体例は米国特許2゜487.850号、
2.518.698号、2゜983.609号、2,9
83,610号、2゜694.637号に記載されてい
る。As the reduction sensitizer, stannous salts, amines, formamidine sulfinic acid, silane compounds, etc. can be used, and specific examples thereof include U.S. Pat. No. 2,487,850,
2.518.698, 2゜983.609, 2,9
83,610 and 2°694.637.
さらにこのハロゲン化銀乳剤は感度上昇および所望の波
長域に感光性をもたせる目的で光学増感することができ
る。光学増感の方法としてはシアニン色素、メロシアニ
ン色素等の増感色素が単独もしくは併用して使用され、
分光増感、強色増悪がほどこされる。Furthermore, this silver halide emulsion can be optically sensitized for the purpose of increasing sensitivity and imparting photosensitivity to a desired wavelength range. As a method of optical sensitization, sensitizing dyes such as cyanine dyes and merocyanine dyes are used alone or in combination.
Spectral sensitization and hyperchromatic enhancement are applied.
これらの技術については、米国特許第2.688.54
5号、同第2,912.329号、同第3.397.0
60号、同第3,615.635号、同第3,628,
964号、特公昭43−4936号、同44−1403
0号、特開昭55−52050号等などに記載されてい
る。These techniques are described in U.S. Patent No. 2.688.54.
No. 5, No. 2,912.329, No. 3.397.0
No. 60, No. 3,615.635, No. 3,628,
No. 964, Special Publication No. 43-4936, No. 44-1403
No. 0, Japanese Unexamined Patent Publication No. 55-52050, etc.
本発明に用いられる写真乳剤には、感光材料の製造工程
、保存中あるいは写真処理中のカブリを防止し、あるい
は写真性能を安定化させる目的で、一種々の化合物を含
有させることができる。すなわちアゾール類、例えばペ
ンゾチアヅリウム塩、ニトロイミダゾール類、ニトロヘ
ンズイミダヅール類、クロロベンズイミダゾール類、ブ
ロモベンズイミダゾール類、メルカプトチアゾール類、
メルカプトベンゾチアゾール類、メルカプトベンゾチア
ゾール類、メルカプトチアジアゾール類、アミノトリア
ゾール類、ベンゾトリアゾール類、ニトロベンゾトリア
ゾール類、メルカプトテトラゾール!!(特に1−フェ
ニル−5−メルカプトテトラゾール)など;メルカプト
ピリミジン類、メルカプトトリアジン類;たとえばオキ
サゾリンチオンのようなチオケト化合物;アザインデン
類、たとえばトリアザインデン類、テトラアザインデン
I!(特に4−ヒドロキソ置換(1,3,3a、7)テ
トラアザインデン類)、ペンタアザインデン類など;ヘ
ンゼンチオスルフオン酸、ヘンゼンスルフィン酸、ヘン
ゼンスルフオン酸アミド等のようなカブリ防止剤または
安定剤として知られた、多くの化合物を加えることがで
きる。The photographic emulsion used in the present invention may contain one or more compounds for the purpose of preventing fog during the manufacturing process, storage, or photographic processing of the light-sensitive material, or for stabilizing photographic performance. That is, azoles such as penzothiadurium salts, nitroimidazoles, nitrohenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles,
Mercaptobenzothiazoles, mercaptobenzothiazoles, mercaptothiadiazoles, aminotriazoles, benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles! ! (especially 1-phenyl-5-mercaptotetrazole); mercaptopyrimidines, mercaptotriazines; thioketo compounds, such as oxazolinthione; azaindenes, such as triazaindenes, tetraazaindene I! (especially 4-hydroxo-substituted (1,3,3a,7)tetraazaindenes), pentaazaindenes, etc.; A number of compounds known as inhibitors or stabilizers can be added.
これらの中で、特に好ましいのはベンゾトリアゾールI
I(例えば5−メチルベンゾトリアゾール)及びニトロ
インダゾール!II(例えば5−ニトロインダゾール)
である、また、これらの化合物を処理液に含有させても
よい。Among these, particularly preferred is benzotriazole I
I (e.g. 5-methylbenzotriazole) and nitroindazole! II (e.g. 5-nitroindazole)
In addition, these compounds may be included in the treatment liquid.
本発明の写真感光材料には、写真乳剤層その他の親水性
コロイド層に無機または有機の硬膜剤を含有してよい0
例えばクロム塩(クロムミョウバン、酢酸クロムなど)
、アルデヒド類、(ホルムアルデヒド、グリオキサール
、ゲルタールアルデヒドなど)、N−メチロール化合物
(ジメチロール尿素、メチロールジメチルヒダントイン
など)、ジオキサン誘導体(2,3−ジヒドロキシジオ
キサンなど)、活性ビニル化合物(1,3,5−1−リ
アクリロイル−へキサヒドロ−5−)リアジン、1.3
−ビニルスルホニル−2−プロパツールなど)、活性ハ
ロゲン化合物(2,4−ジクロル−6−ヒドロキシ−S
−トリアジンなど)、ムコハロゲン酸W4(ムコクロル
酸、ムコフェノキシクロル酸など)、などを単独または
組み合わせて用いることができる。The photographic light-sensitive material of the present invention may contain an inorganic or organic hardening agent in the photographic emulsion layer or other hydrophilic colloid layer.
For example, chromium salts (chromium alum, chromium acetate, etc.)
, aldehydes, (formaldehyde, glyoxal, geltaraldehyde, etc.), N-methylol compounds (dimethylol urea, methylol dimethylhydantoin, etc.), dioxane derivatives (2,3-dihydroxydioxane, etc.), activated vinyl compounds (1,3,5 -1-lyacryloyl-hexahydro-5-) riazine, 1.3
-vinylsulfonyl-2-propanol), active halogen compounds (2,4-dichloro-6-hydroxy-S
-triazine, etc.), mucohalogenic acid W4 (mucochloric acid, mucophenoxychloroic acid, etc.), etc. can be used alone or in combination.
本発明を用いて作られる感光材料の写真乳剤層または他
の親水性コロイド層には塗布助剤、帯電防止、スベリ性
改良、乳化分散、接着防止及び写真特性改良(例えば、
現像促進、硬調化、増感)等種々の目的で、種々の界面
活性剤を含んでもよい。The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material prepared using the present invention may contain coating aids, antistatic properties, smoothness improvement, emulsification dispersion, adhesion prevention, and photographic property improvement (e.g.
Various surfactants may be included for various purposes such as development acceleration, high contrast, and sensitization.
例えばサポニン(ステロイド系)、アルキレンオキサイ
ド誘導体く例えばポリエチレングリコール、ポリエチレ
ングリコール/ポリプロピレングリコール縮合物、ポリ
エチレングリコールアルキルエーテル類又はポリエチレ
ングリコールアルキルアリールエーテル類、ポリエチレ
ングリコールエステル類、ポリエチレングリコールアル
キルエーテル類、ポリアルキレングリコールアルキルア
ミン又はアミド類、シリコーンのポリエチレンオキサイ
ド付加物類)、グリンドール誘導体(例えばアルケニル
コハク酸ポリグリセリド、アルキルフェノールポリグリ
セリド)、多価アルコールの脂肪酸エステル類、糖のア
ルキルエステル類などの非イオン性界面活性剖;アルキ
ルカルボン酸塩、アルキルスルフォン酸塩、アルキルベ
ンゼンスルフォン酸塩、アルキルナフタレンスルフォン
酸塩、アルキル硫酸エステル類、アルキルリン酸エステ
ル類、N−アシル−N−アルキルクラリン類、スルホコ
ハク酸エステル類、スルホアルキルポリオキシエチレン
アルキルフェニルエーテル類、ポリオキシエチレンアル
キルリン酸エステル類などのような、カルボキシ基、ス
ルホ基、ホスホ基、硫酸エステル基、リン酸エステル基
等の酸性基を含むアニオン界面活性剤;アミノ酸類、ア
ミノアルキルスルホン酸類、アミノアルキル硫酸又はリ
ン酸エステル類、アルキルベタイン類、アミンオキシド
類などの両性界面活性側;アルキルアミン塩類、脂肪族
あるいは芳香族第4級アンモニウム塩類、ピリジニウム
、イミダブリラムなどの複素環第4級アンモニウム塩類
、及び脂肪族又は複素環を含むホスホニウム又はスルホ
ニウム塩類などのカチオン界面活性剤を用いることがで
きる。For example, saponins (steroids), alkylene oxide derivatives such as polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol alkyl ethers, polyalkylene glycols Nonionic interfaces such as alkylamines or amides, polyethylene oxide adducts of silicone), grindol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, alkyl esters of sugars, etc. Active autopsy; alkyl carboxylates, alkyl sulfonates, alkylbenzenesulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl phosphates, N-acyl-N-alkylclarins, sulfosuccinates, Anionic surfactants containing acidic groups such as carboxy groups, sulfo groups, phospho groups, sulfate ester groups, phosphate ester groups, such as sulfoalkyl polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphate esters, etc. ;Ampholytic surfactants such as amino acids, aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphates, alkyl betaines, amine oxides; Alkylamine salts, aliphatic or aromatic quaternary ammonium salts, pyridinium, imidabrilam Cationic surfactants such as heterocyclic quaternary ammonium salts such as phosphonium or sulfonium salts containing aliphatic or heterocycles can be used.
特に本発明において好ましく用いられる界面活性剤は特
公昭5B−9412号公報に記載された分子量600以
上のポリアルキレンオキサイド類である。In particular, surfactants preferably used in the present invention are polyalkylene oxides having a molecular weight of 600 or more and described in Japanese Patent Publication No. 5B-9412.
本発明に用いる写真感光材料には、写真乳削層その他の
親水性コロイド層に寸度安定性の改良などの目的で、水
不溶又は難溶性合成ポリマーの分散物を含むことができ
る0例えばアルキル(メタ)アクリレート、アルコキシ
アルキル(メタ)アクリレート、グリシジル(メタ)ア
クリレート、(メタ)アクリルアミド、ビニルエステル
(例えハ酢酸ヒニル)、アクリロニトリル、オレフィン
、スチレンなどの単独もしくは組合せ、又はこれらとア
クリル酸、メタクリル酸、α、β−不飽和ジカルボン酸
、ヒドロキシアルキル(メタ)アクリレート、スルホア
ルキル(メタ)アクリレート、スチレンスルホン酸等の
組合せを単量体成分とするポリマーを用いることができ
る。The photographic light-sensitive material used in the present invention may contain a dispersion of a water-insoluble or sparingly soluble synthetic polymer in the photographic emulsion layer or other hydrophilic colloid layer for the purpose of improving dimensional stability. (meth)acrylate, alkoxyalkyl (meth)acrylate, glycidyl (meth)acrylate, (meth)acrylamide, vinyl ester (e.g., vinyl acetate), acrylonitrile, olefin, styrene, etc. alone or in combination, or together with acrylic acid, methacrylate Polymers containing a combination of acids, α, β-unsaturated dicarboxylic acids, hydroxyalkyl (meth)acrylates, sulfoalkyl (meth)acrylates, styrene sulfonic acids, etc. as monomer components can be used.
本発明に用いる処理液としては現像主薬とじてジヒドロ
キシベンゼン系現像主薬を用い補助現像主薬としてp−
アミノフェノール系現像主薬又は3−ピラゾリドン系現
像主薬を用いるのが好ましい。As the processing solution used in the present invention, a dihydroxybenzene-based developing agent is used as a developing agent, and p-
It is preferable to use an aminophenol-based developing agent or a 3-pyrazolidone-based developing agent.
本発明に用いるジヒドロキシベンゼン系現像主薬として
はハイドロキノン、クロロハイドロキノン、ブロモハイ
ドロキノン、イソプロピルハイドロキノン、メチルハイ
ドロキノン、2.3−ジクロロハイドロキノン、2.3
−ジブロモハイドロキノン、2.5−ジメチルハイドロ
キノン等があるが、なかでも特にハイドロキノンが好ま
しい。Examples of dihydroxybenzene-based developing agents used in the present invention include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2.3-dichlorohydroquinone, and 2.3-dichlorohydroquinone.
-Dibromohydroquinone, 2,5-dimethylhydroquinone, etc., among which hydroquinone is particularly preferred.
補助現像主薬としての1−フェニル−3−ピラゾリドン
又はその誘導体の例としては1−フェニル−3−ピラゾ
リドン、1−フェニル−4,4−ジメチル−3−ピラゾ
リドン、1−フェニル−4−メチル−4−ヒドロキシメ
チル−3−ピラゾリドン、1−フェニル−4,4−ジヒ
ドロキシメチル−3−ピラゾリドン、1−フェニル−5
−メルル−3−ビラプリトン、1−p−アミノフェニル
−4,4−ジメチル−3−ビラプリトン、1−p−トリ
ル−4,4−ジメチル−3−ビラプリトンなどがある。Examples of 1-phenyl-3-pyrazolidone or its derivatives as an auxiliary developing agent include 1-phenyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-methyl-4 -Hydroxymethyl-3-pyrazolidone, 1-phenyl-4,4-dihydroxymethyl-3-pyrazolidone, 1-phenyl-5
Examples include -merul-3-virapriton, 1-p-aminophenyl-4,4-dimethyl-3-virapriton, and 1-p-tolyl-4,4-dimethyl-3-virapriton.
p−アミノフェノール系補助現像主薬としてはN−メチ
ル−p−アミノフェノール、p−アミノフェノール、N
−(β−ヒドロキシエチル>−p−アミンフェノール、
N−(4−ヒドロキシフェニル)グリシン、2−メチル
−p−アミノフェノール、p−ベンジルアミノフェノー
ル等があるが、なかでもN−メチル−p−アミノフェノ
ールが好ましい。As the p-aminophenol auxiliary developing agent, N-methyl-p-aminophenol, p-aminophenol, N
-(β-hydroxyethyl>-p-aminephenol,
Examples include N-(4-hydroxyphenyl)glycine, 2-methyl-p-aminophenol, and p-benzylaminophenol, among which N-methyl-p-aminophenol is preferred.
ジヒドロキシベンゼン系現像主薬は通常0.05モル/
1〜0.8モル/7!の量で用いられるのが好ましい。Dihydroxybenzene developing agent is usually 0.05 mol/
1-0.8 mol/7! Preferably, it is used in an amount of .
またジヒドロキシベンゼン類と1−フェニル−3−ピラ
ゾリドン類又はp−アミノ−フェノール類との組合せを
用いる場合には前者を0.05モル/1〜0.5モル/
1、後者を0゜06モル/1以下の量で用いるのが好ま
しい。In addition, when using a combination of dihydroxybenzenes and 1-phenyl-3-pyrazolidones or p-amino-phenols, the former is added at 0.05 mol/1 to 0.5 mol/
1. It is preferable to use the latter in an amount of 0.06 mol/1 or less.
本発明に用いる亜硫酸塩保恒荊としては亜硫酸ナトリウ
ム、亜硫酸カリウム、亜硫酸リチウム、重亜硫酸ナトリ
ウム、メタ重亜硫酸カリウム、ホルムアルデヒド重亜硫
酸ナトリウム等がある。亜硫酸塩は0.3モル/I1以
上用いられるが、余りに多量添加すると現像液中で沈殿
して液汚染を引き起こすので、上限は1.2モル/iと
するのが好ましい。Examples of sulfite-preservatives used in the present invention include sodium sulfite, potassium sulfite, lithium sulfite, sodium bisulfite, potassium metabisulfite, and sodium formaldehyde bisulfite. Sulfite is used at least 0.3 mol/I1, but if too large a quantity is added, it will precipitate in the developer and cause solution contamination, so the upper limit is preferably 1.2 mol/I.
本発明の現像液には現像促進剤として第三級アミン化合
物特に米国特許第4,269.929号に記載の化合物
を含有することができる。The developer solution of the present invention may contain a tertiary amine compound as a development accelerator, particularly the compounds described in U.S. Pat. No. 4,269,929.
本発明の現像液にはその他、ホウ酸、ホウ砂、第三リン
酸ナトリウム、第三リン酸カリウムの如きp H5l&
剤+しE外ニ特開昭60−93433に記載のpT(I
I衝剤を用いることができる。In addition, the developer of the present invention may contain pH5L, such as boric acid, borax, tribasic sodium phosphate, and tribasic potassium phosphate.
pT(I) described in JP-A No. 60-93433
I buffer agents can be used.
臭化カリウム、沃化カリウムの如き現像抑制剤;エチレ
ングリコール、ジエチレングリコール、トリエチレング
リコール、ジメチルホルムアミド、メチルセロソルブ、
ヘキシレングリコール、エタノール、メタノールの如き
有機溶剤;5−ニトロインダゾール等のインダゾール系
化合物、2−メルカプトヘンライミダゾール−5−スル
ホン酸ナトリウム、5−メチルベンツトリアゾールなど
のヘンットリアゾール系化合物等のカブリ防止剤ないし
は黒ボッ(black pepper)防止剤;を含ん
でもよく、特に5−ニトロインダゾール等の化合物を用
いるときはジヒドロキシヘンゼン系現像主薬や亜硫酸塩
保恒剤を含む部分とは別の部分にあらかじめ溶解してお
き使用時に画部分を混合して水を加えること等が一般的
である。さらに5−ニトロインダゾールが溶解されてい
る部分をアルカリ性にしておくと黄色く着色し取扱い等
に便利である。Development inhibitors such as potassium bromide and potassium iodide; ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve,
Organic solvents such as hexylene glycol, ethanol, and methanol; fogging agents such as indazole compounds such as 5-nitroindazole, henttriazole compounds such as sodium 2-mercaptohenraimidazole-5-sulfonate, and 5-methylbenztriazole. It may also contain an inhibitor or a black pepper inhibitor; in particular, when a compound such as 5-nitroindazole is used, it may be added in a separate area from the area containing the dihydroxyhensen developing agent or sulfite preservative. It is common to dissolve the mixture in advance, mix the image and add water before use. Furthermore, if the part where 5-nitroindazole is dissolved is made alkaline, it will be colored yellow and will be convenient to handle.
更に必要に応して色調剤、界面活性剤、硬水軟化剤、硬
膜剤などを含んでもよい。Furthermore, it may contain a toning agent, a surfactant, a water softener, a hardening agent, etc., if necessary.
定着剤としては一般に用いられている組成のものを用い
ることができる。定着剤としてはチオ硫酸塩、チオシア
ン酸塩のほか、定着剤としての効果が知られている有機
硫黄化合物を用いることができる。定着液には硬膜剤と
して水溶性アルミニウム塩、例えば硫酸アルミニウム、
明ハンなどを含んでもよい、ここで水溶性アルミニウム
塩の量としては通常O〜3,0gA1/1である。また
酸化側としてエチレンジアミン四酢酸Fe(I[f)錯
塩を用いてもよい。As the fixing agent, one having a commonly used composition can be used. As the fixing agent, in addition to thiosulfates and thiocyanates, organic sulfur compounds known to be effective as fixing agents can be used. The fixer contains a water-soluble aluminum salt, such as aluminum sulfate, as a hardening agent.
The amount of the water-soluble aluminum salt, which may also contain aluminum salt, is usually 0 to 3.0 gA1/1. Moreover, ethylenediaminetetraacetic acid Fe(I[f) complex salt may be used as the oxidation side.
処理温度は通常18℃から50℃の間に選ばれるが、1
8℃より低い温度または50℃をこえる温度としてもよ
い。The treatment temperature is usually selected between 18°C and 50°C, but 1
The temperature may be lower than 8°C or higher than 50°C.
以下実施例により本発明の効果をさらに詳しく説明する
。The effects of the present invention will be explained in more detail with reference to Examples below.
実施例〜1
1ヱ坐貞l
水1j中に臭化カリ5g、沃化カリ0.05g、ゼラチ
ン30g、チオエーテル
1(0(C11寞)!5(CH,hS(CH,)!01
1の5%水溶液2.5ccを添加し73℃に保った溶液
中へ、撹拌しながら硫酸銀8.33gの水溶液と、臭化
カリ5.94g、沃化カリ0.726gを含む水溶液と
をダブルジェット法により45秒間で添加した。続いて
臭化カリ2.5gを添加したのち、硝酸銀8.33gを
含む水溶液を26分かけて、添加終了時の流量が添加開
始時の2倍となるように添加した。Example ~ 1 1ヱSasada 1J water contains 5g of potassium bromide, 0.05g of potassium iodide, 30g of gelatin, 1(0(C11寞)!5(CH,hS(CH,)!01) of thioether
2.5 cc of a 5% aqueous solution of No. 1 was added and kept at 73°C, and an aqueous solution of 8.33 g of silver sulfate and an aqueous solution containing 5.94 g of potassium bromide and 0.726 g of potassium iodide were added with stirring. It was added in 45 seconds using the double jet method. Subsequently, 2.5 g of potassium bromide was added, and then an aqueous solution containing 8.33 g of silver nitrate was added over 26 minutes so that the flow rate at the end of the addition was twice that at the beginning of the addition.
このあと25%のアンモニア溶液20cc、50%NH
−NO310CCを添加して20分間物理熟成したのち
INの硫酸240 ccを添加して中和し引き続いて硝
酸銀153.34gの水溶液と臭化カリの水溶液を、電
位をpAg8.2に保ちながらコントロールダブルジェ
ット法で40分間で添加した。のこ時の流量は添加終了
時の流量が、添加開始時の流量の9倍となるよう加速し
た。添加終了後2Nのチオシアン酸カリウム溶液15c
cを添加し、さらに1%の沃化カリ水溶液25ccを3
0秒かけて添加した。このあと温度を35℃に下げ、沈
降法により可溶性塩類を除去したのち、40℃昇温しで
ゼラチン30gとフェノール2gを添加し、苛性ソーダ
と臭化カリによりpH6,40、pAg8.10に調整
した。After this, 20cc of 25% ammonia solution, 50% NH
- After adding 10 CC of NO3 and physically ripening for 20 minutes, 240 cc of IN sulfuric acid was added to neutralize it, and then an aqueous solution of 153.34 g of silver nitrate and an aqueous solution of potassium bromide were added in a control double while maintaining the potential at pAg 8.2. It was added by jet method over 40 minutes. The flow rate at this time was accelerated so that the flow rate at the end of addition was nine times the flow rate at the start of addition. After the addition is complete, add 15 c of 2N potassium thiocyanate solution.
c, and then add 25 cc of 1% potassium iodide aqueous solution to 3
Added over 0 seconds. After that, the temperature was lowered to 35°C and soluble salts were removed by a sedimentation method, and then the temperature was raised to 40°C, 30g of gelatin and 2g of phenol were added, and the pH was adjusted to 6.40 and pAg to 8.10 with caustic soda and potassium bromide. .
温度を56℃に昇温したのち、下記構造の増悪色素を6
00■と安定化剤150■を添加した。After raising the temperature to 56℃, 6 aggravating dyes with the following structure were added.
00 ■ and 150 ■ of stabilizer were added.
10分後にチオ硫酸ナトリウム5水和物2.4■チオシ
アン酸力リ140w、塩化金酸2.】■を各々の乳剤に
添加し、80分後に急冷して固化させて乳剤とした。得
られた乳剤は全粒子の投影面積の総和の98%がアスペ
クト比3以上の粒子かラナリ、アスペクト比2以上すべ
ての粒子についての平均の投影面積直径は1.4μm、
標準偏差15%、厚みの平均は0.187μmでアスペ
クト比は7.5であった。After 10 minutes, sodium thiosulfate pentahydrate 2.4 ■ thiocyanic acid strength 140 w, chlorauric acid 2. ]■ was added to each emulsion, and after 80 minutes, it was rapidly cooled and solidified to form an emulsion. In the obtained emulsion, 98% of the total projected area of all grains are grains or lanalis with an aspect ratio of 3 or more, and the average projected area diameter of all grains with an aspect ratio of 2 or more is 1.4 μm.
The standard deviation was 15%, the average thickness was 0.187 μm, and the aspect ratio was 7.5.
増感色素
(CHz) ! (CL) sSOi e
SO3Na
安定化剤
乳剤にハロゲン化銀1モルあたり、下記の薬品を添加し
て塗布液とした。Sensitizing dye (CHz)! (CL) sSOi e
The following chemicals were added per mole of silver halide to the SO3Na stabilizer emulsion to prepare a coating solution.
・ゼラチン
Ag/Binder比が1.0となるようにゼラチンを
添加した。- Gelatin was added so that the gelatin Ag/Binder ratio was 1.0.
(Binder=ゼラチン+ポリマー)・水溶性ポリエ
ステル
イーストマン・ケミカル社製の
WD−3TZE 15.Og・ポリマー
ラテックス
(ポリ (エチルアクリレート
/メタクリル酸)=97/3) 25.0g・硬膜
剤
1.2−ビス(スルホニルア
・本発明の一般式(1)の化合物
もしくは比較化合物 表−1記載の添加量・2.6−
ビス(ヒドロキシアミ
ノ)−4−ジエチルアミノ−
1、3,5−トリアジン 80■・ポリアク
ルリ酸ナトリウム
(平均分子量 4,1万) 4.0g・ポリス
チレンスルホン酸カリウム
(平均分子量 60万) 1.0g前記塗布
液を表面保護層塗布液と同時に厚み175μmの透明P
ET支持体上に塗布した。(Binder = Gelatin + Polymer) - Water-soluble polyester WD-3TZE manufactured by Eastman Chemical Company 15. Og・Polymer latex (poly(ethyl acrylate/methacrylic acid)=97/3) 25.0g・Hardening agent 1.2-bis(sulfonylua・Compound of general formula (1) of the present invention or comparative compound Table 1 Addition amount stated: 2.6-
Bis(hydroxyamino)-4-diethylamino-1,3,5-triazine 80■ Sodium polyacrylate (average molecular weight 4,10000) 4.0g Potassium polystyrene sulfonate (average molecular weight 600,000) 1.0g Above coating Coat the liquid with the surface protective layer coating liquid at the same time as transparent P with a thickness of 175 μm.
Coated on an ET support.
塗布銀量は2.0g/ボとした。The amount of silver coated was 2.0 g/bore.
表面保護層は各成分が、下記の塗布量となるように調製
し、写真材料1〜13とした(表−1)。The surface protective layer was prepared so that each component was coated in the following coating amounts to form photographic materials 1 to 13 (Table 1).
1皿m夏吉容 塗布l
・ゼラチン 1.15g/n(・ポ
リアクリルアミド
(平均分子量 4.5万)0.25
・ポリアクリル酸ソーダ
(平均分子量 40万) 0.02・p−t−オ
クチルフェノキシ
ジグリセリルブチルスルホ
ン化物のナトリウム塩 0.02
・ポリ (重合度10)オキシエ
チレンセチルエーテル 0.035・ポリ (重合
度10)オキシエ
チレンーポリ (重合度3)
オキシグリセリルルーオフ
チルフェノキシエーテル 0.01
・CaFrtSOs!I、 0.
003Jy
・ CsF+?5OJ(C)lzテτKGHz )
asOsNao、001
CJ。1 plate m Natsuyoshi Yoshi Coating l ・Gelatin 1.15g/n (・Polyacrylamide (average molecular weight 45,000) 0.25 ・Sodium polyacrylate (average molecular weight 400,000) 0.02・pt-octylphenoxy Sodium salt of diglyceryl butyl sulfonate 0.02 ・Poly (degree of polymerization 10) Oxyethylene cetyl ether 0.035 ・Poly (degree of polymerization 10) Oxyethylene-Poly (degree of polymerization 3) Oxyglyceryl-butyl phenoxy ether 0. 01 ・CaFrtSOs!I, 0.
003Jy・CsF+? 5OJ(C)lzteτKGHz)
asOsNao, 001 CJ.
「
’ CsFr、5OJ)CToCHJ斤−CH2CH
CHzO)−HO,OO3
・ポリメチルメタクリレート
(平均粒径3.5μm) 0.025・ポリ (
メチルメタクリレ−
ト/メタクリレート)
(モル比7:3、平均粒
径2.5μm) 0.020亙lユli■■
550nmにピークを有する緑色光にて写真材料1〜1
3に1/2o秒露光を与えた後冨士写真フィルム■製の
自動現像機FPM9000、現像液RD7、定着液Fu
jiFを用いて35℃sp処理(Dry to D
ry45秒)を行った。'' CsFr, 5OJ) CToCHJ cat-CH2CH
CHzO)-HO,OO3 ・Polymethyl methacrylate (average particle size 3.5 μm) 0.025・Poly (
Methyl methacrylate/methacrylate) (mole ratio 7:3, average particle size 2.5 μm) 0.020 liters Photographic materials 1 to 1 under green light with a peak at 550 nm
3 was exposed to 1/2o second using an automatic processor FPM9000 manufactured by Fuji Photo Film ■, developer RD7, and fixer Fu.
Sp treatment at 35°C using jiF (Dry to D
ry 45 seconds) was performed.
感度はFog+l、Qの濃度をあたえる露光量の逆数で
あられし、写真材料1を100として結果を表−1にま
とめた。The sensitivity was determined by the reciprocal of the exposure amount that gives the density of Fog+l and Q, and the results are summarized in Table 1, with photographic material 1 set as 100.
ス1キズ の
写真材料1〜13を25℃25%RHの条件下で1時間
調湿したのち、同条件下で市販のナイロンタワシを用い
て2×1csの面積に加重100gをかけ、毎秒lcs
のスピードでこすった。未露光状態で上記の自動現像処
理を行ったのち、黒化したスリキズの本数を数えた。After conditioning the humidity of photographic materials 1 to 13 with scratches for 1 hour at 25°C and 25% RH, under the same conditions, using a commercially available nylon scrubber, a load of 100 g was applied to an area of 2 x 1 cs, and 1 cs per second was applied.
I rubbed it at a speed of After performing the above automatic development process in an unexposed state, the number of blackened scratches was counted.
(表−1)
表−1の結果より本発明の一般弐N)の化合物を添加し
たものは感度低下することなくスリキズ耐性が良化して
いることがわかる。(Table 1) From the results in Table 1, it can be seen that the products to which the compound of the present invention (general 2N) was added had improved scratch resistance without deterioration in sensitivity.
試料Nll0〜13の比較化合物を添加したものでは、
スリキズはわずかに良化傾向であるが感度低下を伴ない
、好ましくない。In the samples Nll0 to 13 to which comparative compounds were added,
Although the scratches tend to improve slightly, they are accompanied by a decrease in sensitivity, which is not desirable.
実施例−2
ブルー着色した厚さ175μmのポリエチレンテレフタ
レートベースの両面に下記の塗布量の下塗層を設けたベ
ースを準備した。Example 2 A blue colored polyethylene terephthalate base having a thickness of 175 μm was provided with an undercoat layer on both sides of the base in the following coating amount.
・ゼラチン 84■/ポ17■
/mt
このベースに実施例1の乳剤を片面あたりの塗布銀量が
1.9g/rr+となるように両面に塗布した。この時
、−a式(1)の化合物または比較化合物を銀1モル当
り表−2記載の添加量になるよう添加した。表面保護層
は実施例1と同様の塗布液を使用した。硬膜剤の添加量
は、15mmoI/ 100 g −g e 1と変更
した。このようにして写真材料1〜13を得た。実施例
1と同様な方法によりスリキズを評価した。但し、処理
は下記の写真性能評価と同一のものに変更した。・Gelatin 84■/Po17■
/mt The emulsion of Example 1 was coated on both sides of this base so that the amount of silver coated on each side was 1.9 g/rr+. At this time, the compound of -a formula (1) or a comparative compound was added in an amount shown in Table 2 per mole of silver. The same coating liquid as in Example 1 was used for the surface protective layer. The amount of hardener added was changed to 15 mmol/100 g-ge1. Photographic materials 1 to 13 were thus obtained. Scratches were evaluated by the same method as in Example 1. However, the processing was changed to the same one as in the photographic performance evaluation described below.
亙l並址■評l
実施例1と同様な露光を両面から与え、下記の現像液と
定着液にて、自動現像機処理をした。亙 Average Condition ■ Review 1 The same exposure as in Example 1 was given from both sides, and processing was carried out using an automatic processor using the following developer and fixer.
〈現像液濃縮液〉
水酸化カリウム 56.6g亜硫酸ナ
トリウム 200gジエチレントリ
アミン五酢酸 6.7g炭酸カリ
16.7g水う酸
10gヒドロキノン
83.3gジエチレングリコール 40
g4−ヒドロキシメチル−4−
メチル1−フェニル−3=
ピラゾリドン 11.0g5−メチ
ルベンゾトリアゾ−
ル
2g水で11とする(pH10,60に調整する)。<Developer concentrate> Potassium hydroxide 56.6g Sodium sulfite 200g Diethylenetriaminepentaacetic acid 6.7g Potassium carbonate
16.7g Hydrolic acid
10g hydroquinone
83.3g diethylene glycol 40
g4-Hydroxymethyl-4-methyl1-phenyl-3=pyrazolidone 11.0g5-methylbenzotriazole
Adjust to 11 with 2g water (adjust to pH 10.60).
〈定着液濃縮液〉
チオ硫酸アンモニウム 560g亜硫酸
ナトリウム 60gエチレンジア
ミン四酢酸・
ニナトリウム・二水塩 0.10g水酸化ナト
リウム 24g水で11とする(酢
酸でpH5,10番こ調整する)。<Fixer concentrate> Ammonium thiosulfate 560g Sodium sulfite 60g Ethylenediaminetetraacetic acid disodium dihydrate 0.10g Sodium hydroxide 24g Adjust to 11 with water (adjust pH to 5 and 10 with acetic acid).
自動現像ll !LJLJ現像タン
ク 5.51 35℃X12.5秒置着タンク 6
.5g 35℃×10秒水洗タンク 6.5z
20℃×7.5秒乾 *
50℃Dry to Dry処理時
間 48秒現像処理をスタートするときに器よ各タ
ンクに以下の如き処理液を満たした。Automatic development! LJLJ developing tank 5.51 35℃ x 12.5 seconds holding tank 6
.. 5g 35℃ x 10 seconds water washing tank 6.5z
Dry at 20℃ x 7.5 seconds *
50°C Dry to Dry processing time: 48 seconds When starting the development process, each tank was filled with the following processing solution.
現像タンク:上記現像液S縮環333d、水66−及び
臭化カリウム2gと酢酸1゜
8gとを含むスターター10−を加
えてpHをIQ、15とした。Developing tank: The above developer solution S ring condensation 333d, 66 ml of water, and a starter 10 containing 2 g of potassium bromide and 1.8 g of acetic acid were added to adjust the pH to IQ, 15.
定着タンク二上記定着液濃縮液25〇−及び水75〇−
結果を表2にまとめた。試料階1の感度を100とした
。Fixing tank 2: 250 ml of the above fixer concentrate and 750 ml of water The results are summarized in Table 2. The sensitivity of sample floor 1 was set to 100.
監1丘立旺盪
フイJレムを24.5X30.5caサイズで前言己の
自動現像機処理をおこない、乾燥ゾーン力・ら出てきた
フィルムを直ちに手で触ってみて、乾燥状態を確認した
。結果は表−2にまとめた。評価基準は以下のとうりで
ある。A film of 24.5 x 30.5 ca size was processed in the automatic processor as described above, and the film that came out of the drying zone was immediately touched with the hand to check whether it was dry. The results are summarized in Table-2. The evaluation criteria are as follows.
◎ ・・・ でてきたフィルムがかなり温かく、十分乾
燥している。◎ ... The film that comes out is quite warm and dry enough.
O・・・ でてきたフィルムは微かに温かく、乾燥して
いる。O... The film that comes out is slightly warm and dry.
ム ・・・ でてきたフィルムが湿り気を帯びており、
乾燥不十分である。M... The film that comes out is damp.
Insufficient drying.
× ・・・ でてきたフィルムが濡れており、フィルム
とフィルムが接fFfる。×... The film that comes out is wet, and the films are in contact with each other.
(表−2)
表−2の結果より本発明の一般式(1)の化合物を使用
した試料では迅速処理での乾燥性に優れ、高感度でスリ
キズが良好であることが明らかである。(Table 2) From the results in Table 2, it is clear that the samples using the compound of general formula (1) of the present invention have excellent drying properties in rapid processing, high sensitivity, and good scratch resistance.
実施例−3 1ヱ勿謹製 以下に述べる方法により乳剤A−Eを調製した。Example-3 1.Made by Nasukan Emulsions A-E were prepared by the method described below.
ハロ゛ン の! 1
水11に臭化カリウムと25gゼラチンの入った容器に
、pAgを8.7に保ちつつ、硝酸銀水溶液と臭化カリ
ウム及び沃化カリウム水溶液をダブルジェット法で添加
して、平均粒子サイズ0゜8μmの正八面体沃臭化銀乳
剤を調製し、チオ硫酸ナトリウム及び塩化金酸を用いて
化学増感を行なって、pAg8.6、p)(Ei、
4で法度含量8モル%の正八面体感光性沃臭化銀乳剤(
A)を得た。Halloween! 1. To a container containing potassium bromide and 25 g gelatin in water 11, while maintaining pAg at 8.7, add silver nitrate aqueous solution and potassium bromide and potassium iodide aqueous solution by double jet method to obtain an average particle size of 0°. A regular octahedral silver iodobromide emulsion of 8 μm was prepared and chemically sensitized using sodium thiosulfate and chloroauric acid to give pAg8.6, p) (Ei,
4 and a regular octahedral photosensitive silver iodobromide emulsion with a normal content of 8 mol% (
A) was obtained.
1 ノ 日 ハロ ン のシ 1水11中
に25gの臭化カリウムと4.5gの沃化カリウムと2
Nのチオシアン酸カリウム9ccと24gのゼラチンが
入った容器中に通常のアンモニア法で硝酸銀水溶液、臭
化カリウム水溶液をダブルジェット法で添加して、平均
粒子サイズ1゜0μmの比較的不定形に近い厚い板状で
法度含量3モル%の沃臭化銀乳剤を調整し、チオ硫酸ナ
トリウム及び塩化金酸を用いて化学増感を行なってpA
gs、6、pH6,4の感光性沃臭化銀乳剤(B)を得
た。最初の溶液中に9gの沃化カリウムを存在せしめ、
乳剤(B)と同様に粒子形成及び化学増感を行ない、法
度含量6モル%で平均粒径0.6μの感光性沃臭化銀乳
剤(C)および最初の溶液中に8gの沃化カリウムを添
加し、ダブルジェット法のハロゲン水溶液中に4gの沃
化カリウムを添加することにより法度含量8モル%で平
均粒径1.0μの感光性沃臭化銀乳剤(D)を得た。1 day Halon 1 25g potassium bromide and 4.5g potassium iodide in 11 water
Into a container containing 9 cc of N potassium thiocyanate and 24 g of gelatin, a silver nitrate aqueous solution and a potassium bromide aqueous solution were added using the normal ammonia method using a double jet method to form particles with an average particle size of 1°0 μm and a relatively amorphous shape. A thick plate-shaped silver iodobromide emulsion with a nominal content of 3 mol% was prepared, and chemically sensitized using sodium thiosulfate and chloroauric acid to obtain a pA.
A photosensitive silver iodobromide emulsion (B) having a gs of 6 and a pH of 6.4 was obtained. 9 g of potassium iodide was present in the initial solution;
Grain formation and chemical sensitization were carried out in the same manner as in emulsion (B), and a photosensitive silver iodobromide emulsion (C) with a normal content of 6 mol % and an average grain size of 0.6 μm and 8 g of potassium iodide were added in the initial solution. By adding 4 g of potassium iodide to a halogen aqueous solution using a double jet method, a photosensitive silver iodobromide emulsion (D) having a normal content of 8 mol % and an average grain size of 1.0 μm was obtained.
水11に5gの臭化カリウムと30gゼラチンの入った
容器に、pAgを9.5に保ちつつ全体の5%の硝酸銀
水溶液と臭化カリウムと沃化カリウムの混合水溶液を添
加し、続いて全体の5%の硝酸銀をシングルジェット法
によって添加し、さらにPAgを8.1に保ちつつ残り
の90%の硝酸銀水溶液と臭化カリウムと沃化カリウム
の混合水溶液をダブルジェット法で添加して、平均投影
面積径1.3μm、標準偏差15%、アスペクト比6.
5の平板状臭化銀乳剤を調製し、チオ硫酸ナトリウム及
び塩化金酸を用いて化学増感を行なってpAg8.6、
PH6,4で法度含量3モル%の感光性沃臭化銀乳剤(
E)を得た。To a container containing 5 g of potassium bromide and 30 g of gelatin in water 11, a 5% aqueous silver nitrate solution and a mixed aqueous solution of potassium bromide and potassium iodide were added while keeping the pAg at 9.5. 5% of silver nitrate was added by a single jet method, and the remaining 90% of silver nitrate aqueous solution and a mixed aqueous solution of potassium bromide and potassium iodide were added by a double jet method while maintaining PAg at 8.1. Projected area diameter 1.3 μm, standard deviation 15%, aspect ratio 6.
A tabular silver bromide emulsion of No. 5 was prepared and chemically sensitized using sodium thiosulfate and chloroauric acid to give a pAg of 8.6.
Photosensitive silver iodobromide emulsion with a legal content of 3 mol% at pH 6.4 (
E) was obtained.
1五跋粁豊作製
乳剤塗布面をあらかじめ下引き加工し、裏面に(C1,
) s
0イCHzCJO+−J
(m+n=32) 101mg/rrfジアセチル
セルロース 143■/n(酸化ケイ素
5■/n(を塗設したトリアセチル
セルロース支持体上に下記処方を乳剤塗布面側に塗布し
、塗布試料を作製した。1. The side coated with the emulsion made by Gobakan Hosaku was pre-undercoated, and the back side was coated with (C1,
) s 0iCHzCJO+-J (m+n=32) 101mg/rrf diacetyl cellulose 143■/n (silicon oxide
A coated sample was prepared by coating a triacetyl cellulose support coated with 5 .mu./n (2.5 mm/n) on the emulsion-coated side of the triacetyl cellulose support.
(乳剤層)
塗布銀量 3.5g/n(ゼラチ
ン量 1.5g/Ag1g4−ヒドロキシ
−6−メチ
ル1. 3.3a、 7−チ
トラザインデン ]O■/Ag1gポリエチ
レンオキサイド 8■/Ag1gポリポタシウムp
−ビニル
ベンゼンスルホネート 20■/Ag1g増感色素
230■1モルAgrW
一般式(1)の化合物および比較化合物は表−3記載の
添加量になるよう加えた。硬膜は塗布試料を25°C6
5%RHで7日間保存した後、25°Cの蒸留中に3分
浸漬したあとの膜厚が乾燥膜の200±10%になるよ
うにビス−(ビニルスルホニルアセトアミド)エタンに
よって調整した。(Emulsion layer) Amount of coated silver: 3.5 g/n (Amount of gelatin: 1.5 g/Ag1g 4-hydroxy-6-methyl 1.3.3a, 7-titrazaindene) O■/Ag1g Polyethylene oxide 8■/Ag1g Polypotassium p
-Vinylbenzenesulfonate 20■/Ag1g sensitizing dye
230 1 mol AgrW The compound of general formula (1) and the comparative compound were added in amounts shown in Table 3. For the dura mater, the coated sample was heated at 25°C6.
After storage at 5% RH for 7 days, the film was immersed in distillation at 25°C for 3 minutes and adjusted with bis-(vinylsulfonylacetamido)ethane so that the film thickness was 200±10% of the dry film.
(表面保護層)
ゼラチン量 0.8g/ボポリポタ
ソウムP−ビニルベ
ンゼンスルホネート 1*+g/ビポリ
メチルメタクリレート微
粒子(平均サイズ3μ) 0.13g/ボ互1撒処
方
メトール 2g無水亜硫酸
ナトリウム 100gハイドロキノン
5gホウ酸
2g以上に水を加えて1j!にする。(Surface protective layer) Amount of gelatin 0.8g/Bopolipotasum P-vinylbenzenesulfonate 1*+g/Bipolymethyl methacrylate fine particles (average size 3μ) 0.13g/1 sprinkle each Prescription Metol 2g Anhydrous sodium sulfite 100g Hydroquinone
5g boric acid
Add water to 2g or more to make 1j! Make it.
(pHを8.7に調整する)
定l瓜処1
チオ硫酸ナトリウム 240g無水亜硫
酸ナトリウム 15g28%酢酸
48M!ホウ酸
7.5gカリミョウバン
15g以上に水を加えて11にする。(Adjust the pH to 8.7) Constant liter melon soup 1 Sodium thiosulfate 240g Anhydrous sodium sulfite 15g 28% acetic acid
48M! Boric acid
7.5g potassium alum
Add water to 15g or more to make 11.
センシトメト1−の−
塗布試料1〜25を25℃65%RHの温湿度で7日間
保存した。太陽光に相当する波長分布を持つフィルター
を用いて1/100秒露光した後現像液により20℃、
7分間現像し、定着液で定着後、水洗、乾燥した。処理
後の試料についてカブリ+濃度0.3における感度の測
定を行なった。Sensitomet 1- Coated samples 1 to 25 were stored at 25° C. and 65% RH for 7 days. After exposure for 1/100 seconds using a filter with a wavelength distribution equivalent to sunlight, it was heated to 20℃ using a developer.
It was developed for 7 minutes, fixed with a fixer, washed with water, and dried. Sensitivity measurements were performed on the processed samples at a fog+density of 0.3.
感度はA−E各乳剤のものについてそれぞれのブランク
のものの感度を100として相対比較した。The sensitivity of each emulsion A to E was compared relative to the sensitivity of each blank as 100.
スフキズ の量゛
実施例−1と同様の方法でナイロンタワシを用いスリキ
ズをつけた。この試料をセンシトメトリーと同様の現像
処理を行った後、実施例−1と同様に黒化したスリキズ
の本数を数えた。Amount of scratches: Scratches were made using a nylon scrubber in the same manner as in Example-1. After this sample was subjected to a development treatment similar to sensitometry, the number of blackened scratches was counted in the same manner as in Example-1.
OiI 力 11
塗布試料を25℃65%RHの温湿度で保存したものと
、40℃75%RHの温湿度で10日間保存したものと
をそれぞれセンシトメトリーを行ない、かぶり濃度を比
較した。前者に対し後者のかふり値は高くその差を経時
カブリとして表−3に記載した。OiI Force 11 Sensitometry was performed on coated samples stored at a temperature and humidity of 25° C. and 65% RH, and those stored at a temperature and humidity of 40° C. and 75% RH for 10 days, respectively, and the fog density was compared. The fogging value of the latter was higher than that of the former, and the difference is recorded in Table 3 as the fog over time.
表−3より本発明の一般式(1)の化合物を使用した試
料隘1〜25は感度を損なうことなくスリキズ耐性が良
化し、経時によるカブリの上昇が少ないことが明らかで
ある。From Table 3, it is clear that samples Nos. 1 to 25 using the compound of general formula (1) of the present invention have improved scratch resistance without impairing sensitivity, and have little increase in fog over time.
また本発明の試料には、センシトメトリーでの足部の硬
調化(いわゆる足切れ)がみられ、さらに現像時間の短
かい所での現像促進効果も見られた。In addition, in the sample of the present invention, high contrast in the toe portion (so-called toe breakage) was observed in sensitometry, and furthermore, a development accelerating effect was observed in areas where the development time was short.
実施例−4 下記のような層構成で塗布試料1〜11を作製した。Example-4 Coating samples 1 to 11 were prepared with the following layer configurations.
支持体より第1層
ゼラチン o、6g/mポリボタ
シウムp−ビニルベ
ンゼンスルホネート 9■/M第2層
ゼラチン 1.0g/n?CHz
CHzSOJ CHzCHzSOJ26■/
イ
CHzCLSO3KCJbCHzSOsK16■/n(
H(1! 0.11■
/ポ第3層
ゼラチン o、4g/n(ポリボ
タンウムp−ビニルベ
ンゼンスルホネート 5■/ボ第4層
乳剤Cを用いて
銀量 1.36g/rd
ゼラチン 2. 0g/rr14
−ヒドロキシ−6−メチル
−1,3,3a、7−チト
ラザインデン 30■/n(ポリエ
チレンオキサイド 7■/dボリボタシウム
p−ビニルベ
ンゼンスルホネート 50■/ボ第5層
乳剤りを用いて
銀量 4.6g/ボ
ゼラチン量 7.0g/m4−ヒド
ロキシ−6−メチル
−1,3,3a、7−チト
ラザインデン 41■/Mポリエチ
レンオキサイド 23■/dポリポタシウムp
−ビニルへ
ンゼンスルホネート 88■/ボ最上層
ゼラチン 0.8g/耐13■、
/r+(
ポリメチルメタクリレ−11粒子
(平均粒径3μ) 0.13■/ri(ポリ
ポタシウムp−ビニルへ
ンゼンスルホネート 6■/M42■/
、I
C+sHs+C00C+Js* 5
0■/dc、p、、so□−N−CH2COOKC3L
1. 8g/n(硬膜は、塗布試料
を25℃65%Rhの温湿度で7日間保存した後25℃
の華留水に3分間浸漬後の膜厚が乾燥厚に対して300
%±10になるヨウにビス−(ビニルスルホニルアセト
アミド)エタンによって調整した。First layer gelatin o, 6 g/m polybotacium p-vinylbenzenesulfonate 9/M second layer gelatin 1.0 g/n? Hz
CHzSOJ CHzCHzSOJ26■/
ICHzCLSO3KCJbCHzSOsK16■/n(H(1! 0.11■
/ Po 3rd layer Gelatin o, 4 g/n (Polybutonium p-vinylbenzenesulfonate 5 ■/Bo 4th layer
Silver amount using emulsion C: 1.36 g/rd Gelatin 2. 0g/rr14
5th layer
Silver amount 4.6 g/bogelatin amount 7.0 g/m 4-hydroxy-6-methyl-1,3,3a,7-titrazaindene 41 ■/M polyethylene oxide 23 ■/d polypotasium p
- Vinyl henzene sulfonate 88■ / top layer gelatin 0.8g / resistance 13■,
/r+(Polymethyl methacrylate-11 particles (average particle size 3μ) 0.13■/ri(Polypotassium p-vinylhenzenesulfonate 6■/M42■/
, I C+sHs+C00C+Js*5
0■/dc,p,,so□-N-CH2COOKC3L
1. 8 g/n (dural film was formed at 25°C after storing the coated sample at 25°C and 65% Rh temperature and humidity for 7 days.
The film thickness after immersion in Karu water for 3 minutes is 300% of the dry thickness.
%±10 was adjusted with bis-(vinylsulfonylacetamido)ethane.
乳剤(C)、(D)は後熟前に、実施例−3と同じ色素
を230■/Agモル添加した。To emulsions (C) and (D), 230 μm/Ag mole of the same dye as in Example 3 was added before post-ripening.
本発明の一般式(+)の化合物の添加量及び添加した層
は表−4に示す。The amount of the compound of the general formula (+) of the present invention and the added layer are shown in Table 4.
実施例−3と同様の方法で、センシトメトリー、スリキ
ズ耐性、経時カブリの評価を行ない、結果を表−4に記
載した。Sensitometry, scratch resistance, and fogging over time were evaluated in the same manner as in Example 3, and the results are listed in Table 4.
表−4より本発明の試料階7〜11はどの層に添加して
もスリキズ耐性、経時カプリ改良の効果は明らかである
。From Table 4, it is clear that Samples 7 to 11 of the present invention are effective in improving scratch resistance and capri over time no matter which layer they are added to.
実施例−5
硝flI銀水溶液と臭化カリウム、沃化カリウム水溶液
を、アンモニアの存在下でpAgを7.9に保ちつつダ
ブルジェット法により混合し、平均粒子サイズ0.2ミ
クロンの単分散立方体の沃臭化銀乳剤(沃化銀2.0モ
ル%、臭化銀98.0モル%)を作った。Example-5 An aqueous solution of silver nitrate, potassium bromide, and potassium iodide was mixed by a double jet method in the presence of ammonia while maintaining pAg at 7.9, and monodisperse cubes with an average particle size of 0.2 microns were obtained. A silver iodobromide emulsion (silver iodide 2.0 mol%, silver bromide 98.0 mol%) was prepared.
この沃化銀乳剤に化学熟成として、チオ硫酸ナトリウム
3X10−’モル1モルAg添加し硫黄増感を施した。This silver iodide emulsion was subjected to sulfur sensitization by adding 1 mol of sodium thiosulfate (3×10 -' mols) of Ag for chemical ripening.
この乳剤に、増感色素r5,5’−ジクロロ−3,3′
−ジ(3−スルホプロピル)−9−エチル−オキサカル
ボシアニンナトリウム塩」を、銀1モルあたり6X10
−’モル添加して分光増感した。The sensitizing dye r5,5'-dichloro-3,3'
-di(3-sulfopropyl)-9-ethyl-oxacarbocyanine sodium salt" at 6X10 per mole of silver.
Spectral sensitization was performed by adding -' moles.
さらに安定側として4−ヒドロキシ−6−メチル−1,
3,3a、7−チトラザインデンを塗布助剤として下記
化合物およびサポニンを、C+ 、Hs3CON−CH
zCH2SO3NaCH3
ビニルスルホン系硬化剤として
CHz=(JISOtCHxCONH(CTo) 、1
NHCOCHzSOzCH=CL(n=2.3)
を、増粘剤としてポリスチレンスルホン酸ソーダを、ラ
テックスポリマーとしてポリスチルアクリレートの分散
物を0.30g/rdおよび次の化合物を0.40g/
−になるように添加した。Furthermore, as a stable side, 4-hydroxy-6-methyl-1,
C+, Hs3CON-CH
zCH2SO3NaCH3 As a vinyl sulfone curing agent, CHz=(JISOtCHxCONH(CTo), 1
NHCOCHzSOzCH=CL (n=2.3), sodium polystyrene sulfonate as a thickener, 0.30 g/rd of a dispersion of polystylacrylate as a latex polymer, and 0.40 g/rd of the following compound:
It was added so that -
CH3
(CH,C8←、。(CHzC? 3゜COOII
C00C,H,OOC−(CCH2L
■
CH3
さらにかぶり防止剤として1−フェニルメルカブトテト
ラソ゛−ルを0.1gそれぞれ銀1モル当り添加したの
ち、ヒドラジン化合物として下記化合物を6.0X10
−’モル1モルAg加えた。CH3 (CH, C8←,.(CHzC? 3゜COOII
C00C,H,OOC-(CCH2L ■ CH3 Furthermore, 0.1 g of 1-phenylmercabutotetrasol was added as an antifoggant per mole of silver, and then the following compound was added as a hydrazine compound at 6.0×10
-'1 mole of Ag was added.
さらに一般式(1)の化合物を表−5記載の添加量加え
た。Furthermore, the compound of general formula (1) was added in the amount shown in Table 5.
また、比較試料として一般式(1)の化合物のかわりに
ハイドロキノンを加えた乳剤も調製した。Furthermore, as a comparative sample, an emulsion was also prepared in which hydroquinone was added instead of the compound of general formula (1).
保護層としては、ゼラチン、ドデシルベンゼンスルホン
酸ソーダ、シリコーンオイル、フッ素系界面活性剤、コ
ロイダルシリカ、ポリエチルアクリレートの分散物、ポ
リメチルメタクリレート(粒径2.5μ)のマント剤お
よびポリスチレンスルホン酸ソーダの増粘剤からなるゼ
ラチン水溶液をゼラチン塗布量として1.6g/rrr
になるよう、また、乳剤は塗布銀量として3.6g/r
rrになるよう乳剤層と保護層を同時塗布した。The protective layer includes gelatin, sodium dodecylbenzenesulfonate, silicone oil, fluorosurfactant, colloidal silica, polyethyl acrylate dispersion, polymethyl methacrylate (particle size 2.5μ) cloak agent, and sodium polystyrene sulfonate. The coating amount of gelatin is 1.6 g/rrr for gelatin aqueous solution consisting of thickener.
Also, the emulsion was coated with a silver amount of 3.6 g/r.
The emulsion layer and the protective layer were coated at the same time so that rr was obtained.
これらの試料をそれぞれ2枚用意し、1枚は圧力増悪の
試験をする目的でサファイア針0.025mφに荷重を
2.4.6.8.10gかけてすりきすをつけた。もう
1枚はセンシトメトリーの感度、γを測定する目的です
りきすは何もつけないものを用意した。Two samples were each prepared, and one sample was ground with a load of 2.4, 6, 8.10 g applied to a sapphire needle of 0.025 mφ for the purpose of testing pressure aggravation. The other sheet was prepared without any sandpaper for the purpose of measuring the sensitivity of sensitometry, γ.
これら2枚の試料は3200’にのタングステン光でセ
ンシトメトリー用光学クサビを通して5秒間露光した後
、下記組成の現像液で38℃30秒間現像し、定着、水
洗、乾燥した。(現像処理には富士写真フィルム株式会
社製自動現像機FG−660Fを用いた。)
結果を表−5に示す。These two samples were exposed to tungsten light at 3200' for 5 seconds through an optical wedge for sensitometry, then developed for 30 seconds at 38 DEG C. with a developer having the following composition, fixed, washed with water, and dried. (For the development process, an automatic processor FG-660F manufactured by Fuji Photo Film Co., Ltd. was used.) The results are shown in Table 5.
(現像液処方)
○感度の評価方法
特性曲線上のfog+tM度1.5の点の露光量から感
度を読み取った。(Developer prescription) ○ Method for evaluating sensitivity Sensitivity was read from the exposure amount at the point of fog+tM degree 1.5 on the characteristic curve.
○γの評価方法
特性曲線のfog+4度0.3の点からfog+濃度3
.0の点を直線で結びこの直線の傾きでγ値を求めた。○ Evaluation method of γ From the point of fog + 4 degrees 0.3 on the characteristic curve, fog + density 3
.. The γ value was determined by connecting the 0 points with a straight line and using the slope of this straight line.
つまり
3.0−0.3
Bog (fog +濃度0.3のところの露光量)γ
は面質に対応し10以上であることが好ましい。In other words, 3.0-0.3 Bog (fog + exposure amount at density 0.3) γ
corresponds to the surface quality and is preferably 10 or more.
Oすりきす増感の評価方法
センシトメトリーの足部に相当するわずかにハックグラ
ウンド濃度を有する部分においてすりきす増感の程度を
目視で観察し評価した。Method for evaluating O ground-kiss sensitization: The degree of ground-kiss sensitization was visually observed and evaluated in a portion having a slight huck ground density corresponding to the toe of sensitometry.
すりきすをつける針の荷重を増していった時、すりきす
増悪の認められるようになり始める荷重を記録した。こ
の値が大きい程すりきすに対する耐性が強く、6g以上
あることが好ましい。As the load of the needle applying the pickpocket was increased, the load at which the worsening of the pickpocket began to be observed was recorded. The larger this value is, the stronger the resistance to scratches is, and it is preferably 6 g or more.
表−5の結果より本発明の化合物を使用した試料は感度
、Tの低下がほとんどなくすりきす増感が極めて良化し
ていることがわかる。From the results shown in Table 5, it can be seen that the samples using the compounds of the present invention showed almost no decrease in sensitivity or T, and the ground-kiss sensitization was extremely improved.
また、比較化合物としてハイドロキノンを一般式(1)
の化合物のかわりに用いた試料は、本発明の試料にくら
べすりきす増悪良化程度が小さくかつ感度が低下してお
り、本発明の化合物の方が優れていることがわかる。In addition, as a comparative compound, hydroquinone was used with the general formula (1)
It can be seen that the sample used in place of the compound of the present invention showed a smaller degree of aggravation and improvement of scratches and a lower sensitivity than the sample of the present invention, and that the compound of the present invention was superior.
実施例−6
ダブルジェット法を用いて塩沃臭化銀乳剤(沃化銀0.
1モル%、臭化銀30モル%)を調製した。この塩沃臭
化銀乳剤にはロジウム塩として(N H4)3Rh C
1bをI X 10−’モル1モルAg含有するようハ
ロゲン水溶液に添加した9また同時にイリジウム塩とし
てKzlrC16を4×10−7モル/Ag1モル含有
するようハロゲン水溶液に添加した。このハロゲン水溶
液と硝a2銀水溶液とを45℃60分間で混合し平均粒
子サイズ0.25μの単分散立方体乳剤を調製した。Example 6 A silver chloroiodobromide emulsion (silver iodide 0.00%) was prepared using the double jet method.
1 mol %, silver bromide 30 mol %). This silver chloroiodobromide emulsion contains (NH4)3RhC as a rhodium salt.
1b was added to the aqueous halogen solution so as to contain 1 mole of Ag (I x 10 -' mol), and at the same time, KzlrC16 was added as an iridium salt to the aqueous halogen solution so as to contain 4 x 10 -7 mole/1 mole of Ag. The halogen aqueous solution and the a2 silver nitrate aqueous solution were mixed at 45° C. for 60 minutes to prepare a monodisperse cubic emulsion with an average grain size of 0.25 μm.
この乳剤に水洗脱塩後チオ硫酸ナトリウム5×10−5
モル1モルAg添加し硫黄増感を施したのちさらにカリ
ウムクロロオーレート4X10−’モル1モルAg添加
し金増感を施した。After washing and desalting this emulsion, sodium thiosulfate 5 x 10-5
After sulfur sensitization was carried out by adding 1 mol of Ag, gold sensitization was carried out by adding 1 mol of potassium chloroaurate (4×10 -' mol of Ag).
この乳剤に、増感色素として1−(2−ヒドロキシエト
キシエチル)−3−(ピリジン−2−イル)−5−((
3−スルホブチル−5−クロロ−2−ペンゾオキサゾリ
ニデン)エチリデン〕−2−チオヒダントインカリウム
塩を3X10−’モル/Ag1モル、安定剤として4−
ヒドロキシ−6−メチル−1,3,3a、7−チトラザ
インデンt−1,5g、レゾルシンアルドキシム2g、
1−フェニル−5−メルカプトテトラゾールを0.1g
それぞれ銀1モル当り加えた。This emulsion was added as a sensitizing dye to 1-(2-hydroxyethoxyethyl)-3-(pyridin-2-yl)-5-((
3-sulfobutyl-5-chloro-2-penzooxazolinidene)ethylidene]-2-thiohydantoin potassium salt at 3X10-' mol/Ag 1 mol, 4- as a stabilizer.
Hydroxy-6-methyl-1,3,3a, 7-chitrazaindene t-1,5g, resorcinaldoxime 2g,
0.1 g of 1-phenyl-5-mercaptotetrazole
Each was added per mole of silver.
さらに塗布助剤として下記化合物およびサポニンを、 C+ tH33cON−C)IzCHzSO3Na暑 CH。Furthermore, the following compounds and saponin are used as coating aids. C+ tH33cON-C) IzCHzSO3Na heat CH.
ビニルスルホン系硬化剤として
cut=cnso□C)IzCONH(CHz)llN
HCOCHzSO□cn=cnz(n=2.3)
を、増粘剤としてポリスチレンスルホン酸ソーダを、ラ
テックスポリマーとしてポリエチルアクリレートの分散
物を加えた。As a vinyl sulfone curing agent cut=cnso□C)IzCONH(CHz)llN
HCOCHzSO□cn=cnz (n=2.3), sodium polystyrene sulfonate as a thickener, and a dispersion of polyethyl acrylate as a latex polymer were added.
さらにヒドラジン化合物として Js を1.2X10−’モル1モルAg加えた。Furthermore, as a hydrazine compound Js 1.2 x 10-' mol of 1 mol Ag was added.
さらに一般式(1)の化合物あるいはハイドロキノンを
表−6記載の添加量加えた。Furthermore, the compound of general formula (1) or hydroquinone was added in the amount shown in Table 6.
保護層としては、ゼラチン、ドデシルベンゼンスルホン
酸ソーダ、シリコーンオイル、フッ素系界面活性剤、コ
ロ ルシリ力、ポリエチルアクリレートの分散物、ポ
リアクリルアミド(分子量=5000)、ポリメチルメ
タクリレート(粒径2.5μ)のマット剤およびポリス
チレンスルホン酸ソーダの増粘剤からなるゼラチン水溶
液をゼラチン塗布量として1.6g/rrrになるよう
、また乳剤は塗布銀量として3.6g/n(になるよう
乳剤層と保護層を同時塗布した。For the protective layer, gelatin, sodium dodecylbenzenesulfonate, silicone oil, fluorine surfactant, color silicone, polyethyl acrylate dispersion, polyacrylamide (molecular weight = 5000), polymethyl methacrylate (particle size 2.5μ) were used. ) The aqueous gelatin solution consisting of a matting agent and a thickener of sodium polystyrene sulfonate was applied to the emulsion layer so that the gelatin coating amount was 1.6 g/rrr, and the emulsion was coated with a silver coating amount of 3.6 g/n. A protective layer was applied at the same time.
これらの試料を実施例−5と同様の方法ですりきすをつ
け、露光〜現像したのち実施例−5と同様に評価した。These samples were polished in the same manner as in Example-5, exposed and developed, and then evaluated in the same manner as in Example-5.
結果を表−6に示す。The results are shown in Table-6.
表−6の結果より含硫黄増感した塩沃臭化銀裏側におい
ても本発明の化合物を使用した試料は感度、γを損うこ
となくすりきす増悪が極めて良化していることがわかる
。From the results shown in Table 6, it can be seen that even on the back side of sulfur-containing sensitized silver chloroiodobromide, the sample using the compound of the present invention has extremely improved aggravation of scratches without impairing the sensitivity or γ.
また、比較化合物のハイドロキノンより本発明の一般式
(1)の化合物の方が感度、Tの低下が少なく、すりき
すが良化している。Furthermore, the compound of general formula (1) of the present invention exhibits less decrease in sensitivity and T, and has improved abrasion resistance than hydroquinone, which is a comparative compound.
Claims (2)
、該乳剤層および/または他の構成層中に下記一般式(
I )で表わされる化合物を含有することを特徴とする
ハロゲン化銀写真感光材料。 一般式( I ) ▲数式、化学式、表等があります▼ 式中、X_1、X_2はそれぞれ加水分解によって生成
してもよいヒドロキシ基、または置換もしくは無置換の
アミノ基を表わし、Zは=CR_2−、=N−を表わし
、R_1、R_2は水素原子または置換可能な基を表わ
し、nは0、1、2、3、4、または5を表わし、nが
2〜5のとき、繰り返し単位となる▲数式、化学式、表
等があります▼は同じでも異なってもよく、単環または
縮合環を形成していてもよい。 ここで、X_1、X_2、R_1、R_2のうち少なく
とも一方は、その基の中に含まれる水素原子がハロゲン
化銀粒子への吸着促進基によって置換されている。 ただし、nが1〜5のとき、繰り返し単位となる▲数式
、化学式、表等があります▼の少なくとも1つはZ=N
−であり、nが0の場合、X_1、X_2が同時に置換
もしくは無置換のアミノ基になることはない。(1) It has a surface latent image type silver halide emulsion layer on a support, and the emulsion layer and/or other constituent layers have the following general formula (
A silver halide photographic material containing a compound represented by I). General formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, X_1 and X_2 each represent a hydroxy group that may be generated by hydrolysis, or a substituted or unsubstituted amino group, and Z is =CR_2- , =N-, R_1 and R_2 represent a hydrogen atom or a substitutable group, n represents 0, 1, 2, 3, 4, or 5, and when n is 2 to 5, it becomes a repeating unit. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ may be the same or different, and may form a single ring or a fused ring. Here, in at least one of X_1, X_2, R_1, and R_2, a hydrogen atom contained in the group is substituted with a group that promotes adsorption to silver halide grains. However, when n is 1 to 5, at least one of the repeating units ▲mathematical formula, chemical formula, table, etc.▼ is Z=N
- and when n is 0, X_1 and X_2 cannot be substituted or unsubstituted amino groups at the same time.
(II)で表わされる化合物を含有することを特徴とする
特許請求の範囲第(1)項記載のハロゲン化銀写真感光
材料。 一般式(II) ▲数式、化学式、表等があります▼ 式中、R_1は脂肪族基または芳香族基を表わし、R_
2は水素原子、アルキル基、アリール基、アルコキシ基
、アリールオキシ基、アミノ基またはヒドラジノ基を表
わし、G_1は▲数式、化学式、表等があります▼基、
−SO_2−基、−SO−基、▲数式、化学式、表等が
あります▼基、▲数式、化学式、表等があります▼基、
チオカルボニル基又はイミノメチレン基を表わし、A_
1、A_2はともに水素原子あるいは一方が水素原子で
他方が置換もしくは無置換のアルキルスルホニル基、又
は置換もしくは無置換のアリールスルホニル基、又は置
換もしくは無置換のアシル基を表わす。(2) The silver halide photographic material according to claim (1), which contains a compound represented by the following general formula (II) in the emulsion layer and/or other constituent layers. General formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, R_1 represents an aliphatic group or an aromatic group, and R_
2 represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an amino group, or a hydrazino group, and G_1 is a ▲ group with a mathematical formula, chemical formula, table, etc.;
-SO_2- group, -SO- group, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ groups, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ groups,
Represents a thiocarbonyl group or iminomethylene group, A_
1 and A_2 both represent a hydrogen atom, one hydrogen atom and the other a substituted or unsubstituted alkylsulfonyl group, a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30646290A JPH04177336A (en) | 1990-11-13 | 1990-11-13 | Silver halogenide film sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30646290A JPH04177336A (en) | 1990-11-13 | 1990-11-13 | Silver halogenide film sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04177336A true JPH04177336A (en) | 1992-06-24 |
Family
ID=17957303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30646290A Pending JPH04177336A (en) | 1990-11-13 | 1990-11-13 | Silver halogenide film sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04177336A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7741017B2 (en) | 2001-02-26 | 2010-06-22 | Fujifilm Corporation | Silver halide color photographic light-sensitive material and image formation method using the same, silver halide emulsion, reducing compound having group adsorptive to silver halide and method for producing the same |
-
1990
- 1990-11-13 JP JP30646290A patent/JPH04177336A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7741017B2 (en) | 2001-02-26 | 2010-06-22 | Fujifilm Corporation | Silver halide color photographic light-sensitive material and image formation method using the same, silver halide emulsion, reducing compound having group adsorptive to silver halide and method for producing the same |
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